Patent Application
20060017387
The invention relates to methods and apparatus for generating a plasma, and more particularly, to methods and apparatus for providing an inductively-driven plasma light source.
Plasma discharges can be used in a variety of applications. For example, a plasma discharge can be used to excite gases to produce activated gases containing ions, free radicals, atoms and molecules. Plasma discharges also can be used to produce electromagnetic radiation (e.g., light). The electromagnetic radiation produced as a result of a plasma discharge can itself be used in a variety of applications. For example, electromagnetic radiation produced by a plasma discharge can be a source of illumination in a lithography system used in the fabrication of semiconductor wafers. Electromagnetic radiation produced by a plasma discharge can alternatively be used as the source of illumination in microscopy systems, for example, a soft X-ray microscopy system. The parameters (e.g., wavelength and power level) of the light vary widely depending upon the application.
The present state of the art in (e.g., extreme ultraviolet and x-ray) plasma light sources consists of or features plasmas generated by bombarding target materials with high energy laser beams, electrons or other particles or by electrical discharge between electrodes. A large amount of energy is used to generate and project the laser beams, electrons or other particles toward the target materials. Power sources must generate voltages large enough to create electrical discharges between conductive electrodes to produce very high temperature, high density plasmas in a working gas. As a result, however, the plasma light sources generate undesirable particle emissions from the electrodes.
It is therefore a principal object of this invention to provide a plasma source. Another object of the invention is to provide a plasma source that produces minimal undesirable emissions (e.g., particles, infrared light, and visible light). Another object of the invention is to provide a high energy light source.
Another object of the invention is to provide an improved lithography system for semiconductor fabrication. Yet another object of the invention is to provide an improved microscopy system.
The present invention features a plasma source for generating electromagnetic radiation.
The invention, in one aspect, features a light source. The light source includes a chamber having a plasma discharge region and containing an ionizable medium. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region. The light source also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.
The plasma can substantially vary in current density along a path of current flow in the plasma. The zone can be a point source of high intensity light. The zone can be a region where the plasma is pinched to form a neck. The plasma can be a non-uniform plasma. The zone can be created by, for example, gas pressure, an output of the power system, or current flow in the plasma.
The light source can include a feature in the chamber for producing a non-uniformity in the plasma. The feature can be configured to substantially localize an emission of light by the plasma. The feature can be removable or, alternatively, be permanent. The feature can be located remotely relative to the magnetic core. In one embodiment the feature can be a gas inlet for producing a region of higher pressure for producing the zone. In another embodiment the feature can be an insert located in the plasma discharge region. The feature can include a gas inlet. In some embodiments of the invention the feature or insert can include cooling capability for cooling the insert or other portions of the light source. In certain embodiments the cooling capability involves pressurized subcooled flow boiling. The light source also can include a rotating disk that is capable of alternately uncovering the plasma discharge region during operation of the light source. At least one aperture in the disk can be the feature that creates the localized high intensity zone. The rotating disk can include a hollow region for carrying coolant. A thin gas layer can conduct heat from the disk to a cooled surface.
In some embodiments the pulse of energy provided to the magnetic core can form the plasma. Each pulse of energy can possess different characteristics. Each pulse of energy can be provided at a frequency of between about 100 pulses per second and about 15,000 pulses per second. Each pulse of energy can be provided for a duration of time between about 10 ns and about 10 μs. The at least one pulse of energy can be a plurality of pulses.
In yet another embodiment of the invention the pulse power system can include an energy storage device, for example, at least one capacitor and/or a second magnetic core. A second magnetic core can discharge each pulse of energy to the first magnetic core to deliver power to the plasma. The pulse power system can include a magnetic pulse-compression generator, a magnetic switch for selectively delivering each pulse of energy to the magnetic core, and/or a saturable inductor. The magnetic core of the light source can be configured to produce at least essentially a Z-pinch in a channel region located in the chamber or, alternatively, at least a capillary discharge in a channel region in the chamber. The plasma (e.g., plasma loops) can form the secondary of a transformer.
The light source of the present invention also can include at least one port for introducing the ionizable medium into the chamber. The ionizable medium can be an ionizable fluid (i.e., a gas or liquid). The ionizable medium can include one or more gases, for example, one or more of the following gases: Xenon, Lithium, Nitrogen, Argon, Helium, Fluorine, Tin, Ammonia, Stannane, Krypton or Neon. The ionizable medium can be a solid (e.g., Tin or Lithium) that can be vaporized by a thermal process or sputtering process within the chamber or vaporized externally and then introduced into the chamber. The light source also can include an ionization source (e.g., an ultraviolet lamp, an RF source, a spark plug or a DC discharge source) for pre-ionizing the ionizable medium. The ionization source can also be inductive leakage current that flows from a second magnetic core to the magnetic core surrounding the portion of the plasma discharge region.
The light source can include an enclosure that at least partially encloses the magnetic core. The enclosure can define a plurality of holes in the enclosure. A plurality of plasma loops can pass through the plurality of holes when the magnetic core delivers power to the plasma. The enclosure can include two parallel (e.g., disk-shaped) plates. The parallel plates can be conductive and form a primary winding around the magnetic core. The enclosure can, for example, include or be formed from a metal material such as copper, tungsten, aluminum or one of a variety of copper-tungsten alloys. Coolant can flow through the enclosure for cooling a location adjacent the localized high intensity zone.
