Patent Application
20200313049
The present invention relates, generally, to a package, and, more specifically, to a light emitting diode (LED) package suitable for shorter-wavelength LEDs.
Conventional mid-power packages (MPP) use leadframe architecture with a wire-bonded die and exposed silver for high optical reflectivity. Typically, blue pump LEDs are employed and are encapsulated in a phenyl-based silicone. Such silicones have a rather high index (˜1.5) and tend to protect the silver against corrosion/tarnishing.
Although such MPPs may be sufficient for blue, wire-bonded LEDs, Applicants have identified a number of shortcomings of such packages for shorter wavelength LEDs and for flip-chip packages. (As used herein short-wavelength light comprises light at a wavelength significantly shorter than standard blue LEDs, for instance a peak wavelength below 430 nm, below 420 nm, or in one of the following ranges: 200-400 nm, 200-430 nm, 300-400 nm, 300-430 nm, 360-400 nm, 360-430 nm, 380-400 nm, 380-420 nm, 380-430 nm, 400-420 nm, 400-430 nm, 400-440 nm.)
First, Applicants recognize that typical leadframe packages have components with disparate thermal expansion coefficients, which tend to stress flip-chip connections. Specifically, the leadframe core is made of metal, such as copper, which has a thermal expansion coefficient much higher than that of the semiconductor material of the chip. In the case of a flip chip, the chip's electrical contacts are connected directly to the leadframe, as opposed to a wire bond in which the chip is connected to the leadframe through a relatively flexible wire. Thus, in flip-chip configurations, the direct connection between the chip's contacts and the leadframe undergo significant stress as the package thermally cycles. This stress may compromise not only the reliability of the chip's connection, but also the chip itself.
Second, the phenyl silicones often used for encapsulating the chip and securing it to the leadframe tend to be problematic at shorter wavelengths Specifically, phenyl silicone tends to absorb shorter wavelengths (e.g., violet light), causing it to become cloudy and thus diminish the optical performance of the LED package, eventually causing reliability failures. While other silicones, such as methyl silicones, may be more transparent at shorter wavelengths, they tend to be ineffective barriers to protect silver, allowing the silver to tarnish and lose its reflectivity over time.
Third, traditional manufacturing techniques for leadframes tend to be too “coarse” for smaller LED chips. Specifically, leadframes typically are produced using wet etching. Achieving small gaps between electrical pads using wet etching is difficult to do. This in turn, limits the smallest possible spacing between electrodes in a flip-chip device. However, it is sometimes desirable to make the LED chips as small as possible.
In view of these limitations, Applicants have identified the need for a robust LED package architecture that can accommodate flip-chip, shorter-wavelength LEDs with high reliability and optical performance. The present invention fulfills this need among others.
The following presents a simplified summary of the invention in order to provide a basic understanding of some aspects of the invention. This summary is not an extensive overview of the invention. It is not intended to identify key/critical elements of the invention or to delineate the scope of the invention. Its sole purpose is to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented later.
The present invention involves, in one embodiment, using a dimensionally-stable substrate with a flip-chip LED and a reflective coating to minimize exposure of electrical conductors in the package. Specifically, Applicants have discovered that by using a substrate material, such as a ceramic, that is dimensionally stable through a wide range of temperatures for the bulk of the submount, the thermal expansion differences in the package can be minimized, thereby facilitating a more robust bond between the LED chip and the pads on the submount.
Additionally, Applicants have discovered that, while a flip-chip configuration presents certain challenges in connection with the integrity of the electrical connections between the submount and the LED chip as discussed above, it also provides some unexpected benefits. For example, because the chip is upside down, it essentially covers the electrical interface with the submount, which is often a point of diminished reflectivity in the LED package. A flip-chip architecture also provides excellent heatsinking for the LED.
In one configuration, the present invention provides for a package in which relatively small pads are provided on the surface of the submount to effect an electrical coupling between the LED chip and the electrically-conductive traces in the submount. The small pads are concealed by the flipped chip. Because the electrical connection between the traces and the LED chip is through the pads, the rest of the traces can be covered/concealed by a material which is reflective, but not necessarily conductive. In other words, in one embodiment, there is no need to coat the traces with a material, such as silver, which is used to enhance the traces' reflectivity without diminishing conductivity. (As mentioned above, materials such as silver, which are conductive and reflective, are not only expensive, but also tend to tarnish and diminish performance, especially if certain silicon encapsulants are used because of a violet LED.) Accordingly, Applicants have developed a configuration in which the LED packaging has essentially no exposed traces which would otherwise diminish the package's reflectivity.
In another embodiment, traces are coated with a material, such as silver, which provides reflectivity and conductivity, but the material is coated with barrier to protect the material from corrosion while not diminishing its reflectiveness. Again, a package configuration is provided in which the LED packaging has essentially no exposed traces, which would otherwise diminish the package's reflectivity.
In one embodiment, an LED package is disclosed having a flip chip and a reflective layer, which cover the traces on a non-conductive submount. In another embodiment, an LED package is disclosed having relatively small pads to connect the LED chip to the submount and a reflective layer otherwise covering the traces. In one embodiment, the LED package comprises: (a) a submount comprising a substrate, at least one electrically-conductive trace disposed on the submount, and at least one pad disposed on a first portion of the at least one electrically-conductive trace, thereby defining a second portion of the at least one electrically-conductive trace on which the at least one pad is not disposed, the first portion having an area smaller than that of the second portion, and a non-conductive reflective material disposed over substantially all of the second portion; and (b) an LED chip being flip-chip mounted to the submount such that the at least one contact is electrically connected to the at least one pad, the LED chip covering a substantial portion of the at least one pad.
In yet another embodiment, a method is disclosed of making a LED package having relatively small pads to connect the LED chip to the submount and a reflective layer otherwise covering the traces. In one embodiment, the method comprises: (a) depositing two or more traces on an insulting substrate; (b) depositing at least one pad on a portion of each trace; (c) depositing a non-conductive reflective material such that it covers the substrate and traces but not the pads; and (d) after depositing the reflective material, flip chip mounting the LED chip to two of the pads.
In still another embodiment, an LED package is disclosed having a flip chip connected to a conductor, which is covered by a conductive and reflective material, which is further coated with a barrier layer to prevent corrosion. In one embodiment, the LED package comprises: (a) a substrate; (b) at least one electrical conductor disposed on the substrate; (c) a reflective material disposed over a major portion of the at least one electrical conductor; (d) a protective layer disposed over a portion of the reflective material; and (e) a violet LED chip having at least one contact, the at least one contact being electrically connected to the at least one electrical conductor through the reflective layer.
