The present disclosure relates to a light emitting display panel and an electronic device, and more particularly to a light emitting display panel and an electronic device with improved display quality.
Electronic devices such as smart phones, tablets, notebook computers, navigations, and smart televisions are being developed. These electronic devices have a display panel for providing information. Electronic devices include a variety of electronic modules in addition to the display panel.
Electronic devices should meet display quality requirements for their intended use. The light generated from the light emitting element is emitted to the outside of the electronic device while generating various optical phenomena such as a resonance and interference. This optical phenomenon may affect the quality of the displayed image.
The present disclosure provides a display panel with improved display quality.
The present disclosure also provides an electronic device with reduced reddishness of white images.
An embodiment of the inventive concept provides a light emitting display panel including: a base layer; a light emitting element including a first electrode disposed on the base layer, a light emitting layer disposed on the first electrode, and a second electrode disposed on the light emitting layer; and a stacked structure disposed on the light emitting element and including a plurality of layers, wherein a first layer to a q-th layer among the plurality of layers satisfy at least one of the following Equations 1 and 2. The first layer contacts with the second electrode.
In Equations 1 and 2, m is 0 and a natural number, n1,z to nq,z are refractive indices in a thickness direction of each of the first layer to the q-th layer, d1 to dq are respective thicknesses of the first layer to the q-th layer, θair is 20° to 40°, λ, in Equation 1 is 610 nm or more and 645 nm or less, and λ in Equation 2 is 515 nm or more and 545 nm or less.
In Equations 1 and 2, Φ1,CE is the following Equation 3,
In Equation 3, r1,CE is defined as a reflection coefficient of the first layer for the light emitting element, and if Im(r1,CE)≥0, 0≤ϕ1,CE≤π and if Im(r1,CE)<0, π<ϕ1,CE<2π.
In Equations 1 and 2, if the refractive index of the q-th layer is larger than the refractive index of a q+1th layer, Φq,q+1 is π and if the refractive index of the q-th layer is smaller than the refractive index of the q+1th layer, Φq,q+1 is 0.
In an embodiment, the light emitting element may include a first light emitting element for generating blue light having a peak in a range of 440 nm to 460 nm; a second light emitting element for generating green light having a peak in a range of 515 nm to 545 nm; and a third light emitting element for generating red light having a peak in a range of 610 nm to 645 nm.
In an embodiment, the first layer to the q-th layer of the stacked structure may satisfy Equation 4 below.
n
1,z
d
1
+n
2,z
d
2
. . . n
q,z
d
q≤4000 nm [Equation 4]
In an embodiment, in Equation 4, q may be 3 to 5.
In an embodiment, the stacked structure may include a first organic layer, a first inorganic layer, a second inorganic layer, a second organic layer, and a third inorganic layer, which are sequentially stacked.
In an embodiment, the q-th layer may be the second inorganic layer.
In an embodiment, the first organic layer may include the same organic material as the light emitting element, wherein the thicknesses of the first organic layer and the first inorganic layer may be 300 nm or less.
In an embodiment, the first inorganic layer may include lithium fluoride.
In an embodiment, each of the second inorganic layer and the third inorganic layer may include at least one of silicon nitride, silicon oxynitride, silicon oxide, a titanium oxide layer, and aluminum oxide.
In an embodiment, a refractive index of the second inorganic layer may be 1.5 to 1.9, and a thickness of the second inorganic layer may be 800 nm to 2000 nm.
In an embodiment, a refractive index of the second organic layer may be 1.4 to 1.8, and a thickness of the second organic layer may be 1000 nm to 12000 nm.
In an embodiment, the q-th layer may be the second organic layer.
In an embodiment, a refractive index of the second organic layer may be 1.4 to 1.8, a thickness of the second organic layer may be 1000 nm to 2500 nm, wherein a refractive index of the second inorganic layer may be 1.5 to 1.9, and a thickness of the second inorganic layer may be 500 nm to 1600 nm.
In an embodiment, the stacked structure may include a first organic layer disposed directly on the light emitting element, a first inorganic layer disposed directly on the first organic layer, and an second organic layer and an second inorganic layer disposed on the first inorganic layer, wherein the q-th layer may be the second organic layer or the second inorganic layer.
