The present invention relates to sealing high-temperature electrochemical devices, such as solid oxide fuel cells.
Solid-state electrochemical devices are normally cells that include two porous electrodes, the anode and the cathode, and a dense solid electrolyte membrane disposed between the electrodes. In the case of a typical solid oxide fuel cell, the anode is exposed to fuel and the cathode is exposed to an oxidant in separate closed systems to avoid any mixing of the fuel and oxidants.
External seals are used to seal off the closed systems and prevent mixing. While no dominant seal technology exists, examples includes braze seals, compressive seals and glass seals. Seal-less designs, which allow mixing of the fuel and oxidant streams at the outlet of the device, have also been in development, though oxidant and fuel mixing is generally undesirable. Long-term performance of braze seals has not been demonstrated. In addition, braze seals can be costly and the coefficient of thermal expansion (“CTE”) must be modified to match the CTE of the electrolyte. Compressive seals are generally made with mica, display high leak rate and have poor thermal cycling capability. Glass seals can react with sealed surfaces and also have poor thermal cycling ability.
The present invention provides electrochemical device structures having integrated seals and methods of fabricating them. According to various embodiments, the structures include a thin, supported electrolyte film with the electrolyte sealed to the support. The perimeter of the support is self-sealed during fabrication. The perimeter can then be independently sealed to a manifold or other device, e.g., via an external seal. According to various embodiments, the external seal does not contact the electrolyte, thereby eliminating the restrictions on the sealing method and materials imposed by sealing against the electrolyte.
One aspect of the invention relates to electrochemical device structure having an integrated seal. The devices include first and second electrodes separated by a dense electrolyte and a support having dense and porous support regions. The dense and porous support regions share a dense support/porous support interface and are composed of the same material type (e.g., they are both metal or both cermet). The dense electrolyte is disposed on at least a portion of the dense support region to form an electrolyte/dense support interface. The electrolyte/dense support interface and dense support/porous support interface form a gas tight seal between the first electrode and the second electrode.
Another aspect of the invention relates to an electrochemical device structure having an integrated seal. The device includes first and second electrodes separated by a dense electrolyte; a porous support region cosintered to a dense support region to form a gas impermeable dense support/porous support interface; the dense electrolyte cosintered to at least a portion of the dense support region to form a gas impermeable electrolyte/dense support interface. The electrolyte/dense support interface and dense support/porous support interface forming a gas tight seal between the first electrode and the second electrode.
In certain embodiments, the dense support region provides a point of mechanical attachment to a housing, sheet, etc. For example, an external sealing member may be connected to the dense support region, to provide a further seal and/or to mount the device to a manifold, housing, another device, etc. This external sealing member is not in physical contact with the dense electrolyte. According to certain embodiments, the external sealing member is metal, and may be a brazed or welded joint. Also in certain embodiments, the dense support is fitted to a metal housing, e.g., by threading. In certain embodiments, the dense support region provides an electrical contact point for exchanging current or voltage with the device.
The porous support region may be an electrode or support an electrode. In certain embodiments, a ceramic or cermet interlayer is disposed between the porous support region and the dense electrolyte. This interlayer may function as an electrode. In certain embodiments, the porous and dense support regions are made of the same material (e.g., both are Ni—YSZ, or Cu—YSZ, or stainless steel). The device may be of any geometry, including planar and tubular geometries. In certain embodiments, solid oxide fuel cells are provided.
Another aspect of the invention relates to a method of fabricating an electrochemical device structure having an integrated seal. The method involves providing a support structure green body configured such that upon sintering, adjacent dense and porous support regions are formed; coating at least a portion of the support structure green body with a green electrolyte material; and cosintering the support structure green body and green electrolyte material such that a) a support having adjacent porous and dense support regions is formed, b) the dense support region and the electrolyte become substantially gas impermeable, and c) an integrated gas-tight seal is formed at an electrolyte/dense support region interface.
In certain embodiments, prior to coating a portion of the support structure green body with a green electrolyte material, green interlayer material is deposited on at least a portion of the support structure green body. The green electrolyte material is then deposited on the interlayer as well as a portion of the green support structure.
In certain embodiments, after sintering, the dense support region is attached to an external metal seal, housing, manifold or fitting such that the seal, housing, manifold or fitting does not contact the electrolyte. The external seal, etc. may also be sintered to the dense support region during the cosintering operation.
These and other features and advantages of the present invention will be presented in more detail in the following specification of the invention and the accompanying figures which illustrate by way of example the principles of the invention.
a-3d are schematics of electrochemical device structures having an integrated seal in accordance with certain embodiments of the present invention.
a-4c are schematics showing placement of integrated seals in tubular devices in accordance with certain embodiments of the present invention.
d and 4e are cross-sectional schematics of electrode and electrolyte layers in tubular devices in accordance with certain embodiments of the present invention.
Reference will now be made in detail to specific embodiments of the invention. Examples of the specific embodiments are illustrated in the accompanying drawings. While the invention will be described in conjunction with these specific embodiments, it will be understood that it is not intended to limit the invention to such specific embodiments. On the contrary, it is intended to cover alternatives, modifications, and equivalents as may be included within the scope of the appended claims. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may be practiced without some or all of these specific details. In other instances, well known process operations have not been described in detail in order not to unnecessarily obscure the present invention.
Electrochemical devices generally have an ion-conducting electrolyte sandwiched between a porous anode and cathode in fuel cell applications. (Although a fuel cell is used as an example of an electrochemical device for purposes of illustration, it will be understood that the electrochemical device structures described herein include oxygen generators, syn-gas generators, hydrogen gas separators and similar devices.)
The present invention provides electrochemical device structures having integrated seals and methods of fabricating them. The integrated seal separates the atmosphere on one side of the electrolyte (e.g., air) from the atmosphere on the other side of the electrolyte (e.g., fuel). The devices generally have a support layer including a porous support member or region and a dense support member or region on which a solid electrolyte is disposed. By cosintering the electrolyte, dense support and porous support, an integrated seal exists at the porous support/dense support and the electrolyte/dense support interfaces. As used herein, “dense” support or electrolyte region refers to a support or electrolyte that is substantially free of connected porosity such that it is substantially gas-tight.
