This disclosure relates generally to thermoelectric devices and, more particularly, to a hybrid solar and a solar thermal device with embedded flexible thin-film based thermoelectric module.
A solar device (e.g., a solar panel) may utilize a photovoltaic layer including solar cells to convert solar energy into electricity. Although photovoltaic based solar devices provide for scalability in use thereof, the aforementioned devices may be inefficient (e.g., efficiency ≤24%). Another solar device may be solar thermal based, leveraging heat energy of the sun. Although solar thermal installations may be relatively efficient, limitations in efficiency arising out of heat losses due to internal convection may prove to be a compromise therein.
Disclosed are methods, a device and/or a system of a hybrid solar and a solar thermal device with embedded flexible thin-film based thermoelectric module.
In one aspect, a method of a solar device includes sputter depositing pairs of N-type thermoelectric legs and P-type thermoelectric legs electrically in contact with one another on a flexible substrate to form a thin-film based thermoelectric module. The flexible substrate is aluminum (Al) foil, a sheet of paper, teflon, plastic, polyimide, a single-sided metal clad laminate, or a double-sided metal clad laminate. The method also includes rendering the formed thin-film based thermoelectric module flexible and less than or equal to 100 μm in dimensional thickness based on choices of fabrication processes with respect to layers of the formed thin-film based thermoelectric module including the sputter deposited N-type thermoelectric legs and the P-type thermoelectric legs.
Further, the method includes directly coupling the flexible thin-film based thermoelectric module to a layer of heat absorber material or a layer of photovoltaic material configured to receive sunlight such that the flexible thin-film based thermoelectric module is in contact therewith to form the solar device, and leveraging, through the directly coupled flexible thin-film based thermoelectric module, a temperature difference across a first surface of the flexible thin-film based thermoelectric module directly in contact with the layer of heat absorber material or the layer of photovoltaic material and a second surface away therefrom to generate increased solar thermal power and/or electrical power output through the solar device compared to an otherwise equivalent solar device without the formed thin-film based thermoelectric module.
In another aspect, a method of a solar device includes forming a flexible thin-film based thermoelectric module of less than or equal to 100 μm in dimensional thickness on a flexible substrate based on choices of fabrication processes and materials with respect to layers of the formed thin-film based thermoelectric module. The flexible substrate is an Al foil, a sheet of paper, teflon, plastic, polyimide, a single-sided metal clad laminate, or a double-sided metal clad laminate. The method also includes directly coupling the flexible thin-film based thermoelectric module to a layer of heat absorber material or a layer of photovoltaic material configured to receive sunlight such that the flexible thin-film based thermoelectric module is in contact therewith to form the solar device.
Further, the method includes leveraging, through the directly coupled flexible thin-film based thermoelectric module, a temperature difference across a first surface of the flexible thin-film based thermoelectric module directly in contact with the layer of heat absorber material or the layer of photovoltaic material and a second surface away therefrom to generate increased solar thermal power and/or electrical power output through the solar device compared to an otherwise equivalent solar device without the formed thin-film based thermoelectric module.
In yet another aspect, a method of a solar device includes forming a flexible thin-film based thermoelectric module of less than or equal to 100 μm in dimensional thickness on a flexible substrate based on choices of fabrication processes and materials with respect to layers of the formed thin-film based thermoelectric module. The flexible substrate is an Al foil, a sheet of paper, teflon, plastic, polyimide, a single-sided metal clad laminate, or a double-sided metal clad laminate. The method also includes directly coupling the flexible thin-film based thermoelectric module to a layer of heat absorber material or a layer of photovoltaic material configured to receive sunlight such that the flexible thin-film based thermoelectric module is in contact therewith to form the solar device.
Further, the method includes leveraging, through the directly coupled flexible thin-film based thermoelectric module, a temperature difference across a first surface of the flexible thin-film based thermoelectric module directly in contact with the layer of heat absorber material or the layer of photovoltaic material and a second surface away therefrom to generate increased solar thermal power and/or electrical power output through the solar device compared to an otherwise equivalent solar device without the formed thin-film based thermoelectric module while enabling retention of an outward physical appearance of the otherwise equivalent solar device.
