This application claims priority of Chinese Invention Patent Application No. 202010845753.8, filed on Aug. 20, 2020.
The disclosure relates to a semiconductor lighting device, and more particularly to a light-emitting diode device.
As light-emitting diode (LED) technology advances, one of the research focuses is to develop LED chips of smaller size. Improvements in structural configuration, production, testing and assembly of small size LEDs are still challenging due to high production cost and difficulties in packaging, protection from damage, safe transportation, assembly and maintenance of such LED chips. Conventionally, small size LED chips are connected in series circuit to form high voltage LED device (such as a display). However, such high voltage LED device operating at high working voltage requires a higher power consumption and is liable to damage, which may incur safety concerns.
In addition, conventional LED chips are usually subjected to a full-line test for optoelectronic properties, such as forward bias voltage (VF), light output power (LOP), dominant wavelength (WLD) and reverse leakage current (IR). Measurements of these properties usually take a relatively long time (e.g., one-third to half of total testing time), which may result in a low test efficiency and reduction of production efficiency, especially for small size LED chips. For example, when a 4-inch wafer yields about 800,000 chips, and if each chip is tested using a conventional way, a total of about 30 hours of testing time is required, which seriously affects the production efficiency. In addition, when the size of the LED chips is further decreased to Z mil or below (1 mil=0.0254 mm, or 23.4 μm), or even in a micro scale, such testing would not be successfully conducted, as currently available test instrument which has test probes with a minimum diameter of 2.5 mil would cause the test probes to be positioned too close to each other (e.g., 30 μm or less), thereby causing circuit breaks during testing, resulting in damage to the test instrument.
Therefore, there is still a need to develop a LED device that is capable to operate under low voltage, and to overcome challenges in testing and packaging of small size LED chips.
Therefore, an object of the disclosure is to provide a light-emitting diode (LED) device and a display that can alleviate at least one of the drawbacks of the prior art.
According to the disclosure, the LED device includes a substrate, a plurality of LED chips, a first protecting layer, a first electrical connection structure and a second electrical connection structure. The substrate has a plurality of chip-forming regions. The LED chips are separated from each other by a trench that is defined by a trench-defining wall. Each of the LED chips is formed in a mesa structure and includes a first semiconductor layer, an active layer, a second semiconductor layer that are sequentially disposed on a corresponding one of the chip-forming regions of the substrate in such order. The first protecting layer covers the trench-defining wall of the trench, and the mesa structure of each of the LED chips. The first electrical connection structure is disposed on the first protecting layer opposite to the substrate, and penetrates through the first protecting layer to electrically connect in parallel with the first semiconductor layer of each of the LED chips. The second electrical connection structure is disposed on the first protecting layer opposite to the substrate, and penetrates through the first protecting layer to electrically connect in parallel with the second semiconductor layer of each of the LED chips.
According to the disclosure, the display includes at least one LED chip as mentioned above.
Other features and advantages of the disclosure will become apparent in the following detailed description of the embodiments with reference to the accompanying drawings, of which:
Before the disclosure is described in greater detail, it should be noted that where considered appropriate, reference numerals or terminal portions of reference numerals have been repeated among the figures to indicate corresponding or analogous elements, which may optionally have similar characteristics.
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The substrate 100 may be made of a material including, but is not limited to, sapphire including aluminum oxide (Al2O3), silicon (Si), silicon carbide (SiC), aluminum nitride (AlN), gallium arsenide (GaAs) or any other suitable material.
The substrate 100 has a plurality of chip-forming regions, and each of the LED chips 20 is disposed on a corresponding one of the chip-forming regions. In certain embodiments, the substrate is a part of a wafer on which the LED chips 20 are first formed, and then the wafer is subjected to a dicing process to form a plurality of the LED devices of this disclosure, each of which may independently include a predetermined amount of the LED chips 20 according to practical needs. Each of the LED chips 20 is formed in a mesa structure, and has a length not greater than 250 μm. A projection of the mesa structure on the substrate 100 may be substantially a rectangle, or a square. Therefore, both the width and the length of the projection of the mesa structure may be not greater than 250 μm, such as 200 μm, or 100 μm, or 40 μm. In certain embodiments, the projection of each of the LED chips 20 on the substrate 100 may have an area ranging from 900 μm2 to 62500 μm2, such as 1600 μm2 (40 μm×40 μm), or 62500 μm2 (250 μm×250 μm), or 9677.4 μm2 (3 mil×5 mil, i.e., 76.2 μm×127 μm). Two immediately adjacent ones of the LED chips 20 are spaced apart from each other by a distance ranging from 10 μm to 50 μm, for instance, 20 μm to 40 μm, or 30 μm. Controlling the size of the LED chips 20 and the distance therebetween may contribute to improvement in pitch (image resolution) and light-emitting effect of the LED device.