In some embodiments of the invention the light source can be configured to produce light for different uses. In other embodiments of the invention a light source can be configured to produce light at wavelengths shorter than about 100 nm when the light source generates a plasma discharge. In another embodiment of the invention a light source can be configured to produce light at wavelengths shorter than about 15 nm when the light source generates a plasma discharge. The light source can be configured to generate a plasma discharge suitable for semiconductor fabrication lithographic systems. The light source can be configured to generate a plasma discharge suitable for microscopy systems.
The invention, in another aspect, features an inductively-driven light source.
In another aspect of the invention, a light source features a chamber having a plasma discharge region and containing an ionizable material. The light source also includes a transformer having a first magnetic core that surrounds a portion of the plasma discharge region. The light source also includes a second magnetic core linked with the first magnetic core by a current. The light source also includes a power supply for providing a first signal (e.g., a voltage signal) to the second magnetic core, wherein the second magnetic core provides a second signal (e.g., a pulse of energy) to the first magnetic core when the second magnetic core saturates, and wherein the first magnetic core delivers power to a plasma formed in the plasma discharge region from the ionizable medium in response to the second signal. The light source can include a metallic material for conducting the current.
In another aspect of the invention, a light source includes a chamber having a channel region and containing an ionizable medium. The light source includes a magnetic core that surrounds a portion of the channel region and a pulse power system for providing at least one pulse of energy to the magnetic core for exciting the ionizable medium to form at least essentially a Z-pinch in the channel region. The current density of the plasma can be greater than about 1 KA/cm2. The pressure in the channel region can be less than about 100 mTorr. In other embodiments, the pressure is less than about 1 Torr. In some embodiments, the pressure is about 200 mTorr.
In yet another aspect of the invention, a light source includes a chamber containing a light emitting plasma with a localized high-intensity zone that emits a substantial portion of the emitted light. The light source also includes a magnetic core that surrounds a portion of the non-uniform light emitting plasma. The light source also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to the plasma.
In another aspect of the invention, a light source includes a chamber having a plasma discharge region and containing an ionizable medium. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region. The light source also includes a means for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.
In another aspect of the invention, a plasma source includes a chamber having a plasma discharge region and containing an ionizable medium. The plasma source also includes a magnetic core that surrounds a portion of the plasma discharge region and induces an electric current in the plasma sufficient to form a Z-pinch.
In general, in another aspect the invention relates to a method for generating a light signal. The method involves introducing an ionizable medium capable of generating a plasma into a chamber. The method also involves applying at least one pulse of energy to a magnetic core that surrounds a portion of a plasma discharge region within the chamber such that the magnetic core delivers power to the plasma. The plasma has a localized high intensity zone.
The method for generating the light signal can involve producing a non-uniformity in the plasma. The method also can involve localizing an emission of light by the plasma. The method also can involve producing a region of higher pressure to produce the non-uniformity.
The plasma can be a non-uniform plasma. The plasma can substantially vary in current density along a path of current flow in the plasma. The zone can be a point source of high intensity light. The zone can be a region where the plasma is pinched to form a neck. The zone can be created with a feature in the chamber. The zone can be created with gas pressure. The zone can be created with an output of the power system. Current flow in the plasma can create the zone.
The method also can involve locating an insert in the plasma discharge region. The insert can define a necked region for localizing an emission of light by the plasma. The insert can include a gas inlet and/or cooling capability. A non-uniformity can be produced in the plasma by a feature located in the chamber. The feature can be configured to substantially localize an emission of light by the plasma. The feature can be located remotely relative to the magnetic core.
The at least one pulse of energy provided to the magnetic core can form the plasma. Each pulse of energy can be pulsed at a frequency of between about 100 pulses per second and about 15,000 pulses per second. Each pulse of energy can be provided for a duration of time between about 10 ns and about 10 μs. The pulse power system can an energy storage device, for example, at least one capacitor and/or a second magnetic core.
In some embodiments, the method of the invention can involve discharging the at least one pulse of energy from the second magnetic core to the first magnetic core to deliver power to the plasma. The pulse power system can include, for example, a magnetic pulse-compression generator and/or a saturable inductor. The method can involve delivering each pulse of energy to the magnetic core by operation of a magnetic switch.
In some embodiments, the method of the invention can involve producing at least essentially a Z-pinch or essentially a capillary discharge in a channel region located in the chamber. In some embodiments the method can involve introducing the ionizable medium into the chamber via at least one port. The ionizable medium can include one or more gases, for example, one or more of the following gases: Xenon, Lithium, Nitrogen, Argon, Helium, Fluorine, Tin, Ammonia, Stannane, Krypton or Neon. The method also can involve pre-ionizing the ionizable medium with an ionization source (e.g., an ultraviolet lamp, an RF source, a spark plug or a DC discharge source). Alternatively or additionally, inductive leakage current flowing from a second magnetic core to the magnetic core surrounding the portion of the plasma discharge region can be used to pre-ionize the ionizable medium. In another embodiment, the ionizable medium can be a solid (e.g., Tin or Lithium) that can be vaporized by a thermal process or sputtering process within the chamber or vaporized externally and then introduced into the chamber.
In another embodiment of the invention the method can involve at least partially enclosing the magnetic core within an enclosure. The enclosure can include a plurality of holes. A plurality of plasma loops can pass through the plurality of holes when the magnetic core delivers power to the plasma. The enclosure can include two parallel plates. The two parallel plates can be used to form a primary winding around the magnetic core. The enclosure can include or be formed from a metal material, for example, copper, tungsten, aluminum or copper-tungsten alloys. Coolant can be provided to the enclosure to cool a location adjacent the localized high intensity location.
