This application is a Continuation of International Patent Application No. PCT/JP2020/028778, filed Jul. 28, 2020, which claims the benefit of Japanese Patent Application No. 2019-153103, filed Aug. 23, 2019 and No. 2019-153102, filed Aug. 23, 2019, both of which are hereby incorporated by reference herein in their entirety.
The present invention relates to an electrophotographic image forming apparatus and, more specifically, to an image forming apparatus with a top emission light emitting device as a light emitting device that emits light for exposing a photoconductor to light.
Generally, there has been known an electrophotographic image forming apparatus that forms an image by exposing a photoconductor drum to light by using an exposure head including LEDs (Light Emitting Diodes) or organic EL (Organic Electro Luminescent) diodes. The exposure head includes a plurality of light emitting portions arranged in a direction substantially orthogonal to a rotation direction of the photoconductor drum. The exposure head further includes a rod lens array for forming an image on the photoconductor drum with light emitted from the light emitting portions. The number of light emitting portions and the distance between adjacent light emitting portions depend on the width of an image forming region on the photoconductor drum and the resolution of an output image of the image forming apparatus. In the case of, for example, a printer with an output resolution of 1200 dpi, the width of one pixel is 21.16 μm (the third and subsequent decimal places are omitted), so the light emitting portions are formed such that the center-to-center distance between adjacent light emitting portions is 21.16 μm. Since such an image forming apparatus using an exposure head does not use a deflector, such as a polygon mirror, unlike a scanning laser beam printer, the number of components used is less than that of a scanning laser printer, so a downsized and low-cost apparatus can be provided.
There has been suggested an exposure head using a TFT circuit and an organic EL device on a transparent glass substrate as such an exposure head (see, for example, PTL 1).
PTL 1 Japanese Patent Laid-Open No. 2015-162428
A light emitting device provided in the exposure head described in PTL 1 is a so-called bottom emission light emitting device that causes light from an organic layer to exit from the TFT circuit side. In a bottom emission light emitting device, an optical path is limited by a TFT circuit, so the ratio of the amount of light emitted from the light emitting device to the amount of light produced in a light emitting layer is low. For this reason, when a bottom emission light emitting device is used as an exposure light source for a photoconductor, there is a challenge that the amount of light produced needs to be increased.
The present invention is contemplated in view of the above problem. An image forming apparatus of the present invention is an image forming apparatus. The image forming apparatus includes a photoconductor configured to be driven to rotate about a rotational axis, and an exposure head that includes a light emitting device, and a lens array configured to guide light emitted from the light emitting device to a photoconductor surface. The light emitting device includes a silicon substrate that includes a drive circuit configured to drive the light emitting device, a first electrode layer that includes a plurality of electrodes arranged in a two-dimensional array in a rotation direction of the photoconductor and in a direction substantially parallel to the rotational axis and separately formed on the silicon substrate, a light emitting layer formed in a layer on the first electrode layer and configured to produce light when a voltage is applied, and a second electrode layer provided in common for the plurality of electrodes of the first electrode layer on an opposite side across the light emitting layer from a side on which the silicon substrate and the first electrode layer are disposed and configured to be capable of transmitting light. The drive circuit is configured to control a voltage of each of the electrodes included in the first electrode layer in accordance with image data such that the light emitting layer produces light. The lens array is disposed between the second electrode layer and the photoconductor surface such that light transmitted through the second electrode layer is guided onto the photoconductor. An image forming apparatus of the present invention is an image forming apparatus. The image forming apparatus includes a photoconductor configured to be driven to rotate about a rotational axis, and an exposure head that includes a light emitting device, and a lens array configured to guide light emitted from the light emitting device to a photoconductor surface. The light emitting device includes a silicon substrate that includes a drive circuit configured to drive the light emitting device, a first electrode layer that includes a plurality of electrodes arranged in a direction substantially parallel to the rotational axis and separately formed on the silicon substrate, a light emitting layer formed in a layer on the first electrode layer and configured to produce light when a voltage is applied, and a second electrode layer provided in common for the plurality of electrodes of the first electrode layer on an opposite side across the light emitting layer from a side on which the silicon substrate and the first electrode layer are disposed and configured to be capable of transmitting light. The drive circuit is configured to control a potential of each of the electrodes included in the first electrode layer in accordance with image data such that the light emitting layer produces light. The lens array is disposed between the second electrode layer and the photoconductor surface such that light transmitted through the second electrode layer is guided onto the photoconductor.
Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
The image forming section 103 includes quadruple image forming stations arranged in order of cyan (C), magenta (M), yellow (Y), and black (K) stations along a rotation direction (counterclockwise direction) of an endless conveying belt 111. The four image forming stations have the same configuration. Each of the image forming stations includes a photoconductor drum 102, an exposure head 106, a charger 107, and a developing unit 108. The photoconductor drum 102 is a photoconductor that rotates in an arrow direction (clockwise direction). The suffixes a, b, c, and d of the photoconductor drum 102, the exposure head 106, the charger 107, and the developing unit 108 respectively indicate components corresponding to the black (K), yellow (Y), magenta (M), and cyan (C) image forming stations. Hereinafter, unless a specific photoconductor drum or the like is specified, the suffixes of reference signs are omitted.
The image forming section 103 drives the photoconductor drum 102 to rotate and charges the photoconductor drum 102 with the charger 107. The exposure head 106 that is an exposure means causes a light emitting device to produce light in accordance with image data, condenses the light produced by the light emitting device onto the photoconductor drum 102 (photoconductor) with a rod lens array, and forms an electrostatic latent image. The developing unit 108 that is a developing means develops the electrostatic latent image formed on the photoconductor drum 102 by using toner. The developed toner image is transferred to recording paper on the conveying belt 111 that conveys the recording paper. Such a series of electrophotographic processes is performed in each of the image forming stations. During image formation, after a predetermined time elapses from the start of image formation in the cyan (C) image forming station, image forming operation is sequentially performed in the magenta (M), yellow (Y), and black (K) image forming stations. Thus, a full-color image is formed.
