Claims
- 1. A method for forming a diamond coating on a substrate consisting of WC—Co, the method including the steps of:forming a sample preparation station including a substrate support, an array of lasers and at least two gas outlets disposed about said substrate support, said array of lasers being taken from one or more of the group consisting of an excimer laser, a YAG:Nd laser, and a CO2 laser; placing said substrate on said substrate support; exposing said substrate to a gas environment from said at least two gas outlets, said gas environment being selected from the group consisting of N2 gas and CO2 gas; and activating said array of lasers to create a plasma about said substrate.
- 2. The method of claim 1, wherein said array of lasers includes at least two excimer lasers.
- 3. The method of claim 1, wherein one of said gas outlets is connected to a source of N2 gas and the other of said gas outlets is connected to a source of CO2 gas.
- 4. The method of claim 1, wherein said plasma is formed a few mm about an insert.
- 5. The method of claim 1, wherein the duration of the deposition process is about 40 seconds.
- 6. The method of claim 1, wherein the resulting diamond coating is in the range of between 20 and 40 μm thick.
- 7. The method of claim 1, wherein the coating grows vertically at the rate of about 1 μm/s.
- 8. A method for forming a diamond coating on a substrate consisting of WC—Co, the method including the steps of:forming a sample preparation station including a substrate support, an array of lasers and at least two gas outlets disposed about said substrate support, said array of lasers being taken from one or more of the group consisting of an excimer laser, a YAG:Nd laser, and a CO2 laser; providing a first source of gas connected to one of said at least two gas outlets; providing a second source of gas connected to the other of said at least two gas outlets, said each of said gases being different from the other, one of said gas outlets being connected to a source of N2 gas and the other of said gas outlets being connected to a source of CO2 gas; placing said substrate on said substrate support; exposing said sample substrate to a gas environment comprised of said N2 gas and said CO2 gas; activating said array of lasers to create a plasma about said substrate; and allowing said substrate to be exposed to said plasma for a selected duration.
- 9. The method of claim 8, wherein said array of lasers includes at least two excimer lasers.
- 10. The method of claim 8, wherein said array of lasers includes an excimer laser, a YAG:Nd laser, and a CO2 laser.
- 11. The method of claim 1, wherein said plasma is formed a few mm about an insert.
- 12. The method of claim 1, wherein the duration of the deposition process is abort 40 seconds.
- 13. The method of claim 8, wherein the resulting diamond coating is in the range of between 20 and 40 μm thick.
- 14. The method of claim 8, wherein the coating grows vertically at the rate of about 1 μm/s.
- 15. A method for forming a diamond coating on a substrate consisting of WC—Co, the method including the steps of:forming a sample preparation station including a substrate support, an array of lasers and at least two gas outlets disposed about said substrate support, said array of lasers being taken from one or more of the group consisting of an excimer laser, a YAG:Nd laser, and a CO2 laser; providing a first source of gas connected to one of said at least two gas outlets; providing a second source of gas connected to the other of said at least two gas outlets, said each of said gases being different from the other, one of said gas outlets being connected to a source of N2 gas and the other of said gas outlets being connected to a source of CO2 gas; placing said substrate on said substrate support; exposing said substrate to a gas environment comprised of said N2 gas and said CO2 gas; activating said array of lasers to create a plasma about said substrate; and allowing said substrate to be exposed to said plasma for a selected duration, whereby said coating grows vertically at a rate of about 1 μm/s.
- 16. The method of claim 15, wherein said array of lasers includes at least two excimer lasers.
- 17. The method of claim 15, wherein said array of lasers includes an excimer laser, a YAG:Nd laser, and a CO2 laser.
- 18. The method of claim 15, wherein said plasma is formed a few mm from said substrate.
- 19. The method of claim 15, wherein the duration of the coating process is about 40 seconds.
Parent Case Info
This application claims Provisional to application Serial No. 60/093,461, filed Jul. 20, 1998.
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Provisional Applications (1)
|
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Date |
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|
60/093461 |
Jul 1998 |
US |