The method can involve alternately uncovering the plasma discharge region. A rotating disk can be used to alternately uncover the plasma discharge region and alternately define a feature that creates the localized high intensity zone. A coolant can be provided to a hollow region in the rotating disk.
In another embodiment the method can involve producing light at wavelengths shorter than about 100 nm. In another embodiments the method can involve producing light at wavelengths shorter than about 15 nm. The method also can involve generating a plasma discharge suitable for semiconductor fabrication lithographic systems. The method also can involve generating a plasma discharge suitable for microscopy systems.
The invention, in another aspect, features a lithography system. The lithography system includes at least one light collection optic and at least one light condenser optic in optical communication with the at least one collection optic. The lithography system also includes a light source capable of generating light for collection by the at least one collection optic. The light source includes a chamber having a plasma discharge region and containing an ionizable medium. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region and a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.
In some embodiments of the invention, light emitted by the plasma is collected by the at least one collection optic, condensed by the at least one condenser optic and at least partially directed through a lithographic mask.
The invention, in another aspect, features an inductively-driven light source for illuminating a semiconductor wafer in a lithography system.
In general, in another aspect the invention relates to a method for illuminating a semiconductor wafer in a lithography system. The method involves introducing an ionizable medium capable of generating a plasma into a chamber. The method also involves applying at least one pulse of energy to a magnetic core that surrounds a portion of a plasma discharge region within the chamber such that the magnetic core delivers power to the plasma. The plasma has a localized high intensity zone. The method also involves collecting light emitted by the plasma, condensing the collected light; and directing at least part of the condensed light through a mask onto a surface of a semiconductor wafer.
The invention, in another aspect, features a microscopy system. The microscopy system includes a first optical element for collecting light and a second optical element for projecting an image of a sample onto a detector. The detector is in optical communication with the first and second optical elements. The microscopy system also includes a light source in optical communication with the first optical element. The light source includes a chamber having a plasma discharge region and containing an ionizable medium. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region and a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.
In some embodiments of the invention, light emitted by the plasma is collected by the first optical element to illuminate the sample and the second optical element projects an image of the sample onto the detector.
In general, in another aspect the invention relates to a microscopy method. The method involves introducing an ionizable medium capable of generating a plasma into a chamber. The method also involves applying at least one pulse of energy to a magnetic core that surrounds a portion of a plasma discharge region within the chamber such that the magnetic core delivers power to the plasma. The plasma has a localized high intensity zone. The method also involves collecting a light emitted by the plasma with a first optical element and projecting it through a sample. The method also involves projecting the light emitted through the sample to a detector.
Another aspect of the invention features an insert for an inductively-driven plasma light source. The insert has a body that defines at least one interior passage and has a first open end and a second open end. The insert has an outer surface adapted to couple or connect with an inductively-driven plasma light source in a plasma discharge region. In other embodiments, the outer surface of the insert is directly connected to the plasma light source. In other embodiments, the outer surface of the insert is indirectly connected to the plasma light source. In other embodiments, the outer surface of the insert is in physical contact with the plasma light source.
The at least one interior passage can define a region to create a localized high intensity zone in the plasma. The insert can be a consumable. The insert can be in thermal communication with a cooling structure.
In one embodiment, the outer surface of the insert couples or connects to the plasma light source by threads in a receptacle inside a chamber of the plasma light source. In another embodiment, the insert can slip fit into a receptacle inside a chamber of the plasma light source and tighten in place due to heating by the plasma (e.g., in the plasma discharge region).
In some embodiments, at least a surface of the at least one interior passage of the insert includes a material with a low plasma sputter rate (e.g., carbon, titanium, tungsten, diamond, graphite, silicon carbide, silicon, ruthenium, or a refractory material). In other embodiments, a surface of at least one interior passage of the insert includes a material with both a low plasma sputter rate and a high thermal conductivity (e.g., highly oriented pyrolytic graphite (HOPG) or thermal pyrolytic graphite (TPG)). In another embodiment, a surface of at least one interior passage of the insert can be made of a material having a low absorption of EUV radiation (e.g., ruthenium or silicon).
The interior passage geometry of the insert can be used to control the size and shape of the plasma high intensity zone. The inner surface of the passage can define a reduced dimension of the passage. The geometry of the inner surface of the passage can be asymmetric about a midline between the two open ends. In another embodiment, the geometry of the inner surface can be defined by a radius of curvature which is substantially less than the minimum dimension across the passage. In another embodiment, the geometry of the inner surface can be defined by a radius of curvature between about 25% to about 100% of the minimum dimension across the passage.
The invention, in another aspect, features an insert for an inductively-driven plasma light source. The insert has a body defining at least one interior passage and has a first open end and a second open end. The insert also has a means for coupling or connecting with an inductively-driven light source in a plasma discharge region.
The insert can be defined by two or more bodies. The insert can have at least one gas inlet hole in the body. In another embodiment, the insert can have at least one cooling channel passing through the body. In one embodiment, the insert is replaced using a robotic arm.
The invention, in another aspect, features a light source. The light source includes a chamber having a plasma discharge region and containing an ionizable medium. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region. The light source also includes a power system for providing energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region, wherein the plasma has a localized high intensity zone. The light source also includes a filter disposed relative to the light source to reduce indirect or direct plasma emissions.
The filter can be configured to maximize collisions with emissions which are not traveling parallel to radiation emanating from the light source (e.g., from the high intensity zone). The filter can be configured to minimize reduction of emissions traveling parallel to radiation emanating from the light source (e.g., from the high intensity zone). In one embodiment, the filter is made up of walls which are substantially parallel to the direction of radiation emanating from the high intensity zone, and has channels between the walls. A curtain of gas can be maintained in the vicinity of the filter to increase collisions between the filter and emissions other than radiation.