Each of the LED chips 20 includes a first semiconductor layer 101, an active layer 102, and a second semiconductor layer 103 that are sequentially disposed on the corresponding one of the chip-forming regions of the substrate 100 in such order. Each of the first and second semiconductor layers 101, 103 may be independently made of gallium nitride (GaN)-based material or aluminium gallium indium phosphide (AlGaInP)-based material. The first semiconductor layer 101 may be doped with an N-type dopant, and the second semiconductor layer 103 may be doped with a P-type dopant, or vice versa. Each of the first and second semiconductor layers 101, 103 may include sublayers with different functions. For instance, the first semiconductor layer 101 may include a GaN buffer sublayer, such as an unintentionally doped GaN buffer layer. The active layer 102 may be made of at least one nitride-based film that include indium (In). The active layer 102 may include an alternate stacking of a nitride film of narrow band gap and a nitride film of wide band gap. In certain embodiments, a bonding layer may be interposed between the first semiconductor layer 101 and the substrate 100.
The LED chips 20 are separated from each other by a trench 30 that is defined by a trench-defining wall. That is, the chip-forming regions are defined by the trench 30. The trench-defining wall may have a depth not greater than 10 μm. The trench 30 may be formed by subjecting an epitaxial structure for forming the LED chips (i.e., the epitaxial structure including the first, semiconductor layer 101, the active layer 102 and the second semiconductor layer 103) to an etching process which may terminate at a predetermined position according to practical needs, as long as the trench 30 thus formed penetrates through the active layer 102 and the second semiconductor layer 103. That is, for each of the LED chips 20, the bottom surface of the trench defining wall of the trench 30 may be positioned at a level between the first semiconductor layer 101 and the substrate 100. In this embodiment, the trench 30 terminates at a contact surface between the first semiconductor layer 101 and the substrate 100, or even terminates at the substrate 100 (i.e., the substrate is over-etched) so as to expose a portion of the substrate 100. With such configuration, separation of the LED chips 20 (e.g., dicing process) may be easily performed. The bottom surface of the trench-defining wall may be a roughened surface as shown in
Alternatively, in other embodiments, the trench 30 may only terminate at the first semiconductor layer 101 without exposing the substrate 100, and the LED chips 20 are physically connected to each other through the first semiconductor layer 101. In such case, since the depth of the trench 30 is relatively small, other elements (e.g., the first and second electrical connection structures 40, 50 as described below) to be subsequently formed thereon may be less susceptible to fracture.
A lateral surface of the trench-defining wall angularly extends from the substrate 100 to an upper surface of the mesa structure opposite to the substrate 100. In the first embodiment, the lateral surface substantially perpendicularly extends from the substrate 100 (see
The first protecting layer 105 covers the trench-defining wall of the trench 30, and the mesa structure of each of the LED chips 20. The first protecting layer 105 may further cover other elements that are not mentioned above so as to provide more intact protection. The first protecting layer 105 may be made of silicon dioxide, silicon nitride, silicon oxynitride, or any combinations thereof.
The first electrical connection structure 40 is disposed on the first protecting layer 105 opposite to the substrate 100. The first electrical connection structure 40 includes a plurality of first electrodes 121 and a plurality of first bridging electrodes 122. As shown in
The second electrical connection structure 50 is disposed on the first protecting layer 105 opposite to the substrate 100. The second electrical connection structure 50 includes a plurality of second electrodes 106 and a plurality of second bridging electrodes 107. As shown in
Each of the first and second electrodes 121, 106, and the first and second bridging electrodes 122, 107 may be independently made of chromium (Cr), nickel (Ni), copper (Cu), silver (Ag), aluminum (Al), or combinations thereof.
Each of the LED chips 20 may further include a current spreading layer 104 that is disposed on the second semiconductor layer 103 opposite to the active layer 102. The current spreading layer 104 is covered by the first protecting layer 105, and is in contact with the second electrical connection structure 50 to electrically connect the second semiconductor layer 103 to the second electrical connection structure 50.
In a case that the LED chips 20 are flip-chip LED chips, the first protecting layer 105 may be formed with a distributed Bragg reflector (DBR) structure, and the current spreading layer 104 may serve as a transparent conductive layer that is made of indium tin oxide (ITO), zinc oxide (ZnO) or aluminum doped zinc oxide (AZO).
In a case that the LED chips 20 are face-up LED chips, the substrate 100 may be formed with a distributed Bragg reflector (DBR) structure. In certain embodiments, for each of the LED chips 20, each of the first and second electrical connection structures 40, 50 may be independently made of a material identical to that of the current spreading layer 104, which has an advantageous effect of reducing light emitted from the active layer 102 to be absorbed by the first and second electrical connection structures 40, 50. In such case, the first and second electrical connection structures 40, 50 are formed by a process same as that of the current spreading layer 104, so as to simplify the manufacturing process of the LED device.
In certain embodiments, the current spreading layer 104 may be omitted, and the first protecting layer 105 may be formed with a larger opening for the disposal of the second electrical connection structure 50. In this case, for each of the LED chips 20, each of the second electrodes 106 may have a larger contact area with the second semiconductor layer 103 so as to achieve improved current spreading effect. Such LED chips 20 may be more suitable for face-up packaging technique.
