Hereinafter, the present invention will be described with reference to the drawings.
T=C1*R1*1n(V0/(V0−Vih) (1)
T=0.1*R1(ms) (2)
Table 1 illustrates the time T in case of having changed the resistance value at seven values from r0 to r6. In the table, the T min and the T max represent values in 80% and 120% of the time T calculated by the formula (1) or the formula (2), respectively. These seven resistance values can be identified (detected) from a relation between the resistance R and the time T in Table 1.
Then, a method for manufacturing the keyboard of the present invention will be described. First, a bottom cover is prepared. In the bottom cover, there is a substrate provided with a resistive layer therein. Next, a top cover having the keys arranged thereon is combined with the bottom cover. The resistive layer is irradiated with a laser beam through an opening preliminarily provided on the top cover, and thereby the resistance value of the resistor is adjusted to a predetermined value. At this time, the predetermined value corresponds to the ID assigned to the nomenclature information (language of the nomenclature) of the key of Table 2. The resistive layer is provided in an opening 19 formed on a keyboard surface of
The present invention has been described taking
Number | Date | Country | Kind |
---|---|---|---|
2006-197274 | Jul 2006 | JP | national |