Claims
- 1. A method securing a cap to a silicon die comprising:
forming a thin glass particle layer on a bonding area of the cap; heating the cap and the thin glass particle layer on the bonding area to form a substantially continuous glass layer on the bonding area; and heating the cap and silicon die to a temperature above the melting point of the glass to form a bond between the cap and the silicon die.
- 2. The method of claim 1 further comprising:
forming a contact between a bonding area of the cap and a glass particle material; and heating the cap and glass particle material to a first temperature above a bum off temperature of binders in the glass particle material, but below the melting temperature of glass particles in the glass particle material, to form the thin glass particle layer on the bonding area.
- 3. The method of claim 1 further comprising clamping the cap and silicon die together with an amount of force sufficient to bring each piece in contact.
- 4. The method of claim 1 wherein the cap and silicon die are heated in a chamber with a controlled pressure.
- 5. The method of claim 4 wherein the controlled pressure is a vacuum.
- 6. The method of claim 2 wherein the glass particle material is a non-adhesive glass particle film.
- 7. The method of claim 6 further comprising moistening the glass particle film with a solvent.
- 8. The method of claim 2 wherein the glass particle material is an adhesive glass particle film.
- 9. The method of claim 2 wherein the glass particle material is an glass paste and the contact is formed by a screening process.
- 10. A method securing a cap to a silicon die comprising:
forming a contact between a bonding area of the cap and a glass particle material; heating the cap and glass particle material to a first temperature above a burn off temperature of binders in the glass particle material, but below the melting temperature of glass particles in the glass particle material, to form a thin glass particle layer on the bonding area; heating the cap and the thin glass particle layer on the bonding area to a second temperature above the melting temperature of the glass particles in the glass particle layer to form a substantially continuous glass layer on the bonding area; forming a contact between the bonding area of the cap and the silicon die; and heating the cap and silicon die to a temperature above the melting point of the glass to form a bond between the cap and the silicon die.
- 11. The method of claim 10 wherein the cap and silicon die are heated in a chamber with a controlled pressure.
- 12. The method of claim 11 wherein the controlled pressure is a vacuum.
- 13. The method of claim 10 wherein the glass particle material is a non-adhesive glass particle film.
- 14. The method of claim 13 further comprising moistening the glass particle film with a solvent.
- 15. The method of claim 14 wherein the solvent is acetone.
- 16. The method of claim 10 wherein the glass particle material is an adhesive glass particle film.
- 17. An article of manufacture prepared by a process comprising the steps of:
forming a thin glass particle layer on a bonding area of a cap; heating the cap and the thin glass particle layer on the bonding area to form a substantially continuous glass layer on the bonding area; and heating the cap and silicon die to a temperature above the melting point of the glass to form a bond between the cap and the silicon die.
- 18. The article of manufacture prepared by the process of claim 17 wherein the process further comprises:
forming a contact between a bonding area of the cap and a glass particle material; and heating the cap and glass particle material to a first temperature above a burn off temperature of binders in the glass particle material, but below the melting temperature of glass particles in the glass particle material, to form the thin glass particle layer on the bonding area.
- 19. A pressure sensor comprising:
a silicon die having a diaphragm portion and a frame portion; a cap having an extended region and bonding area; and a continuous glass layer between bonding area of the cap and the frame portion of the silicon die formed by heat treating glass particles on the bonding area of the cap, wherein an area above the diaphragm and below the cap define a reference cavity and the continuous glass layer is localized to the bonding area and completely seals the reference cavity.
- 20. A pressure sensor comprising:
a silicon die having a diaphragm portion and a frame portion; a cap having a bonding area; and heat treated glass particle means for bonding the cap to the silicon die, wherein the heat treated glass particle means are localized to the bonding area for securing the bonding area to the frame portion of the silicon die.
- 21. The pressure sensor of claim 20 wherein the heat treated glass particle means are treated at a first temperature during a first processing step, and the heat treated glass particle means are treated at a second temperature higher than the first temperature during a second processing step.
CROSS REFERENCES TO RELATED APPLICATIONS
[0001] The present application is a continuation-in-part of application Ser. No. 09/489,560, filed Jan. 19, 2000 which is hereby incorporated by reference in its entirety.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09489560 |
Jan 2000 |
US |
Child |
09908463 |
Jul 2001 |
US |