As is discussed further below, the porous support and dense support are made of the same material type, typically either both a metal or both a cermet. In certain embodiments, they are both the same material, e.g., ferritic stainless steel.
In the embodiment depicted in
In certain embodiments the porous support is a porous electrode. Electrode supported cells can be either anode supported or cathode supported. The electrode supports are typically a metal, e.g., a metal alloy, or a ceramic metal composite (cermet). Examples of metals that may be used include nickel, copper, iron, chromium, titanium, stainless steel and chromium containing nickel alloys. Examples of cermets that may be used include Ni—YSZ and Cu—YSZ. In certain embodiments, the support layer provides mechanical support but is not an electrode. For example, a support may be composed of an inexpensive high strength material, such as a metal, with an electrode layer is composed of a material having high electrocatalytic activity for a specific purpose, for example methane reformation, oxygen reduction or hydrogen oxidation. (Examples of structures in which an interlayer disposed between the porous support and the dense electrolyte functions as an anode are discussed further below with reference to
The dense support material is of the same type as the porous support, e.g., the dense support and porous support are metal/metal or cermet/cermet. If metal, the dense and porous supports may be the same metal or alloy or may be different metals or alloys. Similarly, if cermet, the dense and porous supports may be the same or different cermets. The support can have a sharp boundary between the dense and porous sections, or can be a graded structure that changes from porous or dense over some distance.
a-3d show schematic representations of various implementations of supports and electrolytes in which the electrolyte is sealed against a dense support in accordance with the invention.
As indicated above, in certain embodiments, an interlayer is disposed between the support and electrolyte.
In certain embodiments, the dense support is connected to an external seal, as is shown in
Typically, the electrolyte contacts only an internal portion of the dense support region surface, with the end or perimeter of the support extending beyond the electrolyte. The internal portion of the dense support is sealed to the electrolyte, with the external portion available to bond to an external seal. In certain embodiments, however, the dense support may not extend further than the electrolyte. An external seal can be attached to the surfaces of the support away from the electrolyte.
The integrated seal is applicable to any device geometry, including planar and tubular geometries. A single device may contain one or multiple integrated seals. The integrated seal exists anywhere the perimeter of the electrolyte overlays a dense part of the support. For example,
d shows a cross-sectional schematic view of an electrolyte and electrode layers in an example of tubular structure of
According to various embodiments, the exposed dense support areas, both at the perimeter (as in
Once the support structure green body is formed, an interlayer is optionally deposited on the support structure green body in an operation 503. As described above, the interlayer may cover all or part of the porous area of the support structure, and may span the dense/porous interface. An area of the dense support structure surface is left exposed to seal against the electrolyte. In one example, a YSZ interlayer is formed by dipcoating from a slurry of YSZ and poreformer particles. Other known methods of coating or depositing may be used.
Then, in an operation 505, an electrolyte film is deposited on the interlayer surface (if present) and the desired areas of the green support structure, including at least a portion of the exposed dense area surface. As discussed above with reference to
The support layer structure having dense and porous regions, the interlayer, if present, and electrolyte are then cosintered in an operation 507. During this process, all of the components shrink. The end area of the support structure becomes dense, the electrolyte becomes dense, and the electrolyte and the dense end of the support structure are joined through mechanical interlocking to produce a seal at that interface. The layers of the resulting structure may be said to be cosintered: e.g., cosintering of the electrolyte and dense support region produces an electrolyte layer cosintered to the dense support region. Note that unlike conventional methods this electrolyte/support seal is created during fabrication and not as a later step. This has benefits for inexpensive and easy manufacturing. Moreover, because the seal is integrated, sealing performance and lifetime are expected to increase. By densifying the end of the support structure, the cosintering operation produces a seal at the dense and porous support interface. As indicated above, this interface boundary may be sharp or graduated.
Effective cosintering the electrolyte in contact with the dense support region creates significant mechanical interlocking between the two providing an integrated hermetic seal. Effective cosintering of the electrolyte, porous support region and dense support region is facilitated through selection of appropriate materials, particle size, sintering schedule and poreformer/binder additives. The particle size and green density of the support are chosen so that after sintering, the porous region is porous and the dense region sinters to near full density. Support materials having similar shrinkage to the electrolyte may be used. CTE matching between the support and electrolyte is described in U.S. Pat. No. 6,605,316, titled “Structures And Fabrication Techniques For Solid State Electrochemical Devices,” incorporated by reference herein in its entirety. As indicated, the support materials may be selected to have a good CTE match with the electrolyte. Note that CTE matching between the support and electrolyte (2 materials) is easier than CTE matching between the support, electrolyte and a seal material (3 materials) that may be required with prior art methods.
Examples of electrolyte materials include stabilized zirconias, including zirconias having about 1-11 mol % of one of the following dopants: yttria, calcia, scandia, ceria, and combinations thereof.
In certain embodiments, using the same material for the porous and dense regions of the support aids in effective cosintering. For example, stainless steel metal may be used for both regions. Particle size, addition and amount of poreformer and green density may be different for the porous and dense support regions.
After the sintering operation, the dense area of the support may be optionally shaped and/or attached to an external seal, metal housing, fitting, etc. in an operation 509. As indicated, the dense support typically has an exposed area, which is not in contact with the electrolyte. See, e.g., area 313 in
In certain embodiments, the dense support area contacts an external object during sintering, where the external object is made of a material that will sinter-bond with the dense support. For example, the tube of
The methods described above allow high-temperature electrochemical devices to be sealed or joined to materials that are not compatible with the electrolyte.
The following examples are intended to illustrate various aspects of the invention, and do not limit the invention in any way.