The image forming apparatus shown in
On the downstream side of the black (K) image forming station in a recording paper conveying direction, an optical sensor 113 that is a detecting means is disposed at a position facing the conveying belt 111. The optical sensor 113 detects the position of test images formed on the conveying belt 111 to derive the amounts of misregistration among toner images of the image forming stations. The amounts of misregistration derived by the optical sensor 113 are provided to an image controller unit 700 (described later) (see
Here, the image forming apparatus configured to directly transfer a toner image formed on the photoconductor drum 102 of each image forming station to recording paper on the conveying belt 111 has been described as an example of the electrophotographic image forming apparatus. However, the embodiment is not limited to such a printer configured to directly transfer a toner image on the photoconductor drum 102 to recording paper. For example, the embodiment may also be an image forming apparatus that includes a primary transfer section that transfers a toner image on the photoconductor drum 102 to an intermediate transfer belt and a secondary transfer section that transfers the toner image on the intermediate transfer belt to recording paper.
Next, the exposure head 106 that exposes the photoconductor drum 102 to light will be described with reference to
As shown in
As shown in
As shown in
The light emitting device 401 according to the present embodiment includes a linear light emission region 604 extending along the rotational axis direction of the photoconductor drum. The light emission region 604 includes a positive electrode, a negative electrode, and a light emitting layer 450 (described later). The light emission region 604 is a region that produces light when there is a potential difference between the positive electrode and the negative electrode.
A process technology for forming an integrated circuit has been developed, and the silicon circuit board 402 has been already used as circuit boards for various integrated circuits, so it is beneficial to form a high-speed, high-functionality circuit in high density. In addition, a large-diameter wafer has been distributed for silicon circuit boards, so it is beneficial that a large-diameter wafer is on the market and available at low cost.
The light emitting device 401 will be further described in detail with reference to
The silicon circuit board 402 is a drive circuit board in which a drive circuit that includes drive portions respectively corresponding to the lower electrodes 410-1 to 410-748 (described later) is formed in a manufacturing process.
As shown in
As shown in
The width W of the lower electrodes 410-1 to 410-748 in the X direction in the present embodiment corresponds to the width of one pixel. A clearance d is a distance between the lower electrodes in the X direction. Since the lower electrodes 410-1 to 410-748 are formed with the clearance d on the silicon circuit board 402, the plurality of drive portions formed in the silicon circuit board 402 are capable of respectively individually controlling the voltages of the lower electrodes 410-1 to 410-748. An organic material of the light emitting layer 450 is filled in the clearance d, and the lower electrodes are partitioned by the organic material.
In the light emitting device according to the present embodiment, the width W of each of the lower electrodes 410-1 to 410-748 is set to a nominal dimension of 20.90 m, and the clearance d is set to a nominal dimension of 0.26 μm. In other words, the light emitting device according to the present embodiment includes one lower electrode 410 for every 21.16 μm in the X direction. Since 21.16 μm is the size of one pixel in 1200 dpi, the width of the lower electrode 410 in the X direction of each lower electrode is a size equivalent to one pixel of the output resolution of the image forming apparatus according to the present embodiment. A process rule in the light emitting device according to the present embodiment is about 0.2 μm and is high in precision, and it is possible to form a width of dl with a resolution of 0.26 μm.
The width of each of the lower electrodes 410-1 to 410-748 in the Y direction that is the rotation direction of the photoconductor drum is also W. In other words, the lower electrodes 410-1 to 410-748 according to the present embodiment each have a shape of a square having side 20.90 μm, and the area of the lower electrode 410 is 436.81 μm2. This occupies about 97.6% of the area of one pixel, that is, 447.7456 μm2. An organic luminescent material is less in the amount of light than an LED. In contrast, when the lower electrodes in a square shape are formed on the silicon circuit board 402 with a reduced distance between the adjacent lower electrodes as described above, it is possible to ensure the light emitting area for obtaining the amount of light to such an extent that the potential of the photoconductor drum can be changed. It is desirable to ensure the lower electrode area that is 90% or more of the occupied area of one pixel. Therefore, it is desirable to form the width of one side of the lower electrode 410 by about 20.07 μm or greater for the image forming apparatus with an output resolution of 1200 dpi, and it is desirable to form the width of one side of the lower electrode 410 by about 10.04 μm or greater for the image forming apparatus with an output resolution of 2400 dpi.
On the other hand, an upper limit of the occupied area of the lower electrode 410 should be set in accordance with the transmittance of the rod lens array and the upper electrode (described later) and, in the present embodiment, the upper limit is set to 110% of the occupied area of one pixel. When the occupied area of the lower electrode 410 is designed to be greater than 110% of the occupied area of one pixel, the size of a pixel formed at the time of exposing a photoconductor drum with high sensitivity to light may significantly exceed the resolution, so the upper limit value of the occupied area of the lower electrode 410 is set to 110%. Therefore, it is desirable to form the width of one side of the lower electrode 410 by about 22.19 μm or less for the image forming apparatus with an output resolution of 1200 dpi, and it is desirable to form the width of one side of the lower electrode 410 by about 11.10 μm or less for the image forming apparatus with an output resolution of 2400 dpi. In other words, the range of the occupied area of the lower electrode for the occupied area of one pixel is preferably higher than or equal to 90% and lower than or equal to 110%.
The shape of the lower electrode is not limited to a square shape and may be a shape, such as a polygonal shape more than a quadrilateral shape, a circular shape, and an elliptical shape, as long as light with an exposure region size corresponding to the output resolution of the image forming apparatus is emitted and the quality of an output image satisfies the design specifications of the image forming apparatus by that light.
As shown in
The lower electrodes 420-1 to 420-748 (second electrode array) are disposed with the clearance d from the lower electrodes 410-1 to 410-748 (first electrode array) in the Y direction. The lower electrode 420-1 is disposed adjacent to the lower electrode 410-1 in the Y direction. Similarly, the lower electrode 420-2 to the lower electrode 420-748 are respectively disposed adjacent to the lower electrode 410-2 to the lower electrode 410-748. As in the case of the present embodiment, it is not always necessary to design the lower electrodes such that the distance between the lower electrodes in the X direction is equal to the distance between the lower electrodes in the Y direction; however, it is desirable to design the lower electrodes such that the distances between the lower electrodes in both directions are equal to each other in order to efficiently arrange the lower electrodes in a predetermined area. In the present embodiment, the light emitting device that includes two rows of electrode arrays is illustrated for the sake of easy description; however, as shown in
When the lower electrode 410-1 and the lower electrode 420-1 are driven at the same time, the center positions of areas on the photoconductor drum 102, exposed by driving the electrodes, shift by W+d in the rotation direction of the photoconductor drum 102. The image forming apparatus according to the present embodiment exposes a region corresponding to one pixel in the output resolution of the image forming apparatus by driving the plurality of lower electrodes (for example, the lower electrode 410-1 and the lower electrode 420-1) adjacent in the rotation direction of the photoconductor drum 102. For this reason, a region corresponding to one pixel can be exposed to light multiple times (multiple exposure) by providing a time difference between the timing of application of a voltage to the lower electrode 410-1 and the timing of application of a voltage to the lower electrode 420-1 in accordance with the rotation speed of the photoconductor drum 102.
