The present disclosure relates to the field of display technology, and in particular, to a light-emitting substrate and a display device.
The LED (Light-Emitting Diode) light-emitting substrate may be driven in an active driving mode, where LEDs and a chip for driving the LEDs are provided in the light-emitting area. An external circuit (such as a circuit board) provides power and signals to the LEDs and the chip through driving lines provided on the light-emitting substrate. When the driving lines are disturbed and generate noise, the luminous quality of the LED light-emitting substrate will be greatly affected.
It should be noted that the information disclosed in the background section is only used to enhance understanding of the background of the present disclosure, and therefore may include information that does not constitute prior art known to those of ordinary skill in the art.
The purpose of the present disclosure is to overcome the above-mentioned shortcomings of the prior art, and provide a light-emitting substrate and a display device, for reducing the noise on at least some of the driving lines.
According to a first aspect of the present disclosure, a light-emitting substrate is provided, including a plurality of signal channels arranged in sequence along a row direction. Each of the signal channels includes a plurality of control areas arranged along a column direction. Each of the control areas includes at least one light area controlled by the same chip.
In each of the signal channels, the light-emitting substrate is provided with a first driving line, a second driving line, and a plurality of reference power lines. The first driving line and the second driving line are respectively used for providing different driving signals to the chip. The reference power line is used for providing a reference power supply voltage to the chip. The reference power lines in the same signal channel are electrically connected. At least one reference power line is provided between the first driving line and the second driving line.
In an embodiment of the present disclosure, the first driving line is a clock signal line for providing a clock signal to the chip.
The second driving line is a driving data line for providing a driving data signal to the chip or an address configuration line for providing an address configuration signal to the chip.
In an embodiment of the present disclosure, the second driving line is a driving data line.
In an embodiment of the present disclosure, in the signal channel, the light-emitting substrate further includes: a light area power line for loading a light area power supply voltage to the light area, a chip power line for loading a chip power supply voltage to the chip, and an address configuration line for loading an address configuration signal to the chip.
Along the row direction, the light area power line, the reference power line, the chip power line, the address configuration line, the clock signal line, the reference power line, the driving data line, the reference power line, and the light area power line are arranged in sequence.
In an embodiment of the present disclosure, the reference power line is further provided between the address configuration line and the clock signal line.
In an embodiment of the present disclosure, the light-emitting substrate has a chip pad group for bonding and connecting with the chip, and is provided with a reference power connection line.
The reference power connection line is connected to each reference power line through a via hole, and is electrically connected to the chip pad group.
In an embodiment of the present disclosure, in the signal channel, the plurality of reference power lines include: two main reference power lines located on both sides of the signal channel, and an auxiliary reference power line located between the main reference power lines. The width of the main reference power line is greater than the width of the auxiliary reference power line.
The main reference power line overlaps the light areas, and does not overlap at least some of the chips.
In an embodiment of the present disclosure, in the signal channel, the plurality of reference power lines include a main reference power line and at least one auxiliary reference power line. The main reference power line has the largest width among the reference power lines, and is not adjacent to the driving data line and the clock signal line.
In an embodiment of the present disclosure, the chip is located between the main reference power line and the auxiliary reference power line.
In an embodiment of the present disclosure, in the signal channel, the light-emitting substrate further includes: a light area power line for loading a light area power supply voltage to the light area, and a chip power line for loading a chip power supply voltage to the chip.
The main reference power line is adjacent to the light area power line, and has a width greater than that of the chip power line.
The width of the auxiliary reference power line is smaller than that of the chip power line.
In an embodiment of the present disclosure, the light-emitting substrate further includes: a light area power line for loading a light area power supply voltage to the light area, and a chip power line for loading a chip power supply voltage to the chip. A first capacitor is provided between at least some of the light area power lines and the reference power lines. A second capacitor is provided between at least some of the chip power lines and the reference power lines.
In an embodiment of the present disclosure, among two adjacent signal channels along the row direction, a light area power line in one signal channel is arranged adjacently to a light area power line in the other signal channel. The two adjacent light area power lines are connected to form a merged light area power line. The merged light area power line is used for providing the light area power supply voltage to the light areas in the two signal channels.
3 to 5 first capacitors are provided between any one of the merged light area power lines and the reference power lines.
In an embodiment of the present disclosure, 2 to 4 second capacitors are provided between any one of the chip power lines and the reference power lines.
In an embodiment of the present disclosure, the light-emitting substrate is provided with a temperature sensor, and a temperature sensor power line for loading a temperature sensor power supply voltage to the temperature sensor.
A third capacitor is provided between any one of the temperature sensor power lines and the reference power lines.
In an embodiment of the present disclosure, the light-emitting substrate includes a base substrate, a driving metal layer, a first insulation layer, a wiring metal layer, a second insulation layer, and a device layer that are stacked in sequence.
The driving metal layer is provided with the first driving line, the second driving line, and the reference power lines.
The light area includes a plurality of electrically connected light-emitting elements. The light-emitting elements and the chip are provided on the device layer.