A thin, fully dense yttria-stabilized zirconia (YSZ) electrolyte layer was cosintered onto a ferritic stainless steel support. Cross-sectional images of the resulting structure are shown in
The structure shown in
1. Produce Metal Support Molding Powder
Water-atomized ferritic stainless steel particles were mixed with acrylic binder and polyethylene glycol 6000 poreformer, ground, and sieved to 150 μm agglomerates. The metal particles for the porous section of the support were 25-38 μm, and were mixed with 17 vol % binder and 59 vol % poreformer. These parameters were chosen so as to create a low green density compatible with retaining adequate porosity after cosintering. The metal particles for the dense section were <25 μm, and were mixed with 17 vol % binder and 26 vol % poreformer. These parameters were chosen to allow near-full density after cosintering, and a total shrinkage during cosintering that is similar to that of the YSZ film and porous metal support (˜20-24% linear shrinkage).
2. Produce Metal Support Green Body
The metal support molding powder was loaded into a tubular mold such that only the end section of the tube contained the powder which was to become the dense section. The powder was compacted by cold isostatic pressing.
3. Deposit Interlayer (Optional)
After debiding and bisque-firing the metal support to create handling strength, the porous YSZ interlayer was deposited by dipcoating from a slurry of YSZ and acrylic performer particles.
4. Deposit YSZ Electrolyte Film
The electrolyte film was deposited by aerosol spraying onto the interlayer surface and exposed area of green dense support.
5. Cosinter
The entire structure was cosintered in reducing atmosphere at 1300° C. During this process all of the components shrank, the end of the support tube became dense, the electrolyte became dense, and the electrolyte and dense tube end were joined through mechanical interlocking to produce a hermetic (gas-tight) seal at that interface.
Several tubes with integrated seals were prepared according to the procedure outlined in Example 1. Stainless steel caps and manifolds were brazed onto the exposed dense metal tube ends. The electrolyte was not contacted by the braze. The hermeticity of the seal was then evaluated by bubble testing with 10 psi air inside the tube and acetone outside the tube. All integrated seal areas were air-tight.
Two support specimens were prepared to demonstrate the effect of Cu addition to stainless steel support. The supports were prepared similarly to those in Example 1. The first comprised 10 g P434L 38-45 μm stainless steel powder, 2 g acrylic solution (15 wt % in water), 1.5 g acrylic poreformer beads (53-76 μm), and 0.5 g PEG6000. The second was identical except that 10 wt % of the stainless steel was replaced with Cu powder. Samples of both supports were sintered to 1100° C. and 1300° C. After sintering at 1100° C., the sample with Cu shrank 4.5%, whereas the sample with no Cu shrank 3.6%. The conductivity of the samples sintered at 1300° C. was measured in moist H2 atmosphere. The sample with Cu provided 10.8 kS/cm, whereas the sample with no Cu provided 5.6 kS/cm. After sintering, a mixture of stainless steel-rich and Cu-rich regions of the Cu-containing support was observed, indicating incomplete alloying of the two phases.
From this example, it is clear that addition of a small amount of Cu to the stainless steel support can provide increased shrinkage at the initial stages of sintering, and improved conductivity of the final sintered support. The increased shrinkage may be used to improve the shrinkage match between the electrolyte film and the dense or porous support areas. The improved conductivity may improve in-plane conduction throughout the porous support, and is especially useful at the dense area of the support if the dense area is used as a contact to exchange current with the device. It is also expected that the ductility of the Cu will improve contact resistance and sealing, especially if the dense support area contains Cu and is forcibly contacted to the neighboring device, housing, current connection, etc.
Although the foregoing invention has been described in some detail for purposes of clarity of understanding, it will be apparent that certain changes and modifications may be practiced within the scope of the appended claims. It should be noted that there are many alternative ways of implementing both the process and compositions of the present invention. Accordingly, the present embodiments are to be considered as illustrative and not restrictive, and the invention is not to be limited to the details given herein.
This invention was made with government support under Contract DE-AC02-05CH11231 awarded by the United States Department of Energy to The Regents of the University of California for the management and operation of the Lawrence Berkeley National Laboratory. The government has certain rights in this invention.