In another embodiment, the filter can have cooling channels. The surfaces of the filter which are exposed to the emissions can comprise a material with a low plasma sputter rate (e.g., carbon, titanium, tungsten, diamond, graphite, silicon carbide, silicon, ruthenium, or a refractory material). In another embodiment, the surfaces of the filter which are exposed to the emissions can comprise a material with both a low plasma sputter rate and a high thermal conductivity (e.g., highly oriented pyrolytic graphite or thermal pyrolytic graphite).
In another aspect, the invention relates to a method for generating a light signal. The method includes introducing an ionizable medium capable of generating a plasma into a chamber. The method also includes applying energy to a magnetic core that surrounds a portion of a plasma discharge region within the chamber such that the magnetic core delivers power to the plasma. The plasma has a localized high intensity zone. The inventive method also includes filtering emissions emanating from the localized high intensity zone of the plasma.
In one embodiment, the method includes positioning the filter relative to the high intensity zone (e.g., a source of light) to reduce direct or indirect emissions. The method can include maximizing collisions with emissions which are not traveling parallel to radiation emanating from the high intensity zone. The method can include minimizing reduction of emissions traveling parallel to the radiation emanating from the high intensity zone.
In one embodiment, this method can include locating walls which are substantially parallel to the direction of radiation emanating from the high intensity zone and positioning channels between the walls. The surfaces of the filter which are exposed to the emissions can comprise a material with a low plasma sputter rate (e.g., carbon, titanium, tungsten, diamond, graphite, silicon carbide, silicon, ruthenium, or a refractory material). In another embodiment, the surfaces of the filter which are exposed to the emissions can comprise a material with both a low plasma sputter rate and a high thermal conductivity (e.g., highly oriented pyrolytic graphite or thermal pyrolytic graphite).
The invention, in another aspect, features a light source. The light source includes a chamber having a plasma discharge region and containing an ionizable material. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region. The light source also includes a power system for providing energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region and having a localized high intensity zone. The light source also includes means for minimal reduction of emissions traveling substantially parallel to the direction of radiation emitted from the high intensity zone. The light source also includes means for maximal reduction of emissions traveling other than substantially parallel to the direction of the radiation emitted from the high intensity zone.
The invention, in another aspect, features an inductively-driven plasma source. The plasma source includes a chamber having a plasma discharge region and containing an ionizable medium. The plasma source also includes a system for spreading heat flux and ion flux over a large surface area. This system uses at least one object, located within the plasma chamber, where at least the outer surface of the object moves with respect to the plasma. At least one of the objects is in thermal communication with a cooling channel.
In another embodiment, the outer surface of at least one of the objects can include a sacrificial layer. The sacrificial layer can be continuously coated on the outer surface. The sacrificial layer can be made from a material which emits EUV radiation (e.g., lithium or tin).
In another embodiment, the objects can be two or more closely spaced rods. The space between the rods can define a region to create a localized high intensity zone in the plasma. In another embodiment, a local geometry of the at least one object can define a region to create a localized high intensity zone in the plasma.
In general, in another aspect, the invention relates to a method for generating an inductively-driven plasma. The method includes introducing an ionizable medium capable of generating a plasma in a chamber and applying energy to a magnetic core surrounding a plasma discharge region in the chamber. The method also includes spreading the heat flux and ion flux from the inductively-driven plasma over a large surface area. The method includes locating at least one object within a region of the plasma and moving at least an outer surface of the at least one object with respect to the plasma. The method also includes providing the at least one object with a cooling channel in thermal communication with the at least one object. In this method, the plasma can erode a sacrificial layer from the outer surface of the object. In another embodiment, the method can include continuously coating the outer surface of the at least one object with the sacrificial layer. The sacrificial layer can be formed of a material which emits EUV radiation (e.g., lithium or tin).
The method can further include placing the at least one object in such a way as to create a localized high intensity zone in the plasma. The method can also involve locating a second object relative to the first object in order to define a region to create a localized high intensity zone in the plasma.
The invention, in one aspect, features a light source. The light source includes a chamber having a plasma discharge region and containing an ionizable medium. The light source also includes a magnetic core that surrounds a portion of the plasma discharge region. The light source also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone. The light source includes a magnet located in the chamber to modify a shape of the plasma. In one embodiment, the magnet is inside the plasma discharge region and can create the localized high intensity zone. The magnet can be a permanent magnet or an electromagnet. In another embodiment, the magnet can be located adjacent the high intensity zone.
The invention, in another aspect, relates to a method for operating an EUV light source. EUV light is generated in a chamber using a plasma. A consumable is provided which defines a localized region of high intensity in the plasma. The method also includes replacing (e.g., with a robotic arm) the consumable based on a selected criterion without exposing the chamber to atmospheric conditions. In some embodiments, the selected criterion is one or more of a predetermined time, a measured degradation of the consumable, or a measured degradation of a process control variable associated with operation of the light source. In some embodiments, the selected criterion is a measured degradation of a process control variable associated with operation of a system (e.g., lithography system, microscopy system, or other semiconductor processing system).
The method can also include maintaining a vacuum in the chamber during replacement of the consumable. The plasma light source can be an inductively-driven plasma light source. The consumable can be an insert.
The foregoing and other objects, aspects, features, and advantages of the invention will become more apparent from the following description and from the claims.
