This application claims benefit of priority to Korean Patent Application No. 10-2022-0007797 filed on Jan. 19, 2022, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference in its entirety.
Embodiments relate to a light emitting diode (LED) module.
In order to maintain the reliability and performance of LED modules, a heat dissipation structure for efficiently dissipating heat generated by LED devices may be used.
The embodiments may be realized by providing a light emitting diode (LED) module including a support including a heat dissipation pad; a circuit board spaced apart from the heat dissipation pad on the support, the circuit board including at least one pair of contact pads and an electrical connection terminal electrically connected to the at least one pair of contact pads; an LED device including a wiring board having a lower surface and an upper surface opposing each other, a lower wiring on the lower surface of the wiring board and facing the heat dissipation pad, an upper wiring on the upper surface of the wiring board and electrically insulated from the lower wiring, at least one pair of contact structures at one side of the upper wiring, at least one LED chip mounted on another side of the upper wiring, at least one wavelength conversion film on the at least one LED chip, and a reflective structure covering the upper surface of the wiring board such that at least a portion of each of the at least one pair of contact structures and the at least one wavelength conversion film is exposed; a bonding wire electrically connecting the at least one pair of contact pads and the at least one pair of contact structures to each other; and a conductive bump between the heat dissipation pad and the lower wiring.
The embodiments may be realized by providing a light emitting diode (LED) module including a support including a heat dissipation pad; a circuit board spaced apart from the heat dissipation pad on the support and including a pair of contact pads; an LED device including a wiring board having a lower surface and an upper surface opposing each other, a lower wiring on the lower surface of the wiring board and facing the heat dissipation pad, an upper wiring on the upper surface of the wiring board, a pair of contact structures on the upper wiring, a plurality of LED chips electrically connected to the pair of contact structures through the upper wiring, and a reflective structure covering the upper surface of the wiring board such that at least a portion of the pair of contact structures is exposed; a bonding wire electrically connecting the pair of contact pads and the pair of contact structures to each other; and a conductive bump between the heat dissipation pad and the lower wiring.
The embodiments may be realized by providing a light emitting diode (LED) module including a support including a heat dissipation pad; a circuit board spaced apart from the heat dissipation pad on the support and including a pair of contact pads; an LED device including a wiring board having a lower surface and an upper surface opposing each other, a lower wiring on the lower surface of the wiring board and facing the heat dissipation pad, an upper wiring on the upper surface of the wiring board, a pair of contact structures on the upper wiring, a plurality of LED chips electrically connected to the pair of contact structures through the upper wiring, and a reflective structure covering the upper surface of the wiring board such that at least a portion of the pair of contact structures is exposed; a bonding wire electrically connecting the pair of contact pads and the pair of contact structures to each other; and a conductive bump between the heat dissipation pad and the lower wiring, wherein the heat dissipation pad completely overlaps the LED device in a plan view.
Features will be apparent to those of skill in the art by describing in detail exemplary embodiments with reference to the attached drawings in which:
LED device, and
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The support 100 may be a support structure on which the LED device 200 and the circuit board 300 are mounted, and may include elements for the LED module 10 to be coupled to a lighting device (e.g., a head lamp). In an implementation, the support 100 may include a material having high thermal conductivity, e.g., copper (Cu), aluminum (Al), iron (Fe), nickel (Ni), silver (Ag), gold (Au), platinum (Pt), tin (Sn), lead (Pb), titanium (Ti), chromium (Cr), palladium (Pd), indium (In), zinc (Zn), carbon (C), or alloys thereof. The support 100 may include a heat dissipation pad 101 on which the LED device 200 may be mounted. In an implementation, by attaching the LED device 200 on the heat dissipation pad 101 using a surface mount technology (SMT), a heat dissipation path connected from the LED device 200 to the support 100 may be formed. The heat dissipation pad 101 may include a material having a thermal conductivity of about 300 K/mK or more. In an implementation, the heat dissipation pad 101 may include, e.g., aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), lead (Pb), tantalum (Ta), and tellurium (Te), titanium (Ti), tungsten (W), or alloys thereof. In an implementation, the heat dissipation pad 101 may further include a surface plating layer in contact with a conductive bump 110 (refer to the embodiments of
In an implementation, on a plane (X-Y plane), the heat dissipation pad 101 may have a planar area smaller than that of the LED device 200 (or a wiring board 210), thereby completely overlapping the LED device 200 and limiting a spread region of the conductive bump 110. In an implementation, during a reflow process, the conductive bump 110 may not protrude to the outside of the LED device 200. In an implementation, the heat dissipation pad 101 may have a width W1 smaller than a width W4 of the wiring board 210 in a direction parallel to a lower surface LS of the wiring board 210 (e.g., the X direction).