Next, the light emitting layer 450 will be described. The light emitting layer 450 is formed so as to be laminated on the silicon circuit board 402 on which the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 are formed. In other words, the light emitting layer 450 is laminated on the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 in an area where the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 are formed. The light emitting layer 450 is laminated on the silicon circuit board 402 in an area where the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 are not formed. In the present embodiment, in the light emitting device 401, the light emitting layer 450 is formed so as to bridge over all the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748; however, the embodiment is not limited thereto. For example, the light emitting layer 450 may be formed so as to be laminated separately on each of the lower electrodes as in the case of the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748, or the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 may be divided into a plurality of groups and one light emitting layer may be laminated on the lower electrodes that belong to the same group for each of the divided groups.
For example, an organic material may be used for the light emitting layer 450. The light emitting layer 450 that is an organic EL film is a lamination structure that includes functional layers, such as an electron transport layer, a hole transport layer, an electron injection layer, a hole injection layer, an electron block layer, and a hole block layer. Other than an organic material, an inorganic material may be used for the light emitting layer 450.
The upper electrode 460 (positive electrode) is laminated on the light emitting layer 450 (as a second electrode layer). The upper electrode 460 is an electrode capable of transmitting (transmittable) light of the emission wavelength of the light emitting layer 450. Therefore, the upper electrode 460 according to the present embodiment adopts a material containing indium tin oxide (ITO) as a transparent electrode. An electrode made of indium tin oxide has a transmittance of 80% or higher to light in a visible light range, so the electrode is suitable as the electrode of an organic EL device.
The upper electrode 460 is formed on the side across at least the light emitting layer 450 from the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748. In other words, the light emitting layer 450 is disposed in the Z direction between the upper electrode 460 and the lower electrodes 410-1 to 410-748 and between the upper electrode 460 and the lower electrodes 420-1 to 420-748, and, when the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 are projected onto the upper electrode 460 in the Z direction, the region in which the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 are formed fits into the region in which the upper electrode 460 is formed. A transparent electrode does not need to be laminated all over the light emitting layer 450; however, in order to emit light produced in the light emitting layer 450 to be efficiently emitted to outside the light emitting device, the occupied area of the upper electrode 460 to the occupied area of one pixel is preferably higher than or equal to 100% and more preferably higher than or equal to 120%. The upper limit value of the occupied area of the upper electrode 460 is optionally designed by the areas of the silicon circuit board 402 and the light emitting layer 450. Wiring lines may be disposed in an area other than the area through which light is transmitted in the upper electrode 460.
The upper electrode 460 according to the present embodiment is a positive electrode provided in common for the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748; however, the upper electrode 460 may be provided individually for each of the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 or one upper electrode may be provided for each set of lower electrodes.
The drive circuit controls the potential of each of the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 in accordance with image data in order to generate a potential difference between the upper electrode 460 and selected lower electrodes of the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748.
The light emitting device according to the present embodiment is a device with an emission system of a so-called top emission type. When a voltage is applied between the upper electrode 460 that is a positive electrode and each of the lower electrodes 410 and the lower electrodes 420 that are negative electrodes and, as a result, a potential difference is generated between both electrodes, electrons flow from the negative electrodes into the light emitting layer 450, and holes flow from the positive electrode into the light emitting layer 450. Then, the electrons and the holes recombine with each other in the light emitting layer 450, with the result that the light emitting layer 450 produces light. When the light emitting layer 450 produces light, light heading toward the upper electrode 460 transmits through the upper electrode 460 and exits from the light emitting device in the arrow A direction indicated in
When a transparent electrode made of indium tin oxide or the like is used as the upper electrode 460, an aperture ratio representing the light transmission ratio of the electrode can be made substantially equivalent to the transmittance of the upper electrode 460. In other words, since there is substantially no area, other than the upper electrode 460, that attenuates light or that blocks light, light produced from the light emitting layer 450 becomes emission light without being attenuated or blocked as much as possible.
As described above, when the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 are formed by high-precision Si integrated circuit processing technology, the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 can be disposed in high density. Therefore, almost all the area of light emitting portions 404 (here, the sum of the area of the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748 and the area of the region between the mutually adjacent lower electrodes) can be allocated to the lower electrodes 410-1 to 410-748 and the lower electrodes 420-1 to 420-748. In other words, the exposure head has a high efficiency of use of the light emission region per unit area.
When a luminescent material susceptible to moisture, such as an organic EL layer and an inorganic EL layer, is used for the light emitting layer 450, it is desirable to seal against entry of moisture into the light emitting portions 404. As a sealing method, for example, a thin-film alone or a laminated sealing film made of a silicon oxide, a silicon nitride, and an aluminum oxide, is formed. A method excellent in performance of coating a structure, such as a step, is preferable as a method of forming a sealing film, and, for example, an atomic layer deposition method (ALD method) or the like may be used. The materials, configurations, formation methods, and the like of a sealing film are one examples, and the embodiment is not limited to the above-described examples. Suitable ones may be selected as needed.
Tdelay=((W+d)÷1000) Vdr (1)
In the present embodiment, a light emission signal is generated such that a maximum value Tw of light emission time of each of the lower electrodes corresponding to pixels is equal to a time corresponding to one-line interval in the Y direction, and the expression (2) is expressed by resolution (for example, 1200 dpi) and rotation speed Vdr.
Tw=(25.4÷1200)÷Vdr (2)
It is possible to perform exposure at substantially the same position on the photoconductor drum 102 by using the lower electrode 410-n and the lower electrode 420-n through multiple exposure, so it is possible to increase the amount of light received by the photoconductor drum 102 in proportion to the number of lower electrodes arranged in the Y direction. To maintain such an advantage, a deviation between the positions of the exposure regions of the lower electrodes that perform multiple exposure on the photoconductor drum 102 is preferably small.
For this reason, the time Tdelay falls within the range of the expression (3) for the size Ws (μm) of the exposure region even when there are variations due to control, the light emission timing is controlled within an allowable error ΔT of light emission timing.
