This SBIR Phase II award addresses laser crystallization of spin-on ferroelectric thin films for applications in ferroelectric non-volatile random access memories (FNVRAM). This process affords precise control of temperature in fabrication of lead zirconate titanate (PZT) ferroelectric thin films on large area aluminized silicon wafers. Commercial applications of the technology included VLSIC manufacture and production of FVNRAMs, surface acoustic wave filters, high speed packages, piezoelectric transducers, pyroelectric sensors, and electronic and electro-optic devices.