In yet another embodiment, an LED package is disclosed having a compliant die attach to accommodate differences in the thermal expansion of the components of the package. In one embodiment, the LED package comprises: (a) a submount having an electrical interface; (b) a LED chip connected to the electrical interface; and (c) a die connect between the LED chip and the submount, the die connect comprising at least one layer of Sn having a thickness of at least 5 um.
Referring to
An important feature of this embodiment is that the area of the electrical interface 160 on the surface of the submount 150 is relatively small, thereby allowing the rest of the submount to be covered by the reflective material 106. Furthermore, because the electrical interface area is relatively small, it can be readily covered by the chip to minimize the non-reflective portions of the package. By disposing the reflective material over substantially all of the chip except for the electrical interface, and by disposing the chip over a substantial portion of the electrical interface, the electrical conductors of the submount, which may have poor reflectively, are not exposed. In one embodiment, substantially all is at least 75%, in another embodiment, at least 90%, and, in another embodiment, at least 99%. In one embodiment, the substantial portion is at least 75%, and, in a more particular embodiment, the substantial portion is at least 90%. In one embodiment, the area of the electrical interface is no more than 20% of the top surface area of the package, in another embodiment, no more than 10%, and, in yet another embodiment, no more than 5%. It should be understood that the packages described herein may further comprise a phosphor material. The phosphor material may be disposed around the LED die, and may cover a fraction of the package or substantially all the package. In the present discussion, the “top surface” of the package refers to the surface before the phosphor material is dispensed.
The electrical interface 160 may vary in configuration. Referring to
Referring to
Because the pads 103 and traces 102 are not exposed in the package, they need not be reflective. Instead, the first and second materials used for these traces and pads, respectively, may be optimize for a particular application/objective—e.g., electrical conduction, thermal expansion, cost, etc. Likewise, the material used in the pads may be different than the material used in the trace, allowing each material to be optimize for a particular application/objective. In one embodiment, the first and second metals have a higher conductivity and a lower reflectivity than silver. In one embodiment, the material for the pads and traces is optimize for conductivity. In one embodiment, the material is cooper. The dimensions of traces 102 may be selected to ensure low resistance. In particular, the cross-section of the traces may be sufficient to cause low resistance. In some embodiments, the total resistance of the package traces is less than 10 Ohm, 5 Ohm, 1 Ohm, 0.5 Ohm, 0.1 Ohm, 0.05 Ohm, 0.01 Ohm. In some embodiments, the cross-section of the traces has an area of at least 10×10 um or 20×20 um or 30×30 um or 40×40 um or 50×50 um. Furthermore this cross-section need not be square. The traces may have a width larger than their height, such that the traces are thin enough and can be easily covered with reflective material. In some embodiments, the thickness of the traces on top of the substrate is less than 50 um, 30 um, 20 um, 10 um. In one embodiment, the material for the traces and pads is nonetheless coated with a reflective material like silver (for instance, the trace sidewalls are made reflective such that light diffusing to these sidewalls is not lost); and the reflective material overlying the traces may act as a barrier for silver tarnishing. This freedom to select a trace cross-section for low resistance distinguishes embodiments from prior art having exposed metal traces (in which case, there may be an incentive to minimize the cross-section to limit losses)
Referring to
Another feature of this embodiment is that substantially all of the chip extends above the reflective material. This is an important feature, especially for volumetric LED chips. In volumetric flip-chip embodiments, the substrate of the chip faces upward (above the die epi), and light is emitted from the chip's sides. (Volumetric chips are described in greater detail below.) For this reason, in one embodiment, the sides of the chip extend above the reflective material. This is illustrated in
The aspect discussed above (i.e. the white material does not protrude above the die) may be closely related to the package fabrication process. In particular, the two-metal process which will be discussed below enables such embodiments and the geometries of
Therefore, in one embodiment, substantially all of the chip extends above the reflective material, or in other words, the reflective material does not extend significantly past the bottom of the chip. Although
The reflective layer 106 may comprise a white reflecting material or a dichroic stack. White reflecting materials include diffusing materials which reflect light by scattering. This includes materials comprising a binder (which may be a soft binder like a silicone) and small particles embedded in the binder which scatter light, such as TiO2 (including rutile phase, anatase phase, or a combination of phases including a combination of rutile and anatase), ZnO etc. Such materials comprise so-called white rubbers, and silicone molding compounds (SMCs). White reflecting materials may also be porous materials, including materials having pores of air for scattering, or materials composed of a scaffold of scattering elements with air in-between. For any such material, geometric dimensions (i.e. the size of scattering elements, pores . . . ) may be on the order of 1 nm, 10 nm, 50 nm, 100 nm, 500 nm, 1 um, 5 um, 10 um or in a range including 1 nm-10 um, 10 nm-5 um, 50 nm-5 um, 100 nm-5 um; these dimensions may be a mixture of various dimensions (for instance, scattering particles may have a bimodal distribution around 50 nm and 500 nm, or a broad distribution in the range 50 nm-500 nm, and other such combinations). In one embodiment, the reflective layer is not conductive.
A description of a dichroic stack is given below in the context of the leadframe embodiment, although it applicable to this embodiment as well. When a dichroic is used, the underlying material may be of importance. In such cases, a high-reflectivity metal (such as Ag or Al) may be used to cover the traces, underneath the dichroic.
The substrate 101 may be any structure for providing rigidity and strength to the package and may include for example, metallic leadframes or insulating structures. In one embodiment, the insulating substrate is substantially made of a ceramic. Ceramics offer some advantages over metal substrates. For example, a ceramic's coefficient of expansion (COE) is low, and, thus, it is dimensionally stable through a wide heat range. Moreover, its COE may be similar to that of the LED chip, and thus, the chip and the substrate will expand and contract similarly, thereby reducing stress at the electrical interfaces between the two. In one embodiment, the ceramic comprises one of AlOx, AlN, Al2O3, Si3N4, etc. In one embodiment, the thermal conductivity of the material may be, for example, at least 5, 10, 30 30, 50, or 100 W/(m·K) or in the range 5-200, 20-200, or 50-200 W/(m·K). In some embodiments, the insulating substrate has CTEs in a range of 2.6-6.8 E-6/K (or 1-10 E-6/K) which is very similar to the CTE of the semiconductor which may be ˜5.6 E-6/K (or in a range 1-10E-6/K). The ceramic may be obtained by a variety of manufacturing techniques, including sintering and hot pressing.
In some embodiments, the insulating substrate is not a ceramic but another type of material, including for instance a crystalline or polycrystalline material, or a PCB (including a flex circuit). In this last case, the connections of the PCB or flex circuit can be used to attach the LED.