Since the LED chips 20 are electrically connected in parallel to each other through the first electrical connection structure 40 and the second electrical connection structure 50, the LED device of the disclosure may be conferred with advantageous characteristics in various aspects.
In one aspect, the LED device of the disclosure may be operated at a voltage that is relatively lower than that of a conventional high voltage LED device in which LED chips are electrically connected in series to each other, and thus the LED device of the disclosure is relatively safe, and exhibits a reduced power consumption.
In addition, with the abovementioned configuration, the size of the LED chips 20 and the distance therebetween can be further reduced (e.g., not greater than 250 μm, or 1 mil to 3 mil), so as to facilitate testing of the LED device. Since the LED chips 20 that are electrically connected in parallel to each other in ay have similar optoelectronic properties, testing of the LED chips 20 may be performed on a portion of the LED chips and an averaged value of the tested portion of LED chips can be used to determine the overall quality of the LED device, instead of testing the LED chips 20 one by one. In one example, forward bias voltage for each of the LED chips 20 within the same array of the LED chips 20 is the same, such that only one of the LED chips 20 is required to be subjected to forward bias voltage measurement. In another example, when one row of the array of LED chip 20 having a reverse leakage current (IR) value which is determined to be larger than a predetermined threshold value, such row of the LED chips 20 may be considered defective. As such, testing time may be greatly reduced and testing efficiency may be improved. In addition, the external electrode units of the first and second electrical connection structures 40, 50 may serve as testing electrodes, or as connection electrodes connected to an external power source.
In another aspect, as the LED chips 20 may foe directly transferred to a packaging substrate to foe packaged as an integral structure, packaging efficiency and yield may be increased. The dicing process may foe performed to produce separated LED devices each having corresponding amount of LED chips 20. For example, one of the resultant LED devices may have one LED chip 20, and the other one of the resultant LED devices may have more than one LED chips 20. As compared to LED chips that are electrically connected in series to each other, the LED chips 20 that are electrically connected in parallel to each other cars foe easily prepared without customizing or changing the configuration of each LED chip 20.
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Production of the LED devices of the abovementioned variations (as shown in
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Each of the external electrode unit of the first and second electrical connection structures 40, 50 is disposed on one of the chip-forming regions of the substrate 100. Alternatively, each of the external electrode unit of the first and second electrical connection structures 40, 50 may be disposed across more than one of the chip-forming regions of the substrate 100, in particular when the LED chips 20 have relatively small size, e.g., in micro scale.
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To prepare the abovementioned display 700, a plurality of LED devices are first uniformly formed in an array, and then the LED devices are covered with different fluorescent films or wavelength converting layers in such a manner that the first LED devices 710, the second LED devices 720, and the third LED devices 730 emitting specific colors are obtained. For example, the first LED devices emitting blue color may be usually not covered with the fluorescent films, and each of the second LED devices 720 emitting green light may be covered with a first type of the fluorescent films and the third LED devices 730 emitting red light may be covered with a second type of the fluorescent films. Since the first, second and third LED devices 710, 720, 730 are to be arranged and aligned in different rows, covering the fluorescent films can be conducted in a row-by-row manner, instead of one-by-one manner. Therefore, the display 700 may be manufactured with improved efficiency and reduced manufacturing cost, and may exhibit improved light-emitting efficiency. The display 700 also possesses advantages such as long service life, high intensity, small volume, lower power consumption and high pixel density, etc., and thus the display 700 can be desirably applied in various light-emitting appliances such as computer monitors, phone monitors, wearable devices, or even large size display screen.
To conclude, by inclusion of the first electrical connection structure 40 and the second electrical connection structure 50 that cooperate to allow the LED chips 20 to be connected in parallel to each other, the LED device according to the disclosure can be operated at a low working voltage, thereby solving safety issues during operation and reduces power consumption. In addition, the arrangement of the LED chips 20 on the LED device according to the disclosure may facilitate optoelectronic tests without damaging testing instrument.
In the description above, for the purposes of explanation, numerous specific details have been set forth in order to provide a thorough understanding of the embodiments. It will be apparent, however, to one skilled in the art, that one or more other embodiments may be practiced without some of these specific details. It should also be appreciated that reference throughout this specification to “one embodiment,” “an embodiment,” an embodiment with an indication of an ordinal number and so forth means that a particular feature, structure, or characteristic may be included in the practice of the disclosure. It should be further appreciated that in the description, various features are sometimes grouped together in a single embodiment, figure, or description thereof for the purpose of streamlining the disclosure and aiding in the understanding of various inventive aspects, and that one or more features or specific details from one embodiment may be practiced together with one or more features or specific details from another embodiment, where appropriate, in the practice of the disclosure.
While the disclosure has been described in connection with what are considered the exemplary embodiments, it is understood that this disclosure is not limited to the disclosed embodiments but is intended to cover various arrangements included within the spirit and scope of the broadest interpretation so as to encompass all such modifications and equivalent arrangements.
Number | Date | Country | Kind |
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202010845753.8 | Aug 2020 | CN | national |