The wiring metal layer is provided with a light-emitting element pad group for bonding the light-emitting elements, a chip pad group for bonding the chip, and a connection line for connecting the light-emitting element pad group and the chip pad group.
In an embodiment of the present disclosure, the wiring metal layer is provided with a reference power resistance-reducing structure corresponding to at least some of the reference power lines. The reference power resistance-reducing structure and the respective reference power line is connected through a via hole.
In an embodiment of the present disclosure, the orthographic projection of the reference power resistance-reducing structure on the base substrate is located within the orthographic projection of the respective reference power line on the base substrate.
In an embodiment of the present disclosure, at least some of the via holes between the reference power resistance-reducing structure and the respective reference power line are arranged around the edge of the reference power resistance-reducing structure.
In an embodiment of the present disclosure, in the signal channel, the plurality of reference power lines have one or two main reference power lines with the largest width. The reference power resistance-reducing structure and the main reference power line are connected.
In an embodiment of the present disclosure, the driving metal layer is provided with a light area power line for loading a light area power supply voltage to the light area. The wiring metal layer is provided with a light area power resistance-reducing structure corresponding to the light area power line. The light area power line and the respective light area power resistance-reducing structure are connected through a via hole.
In an embodiment of the present disclosure, at least some of the via holes between the light area power resistance-reducing structure and the respective light area power line are arranged around the edge of the light area power resistance-reducing structure.
In an embodiment of the present disclosure, the orthographic projection of the light area power resistance-reducing structure on the base substrate coincides with the orthographic projection of the respective light area power line on the base substrate.
In an embodiment of the present disclosure, the driving metal layer is provided with a chip power line for loading a chip power supply voltage to the chip. The wiring metal layer is provided with a chip power resistance-reducing structure corresponding to the chip power line. The chip power resistance-reducing structure and the respective chip power line are connected through a via hole.
In an embodiment of the present disclosure, at least some of the via holes between the chip power resistance-reducing structure and the respective chip power line are arranged in a line along the column direction.
According to a second aspect of the present disclosure, a display device is provided, including the above-mentioned light-emitting substrate.
It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only, and do not limit the present disclosure.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present disclosure and together with the description, serve to explain the principle of the present disclosure. Obviously, the drawings in the following description are only some embodiments of the present disclosure. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without exerting creative efforts.
AA, light area; BB, control area; CH, signal channel; BP, base substrate; Cu1, driving metal layer; Cu2, wiring metal layer; OC1, first insulation layer; OC2, second insulation layer; VLED, light area power supply voltage; GND, reference power supply voltage; VCC, chip power supply voltage; DIS, address configuration signal; DOS, address relay signal; Data, driving data signal; CLK, clock signal; GNDD, reference power pin; VCCD, chip power pin; DISD, address configuration pin; DOSD, address relay pin; DataD, driving data pin; CLKD, clock signal pin; ICA, chip area; VLEDA, light area power line; GNDA, reference power line; VCCA, chip power line; DSA, address configuration line; DataA, driving data line; CLKA, clock signal line; VLEDB, light area power resistance-reducing structure; GNDB, reference power resistance-reducing structure; VCCB, chip power resistance-reducing structure; GNDL, reference power connection line; VCCL, chip power connection line; DISL, address configuration connection line; DOSL, address relay connection line; DataL, driving data connection line; CLKL, clock signal connection line; LEDL, light area connection line; DSC, address configuration transfer structure; GNDE, reference power line extension; VCCAG, chip power line avoidance gap; GNDAG, reference power line avoidance gap; LEDPAD, light-emitting element pad group; LEDPAD1, first light-emitting element pad; LEDPAD2, second light-emitting element pad; ICPAD, chip pad group; Cst1, first capacitor; Cst2, second capacitor; GNDP, reference power pad; VCCP, chip power pad; DISP, address configuration pad; DOSP, address relay pad; DataP, driving data pad; CLKP, clock signal pad; HH, via hole; H1, row direction; H11, preset direction; H2, column direction.
Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that the present disclosure will be thorough and complete, and will fully convey the concept of the example embodiments to those skilled in the art. The same reference numerals in the drawings indicate the same or similar structures, and thus their detailed descriptions will be omitted. Furthermore, the drawings are merely schematic illustrations of the present disclosure, and are not necessarily drawn to scale.
Although relative terms, such as “above” and “below”, are used in this specification to describe the relative relationship of one component represented by an icon to another component, these terms are used in this specification only for convenience, for example, according to the example directions shown in the drawings. It will be understood that if the device represented by the icon were turned upside down, components described as being “above” would become components as being “below”. When a structure is located “on” another structure, it may mean that the structure is integrally formed on the other structure, or that the structure is “directly” placed on the other structure, or that the structure is “indirectly” placed on the other structure through an intermediate structure.
The terms “a”, “an”, “the”, and “at least one” are used to indicate the presence of one or more elements or components/etc. The terms “include” and “have” are used to indicate an open inclusion and means that there may be additional elements or components/etc. in addition to the listed elements or components/etc. The terms “first”, “second”, “third” etc. are used as labels only, and are not used as any limitation on the number of the associated objects.