In an embodiment of the inventive concept, an electronic device includes: a light emitting display panel; and a window disposed on the light emitting display panel, wherein when the light emitting display panel displays a single white image, a graph showing an intensity of light of the single white image measured at a height of 30 cm from the window and at a viewing angle of 20° to 40° in the CIE 1931 color coordinates is disposed on the left and top of a block body curve.
In an embodiment, the light emitting display panel may include: a first light emitting element configured to generate red light; a second light emitting element configured to generate green light; a third light emitting element configured to generate blue light; and interference layers disposed on the first light emitting element, the second light emitting element, and the third light emitting element, wherein the red light may be extinctively interfered in the interference layers, and the blue light may be constructively interfered in the interference layers. In an embodiment, a first interference layer to a q-th interference layer (q is a natural number of 3 or more) among the interference layers may satisfy at least one of Equation 1 and Equation 2 below. The first interference layer contacts with the first light emitting element, the second light emitting element, and the third light emitting element.
In Equations 1 and 2, m is 0 and a natural number, n1,z to nq,z are refractive indices in a thickness direction of each of the first layer to the q-th layer, d1 to dq are respective thicknesses of the first layer to the q-th layer, θair is 20° to 40°, λ, in Equation 1 is 610 nm or more and 645 nm or less, and λ in Equation 2 is 515 nm or more and 545 nm or less.
In Equations 1 and 2, Φ1,CE is the following Equation 3,
In Equation 3, r1,CE is defined as a reflection coefficient of reflection coefficient for the light emitting element, and if Im(r1,CE)≥0, 0≤ϕ1,CE≤π and if Im(r1,CE)<0, π<ϕ1,CE<2π.
In Equations 1 and 2, if the refractive index of the q-th layer is larger than the refractive index of a layer disposed directly above the q-th layer, Φq,q+1 is π and if the refractive index of the q-th layer is smaller than the refractive index of the layer disposed directly above the q-th layer, Φq,q+1 is 0.
In an embodiment, a display surface where a single white image is displayed on the window may be defined by a first direction axis and a second direction axis, wherein a length of the display surface along the first directional axis is 10 cm to 20 cm.
In an embodiment, the electronic device may further include at least one of an input sensor and an anti-reflection layer disposed between the window and the light emitting display panel.
In an embodiment, the first interference layer to the q-th interference layer may satisfy Equation 4 below.
n
1,z
d
1
+n
2,z
d
2
. . . n
q,z
d
q≤4000 nm [Equation 4]
The accompanying drawings are included to provide a further understanding of the inventive concept, and are incorporated in and constitute a part of this specification. The drawings illustrate exemplary embodiments of the inventive concept and, together with the description, serve to explain principles of the inventive concept. In the drawings:
4A and 4B are cross-sectional views of an electronic device according to an embodiment of the inventive concept;
Hereinafter, embodiments of the inventive concept will be described in more detail with reference to the accompanying drawings. In this specification, when it is mentioned that a component (or, an area, a layer, a part, etc.) is referred to as being “on”, “connected to” or “combined to” another component, this means that the component may be directly on, connected to, or combined to the other component or a third component therebetween may be present.
Like reference numerals refer to like elements. Additionally, in the drawings, the thicknesses, proportions, and dimensions of components are exaggerated for effective description. “And/or” includes all of one or more combinations defined by related components.
It will be understood that the terms “first” and “second” are used herein to describe various components but these components should not be limited by these terms. The above terms are used only to distinguish one component from another. For example, a first component may be referred to as a second component and vice versa without departing from the scope of the present disclosure. The singular expressions include plural expressions unless the context clearly dictates otherwise.
In addition, terms such as “below”, “the lower side”, “on”, and “the upper side” are used to describe a relationship of configurations shown in the drawing. The terms are described as a relative concept based on a direction shown in the drawing.
In various embodiments of the inventive concept, the term “include,” “comprise,” “including,” or “comprising,” specifies a property, a region, a fixed number, a step, a process, an element and/or a component but does not exclude other properties, regions, fixed numbers, steps, processes, elements and/or components.
As shown in
When the direction in which the image is displayed is set to be the same as the third direction axis DR3, an upper surface (or a front surface) and a lower surface (or a rear surface) of each of the elements are defined by the third direction axis DR3. Hereinafter, the first to third directions refer to the same reference numerals as the directions indicated by the first to third direction axes DR1, DR2, and DR3, respectively.
