Claims
- 1. A process for fast switching of a gas from a conducting state to an insulating state comprising:
- in the absence of light, introducing an electron source to a gas mixture of a buffer gas contained in said switch that is an inert, nonelectron attaching, high vapor pressure gas with the lowest excited state lying at energies above the laser photon energy and a compound which attaches electrons when electronically exicted, said mixture being in a gas chamber containing two electrodes, thereby creating an conducting environment within said chamber;
- removing said electron source;
- directing a laser light at said gas mixture thereby affecting the attachment of low energy electrons, wherein said electron attachment is caused by the molecules of said compound, first, being optically excited to a high lying optically allowed transition state, second, being internally converted to the lowest optically allowed state, third, undergoing intersystem crossing to the triplet state, remaining in the triplet for a relatively long time and capturing low energy electrons efficiently while in the triplet state.
- 2. The process of claim 1 wherein said compound is C.sub.6 H.sub.5 SH, C.sub.6 H.sub.5 SCH.sub.3, CH.sub.3 CHO, or CF.sub.3 CHO.
- 3. A diffuse discharge switch comprising: a chamber containing a gas mixture of a buffer gas that is inert, nonelectron attaching, high vapor pressure gas with the lowest excited state lying at energies above the laser photon energy and a compound which attaches electrons when elec tronically excited by molecules of said compound first being optically excited to a high lying optically allowed transition state second, being internally converted to the lowest optically allowed state, third, undergoing intersystem crossing to the triplet state, remaining in the triplet state for a relatively long time and capturing low energy electrons efficiently while in the triplet state; an electron source; two electrodes; and a means for transporting an electric current through said chamber.
- 4. A diffuse discharge switch claim 3, wherein said gas mixture is C.sub.6 H.sub.5 SH, C.sub.6 H.sub.5 SCH.sub.3, CH.sub.3 CHO or CF.sub.3 CHO.
- 5. A gas mixture for fast switching in a diffuse discharge switch comprising a buffer gas contained in said switch that is an inert, nonelectron attaching, high vapor pressure gas with the lowest excited state lying at energies above the laser photon energy and a compound that when exposed to a laser light the molecules of said compound, first, are optically excited to a high lying singlet state, second, are internally converted to the lowest optically allowed state and, third, undergo intersystem crossing to the triplet state and remain in the triplet state for a relatively long time.
- 6. The gas mixture claim 5 wherein said compound is C.sub.6 H.sub.5 SH, C.sub.6 H.sub.5 SCH.sub.3, CH.sub.3 CHO, or CF.sub.3 CHO.
Government Interests
This invention is an optical switch containing a gas mixture capable of rapidly removing free electrons from a system and was developed pursuant to a contract with the United States Department of Energy.
US Referenced Citations (5)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2099627 |
Dec 1982 |
GBX |
Non-Patent Literature Citations (2)
Entry |
Schoenback et al, "An Optically Controlled Diffuse Discharge Switch," Digest of Technical Papers, Jun. 1-3, 1981, pp. 142-146. |
Rossi, "Photoenhanced Electron Attachment of Vinylchloride and Trifluoroethylene at 193 nm," Appl. Phys. Lett. 47 (6), 15 Sep. 1985, pp. 576-578. |