In the present disclosure, unless otherwise specified, the width of a line refers to the size of the line in the row direction.
In the present disclosure, unless otherwise specified, when describing the relative positional relationship between two structures, it refers to the positional relationship between the orthographic projections of the two structures on the base substrate. When describing the positional relationship between two structures relative to the base substrate, it refers to the positional relationship between the two structures in the direction perpendicular to the base substrate, that is, the layer relationship between the film layers where the two structures are located.
When describing an overlap between two structures, it means that the two structures are in different film layers, and the orthographic projections of the two structures on the base substrate at least partially overlap. When describing a complete overlap between two structures, it means that the orthographic projection of one structure on the base substrate is completely located within the orthographic projection of the other structure on the base substrate. When describing a non-overlap between two structures, it means that the orthographic projection of one structure on the base substrate goes beyond the orthographic projection of the other structure on the base substrate.
The present disclosure provides a light-emitting substrate and a display device having the light-emitting substrate. Referring to
In the present disclosure, the driving metal layer Cu1 and/or the wiring metal layer Cu2 may also be provided with bonding pads for bonding and connecting with external circuits. The bonding pad may be disposed on the edge of the light-emitting substrate. The light-emitting substrate is provided with a fan-out area at one end close to the bonding pad. The fan-out area is provided with fan-out lines that are electrically connected to the driving lines in a one-to-one correspondence. The fan-out line may be bent to connect onto the corresponding bonding pad. The fan-out lines may be provided in the driving metal layer Cu1 or the wiring metal layer Cu2. Some fan-out lines may also be provided across the driving metal layer Cu1 and the wiring metal layer Cu2. In an embodiment of the present disclosure, the fan-out area may span 2 to 4 rows of light areas, for example, span three rows of light areas.
In the present disclosure, the extending direction of the driving line in the non-fan-out area may be defined as the column direction H2, and the direction perpendicular to the column direction H2 and parallel to the plane where the light-emitting substrate is located may be defined as the row direction H1. In some embodiments of the present disclosure, the fan-out area and the bonding pad are located at one end of the light-emitting substrate along the column direction H2. Further, at the end of the light-emitting substrate away from the fan-out area, at least some of the driving lines (i.e., power lines) loaded with the same power source may be electrically connected to each other. It can be understood that at an end of the light-emitting substrate, the same power lines may be electrically connected either through the conductive structure located in the driving metal layer Cu1 or through the conductive structure located in the wiring metal layer Cu2, or through both the conductive structures in the driving metal layer Cu1 and the wiring metal layer Cu2. The present disclosure does not impose any special limitation in this regard.
For example, in an embodiment of the present disclosure, the power lines may include a reference power line GNDA for loading the reference power supply voltage GND, and a light area power line VLEDA for loading the light area power supply voltage VLED. At the end away from the fan-out area, the reference power lines GNDA are electrically connected through conductive lines located in the driving metal layer Cu1 and/or the wiring metal layer Cu2, and the light area power lines VLEDA are electrically connected through conductive lines located in the driving metal layer Cu1 and/or the wiring metal layer Cu2.
It is noted that in other embodiments of the present disclosure, both ends of the light-emitting substrate in the column direction H2 may be provided with bonding pads and fan-out areas adjacent to the bonding pads. An external circuit for driving the light-emitting substrate may be electrically connected to the bonding pads at either end to drive the light-emitting substrate.
In the following, each film layer of the light-emitting substrate in the present disclosure is exemplarily introduced and explained from the perspective of the material of each film layer.
In the present disclosure, the base substrate BP may be a base substrate BP of inorganic material or a base substrate BP of organic material. For example, in an embodiment of the present disclosure, the material of the base substrate BP may be soda-lime glass, quartz glass, sapphire glass, and other glass materials. That is, the base substrate BP may be a glass substrate. In another embodiment of the present disclosure, the material of the base substrate BP may be polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), polyether sulfone (PES), polyimide, polyamide, polyacetal, polycarbonate (PC), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or a combination thereof. That is, the base substrate BP may be an organic flexible substrate. It is noted that in other embodiments of the present disclosure, the base substrate BP may also be made of other materials and structures, such as a multi-layer composite base substrate BP, as long as it can effectively support the light-emitting substrate.
In some embodiments, the thickness of the driving metal layer Cu1 may be greater than the thickness of the wiring metal layer Cu2, so as to reduce the impedance of each driving line, reduce the power consumption of the light-emitting substrate, reduce the difficulty in debugging the light-emitting substrate, and improve the light emission uniformity of the light-emitting substrate. Alternatively, copper electroplating, chemical copper plating, stacking of multiple thin metal layers, or other feasible methods may be used for preparation, so that the driving metal layer Cu1 has a thickness required to meet the electrical performance of the light-emitting substrate. Any thin metal layer may be prepared by magnetron sputtering. The wiring metal layer Cu2 may be prepared by magnetron sputtering. In an embodiment of the present disclosure, the thickness of the driving metal layer Cu1 may be between 1 and 20 microns, for example, between 2 and 5 microns. In an embodiment of the present disclosure, the thickness of the wiring metal layer Cu2 is between 0.3 and 0.8 microns, for example, between 0.3 and 0.5 microns. It is noted that in other embodiments of the present disclosure, the thickness of the driving metal layer Cu1 and the thickness of the wiring metal layer Cu2 may not differ too much, so that they can meet the electrical performance requirements of the light-emitting substrate for the driving lines.