In an embodiment of the inventive concept, an electronic device ED having a planar display surface is shown, but is not limited thereto. The electronic device ED may further include a curved display surface. The electronic device ED may include a stereoscopic display surface. The stereoscopic display surface includes a plurality of display areas indicating different directions, and may include, for example, a polygonal columnar display surface.
The electronic device ED according to this embodiment may be a rigid display device. However, without being limited thereto, the electronic device ED according to the inventive concept may be a flexible electronic device ED having the shape of
As shown in
The display area ED-DA may have a rectangular form. The non-display area ED-NDA may surround the display area ED-DA. However, the inventive concept is not limited thereto, and the shape of the display area ED-DA and the shape of the non-display area ED-NDA may be relatively designed. For example, a non-display area ED-NDA may be disposed only in an area facing in the first direction DR1.
As shown in
Since the light emitted from the display panel DP are provided to the user differently depending on the viewing angles θ0, θ1, and θ2. The propagation path of the light corresponding to the first viewing angle θ0 and the propagation path of the light corresponding to the second viewing angle θ1 and the propagation path of the light corresponding to the third viewing angle θ2 are different from each other. In addition, the light generated in the inside of the display panel (for example, the organic light emitting layer) passes through the plurality of layers and is emitted to the outside. Because the interference phenomenon by the plurality of layers varies depending on the propagation path of light, the white image displayed on the electronic device ED may look different to a user depending on the viewing angles θ0, θ1, and θ2.
The graphs described with reference to
The graph shown in
WΔx=−0.0227+0.0934Xr+0.0196Yg−0.0917Zb
WΔy=−0.00777+0.0337Xr+0.142Yg−0.167Zb
In Equations above, WΔx represents a displacement of white color according to an x-axis and WΔy represents a displacement of white color according to a y-axis.
The above relational expression means that a change in luminance in the red wavelength range, the blue wavelength range, and the blue wavelength range affects the color change of the white image. If the luminance change in the red wavelength range, the blue wavelength range, and the blue wavelength range is controllable according to the viewing angle, the change in color tone according to the viewing angle of the white image may be controlled.
Based on the spectra of light measured at different viewing angles at a 30 cm height H1 from an electronic device ED, the tristimulus value according to the viewing angle is calculated. A tristimulus value is calculated from a spectrum of light using a color matching function, and a tristimulus value is normalized to calculate a color coordinate value according to a viewing angle.
The measurement of the spectrum of the light emitted from the electronic device ED at the 30 cm height H1 (see
The black body curve (BBC) shown in
The first graph GH-R is the spectrum of the light emitted from the electronic device according to the comparative example. According to the first graph GH-R, the color coordinates corresponding to the viewing angle of 20° to 40° are arranged on the lower or right side of the black body curve (BBC). Thus, when looking at a viewing angle of 20° to 40°, the white image displayed on the electronic device ED becomes reddish-white. In relation to the spectrum of the light measured corresponding to the viewing angle of 20° to 40°, a tristimulus value of Xr may be large or a tristimulus value of Yg may be small in comparison to the black body curve (BBC).
For a white image displayed on an electronic device (ED, see
A second graph GH-S in
Here, it may be seen that the color coordinates outside the range of 20° to 40° of the second graph GH-S do not change significantly with respect to the first graph GH-S. This is because, as will be described later, a layer having an optical distance of a predetermined thickness or more is controlled, and a layer having an optical distance of a predetermined thickness or less is fixed to a constant thickness.
The first graph GH-RR shown in
Unlike the embodiment described with reference to
According to the inventive concept, by controlling the material and the thickness of the upper stacked structure disposed on the display panel, the tristimulus value of Xr and the tristimulus value of Yg of the light emitted from an electronic device may be periodically controlled. This control may reduce the tristimulus value of Xr periodically or increase the tristimulus value of Yg periodically. The tristimulus value of Xr may be periodically decreased and the tristimulus value of Yg may be periodically increased at the same time. Hereinafter, the upper stacked structure and the optical distance will be described in more detail with reference to
4A and 4B are cross-sectional views of an electronic device ED according to an embodiment of the inventive concept.
An electronic device ED according to an embodiment of the inventive concept may include a display panel DP, an input sensor ISU, an anti-reflector RPU, and a window WU. The display panel DP generates an image, and the input sensor ISU acquires coordinate information of an external input (e.g., a touch event). The anti-reflector RPU reduces the reflectance of light incident from the outside, and the window WU provides the display surface ED-IS. At least some of the configurations of the display panel DP, the input sensor ISU, the anti-reflector RPU and the window WU are formed by a continuous process, or at least some configurations may be coupled together via an adhesive member.
