This application relates generally to apparatuses and methods for providing tumor treating fields and, in particular, for apparatuses and methods for implanting electrodes within a patient for providing tumor treating fields.
Tumor Treating Fields, or TTFields, are low intensity (e.g., 1-6 V/cm) alternating electrical fields within an intermediate frequency range (e.g. 50-500 kHz). This heretofore non-invasive treatment targets solid tumors and is described in U.S. Pat. No. 7,565,205, which is incorporated herein by reference in its entirety. TTFields disrupt cell division through physical interactions with key molecules during mitosis. TTFields therapy is an approved mono-treatment for recurrent glioblastoma, and an approved combination therapy with chemotherapy for newly diagnosed patients. Conventionally, these electrical fields are induced non-invasively by transducer arrays (i.e., arrays of electrodes) placed directly on the patient's scalp. TTFields also appear to be beneficial for treating numerous tumor cell types in many other parts of the body.
Described herein, in various aspects, is an implantable apparatus for providing tumor treating fields (TTFields). The implantable apparatus can comprise a support structure and at least one electrode array (optionally, a plurality of electrode arrays) disposed on the support structure. Each electrode array can comprise a plurality of electrodes. There is no limit to the number of electrodes, their configuration, or the activation patterns that can be used to shape the electric field to cover the tumorous region with sufficient strength and changes of direction that are required to kill tumor cells.
According to at least one aspect, the implantable apparatus can be inserted into a location in a patient, the location being proximate to a target site. TTFields can then be generated through the target site with the implantable apparatus.
According to at least one aspect, the implantable apparatus can be a first TTField stimulating apparatus, and a second TTField stimulating apparatus can be positioned so that the target site is disposed between the first TTField stimulating apparatus and the second TTField stimulating apparatus. TTFields can be generated between the first TTField stimulating apparatus and the second TTField stimulating apparatus.
According to at least one aspect, TTFields can be generated through the target site with the implantable apparatus by generating electric fields between at least two electrodes of the same electrode array.
According to at least one aspect, TTFields can be generated through the target site with the implantable apparatus by generating electric fields between at least two electrodes of two different electrode arrays of the plurality of electrode arrays.
Additional advantages of the invention will be set forth in part in the description that follows, and in part will be obvious from the description, or may be learned by practice of the invention. The advantages of the invention will be realized and attained by means of the elements and combinations particularly pointed out in the appended claims. It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention, as claimed.
These and other features of the preferred embodiments of the invention will become more apparent in the detailed description in which reference is made to the appended drawings wherein:
The disclosed system and method may be understood more readily by reference to the following detailed description of particular embodiments and the examples included therein and to the Figures and their previous and following description.
It is to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of the present invention which will be limited only by the appended claims.
It must be noted that as used herein and in the appended claims, the singular forms “a,” “an,” and “the” include plural references unless the context clearly dictates otherwise. Thus, for example, reference to “an electrode” includes one or more of such electrodes, and so forth.
“Optional” or “optionally” means that the subsequently described event, circumstance, or material may or may not occur or be present, and that the description includes instances where the event, circumstance, or material occurs or is present and instances where it does not occur or is not present.
Ranges may be expressed herein as from “about” one particular value, and/or to “about” another particular value. When such a range is expressed, also specifically contemplated and considered disclosed is the range from the one particular value and/or to the other particular value unless the context specifically indicates otherwise. Similarly, when values are expressed as approximations, by use of the antecedent “about,” it will be understood that the particular value forms another, specifically contemplated embodiment that should be considered disclosed unless the context specifically indicates otherwise. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint, and independently of the other endpoint unless the context specifically indicates otherwise. Finally, it should be understood that all of the individual values and sub-ranges of values contained within an explicitly disclosed range are also specifically contemplated and should be considered disclosed unless the context specifically indicates otherwise. The foregoing applies regardless of whether in particular cases some or all of these embodiments are explicitly disclosed.
Optionally, in some aspects, when values are approximated by use of the antecedents “about,” “substantially,” “approximately,” or “generally,” it is contemplated that values within up to 15%, up to 10%, up to 5%, or up to 1% (above or below) of the particularly stated value or characteristic can be included within the scope of those aspects.
Unless defined otherwise, all technical and scientific terms used herein have the same meanings as commonly understood by one of skill in the art to which the disclosed apparatus, system, and method belong.
As used herein, the term “patient” refers to a human or animal subject who is in need of treatment using the disclosed systems and devices.