Alternatively, the driving metal layer Cu1 may include one or more stacked metal layers. In an embodiment of the present disclosure, the driving metal layer Cu1 includes at least one copper metal layer, so as to improve the electrical conductivity of the driving metal layer Cu1 and reduce the sheet resistance of the driving metal layer Cu1. Further, the driving metal layer Cu1 may also include other metal layers, for example, an alloy layer (such as molybdenum-niobium alloy) located on the copper metal layer (the side away from the base substrate BP) or below the copper metal layer (the side close to the base substrate BP).
In an embodiment of the present disclosure, the driving metal layer Cu1 may be formed on the base substrate BP through a photolithography process, including sputtering, cleaning, coating, baking, photo exposure, development, hard baking, etching, stripping, and other steps.
In some embodiments, a first passivation layer may also be provided on the upper surface of the driving metal layer Cu1 (the surface away from the base substrate BP). The first passivation layer is used to protect the driving metal layer Cu1 from being oxidized during the processing procedure. The material of the first passivation layer may be inorganic insulation materials such as silicon nitride, silicon oxide, silicon nitride oxide, etc., especially silicon nitride.
The first insulation layer OC1 is disposed on a side of the driving metal layer Cu1 away from the base substrate BP. In some embodiments, the material of the first insulation layer OC1 may be organic materials such as photosensitive resin. The first insulation layer OC1 may be formed through processes including coating, photo exposure, and development, so that the first insulation layer OC1 covers the driving metal layer Cu1, and a via hole is formed to expose part of the driving metal layer Cu1. When the light-emitting substrate is provided with the first passivation layer, the first insulation layer OC1 is formed on a side of the first passivation layer away from the base substrate BP. After the via hole is formed in the first insulation layer OC1, the first insulation layer OC1 may be used as a mask to open a via hole exposing the driving metal layer Cu1 on the first passivation layer.
In the present disclosure, the wiring metal layer Cu2 may include one or more laminated metal layers. In an embodiment of the present disclosure, the wiring metal layer Cu2 includes at least one copper metal layer, so as to improve the electrical conductivity of the wiring metal layer Cu2 and reduce the sheet resistance of the wiring metal layer Cu2. Further, the wiring metal layer Cu2 may also include other metal layers, for example, an alloy layer (such as molybdenum-niobium alloy) located on the copper metal layer (the side away from the base substrate BP) or below the copper metal layer (the side close to the base substrate BP).
In an embodiment of the present disclosure, the wiring metal layer Cu2 may be formed on the base substrate BP through a photolithography process, including sputtering, cleaning, coating, baking, photo exposure, development, hard baking, etching, stripping, and other steps.
In some embodiments, a second passivation layer may also be provided on the upper surface of the wiring metal layer Cu2 (the surface away from the base substrate BP). The second passivation layer is used to protect the wiring metal layer Cu2 and avoid the wiring metal layer Cu2 from being oxidized during the preparation process of the light-emitting substrate. The material of the second passivation layer may be inorganic insulation materials such as silicon nitride, silicon oxide, silicon nitride oxide, etc., especially silicon nitride.
The second insulation layer OC2 is disposed on the side of the wiring metal layer Cu2 away from the base substrate BP. In some embodiments, the material of the second insulation layer OC2 may be organic materials such as photosensitive resin. The second insulation layer OC2 may be formed through a process including coating, photo exposure, and development, so that the second insulation layer OC2 covers the wiring metal layer Cu2 and a via hole is formed exposing part of the wiring metal layer Cu2. When the light-emitting substrate is provided with the second passivation layer, the second insulation layer OC2 is formed on a side of the second passivation layer away from the base substrate BP. After the via hole is formed in the second insulation layer OC2, the second insulation layer OC2 may be used as a mask to open a via hole exposing the pad on the second passivation layer.
It can be understood that in other embodiments of the present disclosure, the materials, film structures, and formation methods of the driving metal layer Cu1 and the wiring metal layer Cu2 may also be other feasible ways, as long as the driving metal layer Cu1 and the wiring metal layer Cu2 that meet the electrical requirements of the light-emitting substrate can be formed. Accordingly, the materials and formation methods of the first insulation layer OC1 and the second insulation layer OC2 may also be other feasible methods.
