Claims
- 1. A subbase coating composition for photolithographic plates comprising a salt formed from the reaction product of a water soluble polyacrylic resin containing carboxy groupings and a polyalkylenimine-urea-aldehyde resin, said polyacrylic resin being selected from the group consisting of polymers of acrylamide, hydrolyzed acrylamide, acrylic acids and salts thereof, and having a molecular weight range of from 10,000 to 200,000, wherein said polyalkylenimine-urea-aldehyde resin is a product made according to a process which comprises the steps of:
- a. heating and reacting a polyalkylenimine resin having the following general formula: ##STR2## wherein R.sub.1 and R.sub.2 are alike or different and are selected from the group consisting of hydrogen, lower alkyl, water and urea to form from about 10 to about 30 percent of a polyurea reaction product, while water and ammonia are removed;
- b. adding thereto and reacting additional urea;
- c. methylolating the reaction mixture with an aldehyde to form said polyalkylenimine-urea-aldehyde resin;
- wherein said salt is characterized by the reaction of carboxy groups of said polyacrylic resin with the tertiary amino groups of the polyalkylenimine resin.
- 2. The composition of claim 1 wherein the polyalkylenimine-urea-aldehyde resin is a polyethylenimine-urea-formaldehyde resin.
- 3. The composition of claim 1 wherein the polyalkylenimine resin has a molecular weight of from 500 to 20,000.
- 4. The composition of claim 1 wherein the polyalkylenimine resin has a molecular weight of from 600 to 2,000.
- 5. The composition of claim 1 wherein the polyalkylenimine resin is polyethylenimine or polypropylenimine.
- 6. The composition of claim 1 wherein urea is reacted with the polyalkylenimine.
- 7. The composition of claim 1 wherein a nitrogen containing material selected from the group consisting of melamine, benzoguanamine and dodecylaminopropylamine is included in the reaction mass with the additional urea.
- 8. The composition of claim 7 wherein the nitrogen containing material is added to the reaction mass after methylolation.
Parent Case Info
This is a continuation of application Ser. No. 455,635 , filed Mar. 28, 1974 now abandoned which is a continuation of application Ser. No. 247,205 filed Apr. 24, 1972 now abandoned which in turn is a division of application Ser. No. 97,394 filed Dec. 4, 1970 now U.S. Pat. No. 3,690,880.
US Referenced Citations (9)
Divisions (1)
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Number |
Date |
Country |
Parent |
97394 |
Dec 1970 |
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Continuations (2)
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Number |
Date |
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Parent |
455635 |
Mar 1974 |
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Parent |
247205 |
Apr 1972 |
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