1. Field of the Invention
The invention relates to a light emitting screen structure for forming an image by irradiation of an electron beam in a flat image forming apparatus using the electron beam such as a field emission display (FED) or the like and to an image forming apparatus using the light emitting screen structure.
2. Related Background Art
Hitherto, an image forming apparatus can be mentioned as a using form of electron-emitting devices. For example, there has been known a flat electron beam display panel in which an electron source substrate and a opposite substrate are arranged in parallel so as to face each other and which has been exhausted to a vacuum state, wherein a number of cold cathode electron-emitting devices are formed on the electron source substrate and the opposite substrate has phosphor and a metal back or a transparent electrode for accelerating electrons emitted from the electron-emitting devices. The flat electron beam display panel is preferable because a lighter weight and a larger display screen can be realized as compared with cathode ray tube (CRT) display apparatuses which are at present widely used. According to such a display panel, an image of higher luminance and higher quality can be provided as compared with other flat display panels such as flat display panel using liquid crystal, plasma display panel (PDP), electroluminescent (EL) display panel, and the like.
In the image forming apparatus of the type in which a voltage is applied between the opposite electrode such as metal back, transparent electrode, or the like and the electron-emitting device in order to accelerate the electron emitted from the cold cathode electron-emitting device as mentioned above, it is advantageous to apply a high voltage to obtain the maximum light emitting luminance. Since the emitted electron beam diverges until it reaches the opposite electrode in dependence on a kind of electron-emitting device, it is desirable that an inter-substrate distance between the electron source substrate and the opposite substrate is short in order to realize the display with high resolution.
However, if the inter-substrate distance becomes short, since an electric field between the substrates increases inevitably, there is a case where such a phenomenon that the electron-emitting device is broken by an unexpected discharge rarely occurs. In such a case, since a current is concentrated on a part of phosphor and flows therein, such a phenomenon that a part of a display screen shines or the like occurs.
To solve such a problem, it is necessary to reduce a frequency of the unexpected discharge or make it difficult to cause the discharge breakdown.
It is considered that the discharge breakdown of the electron-emitting device occurs by the following causes: a large current is concentrated on one point and flows therein for a short time, so that heat generation occurs; or a voltage applied to the electron-emitting device rises instantaneously and an overvoltage is applied thereto.
A method of serially inserting a limiting resistor as shown in
Assuming that an emission current per device is equal to 5 μA in the case where about 1000 devices are simultaneously turned on in the state where a high voltage of 10 kV has been applied to the anode, an inflow current to the anode fluctuates in a range of 0 to 5 mA in dependence on an image pattern (light-on pattern). In the example in which a serial resistor of 1 MΩ is connected to the anode as shown in
Since the high voltage has been applied to the flat plates which face each other, an amount of charges which are accumulated in a capacitor reaches 10−6 coulomb when it is assumed that, for example, an area of each of the face plate 111 and the rear plate 112 in
To solve those problems, the applicant of the present invention has proposed the method whereby an electrode to apply a voltage is divided in nonparallel with the direction of the scanning wirings and a resistor is arranged between the electrode and accelerating voltage applying means, thereby suppressing a discharge current generated between flat plates which face each other (refer to JP-A-10-326583 (EP866491A)).
By dividing the electrode of the face plate 131 and inserting a resistor R1 with a high resistance to each of the divided electrodes, a capacitance of a capacitor is reduced and a discharge current Ib2 is decreased. Thus, a fluctuation in the voltage applied to the device due to the discharge current Ib2 is decreased and a damage upon discharging is also improved.
However, a construction to further reduce the discharge current is demanded from such a viewpoint that it is desirable not to damage the electron-emitting device at the time of discharging.
It is an object of the invention to provide a light emitting screen structure to further reduce a discharge current without deteriorating luminance. In an image forming apparatus using such a light emitting screen structure, it is another object of the invention to lighten an adverse influence on an electron-emitting device due to an unexpected discharge and to realize high durability and a long life.