The foregoing and other objects, feature and advantages of the invention, as well as the invention itself, will be more fully understood from the following illustrative description, when read together with the accompanying drawings which are not necessarily to scale.
In this embodiment, the winding 140 is a copper enclosure that at least partially encloses the magnetic core 108 and that provides a conductive path that at least partially encircles the magnetic core 108. The copper enclosure is electrically equivalent to a single turn winding that encircles the magnetic core 108. In another embodiment, the plasma source 100 instead includes an enclosure that at least partially encloses the magnetic core 108 in the chamber 104 and a separate metal (e.g., copper or aluminum) strip that at least partially encircles the magnetic core 108. In this embodiment, the metal strip is located in the gap 158 between the enclosure and the magnetic core 108 and is the primary winding of the magnetic core 108 of the transformer 124.
The plasma source 100 also includes a power system 136 for delivering energy to the magnetic core 108. In this embodiment, the power system 136 is a pulse power system that delivers at least one pulse of energy to the magnetic core 108. In operation, the power system 136 typically delivers a series of pulses of energy to the magnetic core 108 for delivering power to the plasma. The power system 136 delivers pulses of energy to the transformer 124 via electrical connections 120a and 120b (generally 120). The pulses of energy induce a flow of electric current in the magnetic core 108 that delivers power to the plasma loops 116a and 116b in the plasma discharge region 112. The magnitude of the power delivered to the plasma loops 116a and 116b depends on the magnetic field produced by the magnetic core 108 and the frequency and duration of the pulses of energy delivered to the transformer 124 according to Faraday's law of induction.
In some embodiments, the power system 136 provides pulses of energy to the magnetic core 108 at a frequency of between about 1 pulse and about 50,000 pulses per second. In certain embodiments, the power system 136 provides pulses of energy to the magnetic core 108 at a frequency of between about 100 pulses and 15,000 pulses per second. In certain embodiments, the pulses of energy are provide to the magnetic core 108 for a duration of time between about 10 ns and about 10 μs. The power system 136 may include an energy storage device (e.g., a capacitor) that stores energy prior to delivering a pulse of energy to the magnetic core 108. In some embodiments, the power system 136 includes a second magnetic core. In certain embodiments, the second magnetic core discharges pulses of energy to the first magnetic core 108 to deliver power to the plasma. In some embodiments, the power system 136 includes a magnetic pulse-compression generator and/or a saturable inductor. In other embodiments, the power system 136 includes a magnetic switch for selectively delivering the pulse of energy to the magnetic core 108. In certain embodiments, the pulse of energy can be selectively delivered to coincide with a predefined or operator-defined duty cycle of the plasma source 100. In other embodiments, the pulse of energy can be delivered to the magnetic core when, for example, a saturable inductor becomes saturated.
The plasma source 100 also may include a means for generating free charges in the chamber 104 that provides an initial ionization event that pre-ionizes the ionizable medium to ignite the plasma loops 116a and 116b in the chamber 104. Free charges can be generated in the chamber by an ionization source, such as, an ultraviolet light, an RF source, a spark plug or a DC discharge source. Alternatively or additionally, inductive leakage current flowing from a second magnetic core in the power system 136 to the magnetic core 108 can pre-ionize the ionizable medium. In certain embodiments, the ionizable medium is pre-ionized by one or more ionization sources.
The ionizable medium can be an ionizable fluid (i.e., a gas or liquid). By way of example, the ionizable medium can be a gas, such as Xenon, Lithium, Tin, Nitrogen, Argon, Helium, Fluorine, Ammonia, Stannane, Krypton or Neon. Alternatively, the ionizable medium can be finely divided particle (e.g., Tin) introduced through at least one gas port into the chamber 104 with a carrier gas, such as helium. In another embodiment, the ionizable medium can be a solid (e.g., Tin or Lithium) that can be vaporized by a thermal process or sputtering process within the chamber or vaporized externally and then introduced into the chamber 104. In certain embodiments, the plasma source 100 includes a vapor generator (not shown) that vaporizes the metal and introduces the vaporized metal into the chamber 104. In certain embodiments, the plasma source 100 also includes a heating module for heating the vaporized metal in the chamber 104. The chamber 104 may be formed, at least in part, from a metallic material such as copper, tungsten, a copper-tungsten alloy or any material suitable for containing the ionizable medium and the plasma and for otherwise supporting the operation of the plasma source 100.
Referring to
Constricting the flow of current in a plasma is also sometimes referred to as producing a Z-pinch or a capillary discharge. A Z-pinch in a plasma is characterized by the plasma decreasing in cross-sectional area at a specific location along the path of the plasma. The plasma decreases in cross-sectional area as a result of the current that is flowing through the cross-sectional area of the plasma at the specific location. Generally, a magnetic field is generated due to the current in the plasma and, the magnetic field confines and compresses the plasma. In this case, the plasma carries an induced current along the plasma path and a resulting magnetic field surrounds and compresses the plasma. This effect is strongest where the cross-sectional area of the plasma is minimum and works to further compress the cross-sectional area, hence further increasing the current density in the plasma.
In one embodiment, the channel 132 is a region of decreased cross-sectional area relative to other locations along the path of the plasma loops 116a and 116b. As such, the energy intensity is increased in the plasma loops 116a and 116b within the channel 132 relative to the energy intensity in other locations of the plasma loops 116a and 116b. The increased energy intensity increases the emitted electromagnetic energy (e.g., emitted light) in the channel 132.