ΔT=(Ws÷1000)÷Vdr (3)
Image data generated by the scanner section 100 is input to the image controller unit 700, and the image controller unit 700 transmits control signals for controlling the drive circuit board 202. Image data input to the image controller unit 700 may be the above-described data generated in the scanner section 100 or may be data transferred via a network device (not shown) by a personal computer. The control signals include a chip select signal cs_x indicating an effective range of image data, a clock signal clk, an image data signal data, a line synchronization signal lsync_x indicating a partition for each line of image data, and a communication signal with a CPU 703. The signals are respectively transmitted to the light emitting device 401 in the drive circuit board 202 via a chip select signal line 705, a clock signal line 706, an image data signal line 707, a line synchronization signal line 708, and a communication signal line 709. The image controller unit 700 executes a process on image data and a process on print timing. An image data generation section 701 generates image data for print output by dithering at a resolution specified by the CPU 703 on image data received from the scanner section 100 or outside the image forming apparatus. In the present embodiment, dithering is executed at a resolution of, for example, 1200 dpi.
A synchronization signal generation section 704 generates a line synchronization signal lsync_x that is a second signal. The CPU 703 provides an instruction on a time interval of a signal period to the synchronization signal generation section 704 as one-line period for a predetermined rotation speed of the photoconductor drum 102. Here, one-line period is a period during which the surface of the photoconductor drum 102 moves by a pixel size (about 21.16 μm) of 1200 dpi in the rotation direction. For example, when printing is performed at a speed of 200 mm/s in the conveying direction of recording paper, the CPU 703 provides an instruction on a time interval to the synchronization signal generation section 704 with the one-line period set to 105.8 μs (the second and subsequent decimal places are omitted). The CPU 703 calculates a speed in the conveying direction by using a setting value (fixed value) of print speed (image forming speed) set in the control unit (not shown) that controls the speed of the photoconductor drum 102. A print speed is, for example, set according to the type of recording paper.
A chip data conversion section 702 divides one-line image data into pieces of image data for the respective light emitting devices 401 in synchronization with the line synchronization signal lsync_x generated in the synchronization signal generation section 704. The chip data conversion section 702 transmits each of the pieces of image data divided for the respective light emitting devices 401 to the drive circuit board 202 together with the clock signal clk and the chip select signal cs_x. The clock signal clk is a reference signal for control.
Next, the configuration of the drive circuit board 202 will be described. A head information storage section 710 is a storage device that stores head information, such as the quantity of light produced by each of the light emitting devices 401 and mounting position information, and is connected to the CPU 703 via the communication signal line 709. The clock signal line 706, the image data signal line 707, the line synchronization signal line 708, and the communication signal line 709 are connected to all the light emitting devices 401. The chip select signal line 705 is connected to the input of the light emitting device 401-1. The output of the light emitting device 401-1 is connected to the input of the light emitting device 401-2 via a signal line 711-1, and the output of the light emitting device 401-2 is connected to the input of the light emitting device 401-3 via a signal line 711-2. In this way, the chip select signal line 705 (or the signal line 711) is connected by a so-called daisy chain (cascade-connected) via the light emitting device 401. Each of the light emitting devices 401 controls the voltages of the lower electrodes of the light emitting device 401 in accordance with setting values set by the chip select signal line 705, the clock signal line 706, the line synchronization signal line 708, the image data signal line 707, and the communication signal line 709. Each of the light emitting devices 401 generates a chip select signal for the subsequent light emitting device 401.
A communication IF section 801 controls the writing and reading of setting values to a register section 802 in accordance with communication signals from the CPU 703. The register section 802 stores setting values necessary for operation (setting values set in advance). Examples of the setting values include exposure timing information used in an image data storage section 804, information on the width and phase of a pulse signal generated in a pulse signal generation section 805, and setting information of a drive voltage set in the analog section 806. Since a drive voltage can be derived from a resistance value between the lower electrode and the upper electrode and the range of the resistance value is known in advance, information on a drive current may be stored instead of setting information of a drive voltage. The register section 802 stores at least one of these pieces of information. A chip select signal generation section 803 that is a second generation section generates a chip select signal for the subsequent light emitting device 401 by delaying a chip select signal cs_x that is an input first signal and transmits the chip select signal via the signal line 711. The image data storage section 804 holds image data while an input chip select signal cs_x is effective and outputs the image data to the pulse signal generation section 805 in synchronization with the line synchronization signal lsync_x. Details will be described later.
The pulse signal generation section 805 generates a pulse signal based on the width information and phase information on the pulse signal set in the register section 802 according to the image data input from the image data storage section 804 and outputs the pulse signal to the analog section 806. Details will be described later. The analog section 806 generates a signal necessary to drive the lower electrode in accordance with the pulse signal generated in the digital section 800. Details will be described later.
Next, the operation of the image data storage section 804 will be described. The image data storage section 804 according to the first embodiment is incorporated in the light emitting device 401. An example in which the chip select signal cs_x and the line synchronization signal lsync_x are negative logic signals will be described; however, these signals may be positive logic.
The flip-flop circuit 811 receives an image data signal data input to the image data storage section 804 as original input. The flip-flop circuits 811 equal in number (748 in the present embodiment) to an array of the lower electrodes 410 provided in the longitudinal direction of the light emitting device 401 are connected in series. The flip-flop circuits 811 operate in response to the clock signal s_clk sent from the clock gate circuit 810. The outputs of the flip-flop circuits 811 are respectively output to the adjacently connected next flip-flop circuits 811 and flip-flop circuits 812 as pieces of image data dly_data_000 to dly_data_747. The flip-flop circuits 811 and the flip-flop circuits 812 equal in number (748 in the present embodiment) to the lower electrodes 401 are provided in the longitudinal direction of a lower electrode array 401.
The flip-flop circuits 812 respectively receive the outputs of the flip-flop circuits 811 as inputs and operate in response to the line synchronization signal lsync_x. The outputs of the flip-flop circuits 812 are respectively output to the pulse signal generation sections 805 (805-1, 805-3, 805-5, . . . ) and flip-flop circuits 813 as pieces of image data buf_data_0_000 to buf_data_0_747. The flip-flop circuits 812 each function as a memory circuit, and the flip-flop circuits 812 provided for one lower electrode array (lower electrodes 401-1 to 401-748) function as a memory circuit group (or a first memory circuit group). The pulse signal generation sections 805-1, 805-3, 805-5, . . . function as a first pulse signal generation section group that generates first pulse signals. The pulse signal generation section 805-1 generates a pulse signal for driving the lower electrode 410-1. The pulse signal generation section 805-3 generates a pulse signal for driving the lower electrode 410-2. The pulse signal generation section 805-5 generates a pulse signal for driving the lower electrode 410-3.