According to the first invention of the present invention, there is provided a light emitting screen structure comprising:
a substrate;
a plurality of light emitting members locating on the substrate;
a plurality of metal backs which are divided along a first direction and a second direction which is not parallel to the first direction and each of the metal back covering at least one of the light emitting members; and
a plurality of strip shaped resistors which electrically connect at least a part of the plurality of metal backs and extend in the first direction,
wherein the strip shaped resistors are discontinuous at a gap portion between the metal backs in the second direction.
According to the second invention of the present invention, there is provided an image forming apparatus comprising:
an electron source having a plurality of electron-emitting devices, a plurality of signal wirings which are parallel with the first direction and electrically connect the electron-emitting devices among the plurality of electron-emitting devices, and a plurality of scanning wirings which are parallel with the second direction and electrically connect the electron-emitting devices among the plurality of electron-emitting devices; and
a light emitting screen structure in which light emission is performed by irradiation of electrons emitted from the electron-emitting devices,
wherein the light emitting screen structure is the light emitting screen structure according to the first invention of the present invention.
In a light emitting material substrate of the invention, strip shaped resistors divided into a plurality of portions in the X direction are arranged so as to be discontinuous in an electrode gap between metal back electrodes divided into at least two or more portions in the X direction, preferably, they are arranged on the inside of the metal back electrodes. Owing to such a construction, a resistor between the metal back electrodes which are neighboring in the X direction is held in a high resistance state, thereby preventing an inflow of a discharge current between the metal back electrodes in the X direction. First, such a function will be described in comparison with a construction in which the strip shaped resistors are continuous in the gap between the adjacent metal back electrodes in the X direction.
In the construction of
When comparing with R in
That is, in the construction of
In the above description, the construction in which the strip shaped resistor 4 which is preferable as a light emitting material substrate of the invention is arranged on the inside of the metal back electrode 7 is shown. However, in the invention, the strip shaped resistor 4 can be also arranged in the gap between the metal back electrodes 7 so long as the current path which passes in the film thickness direction in the black matrix 6 and the strip shaped resistor 4 as shown in
Since the distance between the adjacent metal back electrodes 7 in the Y direction (first direction) is larger than that in the X direction (second direction), even if the strip shaped resistor 4 is arranged between the adjacent metal back electrodes 7, the resistance can be increased and an influence which is exercised on the discharge current is small.
A fundamental construction of the light emitting material substrate (there is also a case where it is called a face plate) of the invention will be described hereinbelow with reference to
In the invention, the strip shaped resistors 4 are preferably arranged on the inner side than the edges which are parallel with the Y direction of the metal back 7 so that they are not located between the metal backs which are neighboring in the X direction. It is desirable to arrange the strip shaped resistors 4 under phosphor 5. In addition, it is sufficient to use any type of strip shaped resistors 4 so long as it can control the resistance. Transparent electrodes can be used in the case where they are arranged under phosphor 5. In this case, ITO or the like can be used.
The metal back 7 is divided into at least two portions in the X directions and each metal back 7 is electrically connected to the strip shaped resistor 4 by the black matrix 6.
Since the resistance value of the strip shaped resistor 4 can be raised more in an allowable range of the voltage drop by dividing the metal back 7 on a phosphor unit basis as shown in
In the case of the strip shaped resistors 4 which are arranged in nonparallel with the scanning wirings which are parallel with the X direction, that is, which are arranged in parallel with the Y direction in the embodiment of
Even when the discharge has occurred near the common electrode 2, the resistance value of the serial resistor 3 connecting the strip shaped resistor 4 and the common electrode 2 has to limit the discharge current flowing in the rear plate. Therefore, specifically speaking, it is desirable that the resistance value of the serial resistor 3 lies within a range of 10 kΩ to 1 GΩ, more preferably, 10 kΩ to 10 MΩ.
In the embodiment, the black matrix 6 electrically connects the strip shaped resistor 4 and the metal back 7. To limit the discharge current, it is desirable that the resistance value of the black matrix is set to 1 kΩ to 1 GΩ between the metal backs 7, more preferably, 1 kΩ to 1 MΩ. As a material of the black matrix 6, besides a material using graphite which is generally used as a main component, any material whose transmittance and reflectance of light are small can be used.