In an implementation, the characteristics of the LED module 10 may be maintained to be constant by forming a height H1 (e.g., in a vertical Z direction) from an upper surface of the support 100 to the upper surface of the heat dissipation pad 101 according to a design. In an implementation, the height H1 from the upper surface of the support 100 to the upper surface of the heat dissipation pad 101 may be, e.g., in the range of about 1 μm to about 30 μm, about 1 μm to about 20 μm, about 5 μm to about 30 μm, about 5 μm to about 20 μm, about 10 μm to about 30 μm, or about 10 μm to about 20 μm. In an implementation, the height H1 of the heat dissipation pad 101 may be variously changed according to a design.
The LED device 200 may be on the heat dissipation pad 101 of the support 100, and may include the wiring board 210 and a reflective structure 260.
The wiring board 210 may have a lower surface LS and an upper surface US opposing each other. At least one LED chip and a wavelength conversion film 280 may be sequentially stacked on the upper surface US of the wiring board 210, and at least a pair of contact structures 214 may be spaced apart therefrom on the upper surface US of the wiring board 210. The pair of contact structures 214 may be electrically connected to an LED chip through an upper wiring (refer to 212 of
A lower wiring 211 may be on the lower surface LS of the wiring board 210. The lower wiring 211 may be for surface mounting of the LED device 200 and may be electrically insulated from the LED chip. The lower wiring 211 may have a width W2 smaller than the width W4 of the wiring board 210 in the direction (e.g., the X-axis direction), parallel to the lower surface LS of the wiring board 210. In an implementation, the width W2 of the lower wiring 211 may be substantially the same as the width W1 of the heat dissipation pad 101. In an implementation, the lower wiring 211 may include a first surface plating layer 211PL in contact with the conductive bump 110. The lower wiring 211 may include, e.g., aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), lead (Pb), tantalum (Ta), tellurium (Te), titanium (Ti), or alloys thereof. The first surface plating layer 211PL may include, e.g., tin (Sn), lead (Pb), nickel (Ni), or gold (Au). In an implementation, the height H2 of the lower wiring 211 may be similar to the height H1 of the heat dissipation pad 101 (e.g., as measured in the Z direction). The height H2 of the lower wiring 211 may be variously modified according to a design. Components constituting the wiring board 210 will be described in more detail with reference to
In an implementation, the LED device 200 may be surface-mounted on the support 100 using the lower wiring 211 and the conductive bump 110 instead of an adhesive resin, so that a residue (e.g., an adhesive resin leaking out of the LED device 200) may be prevented from protruding to the outside of the LED device 200. In an implementation, on a plane (X-Y plane), the wiring board 210 may overlap the entirety of the heat dissipation pad 101. The conductive bump 110 may be between the heat dissipation pad 101 and the lower wiring 211 and may be formed so as not to protrude from or beyond an edge of the wiring board 210 on a plane (X-Y plane). In an implementation, the conductive bump 110 may have a width W3 equal to or smaller than the width W4 of the wiring board 210 in the direction (e.g., the X direction) parallel to the lower surface LS of the wiring board 210. In an implementation, the conductive bump 110 may include a material having a thermal conductivity of about 10 K/mK or more. In an implementation, the conductive bump 110 may include tin (Sn), indium (In), bismuth (Bi), antimony (Sb), copper (Cu), silver (Ag), zinc (Zn), lead (Pb), or alloys thereof. In an implementation, the conductive bump 110 may help improve the heat dissipation effect between the LED device 200 and the support 100. A height H3 of the conductive bump 110 (in the Z direction) may be, e.g., in a range of about 1 μm to about 50 μm, about 1 μm to about 40 μm, about 1 μm to about 30 μm, or about 1 μm to about 20 μm. In an implementation, the height H3 of the conductive bump 110 may be variously changed according to a design.