The plasma loops 116a and 116b also have a localized high intensity zone 144 as a result of the increased energy intensity. In certain embodiments, a high intensity light 154 is produced in and emitted from the zone 144 due to the increased energy intensity. Current density substantially varies along the path of the current flow in the plasma loops 116a and 116b. In one exemplary embodiment, the current density of the plasma is in the localized high intensity zone is greater than about 1 KA/cm2. In some embodiments, the zone 144 is a point source of high intensity light and is a region where the plasma loops 116a and 116b are pinched to form a neck.
In some embodiments, a feature is located in the chamber 104 that creates the zone 144. In certain embodiments, the feature produces a non-uniformity in the plasma loops 116a and 116b. The feature is permanent in some embodiments and removable in other embodiments. In some embodiments, the feature is configured to substantially localize an emission of light by the plasma loops 116a and 116b to, for example, create a point source of high intensity electromagnetic radiation. In other embodiments, the feature is located remotely relative to the magnetic core 108. In certain embodiments, the remotely located feature creates the localized high intensity zone in the plasma in a location remote to the magnetic core 108 in the chamber 104. For example, the disk 308 of
In some embodiments, the feature is an insert that defines a necked region. In certain embodiments, the insert localizes an emission of light by the plasma in the necked region. In certain other embodiments, the insert includes a gas inlet for, for example, introducing the ionizable medium into the chamber 104. In other embodiments, the feature includes cooling capability for cooling a region of the feature. In certain embodiments, the cooling capability involves subcooled flow boiling as described by, for example, S. G. Kandlikar “Heat Transfer Characteristics in Partial Boiling, Fully Developed Boling, and Significant Void Flow Regions of Subcooled Flow Boiling”Journal of Heat Transfer Feb. 2, 1998. In certain embodiments, the cooling capability involves pressurized subcooled flow boiling. In other embodiments, the insert includes cooling capability for cooling a region of the insert adjacent to, for example, the zone 144.
In some embodiments, gas pressure creates the localized high intensity zone 144 by, for example, producing a region of higher pressure at least partially around a portion of the plasma loops 116a and 116b. The plasma loops 116a and 116b are pinched in the region of high pressure due to the increased gas pressure. In certain embodiments, a gas inlet is the feature that introduces a gas into the chamber 104 to increase gas pressure. In yet another embodiment, an output of the power system 136 can create the localized high intensity zone 144 in the plasma loops 116a and 116b.
In another embodiment, illustrated in
The winding 140 around the first magnetic core 108 forms the primary winding of the transformer 124. In this embodiment, the second magnetic core and the winding 140 are part of the power system 136 and form a saturable inductor that delivers a pulse of energy to the first magnetic core 108. The power system 136 includes a capacitor 320 that is electrically connected via connections 380a and 380b to the winding 140. In certain embodiments, the capacitor 320 stores energy that is selectively delivered to the first magnetic core 108. A voltage supply 324, which may be a line voltage supply or a bus voltage supply, is coupled to the capacitor 320.
The plasma source 100 also includes a disk 308 that creates a localized high intensity zone 144 in the plasma loops 116a and 116b. In this embodiment, the disk 308 is located remotely relative to the first magnetic core 108. The disk 308 rotates around the Z-axis of the disk 308 (referring to
It is understood that variations on, for example, the geometry of the disk 308 and the number and or shape of the apertures 312 is contemplated by the description herein. In one embodiment, the disk 308 is a stationary disk having at least one aperture 312. In some embodiments, the disk 308 has a hollow region (not shown) for carrying coolant to cool a region of the disk 308 adjacent the localized high intensity zone 144. In some embodiments, the plasma source 100 includes a thin gas layer that conducts heat from the disk 308 to a cooled surface in the chamber 104.
In some embodiments, the capacitor 320 is a plurality of capacitors that are connected in parallel. In certain embodiments, the saturable inductor 328 is a plurality of saturable inductors that form, in part, a magnetic pulse-compression generator. The magnetic pulse-compression generator compresses the pulse duration of the pulse of energy that is delivered to the first magnetic core 108.
In another embodiment, illustrated in
The enclosure 512 defines at least two holes 516 and 532 that pass through the enclosure 512. In this embodiment, there are six holes 532 that are located equally angularly spaced around a diameter of the plasma source 500. Hole 516 is a single hole through the enclosure 512. In one embodiment, the six plasma loops 508 each converge and pass through the hole 516 as a single current carrying plasma path. The six plasma loops also each pass through one of the six holes 532. The parallel plates 540a and 540b have a groove 504 and 506, respectively. The grooves 504 and 506 each locate an annular element (not shown) for creating a pressurized seal and for defining a chamber, such as the chamber 104 of
The hole 516 in the enclosure defines a necked region 536. The necked region 536 is a region of decreased cross-section area relative to other locations along the length of the hole 516. As such, the energy intensity is increased in the plasma loops 508, at least, in the necked region 536 forming a localized high intensity zone in the plasma loops 508 in the necked region 536. In this embodiment, there also are a series of holes 540 located in the necked region 536. The holes 540 may be, for example, gas inlets for introducing the ionizable medium into the chamber of the plasma source 500. In other embodiments, the enclosure 512 includes a coolant passage (not shown) for flowing coolant through the enclosure for cooling a location of the enclosure 512 adjacent the localized high intensity zone.
In an exemplary embodiment, a lithography system, such as the lithography system 600 of
In other embodiments, an outer surface of the insert 802 is directly connected to the plasma source 500. In other embodiments, the outer surface of the insert 802 is indirectly connected to the plasma source 500. In other embodiments, the outer surface of the insert 802 is in physical contact with the plasma source 500.