To form an image on the display panel, by sequentially applying a predetermined voltage to the scanning wirings 12 and the signal wirings 13 arranged in a matrix form, predetermined electron-emitting devices 14 locating at crossing points of the matrix are selectively driven. The electrons emitted by this method are irradiated to phosphor 5, thereby obtaining luminescent spots at predetermined positions. As for the metal back 7, to obtain the luminescent spots of higher luminance by accelerating the emission electrons, a high voltage Hv is applied to the electron-emitting devices 14 so as to have a high electric potential. The voltage which is applied here lies within a range about from hundreds of V to tens of kV although it depends on performance of phosphor 5. Therefore, generally, a distance between the rear plate 15 and the face plate 17 is set to a value in a range about from hundred μm to a few mm so that dielectric breakdown of the vacuum (that is, discharge) is not caused by the applied voltage.
In the case of a color phosphor film, phosphor 5 of each color of R (red), G (green), and B (blue) is used. As a method of coating the substrate 1 with phosphor 5, a settling method, a printing method, or the like can be used irrespective of a monochromatic display mode or a color display mode.
An object of the use of the metal back 7 is to improve the luminance by a method whereby the light to the inner surface side in the light emission of phosphor 5 is mirror-surface reflected to the substrate 1 side, to make the metal back function as an electrode for applying the accelerating voltage of the electron beam, to protect phosphor 5 from a damage that is caused by collision of negative ions generated in the vacuum envelope 18, or the like.
It is preferable to set a shape of the metal back 7 into a shape having a curved square corner. This is because when a discharge occurs between the face plate 17 and the rear plate 15, an electric potential difference occurs between the adjacent the metal backs 7, so that if the metal back does not have the curved corner, the electric field is concentrated and a creeping discharge occurs. Examples of the metal back having the curved corner are shown in
To form such divided metal backs 7, it is possible to use a method whereby the metal backs are formed on the whole surface of the substrate on which phosphor 5 has been formed by the ordinary method and the patterning is executed by a photo etching process. A method of evaporation-depositing by using a metal mask having a desired opening as a shielding member (ordinarily, such a method is called a mask evaporation deposition) or the like can be properly selected.
Further, in the case of manufacturing the image forming apparatus by using the light emitting substrate of the invention, a getter member can be also used to maintain the inside of the vacuum envelope 18 in a high vacuum state for a long period of time. In such a case, it is preferable to arrange the getter member to a region while avoiding the electron beam irradiating region where the electron beam emitted from the electron-emitting devices 14 is irradiated. This is because if the getter member is arranged in the electron irradiating region, an energy of the electron beam is decreased and desired luminance cannot be obtained.
The face plate with the construction shown in
A glass substrate (PD200 made by Asahi Glass Co., Ltd.) having a thickness of 2.8 mm is used as a substrate 1 and an ITO film having a thickness of 100 nm is formed on the whole surface. After that, the surface is patterned by a photolithography step so as to become a strip shape having a width of 185 μm, thereby forming the strip shaped resistors 4. A sheet resistance of the ITO film is adjusted to be 60 kΩ/□ so that the resistance value of the strip shaped resistor 4 is equal to about 200 MΩ.
Subsequently, NiO films which have been patterned as serial resistors 3 are formed on both sides of the strip shaped resistor 4. The common electrodes 2 are formed by using an Ag paste so as to be come into contact with all of the resistors 3. The resistance value of the serial resistor 3 is set to 10 MΩ.
The black matrix 6 (NP-7803D made by Noritake Co., Ltd.) is printed on the strip shaped resistor 4, thereby setting a value of the resistance (individual resistance) between the adjacent metal backs 7 to about 100 kΩ. Further, phosphor 5 is coated and baked.
