Claims
- 1. An aqueous solution having a pH of from about 0.5 to about 6 and comprising i) hydrogen peroxide in a concentration of from about 0.05 to about 8 wt./wt. % of the solution, ii) at least one phosphorus-based acid in a concentration range of from about 0.05 to about 8 wt./wt. % of the solution, and iii) at least one anionic surfactant selected from the group consisting of C8 to C16 alkyl aryl sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, sulfonated C12 to C22 carboxylic acids and alkali metal, ammonium, calcium and magnesium salts thereof, C6 to C22 alkyl diphenyl oxide sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, naphthalene sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, C8 to C22 alkyl sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, alkali metal, ammonium, calcium and magnesium C8 to C18 alkyl sulfates, alkyl or alkenyl esters or diesters of sulfosuccinic acid in which the alkyl or alkenyl groups independently contain from six to eighteen carbon atoms and alkali metal, ammonium, calcium and magnesium salts thereof, and mixtures thereof, in a concentration range of from about 0.02 to about 5 wt./wt. % of the solution.
- 2. An aqueous solution according to claim 1 wherein the phosphorus-based acid is selected from the group consisting of the derivatives of phosphorous oxides in which the phosphorous atom is in the +5 oxidation state, phosphonic acids having 1 to 5 phosphonic acid groups and salts thereof, and mixture thereof.
- 3. A solution according to claim 2 wherein the phosphorus-based acid is selected from the group consisting of phosphoric acid, sodium tripolyphosphate, 1-hydroxyethylidene-1,1,-diphosphonic acid, amino tri(methylene phosphonic acid), diethylenetriaminepenta-(methylene phosphonic acid), 2-hydroxyethylimino bis(methylene phosphonic acid), ethylene diamine tetra(methylene phosphonic acid), and mixtures thereof.
- 4. A solution according to claim 3 wherein the phosphorus-based acid is selected from the group consisting of phosphoric acid, 1-hydroxyethylidene-1,1,-diphosphonic acid, and mixtures thereof.
- 5. A solution according to claim 2 wherein the anionic surfactant is selected from the group consisting of dodecyl benzene sulfonic acid and alkali metal, ammonium, calcium and magnesium salts thereof, C6 to C22 alkyl diphenyl oxide sulfonic acid and alkali metal, ammonium, calcium and magnesium salts thereof, and mixtures thereof.
- 6. A solution according to claim 5 wherein the anionic surfactant is selected from the group consisting of dodecyl benzene sulfonic acid and an alkali metal salt thereof, a C6 alkylated sulfonated diphenyl oxide disodium salt, and mixtures thereof.
- 7. A solution according to claim 2 wherein the solution has a hydrogen peroxide concentration of from about 0.5 to about 8 wt./wt. % of the solution.
- 8. A solution according to claim 2 wherein the phosphorus-based acid is present in a concentration of from about 0.2 to about 8 wt./wt. % of the solution.
- 9. A solution according to claim 2 wherein the anionic surfactant is present in a concentration of from about 0.08 to about 5 wt./wt. % of the solution.
- 10. A solution according to claim 2 having a pH of from about 0.7 to about 3.5.
- 11. A solution according to claim 2 wherein the solution contains an additional component selected from the group consisting of emulsifiers, hydrotropes, detergents and mixtures thereof in a concentration of up to about 3 wt./wt. % of the solution.
- 12. A solution according to claim 11 containing wherein the emulsifiers and detergents are polyoxyethylene surfactants.
- 13. A solution according to claim 11 wherein the hydrotrope is selected from the group consisting of alkylated sulfonated diphenyl oxides, alkylated sulfonated diphenyl oxide salts, and mixtures thereof.
- 14. A solution according to claim 13 containing a C6 alkylated sulfonated diphenyl oxide disodium salt.
- 15. A solution according to claim 11 wherein said additional component is present in a concentration of from about 0.04 to about 3 wt./wt. % of the solution.
- 16. A solution according to claim 2 containing a corrosion inhibitor in a concentration of from about 0.05 to about 10 wt./wt % of the solution.
- 17. A solution according to claim 2 containing a monocarboxylic acid, a polycarboxylic acid, or mixtures thereof, in a concentration of from about 0.05 to about 4 wt./wt. % of the solution.
- 18. A solution according to claim 2 containing an alcohol comprising one to six carbon atoms in a concentration of from about 0.1 to about 10 wt./wt. % of the solution.
- 19. A solution according to claim 2 having a pH of from about 0.7 to about 3.5 and a hydrogen peroxide concentration of from about 0.5 to about 8 wt./wt. % of the solution, and containing a phosphonic acid having from 1 to 5 phosphonic acid groups in a concentration of from about 0.2 to about 8 wt./wt. %. of the solution, an anionic alkyl aryl sulfonic acid in a concentration of from about 0.08 to about 5 wt./wt. %. of the solution, and an additional component selected from the group consisting of emulsifiers, hydrotropes, detergents and mixtures thereof in a concentration of from about 0.04 to about 3 wt./wt. % of the solution, said additional component including at least one polyoxyethylene surfactant and an alkylated sulfonated diphenyl oxide salt.
- 20. A concentrated solution which can be diluted with water to produce a solution according to claim 2.
- 21. A powdered formulation which can be dissolved in water to produce a solution according to claim 2.
- 22. A solution according to claim 1 containing a phosphonic acid having from 1 to 5 phosphonic acid groups, an anionic alkyl aryl sulfonic acid, and an additional component selected from the group consisting of emulsifiers, hydrotropes, detergents and mixtures thereof in a concentration of from about 0.04 to about 3 wt./wt. % of the solution.
- 23. An aqueous solution having a pH of from about 0.5 to about 6 and comprising i) hydrogen peroxide in a concentration of from about 0.01 to about 20 wt./wt. % of the solution, ii) at least one phosphorus-based acid in a concentration range of from about 0.05 to about 8 wt./wt. % of the solution, and iii) at least one anionic surfactant selected from the group consisting of C8 to C16 alkyl aryl sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, sulfonated C12 to C22 carboxylic acids and alkali metal, ammonium, calcium and magnesium salts thereof, C6 to C22 alkyl diphenyl oxide sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, naphthalene sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, C8 to C22 alkyl sulfonic acids and alkali metal, ammonium, calcium and magnesium salts thereof, alkali metal, ammonium, calcium and magnesium C8 to C18 alkyl sulfates, alkyl or alkenyl esters or diesters of sulfosuccinic acid in which the alkyl or alkenyl groups independently contain from six to eighteen carbon atoms and alkali metal, ammonium, calcium and magnesium salts thereof, and mixtures thereof, in a concentration range of from about 0.02 to about 5 wt./wt. % of the solution.
Parent Case Info
[0001] This application is a continuation-in-part of U.S. patent application Ser. No. 09/356,345 filed Jul. 19, 1999 which claims the benefit of U.S. provisional patent application 60/112,047 filed Dec. 14, 1998.
Provisional Applications (1)
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Number |
Date |
Country |
|
60112047 |
Dec 1998 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09356345 |
Jul 1999 |
US |
Child |
10028373 |
Dec 2001 |
US |