The flip-flop circuits 813 each receive the output of the flip-flop circuit 812 as input and operate in response to a multiple exposure timing signal lshift_0. The outputs of the flip-flop circuits 813 are respectively output to the pulse signal generation sections 805 (805-2, 805-4, 805-6, . . . ) as pieces of image data buf_data_1_000 to buf_data_1_747. The flip-flop circuits 813 each function as a memory circuit, and the flip-flop circuits 813 provided for one lower electrode array (lower electrodes 402-1 to 402-748) function as a memory circuit group (or a second memory circuit group). The pulse signal generation sections 805-2, 805-4, 805-6, . . . function as a second pulse signal generation section group that generates second pulse signals. The pulse signal generation section 805-2 generates a pulse signal for driving the lower electrode 420-1. The pulse signal generation section 805-4 generates a pulse signal for driving the lower electrode 420-2. The pulse signal generation section 805-6 generates a pulse signal for driving the lower electrode 420-3.
A multiple exposure timing signal generation section 814 that is a first generation section generates a multiple exposure timing signal lshift_0 that is a timing signal in accordance with the line synchronization signal lsync_x, the clock signal clk, and a multiple timing setting signal lshift_start. In other words, the multiple exposure timing signal generation section 814 generates a multiple exposure timing signal lshif_0 for generating a pulse signal for the pulse signal generation sections 805-2, 805-4, . . . at different timing from the pulse signal generation sections 805-1, 805-3, . . . In the present embodiment, the multiple exposure timing signal generation section 814 generates a multiple exposure timing signal lshift_0 by delaying the line synchronization signal lsync_x by a setting value set in the multiple timing setting signal lshift_start. When, for example, the multiple timing setting signal lshift_start is set to 1 (lshift_start=1), the multiple exposure timing signal lshift_0 becomes a signal obtained by delaying the line synchronization signal lsync_x by one cycle of the clock signal clk. The multiple exposure timing signal generation section 814 generates a multiple exposure timing signal lshift_0 in accordance with the rotation speed of the photoconductor drum 102. In other words, the multiple timing setting signal lshift_start is set in accordance with the delay time Tdelay obtained from the above-described expression (1).
During the period from time T0 to time T1 during which the chip select signal cs_x is 0 (cs_x=0 (low level)), image data shifts as follows via the flip-flop circuits 811 connected in series. Time T1 is time at which cs_x=1 is captured at the leading edge of the clock signal clk. In other words, image data sequentially shifts like data→dly_data_000→dly_data_001→ . . . →dly_data_747. During the period in which the chip select signal cs_x is low level (cs_x=0), it is assumed that clock signals clk equal in number to the lower electrodes in the longitudinal direction of the light emitting device 401, that is, 748 clock signals clk, are input. With this configuration, one-line image data is held in dly_data_000 to dly_data_747.
From time Tl, the chip select signal cs_x is 1 (cs_x=1 (high level)), so no shift operation is performed, and image data at time T1 is held. For example, the image data dly_data_000 held in the first flip-flop circuit 811 from time T1 is 747. When the line synchronization signal lsync_x becomes 0 (lsync_x=0 (low level)) at time T2, one-line image data is concurrently output to the pulse signal generation sections 805 as buf_data_0_000 to buf_data_0_747. Time T2 is time at which lsync_x=0 is captured at the leading edge of the clock signal clk. In other words, the image data dly_data_000 and the like held in the flip-flop circuits 811 are output to the pulse signal generation sections 805 as image data buf_data_0_000 and the like via the flip-flop circuits 812.
Next,
As described with reference to
In the present embodiment, the configuration in which multiple exposure is performed by using the two lower electrode 410-n and lower electrode 420-n arranged in the Y direction has been described as an example; however, the number of lower electrodes used for multiple exposure is not limited to two. When the number of lower electrodes used for multiple exposure is increased (when rows of m=3 or more lower electrodes are used for multiple exposure), the flip-flop circuits 812, 813 (748) shown in
In the present embodiment, the flip-flop circuit has been described as an example of a means of holding image data of each of the lower electrodes. With this configuration, the flip-flop circuits are disposed together with the lower electrodes 410-1 to 410-748, with the result that a further simple circuit with less wiring area is configured. On the other hand, when a flip-flop circuit is not used, the following configuration may be adopted. As long as a memory circuit (for example, a RAM or the like) corresponding to a lower electrode and a control unit that controls the timing to read from and the timing to write to the memory circuit are provided, a flip-flop circuit is not necessarily used.
When the number of lower electrodes used for multiple exposure is increased and the number of lower electrode arrays used for multiple exposure is selectable, further dynamic light amount control is possible. In the case of, for example, the configuration in which the number of rows m of lower electrode arrays is m=10 and lower electrodes are arranged in the Y direction, lower electrode arrays used for multiple exposure can be selected from among two rows to 10 rows according to the image forming speed of the image forming apparatus. Thus, light output can be changed in nine levels. Therefore, a control range of a drive current of each of the lower electrodes can be reduced, and the lower electrodes can be constantly driven under substantially equal drive current conditions. When, for example, lower electrodes are driven at a low current (that is, a low amount of light), there is a case where the response of the lower electrodes delays and a predetermined amount of light is not obtained. In such a case, it is possible to stably drive lower electrodes by using multiple exposure according to the present embodiment. In this way, to select which rows of a plurality of rows of lower electrodes are used, the configuration in which reset terminals are added to the flip-flop circuits 812, 813 and the like and output of image data is selectively stopped may be adopted. Other than such a method, a means of stopping the output of a pulse signal may be added to the pulse signal generation section 805.
A digital-analog converter (hereinafter, referred to as DAC) 1002 supplies an analog voltage that determines a drive current to the drive portions 1001-1, 1001-3 via a signal line 1003 in accordance with data set in the register section 802. A drive portion select section 1007 supplies a drive portion select signal for selecting one of the drive portions 1001-1, 1001-3 to the drive portions 1001-1, 1001-3 via signal lines 1004, 1005 in accordance with data set in the register section 802. The drive portion select signal is generated such that only the signal connected to the selected drive portion 1001 is high level. When, for example, the drive portion 1001-1 is to be selected, a high-level drive portion select signal is supplied to only the signal line 1004, and a low-level drive portion select signal is supplied to the signal line 1005 or the like, that is, the signal line 1005 and the like respectively connected to the other drive portions 1001-3 and the like. In the present embodiment, a drive portion select signal is positive logic; however, a drive portion select signal may be negative logic.