Finally, an island-shaped Al film having a thickness of 80 nm is evaporation-deposited on phosphor 5, thereby forming the metal back 7. In this manner, a face plate having such a construction that the strip shaped resistors 4 are discontinuous between the metal backs which are neighboring in the X direction is formed.
The image forming apparatus shown in
With respect to the obtained image forming apparatus, discharge resisting tests are executed by deteriorating the vacuum degree in the panel. Thus, it has been confirmed that the currents flowing in the face plate 17 and the electron source substrate 11 at the time of the discharge are reduced more than those in the apparatus with the construction in which the metal backs 7 are not vertically and laterally divided. Further, no point defects occur in the discharging positions and the state before the discharge can be maintained.
Since the resistance value in the strip shaped resistor 4 can be set to a value in a voltage drop allowable range, the voltage drop in the strip shaped resistor upon driving the image forming apparatus is equal to or less than 250V and there is no problem in the luminance deterioration when it is confirmed by the eyes.
Although both ends of the strip shaped resistor 4 are connected to the common electrodes 2 through the serial resistors 3 in the embodiment, if the voltage drop upon driving lies within the allowable range, the common electrode 2 can be also provided only for one side.
A light emitting substrate and, further, an image forming apparatus having constructions which are fundamentally similar to those in the embodiment 1 except that the pattern shape of the metal back 7 has a curved corner as shown in
First, an ITO film having a film thickness of 100 nm and a width of 200 μm is formed on the substrate 1 by using a sputtering method and the strip shaped resistor 4 is formed (
Subsequently, a photosensitive black matrix material is printed onto the whole surface of the substrate 1 by a screen printing and dried. Further, it is exposed by using a mask of a desired pattern and, after that, developed and baked, thereby forming the black matrix 6. At this time, by setting the developing time to be longer than the normal time, control is made so as to obtain a cross sectional shape having an under-cut shape as shown in
Subsequently, phosphor 5 is formed in an opening portion of the black matrix 6 by printing and baking. At this time, phosphor 5 is formed so as not to be come into contact with an overhang portion of the black matrix 6. This is because in the Al evaporation deposition in the post-step, it is necessary to cause a step cutting of Al between the black matrix portion and the opening portion of the black matrix (
Subsequently, a filming material (binding agent and acrylic emulsion) 41 is spray-coated onto a display screen region and dried. After that, an Al film having a thickness of 100 nm is formed as a metal back 7 onto the display screen region by a vacuum evaporation depositing method. At this time, the Al films on phosphor 5 and the black matrix 6 are the separated films in which the step cutting has occurred (
Subsequently, the filming material 41 is baked at 450° C. for 60 minutes, thereby obtaining the face plate. At this time, since adhesion of the Al film on the black matrix 6 is low, the whole Al film is peeled off from the black matrix 6 upon baking. Since the metal backs 7 manufactured as mentioned above can be divided in a self alignment manner and, further, the Al portion on the black matrix 6 can be removed, the reduction in capacitance and the improvement of the withstanding voltage between the metal backs 7 can be certainly realized.
The image forming apparatus shown in
As a third embodiment of the invention, the face plate with a construction shown in
In the embodiment, a glass substrate (PD200 made by Asahi Glass Co., Ltd.) having a thickness of 2.8 mm is used as a substrate 1 and an ITO film having a width of 185 μm and a thickness of 100 nm is used as a strip shaped resistor 4. A sheet resistance of the ITO film is adjusted to be 20 kΩ/□ so that the resistance value is equal to about 70 MΩ. Further, a sheet resistance of the black matrix 6 is adjusted to be 2 MΩ/□ so that a value of the resistance (individual resistance) between the adjacent metal backs 7 is equal to about 200 kΩ. A resistance value of the serial resistor 3 is set to 10 MΩ. As shown in
The image forming apparatus shown in
Since the resistance value in the strip shaped resistor 4 can be set to a value in the voltage drop allowable range, the voltage drop (due to the resistor in the electrode) in the strip shaped resistor upon driving the image forming apparatus is equal to or less than 275V and there is no problem in the luminance deterioration when it is confirmed by the eyes.
