Claims
- 1. An imaging method comprising:
- providing an imaging member comprising a layer of softenable material containing agglomerable migration marking material, and
- imagewise exposing said member to an image pattern of electromagnetic radiation of sufficient energy to cause the agglomerable migration marking material in the exposed areas to imagewise migrate at least in depth in the softenable layer and simultaneously agglomerate, whereby the effective cross-sectional area of the marking material in the imagewise exposed area is reduced.
- 2. The method of claim 1 wherein the layer of softenable material contacts a supporting substrate.
- 3. The method of claim 2 wherein the agglomerable migration marking material is arranged in a fracturable layer contiguous the surface of layer of softenable material spaced apart from the substrate.
- 4. The method of claim 3 wherein said fracturable layer is of a thickness in the range between about 0.1 and about 2.0 microns.
- 5. The method of claim 3 wherein said fracturable layer of agglomerable migration marking material comprises particles of agglomerable migration marking material of average particle size not greater than about 1 micron.
- 6. The method of claim 5 wherein said particles of agglomerable migration marking material are of average size not greater than about 0.5 microns.
- 7. The method of claim 5 wherein said particles of agglomerable migration marking material have average particle-to-particle spacings of not greater than about 1/2 micron.
- 8. The method of claim 3 wherein the layer of softenable material is of a thickness in the range between about 1/2 and about 16 microns.
- 9. The method of claim 8 wherein the layer of softenable material is of a thickness in the range of between about 1 and about 4 microns.
- 10. The method of claim 3 wherein the agglomerable migration marking material comprises a material selected from the group consisting of: selenium, tellurium, arsenic, zinc, sulfur, gallium, cobalt tricarbonyl, and mixtures thereof.
- 11. The method of claim 5 wherein said agglomerable migration marking material comprises amorphous selenium.
- 12. The method of claim 2 wherein said agglomerable migration marking material comprises particulate material which is dispersed throughout the layer of softenable material.
- 13. The method of claim 12 wherein said particulate material is of average particle size not greater than about 1 micron.
- 14. The method of claim 12 wherein said particulate material is of average particle size not greater than about 0.5 microns.
- 15. The method of claim 12 wherein said particulate material has average particle-to-particle spacings not greater than about 1/2 micron.
- 16. The method of claim 12 wherein said layer of softenable material is of a thickness in the range between 1/2 and about 16 microns.
- 17. The method of claim 16 wherein said layer of softenable material is of a thickness in the range of between 1 and about 4 microns.
- 18. The method of claim 12 wherein said agglomerable migration marking material comprises a material selected from the group consisting of: selenium, tellurium, arsenic, zinc, sulfur, gallium, cobalt tricarbonyl, and mixtures thereof.
- 19. The method of claim 12 wherein said agglomerable migration marking material comprises amorphous selenium.
- 20. The method of claim 1 wherein the step of imagewise exposing said member comprises exposing imagewise portions of said member to electromagnetic radiation of energy in the range between about 0.001 and about 0.3 joules/cm.sup.2.
- 21. The method of claim 20 wherein said electromagnetic radiation is of wavelength in the range between about 2,000 A and about 26,000 A.
- 22. The method of claim 20 wherein the imagewise exposure is carried out for a time period in the range between about 10 microseconds and about 10.sup.5 microseconds.
- 23. The method of claim 20 wherein the source of said electromagnetic radiation is a Xenon gas discharge lamp.
- 24. The method of claim 20 wherein the source of said electromagnetic radiation is a laser.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of copending U.S. patent application Ser. No. 755,163, filed Aug. 26, 1968, now abandoned.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
3032414 |
James et al. |
May 1962 |
|
3384565 |
Tulagin et al. |
May 1968 |
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3510419 |
Carreira et al. |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
755163 |
Aug 1968 |
|