BRIEF DESCRIPTION OF THE DRAWINGS
Embodiments will now be described, by way of example only, with reference to the accompanying drawings which are meant to be exemplary, not limiting, and wherein like elements numbered alike in several figures, in which:
FIG. 1 is a schematic cross-sectional view showing an example of a layer structure of an intermediate transfer member,
FIG. 2 is a diagram showing an example of a measuring device employing a nano indentation method,
FIG. 3 shows a typical load-displacement curve obtained by a nano indentation method,
FIG. 4 is a diagram showing a contacting situation between an indenter and a sample, and
FIG. 5 is a cross-sectional diagram showing an example of an image forming apparatus capable of using an intermediate transfer member of the present invention,
FIG. 6 is a cross-sectional diagram showing a manufacturing apparatus of intermediate transfer members employing an atmospheric pressure plasma CVD method specifically called a direct method in which a discharge space and a thin film deposition region are roughly identical,
FIG. 7 is a cross-sectional diagram showing another example of a manufacturing apparatus of intermediate transfer members employing an atmospheric pressure plasma CVD method relating to the apparatus shown in FIG. 6, and
FIG. 8 is an enlarged view showing the manufacturing apparatus of intermediate transfer members shown in FIG. 6.