As used herein, the term “electrode” refers to any structure that permits generation of an electric potential, electric current, or electrical field as further disclosed herein. Optionally, an electrode can comprise a transducer. Optionally, an electrode can comprise a non-insulated portion of a conductive element.
Throughout the description and claims of this specification, the word “comprise” and variations of the word, such as “comprising” and “comprises,” means “including but not limited to,” and is not intended to exclude, for example, other additives, components, integers or steps. In particular, in methods stated as comprising one or more steps or operations it is specifically contemplated that each step comprises what is listed (unless that step includes a limiting term such as “consisting of”), meaning that each step is not intended to exclude, for example, other additives, components, integers or steps that are not listed in the step.
Unless otherwise expressly stated, it is in no way intended that any method or aspect set forth herein be construed as requiring that its steps be performed in a specific order. Accordingly, where a method claim does not specifically state in the claims or description that the steps are to be limited to a specific order, it is no way intended that an order be inferred, in any respect. This holds for any possible non-express basis for interpretation, including matters of logic with respect to arrangement of steps or operational flow, plain meaning derived from grammatical organization or punctuation, or the number or type of embodiments described in the specification.
While the present invention is capable of being embodied in various forms, the description below of several embodiments is made with the understanding that the present disclosure is to be considered as an exemplification of the invention, and is not intended to limit the invention to the specific embodiments illustrated. Headings are provided for convenience only and are not to be construed to limit the invention in any manner. Embodiments illustrated under any heading or in any portion of the disclosure may be combined with embodiments illustrated under the same or any other heading or other portion of the disclosure.
Any combination of the elements described herein in all possible variations thereof is encompassed by the invention unless otherwise indicated herein or otherwise clearly contradicted by context.
The electrical field generator 12 may comprise a processor 16 in communication with a signal generator 18. The electrical field generator 12 may comprise control software 20 configured for controlling the performance of the processor 16 and the signal generator 18.
The signal generator 18 may generate one or more electric signals in the shape of waveforms or trains of pulses. The signal generator 18 may be configured to generate an alternating voltage waveform at frequencies in the range from about 50 kHz to about 500 kHz (preferably from about 100 kHz to about 300 kHz) (e.g., the TTFields). The voltages are such that the electrical field intensity in tissue to be treated is typically in the range of about 0.1 V/cm to about 10 V/cm.
One or more outputs 24 of the electrical field generator 12 may be coupled to one or more conductive leads 22 that are attached at one end thereof to the signal generator 18. The opposite ends of the conductive leads 22 are connected to the one or more electrode arrays 104 that are activated by the electric signals (e.g., waveforms). The conductive leads 22 may comprise standard isolated conductors with a flexible metal shield and may be grounded to prevent the spread of the electrical field generated by the conductive leads 22. The one or more outputs 24 may be operated sequentially. Output parameters of the signal generator 18 may comprise, for example, an intensity of the field, a frequency of the waves (e.g., treatment frequency), and a maximum allowable temperature of the one or more electrode arrays 104. The output parameters may be set and/or determined by the control software 20 in conjunction with the processor 16. After determining a desired (e.g., optimal) treatment frequency, the control software 20 may cause the processor 16 to send a control signal to the signal generator 18 that causes the signal generator 18 to output the desired treatment frequency to the one or more electrode arrays 104. It is further contemplated that the control software 20 can cause the processor 16 to shift or change the direction of TTFields or otherwise adjust the properties of TTFields in the manner further disclosed herein.
The one or more electrode arrays 104 may be configured in a variety of shapes and positions so as to generate an electrical field of the desired configuration, direction and intensity at a target volume so as to focus treatment. Optionally, the one or more electrode arrays 104 may be configured to deliver two electric fields in two different directions, or even three electric fields in three different directions, through the volume of interest. Optionally, the one or more electrode arrays 104 may be configured to deliver two perpendicular field directions, or even three orthogonal field directions, through the volume of interest.
Further disclosure directed to use of such electrotherapeutic systems is provided in U.S. Patent Application Publication No. 2021/0162228 to Urman et al., published Jun. 3, 2021, the entire disclosure of which is hereby incorporated by reference herein.
Although transducers are conventionally positioned externally on the patient, the present disclosure recognizes that there are benefits to positioning electrodes within the body of the patient to provide localized electric fields at the site of the tumor.