Filing Document | Filing Date | Country | Kind | 371c Date |
---|---|---|---|---|
PCT/US2008/066737 | 6/12/2008 | WO | 00 | 1/7/2011 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2009/128849 | 10/22/2009 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
3126311 | Harris | Mar 1964 | A |
3324543 | McVey et al. | Jun 1967 | A |
3402230 | White | Sep 1968 | A |
3525646 | Tannenberger et al. | Aug 1970 | A |
3668010 | Falley et al. | Jun 1972 | A |
3773549 | Elbert | Nov 1973 | A |
4035547 | Heller et al. | Jul 1977 | A |
4560607 | Sumner | Dec 1985 | A |
4562124 | Ruka | Dec 1985 | A |
4578214 | Jungerhans | Mar 1986 | A |
4624897 | Ito | Nov 1986 | A |
4687717 | Kaun et al. | Aug 1987 | A |
4720335 | Fukushima et al. | Jan 1988 | A |
4763828 | Fukaya et al. | Aug 1988 | A |
4847172 | Maskalick et al. | Jul 1989 | A |
4917958 | Akai et al. | Apr 1990 | A |
4929294 | Blome | May 1990 | A |
4942999 | Oda et al. | Jul 1990 | A |
5013612 | Hunt et al. | May 1991 | A |
5043229 | Mizuhara | Aug 1991 | A |
5085720 | Mikeska et al. | Feb 1992 | A |
5127969 | Sekhar | Jul 1992 | A |
5173372 | Matsuo et al. | Dec 1992 | A |
5236787 | Grassi | Aug 1993 | A |
5240480 | Thorogood et al. | Aug 1993 | A |
5279909 | Horner et al. | Jan 1994 | A |
5306411 | Mazanec et al. | Apr 1994 | A |
5318951 | Shintaku et al. | Jun 1994 | A |
5328779 | Tannenberger et al. | Jul 1994 | A |
5366770 | Wang | Nov 1994 | A |
5409784 | Bromberg et al. | Apr 1995 | A |
5441825 | Barlow | Aug 1995 | A |
5480739 | Kawasaki et al. | Jan 1996 | A |
5487803 | Sweeney et al. | Jan 1996 | A |
5589285 | Cable et al. | Dec 1996 | A |
5599383 | Dyer et al. | Feb 1997 | A |
5616223 | Shen et al. | Apr 1997 | A |
5626914 | Ritland et al. | May 1997 | A |
5629103 | Wersing et al. | May 1997 | A |
5633081 | Cough et al. | May 1997 | A |
5670270 | Wallin | Sep 1997 | A |
5672848 | Komorita et al. | Sep 1997 | A |
5686198 | Kuo et al. | Nov 1997 | A |
5735332 | Ritland et al. | Apr 1998 | A |
5741605 | Gillett et al. | Apr 1998 | A |
5750279 | Carolan et al. | May 1998 | A |
5787578 | Farooq et al. | Aug 1998 | A |
5827620 | Kendall | Oct 1998 | A |
5908713 | Ruka et al. | Jun 1999 | A |
5932368 | Batawi et al. | Aug 1999 | A |
5938822 | Chen et al. | Aug 1999 | A |
5976216 | Samal et al. | Nov 1999 | A |
5993986 | Wallin et al. | Nov 1999 | A |
6007683 | Jankowski et al. | Dec 1999 | A |
6017647 | Wallin | Jan 2000 | A |
6188582 | Peter | Feb 2001 | B1 |
6217732 | Schuh et al. | Apr 2001 | B1 |
6270642 | Basu et al. | Aug 2001 | B1 |
6293978 | Kleefisch et al. | Sep 2001 | B2 |
6296910 | Choy et al. | Oct 2001 | B1 |
6344291 | Hitomi | Feb 2002 | B1 |
6348273 | Ishikawa et al. | Feb 2002 | B1 |
6358567 | Pham et al. | Mar 2002 | B2 |
6368383 | Virkar et al. | Apr 2002 | B1 |
6372078 | Melchert et al. | Apr 2002 | B1 |
6390354 | Makino et al. | May 2002 | B1 |
6420064 | Ghosh et al. | Jul 2002 | B1 |
6428920 | Badding et al. | Aug 2002 | B1 |
6440578 | Shinkai et al. | Aug 2002 | B1 |
6492050 | Sammes | Dec 2002 | B1 |
6541146 | Xue et al. | Apr 2003 | B1 |
6565621 | Shinkai et al. | May 2003 | B2 |
6576363 | Hitomi | Jun 2003 | B1 |
6589680 | Gorte et al. | Jul 2003 | B1 |
6605316 | Visco et al. | Aug 2003 | B1 |
6653009 | Wang et al. | Nov 2003 | B2 |
6656625 | Thompson et al. | Dec 2003 | B1 |
6682842 | Visco et al. | Jan 2004 | B1 |
6742700 | Makino et al. | Jun 2004 | B2 |
6767622 | Hada et al. | Jul 2004 | B2 |
6767662 | Jacobson et al. | Jul 2004 | B2 |
6783880 | Christiansen | Aug 2004 | B2 |
6800323 | Pan | Oct 2004 | B2 |
6846511 | Visco et al. | Jan 2005 | B2 |
6887361 | Visco et al. | May 2005 | B1 |
6896992 | Kearl | May 2005 | B2 |
6974516 | Devoe et al. | Dec 2005 | B2 |
6979511 | Visco et al. | Dec 2005 | B2 |
6994884 | Guan et al. | Feb 2006 | B1 |
7055733 | Weil et al. | Jun 2006 | B2 |
7118777 | Visco et al. | Oct 2006 | B2 |
7153559 | Ito et al. | Dec 2006 | B2 |
7163713 | Jacobson et al. | Jan 2007 | B2 |
7208246 | Herman et al. | Apr 2007 | B2 |
7218502 | Fujii et al. | May 2007 | B2 |
7232626 | Jacobson et al. | Jun 2007 | B2 |
7273673 | Akikusa et al. | Sep 2007 | B2 |
7351488 | Visco et al. | Apr 2008 | B2 |
7553573 | Visco et al. | Jun 2009 | B2 |
8287673 | Tucker et al. | Oct 2012 | B2 |
8343686 | Tucker et al. | Jan 2013 | B2 |
20010012576 | Christiansen et al. | Aug 2001 | A1 |
20020028367 | Sammes et al. | Mar 2002 | A1 |
20020048699 | Steele et al. | Apr 2002 | A1 |
20020081762 | Jacobson et al. | Jun 2002 | A1 |
20020177031 | Doshi et al. | Nov 2002 | A1 |
20030021900 | Jacobson et al. | Jan 2003 | A1 |
20030024611 | Cornie et al. | Feb 2003 | A1 |
20030059668 | Visco et al. | Mar 2003 | A1 |
20030132270 | Weil et al. | Jul 2003 | A1 |
20030188637 | Ito et al. | Oct 2003 | A1 |
20030224234 | Steele et al. | Dec 2003 | A1 |
20040023101 | Jacobson et al. | Feb 2004 | A1 |
