This application is based upon and claims the benefit of priority from Japanese patent application No. 2023-050741, filed on Mar. 28, 2023, the disclosure of which is incorporated herein in its entirety by reference.
The present disclosure relates to a laser processing apparatus.
Regarding a laser processing apparatus that processes a workpiece by applying a laser beam thereto, a technique for determining whether the quality of the processing is good or poor by measuring light reflected from the workpiece is known.
For example, Japanese Unexamined Patent Application Publication No. 2023-020190 discloses a technique for determining whether the quality of laser processing is good or poor by measuring a measurement laser beam reflected on the surface of a workpiece.
The inventors have found the following problem in regard to such a laser processing apparatus.
In some cases, a laser beam is reflected on a structure or the like present in a laser processing apparatus, and the reflected laser beam enters a sensor. There is a possibility that when light reflected on any object or the like other than the surface of the workpiece enters a sensor, the accuracy of the measurement of reflected light reflected on the surface of the workpiece deteriorates.
The present disclosure has been made in view of the above-described problem, and an object thereof is to provide a laser processing apparatus having high accuracy of measurement of reflected light.
An aspect for achieving the above-described object is a laser processing apparatus including:
According to the present disclosure, it is possible to provide a laser processing apparatus having high accuracy of measurement of reflected light.
The above and other objects, features and advantages of the present disclosure will become more fully understood from the detailed description given hereinbelow and the accompanying drawings which are given by way of illustration only, and thus are not to be considered as limiting the present disclosure.
Embodiments according to the present disclosure will be described hereinafter in detail with reference to the drawings. The same or corresponding elements are assigned the same reference numerals (or symbols) throughout the drawings, and redundant descriptions thereof will be omitted as appropriate for clarifying the description.
A configuration of a laser processing apparatus according to a first embodiment will be described with reference to
The laser oscillator emits a laser beam having a predetermined wavelength. The laser processing apparatus 100 applies the laser beam emitted by the laser oscillator to the workpiece. As the laser beam is applied to the workpiece, it is laser-processed. A part of the laser beam applied to the workpiece is reflected on the surface of the workpiece. The sensor 10 is a sensor that measures the light reflected from the workpiece. The laser processing apparatus 100 determines whether the quality of the laser processing is good or poor based on the sensing result of the sensor 10.
An optical path 60 is an optical path of the reflected light from the workpiece to the sensor 10. As shown in
The lenses 30 are lenses for condensing (or focusing) the reflected light. The lenses 30 are arranged so as to condense (or focus) the reflected light near the sensor 10. A plurality of lenses 30 may be arranged as shown in
The plate-like member 20 is disposed in the middle of the optical path 60. When various members such as the lenses 30, the filters 40, and the reflector 50 are arranged on the optical path 60, the plate-like member 20 may be disposed between two of these members. For example, in the example shown in
The plate-like member 20 is a plate-like member formed by using a material that does not allow the reflected light to pass therethrough, and a through-hole 21 that penetrates from one surface of the plate-like member 20 to the other surface thereof is formed in the plate-like member 20. The plate-like member 20 is disposed at such a position that the reflected light passes through the through-hole 21. In other words, the through-hole 21 is provided at such a position in the plate-like member 20 that the reflected light passes through the through-hole 21. The sensor 10 measures intensity of the reflected light that has passed through the through-hole 21. In the example shown in
The shape of the through-hole 21 when the plate-like member 20 is viewed from one side of the plate-like member 20 toward the other side thereof, i.e., the shape of the through-hole 21 when the plate-like member 20 is viewed from the filter 40 side in the example shown in
The through-hole 21 is preferably provided in a position and preferably has an area (i.e., a size) in such a range that the light reflected from the surface of the workpiece can pass through the plate-like member 20 in order to increase the absorption ratio of light reflected from any object or the like other than the surface of the workpiece, and to enable the light reflected from the surface of the workpiece to sufficiently pass through the through-hole 21. That is, the through-hole 21 is preferably provided in such a position that the light reflected from the surface of the workpiece can pass through the through-hole 21, and has an area (i.e., a size) roughly equal to a range in which the reflected light can pass through near the plate-like member 20.
In some cases, the laser beam is reflected by a structure or the like present in the laser processing apparatus 100. Hereinafter, the light reflected by any object or the like other than the surface of the workpiece, i.e., the light reflected by a structure or the like present in the laser processing apparatus 100, is also referred to as “diffusely-reflected light”. The diffusely-reflected light travels along an optical path different from that of the light reflected on the surface of the workpiece. An optical path 70 shown in
Next, a configuration of a laser processing apparatus according to a second embodiment will be described with reference to
The tenses 90 are lenses designed to condense (e.g., focus) the reflected light near the plate-like member 80. In the example shown in
Next, results of measurement of reflected light using the laser processing apparatus 200 according to the second embodiment will be described with reference to
The graph shown in
The graph shown in
By the embodiments described above, it is possible to provide a laser processing apparatus having high accuracy of measurement of reflected light.
Note that the present disclosure is not limited to the above-described embodiments, and they can be modified as appropriate without departing the scope and spirit of the disclosure.
From the disclosure thus described, it will be obvious that the embodiments of the disclosure may be varied in many ways. Such variations are not to be regarded as a departure from the spirit and scope of the disclosure, and all such modifications as would be obvious to one skilled in the art are intended for inclusion within the scope of the following claims.
Number | Date | Country | Kind |
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2023-050741 | Mar 2023 | JP | national |