In some embodiments, the insulating substrate comprises through-vias for backside electrical contacting. In some embodiments, the vias comprise copper or are substantially made of copper.
Although insulating or ceramic substrates may be preferred for certain applications as discussed above, a traditional metallic leadframe may also be preferred in different applications. For example, leadframes are inexpensive and tend to improve the manufacturability of the package. A description of leadframes is provided below which is applicable to this embodiment as well.
Although any die may be used, the package is particularly well suited for shorter-wavelengths as described above, including violet radiation, ultra-violet radiation, near-UV radiation.
In some embodiments, the package is configured to contain one or more flip-chip LED die. The die may be configured in series, in parallel, or in a series-parallel combination. For example, referring to
The flip-chip LED die is specially configured to have good die attachment to the package in order to have high reliability, and/or good thermal performance, and/or high performance. This may be achieved with a proper die metal stack 108 and submount metal stack 110. To this end, the submount pads may be further covered with a metal stack 110 suited for die-attachment. The stack 110 may include Ni, Pd, Au or other metals known for die attachment. They may be formed by a technique including ENEPIG (Electroless Nickel Electroless Palladium Immersion Gold) or ENIG (Electroless Nickel Immersion Gold). In one embodiment, the stack comprises a thick Sn layer. In one embodiment, the Sn is on the die side (not the package side) of the stack. In some embodiments, the die stack 108 comprises a relatively thick layer of Sn to provide compliance in the stack. In particular, Sn may be the last metal on stack 108 and may be used for die attach to the package. In the following, we discuss metallization schemes for the LED die; the term die-attach metal refers to the metal stack of the die 108 (either p or n contact) which will make contact to the package metal stack 110. In general, the metal stacks for the p-contact 108a and n-contact 108b may be different, since different metals may be necessary for ohmic contacts to the two LED electrodes.
In some embodiments, the die attach is performed with use of solder alloys. These alloys may include eutectic or near-eutectic gold-tin alloys such as an alloy containing about 80% gold by weight and 20% tin by weight with a reflow temperature above 280 C. Alternately the solder alloy can be primarily tin, such as 100% tin, or tin with alloying elements such as copper and silver for improved mechanical properties. These alloys melt in the range of 200-235 C. Alternately the solder alloy can include bismuth and/or indium with melting temperatures under 235 C, such as the eutectic alloy of 52% indium and 48% tin melting at 118 C. The selection of the solder alloy used may take into consideration: the reactions with the metallization on the package in order to form a strong, electrically conductive, thermally conductive and reliable solder joint; the thermal expansion differences between the package materials and the LED die; the operation temperature of the package; the use of other solders in the assembly of the package into other products; and the methods to apply the solder to the die.
In some embodiments, the die attach is performed with the use of gold-tin solder. The solder alloy may be applied by evaporation, sputtering, plating, or another technique onto the LED die. For example, the gold-tin alloy may be deposited by thermal evaporation from gold and tin sources, or mixed gold-tin alloy sources, as a layer which may be approximately 2 um (or 1, 5, 10 um) thick. The patterning of the layer may be achieved by standard techniques, for instance the photoresist liftoff method, or wet etching, or dry etching, in order to define regions of the die connecting to either the anode or cathode of the LED die. The gold-tin alloy is particularly selected for high reliability applications because of the low chemical reactivity of the solder alloy.
In another embodiment, the die attach is performed with the use of pure tin as the solder material. The tin may be applied by evaporation, sputtering, plating, or another technique onto the LED die. For example, the tin may be deposited by thermal evaporation, as a Sn layer having a thickness of at least about 2, 5, 10, 20, or 50 um, or in a range 2-50 um or 5-20 um. The patterning of the layer may be achieved by standard techniques, for instance the photoresist liftoff method, or wet etching, or dry etching, in order to define regions of the die connecting to either the anode or cathode of the LED die. The use of tin is particularly helpful to accommodate thermal expansion differences between the materials in the package and the LED die. For example, the package may be substantially comprised of aluminum oxide with a thermal expansion coefficient of about 7.2 ppm/C (or a similar ceramic), while the LED die may be substantially comprised of GaN with a thermal expansion of about 3.9 ppm/C. The high ductility of tin, the low elastic modulus, the ability to economically apply thick layers, and the lower melting temperature all favor tin and high-tin solders over gold-tin eutectics for accommodating thermal strain differences between the LED die and the package. In the case of package materials with larger thermal expansion coefficients and/or longer lengths between the anode and cathode solder contacts, die with gold-tin solder may suffer from cracks in the solder resulting in an open circuit after die attach, due to the different thermal contraction of the die and package after cooling from reflow temperature.
In an experiment, the package was a leadframe package which substantially consisted of silicone molding compound with a thermal expansion coefficient of about 50 ppm/C and copper with a thermal expansion coefficient of about 17 ppm/C. In this experiment, a portion of LED die had electrical opens after reflow due to solder cracks in the case of using 1.7 microns of gold-tin solder. This portion was reduced when using 5 microns of tin as the solder material.
In some embodiments, the substrate and the die may have thermal expansion coefficients which differ by less than 5 (or 10 or 3) ppm/C.
Even in packages with good thermal expansion matching between the substrate and die, Sn die-attach may be desirable. For instance, the submount may still incorporate metal traces which are thick enough that their thermal expansion may have a detrimental impact on the die reliability. For instance, in dual-metal packages such as those of
In order to accommodate height differences in the package and LED die, the solder may be deposited over different regions with different wettability to achieve different solder thicknesses after melting. The details of this design are described in US patent application U.S. Ser. No. 14/615,315, which is incorporated by reference. Besides wetting control, layers are provided under the dewetting layer to limit the reaction and penetration of the solder alloy toward the anode and cathode contacts, and to provide additional mechanical compliance. These layers may be selected specifically for a tin die-attach metal. For example, tin can dissolve and/or react with substantial amounts of gold during reflow. This reaction may have undesirable impact on the solder reliability or mechanical properties, like the formation of brittle intermetallic layers. On the other hand, materials with very low chemical interaction with the solder may not form a strong solder joint. For example, chromium acts as an excellent barrier against tin penetration, but the interface between these metals is very weak. Other materials have an intermediate reaction rate which allows for strong interface formation with limited formation of brittle intermetallics. For example, barrier layers of titanium, nickel, and platinum will react slowly with tin during reflow. These layers may be deposited by various techniques, for example by evaporation or sputtering. In the case of film defects arising from the deposition process, it is advantageous to provide multiple layers of alternating materials in sequence, such that the defects in first layers are covered and protected by following layers. In an example, a barrier stack is provided with 3 pairs of 100 nm Ti and 100 nm Pt deposited by electron beam evaporation. Other material combinations and thicknesses are possible to provide the function of a barrier to tin penetration to the anode or cathode contact without formation of detrimental brittle layers. In another example, a sequence of 100 nm Ti, 50 nm Ni, 50 nm Ti, 100 nm Pt, 50 nm Ni, and 80 nm Pt provided the barrier to tin solder reflow. In another example, a thick layer of a more ductile metal or alloy is provided under the solder barrier to further accommodate mechanical strain from the assembly process or package. For instance, 500 nm of gold or 1 um of aluminum may be deposited above the anode and/or cathode contacts and below the barrier layers to provide mechanical compliance.
