Claims
- 1. An in situ method for producing and maintaining an electrically insulating coating on a surface comprising:
- selecting a surface from the group consisting of vanadium, vanadium-chromium-titanium alloy, titanium, vanadium-titanium alloy, molybdenum, stainless steel, and combinations thereof;
- forming an intermetallic layer on the surface through contacting the surface with a liquid selected from the group consisting of lithium, lithium-lead, sodium, potassium, sodium-potassium, gallium, and combinations thereof, said liquid containing dissolved metals selected from the group consisting of Al, Be, Ca, Cr, Fe, In, Ni, Pd, Pt, Si, Ti, Y--Pt, and combinations thereof; and
- contacting the intermetallic layer with an alkali liquid containing dissolved molten metal-nonmetal compounds thereby forming an electrically insulating coating on the surface.
- 2. The method of claim 1 wherein the dissolved metal used to form the intermetallic layer has a concentration of between approximately 0.1 atom percent and 10 atom percent.
- 3. The method as recited in claim 1 wherein the step of contacting the intermetallic layer with a metal-nonmetal compound further consists of exposing the intermetallic layer to the metal-nonmetal compound at a temperature selected from the range of between approximately 400.degree. C. and 1000.degree. C.
- 4. The method of claim 1 wherein the metal of the metal-nonmetal compound is selected from a group consisting of Al, B, Be, Ca, Mg, Y and combinations thereof.
- 5. The method of claim 1 wherein the nonmetal of the metal-nonmetal compound is selected from a group consisting of oxygen, nitrogen, carbon, sulfur and combinations thereof.
- 6. An in situ method for producing and maintaining an electrically insulating coating on a surface comprising:
- selecting a surface from the group consisting of vanadium, vanadium alloy and combinations thereof;
- forming an intermetallic layer on the surface through contacting the surface with a molten alkali metal containing dissolved metals selected from the group consisting of Al, Be, Ca, Cr, Fe, In, Mg, Ni, Pd, Pt, Si, Ti, Y--Pt, and combinations thereof; and
- contacting the intermetallic layer with an alkali liquid containing dissolved molten metal-nonmetal compounds selected from the group consisting of metal nitrides, metal oxides and combinations thereof thereby forming an electrically insulating coating on the surface.
- 7. The method of claim 6 wherein the dissolved metal used to form the intermetallic layer has a concentration of between approximately 0.1 atom percent and 10 atom percent.
- 8. The method as recited in claim 6 wherein the step of contacting the intermetallic layer with a metal-nonmetal compound further consists of exposing the intermetallic layer to the metal-nonmetal compound at a temperature selected from the range of between approximately 400.degree. C. and 1000.degree. C.
- 9. The method of claim 1 wherein the metal of the metal-nonmetal compound is selected from a group consisting of Al, B, Be, Ca, Mg, Y and combinations thereof.
Parent Case Info
This application is a continuation of application Ser. No. 08/241,425 filed May 11, 1994 , now abandoned.
CONTRACTUAL ORIGIN OF THE INVENTION
The United States Government has rights in this invention pursuant to Contract No. W-31-109-ENG-38 between the U.S. Department of Energy and the University of Chicago representing Argonne National Laboratory.
US Referenced Citations (8)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2074063 |
Apr 1987 |
JPX |
Non-Patent Literature Citations (5)
Entry |
American Ceramic Society Bulletin vol. 71, No. 10, Oct. 1992. |
E. Salpitro-ITER: Basic Device 12th Conference Proceedings, NICE, 12-19 O 1988 International Atomic Energy Agency. |
Fusion Reactor Materials, Semiannual Progress Report for Period Ending Sep. 30, 1992, U.S. Department of Energy. |
Fusion Reactor Materials, Semiannual Progress Report for Period Ending Mar. 31, 1993, U.S. Department of Energy. |
Measurement of Electrical Resistivity of Thermally Grown Titanium Nitride Thin Films in Liquid Lithium, Park et al. Oct. 1993. |
Continuations (1)
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Number |
Date |
Country |
Parent |
241425 |
May 1994 |
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