Referring to
The input sensor ISU may include at least one conductive layer and at least one insulating layer. At least one conductive layer may include a plurality of sensor electrodes. The input sensor ISU may include a plurality of sensor electrodes, such as capacitive touch panels.
The anti-reflector RPU reduces the reflectance of natural light (or sunlight) incident from above the window WU. The anti-reflector RPU according to an embodiment of the inventive concept may include a retarder and a polarizer. The retarder may be a film type or a liquid crystal coating type, and may include a λ/2 retarder and/or a λ/4 retarder. The polarizer may also be of film type or liquid crystal coating type. The film type includes a stretch-type synthetic resin film, and the liquid crystal coating type may include liquid crystals arranged in a predetermined arrangement. The retarder and the polarizer may further include a protective film. The retarder and the polarizer itself or the protective film may be defined as the base layer of the anti-reflector RPU.
The anti-reflector RPU according to an embodiment of the inventive concept may include color filters. The color filters have a predetermined arrangement. The arrangement of the color filters may be determined in consideration of the light emission colors of the pixels included in the display panel DP. The anti-reflector RPU may further include a black matrix disposed adjacent to the color filters.
The window WU according to an embodiment of the inventive concept includes a base layer WP-BS and a light blocking pattern WP-BZ. The base layer WP-BS may include a glass substrate and/or a synthetic resin film or the like. The base layer WP-BS is not limited to a single layer. The base layer WP-BS may include two or more films bonded with an adhesive member.
The light blocking pattern WP-BZ partially overlaps the base layer WP-BS. The light blocking pattern WP-BZ may be disposed on the back surface of the base layer WP-BS to define a bezel area of the display device DD, that is, a non-display area DD-NDA (see
The light blocking pattern WP-BZ may be formed as a colored organic film, for example, by a coating method. Although not shown separately, the window WU may further include a functional coating layer disposed on the front surface of the base layer WP-BS. The functional coating layer may include an anti-fingerprint layer, anti-reflective layer, and a hard coating layer.
The input sensor ISU, the anti-reflector RPU, and the window WU shown in
The multi-layer structure is formed through a series of processes with different configurations. In other words, the lowest layer of the multi-layer structure is disposed on the base. The base may be separately provided or the display panel DP may be the base.
As shown in
The display panel DP may include a pixel region DP-DA and a peripheral region DP-NDA on a plane. The pixel region DP-DA is a region where pixels PX-R, PX-G, and PX-B are arranged and the peripheral region DP-NDA is a region where no pixels PX-R, PX-G, and PX-B are arranged. The pixel region DP-DA and the peripheral region DP-NDA correspond to the display area ED-DA and the non-display area ED-NDA shown in
Each of the pixels PX-R, PX-G, and PX-B includes an organic light emitting diode and a pixel driving circuit connected thereto. The pixels PX-R, PX-G, and PX-B may be divided into a plurality of groups according to the emitted color. The pixels PX-R, PX-G and PX-B may include, for example, red pixels PX-R, green pixels PX-G, and blue pixels PX-B. The pixels PX-R, PX-G, and PX-B may include organic light emitting layers of different materials.
The first transistor T1 outputs a data signal applied to the data line DL in response to a scan signal applied to the scan line GL. The capacitor Cst charges a voltage corresponding to a data signal received from the first transistor T1. The second transistor T2 is connected to the organic light emitting diode OLED. The second transistor T2 controls a driving current flowing through the organic light emitting diode OLED in correspondence to a charge amount stored in the capacitor Cst.
The equivalent circuit is only an embodiment and is not limited thereto. The pixel PX may further include a plurality of transistors, and may include a larger number of capacitors. The organic light emitting diode OLED may be connected between the power line PL and the second power voltage ELVSS.
As shown in
The first transistor T1 and the second transistor T2 may be disposed on the buffer film BFL. On the other hand, according to another embodiment of the inventive concept, some of the first transistor T1 and the second transistor T2 may be modified as a bottom gate structure.
A pixel defining film PDL and an organic light emitting diode OLED may be disposed on the organic film 30. The pixel defining film PDL may include an organic material. A first electrode AE is disposed on the organic film 30. The first electrode AE is connected to the output electrode of the second transistor T2 through a through hole penetrating the organic film 30. An opening part OP is defined in the pixel defining film PDL. The opening part OP of the pixel defining film PDL exposes at least a part of the first electrode AE. In an embodiment of the inventive concept, the pixel defining film PDL may be omitted.
