Number | Name | Date | Kind |
---|---|---|---|
3611982 | Coriale | Oct 1971 | |
3831606 | Damani | Aug 1974 | |
3971377 | Damani | Jul 1976 | |
4047525 | Kulessa et al. | Sep 1977 | |
4072129 | Bright et al. | Feb 1978 | |
4160257 | Carrish | Jul 1979 | |
4197289 | Sturzenegger et al. | Apr 1980 | |
4332789 | Mlodozeniec | Jun 1982 | |
4353365 | Hallworth et al. | Oct 1982 | |
4564285 | Yasuda et al. | Jan 1986 | |
4570630 | Elliott et al. | Feb 1986 | |
4627432 | Newell et al. | Dec 1986 | |
4664107 | Wass | May 1987 | |
4685620 | Law et al. | Aug 1987 | |
4778054 | Newell et al. | Oct 1988 | |
4795644 | Zentner | Jan 1989 | |
4811731 | Newell et al. | Mar 1989 | |
4889114 | Kladders | Dec 1989 | |
4917978 | Ritt et al. | Apr 1990 | |
4921727 | Datta et al. | May 1990 | |
4921767 | Datta et al. | May 1990 | |
4971257 | Birge | Nov 1990 | |
5028501 | Ritt et al. | Jul 1991 | |
5031610 | Armstrong et al. | Jul 1991 | |
5035237 | Newell et al. | Jul 1991 | |
5115803 | Sioutas | May 1992 | |
5161524 | Evans | Nov 1992 | |
5176132 | Drought et al. | Jan 1993 | |
5192548 | Velasquez et al. | Mar 1993 | |
5239993 | Evans | Aug 1993 | |
5243970 | Ambrosio et al. | Sep 1993 | |
5263475 | Altermatt et al. | Nov 1993 | |
5278588 | Kubelik | Jan 1994 | |
5301666 | Lerk et al. | Apr 1994 | |
5327883 | Williams et al. | Jul 1994 | |
5415162 | Casper et al. | May 1995 | |
5619984 | Hodson et al. | Apr 1997 | |
5642727 | Datta et al. | Jul 1997 | |
5647347 | Van Oort | Jul 1997 |
Number | Date | Country |
---|---|---|
0 129 985 A1 | Jan 1985 | EPX |
2 064 334 | Jun 1981 | GBX |
2 242 134 | Sep 1991 | GBX |
2 274 273 | Jul 1994 | GBX |
WO 9309832 | May 1993 | WOX |
WO 9324186 | Sep 1993 | WOX |
WO 9406497 | Mar 1994 | WOX |
WO 9408552 | Apr 1994 | WOX |
WO 9413271 | Jun 1994 | WOX |
WO 9423772 | Oct 1994 | WOX |
WO 9500127 | Jan 1995 | WOX |
Entry |
---|
Donald A. Seanor, Triboelectrification of Polymers in K.C. Frisch and A. Patsis, Electrical Properties of Polymers (Technomic Publications, Westport, CT) pp. 37-58. |
Toshiya Watanabe et al., Electrostatic Force and Absorption Current of Alumina Electrostatic Chuck, Jpn. J. Appl. Phys. vol. 31, pp. 2145-2150 (1992). |
Larry D. Harsough, Electrostatic Wafer Holding, Solid State Technology, pp. 87-90 (Jan. 1993). |
John Field, Electrostatic Wafer Clamping for Next-Generation Manufacturing, Solid State Technology, pp. 91-98 (Sep. 1994). |
J. -F. Daviet et al., Electrostatic Clamping Applied to Semiconductor Plasma Processing, I. Theoretical Modeling, J. Electrochem. Soc., vol. 140, No. 11, pp. 3245-3256 (Nov. 1993). |
J. -F. Daviet et al., Electrostatic Clamping Applied to Semiconductor Plasma Processing, II. Experimental Results, J. Electrochem. Soc., vol. 140, No. 11, pp. 3256-3261 (Nov. 1993). |
Peter Singer, Electrostatic Chucks in Wafer Processing, Semiconductor International, pp. 57-64 (Apr. 1995). |
T. Watanabe, et al., Electrostatic Charge Distribution in the Dielectric layer of Alumina Electrostatic Chuck, Journal of Materials Science, vol. 29, pp. 3510-3616 (1994). |
Mamoru Nakasuji et al., Low Voltage and High Speed Operating Electrostatic Wafer Chuck Using Sputtered Tantalum Oxide Membrane, J. Vac. Sci. Technol. A 12(5) pp. 2834-2839 (Sep./Oct. 1994). |
Derwent Search Report (dated: May 20, 1996). |