Claims
- 1. A light emitting diode capable of having a high switching rate and reduced non-radiative recombination due to tunneling comprising:
- an active recombination region of a first semiconductor material containing group III-V elements,
- said active recombination region being bordered by at least one layer of a second semiconductor material containing group III-V elements, said second semiconductor material having a lower refractive index than the refractive index of said first semiconductor material,
- said active recombination region and said one layer being doped to have opposite conductivity types whereby a rectifying junction is provided therebetween, radiative recombination of oppositely charged carriers taking place in said active recombination region when said rectifying junction is forward biased beyond threshold;
- said active recombination region being comprised of a plurality of contiguous layers, one of said layers of said active recombination region being degenerately doped to a level of at least approximately 10.sup.19 /cm.sup.3 with a dopant that diffuses readily in both said first material and said second material, said one layer of said active recombination region being separated from said rectifying junction by another of said layers of said active recombination region, said another layer of said active recombination region being less than degenerately doped with a dopant that does not diffuse readily in both said first material and said second material, whereby non-radiative recombination of oppositely charged carriers due to carrier tunneling is reduced.
- 2. A light emitting diode capable of having a high switching rate and reduced non-radiative recombination due to tunneling comprising:
- an active recombination region of a first semiconductor material containing group III-V elements,
- said active recombination region being bordered by at least one layer of a second semiconductor material containing group III-V elements, said second semiconductor material having a lower refractive index than the refractive index of said first semiconductor material,
- said active recombination region and said one layer being doped to have opposite conductivity types whereby a rectifying junction is provided therebetween, radiative recombination of oppositely charged carriers taking place in said recombination region when said rectifying junction is forward biased beyond threshold,
- said active recombination region being comprised of a plurality of contiguous layers, one of said layers of said active recombination region being degenerately doped to a level of at least approximately 10.sup.19 /cm.sup.3 with a dopant that diffuses readily in both said first material and said second material, said one layer of said active recombination region being separated from said rectifying junction by at least two other layers of said active recombination region, the layer of said at least two other layers closest to said first layer of said active recombination region being degenerately doped to a level of at least approximately 10.sup.19 /cm.sup.3 with a dopant that does not diffuse readily in both said first material and said second material, the layer of said at least two other layers of said active recombination region further from said first layer of said active recombination region being less than degenerately doped with a dopant that does not diffuse readily in both said first material and said second material, whereby non-radiative recombination of oppositely charged carriers due to carrier tunneling is reduced.
Parent Case Info
This is a continuation of application Ser. No. 786,169, filed Feb. 11, 1977, now abandoned.
US Referenced Citations (3)
Continuations (1)
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Number |
Date |
Country |
Parent |
786169 |
Feb 1977 |
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