In use, it is contemplated that changing the direction at which the electric field generated by TTFields is oriented with regard to cellular membranes and molecules can provide improved tumor-killing efficacy. As more changes of direction are applied, the variance of field strength as seen by the target structures will decrease, and fewer structures will be subjected to weak, sub-efficacy threshold field strength.
TTFields are FDA-approved for treating brain cancer. (e.g., glioblastoma). However, delivering TTFields to target regions in the brain via trans-dermal arrays can be particularly challenging, primarily due to high resistivity of the skull. Further, preferred locations for the arrays on the skull may be partially obstructed by the ears. The present invention provides a location for one or more array within the skull, negating the issue of high resistivity of the skull as well as avoiding obstructions on the skin surface. Because resection (removal) of the tumor often occurs prior to treatment with TTFields, the current apparatus can be inserted into the void space left from resection, and in some embodiments, the apparatus may be inflated to fill the void space. The latter approach has the additional benefit of placing the one or more array in close proximity to stray cancer cells or clusters that may have been missed during resection, which advantage extends to cancers in other parts of the human (mammalian) body.
Disclosed herein, in various aspects and with reference to
The support structure 102 can optionally be inflatable from a collapsed configuration to an expanded configuration. Thus, it is contemplated that the support structure 102 can function as a balloon that can be selectively inflated or deflated to adjust positioning of electrode arrays 104 within or relative to the body of a subject. For example, the support structure 102 can define an interior 103 that can be in fluid communication with a conduit 107. The conduit 107 can be configured to receive fluid therethrough for inflating the support structure 102. Embodiments of said fluid may be desirable for the fluid's biological properties, such as being anti-bacterial, tumoricidal, biologically compatible, or inert. Embodiments of the fluid can also be desirable for the fluid's thermodynamic properties, such as heat carrying or heat absorbing capacity. Embodiments of the fluid can also be desirable for the fluid's electrical properties, such as ability to reflect, shield, transmit, or guide an electric field, which can allow a stronger and more efficacious electric field to be generated in the tumor vicinity. The fluid may be conductive, or it may be non-conductive. Accordingly, the fluid can be selected based on its desired biological properties, thermodynamic properties, and/or electrical properties. In this way, the support structure 102 can be configured to be inflated from a collapsed configuration to an expanded configuration. In some aspects, the support structure 102, when in the expanded configuration, can be spherical, ovoid, cylindrical, oblong, elongate, flat, curved, amorphous, or any suitable shape. The support structure 102 can optionally comprise at least one flexible wall that can be configured to expand from fluid pressure within the interior 103 of the support structure 102.
In exemplary aspects, and with reference to
In exemplary aspects, and as further described above, the plurality of electrode arrays 104 can comprise a first electrode array 104a disposed on the first portion 120 of the support structure 102 and a second electrode array 104b disposed on the second portion 122 of the support structure. In these aspects, in the expanded configuration, the first electrode array 104a and the second electrode array 104b can be aligned in a first direction. In exemplary aspects, the first direction can be coincident with a first axis 110 that extends between respective centroids 125 of the first and second electrode arrays 104a, 104b. As used herein, the term “centroid” can refer to the geometric center of the area occupied by a given object or structure.
In further optional aspects, and as further described above, the plurality of electrode arrays 104 can further comprise a third electrode array 104c disposed on the third portion 124 of the support structure 102 and a fourth electrode array 104d disposed on the fourth portion 126 of the support structure. In the expanded configuration, the third electrode array 104c and the fourth electrode array 104d can be aligned in a second direction that is different than the first direction. In exemplary aspects, the second direction can be coincident with a second axis 112 that extends between respective centroids 125 of the third and fourth electrode arrays 104c, 104d. Optionally, in these aspects, it is contemplated that the first and second axes 110, 112 do not intersect. In further aspects, it is contemplated that the first and second axes 110, 112 can intersect. Optionally, in these aspects, it is contemplated that the second axis 112 can be orthogonal (e.g., perpendicular) or within 1 degree, 5 degrees, 10 degrees, or 15 degrees of being orthogonal or perpendicular to the first axis 110.
