Laser Annealing of Plasma Deposited High Critical Temperature Superconducting Thick Films and Devices (REU Supplement)

Information

• NSF Award
• 8822195

Owner

• American Research Corporation

• Award Id

  8822195

• Award Effective Date

  6/1/1989 - 35 years ago

• Award Expiration Date

  11/30/1991 - 33 years ago

• Award Amount

  $ 241,000.00

• Award Instrument

  Standard Grant

This research includes an analysis and extension of the plasma spray process, the establishment of laser annealing parameters, development of laser etching techniques, design and fabrication of thick film devices for high frequency applications, acquisition of families of test data, and optimization of a proof-of-concept system using plasma spraying, laser annealing, and laser etching for the fabrication of microwave, millimeterwave and sub-millimeterwave devices. An important aspect of this program lies in the development of processing techniques for large scale production of electronic and microwave components.

• Program Officer

  Ritchie B. Coryell

• Min Amd Letter Date

  5/31/1989 - 35 years ago

• Max Amd Letter Date

  4/5/1990 - 34 years ago

• ARRA Amount

• Name

  American Research Corporation of Virginia

• City

  Radford

• State

  VA

• Country

  United States

• Address

  PO Box 3406

• Postal Code

  241433406

• Phone Number

  5407310655

• First Name

  Russell

• Last Name

  Churchill

• Email Address

  arcova@swva.net

• Start Date

  6/1/1989 12:00:00 AM

• Name

  Engineering NEC

• Code

  59

• Name

  Industrial Technology

• Code

  308000