Claims
- 1. A compound having the formula ##SPC30##
- in which R.sup.1 and R.sup.4 are alike or different and each is H, phenyl or (lower)alkyl of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when different are hydrogen, chloro, bromo, fluoro, CF.sub.3, hydroxy, nitro, amino, phenyl, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when alike are hydrogen, chloro, fluoro, bromo, hydroxy, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms or when taken together R.sup.2 and R.sup.3 are methylenedioxy or the residue of a phenyl ring (--C=CH--CH=CH--); or a pharmaceutically acceptable salt thereof.
- 2. A compound of claim 1 having the formula ##SPC31##
- in which R.sup.1 is H, phenyl or (lower)alkyl of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when different are hydrogen, chloro, bromo, fluoro, CF.sub.3, hydroxy, nitro, amino, phenyl, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when alike are hydrogen, chloro, bromo, fluoro, hydroxy, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms, or when taken together R.sup.2 and R.sup.3 are methylenedioxy or the residue of a phenyl ring (--CH=CH--CH=CH--); or a pharmaceutically acceptable acid addition salt thereof.
- 3. A compound of claim 1 having the formula ##SPC32##
- in Which R.sup.1 is H, phenyl or (lower)alkyl of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when different are hydrogen, chloro, bromo, fluoro, CF.sub.3, hydroxy, nitro, amino, phenyl, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when alike are hydrogen, chloro, bromo, fluoro, hydroxy, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms, or when taken together R.sup.2 and R.sup.3 are methylenedioxy or the residue of a phenyl ring (--CH=CH--CH=CH--); or a pharmaceutically acceptable acid addition salt thereof.
- 4. A compound of claim 1 having the formula ##SPC33##
- in which R.sup.2 and R.sup.3 when different are hydrogen, CF.sub.3, chloro, bromo, fluoro, nitro, amino, hydroxy, (lower)alkoxy of 1 to 3 carbon atoms, or (lower)alkyl of 1 to 3 carbon atoms, R.sup.2 and R.sup.3 when alike are hydrogen, chloro, bromo, fluoro, hydroxy, (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms, or when taken together R.sup.2 and R.sup.3 are methylenedioxy or the residue of a phenyl ring (--CH=CH--CH=CH--); or a pharmaceutically acceptable acid addition salt thereof.
- 5. A compound of claim 1 having the formula ##SPC34##
- in which R.sup.2 and R.sup.3 are alike or different and are H, hydroxy, bromo, chloro, fluoro (lower)alkyl of 1 to 3 carbon atoms, or (lower)alkoxy of 1 to 3 carbon atoms; or a pharmaceutically acceptable salt thereof.
- 6. A compound of claim 1 having the formula ##SPC35##
- in which R.sup.2 and R.sup.3 are alike or different and are H, chloro, bromo, methyl, methoxy, or hydroxy; or the hydrochloride salt thereof.
- 7. The compound of claim 6 in which R.sup.2 and R.sup.3 are H.
- 8. The compound of claim 6 in which R.sup.2 and R.sup.3 are chloro
- 9. The compound of claim 6 in which R.sup.2 is chloro and R.sup.3 is methyl.
- 10. The compound of claim 6 in which R.sup.2 is bromo and R.sup.3 is methyl.
- 11. The compound of claim 6 in which R.sup.2 is H and R.sup.3 is chloro.
- 12. The compound of claim 6 in which R.sup.2 is chloro and R.sup.3 is H;
- 13. The compound of claim 6 in which R.sup.2 is H and R.sup.3 is methyl;
- 14. The compound of claim 6 in which R.sup.2 is methyl and R.sup.3 is H;
- 15. The compound of claim 6 in which R.sup.2 and R.sup.3 are methyl;
- 16. The compound of claim 4 in which R.sup.2 and R.sup.3 taken together are --CH=CH--CH=CH--;
- 17. The compound of claim 6 in which R.sup.2 is bromo and R.sup.3 is chloro.
- 18. The compound of claim 4 in which R.sup.2 is NO.sub.2 and R.sup.3 is methyl.
- 19. The compound of claim 3 in which R.sup.1 and R.sup.3 are methyl and R.sup.2 is H.
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of a co-pending application Ser. No. 441,619, filed Feb. 21, 1974, now abandoned.
Non-Patent Literature Citations (1)
Entry |
tanaka et al., Jour. Het. Chem., vol. 9 (1972) pp. 1355-1358. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
441619 |
Feb 1974 |
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