The reflective structure 260 may cover the upper surface US of the wiring board such that at least a portion of each of the at least one wavelength conversion film 280 stacked on at least one LED chip and at least one pair of contact structures 214 may be thereon. The reflective structure 260 may define the light emitting region EL provided by the at least one wavelength conversion film 280. The reflective structure 260 may include a resin body containing reflective powder. In an implementation, the resin body may include silicone or an epoxy resin. The reflective powder may be a white ceramic powder or a metal powder. In an implementation, the ceramic powder may include, e.g., TiO2, Al2O3, Nb2O5, or ZnO. The metal powder may include, e.g., Al or Ag.
The circuit board 300 may be on the support 100 and spaced apart from the heat dissipation pad 101, and may include at least one pair of contact pads 311, an electrical connection terminal 312, and a wiring circuit 313. The circuit board 300 may be fixed on the support 100 by an adhesive layer 102. The pair of contact pads 311 may be electrically connected to the pair of contact structures 214 by a bonding wire BW, respectively. The pair of contact pads 311 may include, e.g., aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), lead (Pb), tantalum (Ta), tellurium (Te), titanium (Ti), or alloys thereof. The electrical connection terminal 312 may be electrically connected to the at least one pair of contact pads 311 through the wiring circuit 313. A number of electrical connection terminals 312 may be equal to or greater than a number of the pair of contact pads 311. In an implementation, the electrical connection terminal 312 may include second electrical connection terminals 312b for passive elements 320, in addition to a pair of first electrical connection terminals 312a for input/output signal transmission of the LED device 200 to correspond to the pair of contact pads 311. The wiring circuit 313 may electrically connect the passive elements 320, the electrical connection terminal 312, and at least one pair of contact pads 311. The circuit board 300 may be a support board on which the passive elements 320 are mounted, and may include a PCB, a ceramic board, a glass board, a tape wiring board, or the like. The passive elements 320 may include a capacitor element, a resistor element, or an inductor element. The passive elements 320 may constitute a driving circuit of the LED device 200 together with the wiring circuit 313. In an implementation, a test terminal TP for electrical testing of the driving circuit may be between the pair of first electrical connection terminals 312a and the pair of contact pads 311 respectively connected through the wiring circuit 313.
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The wiring board 210 may include the lower wiring 211 on the lower surface LS thereof, an upper wiring 212 on the upper surface US thereof, and at least one pair of the contact structures 214 on one side of the upper wiring 212. At least one LED chip 250 may be mounted on the other side of the upper wiring 212. The wiring board 210 may be a package substrate such as a PCB, a ceramic substrate, a glass substrate, or a tape wiring board.
The upper wiring 212 may include, e.g., aluminum (Al), gold (Au), cobalt (Co), copper (Cu), nickel (Ni), lead (Pb), tantalum (Ta), tellurium (Te), titanium (Ti), or alloys thereof. The upper wiring 212 may be electrically insulated from the lower wiring 211, and may electrically connect at least one LED chip 250 and at least one pair of contact structures 214.
The at least one pair of contact structures 214 may be electrically connected to the at least one LED chip 250 through the upper wiring 212, and may be exposed to the outside of the LED device 200 to provide an input/output terminal of a current for driving the LED chip 250. In an implementation, each of the at least one pair of contact structures 214 may include a metal pad portion 214P exposed at the upper surface of the LED device 200. The at least one pair of contact structures 214 and the metal pad portion 214P may be formed of a metal material, e.g., aluminum (Al), tungsten (W), or molybdenum (Mo), or a semiconductor material, e.g., doped polysilicon.