In still further optional aspects, and as further described above, the plurality of electrode arrays 104 can comprise a fifth electrode array 104e disposed on the fifth portion 128 of the support structure 102 and a sixth electrode array 104f disposed on the sixth portion of the support structure. In the expanded configuration, the fifth electrode array 104e and the sixth electrode array 104f can be aligned in a third direction that is different than the first and second directions. In exemplary aspects, the second direction can be coincident with a third axis 114 that extends between respective centroids 125 of the fifth and sixth electrode arrays 104e, 104f (and extends into and out of the page in
In some optional aspects, in the expanded configuration, it is contemplated that the first axis 110, the second axis 112, and the third axis 114 can each pass through a centroid (e.g., three-dimensional center point) of the support structure 102. In further aspects, it is contemplated that at least two (optionally, only two) of the first, second, and third axes 110, 112, 114 can pass through the centroid of the support structure 102. In still further aspects, it is contemplated that at least one (optionally, only one) of the first, second, and third axes 110, 112, 114 can pass through the centroid of the support structure 102. In still further aspects, it is contemplated that none of the first, second, and third axes 110, 112, 114 passes through the centroid of the support structure 102. More generally, it is contemplated that each electrode array 104 of the plurality of electrode arrays can be aligned with another electrode array of the plurality of electrode arrays along an axis that either passes through the centroid of the support structure 102 or has a selected spacing from the centroid of the support structure to achieve a particular distribution or orientation of TTFields. For example, in some exemplary aspects, a plurality of electrode arrays 104 can be concentrated on one side of the support structure (e.g., one hemisphere of an ovoid support structure) to focus TTFields in a particular way.
As used herein to describe portions of the support structure 102, the term “portion” does not require a particular structure. Exemplary “portions” of the support structure can have planar profiles, arcuate profiles, variable profiles, or combinations thereof. For example, as shown in
The electrode arrays 104 can optionally comprise a patch 140 with the electrodes 106 disposed thereon. The patch can optionally comprise a flexible and resilient material. It is contemplated that the electrical connections with the electrodes can remain intact as the patch expands, contracts, flexes, or otherwise changes shape. In one exemplary embodiment, the patch has electrodes with electrical connections that do not break as the material of the patch expands, contracts, or changes shape. One exemplary method of forming flexible and expandable conductive materials for the patch includes supersonic cluster beam implantation (SCBI) provided by WISE Srl (Milan, Italy). In further aspects, flexible conductors can be formed with ends separated by a winding/undulating/serpentine path and embedded in a flexible material, which can define a portion of or be incorporated into the patch structure. In this way, the conductors can have an expandable length between said ends and can allow for stretching of the flexible material of the patch. In exemplary aspects, one or more of the patches 140 can be provided as a WISE Cortical Strip (WCS) (WISE Srl, Milan, Italy) or similar structure in which electrodes are embedded within a soft, flexible film (for example, a thin film of silicone).
In further aspects, it is contemplated that the electrodes 106 can be disposed directly onto the support structure 102. Although the electrodes are described herein as arranged in a plurality of electrode arrays, no physical association between electrodes of a given electrode array need be made. For example, it is contemplated that the support structure 102 can have a plurality of independently addressable electrodes disposed thereon, and individual electrodes associated with a particular region on the support structure can be understood to be associated with a specific array. In various aspects, each electrode can couple to a respective lead so that each electrode can be selectively and independently polarized.
The electrode arrays can optionally comprise an odd number of electrodes 106. For example, in some aspects, the electrode array can comprise three, five, seven, nine, or more electrodes. In at least one aspect, one or more (optionally, all) of the electrode arrays can comprise a central electrode 106a and a plurality of circumferential electrodes 106b spaced around the central electrode. In various aspects, each electrode array can optionally comprise the same number of electrodes as the other electrode arrays of the implantable apparatus 100. In other aspects, at least one electrode array can have a different number of electrodes than at least one other electrode array of the implantable apparatus 100. In still other aspects, each electrode array of the implantable apparatus 100 can have a different number of electrodes. In further optional aspects, each of the electrode arrays can comprise an even number of electrodes (e.g., 2, 4, 6, 8, or more electrodes).