In the present disclosure, the device layer may include various electronic components bonded and connected to the wiring metal layer Cu2. These electronic components may include light-emitting elements and chip ICs that drive the light-emitting elements. Accordingly, the pads on the wiring metal layer Cu2 include the light-emitting element pad group LEDPAD for bonding with the light-emitting elements and the chip pad group ICPAD for bonding with the chip IC. In some embodiments, the electronic components may further include a temperature sensor, and the wiring metal layer Cu2 may further include a temperature sensor pad group for bonding with the temperature sensor. In some embodiments, the electronic components may further include a capacitor, and the wiring metal layer Cu2 may also be provided with a capacitor pad group for bonding and connecting with the capacitor. In some embodiments, the light-emitting element may be an electronic element that actively emits light, such as Light Emitting Diode (LED), Mini Light Emitting Diode (Mini LED), Micro Light Emitting Diode (Micro LED), etc. The drawings of the present disclosure are all represented and schematically represented by LEDs.
In an embodiment of the present disclosure, the light-emitting element is a Mini LED. The cross-sectional size of the Mini LED (parameters such as length, width, diagonal, or diameter) is between about 100 μm and about 300 μm.
In another embodiment of the present disclosure, the light-emitting element is a Micro LED. The cross-sectional size of the Micro LED (parameters such as length, width, diagonal, or diameter) is below 100 μm.
It can be understood that in other embodiments of the present disclosure, the device layer may also include more types of electronic components, and the wiring metal layer Cu2 may be provided with corresponding pads according to the types and positions of the electronic components.
From a top view, referring to
Referring to
When the chip IC of the present disclosure is working, it may work in the address configuration mode, the driving configuration mode, and the device driving mode. In the address configuration mode, the external circuit may load the address configuration signal DIS to the address configuration pad DISP of the chip IC, the chip IC may configure its own address according to the received address configuration signal DIS, and automatically generate the address relay signal DOS and output it via the address relay pad DOSP. The address relay signal DOS output by the chip IC may be used as the address configuration signal DIS in the subsequent stage, allowing the chip IC in the subsequent stage to perform address configuration. In this way, the chips IC in a signal channel CH can complete address configuration in sequence and determine their own address information. The address relay signal DOS output by the chip IC in the last stage may be fed back to the external circuit. In the driving configuration mode, the external circuit sends the driving data signal Data and the clock signal CLK to each chip IC in the same signal channel CH. Specifically, the external circuit loads the clock signal CLK to the clock signal pad CLKP of the chip IC, and loads the driving data signal Data to the driving data pad DataP of the chip IC. The clock signal CLK is used to control the chip IC to sample the driving data signal Data, for example, so that the driving data pad DataP is sampled on the rising edge or falling edge of the clock signal CLK. The driving data signal Data contains the driving data information of each chip IC, and each driving data information corresponds to an address information (for example, the driving data information has an address information tag). Each chip IC may receive the driving data information it needs based on its own address information. In the device driving mode, the chip IC may control the on or off of each output pin according to the received driving data information, thereby controlling each light area.
Referring to
The chip pad group ICPAD used for bonding and connecting with the chip IC is provided on the wiring metal layer Cu2. The chip pad group ICPAD includes: the reference power pad GNDP for bonding and connecting with the reference power pin GNDD, the chip power pad VCCP for bonding and connecting with the chip power pin VCCD, the driving data pad DataP for bonding and connecting with the driving data pin DataD, the clock signal pad CLKP for bonding and connecting with the clock signal pin CLKD, the address configuration pad DISP for bonding and connecting with the address configuration pin DISD, the address relay pad DOSP for bonding and connecting with the address relay pin DOSD, and the four output pads each being bonded and connected to a respective one of the four output pins. The four output pads include ten pads such as a first output pad OUT1P for bonding and connecting with the first output pin OUT1D, a second output pad OUT2P for bonding and connecting with the second output pin OUT2D, a third output pad OUT3P for bonding and connecting with the third output pin OUT3D, and a fourth output pad OUT4P for bonding and connecting with the fourth output pin OUT4D.
The arrangement of various pads of the chip pad group ICPAD may match the arrangement of the pins of the chip IC, so that each pin of the chip IC can be bonded to a respective pad in a one-to-one correspondence. In an embodiment of the present disclosure, referring to
In an embodiment of the present disclosure, referring to
Referring to
The wiring metal layer Cu2 may also be provided with connection lines, and the connection lines may be connected to the light-emitting element pad group LEDPAD and the chip pad group ICPAD.
The connection lines may include a light area connection line LEDL that is electrically connected to the light-emitting element pad group LEDPAD. The light-emitting element pad groups LEDPAD in the same light area AA are electrically connected through the light area connection line LEDL, so that the light-emitting elements in the same light area AA are electrically connected. The second light-emitting element pad LEDPAD2 in the light area AA may be used as the second end of the light area AA and connected to an output pad (any one of the first output pad OUT1P, the second output pad OUT2P, the third output pad OUT3P, and the fourth output pad OUT4P) through the light area connection line LEDL. The first light-emitting element pad LEDPAD1 in the light area AA may be used as the first end of the light area AA and connected to the light area power line VLEDA through the light area connection line LEDL.