The at least one LED chip 250 may be surface mounted on the upper surface US of the wiring board 210, and may be electrically connected to the at least one pair of contact structures 214 through the upper wiring 212. In an implementation, the at least one LED chip 250 may be electrically connected to wiring electrodes 212a and 212b of the upper wiring 212 through the metal bump 215. The metal bump 215 may include, e.g., tin (Sn), lead (Pb), nickel (Ni), or gold (Au). The at least one LED chip 250 may be provided as a plurality of LED chips 250 each having a first electrode 259a and a second electrode 259b. In an implementation, the plurality of LED chips 250 may be connected to each other in series through the upper wiring 212 so that current may flow in a forward direction through each of the first and second electrodes 259a and 259b. In an implementation, the plurality of LED chips 250 may be connected in parallel.
At least one wavelength conversion film 280 may be stacked on each LED chip 250 to correspond to the at least one LED chip 250. The at least one wavelength conversion film 280 may include at least one wavelength conversion material converting a portion of light emitted from the LED chip 250 into light of a first wavelength different from an emission wavelength. The wavelength conversion film 280 may be, e.g., a resin layer in which a wavelength conversion material is dispersed or a ceramic phosphor film. The wavelength conversion material may be a phosphor or a quantum dot. In an implementation, the LED device 200 may be configured to emit white light. The LED chip 250 may emit blue light, and the wavelength conversion material may include a phosphor or quantum dot converting a portion of blue light into yellow light, or may include a plurality of phosphors or quantum dots converting a portion of blue light into red and green light.
The reflective structure 260 may cover the upper surface US of the wiring board 210 such that at least a portion of each of the at least one pair of contact structures 214 and the at least one wavelength conversion film 280 is exposed. The reflective structure 260 may include a resin body containing reflective powder. An upper surface of the reflective structure 260 may be coplanar with the upper surface of the at least one pair of contact structures 214 and the upper surface of the at least one wavelength conversion film 280.
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The upper wiring 212 may include first and second wiring electrodes 212a and 212b corresponding to the first and second electrodes 259a and 259b of an LED chip (‘250’ of
The lower wiring 211 may be electrically insulated from the upper wiring 212 and may be connected to the heat dissipation pad 101 of the support (‘100’ of
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The substrate 251 may be an insulating substrate, e.g., sapphire. In an implementation, the substrate 251 may be a conductive or semiconductor substrate in addition to an insulating substrate. In an implementation, the substrate 251 may be formed of SiC, Si, MgAl2O4, MgO, LiAlO2, LiGaO2, or GaN, in addition to sapphire. An uneven portion C may be formed on an upper surface of the substrate 251. The uneven portion C may help improve the quality of a grown single crystal, while improving the light extraction efficiency.
The buffer layer 252 may include InxAlyGa1−x−yN (0≤x≤1, 0≤y≤1). In an implementation, the buffer layer 252 may include GaN, AlN, AlGaN, or InGaN. In an implementation, a plurality of layers may be combined, or some compositions may be gradually changed to be used.
The first conductivity-type semiconductor layer 254 may include a nitride semiconductor satisfying n-type InxAlyGa1−x−yN (0≤x<1, 0≤y<1, 0≤x+y<1), and an n-type impurity may be Si. In an implementation, the first conductivity-type semiconductor layer 254 may include n-type GaN. The second conductivity-type semiconductor layer 256 may include a nitride semiconductor layer satisfying p-type InxAlyGa1−x−yN (0≤x<1, 0≤y<1, 0≤x+y<1), and p-type impurity may be Mg. In an implementation, the second conductivity-type semiconductor layer 256 may be implemented as a single-layer structure, or may have a multilayer structure having different compositions.
The active layer 255 may have a multi-quantum well (MQW) structure in which quantum well layers and quantum barrier layers are alternately stacked with each other. In an implementation, the quantum well layer and the quantum barrier layer may include InxAlyGa1−x−yN (0≤x≤1, 0≤y≤1, 0≤x+y≤1) having different compositions. In an implementation, the quantum well layer may include InxGa1−xN (0<x≤1), and the quantum barrier layer may include GaN or AlGaN. The thickness of the quantum well layer and the quantum barrier layer may be respectively in the range of, e.g., about 1 nm to about 50 nm. In an implementation, the active layer 255 may have a single quantum well structure.