20040028994 | Akikusa et al. | Feb 2004 | A1 |
20040112478 | Bieler et al. | Jun 2004 | A1 |
20040115416 | Nonninger et al. | Jun 2004 | A1 |
20040135324 | Brule et al. | Jul 2004 | A1 |
20040219423 | Tunney et al. | Nov 2004 | A1 |
20040231143 | Visco et al. | Nov 2004 | A1 |
20040240142 | Fujii et al. | Dec 2004 | A1 |
20050000621 | Devoe et al. | Jan 2005 | A1 |
20050022921 | Morrison et al. | Feb 2005 | A1 |
20050037252 | Pham | Feb 2005 | A1 |
20050048343 | Thirukkvalur | Mar 2005 | A1 |
20050095479 | Mardilovich et al. | May 2005 | A1 |
20050147857 | Crumm et al. | Jul 2005 | A1 |
20050170234 | Liu et al. | Aug 2005 | A1 |
20050214612 | Visco et al. | Sep 2005 | A1 |
20050214616 | Kumar et al. | Sep 2005 | A1 |
20050221153 | Sugimoto et al. | Oct 2005 | A1 |
20050271931 | Finnerty | Dec 2005 | A1 |
20060029860 | Ketcham et al. | Feb 2006 | A1 |
20060051643 | Sarkar et al. | Mar 2006 | A1 |
20060057295 | Visco et al. | Mar 2006 | A1 |
20060119669 | Sharma et al. | Jun 2006 | A1 |
20060153974 | Matsuzaki et al. | Jul 2006 | A1 |
20060228615 | Armstrong et al. | Oct 2006 | A1 |
20060234112 | Visco et al. | Oct 2006 | A1 |
20070059576 | Jacobson et al. | Mar 2007 | A1 |
20070117006 | Zhan et al. | May 2007 | A1 |
20070148503 | Okazaki | Jun 2007 | A1 |
20070166603 | Nakanishi et al. | Jul 2007 | A1 |
20080118804 | Tucker et al. | May 2008 | A1 |
20080131723 | Tucker et al. | Jun 2008 | A1 |
20080254335 | Torgerson et al. | Oct 2008 | A1 |
20080268323 | Tucker et al. | Oct 2008 | A1 |
20090148743 | Day et al. | Jun 2009 | A1 |
20090220765 | Okamura et al. | Sep 2009 | A1 |
20100038012 | Tucker et al. | Feb 2010 | A1 |
20100143824 | Tucker et al. | Jun 2010 | A1 |
20110053041 | Tucker et al. | Mar 2011 | A1 |
20110269047 | Tucker et al. | Nov 2011 | A1 |
20120325678 | Visco et al. | Dec 2012 | A1 |
Number | Date | Country |
---|---|---|
1471741 | Jan 2004 | CN |
1498877 | May 2004 | CN |
101065860 | Oct 2007 | CN |
200580040834.4 | Aug 2009 | CN |
200580041105.0 | Dec 2009 | CN |
428275 | May 1991 | EP |
562724 | Sep 1993 | EP |
1122806 | Aug 2001 | EP |
1699104 | Sep 2006 | EP |
2250295 | Jan 2012 | EP |
1585403 | Jan 1970 | FR |
1276615 | Jun 1972 | GB |
1383343 | Dec 1974 | GB |
2156257 | Nov 1984 | GB |
59-046695 | Sep 1980 | JP |
56-002549 | Jan 1981 | JP |
59-015960 | Jan 1984 | JP |
59-016695 | Jan 1984 | JP |
60-090875 | May 1985 | JP |
05-089883 | Apr 1993 | JP |
05-163078 | Jun 1993 | JP |
06-042990 | Feb 1994 | JP |
40-7006768 | Jan 1995 | JP |
07-069749 | Mar 1995 | JP |
07-126079 | May 1995 | JP |
07-237980 | Sep 1995 | JP |
07-267747 | Oct 1995 | JP |
09-092301 | Apr 1997 | JP |
09-188582 | Jul 1997 | JP |
09-296203 | Nov 1997 | JP |
10-021931 | Jan 1998 | JP |
11-292618 | Oct 1999 | JP |
11-297333 | Oct 1999 | JP |
2001-126745 | May 2001 | JP |
2002-289249 | Oct 2002 | JP |
2002-301588 | Oct 2002 | JP |
2003-288913 | Oct 2003 | JP |
2004-039574 | Feb 2004 | JP |
2004-047598 | Feb 2004 | JP |
2004-127761 | Apr 2004 | JP |
2004-142971 | May 2004 | JP |
2004-164864 | Jun 2004 | JP |
2004-207088 | Jul 2004 | JP |
2004-273736 | Sep 2004 | JP |
2005-288526 | Oct 2005 | JP |
2005-353493 | Dec 2005 | JP |
536922 | Nov 1976 | RU |
1407675 | Jul 1988 | RU |
1822388 | Jun 1993 | RU |
2197441 | Jan 2003 | RU |
2216602 | Nov 2003 | RU |
2236331 | Sep 2004 | RU |
9700734 | Sep 1997 | WO |
9952165 | Oct 1999 | WO |
9952165 | Oct 1999 | WO |
9965642 | Dec 1999 | WO |
9966570 | Dec 1999 | WO |
0034539 | Jun 2000 | WO |
0052780 | Sep 2000 | WO |
0235634 | May 2002 | WO |
03007312 | Jan 2003 | WO |
2004008556 | Jan 2004 | WO |
2004070858 | Aug 2004 | WO |
2006044313 | Apr 2006 | WO |
2006082057 | Aug 2006 | WO |
2006086037 | Aug 2006 | WO |
2006091250 | Aug 2006 | WO |
2006086037 | Aug 2006 | WO |
2006116153 | Nov 2006 | WO |
2006127045 | Nov 2006 | WO |
2008016345 | Feb 2008 | WO |
2009014775 | Jan 2009 | WO |
2009099447 | Aug 2009 | WO |
2009128849 | Oct 2009 | WO |
2010030300 | Mar 2010 | WO |
2011127283 | Oct 2011 | WO |
Entry |
---|
U.S. Appl. No. 61/046,313, “Integrated seal for high-temperature electrochemical device”, Tucker et al., filed Apr. 18, 2008. |
U.S. Appl. No. 61/025,987, “CU-based cermet for high-temperature electrochemical device”, Tucker et al., filed Feb. 4, 2008. |
U.S. Appl. No. 61/026,079, “CU-based cermet for high-temperature electrochemical device”, Tucker et al., filed Feb. 4, 2008. |
U.S. Appl. No. 61/096,177, “Metal-supported, segmented-in-series high temperature electrochemical device”, Tucker et al., filed Sep. 11, 2008. |
CN patent application No. 200580040834.4, Office Action mailed Aug. 1, 2008. |
CN patent application No. 200580041105.0, Office Action mailed Oct. 24, 2008. |
CN patent application No. 200580040834.4, Notification to grant patent right for invention, mailed Apr. 17, 2009. |
CA patent application No. 2,627,786, Office Action mailed Dec. 21, 2010. |