Although both ends of the strip shaped resistor 4 are connected to the common electrodes 2 through the serial resistors 3 in the embodiment, if the voltage drop upon driving lies within the allowable range, the common electrode 2 can be also provided only for one side.
Although one strip shaped resistor 4 is arranged for one metal back 7 in the embodiment, the invention is not limited to such a construction but one strip shaped resistor 4 can be also arranged for one phosphor 5. At this time, since a plurality of strip shaped resistors 4 are connected in parallel in one metal back, it is preferable to raise the resistance value of each strip shaped resistor.
Further, it is also possible to allow the metal back to have a curved corner as shown in
As a fourth embodiment of the invention, the face plate with a construction shown in
In the embodiment, a glass substrate (PD200 made by Asahi Glass Co., Ltd.) having a thickness of 2.8 mm is used as a substrate 1. An ITO film in which a width is equal to 40 μm and a sheet resistance is adjusted to be 100 kΩ/□ so that the resistance value is equal to about 150 MΩ is used as a strip shaped resistor 4. Further, a sheet resistance of the black matrix 6 is adjusted to be 2 MΩ/□ so that a value of the resistance (individual resistance) between the metal backs 7 is equal to about 200 kΩ. A resistance value of the serial resistor 3 is set to 10 MΩ. Also in the embodiment, as shown in
The image forming apparatus shown in
Since the resistance value in the strip shaped resistor 4 can be set to a value in the voltage drop allowable range, the voltage drop in the strip shaped resistor upon driving the image forming apparatus is equal to or less than 275V and there is no problem in the luminance deterioration when it is confirmed by the eyes.
As a fifth embodiment of the invention, the face plate with a construction shown in
In the embodiment, a glass substrate (PD200 made by Asahi Glass Co., Ltd.) having a thickness of 2.8 mm is used as a substrate 1. An ITO film in which a width is equal to 140 μm and a sheet resistance is adjusted to be 15 kΩ/□ so that the resistance value is equal to about 50 MΩ is used as a strip shaped resistor 4. Further, a sheet resistance of the black matrix 6 is adjusted to be 1 MΩ/□ so that a value of the resistance (individual resistance) between the metal backs 7 is equal to about 200 kΩ. A resistance value of the serial resistor 3 is set to 1 MΩ.
The image forming apparatus shown in
Since the resistance value in the strip shaped resistor 4 can be set to a value in the voltage drop allowable range, the voltage drop in the strip shaped resistor upon driving the image forming apparatus is equal to or less than 275V and there is no problem in the luminance deterioration when it is confirmed by the eyes.
As a sixth embodiment of the invention, the image forming apparatus shown in
According to the image forming apparatus in the embodiment, the electron beam 93 emitted from the electron-emitting device 14 is accelerated by the metal back 7, enters phosphor 5, and light is emitted.
The face plate in the embodiment is manufactured by a method similar to that in the embodiment 1 with respect to the manufacturing steps which are executed until the metal backs 7 are formed. After that, as shown in
The image forming apparatus shown in
According to the invention, since the strip shaped resistors divided in nonparallel with the scanning wirings are used, the voltage drop upon driving is reduced. Further, in the X direction (the second direction, preferably, the direction of the scanning wirings), the strip shaped resistors are discontinuous in the gap between the adjacent metal backs. Thus, even if the value of the resistance between the metal back electrodes is large and the unexpected discharge occurs between the light emitting material substrate (light emitting screen structure) and the electron source substrate, the damage of the electron-emitting devices due to such a discharge is small. According to the invention, therefore, the damage of the electron-emitting devices due to the discharge is lightened and the image forming apparatus in which the high durability, the long life, and the high reliability are obtained is provided.
This application claims priorities from Japanese Patent Application Nos. 2004-272794 filed on Sep. 21, 2004, and 2005-258742 filed on Sep. 7, 2005, which are hereby incorporated by reference herein.
Number | Date | Country | Kind |
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2004-272794 | Sep 2004 | JP | national |
2005-258742 | Sep 2005 | JP | national |