Claims
- 1. A process to produce a compound of the formula ##STR5## wherein X and Y are selected from the group consisting of hydrogen, halogen and trifluoromethyl and R.sub.1 is hydrogen or lower alkyl which comprises:
- (A) reacting a compound of the formula ##STR6## wherein X and Y are as above with a hydroxylamine salt at from 0.degree. C. to about 200.degree. C. and thereafter reacting the resultant product with a lower alkyl ketone in the presence of a copper salt at from about room temperature to reflux temperature
- (B) reacting the product of (A) with water in the presence of a dilute strong acid at from about 0.degree. C. to about 80.degree. C.
- (C) reacting the product (A) or (B) with a compound of the formula ##STR7## wherein R.sub.1 is as above and Z is a suitable leaving group at from about room temperature to about 120.degree. C. and
- (D) reacting the product of (C) with a base at from about -10.degree. C. to about 100.degree. C.
Parent Case Info
This is a division of application Ser. No. 105,823, filed Dec. 20, 1979.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
4166185 |
Walser et al. |
Aug 1979 |
|
4170649 |
Liepmann et al. |
Oct 1979 |
|
Foreign Referenced Citations (1)
Number |
Date |
Country |
2540522 |
Apr 1976 |
DEX |
Divisions (1)
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Number |
Date |
Country |
Parent |
105823 |
Dec 1979 |
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