The disclosure relates to a layer system for coating a metal substrate to form a flow field plate, comprising at least one cover layer made of metal oxide. The disclosure further relates to a flow field plate comprising a metal substrate and such a layer system. Furthermore, the disclosure relates to a fuel cell, an electrolyzer or a redox flow cell comprising at least one such flow field plate.
A flow field plate for a fuel cell or an electrolyzer is already known from DE 100 58 337 A1, in which a conductive and corrosion-resistant protective coating made of a metal oxide is formed on at least one side of a metal sheet. The metal oxide is formed in particular from an oxide of the elements or alloys from the group comprising tin, zinc and indium.
US 2018/0053948 A1 describes a separator for a polymer electrolyte fuel cell. The separator made of ferritic stainless steel has an indium tin oxide coating.
It is the object of the disclosure to provide an improved layer system for a flow field plate and to provide such a flow field plate. Furthermore, it is the object of the disclosure to propose a fuel cell, an electrolyzer or a redox flow cell with at least one such flow field plate.
The object is achieved for the layer system for coating a metal substrate to form a flow field plate, the layer system comprising at least one cover layer made of metal oxide, at least one intermediate layer supporting the cover layer and a lower layer supporting the intermediate layer(s) is formed, the cover layer being formed from indium tin oxide (ITO), wherein the indium tin oxide is optionally doped with at least one element from the group comprising carbon, nitrogen, boron, fluorine, hydrogen, silicon, titanium, tin and zirconium, wherein the at least one intermediate layer is formed from titanium nitride and/or titanium carbide and/or titanium carbonitride and/or titanium niobium nitride (TiNbN) and/or titanium niobium carbide (TiNbC) and/or titanium niobium carbonitride (TiNbCN) and/or chromium nitride (CrN) and/or chromium carbide (CrC) and/or chromium carbonitride (CrCN), and wherein the lower layer is formed from titanium (Ti) or a titanium-niobium alloy (TiNb) or chromium (Cr).
The layer system is characterized by high long-term stability with simultaneously high electrical conductivity and low cost, and without precious metal. In addition, the layer system ensures excellent corrosion protection for a metal base material or substrate of a flow field plate.
The layer system is preferably made by a PVD or a CVD process (PVD: physical vapor deposition; CVD: chemical vapor deposition).
Cover layers made of indium tin oxide which have an indium content in the range from 70 to 90 vol % are particularly preferred here. Particular preference is given to indium content in the range from 75 to 85 vol %, which has high electrical conductivity.
The lower layer is used in particular as an adhesion promoter between a metal substrate and the at least one intermediate layer. Furthermore, the lower layer forms conductive oxides and thus provides galvanic corrosion protection for the metal substrate of a flow field plate. The lower layer preferably has a layer thickness in the range from 1 nm to 300 nm.
In particular, the intermediate layer is also used as an adhesion promoter between the lower layer and the cover layer. Furthermore, the at least one intermediate layer also forms conductive oxides and thus provides galvanic corrosion protection for the lower layer and the metal substrate of a flow field plate. The at least one intermediate layer also provides a barrier for hydrogen, so that it cannot penetrate in the direction of the metal substrate and damage it. A layer thickness of an individual intermediate layer is preferably selected in the range from 0.1 to 3.0 μm. However, there can be two or more intermediate layers.
The cover layer protects the lower layer and the intermediate layer(s) mechanically and from corrosive attack. The cover layer in particular has a layer thickness in the range from 0.01 to 15 μm, in particular in the range from 0.1 to 3 μm.
The layer system according to the disclosure, comprising the lower layer, at least one intermediate layer and the cover layer, preferably has a total thickness in the range from 0.1 to 20 μm.
Furthermore, it has proven useful if the cover layer is doped with at least one element from the group comprising carbon, nitrogen, boron, fluorine, hydrogen, silicon, titanium, tin, and zirconium of at most 35 at %, in particular in the range from 0.1 to 10 at %, particularly preferably in the range from 1 to 5 at %. In this case, the doping element or the doping elements are incorporated in the oxide crystal lattice of the indium tin oxide.
In this case, the doping can be present uniformly over the layer thickness of the cover layer. Alternatively, the amount of doping element(s) can increase in the direction of a free surface of the cover layer, such that a gradient layer is formed. A doping element or a plurality of doping elements can also be present in a manner implanted only in the free surface of the cover layer.
Doping the cover layer with carbon and/or silicon is particularly preferred. In particular, hydrogen is only present in traces in the cover layer.
In particular, the following layer systems for coating a metal substrate, preferably made of steel, in particular austenitic steel or austenitic stainless steel, have proven to be advantageous for forming a flow field plate:
The object is achieved for a flow field plate comprising a metal substrate and a layer system according to the disclosure with a structure of the flow field plate in the order:
metal substrate,
lower layer,
intermediate layer(s),
cover layer.
This is preferably a flow field plate with a metal substrate or a metal carrier plate, preferably made of steel, in particular made of austenitic steel or stainless steel. A carrier plate can be designed in one or more parts.
Number | Date | Country | Kind |
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10 2020 112 252.7 | May 2020 | DE | national |
This application is the U.S. National Phase of PCT Appln. No. PCT/DE2021/100347 filed Apr. 16, 2021, which claims priority to DE 10 2020 112 252.7 filed May 6, 2020, the entire disclosures of which are incorporated by reference herein.
Filing Document | Filing Date | Country | Kind |
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PCT/DE2021/100347 | 4/16/2021 | WO |