Other features will be apparent from the accompanying drawings and from the detailed description that follows.
The embodiments of this invention are illustrated by way of example and not limitation in the figures of the accompanying drawings, in which like references indicate similar elements and in which:
Other features of the present embodiments will be apparent from the accompanying drawings and from the detailed description that follows.
Example embodiments, as described below, may be used to provide methods, a device and/or a system of a hybrid solar and a solar thermal device with embedded flexible thin-film based thermoelectric module. Although the present embodiments have been described with reference to specific example embodiments, it will be evident that various modifications and changes may be made to these embodiments without departing from the broader spirit and scope of the various embodiments.
The most common thermoelectric devices in the market may utilize alternative P and N type legs/pellets/elements made of semiconducting materials. As heat is applied to one end of a thermoelectric device based on P and N type elements, charge carriers thereof may be released into the conduction band. Electron (charge carrier) flow in the N type element may contribute to a current flowing from the end (hot end) where the heat is applied to the other end (cold end). Hole (charge carrier) flow in the P type element may contribute to a current flowing from the other end (cold end) to the end (hot end) where the heat is applied. Here, heat may be removed from the cold end to prevent equalization of charge carrier distribution in the semiconductor materials due to migration thereof.
In order to generate voltage at a meaningful level to facilitate one or more application(s), typical thermoelectric devices may utilize alternating P and N type elements (legs/pellets) electrically coupled in series (and thermally coupled in parallel) with one another, as shown in
Typical thermoelectric devices (e.g., thermoelectric device 200) may be limited in application thereof because of rigidity, bulkiness and high costs (>$20/watt) associated therewith. Also, these devices may operate at high temperatures using active cooling. Exemplary embodiments discussed herein provide for a thermoelectric platform (e.g., enabled via roll-to-roll sputtering on a flexible substrate (e.g., plastic)) that offers a large scale, commercially viable, high performance, easy integration and inexpensive (<20 cents/watt) route to flexible thermoelectrics.
In accordance with the exemplary embodiments, P and N thermoelectric legs may be deposited on a flexible substrate (e.g., plastic) using a roll-to-roll process that offers scalability and cost savings associated with the N and P materials. In a typical solution, bulk legs may have a height in millimeters (mm) and an area in mm2. In contrast, N and P bulk legs described in the exemplary embodiments discussed herein may have a height in microns (μm) and an area in the μm2 to mm2 range.
Examples of flexible substrates may include but are not limited to aluminum (Al) foil, a sheet of paper, teflon, plastic, polyimide and a single/double-sided metal (e.g., copper (Cu)) clad laminate. As will be discussed below, exemplary embodiments involve processes for manufacturing/fabrication of thermoelectric devices/modules that enable flexibility thereof not only in terms of substrates but also in terms of thin films/thermoelectric legs/interconnects/packaging. Preferably, exemplary embodiments provide for thermoelectric devices/modules completely wrappable and bendable around other devices utilized in specific applications, as will be discussed below. Further, exemplary embodiments provide for manufactured/fabricated thermoelectric devices/modules that are each less than or equal to 100 μm in dimensional thickness.
Exemplary thermoelectric devices discussed herein may find utility in solar and solar thermal applications. As discussed above, traditional thermoelectric devices may have a size limitation and may not scale to a larger area. For example, a typical solar panel may have an area in the square meter (m2) range and the traditional thermoelectric device may have an area in the square inch range. A thermoelectric device in accordance with the exemplary embodiments may be of varying sizes and/or dimensions ranging from a few mm2 to a few m2.
Additionally, exemplary thermoelectric devices may find use in low temperature applications such as harvesting body heat in a wearable device, automotive devices/components and Internet of Things (IoT). Entities (e.g., companies, start-ups, individuals, conglomerates) may possess expertise to design and/or develop devices that require thermoelectric modules, but may not possess expertise in the fabrication and packaging of said thermoelectric modules. Alternately, even though the entities may possess the requisite expertise in the fabrication and packaging of the thermoelectric modules, the entities may not possess a comparative advantage with respect to the aforementioned processes.
