Claims
- 1. A large-sized quartz glass preform comprising:
- (a) a large-sized quartz glass tube having an outer diameter falling in a range from 50 mm.phi. to 300 mm.phi.; an outer to inner diameter ratio falling in a range from 2.5 to 7, a wall thickness being 10 mm or more, a wall thickness error being 2% or less, an inner surface roughness of 20 .mu.m or less, wherein the large-sized quartz glass tube is a high purity synthetic quartz glass tube; and
- (b) a core glass rod for an optical fiber combined integrally with the large-sized quartz glass tube, where the refractive index of the glass tube differs within 0.02% from a predetermined value relative to the refractive index of the core glass rod.
- 2. The large-scale quartz glass preform set forth in claim 1, wherein the large-sized quartz glass tube is a large-sized primary treated quartz glass tube produced in accordance with steps of:
- (a) perforating a quartz glass mother material with a mechanical perforator;
- (b) grinding, abrading and finishing inner and outer surfaces of the perforated mother material by high precision honing;
- (c) grinding an outer surface of the perforated mother material by peripheral grinding;
- (d) etching the inner and outer surfaces with hydrofluoric acid; and
- (e) subsequently washing the mother material.
- 3. The large-scale quartz glass preform set forth in claim 1, wherein the large-sized quartz glass tube is a large-sized primary treated quartz glass tube produced in accordance with steps of:
- (a) perforating a cylindrical quartz glass mother material by a hot carbon drill press-in process;
- (b) grinding an outer surface of the perforated mother material by a peripheral grinding;
- (c) etching inner and outer surfaces of the perforated mother material; and
- (d) subsequently washing the mother material.
Priority Claims (4)
Number |
Date |
Country |
Kind |
4-332203 |
Nov 1992 |
JPX |
|
5-226669 |
Aug 1993 |
JPX |
|
5-226670 |
Aug 1993 |
JPX |
|
5-226671 |
Aug 1993 |
JPX |
|
Parent Case Info
This is a continuation of application Ser. No. 08/154,692, filed Nov. 18, 1993, now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (3)
Number |
Date |
Country |
52-92530 |
Apr 1977 |
JPX |
52-134623 |
Nov 1977 |
JPX |
2 109 367 |
Jun 1983 |
GBX |
Non-Patent Literature Citations (3)
Entry |
Application Technology of High-Purity Silica, CMC Co., Ltd., Mar. 1, 1991 pp. 103-106. |
High Precision Machining, Kogyo Chosakai Publishing Co., Ltd., Aug. 30, 1984, p. 421. |
Vapor-Phase Verneuil Method, General National Conference of Electronic Communication Society, 1977, pp. 4-96. |
Continuations (1)
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Number |
Date |
Country |
Parent |
154692 |
Nov 1993 |
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