An analog voltage input via the signal line 1003 is set to the drive portion 1001-1 or the drive portion 1001-3 at the timing at which the drive portion is selected by the drive portion select section 1007 (timing at which the drive portion select signal becomes high level). The CPU 703 sequentially selects the drive portions 1001-1, 1001-3 via the register section 802 and sets a voltage associated with the selected one of the drive portions 1001-1, 1001-3. Thus, the CPU 703 sets the analog voltages of all the drive portions 1001 with the one DAC 1002. The analog voltage that determines a drive current and the pulse signal are input to each of the drive portions 1001-1, 1001-3 through the above-described operation, and the drive current and light emission time of each of the lower electrodes 410-1, 410-2 are independently controlled by a drive circuit that will be described later.
The pulse signal line 907-1 is connected to the gate terminal of a MOSFET 1104, and, when the pulse signal is high level, a voltage charged in a capacitor 1106 is transferred to the MOSFET 1102. A drive portion select signal transmitted from the drive portion select section 1007 (transferred by the signal line 1004) is connected to the gate terminal of a MOSFET 1107. The MOSFET 1107 turns on when the received drive portion select signal is high level and charges the capacitor 1106 with the analog voltage output from the DAC 1002 (transferred by the signal line 1003). In the present embodiment, at the timing before image formation, the DAC 1002 sets an analog voltage in the capacitor 1106 and sets the MOSFET 1107 in an off state and continues holding a voltage level during an image formation period.
Through the above operation, the MOSFET 1102 supplies a drive current to the lower electrode 410-1 in accordance with the set analog voltage and the pulse signal. When the input capacitance of the lower electrode 410-1 is large and the turn-off response speed is low, the turn-off speed can be increased by using a MOSFET 1103. A signal logically inverted from the pulse signal by an inverter 1105 is input to the gate terminal of the MOSFET 1103. When the pulse signal is low level, the gate terminal of the MOSFET 1103 becomes high level, and an electric charge in the input capacitance of the lower electrode 410-1 is forcibly discharged.
In the present embodiment, the configuration in which the amount of light of the entire image is controlled by drive current and the amount of light according to image data in each pixel section is controlled by PWM has been described as an example; however, a control method for the amount of light is not limited in the present invention. Both control over the entire image and control in each pixel section may be performed by control based on drive current or may be performed by PWM.
As described above, in the present embodiment, the configuration in which the light emitting devices 401 are disposed in a staggered manner (hereinafter, referred to as staggered arrangement) on the drive circuit board 202 is adopted as an example. When the light emitting devices 401 are disposed in a staggered arrangement, good image-forming characteristics are obtained by placing the lower electrodes near the lens center of the rod lens array 203 in the transverse direction. When a low-priced rod lens array is used, the opening of each rod lens has limitations. Therefore, if each of the lower electrodes is too far from the rod lens center, light does not reach the opening of the rod lens, so there can be a case where light is not emitted onto the photoconductor drum 102. For this reason, the configuration in which a lower electrode array is disposed on one side in the transverse direction with respect to the center of the light emitting device 401 and the lower electrode array is disposed close to the rod lens center as much as possible is effective.
In
By disposing the lower electrodes in this way, each of the lower electrodes is disposed such that light enters the opening of the rod lens array 203. In the present embodiment, the lower electrodes in each light emitting device 401 are arranged at a position adjacent to one side with respect to the center of the light emitting device 401 in the transverse direction. In any light emitting device 401, the direction in which the light emitting device 401 is mounted is determined such that the end surface 310 is adjacent to the center line L center side. In other words, in the silicon circuit board 402, a plurality of lower electrodes 410-1 to 410-748 is disposed closer to the center (center line L center) of the rod lens array 203 in the transverse direction. When the light emitting devices 401 are arranged in two rows of staggered arrangement, the light emitting device 401A and the light emitting device 401B are disposed such that the lower electrodes approach the center line L center in a state where the light emitting device 401A and the light emitting device 401B are inverted by 180° therebetween.
In this way, the mounting direction of each light emitting device 401 is determined such that the positions of the lower electrodes are adjacent to one side in each light emitting device 401 and the lower electrodes approach the center line L_center. Thus, good image-forming characteristics can be obtained. On the other hand, by disposing each light emitting device 401 in the different mounting direction as described above, the order in which the lower electrodes are turned on in the Y direction needs to be controlled in accordance with the direction of the light emitting device 401. For example, the lower electrodes closer to the end surface 311 (upper side in the drawing) turn on in first in the light emitting device 401A, the lower electrodes closer to the end surface 310 (upper side in the drawing) turn on in first in the light emitting device 401B. A control method in such a case will be described below.
Circuit with Selectors
The selectors 2200-12, 2200-34, 2200-56, . . . are collectively referred to as selectors 2200. The selector 2200 is capable of switching a connection relationship with the pulse signal generation sections 805 that are destinations to which the flip-flop circuits 812, 813 respectively transmit image data. In other words, the selector 2200 functions as a select section that selects a combination of connection between the pair of first memory circuit group and second memory circuit group and the pair of first pulse signal generation section group and second pulse signal generation section group.
For example, in one light emitting device 401 in the longitudinal direction of staggered arrangement, the flip-flop circuit 812 connects with the pulse signal generation section 805-1, and the flip-flop circuit 813 connects with the pulse signal generation section 805-2. In the other light emitting device 401 in the longitudinal direction of staggered arrangement, the flip-flop circuit 812 connects with the pulse signal generation section 805-2, and the flip-flop circuit 813 connects with the pulse signal generation section 805-1. Information on connection of the selector 2200 is set in a predetermined register of the register section 802 in accordance with a communication signal from the CPU 703. It is assumed that connection of the selector 2200 is controlled in accordance with information on connection (register value) set in the register section 802.
As described above, with a means of switching the order in which the lower electrodes are turned on, multiple exposure is able to be performed regardless of the direction in which the light emitting device 401 is disposed on the drive circuit board 202. In the present embodiment, usability of staggered arrangement has been described, and it is also usable at the time when the same exposure head is used in a plurality of different image forming apparatuses. The order of turning on is selected in accordance with the rotation direction of the photoconductor drum 102 and the mounting direction of the exposure head. Thus, in an image forming apparatus in which the rotation direction of the photoconductor drum 102 is different as well, the same exposure head can be used.