The implantable apparatus 100, as disclosed herein, can be used to treat tumors in various tissues. In some aspects, for example, the implantable apparatuses 100 can be particularly beneficial in treating brain cancer (e.g., glioblastoma). For example, delivering TTFields to target regions in the brain via trans-dermal arrays can be particularly challenging, primarily due to high resistivity of the skull. Further, TTFields are FDA-approved for treating brain cancer. Accordingly, in some aspects, the target site for providing TTFields can be within the brain of a patient. In further aspects, the target site can be within the torso of a patient. Typically, there is an anatomically well-defined mass comprising contiguous cancer cells, or a shell of cancer cells, surrounding a ‘necrotic’ region wherein the cells have died due to being starved of nutrients. Often, such a tumor is surgically removed (‘resected’) and filled with cerebrospinal fluid, which is electrically-conductive and significantly affects an electric field imposed on the region. Typically, a tumor or resection cavity is surrounded by an anatomically undefined or loosely-defined region containing stray cancer cells, since the extent of stray cancer cells in the vicinity of the tumor is dependent on the tumor cell type, and the highly individualized history, anatomy, immune system, etc. of each patient. This region containing stray, non-contiguous cancer cells is referred to herein as a “peritumoral region”. Optionally, the target site can comprise a tumor and, in some aspects, a peritumoral region surrounding the tumor. In further aspects, the solid portion of the tumor can be resected as much as possible dependent on surgical access, avoiding damaging tissue, etc., and the peritumoral region can be the target site. In cases in which an inner portion (e.g., a necrotic core) of a tumor is resected and an outer portion of tumor remains, the target site can comprise the outer portion of tumor. In further aspects in which an entirety of the tumor is resected, the peritumoral region can be the target site.
It is contemplated that change in direction of TTFields can advantageously increase efficacy of treatment. In some aspects, TTFields can be provided in at least two orthogonal directions (or, optionally, three orthogonal directions, or multiple directions that can be orthogonal or skew), thereby sweeping the maximum field strength throughout the tumor and peritumoral target region relative to electrically reactive cellular membranes and molecules. Examples of cellular structures and properties affected by electric fields, and which in some cases, magnify or concentrate the field strength thereby increasing its tumor-killing efficacy, are: contact points between contiguous cells, the shape of the cell (notably, ellipsoid vs. spherical, since ellipsoid shape produces inhomogeneous electric fields, which therefore are concentrated in some regions), the thickness of the cell membrane, the thickness of the inner and outer mitochondrial cell membranes and the separation between them, the time constant and electrically-reactive components of cell or mitochondrial membrane ion channels, the cellular furrow during mitosis, the orientation of microtubules, actin filaments, and septin polymers during mitosis, the orientation of other dielectrophoretic, polarizable cellular molecules or organelles, and the orientation of polarizable nanoparticles introduced into the tissue or cell. Examples of sub-cellular structures affected by electric field direction are microtubules, which conduct electric current maximally when aligned with the field, septin (which at different points in the cell cycle is either aligned with or orthogonal to the cell axis), various organelles whose shape and properties make them dielectric (and therefore susceptible to being driven into the cell furrow during mitosis, causing cell blebbing or other deleterious effects), and tubulin dimers, whose orientation relative to the ‘plus’ end of microtubules during polymerization can be altered by the field and thus polymerization is stalled. Optionally, the TTFields can be generated cyclically, optionally, changing the direction for each cycle. In some aspects, the change of direction of TTFields can be provided at at least 2 Hz, at least 15 Hz, at least 20 Hz, or at least 50 Hz (e.g., from about 15 Hz to about 50 Hz, from about 20 Hz to about 50 Hz, or from about 2 Hz to about 50 Hz), as described in U.S. Pa. No. 7,917,227 to Yoram Palti, which is incorporated herein by reference in its entirety. It is contemplated that the embodiments disclosed herein can advantageously be able to change the direction of electric field generated through target areas in both a rapid and accurate manner. For example, the configuration of electrodes can provide flexibility in generating the electric fields as a clinician desires. Accordingly, the electric fields can be configured to treat tumor cells that are positioned in various (e.g., random) orientations.
In some aspects, an implantable apparatus 100 can be inserted into a location in a patient, which location is proximate a target site. For example, in some optional aspects, the implantable apparatus 100 can be positioned so that the support structure 102 is spaced from 0.5-10 cm from a target site, such as from 0.5-5 cm, or from 0.5-3 cm, or from 1-10 cm, or from 1-5 cm, or from 1-3 cm from a target site. In further aspects, the implantable apparatus 100 can be positioned within a peritumoral region (e.g., within a tumor resection cavity), and the peritumoral region can be the target site. Accordingly, in some aspects, at least a portion of a tumor can be resected (e.g., optionally, a necrotic core of the tumor or an entirety of the tumor can be removed), leaving a resection cavity, and the implantable apparatus 100 can then be positioned within the resection cavity. It is contemplated that implanting the implantable apparatus 100 in the resection cavity from a necrotic core resection can preserve a maximum amount of healthy brain tissue affected by a resection procedure. The implantable apparatus 100 can then be used to generate TTFields through the target site.