CN patent application No. 200580041105.0, Notification to grant patent right for invention, mailed Aug. 28, 2009. |
AU patent application No. 2005332026, Exam Report mailed Sep. 29, 2010. |
AU patent application No. 2005327925, Office Action mailed Jul. 5, 2010. |
AU patent application No. 2005327164, Office Action mailed Aug. 6, 2010. |
EP patent application No. 05857980.6, Supplemental Search Report mailed Dec. 15, 2009. |
EP patent application No. 05857595.2, Search Report mailed Oct. 15, 2009. |
EP patent application No. 05857587.9, Supplemental Search Report mailed Oct. 26, 2009. |
JP patent application No. 2007-543481, Exam Report mailed Oct. 5, 2010. |
JP patent application No. 2007-543481, Notification of reasons for rejection mailed Oct. 5, 2010 (English translation). |
Translated excerpt from JP2005-288526. |
Translated excerpt from JP2004-047598. |
MY patent application No. PI 20055578, Examination Report mailed Aug. 14, 2009. |
RU patent application No. 2007124484-02, Office Action mailed Nov. 16, 2009. |
TW patent application No. 094141561, Examination Report mailed Mar. 8, 2010. |
RU patent application No. 200712448309, Office Action mailed Jan. 26, 2009. |
CN patent application No. 200680055443.4, Office Action mailed Dec. 21, 2010. |
RU patent application No. 200910693002, Office Action mailed Sep. 21, 2010. |
VN patent application No. 1-2007-01278, Exam Report mailed Jul. 7, 2007. |
VN patent application No. 1-2007-01267, Exam Report mailed Jul. 29, 2009. |
WO patent application No. PCT/US05/42995 International Search Report and Written Opinion mailed Dec. 26, 2006. |
WO patent application No. PCT/US05/43109 International Search Report and Written Opinion mailed Oct. 12, 2006. |
WO patent application No. PCT/US05/42572, International Search Report and Written Opinion mailed Jun. 29, 2006. |
WO patent application No. PCT/US05/042572, International Preliminary Report on Patentability mailed Jun. 14, 2006. |
WO patent application No. PCT/US2006/029580, International Search Report and Written Opinion mailed Jul. 3, 2008. |
WO patent application No. PCT/US2008/060362, International Search Report and Written Opinion mailed Jan. 12, 2009. |
WO patent application No. PCT/US2008/066737, International Search Report and Written Opinion mailed Jan. 29, 2009. |
WO patent application No. PCT/US2008/053869, International Search Report and Written Opinion mailed Oct. 29, 2008. |
WO patent application No. PCT/US2008/081531, International Search Report and Written Opinion mailed Mar. 31, 2009. |
Naka, Masaaki et al., “Joining of plain carbon steel to alumina with copper filler metal”, XP009010006, Nov. 1985. |
Stevenson, Jeff, “SOFC Seals: Materials Status”, SSECA core technology program—SOFC meeting, Jul. 8, 2003. |
Lee, Sungkyu et al., “Fabrication and characterization of Cu/YSZ cermet high-temperature electrolysis cathode material prepared by high-energy ball-milling method I.900° C-sintered”, Journal of Alloys and Compounds, 448 (2008) 363-367. |
Gorte, Raymond J. et al., “Anodes for direct oxidation of dry hydrocarbons in a solid-oxide fuel cell”, Advanced materials, 2000, 12, No. 19, Oct. 2, 2000. |
Park, Seungdoo et al., “Direct oxidation of hydrocarbons in a solid oxide fuel cell I. methane oxidation”, Journal of the Eclectrochemical Society, 146 (10) 3603-3605 (19990. |
Li, J.Q. et al., “Fabrication and thermal properties of a YSZ-NiCr joint with an interlayer of YSZ-NiCr functionally graded material”, Journal of the European Ceramic Society 23 (2003) 1847-1853. |
Zhou, Xia et al., “Fabrication of composite alloy cladding material by brazing process”, Journal of Materials Processing Technology 168 (2005) 280-285. |
Zhu, Minguang et al., “Improving the strength of brazed joints to alumina by adding carbon fibres”, Chapman & Hall, 0022-2461, 1997, pp. 5321-5333, Apr. 17, 1997. |
Blugan, Gurdial et al., “Brazing of silicon nitride ceramic composite to steel using SiC-particle-reinforced active brazing alloy”, Ceramics International, 0272-8842, 2006, Elsevier Ltd. |
U.S. Appl. No. 11/791,269, Office Action mailed Dec. 27, 2010. |
U.S. Appl. No. 11/791,258, Office Action mailed Feb. 16, 2011. |
European Examination Report mailed Feb. 14, 2011, for Application No. 08 768 912.1-3122. |
JP patent application No. 2007-543579, Office Action mailed Jan. 25, 2011. |
European Examination Report mailed Jun. 17, 2011 for Application No. 08770865.7. |
U.S. Appl. No. 11/791,258, Office Action mailed Aug. 18, 2011. |
U.S. Appl. No. 11/791,269, Office Action mailed Sep. 30, 2011. |
U.S. Appl. No. 12/304,191, Office Action mailed Sep. 30, 2011. |
EP patent application No. 05857587.9, Examination Report mailed Aug. 15, 2011. |
MY patent application No. PI 20055579, Substantive Examination Adverse Report mailed Aug. 15, 2011. |
CN patent application No. 200680055443.4, Second Office Action mailed Jul. 12, 2011. |