Referring to the
GaN 1501/[contact metal stack 1502]/P*(Ti 1503/Pt 1504) 1507/[intermediate metals 1505]/Sn 1506
Or, more generally:
GaN 1501/[contact metal stack 1502]/P*(Ti 1503/metal 1504) 1507/[intermediate metals 1505]/Sn 1506
Where P is an integer which may be 1, 2, 3, 4, 5, 8, 10 or in the range 2-10 and “P*” denotes a multiple repeat 1507 of the 2-layer stack (1503/1504) in parenthesis. The contact metal stack 1502 may comprise a high-reflectivity metal including Ag. It may be configured to form an ohmic contact to the p-type or n-type semiconductor material of the LED die. The contact metal stack and the intermediate metal stack may further comprise some of the following metals: Ti, Pt, Au, Al, Ni. Here GaN is taken as an example, but other materials including semiconductors can be used.
The solder material may also be selected to form a bond with the package metal materials with good mechanical and thermal properties. The solder material may react with the package finish 110. For example, the package finish may consist of electroplated silver or electroless nickel/immersion gold, or electroless nickel/electroless palladium/immersion gold. In the case of tin solder and a silver finish, the molten tin may dissolve some silver from the package and form silver-tin intermetallics. In the die attach process, a flux may be applied to reduce surface oxides on the solder and package to promote the formation of a strong bond. For example, a resin-mildly activated flux (RMA flux) may be applied and the package-flux-LED die assembly heated to above 232 C to melt the tin solder and form the bonds with the package and die metallizations.
In some embodiments, the various metals are selected to enable die-attach with a reflow temperature higher than 150 C but lower than 260 C, or in the range 180-250 C, 200-240 C.
In another embodiment, the die attach may be performed with the use of an anisotropic conductive paste that is dispensed on the package. The die is placed into the paste and a heat treatment is applied to form the connection. In this case it is not necessary to apply a solder material to the LED die itself. Similarly, the die attach may be performed using conductive epoxy which is cured to form the electrical contact. In these cases the selection of the metal between the paste or epoxy should be chosen for compatibility with assembly and use temperatures such that the anode and cathode contact materials are not degraded. For example, a barrier layer or layers may be added above the anode and cathode contacts for chemical, metallurgical, mechanical and electrical stability. For example, a final surface layer of gold or platinum may be used to prevent the accumulation of surface oxides that could impede formation of electrical contact. Under the final layer may be a layer of titanium and nickel to provide adhesion to underlying materials and a diffusion barrier between the paste or epoxy and the die contacts. In an example, layers of 100 nm titanium, 100 nm nickel, and 50 nm gold are provided on the die. Other layers may be included to improve the diffusion barrier and final surface, including titanium-tungsten alloys, chromium, zirconium, vanadium, tantalum, molybdenum, cobalt, copper, aluminum, palladium, rhodium, their alloys, and in various combinations.
In some embodiments, the n- and p-metals 108, on the die-attach side, have a separation which is suited for high-yield die attach but within reason given the die dimension. For instance, the separation may be at least 30, 50, 100, 150, or 200 um on a die having a typical lateral dimension in the range 250-500 um. This enables die attach to packages having larger critical dimensions. For instance, if the electrodes 110 on the package surface are separated by a gap of width W, the separation on the die side may be scaled to adapt to this value. For example, it may be at least 50%, 75%, 100% 125%, or 150% of W. Those of skill in the field might appreciate that a small die requires a gap distance which is a fraction of the die, and the gap in the package needs small as well. Certain package technologies such as copper leadframe shaped by wet etching might have difficulties reaching gaps below 150 um, therefore limiting the choices for small dies of similar dimensions. The package technologies presented here on isolated submounts are capable of reaching an aspect ratio of 1:2, 1:3, 2:1, or 3:1, or an aspect ratio in the range 1:2-2:1 between metal thicknesses and lateral gap width. Therefore, a copper thickness of about 80 um can achieve a gap of about 80 um, thus allowing for a die of 350 um in width to have a reasonable spacing gap between the electrodes, for example, 100 um. Therefore, in one embodiment, the lateral dimension of the chip is less than 500, 400, 350, or 300 um, and the gap between electrodes is less than 150, 125, 100, or 75 um.
Referring to
It should be appreciated that the selection of metallization for the die and package, as discussed above, may interact with other aspects of the invention.
For instance, it may enable reflow at a low temperature (i.e. below 280 C or below 250 C)—this in turn may enable the use of other materials in the package which are incompatible with process temperatures. For instance, the white reflector material or the protective barrier may be compatible with a process step at 230 C but not at 280 C.
Additionally, the die metallization may enable desirable die architectures. For instance, small flip-chip dies may be more prone to die shear because the contact areas are small (in contrast to legacy flip-chip dies, having an area of about 1×1 mm{circumflex over ( )}2). Therefore, in contrast to the conventional AuSn die-attach, the use of Sn as a die-attach metal enables small flip-chip dies with good die attach. In some embodiments, the die is flip-chip with a base area of about 250{circumflex over ( )}2 um{circumflex over ( )}2 (for instance a square die having a 250 um side, but other shapes like triangle are possible), or less than 500{circumflex over ( )}2 (or 300{circumflex over ( )}2, 200{circumflex over ( )}2, 100{circumflex over ( )}2) um{circumflex over ( )}. This is combined with a Sn metal in the p- and/or n-stacks to ensure good die attach.