In one scenario, an entity may create or possess a design pattern for a thermoelectric device. Said design pattern may be communicated to another entity associated with a thermoelectric platform to be tangibly realized as a thermoelectric device. It could also be envisioned that the another entity may provide training with regard to the fabrication processes to the one entity or outsource aspects of the fabrication processes to a third-party. Further, the entire set of processes involving Intellectual Property (IP) generation and manufacturing/fabrication of the thermoelectric device may be handled by a single entity. Last but not the least, the entity may generate the IP involving manufacturing/fabrication of the thermoelectric device and outsource the actual manufacturing/fabrication processes to the another entity.
All possible combinations of entities and third-parties are within the scope of the exemplary embodiments discussed herein.
Etching, as defined above, may refer to the process of removing (e.g., chemically) unwanted metal (say, Cu) from the patterned flexible substrate. In one example embodiment, a mask (e.g., a shadow mask) or a resist may be placed on portions of the patterned flexible substrate corresponding to portions of the metal that are to remain after the etch. Here, in one or more embodiments, the portions of the metal that remain on the patterned flexible substrate may be electrically conductive pads, electrically conductive leads and terminals formed on a surface of the patterned flexible substrate.
Also,
It should be noted that the configurations of the electrically conductive pads 5061-N, electrically conductive leads 5121-P and terminals 5201-2 shown in
Example etching solutions employed may include but are not limited to ferric chloride and ammonium persulphate. Referring back to
The metal (e.g., Cu) finishes on the surface of patterned flexible substrate 504 may oxidize over time if left unprotected. As a result, in one or embodiments, operation 408 may involve additionally electrodepositing a seed metal layer 550 including Chromium (Cr), Nickel (Ni) and/or Gold (Au) directly on top of the metal portions (e.g., electrically conductive pads 5061-N, electrically conductive leads 5121-P, terminals 5201-2) of patterned flexible substrate 504 following the printing, etching and cleaning. In one or more embodiments, a dimensional thickness of seed metal layer 550 may be less than or equal to 5 μm.
In one example embodiment, surface finishing may be employed to electrodeposit seed metal layer 550; the aforementioned surface finishing may involve Electroless Nickel Immersion Gold (ENIG) finishing. Here, a coating of two layers of metal may be provided over the metal (e.g., Cu) portions of patterned flexible substrate 504 by way of Au being plated over Ni. Ni may be the barrier layer between Cu and Au. Au may protect Ni from oxidization and may provide for low contact resistance. Other forms of surface finishing/electrodeposition may be within the scope of the exemplary embodiments discussed herein. It should be noted that seed metal layer 550 may facilitate contact of sputter deposited N-type thermoelectric legs (to be discussed below) and P-type thermoelectric legs (to be discussed below) thereto.
In one or more embodiments, operation 410 may then involve cleaning patterned flexible substrate 504 following the electrodeposition.
In one or more embodiments, operation 704 may involve stripping (e.g., using solvents such as dimethyl sulfoxide or alkaline solutions) of photoresist 670 and etching of unwanted material on patterned flexible substrate 504 with sputter deposited N-type thermoelectric legs 6021-P. In one or more embodiments, operation 706 may involve cleaning the patterned flexible substrate 504 with the sputter deposited N-type thermoelectric legs 6021-P; the cleaning process may be similar to the discussion with regard to
In one or more embodiments, operation 708 may then involve annealing the patterned flexible substrate 504 with the sputter deposited N-type thermoelectric legs 6021-P; the annealing process may be conducted (e.g., in air or vacuum) at 175° C. for 4 hours. In one or more embodiments, the annealing process may remove internal stresses and may contribute stability of the sputter deposited N-type thermoelectric legs 6021-P. In one or more embodiments, a dimensional thickness of the sputter deposited N-type thermoelectric legs 6021-P may be less than or equal to 25 μm.
