Led with alternated strain layer

Information

  • Patent Grant
  • 6417522
  • Patent Number
    6,417,522
  • Date Filed
    Thursday, December 2, 1999
    24 years ago
  • Date Issued
    Tuesday, July 9, 2002
    22 years ago
Abstract
The present invention relates to light omitting diodes having an AlGaInP active layer disposed between two cladding layers of AlGaInP, with a strain layer grown on the second cladding layer and comprising a superlattice structure in the form of a plurality of thin alternated AlGaInP layers with preselected composition. In one embodiment, the composition of the alternated AlGaInP layers is an ohmic n-electrode on a rear surface of a GaAs substrate: a distributed AlGaAs Bragg reflecting layer in the form of a multi-layer lamination; a first, lower AlGaInP cladding layer grown on the reflecting layer; an AlGaInP active layer grown on the lower cladding layer; a second, upper AlGaInP cladding layer grown on the active layer; a strain layer grown on the second cladding layer, the strain layer comprising a superlattice structure in the form of a plurality of thin alternated AlGaInP layers with the composition: (AlxGa1-x)1-yInyP/(AlnGa1-n)1-hInhP, where 0.5≦x≦1; 0.4≦y≦0.6/0≦a≦0.4; 0≦b≦0.4.
Description




BACKGROUND OF THE INVENTION




The present invention relates to light-emitting diodes (LEDs).




SUMMARY OF THE INVENTION




The present invention relates to light omitting diodes having an AlGaInP active layer disposed between two cladding layers of AlGaInP, with a strain layer grown on the second cladding layer and comprising a superlattice structure in the form of a plurality of thin alternated AlGaInP layers with preselected composition. In one embodiment, the composition of the alternated AlGaInP layers is an ohmic n-electrode on a rear surface of a GaAs substrate; a distributed AlGaAs Bragg reflecting layer in the form of a multi-layer lamination; a first, lower AlGaInP cladding layer grown on the reflecting layer; an AlGaInP active layer grown on the lower cladding layer; a second, upper AlGaInP cladding layer grown on the active layer; a strain layer grown on the second cladding layer, the strain layer comprising a superlattice structure in the form of a plurality of thin alternated AlGaInP layers with the composition: (Al


x


Ga


1-x


)


1-y


In


y


P/(Al


a


Ga


1-a


)


1-h


In


h


P, wherein 0.5≦x≦1; 0.4≦y≦0.6/0≦a≦0.4; 0≦b≦0.4.











BRIEF DESCRIPTION OF THE DRAWINGS




In the drawing, which constitutes a part of the specification, an exemplary embodiment exhibiting various objectives and features hereof is set forth. Specifically, the FIGURE constitutes a somewhat diagrammatic view of a light omitting diode constructed according to one embodiment of the present invention, shown in elevation.











According to the present invention, there is provided a LED having an alternated AlGaInP strain layer.




The present invention will now be described, by way of example, with reference to the accompanying drawing, which is a section through an example of an LED according to the invention.




DESCRIPTION OF THE PREFERRED EMBODIMENTS




Referring to the drawing, a light-emitting diode comprises: an ohmic n-electrode


1


on a rear surface of a GaAs substrate


2


; a distributed AlGaAs Bragg reflecting layer


3


to improve the luminous efficiency (the Bragg reflector layer being in the form of a multi-layer lamination); a first, lower AlGaInP cladding layer


4


grown on the layer


3


; an AlGaInP active layer


5


grown on the layer


4


; a second, upper AlGaInP cladding layer


6


grown on the layer


5


; an AlGaInP alternated strain layer


7


grown on the layer


6


; a window layer


8


grown on the layer


7


; and an ohmic p-electrode on the layer


8


.




A double hetero-junction or multi-quantum well structure could replace active layer


5


.