Further, in some embodiments, the die is volumetric. A volumetric die may be defined by a thickness of at least 50 um (or 20, 80, 100, 150 um) or a thickness in the range 20-500 um, or by a ratio of height divided by characteristic lateral dimension (as defined below) which is above 10% (and sometimes on the order of unity). This is in contrast to thin-film dies where the die thickness may be about 1-10 um thick whereas its side (or characteristic lateral dimension) may be about 0.5-2 mm wide. This volumetric aspect further strengthens the die, in contrast to a thin-film die. In some embodiments, the volumetric die has a bulk conductive die substrate, which may comprise a III-Nitride substrate or a bulk GaN substrate or SiC or ZnO or GaOx or other conductive substrate (preferably transparent); in other embodiments the die substrate may be insulating and transparent, such as sapphire. In volumetric flip-chip embodiments, the die substrate faces upward (above the die epi); a transparent substrate may help light escape from the die sides. In some embodiments, at least 10% or 20% or 30% of the light emitted by the die escapes from its sidewalls.
In some embodiments, a good die attach aptitude is characterized by a sufficient die shear strength. For a die having an area of about 60,000 um{circumflex over ( )}2, a desirable die shear value may be above 200 g, 250 g, 300 g. The shear force may scale with the area of the die.
The present teachings on die-attach metals may be especially suited in situations where mechanical compliance is required. This may arise if the lateral dimensions of a flip-chip die are small, as previously mentioned. A characteristic lateral dimension for a die may be defined as the square root of its area (meaning the area of its top-view footprint). When the characteristic lateral dimension is lower than 500 um (and lower than 400 um, 300 um, 200 um, 100 um), mechanical compliance may be necessary. In various experiments of Applicants, the characteristic lateral dimension is 250 um. Further, mechanical compliance may be desirable if the flip-chip die is contacted to a metal layer which is thick enough. For instance, even if metal traces are formed on top of a ceramic substrate, thick traces may have enough thermal expansion that they may cause die damage. This may arise if the thickness of the trace is larger than 30 um, 50 um, 100 um. In this context, the relevant trace thickness is the total thickness of metal beneath the die: for instance with reference to
In some embodiment, additional structure or features are provided on the submount to improve the package's performance. For example, in some embodiments, the phosphor material is contained within a cup, which may be formed on the submount.
In some cases the package comprises an ESD die 602 which is a flip-chip ESD die. In such cases, the cup may be molded on top of the ESD, after the ESD is attached to the package, to avoid light absorption by the ESD.
Referring to
In another embodiment, the package combines some of the features described previously. For example, it comprises the dual trace/pad structure for
In other embodiments, no cup is present. Instead, the phosphor material may be dispensed over several packages at once (i.e. at the tile level). The dispense process may be dispense from a needle dispense tool, jetting, spraying, printing, conformal film coating, or other known phosphor processes. The packages may later be singulated (for instance by sawing/breaking the tile), and the phosphor may also be separated during such a singulating step. In such cases, the package side may comprise the phosphor side (as well as the side of the insulating substrate, etc. . . . ) and light may be emitted from the package side as well as its top side.
Further, in some embodiments, the top of the phosphor material is covered with a reflector (which may be a white reflector or a specular reflector). The reflector may be formed directly on the phosphor, or an air gap may be present. In such embodiments, light may be emitted from the sides but not the top. Further, some of the sides may be covered with a reflector such that only some sides (or only one side) emit light. Such packages constitute a form of side-fire (or side-emitter) package which may be useful in display applications and for waveguide/lightguide coupling; however they contrast with standard sidefire packages where the top surface of the package emits light and the package is merely tilted on its side.
In some cases, the top and side reflectors are formed in a single step. In some cases, partial singulation is done (for instance, only singulating some facets of the final package); then the side reflector is formed (for instance it is dispensed in the streets of the partially-singulated packages); then singulation is finalized to expose open surfaces which become the light-emitting surfaces. In some cases, there is an air gap between some or all phosphor surfaces and some or all reflector materials.
Various aspects of the geometry of such a package may be relevant. The dies may have any shape, including having a square base, a rectangle base, a triangle base, a diamond base. The dies may be volumetric. In some cases, the thickness of the die is at least 10% (or 20%, 30%, 50%) of the height of the phosphor material. The singulation may form a package with a square footprint, a rectangular footprint, or other shapes. The light-emitting surface may have a shape that is square, rectangular, triangular, or others.
Referring to
In step (b), the traces 903 are plated on the substrate. In so doing, the vias 905 are filled. In this particular embodiment, the bottom of the substrate is also plated with contacts 904 such that the traces 903 are connected to the bottom contacts 904 through vias 905. In step (c), the pads 906 are added to the traces. It should be understood that traces/pads may be formed by a variety of techniques, including sputtering and/or plating, including electroplating. The metal traces may be made of any conductive material including, for example, copper, aluminum, gold, etc. For instance, in one embodiment, package 100 comprises copper traced and pads. The traces may have a thickness of up to about 5, 10, 15, 20, 25, or 30 um, or a thickness in a range 10-30 um. The pads may have a thickness up to about 40, 40, 50, 60, 70, 80, 90 100, 120, or 150 um, or a thickness in a range 20-200 um or 40-100 um.
In such double-layer packages as shown in
In step (d), the reflective material 907 is added to the submount. This ensures good reflectivity of the reflector over the traces—for instance more than 90% at all wavelengths in the range 400-700 nm. In one embodiment, the reflector material is polished off to leave a flush finish with the pads 906. A mold may be used to form reflector material into a cup 908 (described above). In such cases, the planar reflective material 907 covering the package surface and the cup 908 may be formed in the same molding step. In some embodiments, the white reflector is formed before the LED die is attached, rather than dispensing white reflector after die attach. Doing so facilitates having a white reflector that is flush with the package, rather than the LED die, which can be advantageous, especially for a volumetric die.
A more detailed step list of a possible process flow is listed below. This list corresponds to a process where the cup 908 and reflective layer 907 are formed together:
Some embodiments make use of a substantially transparent material for encapsulating the LED die and/or for forming a binder for luminescent materials (also referred to as phosphors herein, although a variety of material known in the art can be used, including quantum dots). The high transparency ensures reliable operation.
In one embodiment, LED package 1700 further comprises an encapsulant disposed over the violet LED die 1704 and the at least one reflective layer 1706. In various embodiments, the encapsulant is additionally disposed over the at least one protective coating layer 108. In various embodiments, the encapsulant comprises one or more wavelength-converting materials configured to convert at least a portion of light emitted by the violet LED die 1704.
In one embodiment, submount 1702 comprises an insulating substrate comprising terminals for carrying electrical power. For example, the submount 1702 may comprise a ceramic material with metallic regions forming the terminals, 1712a and 1712b. The metallic regions may include through-vias and metal on a top and bottom of the submount 1702. In one embodiment, the metallic regions comprise copper and a top surface of the copper is further covered with metals including Nickel (as diffusion barrier) and the one or more reflective layer 1706. In various embodiments, the regions between the terminals 1712a and 1712b may be coated with a non-metallic reflecting material. For example, the regions between the terminals are coated a white reflector. In one or more embodiments, submount 1702 is a lead frame and/or may have one or more angled regions. In particular, 1702 may have a body which is substantially made of metal leads (including copper), or of metal leads and an injected material such as a silicon molding compound.