In some aspects, TTFields can be generated between at least two electrodes of the same electrode array 104. Optionally, referring to
Further, the precise nature, composition, and geometry of tissue types (e.g. gray matter, white matter, cerebrospinal-filled ventricles, and the tumor cells themselves, etc.) in the target region may not be known. In such cases, purely random activation of electrode patterns may produce optimal field strength throughout the target region.
In further aspects, referring to
In further aspects, TTFields can be generated through the target site by generating electric fields between at least two electrodes of two different electrode arrays of the plurality of electrode arrays. Accordingly, two different electrode arrays can function as a first stimulating electrode array and a second stimulating electrode array. In various aspects, the first and second stimulating electrode arrays can be adjacent (e.g., positioned on adjoining or proximate portions of the support structure 102). In further aspects, the first and second stimulating electrode arrays can be on opposing sides or portions of the support structure 102. It is further contemplated that activation of the first and second stimulating electrode arrays can be alternated in order to generate the TTFields in varying directions. For example, referring to
Optionally, referring to
In further optional aspects, referring to
In further optional aspects, referring to
In yet further aspects, it is contemplated that the implantable device 100 can be configured to thermally kill tumor cells by deliberately exceeding damage limits. In this way, thermal ablation and TTFields can be provided via a single apparatus, minimizing damage from requiring implantation of additional equipment. Optionally, the TTFields can be provided simultaneously with thermal ablation. In still further aspects, the implantable device can comprise an outlet that is configured to deliver a chemotherapy agent. Optionally, the device can be used to simultaneously provide chemotherapy and TTFields. The balloon material can enable the chemotherapy agent to perfuse the peritumoral region at a controlled rate while being replenishable. In some aspects, the TTFields can be used to modulate the perfusion rate.
In use, if the target is known to be in between two patch arrays, TTFields can be applied focally in the target region. More typically, the target will be less well-defined, e.g. stray cancer cells, and the field will be swept in orthogonal directions throughout the entire peritumoral region. That protocol can be envisioned by rotating the plot in a circle around the y-axis (note the axes in the lower left corner of the plots in
Thus, it is contemplated that generating a first polarity with all of the electrodes of a first array and a second, opposite polarity for all of the electrodes of a second array can be desirable to maximize the area of field coverage, which can be beneficial when precise locations of tumor cells are not known. It is further contemplated that generating electric fields between electrodes on the same array can be advantageous when the target site is precisely known. For example, referring to
Optionally, referring to
In view of the described products, systems, and methods and variations thereof, herein below are described certain more particularly described aspects of the invention. These particularly recited aspects should not however be interpreted to have any limiting effect on any different claims containing different or more general teachings described herein, or that the “particular” aspects are somehow limited in some way other than the inherent meanings of the language literally used therein.
Aspect 1: An implantable apparatus for providing tumor treating fields (TTFields), the implantable apparatus comprising: a support structure; and at least one electrode array (optionally, a plurality of electrode arrays) disposed on the support structure, wherein each electrode array comprises a plurality of electrodes.
Aspect 2: The implantable apparatus of aspect 1, wherein the support structure is inflatable from a collapsed configuration to an expanded configuration.
Aspect 3: The implantable apparatus of aspect 2, wherein the support structure of the implantable apparatus defines an interior, the implantable apparatus further comprising a conduit in fluid communication with the interior of the support structure and configured to receive fluid therethrough to inflate the support structure.
Aspect 4: The implantable apparatus of any one of the preceding aspects, further comprising a plurality of leads, wherein a respective lead of the plurality of leads is coupled to each electrode so that each electrode of the plurality of electrodes of each electrode array is configured to receive charge independent of each other electrode of the plurality of electrodes of each electrode array.
Aspect 5: The implantable apparatus of any one of the preceding aspects, wherein each electrode array of the plurality of electrode arrays comprises a patch on which the plurality of electrodes of the electrode array are distributed.
Aspect 6: The implantable apparatus of any one of aspects 2-5, wherein in the expanded configuration, the support structure has a first portion and an opposing second portion, wherein the plurality of electrode arrays comprises a first electrode array disposed on the first portion of the support structure and a second electrode array disposed on the second portion of the support structure, and wherein the first electrode array and the second electrode array are spaced apart along a first axis.
Aspect 7: The implantable apparatus of aspect 6, wherein in the expanded configuration, the support structure has a third portion and an opposing fourth portion, wherein the plurality of electrode arrays comprises a third electrode array disposed on the third portion of the support structure and a fourth electrode array disposed on the fourth portion of the support structure, and wherein the third electrode array and the fourth electrode array are spaced apart along a second axis that is perpendicular to the first axis.