It should be noted that P-type thermoelectric legs 6041-P may also be sputter deposited on the surface finished pattern flexible substrate 504. The operations associated therewith are analogous to those related to the sputter deposition of N-type thermoelectric legs 6021-P. Obviously, photomask 650 may have patterns corresponding/complementary to the P-type thermoelectric legs 6041-P generated thereon. Detailed discussion associated with the sputter deposition of P-type thermoelectric legs 6041-P has been skipped for the sake of convenience; it should be noted that a dimensional thickness of the sputter deposited P-type thermoelectric legs 6041-P may also be less than or equal to 25 μm.
It should be noted that the sputter deposition of P-type thermoelectric legs 6041-P on the surface finished patterned flexible substrate 504 may be performed after the sputter deposition of N-type thermoelectric legs 6021-P thereon or vice versa. Also, it should be noted that various feasible forms of sputter deposition are within the scope of the exemplary embodiments discussed herein. In one or more embodiments, the sputter deposited P-type thermoelectric legs 6041-P and/or N-type thermoelectric legs 6021-P may include a material chosen from one of: Bismuth Telluride (Bi2Te3), Bismuth Selenide (Bi2Se3), Antimony Telluride (Sb2Te3), Lead Telluride (PbTe), Silicides, Skutterudites and Oxides.
In one or more embodiments, operation 802 may involve sputter depositing barrier layer 672 (e.g., film) on top of the sputter deposited pairs of the P-type thermoelectric legs 6041-P and the N-type thermoelectric leg 6021-P discussed above. In one or more embodiments, barrier layer 672 may be electrically conductive and may have a higher melting temperature than the thermoelectric material forming the P-type thermoelectric legs 6041-P and the N-type thermoelectric legs 6021-P. In one or more embodiments, barrier layer 672 may prevent corruption (e.g., through diffusion, sublimation) of one layer (e.g., the thermoelectric layer including the P-type thermoelectric legs 6041-P and the N-type thermoelectric legs 6021-P) by another layer. An example material employed as barrier layer 672 may include but is not limited to Cr, Ni or Au. Further, in one or more embodiments, barrier layer 672 may further aid metallization contact therewith (e.g., with conductive interconnects 696).
In one or more embodiments, a dimensional thickness of barrier layer 672 may be less than or equal to 5 μm. It is obvious that another photomask (not shown) analogous to photomask 650 may be employed to aid the patterned sputter deposition of barrier layer 672; details thereof have been skipped for the sake of convenience and clarity. In one or more embodiments, operation 804 may involve may involve curing barrier layer 672 at 175° C. for 4 hours to strengthen barrier layer 672. In one or more embodiments, operation 806 may then involve cleaning patterned flexible substrate 504 with barrier layer 672.
In one or more embodiments, operation 808 may involve depositing conductive interconnects 696 on top of barrier layer 672. In one example embodiment, the aforementioned deposition may be accomplished by screen printing silver (Ag) ink or other conductive forms of ink on barrier layer 672. Other forms of conductive interconnects 696 based on conductive paste(s) are within the scope of the exemplary embodiments discussed herein. As shown in
In one or more embodiments, the screen printing of Ag ink may contribute to the continued flexibility of the thermoelectric device/module and low contact resistance. In one or more embodiments, operation 810 may involve cleaning (e.g., using one or more of the processes discussed above) the thermoelectric device/module/formed conductive interconnects 696/barrier layer 672 and polishing conductive interconnects 696. In one example embodiment, the polishing may be followed by another cleaning process. In one or more embodiments, operation 812 may then involve curing conductive interconnects 696 at 175° C. for 4 hours to fuse the conductive ink into solid form thereof. In one or more embodiments, conductive interconnects 696 may have a dimensional thickness less than or equal to 25 μm.
In one or more embodiments, the doctor blading may involve controlling precision of a thickness of the encapsulation provided by elastomer 950 through doctor blade 952. In one example embodiment, elastomer 950 may be silicone. Here, said silicone may be loaded with nano-size aluminum oxide (Al2O3) powder to enhance thermal conductivity thereof to aid heat transfer across the thermoelectric module.