The connection lines also includes the reference power connection line GNDL, the chip power connection line VCCL, the driving data connection line DataL, the address configuration connection line DISL, the address relay connection line DOSL, the clock signal connection line CLKL, etc. The reference power pad GNDP is electrically connected to the reference power line GNDA through the reference power connection line GNDL. The chip power pad VCCP is electrically connected to the chip power line VCCA through the chip power connection line VCCL. The driving data pad DataP is electrically connected to the driving data line DataA through the driving data connection line DataL. The address configuration pad DISP is connected to the address configuration line DSA through the address configuration connection line DISL. The address relay pad DOSP is connected to the address configuration line DSA through the address relay connection line DOSL. The clock signal pad CLKP is connected to the clock signal line CLKA through the clock signal connection line CLKL.
Referring to
Referring to
In some examples, the first driving line is the clock signal line CLKA, and the second driving line is the driving data line DataA or the address configuration line DSA.
For example, in an embodiment of the present disclosure, the first driving line is the clock signal line CLKA, and the second driving line is the driving data line DataA. In this way, the light-emitting substrate of the present disclosure can reduce or eliminate the interferences of the driving data signal Data loaded on the driving data line DataA onto the clock signal CLK loaded on the clock signal line CLKA, by setting the reference power line GNDA between the driving data line DataA and the clock signal line CLKA. Thus, the defect is avoided that the clock signal CLK is easily interfered as a high-frequency signal, thereby making the working state of the chip IC to be more stable. Additionally, in each signal channel CH, the reference power lines GNDA are electrically connected to each other, which allows the currents on the reference power lines GNDA to be in communication with each other. This can smooth the current fluctuations on a single reference power line GNDA, thereby making the reference power supply voltage GND to be more stable, and reducing the noise of the reference power supply voltage GND. On the other hand, this can reduce the overall impedance of the reference power line GNDA in the signal channel CH, further improving the signal stability of the reference power supply voltage GND in the signal channel CH.
In an embodiment of the present disclosure, in the same signal channel CH, each reference power line GNDA and the reference power pad GNDP are electrically connected through a reference power connection line GNDL.
In an embodiment of the present disclosure, referring to
In some embodiments of the present disclosure, in a signal channel CH, the sizes of the multiple reference power lines GNDA are not exactly the same. The reference power line GNDA with a larger width may be called the main reference power line GNDA. The reference power line GNDA with a smaller width and mainly used to shield the clock signal line CLKA, the driving data line DataA and other driving lines may be called the auxiliary reference power line GNDA. In an embodiment of the present disclosure, the width of the main reference power line GNDA is greater than the width of the chip power line VCCA, and the width of the chip power line VCCA is greater than the width of each auxiliary reference power line GNDA. In an embodiment of the present disclosure, the main reference power line GNDA may be disposed adjacent to the light area power line VLEDA. It is noted that when two light area power lines VLEDA and one main reference power line GNDA are arranged in the signal channel CH, the main reference power line GNDA is arranged to be adjacent to one of the light area power lines VLEDA, and the other light area power line VLEDA may be adjacent to the auxiliary reference power line GNDA, or may not be adjacent to the reference power line GNDA.
In an embodiment of the present disclosure, the main reference power line GNDA may overlap with the light area AA, and not overlap with at least part of the chip IC.
In some embodiments of the present disclosure, see
In another embodiment of the present disclosure, referring to
In some embodiments of the present disclosure, referring to
In an embodiment of the present disclosure, referring to
In some embodiments of the present disclosure, referring to
In an embodiment of the present disclosure, some of the light area connection lines LEDL are arranged in the reference power line avoidance gap GNDAG. This can reduce the risk of short circuits between the reference power line GNDA and the light area connection line LEDL, and improve the yield of the light-emitting substrate. It is noted that as shown in
For example, referring to
It is noted that in other embodiments of the present disclosure, the main reference power line GNDA may not be provided with a reference power line avoidance gap, and part of the light-emitting element pad group LEDPAD and part of the light area connection line LEDL may overlap with the reference power line GNDA. In this way, the influences on the impedance caused by providing the reference power line GNDA with the reference power line avoidance gap GNDAG can be avoided.
In some embodiments of the present disclosure, referring to
It is noted that in other embodiments of the present disclosure, the relative position between the chip pad group ICPAD and the driving line may also be in other ways.
For example, in other embodiments of the present disclosure, referring to
In one example, referring to
In an example, referring to
In an example, referring to
As another example, in some other embodiments of the present disclosure, referring to
In one example, referring to
In one example, the chip power line VCCA is provided with a chip power line avoidance gap VCCAG, and the main reference power line GNDA has a reference power line extension GNDE extending to one side of the chip pad group ICPAD. Part of the reference power line extension GNDE may be located in the chip power line avoidance gap VCCAG. In this way, the reference power connection line GNDL can be connected to the reference power line extension GNDE through the via hole HH, and the light area connection line LEDL can be avoided.
In one example, part or all of the chip power line avoidance gaps VCCAG may be disconnected so that the chip power line VCCA is divided into multiple sections. Two adjacent sections of the chip power line VCCA may be electrically connected by a chip power transfer structure VCCBC provided on the wiring metal layer Cu2.