A hole control layer HCL, a light emitting layer EML, an electron control layer ECL, and a second electrode CE may be sequentially arranged on the first electrode AE. The hole control layer HCL may include a hole transport layer. The hole control layer HCL may further include a hole injection layer disposed between the hole transport layer and the first electrode AE. The electron control layer ECL may include an electron transport layer. The electron control layer ECL may further include an electron injection layer disposed between the electron transport layer and the second electrode CE. The second electrode CE may include silver (Ag), magnesium (Mg), aluminum (Al), and nickel (Ni).
An upper stacked structure UIL is disposed on the second electrode CE. The upper stacked structure UIL contains a plurality of insulating layers. The plurality of insulating layers may be divided into a plurality of groups according to their functions. A detailed description of the upper stacked structure UIL will be given later.
As shown in the first graph L-B, the first light generated in the blue pixel PX-B has a peak in the first central wavelength range. Here, the central wavelength range is defined as the range in which the peak wavelength may be arranged. The first light may have a wavelength of at least 410 nm or more and 480 nm or less, and the first central wavelength range may be 440 nm or more and 460 nm or less. As shown in the second graph L-G, the second light generated in the green pixel PX-G has a peak in the second central wavelength range. The second light may have a wavelength of at least 500 nm or more and 570 nm or less, and the second central wavelength range may be 515 nm or more and 545 nm or less. As shown in the third graph L-B, the third light generated in the red pixel PX-R has a peak in the third central wavelength range. The third light may have a wavelength of at least 580 nm or more and 675 nm or less, and the second central wavelength range may be 610 nm or more and 645 nm or less.
As shown in
The “specific condition” may be determined by the optical distance of the layers (hereinafter referred to as interference layers) disposed between the reference layers of the plurality of layers from the second electrode CE. The optical distance of a single layer is defined as the product of the refractive index of a single layer and the thickness of a single layer. The optical distance of a structure including a plurality of layers is defined as the sum of the optical distances of the plurality of layers.
As shown in
That is, the interference layers satisfy the following equations. n1,z is the refractive index in the thickness direction of the first interference layer with respect to the peak wavelength. d1 is the thickness of the first interference layer. nq,z is the refractive index in the thickness direction of the reference layer with respect to the peak wavelength. dq is the thickness of the reference layer.
n
1,z
d
1
+n
2,z
d
2
. . . n
q,z
d
q≤4000 nm
As shown in
The first protective layer CPL prevents damage to the second electrode CE from subsequent processes, for example, a plasma process. The first protective layer CPL may include an organic material. The first protective layer CPL may include, for example, a hole transport material called HT01. In addition, the first protective layer CPL may include other organic materials used in the organic light emitting diode OLED described with reference to
The second protective layer PCL prevents damage to the first protective layer CPL, which is an organic layer, from the subsequent chemical vapor deposition process of the inorganic material. The second protective layer PCL may be formed by a sputtering method which is a physical vapor deposition method. The second protective layer PCL may include, for example, LIF. The refractive index of the second protective layer PCL may be 1.3 to 2.2, and the thickness may be 10 nm to 50 nm.
The encapsulation layer TFE seals the organic light emitting diode OLED. The encapsulation layer TFE may include at least one inorganic film (hereinafter referred to as a sealing inorganic film) and at least one organic film (hereinafter referred to as a sealing organic film).
The sealing inorganic film protects the organic light emitting diode OLED from moisture/oxygen, and the sealing organic film protects the organic light emitting diode OLED from foreign substances such as dust particles. The sealing organic film may include a silicon nitride layer, a silicon oxynitride layer, and a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer and is not limited thereto. The sealing organic film may include an acrylic based organic film and is not particularly limited. The sealing inorganic film and the sealing organic film may be formed by a deposition method, and in particular, the sealing organic film may be formed by depositing an acrylic monomer.
In the upper stacked structure UIL shown in
Since the thickness of the first protective layer CPL and the second protective layer PCL is relatively thin, the reference layer RL is determined by the stacked structure of the encapsulation layer TFE. In
In the upper stacked structure UIL shown in
In the upper stacked structure UIL shown in
In the upper stacked structure UIL shown in
According to Equations 1 to 3, as the value of the spectral intensity Le, Ω, λ increases, the tristimulus value of Xr, the tristimulus value of Yg, and the tristimulus value of Zb increase.