Aspect 8: The implantable apparatus of aspect 7, wherein in the expanded configuration, the support structure has a fifth portion and an opposing sixth portion, wherein the plurality of electrode arrays comprises a fifth electrode array disposed on the fifth portion of the support structure and a sixth electrode array disposed on the sixth portion of the support structure, and wherein the fifth electrode array and the sixth electrode array are spaced apart along a third axis that is perpendicular to each of the first and second axes.
Aspect 9: The implantable apparatus of any one of the preceding aspects, wherein the support structure is substantially spherical or ovoid.
Aspect 10: The implantable apparatus of any one of the preceding aspects, wherein each electrode array of the plurality of electrode arrays comprises an odd number of electrodes.
Aspect 11: The implantable apparatus of aspect 10, wherein each electrode array of the plurality of electrode arrays comprises a central electrode and a plurality of circumferential electrodes spaced around the central electrode.
Aspect 12: The implantable apparatus of any one of the preceding aspects, wherein at least one electrode array of the plurality of electrode arrays comprises a central electrode and a plurality of circumferential electrodes spaced around the central electrode.
Aspect 13: A method comprising: inserting the implantable apparatus of any one of aspects 1-12 into a location in a patient, the location being proximate to a target site; and generating TTFields through the target site with the implantable apparatus.
Aspect 14: The method of aspect 13, wherein the implantable apparatus is a first TTField stimulating apparatus, the method further comprising: positioning a second TTField stimulating apparatus so that the target site is disposed between the first TTField stimulating apparatus and the second TTField stimulating apparatus, wherein generating TTFields through the target site with the implantable apparatus comprises generating TTFields between the first TTField stimulating apparatus and the second TTField stimulating apparatus.
Aspect 15: The method of aspect 14, wherein the second TTField stimulating apparatus is a transcranial apparatus.
Aspect 15A: The method of aspect 14, wherein the second TTField stimulating apparatus is positioned on an exterior of the patient's body.
Aspect 16: The method of aspect 14, wherein the second TTField stimulating apparatus comprises an implantable apparatus as in any one of claims 1-10.
Aspect 17: The method aspect 13, wherein generating TTFields through the target site with the implantable apparatus comprises generating electric fields between at least two electrodes of the same electrode array.
Aspect 18: The method of aspect 17, wherein the implantable apparatus is the implantable apparatus of aspect 11 or aspect 12, wherein generating TTFields through the target site with the implantable apparatus comprises sequentially providing an electric potential between the central electrode and each adjacent circumferential electrode of at least one electrode array of the plurality of electrode arrays.
Aspect 19: The method of aspect 17, wherein the implantable apparatus is the implantable apparatus of aspect 11 or aspect 12, wherein generating TTFields through the target site with the implantable apparatus comprises sequentially providing an electric potential between the central electrode and non-adjacent circumferential electrodes at least one electrode array of the plurality of electrode arrays.
Aspect 20: The method of aspect 17, wherein the implantable apparatus is the implantable apparatus of aspect 11 or aspect 12, wherein the generating TTFields through the target site with the implantable apparatus comprises sequentially providing an electric potential between pairs of circumferential electrodes on opposing sides of the central electrode of at least one electrode array of the plurality of electrode arrays.
Aspect 21: The method of aspect 20, wherein sequential pairs of circumferentially spaced electrodes comprise adjacent anodes and cathodes.
Aspect 22: The method of aspect 20, wherein sequential pairs of circumferentially spaced electrodes comprise non-adjacent anodes and cathodes.
Aspect 23: The method aspect 13, wherein the implantable apparatus is an implantable apparatus as in any one of aspects 1-12, wherein generating TTFields through the target site with the implantable apparatus comprises generating electric fields between at least two electrodes of two different electrode arrays of the plurality of electrode arrays, wherein the two different electrode arrays comprise a first stimulating electrode array and a second stimulating electrode array.
Aspect 24: The method of aspect 23, wherein all of the electrodes of the first stimulating electrode array are one of a cathode and an anode, and all of the electrodes of the second stimulating electrode array are the other of the cathode and the anode.
Aspect 25: The method of aspect 23, wherein the electrodes of each of the first stimulating electrode array and the second stimulating electrode array comprises a central electrode and a plurality of circumferential electrodes spaced around the central electrode, wherein, for each of the first stimulating electrode array and the second stimulating electrode array, the central electrode is an opposite polarity of each of the circumferential electrodes.