In this embodiment, the insert 802 has threads 810 on an outer surface 824 of the insert 802. The receptacle 801 has a corresponding set of threads 810 to mate with the threads 810 of the insert 802. The insert 802 is inserted into the receptacle 801 by rotating the the insert 802 relative to the receptacle 801, thereby mating the threads 810 of the insert 802 and the receptacle 801. In other embodiments, neither the insert 802 nor the receptacle 801 have threads 810 and the insert 802 can be slip fit into the receptacle 801 using a groove and key mechanism (not shown). The heat from the plasma causes the insert 802 to expand and hold it firmly in place within the receptacle 801. In this embodiment, the insert 802 is a unitary structure. In another embodiment, insert 802 can be defined by two or more bodies.
In this embodiment, the insert 802 defines a region that creates a high intensity zone in the plasma. The size of the high intensity zone, in part, determines the intensity of the plasma and the brightness of radiation emitted by the zone. The brightness of the high intensity zone can be increased by reducing its size (e.g. diameter or length). Generally, the minimum dimension of the necked region 805 along the passage 820 of the insert 802 determines the size of the high intensity zone. The local geometry of an inner surface 803 of the passage 820 in the insert 802 also determines the size of the high intensity zone. In some embodiments, the geometry of the inner surface 803 is asymmetric about a center line 804 of the insert 802, as shown in
The inner surface 803 of the insert 802 is exposed to the high intensity zone of the plasma. In some embodiments, the insert 802 is formed such that at least the inner surface 803 is made of a material with a low plasma sputter rate, allowing it to resist erosion by the plasma. For example, this can include materials like carbon, titanium, tungsten, diamond, graphite, silicon carbide, silicon, ruthenium, or a refractory material. It is also understood that alloys or compounds including one or more of those materials can be used to form the insert 802 or coat the inner surface 803 of the insert 802.
In another embodiment, it is recognized that material from the inner surface 803 of the insert 802 interacts with the plasma (e.g., sputtered by the plasma) and is deposited on, for example, optical elements of a light source. In this case, it is desirable to form the insert such that at least the inner surface 803 comprises or is coated with a material which does not absorb the EUV light being emitted by the light source. For example, materials that do not absorb or absorb a minimal amount of the EUV radiation include ruthenium or silicon, or alloys or compounds of ruthenium or silicon. This way, material sputtered from the inner surface 803 of the insert 802 and deposited on, for example, the optical elements, does not substantially interfere with the functioning (e.g., transmission of EUV radiation) of the optical elements.
In this embodiment, the insert 802 is in thermal communication with the receptacle 801 in order to dissipate the heat from the plasma high intensity zone. In some embodiments, one or more cooling channels (not shown) can pass through the body 840 of the insert 802 to cool the insert 802. In some embodiments it is desirable to form the insert 802 such that at least the inner surface 803 is made of a material with a low plasma sputter rate and a high thermal conductivity. For example, this can include highly oriented pyrolytic graphite (HOPG) or thermal pyrolytic graphite (TPG). It is also understood that alloys or compounds with those materials can be used.
In this embodiment, the insert 802 includes a gas inlet 806 for, for example, introducing the ionizable medium into the chamber, as described previously herein.
Other shapes, sizes and features are contemplated for the local geometry of the inner surface 803 of the insert 802. Portions of the inner surface 803 can be concave or convex, while still having a radius 807 that defines the high intensity zone. The slope of the sidewall 808 of the necked region 805 can be positive, negative, or zero. The local geometry of the inner surface 803 can be radially symmetric about the axis 813 of the insert 802 or not. The local geometry of the inner surface 803 of the insert 802 can be symmetric about the center line 804 or not.
In some embodiments, applications using a plasma source (e.g., the plasma source 100 of
By way of example, a coating of material (e.g. ruthenium) on the inner surface 803 of the insert 802 may erode or be sputtered as plasma loops 508 pass through the interior passage 820 of the insert 802. In some embodiments, as the inner surface 803 of the insert 802 is eroded or sputtered by the plasma loops 508, its ability to define the localized high intensity zone can be compromised. A new insert 802 can be placed into a chamber 104 of the plasma source 100 through a vacuum load lock (not shown) installed in the chamber 104. After the new insert 802 is placed in the chamber 104, the robotic arm can be used to install the new insert 802 into the receptacle 801 of the enclosure 512. For example, if the receptacle 801 and the insert 802 have mating threads 810, the robotic arm can rotate the insert 802 relative to the receptacle 801 to install the insert 802 by mating the matching threads 810. In this manner, by robotically replacing the insert 802, uptime of the plasma source is improved. Robotically replacing the insert 802 while maintaining a vacuum in the chamber 104, further improves uptime of the plasma source.
The filter 902 is configured to minimize the reduction of emissions traveling substantially parallel to the direction of radiation 904 emanating from the light emitting region 901. The filter 902 is also configured to trap emissions which are traveling in directions substantially not parallel 905 (e.g., in some cases orthogonal) to the direction of radiation 904 emanating from the light emitting region 901. The particles, charged particles, ions, molecules and atoms which are not traveling substantially parallel to the direction of radiation 904 emanating from the light emitting region 901 collide with the filter 902 and cannot reach, for example, the collection optics 903. The particles, charged particles, ions, molecules and atoms which are initially traveling substantially parallel to the direction of radiation 904 emanating from the light emitting region 901 undergo collisions with gas atoms, ions or molecules and be deflected so that they begin to travel in a non-parallel direction thereby becoming trapped at the filter. In some embodiments, the filter 902 is capable of substantially reducing the number of particles, charged particles, ions, molecules and atoms which reach, for example, collection optics 903, while not substantially reducing the amount of radiation which reaches, for example, the collection optics 903.
