Claims
- 1. A base member for an ink jet head, said base member comprising a substrate, a heat generating resistor provided between electrodes which constitute a pair on said substrate an upper protection layer provided on an insulation layer which in turn is provided on the heat generating resistor, said upper protection layer having a contact surface contactable to ink, in the improvement residing in thatsaid upper protection layer is made of amorphous alloy having a following composition formula: TaαFeβNiγCrδ=(1) where 10 atomic % ≦α≦30 atomic %, α+β<80 atomic % α<β, δ>γ and α+β+γ+δ=100 atomic %, and at least the contact surface of said upper protection layer contains an oxide of a constituent component, wherein a film stress in said upper protection layer includes at least compression stress, which is not more than 1.0×1010 dyne/cm2.
- 2. A method of manufacturing a base member for an ink jet head according to claim 1, the improvement residing in that said upper protection layer is produced by a sputtering method using an alloy target comprising Ta, Fe, Cr, and Ni for providing said composition.
- 3. The method according to claim 2, further comprising a step of oxidizing a surface of the amorphous alloy film produced by a sputtering method to coat the surface with the oxide film.
- 4. The method according to claim 3, wherein the oxide film is produced by heat oxidation.
- 5. The method according to claim 4, wherein a film stress of the amorphous alloy film during formation of the film includes a compression stress and is not more than 1.0×1010 dyne/cm2.
- 6. The method according to claim 2, wherein a film stress of the amorphous alloy film during formation of the film includes a compression stress and is not more than 1.0×1010 dyne/cm2.
- 7. The method according to claim 3, wherein a film stress of the amorphous alloy film during formation of the film includes a compression stress and is not more than 1.0×1010 dyne/cm2.
- 8. A method of manufacturing a base member for an ink jet head according to claim 1, the improvement residing in that said upper protection layer is produced by a binary sputtering method using an alloy target comprising Fe, Cr, and Ni for providing a composition and a Ta target.
- 9. The method according to claim 8, further comprising a step of oxidizing a surface of the amorphous alloy film produced by a sputtering method to coat the surface with the oxide film.
- 10. The method according to claim 9, wherein the oxide film is produced by heat oxidation.
- 11. The method according to claim 10, wherein a film stress of the amorphous alloy film during formation of the film includes a compression stress and is not more than 1.0×1010 dyne/cm2.
- 12. The method according to claim 9, wherein a film stress of the amorphous alloy film during formation of the film includes a compression stress and is not more than 1.0×1010 dyne/cm2.
- 13. The method according to claim 8, wherein a film stress of the amorphous alloy film during formation of the film includes a compression stress and is not more than 1.0×1010 dyne/cm2.
- 14. An inkjet head comprising an ejection outlet for ejecting liquid, a liquid flow path having a portion for applying to the liquid thermal energy for ejecting the liquid, a heat generating resistor for generating the thermal energy and an upper protection layer covering the heat generating resistor with an insulation layer therebetween, the improvement residing in thatsaid upper protection layer is made of amorphous alloy having a following composition formula TaαFeβNiγCrδ=(1) where 10 atomic % ≦α≦30 atomic %, α+β<80 atomic % α<β, δ>γ and α+β+γ+δ=100 atomic %, and such a surface of said upper protection layer as is contactable to ink contains an oxide of a constituent component of said upper protection layer, wherein a film stress in said upper protection layer includes at least compression stress, which is not more than 1.0×1010 dyne/cm2.
Priority Claims (1)
Number |
Date |
Country |
Kind |
11-283540 |
Oct 1999 |
JP |
|
Parent Case Info
This application is a division of application Ser. No. 09/677,866, filed on Oct. 3, 2000, U.S. Pat. No. 6,485,131.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
4723129 |
Endo et al. |
Feb 1988 |
A |
4740796 |
Endo et al. |
Apr 1988 |
A |
5660739 |
Ozaki et al. |
Aug 1997 |
A |
5896147 |
Mori et al. |
Apr 1999 |
A |
Foreign Referenced Citations (6)
Number |
Date |
Country |
0318981 |
Jun 1989 |
EP |
0353925 |
Feb 1990 |
EP |
0490668 |
Jun 1992 |
EP |
0899104 |
Mar 1999 |
EP |
2151555 |
Jul 1985 |
GB |
215158 |
Jun 1990 |
JP |