| Number | Name | Date | Kind |
|---|---|---|---|
| 4236120 | White | Nov 1980 | |
| 4636744 | King et al. | Jan 1987 | |
| 5101170 | Torazzina et al. | Mar 1992 | |
| 5153529 | Koda et al. | Oct 1992 | |
| 5193821 | Brambilla et al. | Mar 1993 |
| Entry |
|---|
| Article entitled "Channel Length and Width Effects on NMOS Transistor Degradation Under Constant Positive Gate-Voltage Stressing" by Ken Wu, Sam Pan, David Chin, and J. Shaw, Intel Corporation, IDEM 91, IEEE 1991, pp. 735-738. |