The alternated strain layer


7


is a structure consisting of thin alternated mismatched multi-layers. Also this structure can be described as a strain layer superlattices structure (SLS). It uses different compositions of (Al


x


Ga


1-x


)


1-y


In


y


P thin layers as dislocation traps to reduce the induced defect density from upper cladding layer


6


changing to window layer


8


. Also it is useful for modifying the band structure from high band gap upper cladding layer


6


to low band gap window layer


8


by changing the periodicity of (Al


x


Ga


1-x


)


1-y


In


y


P thin layers, so the forward voltage becomes smaller and more stable.




Compositions of a typical example are set out below.




1. Distributed Bragg layer


3








Al


x


Ga


1-x


As/Al


y


Ga


1·y


As






where 0≦x≦1; 0≦y≦1; x≠y




2. Cladding layers


4


and


6








(Al


x


Ga


1-x


)


1·y


In


y


P






where 0.5≦x≦1; 0.4≦y≦0.6




Thickness 0.5 μm≦D≦1.5 μm




3. Alternated (superlattice structure) strain layer


7








(Al


x


Ga


1-x


)


1-y


In


y


P/(Al


a


Ga


1-a


)


1-b


In


b


P






where 0.5≦x≦1; 0.4≦y≦0.6/0≦a≦0.4; 0≦b≦0.4




Thickness D≦20 nm




4. Multi-quantum well






(Al


x1


Ga


1·x1


)


1-y1


In


y1


P/(Al


x2


Ga


1-x2


)


1-y2


In


y2


P






where 0.5≦x1≦1; 0.4≦y1≦0.6/0≦x2≦0.4; 0≦y2≦0.4




Thickness D≦20 nm




5. Window layer


8








Ga


x


In


1-x


P






where 0.9≦x≦1




Thickness 5 μm≦D≦15 μm



Claims
  • 1. A light emitting diode comprising:an ohmic n-electrode on a rear surface of a GaAs substrate; a distributed AlGaAs Bragg reflecting layer in the form of a multi-layer lamination; a first, lower AlGaInP cladding layer grown on the reflecting layer; an AlGaInP active layer grown on the lower cladding layer; a second, upper AlGaInP cladding layer grown on the active layer; a strain layer grown on the second cladding layer, the strain layer comprising a superlattice structure in the form of a plurality of thin alternated AlGaInP layers with the composition; (AlxGa1-x)1-yInyP/(AlaGa1-a)1-bInbP where 0.5≦x≦1; 0.4≦y≦0.6/0≦a≦0.4; 0≦b≦0.4; a window layer grown on the strain layer; and an ohmic p-electrode on the window layer.
  • 2. A light-emitting diode according to claim 1, wherein the distributed Bragg layer has the composition:AlxGa1-xAs/AlyGa1-yAs where 0≦x≦1; 0≦y≦1; x≠y.
  • 3. A light-emitting diode according to claim 1, wherein each of the cladding layers has the composition:(AlxGa1-x)1-yInyP where 0.5≦x≦1; 0.4≦y≦0.6.
  • 4. A light-emitting diode according to claim 1, wherein the active layer has the composition:(AlxlGa1-xl)1-ylIny1P/(Alx2Ga1-x2)1-y2Iny2P where 0.5≦x≦l; 0.4≦yl≦0.6/0≦x2≦0.4; 0≦y2≦0.4.
  • 5. A light-emitting diode according to claim 1, wherein the window layer has the compositionGaxIn1-xP where 0.9≦x≦l.
Priority Claims (1)
Number Date Country Kind
9826516 Dec 1998 GB
US Referenced Citations (7)
Number Name Date Kind
5319660 Chen et al. Jun 1994 A
5502739 Kidoguchi et ak. Mar 1996 A
5555271 Honda et al. Sep 1996 A
5559818 Shono et al. Sep 1996 A
5600667 Kidoguchi et al. Feb 1997 A
5784399 Sun Jul 1998 A
6057563 Chen et al. May 2000 A
Foreign Referenced Citations (2)
Number Date Country
0 518 320 Dec 1992 EP
0 557 638 Sep 1993 EP
Non-Patent Literature Citations (1)
Entry
Copy of Search Report dated Mar. 17, 1999 for corresponding United Kingdom Application No. GB 9826516.8.