In one embodiment, the violet LED die 1704 emits violet light. For example, the violet LED die 1704 may be configured to emit violet light within a peak within a range of 400 nm to 430 nm. As is illustrated in
The violet LED die 1704 is coupled to the submount 1702. In one embodiment, the violet LED die 1704 comprises two or more pads that are coupled to corresponding terminals (1712a and 1712) of the submount 1702. In one embodiment, the pads of the violet LED die 1704 are coupled to the terminals of submount 1702 through solder joints.
In many embodiments, the violet LED die 1704 provides various advantages in many lighting applications. However, in many embodiments, the use of a violet LED die precludes the use of a phenyl silicone encapsulant, because of photo-chemical reactions which may lead to a degradation of the silicone and/or materials in contact with the silicone, such as the reflective layer. Further, in various embodiments, some organic-based coatings degrade under violet light and may be not be used in packages having a violet LED die.
For light sources employing a blue LED die, with a peak wavelength within a range of about 440 nm-about 490 nm, standard phenyl silicones may be used and act as barrier for a reflective layer. However, for light sources employing a violet LED die, with a peak wavelength within a range of about 390 nm-about 430 nm, phenyl silicones become absorbing and unreliable. Additionally, in various embodiments, while binders such as a methyl silicone can be used in embodiments employing a violet LED die, such binders may not adequately protect the reflective layer from atmospheric agents and the reflective layer may degrade. Suitable low-absorption binders are described elsewhere in this application. Thus, in various embodiment, a protective coating (e.g., protective coating 1708) may be deposited over the reflective layer (e.g., one or more reflective layers 1706) to improve the performance and reliability of LED packages comprising a violet LED die.
Returning to
In various embodiments, the at least one reflective layer 1706 differs with some conventional packages which use other metals such as aluminum. While aluminum may be more reliable than silver, it is less reflective especially for light wavelengths above 390 nm. Therefore, silver may be preferable in embodiments that include a violet LED as the LED die.
In some embodiments, the at least one reflective layer 1706 has a normal-incidence reflectivity which is higher than 98% (or 99%, or 99.5%, or 99.8%) at a wavelength in the range 400 nm-700 nm. Further, in some embodiments, the at least one reflective layer 1706 has a normal-incidence reflectivity which is higher than 90% (or 95%, 97%, 99%) at all wavelengths in the range 400 nm-700 nm. In some embodiments, the at least one reflective layer 1706 has a reflectivity which is higher than 90% (or 95%, 97%, 98%, 99%) at all wavelengths in the range 400-700 nm, when averaged over angles of incidence as explained below.
The protective coating 1708 is disposed over at least a portion of the at least one reflective layer 1706. In one embodiment, the protective coating 1708 is disposed over the entirety of the at least one reflective layer 1706. In other embodiments, the protective coating 1708 is disposed over at least a portion the violet LED die 1704.
In various embodiment, the least one protective coating layer 1708 may be referred to as a barrier as it protects the at least one reflective layer 1706 from atmospheric agents. For example, the least one protective coating layer 1708 is compatible with short-wavelength operation (violet light) and protects the at least one reflective layer 1706 from degradation from one or more of short-wavelength light, sulfur, oxygen, and heat.
Various tests for assessing reliability and degradation will be described in the following.
The protective coating 1708 may be formed of inorganic materials such as SiOx, AlyOx, TiOx, NByOx, AlSiOx, SiNx, ZrOx, transparent oxide, glass, or organic materials such as polyvinyl alcohol, aminopropyltriethoxysilane, ethylene vinyl alcohol, (poly)-siloxane, (poly)-silazane or triazine based coating. The coating layer may be dispensed as a spin-on coating and cured; it may be spray-coated; it may be vapor deposited; it may be deposited by sputtering, evaporation, ALD, CVD; other deposition methods are possible.
In various embodiment, the thickness of the protective coating 1708 is configured to provide a barrier to gases. For example, it may be at least 10 nm, 50 nm, 100 nm. In various embodiments, the thickness should be low enough to avoid cracking due to thermal or mechanical stress. For example, it may be less than 1000 um, 100 um, 10 m, 1 um, or 5 um. In some embodiments, the thickness is in a range of 100 nm to 10 um. In one embodiment, the thickness of the protective coating 1708 is about 1000 nm and is comprised of least one layer of AlSiOx.
In one or more embodiments, one or more parameters of the protective coating 1708 may be configured to provide and/or optimize one or more protective effects. For example, one or more of a chemical composition, viscosity, porosity, elasticity, and permeability may adjusted to provide and/or optimize one or more protective effects. In various embodiment, the viscosity of the protective coating is in a range from 1 cp to 30,000 cp. Further, the water and oxygen permeability of the protective coating is in a range from about 0.01 cc/m2/24 hour-about 10 cc/m2/24 hour. Additionally, the Young's modulus of the protective coating is in a range from 0.001 to 50.
In one embodiment, the protective coating TS 108 is solvated in a low viscosity solvent, dispensed, drop casted or spray coated into a cup, allowing the solvent to evaporate at room temperature or at elevated temperature, and after the film has dried, the protective coating layer is cured. In other embodiments, the protective coating 1708 is solvated in a low viscosity solvent, spray coated on a planar submount, allowing the solvent to evaporate in air or at elevated temperature, and after the film has dried, the protective coating is cured. In various embodiments, the protective coating 1708 is drop casted or dispensed directly into the package with a well-defined cup without the use of solvent or dilution. The protective coating 1708 may be cured after it is drop casted or dispensed. In one or more embodiments, the protective coating 1708 may be applied using thin-film deposition methods such as Atomic Layer Deposition (ALD), or Chemical Vapor Deposition (CVD), or Plasma Vapor Deposition (PVD).
In one or more embodiments, the protective coating 1708 may serve as a binder for one or more phosphors—in which case the protective coating may simultaneously act as an encapsulant.
In various embodiments, depending on the protective coating elasticity, hardness, thickness, thickness uniformity, curvature, topology of the submount, surface energy of the reflective layer, surface cleanliness, presence of LED, ESD and/or other components inside the package, the final cured proactive coating 1708 may or may not have cracks. In some embodiments the barrier does not present any crack longer than 20 microns.
