Number | Date | Country | Kind |
---|---|---|---|
10-151477 | Jun 1998 | JP | |
10-340311 | Nov 1998 | JP |
Number | Name | Date | Kind |
---|---|---|---|
4471042 | Komatsu et al. | Sep 1984 | |
4484809 | Coleman | Nov 1984 | |
4898798 | Sugata et al. | Feb 1990 | |
5211864 | Godlove | May 1993 | |
5521691 | Morimoto et al. | May 1996 | |
5670286 | Takei et al. | Sep 1997 |
Number | Date | Country |
---|---|---|
0 314 579 | May 1989 | EP |
54-86341 | Jul 1979 | JP |
60-59380 | Apr 1985 | JP |
61-59383 | Mar 1986 | JP |
62-75575 | Apr 1987 | JP |
3-243965 | Oct 1991 | JP |
3-293388 | Dec 1991 | JP |
4-335387 | Nov 1992 | JP |
5-88597 | Apr 1993 | JP |
5-165384 | Jul 1993 | JP |
5-241375 | Sep 1993 | JP |
8-123279 | May 1996 | JP |
9-127843 | May 1997 | JP |
9-297511 | Nov 1997 | JP |
Entry |
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“Influence of Plasma Excitation Frequency for α-Si:H Thin Film Deposition”, H. Curtins et al., Plasma Chemistry and Plasma Processing, vol. 7, No. 3, 1987, pp. 267 through 273. |