As described above, in the present embodiment, by arranging the lower electrodes in the Y direction and performing multiple exposure, high light output of the exposure head is possible, with the result that it is possible to increase the speed of the image forming apparatus and support a photoconductor material that needs a further amount of light. By configuring the lower electrode arrays and the circuit portions 406 on the silicon circuit board, it is possible to provide finer output resolution and higher performance of control resulting from allowing incorporation of a large scale logic circuit of the light emitting device.
The silicon circuit board 402 includes a means of generating image data for multiple exposure. Thus, it is possible to generate necessary image data without increasing the wiring lines (wire bonding) of the interface of each light emitting device 401. It is possible to optimize the area of wiring by optimally disposing the memory circuits (flip-flop circuits). Furthermore, it is possible to control the light emission timing according to the print speed, resolution, and clearance between the lower electrodes of the light emitting device 401 in the image forming apparatus. Thus, an exposure region subjected to multiple exposure on the photoconductor drum 102 can be sharpened.
Next, a second embodiment will be described. In the first embodiment, the light emitting device that has a structure in which the lower electrodes are arranged in a two-dimensional array has been illustrated, while in the second embodiment, a light emitting device that has a structure in which lower electrodes are arranged in a one-dimensional array (arranged in an array) will be illustrated. In the present embodiment, the description of items that overlap those in the description of the first embodiment is omitted.
The present embodiment will be described with reference to
The horizontal direction corresponds to the longitudinal direction of the light emitting devices 401 in
The light emitting device 1601 will be further described in detail with reference to
The silicon circuit board 1703 is a drive circuit board in which a drive circuit that includes drive portions respectively corresponding to the lower electrodes 1700-1 to 1700-748 (described later) is formed in a manufacturing process. The drive circuit has a structure in which the drive circuit described in the first embodiment is configured to support a one-dimensional array light emitting devices, and there is no significant difference in the relevant part, so the description is omitted.
As shown in
As shown in
The width W of the lower electrodes 1700-1 to 1700-748 in the X direction in the present embodiment corresponds to the width of one pixel. A clearance d is a distance between the lower electrodes in the X direction. Since the lower electrodes 1700-1 to 1700-748 are formed with the clearance the distance d on the silicon circuit board 1703, the plurality of drive portions formed in the silicon circuit board 1703 are capable of respectively individually controlling the voltages of the lower electrodes 1700-1 to 1700-748. An organic material of the light emitting layer 1701 is filled in the clearance d, and the lower electrodes are partitioned by the organic material.
In the light emitting device 1601 according to the present embodiment, the width W of each of the lower electrodes 1700-1 to 1700-748 is set to a nominal dimension of 20.90 m, and the clearance d is set to a nominal dimension of 0.26 μm. In other words, the light emitting device 1601 according to the present embodiment includes one lower electrode 1700 for every 21.16 μm in the X direction. Since 21.16 μm is the size of one pixel in 1200 dpi, the width of the lower electrode 1700 in the X direction of each lower electrode is a size equivalent to one pixel corresponding to the output resolution of the image forming apparatus according to the present embodiment. A process rule in the light emitting device 1601 according to the present embodiment is about 0.2 μm and is high in precision, and it is possible to form a width of dl with a resolution of 0.26 μm.
The width of the lower electrodes 1700-1 to 1700-748 in the Y direction that is the rotation direction of the photoconductor drum is W. In other words, the lower electrodes 1700-1 to 1700-748 according to the present embodiment each have a shape of a square having side 20.90 μm, and the area of the lower electrode 1700 is 436.81 μm2. This occupies about 97.6% of the area of one pixel, that is, 447.7456 μm2. An organic luminescent material is less in the amount of light than an LED. In contrast, when the lower electrodes in a square shape are formed on the silicon circuit board 1703 with a reduced distance between the adjacent lower electrodes as described above, it is possible to ensure the light emitting area for obtaining the amount of light to such an extent that the potential of the photoconductor drum can be changed. It is desirable to ensure the lower electrode area that is 90% or more of the occupied area of one pixel. Therefore, it is desirable to form the width of one side of the lower electrode 1700 by about 20.07 μm or greater for the image forming apparatus with an output resolution of 1200 dpi, and it is desirable to form the width of one side of the lower electrode 1700 by about 10.04 μm or greater for the image forming apparatus with an output resolution of 2400 dpi.
On the other hand, an upper limit of the occupied area of the lower electrode 1700 should be set in accordance with the transmittance of the rod lens array and the upper electrode (described later) and, in the present embodiment, the upper limit is set to 110% of the occupied area of one pixel. When the occupied area of the lower electrode 1700 is designed to be greater than 110% of the occupied area of one pixel, the size of a pixel formed at the time of exposing a photoconductor drum with high sensitivity to light may significantly exceed the resolution, so the upper limit value of the occupied area of the lower electrode 1700 is set to 110%. Therefore, it is desirable to form the width of one side of the lower electrode 1700 by about 22.19 μm or less for the image forming apparatus with an output resolution of 1200 dpi, and it is desirable to form the width of one side of the lower electrode 1700 by about 11.10 μm or less for the image forming apparatus with an output resolution of 2400 dpi. In other words, the range of the occupied area of the lower electrode for the occupied area of one pixel is preferably higher than or equal to 90% and lower than or equal to 110%.
The shape of the lower electrode is not limited to a square shape and may be a shape, such as a polygonal shape more than a quadrilateral shape, a circular shape, and an elliptical shape, as long as light with a spot size corresponding to the output resolution of the image forming apparatus is emitted and the quality of an output image satisfies the design specifications of the image forming apparatus by that light.
Next, the light emitting layer 1701 will be described. The light emitting layer 1701 is formed so as to be laminated on the silicon circuit board 1703 on which the lower electrodes 1700-1 to 1700-748 are formed. In other words, in the area where the lower electrodes 1700-1 to 1700-748 are formed, the light emitting layer 1701 is formed on the lower electrodes 1700-1 to 1700-748 and formed on the silicon circuit board 1703 in the area where the lower electrodes 1700-1 to 1700-748 are not formed. In the present embodiment, in the light emitting device 1601, the light emitting layer 1701 is formed so as to bridge over all the lower electrodes 1700-1 to 1700-748; however, the embodiment is not limited thereto. For example, the light emitting layer 1701 may be formed so as to be laminated separately on each of the lower electrodes as in the case of the lower electrodes 1700-1 to 1700-748, or the lower electrodes 1700-1 to 1700-748 may be divided into a plurality of groups and one light emitting layer may be laminated on the lower electrodes that belong to the same group for each of the divided groups.