In one example, the chip power connection line VCCL is connected to the chip power transfer structure VCCBC.
In one example, the chip power transfer structure VCCBC includes two lines side by side to avoid a defective ground structure.
In one example, the front address configuration line DSA corresponding to the chip pad group ICPAD is electrically connected to the address configuration pad DISP through the address configuration connection line DISL. The rear address configuration line DSA corresponding to the chip pad group ICPAD is electrically connected to the address configuration transfer structure DSC through a transfer line located on the wiring metal layer Cu2. The address configuration transfer structure DSC is electrically connected to the address relay pad DOSP through the address relay connection line DOSL.
In one example, the address configuration line DSA, CKLA, the driving data line DataA, and the address configuration transfer structure DSC have the same width which is smaller than that of the auxiliary reference power line GNDA. The width of the chip power line VCCA is larger than that of the auxiliary reference power line GNDA and smaller than that of the main reference power line GNDA (all of the main reference power lines GNDA are not shown in
In one example, a gap for laying out the light area connection line LEDL is provided between the chip power line VCCA and the main reference power line GNDA, so as to reduce the overlap between the light area connection line LEDL and the main reference power line GNDA and reduce the risk of undesirable short circuits.
In some embodiments, the wiring metal layer Cu2 is also provided with multiple resistance-reducing structures (such as the light area power resistance-reducing structure VLEDB, the reference power resistance-reducing structure GNDB, the chip power resistance-reducing structure VCCB, etc. in
In one embodiment of the present disclosure, the driving metal layer Cu1 with a smaller thickness may be formed by a magnetron sputtering method. Since the resistance-reducing structure of the wiring metal layer Cu2 can reduce the impedance of the driving line, the reduction in the thickness of the driving metal layer Cu1 will not have a significant negative impact on the electrical performance of the light-emitting substrate, and the preparation process of the driving metal layer Cu1 can be simplified and the cost and the thickness of the light-emitting substrate is reduced. In an embodiment of the present disclosure, the orthographic projection of the resistance-reducing structure on the base substrate BP is located within the orthographic projection of the corresponding driving line on the base substrate BP.
Optionally, the resistance-reducing structure and the corresponding driving line may be connected through a via hole, especially through multiple via holes HH. In
In one embodiment of the present disclosure, referring to
It is noted that in other examples of the present disclosure, the via holes HH between the resistance-reducing structure and the corresponding driving line are also arranged in other possible ways. In an example, see
In an embodiment of the present disclosure, the size of the via hole HH between the resistance-reducing structure and the corresponding driving line may be between 100 and 300 microns. For example, the size of the via hole between the resistance-reducing structure and the corresponding driving line is 200 microns.
In an embodiment of the present disclosure, the spacing of the via holes HH between the resistance-reducing structure and the corresponding driving line may be between 800 and 1200 microns. For example, the spacing of the via holes between the resistance-reducing structure and the corresponding driving line may be 1000 microns.
In an embodiment of the present disclosure, between the resistance-reducing structure and the corresponding driving line, the distance between the via hole HH and the edge of the resistance-reducing structure is not less than 10 microns.
In an embodiment of the present disclosure, the shape of the via hole HH between the resistance-reducing structure and the corresponding driving line may be square or circular. It is noted that the shape of the via hole HH may also be other feasible shapes, such as rectangle, hexagon, etc.
In an embodiment of the present disclosure, referring to
In an embodiment of the present disclosure, the reference power line GNDA may include a control section in the control area BB and a connection section between the control areas BB.
In an embodiment of the present disclosure, the reference power resistance-reducing structure GNDB may include: a connection section of the reference power resistance-reducing structure GNDB overlapping with the connection section of the reference power line GNDA, and a control section of the reference power resistance-reducing structure GNDB overlapping with the control section of the reference power line GNDA. Referring to
In an embodiment of the present disclosure, the control section of the reference power resistance-reducing structure GNDB is provided with an avoidance gap that exposes the control section of the reference power line GNDA. The reference power connection line GNDL is electrically connected to the reference power line GNDA in the avoidance gap through the via hole.
In an embodiment of the present disclosure, the reference power resistance-reducing structure GNDB corresponding to the auxiliary reference power line GNDA may not be provided on the auxiliary reference power line GNDA.
In some embodiments of the present disclosure, referring to
It is noted that in another embodiment of the present disclosure, the via holes located between the light area power line VLEDA and the light area power resistance-reducing structure VLEDB may be arranged into two rows of via holes, and each row includes multiple via holes arranged along the row direction H1. The two rows of via holes may be respectively disposed at both ends of the light area power resistance-reducing structure VLEDB in the column direction H2. In another embodiment of the present disclosure, the via holes in the row may be connected in sequence to form a long strip hole extending along the row direction H1 as a whole.
In an embodiment of the present disclosure, in the non-fan-out area, the light area power resistance-reducing structure VLEDB may completely overlap with the light area power line VLEDA, so that the light area power resistance-reducing structure VLEDB has the largest layout area and can reduce the impedance of the light area power line VLEDA to the greatest extent.