Xr=∫
λ
L
e,Ω,λ(λ)
Yg=∫
λ
L
e,Ω,λ(λ)
Zb=∫
λ
L
e,Ω,λ(λ)
According to the following paper “Simulation of light emission from thin-film microcavities”, Kristiaan A. Neyts, J. Opt. Soc. Am. A/Vol. 15, No. 4/April 1998″, the intensity K value of light passing through a plurality of layers may be determined by Equation 4 below. The K value in Equation 4 may be substantially equal to the value of Le, Ω, λ in Equations 1 to 3.
The intensity of light passing through n layers (where n is a natural number of 3 or more) expressed by Equation 4 may be applied to the intensity of light (ED-L, hereinafter referred to as external emission light) emitted from the electronic device ED in
Equation 4 may be separated as shown in Equation 5 below to check interference effects of the i-th layer to the nth layer among the n layers.
On the other hand, the equations described herein are calculated under transverse-magnetic (TM) polarization conditions. The TM polarization conditions satisfy the following relationship.
In Equation 5, K ‘represents the intensity of light incident on the i-th layer. Here, the light emitting layer is the first layer (i=1).
Equation 6 is the result of summarizing in correspondence with i=4 in Equation 5.
In Equation 6, d4 to d6, and do represent the thickness of each layer. r(i, i+1) represents the reflection coefficient between the i-th layer and the (i+1)th layer. r(i,t) represents the reflection coefficient between the i-th layer and the layers disposed below the i-th layer.
The denominator of Equation 6 is given by Equation 7 below.
The denominator may be interpreted as the product of the bracket arguments. The bracket arguments are related to a plurality of layers, respectively. The influence of the fourth layer CPL to the sixth layer IOL1 on the intensity K of the external emission light may be expressed by Equation 8.
Equation 8 is solved to obtain the following Equation 9. Equation 8 is developed using the following relational expression.
The six arguments excluding 1 in Equation 9 represent six interference occurring in the fourth layer CPL to the sixth layer IOL1 as shown in
The denominator of Equation 6 may be adjusted by controlling six arguments. When the denominator value of Equation 6 is decreased, the intensity K of the external emission light is increased, and when the denominator value is increased, the intensity value K of the external emission light is decreased.
Of the six interference paths, the sixth interference path LP4-6 is set as the main argument. In the second interference path LP5, the third interference path LP6, and the fifth interference path LP5-6 may be neglected because the reflection coefficient between the adjacent layers is small, thus, resonance occurs weakly.
In
The reflection coefficient between adjacent layers in the first interference path LP4 and the fourth interference path LP4-5 is relatively large. However, the fourth layer CPL and the fifth layer PCL which are thinner than the thickness of the sixth layer IOL1 do not affect a light efficiency and an optical characteristic much. However, the light efficiency and the 45° optical characteristic are affected by changes in the thicknesses of the fourth layer CPL and the fifth layer PCL. For example, in the second graph GH-S shown in
Here, the relatively thin thickness range of the fourth layer CPL and the fifth layer PCL may be equal to or more than 10 nm and equal to or less than 300 nm. The sixth argument of Equation 9 may be expressed as Equation 10 below.
Equation 10 represents separately the phase which is an argument affecting the interference. In
As a result, Equation 6 may be expressed as Equation 11.
When Equation 11 is changed to a cosine value and the absolute value is solved, Equation 12 as follows.
In Equation 12, the cosine function of the denominator is as follows.
cos(2(k4,zd4+k5,z+d5+k6,zd6)+ϕ4,1+ϕ6,7)
The intensity K value of the external emission light expressed by Equation 12 may be increased or decreased by the bracket argument of the cosine function. That is, the tristimulus value of Xr, the tristimulus value of Yg, and the tristimulus value of Zb may be increased or decreased by the bracket argument of the cosine function.
The cosine function may be generalized as Equation 13 below.
cos(2(k1,zd1+k2,z+d2 . . . +kq,zdq)+ϕ1,CE+ϕq,q+1) Equation 13
In Equation 12, the fourth layer CPL is expressed by the first layer in Equation 13, and the first layer is a layer contacting the upper surface of the second electrode CE. A plurality of layers are sequentially stacked from the first layer to the q-th layer. The q-th layer corresponds to the above-mentioned reference layer.
