Claims
- 1. A process for producing NF.sub.4 BF.sub.4 comprising placing the gases NF.sub.3, BF.sub.3 and a gaseous compound that gives up fluorine when subjected to laser energy in a reaction container at room temperature and subjecting the gases to a CO.sub.2 laser source for irradiating the reaction chamber and producing NF.sub.4 BF.sub.4 as a precipitate.
- 2. A process for producing NF.sub.4 BF.sub.4 as set forth in claim 1, wherein said gaseous compound that gives up free fluorine is SF.sub.6, wherein said CO.sub.2 laser source is tuned to the P.sub.14 - P.sub.20 lines, and wherein said room temperature is about 25.degree. C .+-. 5.degree. C.
- 3. A process for producing NF.sub.4 BF.sub.4 as set forth in claim 2, wherein said gases are continuously passed through a flow system and said CO.sub.2 laser source is pulsed to produce substantial quantities of the product NF.sub.4 BF.sub.4.
- 4. A process for producing NF.sub.4 BF.sub.4 as set forth in claim 1, wherein said gaseous compound that gives up free fluorine is N.sub.2 F.sub.4, wherein said CO.sub.2 radiation is tuned to the P.sub.14 - P.sub.20 lines, and wherein said room temperature is about 25.degree. C .+-. 5.degree. C.
- 5. A process for producing NF.sub.4 BF.sub.4 as set forth in claim 4, wherein said gases continuously flow through a flow system and said CO.sub.2 laser source is pulsed to produce substantial quantities of the product NF.sub.4 BF.sub.4.
- 6. A process for producing NF.sub.4 BF.sub.4 as set forth in claim 3, wherein said gases are present in an amount of about 1 mole ratio each.
- 7. A process for producing NF.sub.4 BF.sub.4 as set forth in claim 5, wherein said gases are present in an amount of about 1 mole ratio each.
DEDICATORY CLAUSE
The invention described herein may be manufactured, used, and licensed by or for the Government for governmental purposes without the payment to me of any royalties thereon.
Foreign Referenced Citations (1)
Number |
Date |
Country |
690,681 |
Jul 1964 |
CA |