1. Technical Field
The disclosure relates generally to light emitting devices, and more particularly to a light emitting diode (LED) chip and a method for manufacturing the same.
2. Description of Related Art
Nowadays light emitting diodes (LEDs) are used widely in various applications for illumination. There are two types of LED chips available in typical LEDs, a lateral LED chip and a vertical LED chip. The vertical LED chip generally includes a conductive substrate, an N-type semiconductor layer formed on the substrate, a light emitting layer formed on the N-type semiconductor layer, a p-type semiconductor layer formed on the light emitting layer, and a P-type electrode formed on the P-type semiconductor layer. In operation, current flows from the P-type electrode to the substrate, thereby activating the light emitting layer to emit light.
However, the P-type electrode has a smaller surface area less than that of the P-type semiconductor layer, and only covers a central area of the P-type semiconductor layer. The current flowing through the chip is prone to converge at a central portion of the chip corresponding to the P-type electrode. Thus, more current flows through the central portion of the chip than two lateral portions of the chip. As a result, the chip cannot emit light with uniform intensity due to uneven distribution of the current within the chip.
What is needed is an improved LED chip which can overcome the limitations described, and a method for manufacturing the LED chip.
Many aspects of the present embodiments can be better understood with reference to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present embodiments. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
Referring to
A first electrode 31 is further formed on the first semiconductor layer 30. A plurality of carbon nanotube bundles 60 are formed in the second semiconductor layer 50. A second electrode 51 is further formed on the second semiconductor layer 50. The second electrode 51 electrically connects with the carbon nanotube bundles 60.
The substrate 10 is made of Al2O3, silicon, SiC, ceramic, polymer, GaN or ZnO.
The buffer layer 20 is made of GaN or AlN. The buffer layer 20 decreases lattice mismatch existed between the epitaxial structure 100 between and the substrate 10, whereby subsequent growth of the epitaxial structure 100 can obtain an excellent epitaxial structure.
The first semiconductor layer 30, the active layer 40 and the second semiconductor layer 50 are formed on the buffer layer 20 in sequence. In the embodiment of this disclosure, the first semiconductor layer 30 is an N-type semiconductor layer, and the second semiconductor layer 50 is a P-type semiconductor layer. The active layer 40 is made of InN, InGaN, GaN, AlGaN, InGaAlN or other suitable light emitting materials.
Referring to
It can be understood that, alternatively, the carbon nanotube bundles 60 are arranged radially (as shown in
The carbon nanotube bundles 60 are arranged in a single plane. Alternatively, the carbon nanotube bundles 60 are arranged in multiple planes staggered with each other, respectively.
Referring to
Step 101, a substrate 10 is provided, a buffer layer 20 is formed on the substrate 10, and a first semiconductor layer 30, an active layer 40 and a second semiconductor layer 50 are formed on the buffer layer 20 in sequence.
Step 102, a plurality of carbon nanotube bundles 60 are formed on the second semiconductor layer 50.
Step 103, the second semiconductor layer 50 is sequentially formed until the carbon nanotube bundles 60 are embedded m the second semiconductor layer 50
Step 104, the second semiconductor layer 50 and the active layer 40 are etched, and the first semiconductor layer 30 is partially exposed.
Step 105, a first electrode 31 and a second electrode 51 are provided, the first electrode 31 is fixed on the first semiconductor layer 30, and the second electrode 51 is fixed on the second semiconductor layer 50.
It is to be further understood that even though numerous characteristics and advantages of the present embodiments have been set forth in the foregoing description, together with details of the structures and functions of the embodiments, the disclosure is illustrative only, and changes may be made in detail, especially in matters of shape, size, and arrangement of parts within the principles of the disclosure to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.
Number | Date | Country | Kind |
---|---|---|---|
2012 1 0587681 | Dec 2012 | CN | national |
Number | Name | Date | Kind |
---|---|---|---|
8569736 | Wei et al. | Oct 2013 | B2 |
20100221852 | Li et al. | Sep 2010 | A1 |
20120001218 | Choi et al. | Jan 2012 | A1 |
20120175742 | Wei et al. | Jul 2012 | A1 |
20130285105 | Wei et al. | Oct 2013 | A1 |
20130285289 | Feng et al. | Oct 2013 | A1 |
Number | Date | Country |
---|---|---|
201034248 | Sep 2010 | TW |
201244168 | Nov 2012 | TW |
Number | Date | Country | |
---|---|---|---|
20140183445 A1 | Jul 2014 | US |