In this embodiment, the filter 902 includes at least one cooling channel 920. The walls 910 are in thermal communication with the at least one cooling channel 920. The filter 902 includes an inlet 924a and an outlet 924b for flowing coolant through the channel 920. The cooling channel 920 dissipates heat associated with, for example, particles, charged particles, ions, molecules or atoms impacting the walls 910. In some embodiments, the walls 910 are formed such that at least the surfaces of the walls exposed to the emissions are made from a material which has a low plasma sputter rate and a high thermal conductivity. For example, this can include materials like highly oriented pyrolytic graphite or thermal pyrolytic graphite. In some embodiments, multiple cooling channels 920 are provided to cool the filter 902 due to exposure of the filter 902 to particles, charged particles, ions, molecules and atoms. Cooling the filter 902 keeps it at a temperature which will not compromise the structural integrity of the filter 902 and also prevent excessive thermal radiation from the filter 902.
In another embodiment, a curtain of buffer gas is maintained in the vicinity of the filter 902. This buffer gas can be inert and have a low absorption of EUV radiation (e.g., helium or argon). Emissions such as particles, charged particles, ions, molecules and atoms which are initially traveling in a direction substantially parallel to the direction of radiation (e.g., the direction of radiation 904 of
In other embodiments (not shown) the walls 910 are configured to be substantially parallel to each other to form a Venetian blind-like structure (as presented to the light emitting region 901). In other embodiments (not shown), the walls 910 can be curved to form concentric cylinders (with an open end of the cylinders facing the light emitting region 901). In other embodiments, the walls can be curved into individual cylinders and placed in a honeycomb pattern (as presented to the light emitting region 901).
Another embodiment of a plasma source chamber 104 is shown in
In some embodiments, however, a single object 1001 is used to spread the heat flux and ion flux associated with the plasma and to define the localized high intensity zone relative to another structure. It is understood that various alternate sizes, shapes and quantities of objects 1001 can be used.
In this embodiment, at least one object 1001 is in thermal communication with cooling channels 1020. Coolant flows through the channels 1020 to enable the surfaces 1002 of the objects 1001 to dissipate the heat from the plasma. By moving the surface 1002 of the objects 1001 with respect to the plasma (e.g., rotating the rods 1001 around the z-axis), the plasma is constantly presented with a newly cooled portion of the surface 1002 for dissipating heat. In another embodiment, the surface 1002 of the at least one object 1001 is covered with a sacrificial layer. This allows ion flux and heat flux from the plasma to erode the sacrificial layer of the surface 1002 of the at least one object 1001 without damaging the underlying object 1001. By moving the surface 1002 with respect to the plasma, the plasma is presented with a fresh surface to dissipate the ion flux and heat flux. Plasma ions collide with the surface 1002 of the at least one object 1001. These collisions result in, for example, the scattering of particles, charged particles, ions, molecules and atoms from the surface 1002 of the at least one object 1001. In this manner, the resulting particles, charged particles, ions, molecules and atoms are most likely not traveling towards, for example, the collection optics (not shown). In this way, the at least one object 1001 has prevented the ion flux from the plasma from interacting with, for example, collection optics (not shown).
In one embodiment, the surface 1002 of the at least one object 1001 is continuously coated with the sacrificial layer. This can be accomplished by providing solid material (not shown) to the at least one object 1001 being heated by the plasma. Heat from the plasma melts the solid material melts allowing it to coat the surface 1002 of the at least one object 1001. In another embodiment, molten material can be supplied to the surface 1002 of the at least one object 1001 using a wick. In another embodiment, part of the surface 1002 of the at least one object 1001 can rest in a bath of molten material, which adheres to the surface 1002 as it moves (e.g., rotates). In another embodiment, the material can be deposited on the surface 1002 of the at least one object 1001 from the gas phase, using any of a number of well known gas phase deposition techniques. By continuously coating the surface 1002 of the at least one object 1001, the sacrificial layer is constantly replenished and the plasma is continuously presented with a fresh surface 1002 to dissipate the ion flux and heat flux, without harming the underlying at least one object 1001.
In another embodiment, at least the surface 1002 of the at least one object 1001 can be made from a material which is capable of emitting EUV radiation (e.g., lithium or tin). Plasma ions colliding with the surface 1002 cause atoms and ions of that material to be emitted from the surface 1002 into the plasma, where the atoms and ions can emit EUV radiation, increasing the radiation produced by the plasma.
Variations, modifications, and other implementations of what is described herein will occur to those of ordinary skill in the art without departing from the spirit and the scope of the invention as claimed. Accordingly, the invention is to be defined not by the preceding illustrative description but instead by the spirit and scope of the following claims.
This application is a continuation-in-part of U.S. Ser. Nos. 10/888,434, 10/888,795 and 10/888,955, all filed on Jul. 9, 2004. This application claims priority to and incorporates by reference in their entirety U.S. Ser. Nos. 10/888,434, 10/888,795 and 10/888,955.
| Number | Date | Country | |
|---|---|---|---|
| Parent | 10888434 | Jul 2004 | US |
| Child | 11176015 | Jul 2005 | US |
| Parent | 10888795 | Jul 2004 | US |
| Child | 11176015 | Jul 2005 | US |
| Parent | 10888955 | Jul 2004 | US |
| Child | 11176015 | Jul 2005 | US |