PH patent application No. 12008502790, Office Action mailed Sep. 12, 2011. |
EP patent application No. 08826523.6, Extended Search Report mailed Aug. 30, 2011. |
U.S. Appl. No. 11/791,270, Office Action mailed Jul. 27, 2011. |
U.S. Appl. No. 11/791,258, Office Action mailed Dec. 6, 2011. |
JP patent application No. 2007-543579, Final Decision of Rejection mailed Oct. 4, 2011. |
CA patent application No. 2,627,863, Office Action mailed Nov. 17, 2011. |
JP patent application No. 2007-543481, Office Action mailed Nov. 29, 2011. |
JP patent application No. 2009-521730, Office Action mailed Oct. 25, 2011. |
RU patent application No. 2010147046/20(067957), Office Action of the Formal Examination mailed May 4, 2011. |
MY patent application No. PI20055578, substantive examination mailed Dec. 30, 2011. |
KR patent application No. 10-2007-7009946, Notification of Provisional Rejection mailed Jan. 20, 2012. |
IN patent application No. 2386/KOLN/2007, First Examination Report mailed Jan. 31, 2012. |
EP patent application No. 06836096.5, Supplementary European Search Report mailed Feb. 3, 2012. |
Ishida et al., NGK Spark Plug Co. Ltd., abstract of JP 19830079832, Thomson Scientific, XP-002667365, Nov. 21, 1984. |
Fujiki et al., Kobe Steel Ltd., abstract of JP 19960109959, Thomson Scientific, XP-002667366, Nov. 18, 1997. |
AU patent application No. 2008279577, Examiner's first report mailed Jan. 27, 2012. |
PH patent application No. 12010500175, Office Action mailed Feb. 2, 2012. |
RU patent application No. 2010136676/20, Office Action of the Formal Examination mailed Jan. 17, 2011. |
U.S. Appl. No. 11/791,270, Office Action mailed Mar. 15, 2012. |
TW patent application No. 094141908, Search Report mailed Mar. 19, 2012. |
U.S. Appl. No. 12/304,191, Notice of Allowance mailed May 14, 2012. |
U.S. Appl. No. 12/082,320, Office Action mailed Apr. 13, 2011. |
U.S. Appl. No. 12/082,320, Office Action mailed Nov. 9, 2011. |
U.S. Appl. No. 12/082,320, Office Action mailed Mar. 28, 2012. |
U.S. Appl. No. 10/061,127, Office Action mailed Jun. 23, 2004. |
U.S. Appl. No. 10/061,127, Notice of Allowance mailed Jan. 5, 2005. |
U.S. Appl. No. 10/724,558, Notice of Allowance mailed Sep. 9, 2004. |
U.S. Appl. No. 11/042,788, Office Action mailed Jan. 16, 2007. |
U.S. Appl. No. 11/042,788, Office Action mailed Jan. 31, 2008. |
U.S. Appl. No. 11/042,788, Office Action mailed Sep. 3, 2008. |
U.S. Appl. No. 11/042,788, Office Action mailed Oct. 30, 2008. |
U.S. Appl. No. 11,042,788, Notice of Allowance mailed Mar. 9, 2009. |
U.S. Appl. No. 09/626,629, Office Action mailed May 9, 2002. |
U.S. Appl. No. 09/626,629, Notice of Allowance mailed Aug. 13, 2002. |
U.S. Appl. No. 10/273,812, Office Action mailed Nov. 30, 2004. |
U.S. Appl. No. 10/273,812, Office Action mailed Mar. 21, 2005. |
U.S. Appl. No. 10/273,812, Notice of Allownce mailed Aug. 3, 2005. |
U.S. Appl. No. 11/260,009, Office Action mailed Feb. 17, 2006. |
U.S. Appl. No. 11/260,009, Notice of Allowance mailed Apr. 28, 2006. |
U.S. Appl. No. 11/471,774, Notice of Allowance mailed Oct. 30, 2007. |
U.S. Appl. No. 12/027,183, “Structures and fabrication techniques for solid state electrochemical devices,” Visco et al., filed Feb. 6, 2008. |
EP1228546, “Structures and fabrication techniques for solid state electrochemical devices,” Visco et al., Aug. 7, 2002, abstract. |
Seabaugh et al., “Low-cost fabrication processes for solid oxide fuel cells,” NexTech exhibited at the Fuel Cells 2000 Conference in Protland, Oct. 30, 2000-Nov. 2, 2000, NexTech Materials, Ltd. |
Fujii et al., “Manufacturing and characterization of metallic system support tube for solid oxide fuel cells,” Bulletin of the Electrotechnical Laboratory, vol. 62, No. 1-2, 1998, p. 1319. |
Momma et al., “High potential performance of tubular type SOFC using metallic system components,” Electrotechnical Laboratory, Electrochemical Proceedings vol. 97-40, Jun. 1997, pp. 310-321. |
Okuo et al., “Development of metallic substrate tubular SOFC,” Electrotechnical Laboratory, Oct. 1994, pp. 908-919. |
Okua et al., “Improvement in power stability and durability demonstration on new tubular type SOFC using metallic system component,” vol. 60, No. 5, 1996, pp. 1-9. |
Schiller et al., “Development of metallic substrate supported thin-film SOFC by applying plasma spray techniques,” Electrochemical Society Proceedings, vol. 99-19, Oct. 1999, pp. 892-903. |
Schiller et al., “Development of plasma sprayed components for a new SOFC Designs,” Electrochemical Proceedings, vol. 97-40, Oct. 1999, pp. 634-645. |
Schiller et al., “Development of SOFC components by vacuum plasma spraying,” 1998, pp. 515-518. |
Takenoiri et al., “Development of metallic substrate supported planar SOFC at Fuji Electric,” Fuel Cell Seminar Bastracts, Nov. 1998, pp. 84-87. |
Unal, et al., “Microstructures of Y2O3-Stabilized ZrO2 Electron Beam-Physical Vapor Deposition Coatings on Ni-Base Superalloys”, Department of Materials Science and Engineering, vol. 984-92, 1994, pp. 984-992. |