If the value of Equation 13 cos(2(k1,zd1+k2,z+d2 . . . +kq,zdq)+ϕ1,CE+ϕq,q+1) is 0, 2π, 4π . . . , the intensity K of the external emission light expressed by Equation 12 increases. That is, constructive interference occurs in the stacked structure from the first layer to the q-th layer.
If the value of Equation 13 cos(2(k1,zd1+k2,z+d2 . . . +kq,zdq)+ϕ1,CE+ϕq,q+1) is π, 3π . . . , the intensity K value of the external emission light expressed by Equation 12 increases. That is, destructive interference occurs in the stacked structure from the first layer to the q-th layer.
As shown in
In order to reduce the tristimulus value of Xr, the intensity of the external light, that is, the K value, should be decreased, and the bracket arguments of Equation 13 should satisfy Equation 14 below.
Here, m may be 0, 1, 2, . . . . d1 to dp are the thickness argument of each layer, for example, d1 is the thickness of the first layer. In Equation 14, ki, z are expressed by Equation 15 below.
Equation 14 may be expressed as Equation 16 using Equation 15.
θair may be an emission angle θ of the external emission light ED-L shown in
In Equations 14 and 16, Φ1,CE are as shown in the following Equation 17.
Here, r1,CE represent the reflection coefficients of the organic light emitting diode OLED of the first layer, that is, the layer contacting the upper surface of the second electrode CE. In other words, it represents the reflection coefficient for the structure from the first electrode AE of the layer contacting the upper surface of the second electrode CE to the second electrode CE. Therefore, Φ1,CE may be determined according to the refractive indices of the second electrode CE and the first electrode AE, and the thicknesses and refractive indices of the layers disposed between the second electrode CE and the first electrode AE. r1,CE may contain imaginary values and real values. When Im(r1,CE)≥0, the conditions of 0≤Φ1,CE≤π are satisfied and when Im(r1,CE)<0, the conditions of π<Φ1,CE<2π are satisfied.
If the refractive index of the q-th layer (or reference layer) is greater than the refractive index of the (q+1) th layer, Φq,q+1 are π, and If the refractive index of the q-th layer (or reference layer) is smaller than the refractive index of the (q+1)-th layer, Φq,q+1 are 0.
The tristimulus value of Xr may be reduced by destructively interfering with the light generated from the red pixel PX-R. Therefore, λ may be 610 nm or more and 645 nm or less.
In order to reduce the tristimulus value of Yg, the intensity of the external emission light, that is, the K value, should be increased, and Equation 18 should be satisfied. The arguments of Equation 18 are the same as those of Equation 16.
The tristimulus value of Yg may be increased by constructively interfering with the light generated from the blue pixel PX-B. Therefore, λ may be 515 nm or more and 545 nm or less.
Equations 16 and 18 may be satisfied to reduce the tristimulus value of Xr and increase the tristimulus value of Yg. In such a way, the tristimulus value of Xr of the light emitted from the electronic device may be reduced to prevent the reddish phenomenon of the white image. The tristimulus value of Yg of the light emitted from the electronic device may be increased to prevent the reddish phenomenon of the white image.
According to the above description, when the characteristics of light measured at a viewing angle of 20° to 40° are displayed in color coordinates, the coordinates are arranged on the left side or the upper side of the black body curve.
The tristimulus value of Xr of the light emitted from the electronic device may be reduced to prevent the reddish phenomenon of the white image. The tristimulus value of Yg of the light emitted from the electronic device may be increased to prevent the reddish phenomenon of the white image.
Although the exemplary embodiments of the inventive concept have been described, it is understood that the inventive concept should not be limited to these exemplary embodiments but various changes and modifications can be made by one ordinary skilled in the art within the spirit and scope of the inventive concept as hereinafter claimed.
Number | Date | Country | Kind |
---|---|---|---|
10-2017-0177447 | Dec 2017 | KR | national |
This U.S. non-provisional patent application is a divisional application of U.S. patent application Ser. No. 16/162,146 filed on Oct. 16, 2018, which claims priority under 35 USC § 119 to Korean Patent Application No. 10-2017-0177447, filed on Dec. 21, 2017, the entire contents of which are hereby incorporated by reference.
Number | Date | Country | |
---|---|---|---|
Parent | 16162146 | Oct 2018 | US |
Child | 17022254 | US |