For example, an organic material may be used for the light emitting layer 1701. The light emitting layer 1701 that is an organic EL film is a lamination structure that includes functional layers, such as an electron transport layer, a hole transport layer, an electron injection layer, a hole injection layer, an electron block layer, and a hole block layer. Other than an organic material, an inorganic material may be used for the light emitting layer 1701. The upper electrode 1702 (positive electrode) is laminated on the light emitting layer 1701 (as a second electrode layer). The upper electrode 1702 is an electrode capable of transmitting light with the emission wavelength of the light emitting layer 1701. Therefore, the upper electrode 1702 according to the present embodiment adopts a material containing indium tin oxide (ITO) as a transparent electrode. An electrode made of indium tin oxide has a transmittance of 80% or higher to light in a visible light range, so the electrode is suitable as the electrode of an organic EL device.
The upper electrode 1702 is formed on the side across at least the light emitting layer 1701 from the lower electrodes 1700-1 to 1700-748. In other words, the light emitting layer 1701 is disposed in the Z direction between the upper electrode 1702 and the lower electrodes 1700-1 to 1700-748, and, when the lower electrodes 1700-1 to 1700-748 are projected onto the upper electrode 1702 in the Z direction, the region in which the lower electrodes 1700-1 to 1700-748 are formed fits into the region in which the upper electrode 1702 is formed. A transparent electrode does not need to be laminated all over the light emitting layer 1701; however, in order to emit light produced in the light emitting layer 1701 to be efficiently emitted to outside the light emitting device 1601, the occupied area of the upper electrode 1702 to the occupied area of one pixel is preferably higher than or equal to 100% and more preferably higher than or equal to 120%. The upper limit value of the occupied area of the upper electrode 1702 is optionally designed by the areas of the silicon circuit board 1703 and the light emitting layer 1701. Wiring lines may be disposed in an area other than the area through which light is transmitted in the upper electrode 1702.
The upper electrode 1702 according to the present embodiment is a positive electrode provided in common for the lower electrodes 1700-1 to 1700-748; however, the upper electrode 1702 may be provided individually for each of the lower electrodes 1700-1 to 1700-748 or one upper electrode may be provided for each set of lower electrodes.
The drive circuit controls the potential of each of the lower electrodes 1700-1 to 1700-748 in accordance with image data in order to generate a potential difference between the upper electrode 1702 and selected lower electrodes of the lower electrodes 1700-1 to 1700-748.
The upper electrode 1702 is formed on the side across at least the light emitting layer 1701 from the lower electrodes 1700-1 to 1700-748. In other words, the light emitting layer 1701 is disposed in the Z direction between the upper electrode 1702 and the lower electrodes 1700-1 to 1700-748, and, when the lower electrodes 1700-1 to 1700-748 are projected onto the upper electrode 1702 in the Z direction, the region in which the lower electrodes 1700-1 to 1700-748 are formed fits into the region in which the upper electrode 1702 is formed. A transparent electrode does not need to be laminated all over the light emitting layer 1701; however, in order to emit light produced in the light emitting layer 1701 to be efficiently emitted to outside the light emitting device 1601, the occupied area of the upper electrode 1702 to the occupied area of one pixel is preferably higher than or equal to 100% and more preferably higher than or equal to 120%. The upper limit value of the occupied area of the upper electrode 1702 is optionally designed by the areas of the silicon circuit board 1703 and the light emitting layer 1701. Wiring lines may be disposed in an area other than the area through which light is transmitted in the upper electrode 1702.
The upper electrode 1702 according to the present embodiment is a positive electrode provided in common for the lower electrodes 1700-1 to 1700-748; however, the upper electrode 1702 may be provided individually for each of the lower electrodes 1700-1 to 1700-748 or one upper electrode may be provided for each set of lower electrodes.
The drive circuit controls the potential of each of the lower electrodes 1700-1 to 1700-748 in accordance with image data in order to generate a potential difference between the upper electrode 1702 and selected lower electrodes of the lower electrodes 1700-1 to 1700-748.
When a transparent electrode made of indium tin oxide or the like is used as the upper electrode 1702, an aperture ratio representing the light transmission ratio of the electrode can be made substantially equivalent to the transmittance of the upper electrode 1702. In other words, since there is substantially no area, other than the upper electrode 1702, that attenuates light or that blocks light, light produced from the light emitting layer 1701 becomes emission light without being attenuated or blocked as much as possible.
As described above, when the lower electrodes 1700-1 to 1700-748 are formed by high-precision Si integrated circuit processing technology, the lower electrodes 1700-1 to 1700-748 can be disposed in high density. Therefore, almost all the area of light emitting portions (here, the sum of the area of the lower electrodes 1700-1 to 1700-748 and the area of the region between the mutually adjacent lower electrodes) can be allocated to the lower electrodes 1700-1 to 1700-748. In other words, the exposure head has a high efficiency of use of the light emission region per unit area.
When a luminescent material susceptible to moisture, such as an organic EL layer and an inorganic EL layer, is used for the light emitting layer 1701, it is desirable to seal against entry of moisture into the light emitting portions. As a sealing method, for example, a thin-film alone or a laminated sealing film made of a silicon oxide, a silicon nitride, and an aluminum oxide, is formed. A method excellent in performance of coating a structure, such as a step, is preferable as a method of forming a sealing film, and, for example, an atomic layer deposition method (ALD method) or the like may be used. The materials, configurations, formation methods, and the like of a sealing film are one examples, and the embodiment is not limited to the above-described examples. Suitable ones may be selected as needed.
According to the present embodiment, it is possible to suggest an exposure head capable of being driven at high speed with higher light output.
Embodiments of the present invention are not limited to the above-described embodiments. Various changes or modifications are applicable without departing from the spirit and scope of the present invention. Therefore, the following claims are attached to show the scope of the present invention.
It is possible to provide an image forming apparatus that exposes a photoconductor drum to light by using a top emission light emitting device.
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
Number | Date | Country | Kind |
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2019-153102 | Aug 2019 | JP | national |
2019-153103 | Aug 2019 | JP | national |
Number | Date | Country | |
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Parent | PCT/JP2020/028778 | Jul 2020 | US |
Child | 17677746 | US |