In one or more embodiments, as seen above, all operations involved in fabricating the thermoelectric device/module (e.g., thermoelectric device 400) render said thermoelectric device/module flexible.
It should be noted that although photomask 650 is discussed above with regard to deposition of N-type thermoelectric legs 6021-P and a P-type thermoelectric legs 6041-P, the aforementioned deposition may, in one or more other embodiments, involve a hard mask 690, as shown in
The abovementioned flexibility of thermoelectric device 400/1000/1100 may be enabled through proper selection of flexible substrates (e.g., substrate 350) and manufacturing techniques/processes that aid therein, as discussed above. Further, flexible thermoelectric device 1000/1100 may be bendable 360° such that the entire device may completely wrap around the system element discussed above. Still further, in one or more embodiments, an entire dimensional thickness of the flexible thermoelectric module (e.g., flexible thermoelectric device 400) in a packaged form may be less than or equal to 100 μm, as shown in
Last but not the least, as the dimensions involved herein are restricted to less than or equal to 100 μm, the flexible thermoelectric device/module discussed above may be regarded as being thin-film based (e.g., including processes involved in fabrication thereof).
In one or more embodiments, thermoelectric device 400/thermoelectric module 970 may be easily amenable to use in solar devices such as solar panels/flat plate collectors. Solar thermal installations may harvest the heat energy of the sun. The heat then may be used to drive other mechanical systems for power production. One or more embodiments discussed herein may relate to integrating thermoelectric device 400/thermoelectric module 970 with solar devices such as a solar panel.
In one example embodiment, heat absorber layer 1204 may include a metallic material (e.g., Copper, Aluminum) coated with a special material such as TiNOX to efficiently absorb incident solar light energy (e.g., sunlight 1250) and effect transformation thereof into heat/thermal energy, thereby resulting in minimal reflection and radiation losses. It should be noted that surface 1254, in one or more other embodiments, may be in contact with a layer that provides for a temperature difference between surface 1252 and surface 1254. In other words, any layer that provides for a temperature difference between surface 1252 and surface 1254 may substitute internal layer of fluid pipes 1206.
Also, in one or more embodiments, it should be noted that thermoelectric sandwich 1350 may introduced right behind heat absorber layer 1204 and in contact therewith, as shown in
When sunlight 1250 is incident on PV layer 1404, a large portion of said sunlight 1250 may be absorbed by a semiconductor material of PV layer 1404, thereby effecting a transfer of energy from photons to electrons. The flow of these electrons may constitute an electric current. This electric current may be utilized to power a grid or another element. It is obvious that PV layer 1404 may include solar cells made of semiconductor material such as Silicon and Cadmium Telluride. Other materials are within the scope of the exemplary embodiments discussed herein.
The working of photovoltaic cells is well known to one skilled in the art. Detailed discussion thereof is, therefore, skipped for the sake of convenience and brevity. In one or more embodiments, heat absorber layer 1204 placed below PV layer 1404 may provide for cooling of solar cells within PV layer 1404. In one or more embodiments, heat absorber layer 1204 may then be able to leverage energy from PV layer 1404 that is unrecoverable without the presence of heat absorber layer 1204 within solar device 1400.
Again, it should be understood that solar device 1400 may be analogous to solar device 1300 and solar device 1200, except for the inclusion of PV layer 1404 on top of heat absorber layer 1204. Exemplary embodiments disclosed in
It should be noted that any combination of a thermoelectric module (e.g., thermoelectric module 1202, thermoelectric sandwich 1350, thermoelectric module 1402) with PV layer 1404 and heat absorber layer 1204 may be envisioned according to the application toward which a corresponding solar device (e.g., solar device 1200, solar device 1300, solar device 1400) is targeted.
