Number | Date | Country | Kind |
---|---|---|---|
196 03 637.2 | Feb 1996 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
3611436 | Rigrod | Oct 1971 | |
3775699 | Cassels | Nov 1973 | |
5150370 | Furuya et al. | Sep 1992 |
Number | Date | Country |
---|---|---|
60-205420 | Oct 1985 | JPX |
61-139950 | Jun 1986 | JPX |
Entry |
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Abstract and handouts of an Aug. 15-18, 1995 conference, in Colorado Springs, Colorado, from First International Symposium on 193nm Lithography, "ArF Excimer Laser with High Repetition Rate for DUV Lithography," by R. Patzel, I. Bragin, U. Rebhan & d. Basting, 21 pages in length. |
Y. G. Basov, "Telescopic and dispersive prism devices for laser technology," J. Opt. Technol., vol. 62 (3), Mar. 1995, pp. 141-152. |