Aspect 26: The method of aspect 23, wherein the electrodes of each of the first stimulating electrode array and the second stimulating electrode array are randomly selected to be cathodes, anodes, or uncharged.
Aspect 27: The method of any one of aspects 20-26, wherein the first stimulating electrode array and the second stimulating electrode array are on opposing sides of the support structure of the implantable apparatus.
Aspect 28: The method of any one of aspects 20-27, further comprising: ceasing generation of electric fields between the at least two electrodes of the first stimulating electrode array and the second stimulating electrode array; and generating electric fields between at least two electrodes of two different electrode arrays of the plurality of electrode arrays, wherein the two different electrode arrays comprise a third stimulating electrode array and a fourth stimulating electrode array that are different from the first stimulating array and the second stimulating array.
Aspect 29: The method of aspect 28, wherein the first and second stimulating arrays are spaced relative to a first axis, wherein the third and fourth stimulating arrays are spaced relative to a second axis, wherein the first axis is orthogonal to the second axis.
Aspect 30: The method of any one of aspects 28 or claim 29, further comprising: ceasing generation of electric fields between the at least two electrodes of the third stimulating electrode array and fourth second stimulating electrode array; and generating electric fields between at least two electrodes of two different electrode arrays of the plurality of electrode arrays, wherein the two different electrode arrays comprise a fifth stimulating electrode array and a sixth stimulating electrode array that are each different from the first stimulating array, the second stimulating array, the third stimulating array, the fourth stimulating array.
Aspect 31: The method of aspect 30, wherein the fifth and sixth stimulating arrays are spaced relative to a third axis, wherein the third axis is orthogonal to each of the first and second axes.
Aspect 32: The method of any one of aspects 13-31, wherein the target site is within a torso of a patient.
Aspect 33: The method of any one of aspects 13-31, wherein the target site is within a brain of a patient.
Aspect 34: The method of any one of aspects 13-33, wherein the TTFields generated through the target site are delivered within a peritumoral region spaced 1 to 3 cm from the support structure of the implantable apparatus.
Aspect 35: The method of any one of aspects 13-34, wherein inserting the implantable apparatus comprises inserting the implantable apparatus into a resection cavity.
Aspect 36: The method of any one of aspects 13-35, wherein generating TTFields through the target site with the implantable apparatus comprises: generating TTFields in a first direction; and generating TTFields in a second direction that is different from the first direction; and, optionally, generating TTFields in a third direction that is different from the first direction and the second direction.
Aspect 37: The implantable apparatus of any one of aspects 2-12, wherein in the expanded configuration, the support structure has a first portion and an opposing second portion, wherein the plurality of electrode arrays comprises a first array disposed on the first portion of the support structure and a second electrode array disposed on the second portion of the support structure, and wherein the first electrode array and the second electrode array are aligned in a first direction.
Aspect 38: The implantable apparatus of aspect 37, wherein in the expanded configuration, the support structure has a third portion and an opposing fourth portion, wherein the plurality of electrode arrays comprises a third array disposed on the third portion of the support structure and a fourth array disposed on the fourth portion of the support structure, and wherein the third electrode array and the fourth electrode array are aligned in a second direction that is different than the first direction.
Aspect 38A: The implantable apparatus of aspect 38, wherein in the expanded configuration, the support structure has a fifth portion and an opposing sixth portion, wherein the plurality of electrode arrays comprises a fifth electrode array disposed on the fifth portion of the support structure and a sixth electrode array disposed on the sixth portion of the support structure, and wherein the fifth electrode array and the sixth electrode array are aligned in a third direction that is different to each of the first and second directions.
Aspect 39: The method of aspect 28, wherein the first and second stimulating arrays are aligned in a direction coincident with a first axis, wherein the third and fourth stimulating arrays are aligned in a direction coincident with a second axis, and wherein the first axis is orthogonal (or within 15, 10, 5, or 1 degree of orthogonal) to the second axis.
Although the foregoing invention has been described in some detail by way of illustration and example for purposes of clarity of understanding, certain changes and modifications may be practiced within the scope of the appended claims.
This application claims priority to and the benefit of the filing date of U.S. Provisional Patent Application No. 63/085,603, filed Sep. 30, 2020, which is incorporated herein by reference in its entirety.
Number | Date | Country | |
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63085603 | Sep 2020 | US |