In various embodiments, a protective coating may have low permeability and also have low elasticity and crack resistance. In such embodiments, the protective coating thickness may be less than 20 microns. In other embodiments, a protective coating may have higher permeability and also have higher elasticity and crack resistance. In such embodiments, the protective coating thickness may be more than 20 microns. These embodiments illustrate that there may be a trade-off between protective coating permeability and probability of protective coating cracking. Thinner protective coatings have a lower probability of cracking, but has higher permeability and provides less protection from atmospheric agents. Some thicker protective coatings have a higher probability of cracking, but has lower permeability that provides better protection from atmospheric agents.
The level of protection against atmospheric gasses provided by the protective coating for the reflective layer can be quantitatively measured by exposing the protective coating-coated package to a sulfur rich environment and observing the light output change of the LED package over time.
In one or more embodiments, the use of surface treatments such as Ar/H2 plasma and chemical or physical etching may improve the protective coating's uniformity, protective coating adhesion and reduce the occurrence of cracking and or delamination. Such treatments may be applied to the reflective layer prior to deposition of the protective coating.
In one or more embodiments, the at least one reflective layer 1706 may be disposed at later stage in the process of producing a package, such as package 1700, to avoid degradation of its reflectivity. For example, the at least one reflective layer 1706 may be deposited by a plating step (such as electroplating), after all the photolithography, printing and molding steps have been performed.
In some embodiments, the protective coating 1708 is formed over the submount 1702 surface and the violet LED die 1704 is then coupled to the submount 1702, over the protective coating. In other embodiments, the violet LED die 1704 is first coupled to the submount 1702 and the protective coating 1708 is then applied. Further, the at least one reflective layer 1706 may be formed on the submount 1702 before the violet LED die 1704 is couple to the submount 1702 or the at least one reflective layer 1706 may be formed on the submount 1702 after the violet LED die 1704 has been coupled to the submount 1702.
1802 of
1902 of
In various embodiments, various test conditions for determining the extent of degradation may be considered. For example, one or more of the temperature, LED current, LED current density and testing time may be varied for testing. In various embodiments, the temperature may be 25° C., 85° C., or 130° C. The LED current may be 10 mA, 50 mA, 100 mA, 120 mA, or 200 mA. The LED current density may be 10 A/cm2, 20 A/cm2, 50 A/cm2, 100 A/cm2, 200 A/cm2, 500 A/cm2, or 1000 A/cm2. The testing time may be 100 hrs, 200 hrs, 500 hrs, 1000 hrs, 5000 hrs, or 10000 hrs. In one or more embodiments, the test conditions include the introduction of an additional factor which can induce degradation, including water vapor or sulfur.
For a selected set of test conditions, one or more parameters of the protective coating may be configured to achieve a predetermined radiometric maintenance. For example, the type of material or materials, number of layers and the placement of the protective coating may be selected to configure the protective coating to achieve a predetermined radiometric maintenance.
In the embodiment of
In various embodiment, more complex configuration may be employed, as is known in the art, to reach even higher reflectivity. Some embodiments may have tens of layers, and may be designed as distributed Bragg reflectors. Optimization of the reflectivity may be obtained by techniques described within this disclosure. In particular, the stack may be configured to provide high reflectivity in the presence of an underlying silver reflector.
In some embodiments, the multilayer coating disposed over a violet LED die has a normal-incidence transmission which is higher than 80% (or 90%, or 95%, or 97%, or 99%) at the LED's peak emission wavelength.
In some embodiments, the protective coating has an angle-averaged transmission (as explained above) which is higher than 20% (or 25%, 30%, 35%) at the LED's peak emission wavelength.
In some cases, use of more than one material to for a protective coating improves the degradation properties, as each material may have a specific beneficial effect (for instance, each material is a diffusion barrier for some chemical species).
In some embodiments, the protective coating comprises a plurality of layers having varying refractive index. In such embodiments, the protective coating may be configured to provide additional reflectivity for light. For instance, the protective coating may be configured to create an interference effect in the presence of the underlying reflective layer or layers, to increase the reflectivity.
In one or more embodiments, the protective coating comprises at least one low-index layer having an index less than about 1.55 or 1.5. For example, the protective coating may comprise a nano-porous material having an index of refraction less than about 1.4, 1.3 or 1.2. In one embodiment, the protective coating comprises at least one high-index layer having an index more than about 1.6, 1.7, 1.8, 1.9, 2, 2.1, 2.2, 2.3, 2.4, or 2.5.
In particular, in some embodiments, the coating covers both the reflective surface and the die (or part thereof). The coating is configured to be substantially transparent for light emitted from the LED; but to produce an interference effect with the reflective metal to enhance its reflectivity.
It should be understood that the features of the embodiments above can be mixed and match to provide novel LED packages. While the existence of some of these aspects might be known in the prior art, their combination may provide unexpected benefits over common practice in the prior art. For example, the features described above may be combined as follows:
Performance and Reliability
In some embodiments, the invention is configured for high performance including high optical performance and high optical performance at short wavelength. As is known in the art, performance may be measured as white wall plug efficiency, or lumens per watts, at a given current (or current density in the active region) and at a given temperature; performance may also be expressed as package efficiency.
In some embodiments, as previously described, the phosphor is contained within a cup. The package cups can be round, square, rectangular and elliptical in the light emitting area, depending on the number of dies used, the shapes of the dies used, and the packaging method (wirebond or flip-chip).
In some embodiments, the package cup height can range from 0.2-0.5 mm for good performance and compatibility with packages processes.
The lateral dimensions of the cup may influence performance. Namely, as the light-emitting area (i.e. the area of the top surface of the phosphor) shrinks, the cup tends to absorb more light. On the other hand, it may be desirable to shrink the light-emitting area for other reasons (including brightness and color uniformity, as discussed below). Some embodiments are optimized to mitigate the performance drop.
In some embodiments, the package emits substantially white light with the following properties:
In some embodiments, for some of the properties above, the package is characterized by some of the following performance:
Some experimental results are listed in the table below.
The cup is a white diffusing material, and can be high-reflectivity or medium-reflectivity material. It should be appreciated that the lm/W numbers may be affected by the shape of the spectrum (namely, various of these experiments correspond to spectra with high violet leaks, which have a low luminous equivalent of radiation).
In the case of exposed silver, the reflectivity may correspond to that shown for Ag on
In some embodiments, the surface of the package (before deposition of the phosphor material) is partially or fully covered by a white reflecting material. The reflectivity of the material depends on the material composition, thickness and fabrication technique. High reflectivity white material that are sufficiently thick can reach reflectivity >96%. Medium reflectivity material that are sufficiently thick can reach reflectivity >93%.