Wallin, et al., “Cofired Solid Oxide Fuel Cells for Operation at 800° C”, 1997, Abstract. |
Yao, et al, “Improved preparation procedure and properties for a multiplayer piezoelectric thick-film actuator”, Sensors and Actuators A 71, Received Dec. 9, 1997; received in revised form Apr. 27, 1998; accepted May 1, 1998, pp. 139-143. |
“Mfg. Oxygen Sensor—Involves Applying Catalyst Metal Salt Soln. To Sintered Electrolyte, Reducing, Firing, Again Applying Metal Salt Soln. and Firing”, Matsushita Elec Ind Co Ltd [MATU], 1979JP-0078760 (Jun. 21, 1979), (abstract), pp. 1-2. |
CN patent application No. 200880128414.5, First Office Action issued Mar. 20, 2012. |
PH patent application No. 12008502790, Office Action mailed Apr. 27, 2012. |
RU patent application No. 2010105992/07, Office Action mailed Apr. 4, 2012. |
PH patent application No. 12010500175, Office Action mailed May 23, 2012. |
CN patent application No. 200680055443.4, Third Office Action mailed Apr. 16, 2012. |
U.S. Appl. No. 11/791,258, Office Action mailed Jun. 7, 2012. |
Ishihara et al., “Electrophoretic deposition of Y2O3-stabilized ZrO2 electrolyte films in solid oxide fuel cells,” J. Am. Ceram. Soc. 79 (4) 913-19 (1996), Jan. 26, 1995. |
Ishihara et al., “Electrophoretic deposition of Y2O3-stabilized ZrO2 on the porous La0.8Sr02MnO3 cathode substrate for SOFC,” Proceedings of the 4th International Symposium on Solid Oxide Fuel Cells, Electrochemical Society, 1995. |
U.S. Appl. No. 11/791,258, Notice of Allowance mailed Jul. 25, 2012. |
U.S. Appl. No. 13/599,362, “Structure and fabrication techniques for solid state electrochemical devices,” Visco et al., filed Aug. 30, 2012. |
U.S. Appl. No. 12/027,183, Notice of Allowance mailed Jul. 18, 2012. |
CN patent application No. 200880108590.2, Office Action mailed Jun. 1, 2012. |
PH patent application No. 12008502790, Office Action mailed Jul. 4, 2012. |
U.S. Appl. No. 12/664,646, Office Action mailed Sep. 13, 2012. |
U.S. Appl. No. 11/791,270, Office Action mailed Nov. 9, 2012. |
U.S. Appl. No. 13/599,362, Office Action mailed Nov. 6, 2012. |
U.S. Appl. No. 13/637,642, “Method of making electrochemical device with porous metal layer,” Tucker et al., filed Sep. 26, 2012. |
ID patent application No. W00201003079, Notification of Result of Substantive Examination Step I mailed Jun. 1, 2012. |
ID patent application No. W00201003962, Notification of Result of Substantive Examination Step I mailed Jun. 18, 2012. |
EP patent application No. 08826523.6, Examination Report mailed Oct. 23, 2012. |
U.S. Appl. No. 12/304,191, Notice of Allowance mailed Nov. 15, 2012. |
RU patent application No. 2010147046/07, Office Action mailed Oct. 19, 2012. |
RU patent application No. 2010105992/07, Resolution on granting patent for invention mailed Sep. 6, 2012. |
MY patent application No. PI2010000360, Substantive Examination mailed Dec. 31, 2012. |
CN patent application No. 200680055443.4, Fourth Office Action mailed Nov. 21, 2012. |
EP patent application No. 08 768 912.1, Communication under Rule 71(3) EPC, Intent to Grant, mailed Jul. 14, 2011. |
U.S. Appl. No. 12/664,646, Office Action mailed Mar. 1, 2013. |
U.S. Appl. No. 11/791,269, Office Action mailed Mar. 17, 2011. |
U.S. Appl. No. 11/791,269, Office Action mailed Mar. 14, 2013. |
Yaws, Carl L., “Table 1. Physical Properties—inorganic compounds,” Yaws' Critical Property Data for Chemical Engineers and Chemists, Knovel, 2012. |
CN patent application No. 200680055443.4, Office Action mailed Feb. 6, 2013. |
RU patent application No. 2007124482/02, Office Action mailed Nov. 2, 2009. |
MY patent application No. PI2010004878, Certificate of Grant dated Jan. 31, 2013. |
JP patent application No. 2011-504989, Office Action mailed Feb. 19, 2013. |
ID patent application No. W-00201003962, Notification of Allowance to be Granted, mailed Oct. 29, 2012. |
EP patent application No. 08770865.7, Communication under Rule 71(3) Intent to Grant, mailed Nov. 15, 2011. |
CN patent application No. 200880129911.7, First Office Action, mailed Nov. 28, 2012. |
RU patent application No. 2009106930, Certificate of Grant, registered Oct. 27, 2011. |
PH patent application No. 12008502790, Notice of Allowance, mailed Sep. 7, 2012. |
AU patent application No. 2005327925, Notice of Acceptance, mailed Jan. 12, 2011. |
PH patent application No. 1/2010/502361, Examination Report mailed Apr. 4, 2013. |
U.S. Appl. No. 11/791,270, Notice of Allowance mailed Mar. 15, 2013. |
U.S. Appl. No. 13/599,362, Office Action mailed Apr. 17, 2013. |
U.S. Appl. No. 12/865,956, Office Action mailed Apr. 24, 2013. |
CN patent application No. 200880108590.2, Second Office Action mailed Apr. 2, 2013. |
Number | Date | Country | |
---|---|---|---|
20110104586 A1 | May 2011 | US |
Number | Date | Country | |
---|---|---|---|
61046313 | Apr 2008 | US |