While focused solar absorption through heat absorber layer 1204 is missing in solar device 1500 of
Thus, in one or more embodiments, thermoelectric module 970 and the embodiments thereof in
In one or more embodiments, thermoelectric module 970 and embodiments thereof in
It should be noted that solar device 1200, solar device 1300, solar device 1400 and solar device 1500 may be examples of hybrid solar/thermoelectric and hybrid solar thermal/thermoelectric devices. To generalize, exemplary embodiments may relate to hybrid solar and solar thermal devices with embedded thermoelectric module (e.g., thermoelectric module 1202, thermoelectric sandwich 1350, thermoelectric module 1402, thermoelectric module 1502).
In one or more embodiments, the flexible substrate may be an Al foil, a sheet of paper, teflon, plastic, polyimide, a single-sided metal clad laminate, or a double-sided metal clad laminate. In one or more embodiments, operation 1604 may involve rendering the formed thin-film based thermoelectric module flexible and less than or equal to 100 μm in dimensional thickness based on choices of fabrication processes with respect to layers of the formed thin-film based thermoelectric module including the sputter deposited N-type thermoelectric legs and the P-type thermoelectric legs. In one or more embodiments, operation 1606 may involve directly coupling the flexible thin-film based thermoelectric module to a layer of heat absorber material (e.g., heat absorber layer 1204) or a layer of photovoltaic material (e.g., PV layer 1404) configured to receive sunlight (e.g., sunlight 1250) such that the flexible thin-film based thermoelectric module is in contact therewith to form the solar device.
In one or more embodiments, operation 1608 may then involve leveraging, through the directly coupled flexible thin-film based thermoelectric module, a temperature difference across a first surface (e.g., surface 1252, metallic layer 1304) of the flexible thin-film based thermoelectric module directly in contact with the layer of heat absorber material or the layer of photovoltaic material and a second surface (e.g., surface 1254, metallic layer 1306) away therefrom to generate increased solar thermal power and/or electrical power output through the solar device compared to an otherwise equivalent solar device without the formed thin-film based thermoelectric module.
Although the present embodiments have been described with reference to specific example embodiments, it will be evident that various modifications and changes may be made to these embodiments without departing from the broader spirit and scope of the various embodiments. Accordingly, the specification and drawings are to be regarded in an illustrative rather than a restrictive sense.
This application is a Continuation-in-Part application of co-pending U.S. application Ser. No. 15/808,902 titled FLEXIBLE THIN-FILM BASED THERMOELECTRIC DEVICE WITH SPUTTER DEPOSITED LAYER OF N-TYPE AND P-TYPE THERMOELECTRIC LEGS filed on Nov. 10, 2017, which is a Continuation-in-Part application of co-pending U.S. patent application Ser. No. 14/564,072 titled VOLTAGE GENERATION ACROSS TEMPERATURE DIFFERENTIALS THROUGH A THERMOELECTRIC LAYER COMPOSITE filed on Dec. 8, 2014, which is a conversion application of U.S. Provisional Application No. 61/912,561 also titled VOLTAGE GENERATION ACROSS TEMPERATURE DIFFERENTIALS THROUGH A THERMOELECTRIC LAYER COMPOSITE filed on Dec. 6, 2013, U.S. application Ser. No. 14/711,810 titled ENERGY HARVESTING FOR WEARABLE TECHNOLOGY THROUGH A THIN FLEXIBLE THERMOELECTRIC DEVICE filed on May 14, 2015 and issued as U.S. Pat. No. 10,141,492 on Nov. 27, 2018 and co-pending U.S. application Ser. No. 15/368,683 titled PIN COUPLING BASED THERMOELECTRIC DEVICE filed on Dec. 5, 2016. The content of the aforementioned applications are incorporated by reference in entirety thereof.
Number | Date | Country | |
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61912561 | Dec 2013 | US |
Number | Date | Country | |
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Parent | 15808902 | Nov 2017 | US |
Child | 16289637 | US | |
Parent | 14564072 | Dec 2014 | US |
Child | 15808902 | US | |
Parent | 14711810 | May 2015 | US |
Child | 15808902 | US | |
Parent | 15368683 | Dec 2016 | US |
Child | 14711810 | US |