Laser diode and method of manufacturing the same

Abstract
A laser capable of improving surge withstand voltage by preventing damage to a read end surface, and a method of manufacturing the same are provided. A laser diode includes a laser resonator between a first end surface as a main emmission end surface and a second end surface facing the first end surface, and the laser diode includes a light absorption inhibition region on the second end surface side of the laser resonator.
Description

BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a sectional view of a laser diode according to an embodiment of the invention;



FIG. 2 is a plan view of the laser diode shown in FIG. 1 when viewed from a stripe-shaped portion side;



FIG. 3 is a plan view showing a modification of the laser diode shown in FIG. 2;



FIG. 4 is a plan view for describing a method of manufacturing the laser diode shown in FIG. 1;



FIG. 5 is a plan view for showing a modification of FIG. 4;



FIG. 6 is a plan view for describing a manufacturing step following a step shown in FIG. 4;



FIG. 7 is a plan view for describing a manufacturing step following the step shown in FIG. 6; and



FIG. 8 is a plan view for showing a modification of FIG. 7.


Claims
  • 1. A laser diode including a laser resonator between a first end surface as a main emission end surface and a second end surface facing the first end surface, the laser diode comprising: a light absorption inhibition region on the second end surface side of the laser resonator.
  • 2. The laser diode according to claim 1, further comprising: a gap between the second end surface and the light absorption inhibition region.
  • 3. The laser diode according to claim 1, wherein the light absorption inhibition region is an impurity-doped region.
  • 4. The laser diode according to claim 1, further comprising: a mirror film on each of the first end surface and the second end surface.
  • 5. The laser diode according to claim 4, wherein the mirror film on the second end surface includes a-Si.
  • 6. A method of manufacturing a laser diode, the laser diode including a laser resonator between a first end surface as a main emission end surface and a second end surface facing the first end surface, the method comprising the steps of: forming a semiconductor layer including a plurality of planned laser resonator regions;forming a light absorption inhibition region in the semiconductor layer along a position where the second end surface is planned to be formed; andforming the first end surface and the second end surface so that the light absorption inhibition region is disposed on the second end surface side of the laser resonator.
  • 7. The method of manufacturing a laser diode according to claim 6, wherein a gap is arranged between the second end surface and the light absorption inhibition region.
  • 8. The method of manufacturing a laser diode according to claim 6, wherein an impurity-doped region is formed as the light absorption inhibition region.
  • 9. The method of manufacturing a laser diode according to claim 6, further comprising the step of: forming a mirror film on each of the first end surface and the second end surface.
  • 10. The method of manufacturing a laser diode according to claim 9, wherein the mirror film on the second end surface includes a-Si.
Priority Claims (1)
Number Date Country Kind
2006-045312 Feb 2006 JP national