On the other hand, it is also possible to configure white materials having a high reflectivity with a lower thickness. This may be achieved by configuring the scattering particle size (for instance, by having a plurality of particle sizes to scatter several wavelengths of light efficiently and increase packing of the scattering particles in the binder). Besides, it is possible to lay down a thin layer of such materials on a thick “gray” substrate (i.e. an imperfectly-reflecting substrate such as some ceramics). With the right combination of substrate type and thickness, and white material type and thickness, high reflectivity can be achieved despite a modest thickness of white material.
Note that the measurements of
In some embodiments, the substrate is translucent. To recuperate the light that leaks through the substrate, a reflector may be placed on the backside of the substrate to reflect the light back upwards. The reflector may be a white reflector or a metal.
In various embodiments, the substrate material, and the white material and its thickness, are configured to reach a desired reflectivity in a desired wavelength range.
For all the white reflectivities measured in this application, data is collected coming from air. It is important to realize that reflectivity improves when the incoming medium is a high-index encapsulant like silicone (n˜1.4-1.6). This is because scattered light trajectories have a higher chance of re-entering silicone than air. The ratio of “escape cone” solid angles is about n{circumflex over ( )}2/1{circumflex over ( )}2˜2, therefore it is about double. Thus the loss when coming from silicone to air is about halved. This has been verified in careful experiments with light coming from a high-index medium. Accordingly, the table below translates reflectivities in air to equivalent reflectivities in a high-index medium:
The material used in
As previously mentioned, some embodiments comprise a cup. The cup may be made highly reflective, with reflectivity >95% at 550 nm for reflectors using silicone binders suitable for dispensing and molding, or >98% at 550 nm for reflectors with microscope air pores or filaments that are manufactured separately from the package but later combined using lamination or adhesives.
In some embodiments, the surface coverage of the package is configured to offer high performance. Some examples are shown on the table below. Some examples correspond to configurations with exposed Ag (either “maximal” Ag or “minimal” Ag), others have no exposed Ag and only a white reflector. In this table, the area coverage refers to the “open” package area where no dies are present and light can impinge on the package.
Color uniformity: In other embodiments, performance is measured by color-over-angle in the far-field of the package, or as color-versus-position in the near-field of the package.
For applications in directional lighting, the light emitting area of the light source directly impacts the achievable center beam candle power of lenses with a fixed size. For this reason, the package must be sized appropriately taking into account both the light emitting area, as well as its impact on the efficiency of the package. In general, smaller light emitting area both constrains the LED die size that can be used, and also reduces the overall efficiency of the package due to increase light scattering and smaller aperture for light to escape the package.
In some embodiments, the phosphor powder within the encapsulant is allowed to sediment during the dispense process to improve package color over angle. In some embodiments, the phosphor silicone mixture is sprayed on to the package to improve color over angle
The color uniformity versus position on the package is critical for directional lighting purposes because it has a strong effect on the product color-over-angle in the far field. In order to reduce the color variation as a function of position in the package, the following design rules may be beneficial
In some embodiments, the size of the light-emitting area and the size and position of the pump dies is configured to obtain a near-field uniformity below a predetermined value.
Du′v′=sqrt((u′−u′0)2+(v′−v′0)2)*sign(v′−v′0)
This local chromaticity is shown on
In some embodiments, the package size/dimensions/shape, the layout of the dies, and the phosphor (formulation, height etc) are configured such that 75% of the package's light-emitting area is within values Du′v′ lower than +/−0.020 (or 0.015, 0.010).
Reliability
Sulfur: In some embodiments, the package is resistant to sulfur atmosphere.
In sulfur tests, the package is introduced in an enclosed sulfur atmosphere and maintained at a temperature of 65 C, without electrical injection. Reliability is assessed by degradation of the package materials or by loss in optical output.
After a predetermined exposure time of 8 hrs (or 12, 24, 48, 72 hrs), the fraction of the package surface area which is optically degraded may be below 1% (or 0.1%, 2%, 5%, 10%). In general, optical degradation may be defined by direct visual observation; or by a local reduction in reflectivity by a predetermined amount (for instance, an absolute reflectivity decrease worse than −5%, −10% or −20% at a selected wavelength such as 400 nm, 500 nm, 600 nm); or by measuring the reduction in light output (less than −1%, −2%, −5%, −10%). Such sulfur tests may be performed either in the absence or presence of a phosphor material.
HTOL: In some embodiments, the package is reliable in High-temperature Operating Life testing.
In HTOL, the package is electrically injected at high temperature in a dry atmosphere. The test time may be 500 hrs, 1,000 hrs, 5,000 hrs, 10,000 hrs. The package temperature may be 65 C, 80 C, 100 C, 120 C, 150 C, 200 C. The current density in the LEDs may be 20 A·cm−2, 40 A·cm−2, 60 A·cm−2, 80 A·cm−2, 100 A·cm−2, 150 A·cm−2, 200 A·cm−2, 300 A·cm−2, 500 A·cm−2.
Reliability is assessed by loss in optical output, or by damage to the package including optical tarnish, browning, delamination, cracking, or by electrical leakage. Embodiments are given in the table below:
WHTOL: In some embodiments, the package is reliable in Wet High-temperature Operating Life testing.
In WHTOL, the package is electrically injected at high temperature in a wet atmosphere (for instance, above 80% humidity). The test time may be 100 hrs, 200 hrs, 500 hrs. The package temperature may be 60 C, 80 C, 100 C, 120 C. The current density in the LEDs may be 20 A·cm−2, 40 A·cm−2, 60 A·cm−2, 80 A·cm−2, 100 A·cm−2, 150 A·cm−2, 200 A·cm−2, 300 A·cm−2, 500 A·cm−2. The power cycle may be: on at all times, or switching on-off with a predetermined duty factor (including 25%, 50%, 75%) and a predetermined period (including 30 min, 1 hr, 2 hrs).
In some embodiments, reliability is assessed by loss in optical output, or by damage to the package including optical tarnish, browning, delamination, cracking, or by electrical leakage. Embodiments are given in the table below:
These and other advantages maybe realized in accordance with the specific embodiments described as well as other variations. It is to be understood that the above description is intended to be illustrative, and not restrictive. Many other embodiments and modifications within the spirit and scope of the claims will be apparent to those of skill in the art upon reviewing the above description. The scope of the invention should, therefore, be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled.
This application is based on U.S. Provisional Application No. 62/352,864, filed Jun. 21, 2016, hereby incorporated by reference in its entirety.
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/US17/38625 | 6/21/2017 | WO | 00 |
| Number | Date | Country | |
|---|---|---|---|
| 62352864 | Jun 2016 | US |