The first and second electrodes 259a and 259b may be respectively on the mesa-etched region of the first conductivity-type semiconductor layer 254 and the second conductivity-type semiconductor layer 256 to be positioned on the same surface. The first electrode 259a may include, e.g., Ag, Ni, Al, Cr, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Au, or the like, and may be employed as having a structure of a single layer or two or more layers. In an implementation, the second electrode 259b may be a transparent electrode such as a transparent conductive oxide or a transparent conductive nitride, or may include graphene. The second electrode 259b may include, e.g., Al, Au, Cr, Ni, Ti, or Sn.
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The LED chip 250B may include first and second electrode structures E1 and E2 respectively connected to the first and second conductivity-type semiconductor layers 254 and 256. The first electrode structure E1 may include a connection electrode 258a such as a conductive via connected to the first conductivity-type semiconductor layer 254 through the second conductivity-type semiconductor layer 256 and the active layer 255 and a second electrode 259b connected to the connection electrode 258a. The connection electrode 258a may be surrounded by an insulating portion 257 to be electrically separated from the active layer 255 and the second conductivity-type semiconductor layer 256. The connection electrode 258a may be on a region in which the semiconductor stack S is etched. In an implementation, a number, shape, and pitch or the connection electrode 258a or a contact region thereof with the first conductivity-type semiconductor layer 254 may be appropriately designed so that contact resistance is lowered. In an implementation, the connection electrodes 258a may be arranged to form rows and columns on the semiconductor stack S, thereby improving current flow. The second electrode structure E2 may include an ohmic contact layer 258b and a second electrode 259b on the second conductivity-type semiconductor layer 256.
The connection electrode 258a and the ohmic contact layer 258b respectively may include a single or multilayer structure of a conductive material having ohmic characteristics with the first and second conductivity-type semiconductor layers 254 and 256 and may include, e.g., Ag, Al, Ni, Cr, a transparent conductive oxide (TCO), or the like.
The first and second electrodes 259a and 259b may be respectively connected to the connection electrode 258a and the ohmic contact layer 258b, respectively, to function as external terminals of the LED chip 250B. In an implementation, the first and second electrodes 259a and 259b may include Au, Ag, Al, Ti, W, Cu, Sn, Ni, Pt, Cr, NiSn, TiW, AuSn, or a eutectic metal thereof. The first and second electrode structures E1 and E2 may be disposed in the same direction.
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The head lamp 1000 may further include a heat dissipator 1012 dissipating heat generated by the light source 1001 externally, and the heat dissipator 1012 may include a heat sink 1010 and a cooling fan 1011 to effectively dissipate heat. In addition, the head lamp 1000 may further include a housing 1009 for fixing and supporting the heat dissipator 1012 and the reflector 1005, and the housing 1009 may include a central hole 1008 in one surface of a body portion thereof to facilitate coupling and mounting of the heat dissipator 1012 therein. The housing 1009 may include a front hole 1007 for fixing the reflector 1005 to an upper side of the light source 1001 on the other surface integrally connected with the one surface and bent in a right angle direction. Accordingly, the front side may be open by the reflector 1005, and the reflector 1005 may be fixed to the housing 1009 so that the open front corresponds to the front hole 1007, and light reflected through the reflector 1005 may exit externally through the front hole 1007.
By way of summation and review, in the case of an LED module in which a plurality of LED devices are embedded, heat generated by the plurality of LED devices could cause deterioration of the performance of the LED module.
According to embodiments, an LED module having improved heat dissipation characteristics may be provided.
Example embodiments have been disclosed herein, and although specific terms are employed, they are used and are to be interpreted in a generic and descriptive sense only and not for purpose of limitation. In some instances, as would be apparent to one of ordinary skill in the art as of the filing of the present application, features, characteristics, and/or elements described in connection with a particular embodiment may be used singly or in combination with features, characteristics, and/or elements described in connection with other embodiments unless otherwise specifically indicated. Accordingly, it will be understood by those of skill in the art that various changes in form and details may be made without departing from the spirit and scope of the present invention as set forth in the following claims.
Number | Date | Country | Kind |
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10-2022-0007797 | Jan 2022 | KR | national |