In some embodiments, referring to
In an embodiment of the present disclosure, referring to
In some embodiments of the present disclosure, the device layer may also be provided with a capacitor, and the two pins of the capacitor are electrically connected to the reference power line GNDA and other power lines (power lines other than the reference power line GNDA) respectively. This stabilizes the signal on the power line, filters out the noise on the power line, and decouples the power line from the reference power line GNDA, thereby avoiding voltage fluctuations on the power line that would degrade the quality of the light-emitting substrate.
Optionally, the capacitor may be disposed outside the light area AA to reduce the impact on the light output uniformity of the light-emitting substrate and reduce the wiring difficulty.
Optionally, the capacitors may be arranged evenly on the light-emitting substrate, to eliminate possible fluctuations in the voltage signal more efficiently and uniformly, and to have a more uniform impact on the light output uniformity of the light-emitting substrate.
Optionally, the capacitors may be provided on only some power lines to avoid setting capacitors on each power line, which would cause the density of capacitors too high, thereby preventing the density of capacitors from being too high and affecting the light output uniformity of the light-emitting substrate.
In an embodiment of the present disclosure, referring to
In one example, the wiring metal layer Cu2 may be provided with a first capacitor pad group. The first capacitor pad group includes: a first pad for first capacitor connected to the light area power line VLEDA through a via hole, and a second pad for first capacitor connected to the main reference power line GNDA through a via hole. The two pins of the capacitor are electrically connected to the first pad for first capacitor and the second pad for first capacitor respectively.
In one example, capacitors may be connected to some of the light area power lines VLEDA, and no capacitors may be connected to the remaining light area power lines VLEDA, so as to avoid too many capacitors from affecting the light output uniformity of the light-emitting substrate.
In one example, two adjacent light area power lines VLEDA of two adjacent signal channels CH are electrically connected to each other to form a merged light area power line VLEDA. For example, they are merged into a wider line, or mutually connected through a conductive structure to form a hollow structure. A first capacitor is connected between any merged light area power line VLEDA and the reference power line GNDA. Further, 3 to 5 first capacitors are connected to each merged light area power line VLEDA.
For example, in an embodiment of the present disclosure, on the light-emitting substrate, the number of columns of light areas AA is 80 columns, and the number of rows of light areas AA is 45 rows (one end away from the bonding pad, one chip IC can drive two light areas AA). The first capacitor Cst1 is provided on the light area power line VLEDA that drives the even-numbered column or the odd-numbered column. The first capacitors Cst1 are arranged in four rows, and each row of first capacitors Cst1 is adjacent to the 11th row (starting from the end close to the bonding pad), the 13th row, the 33rd row, and the 39th row of light areas AA.
In an embodiment of the present disclosure, referring to
In one example, the wiring metal layer Cu2 may be provided with a second capacitor pad group. The second capacitor pad group includes: a first pad for the second capacitor connected to the chip power line VCCA through a via hole, and a second pad for the second capacitor connected to the main reference power line GNDA through a via hole. The two pins of the capacitor are electrically connected to the first pad for the second capacitor and the second pad for the second capacitor respectively.
In one example, the second capacitor Cst2 may be connected to some of the chip power lines VCCA, and the second capacitor Cst2 may not be connected to the remaining chip power lines VCCA, so as to avoid too many second capacitors Cst2 from affecting the light output uniformity of the light-emitting substrate.
In one example, a second capacitor Cst2 is connected to each chip power line VCCA. Further, the number of second capacitors Cst2 connected to each chip power line VCCA is 2 to 4.
For example, in an embodiment of the present disclosure, on the light-emitting substrate, the number of columns of light areas AA is 80 columns, and the number of rows of light areas AA is 45 rows (one end away from the bonding pad, one chip IC can drive two light areas AA). Three second capacitors Cst2 are connected to each chip power line VCCA. The second capacitors Cst2 are arranged in three rows, and the row of second capacitors Cst2 is adjacent to the 3rd row (starting from the end close to the bonding pad), the 23rd row, and the 43rd row of light areas AA.
In an embodiment of the present disclosure, the electronic components may further include: a temperature sensor for measuring temperature, and a third capacitor for filtering a power line of the temperature sensor. On the driving metal layer Cu1, the driving lines include a temperature sensor power line used to load the temperature sensor power supply voltage to the temperature sensor. One pin of the third capacitor is electrically connected to the temperature sensor power line, and the other pin is electrically connected to the main reference power line GNDA.
In one example, a third capacitor is connected to each temperature sensor power line.
In one example, 2 to 4 third capacitors are connected to each temperature sensor power line.
In one example, the wiring metal layer Cu2 is provided with a third capacitor pad group, a first temperature sensor wiring, a second temperature sensor wiring, and a temperature sensor pad group for bonding the temperature sensor. The first temperature sensor wiring is electrically connected to the temperature sensor power line and to the temperature sensor pad group, for loading the temperature sensor power supply voltage to the temperature sensor. The second temperature sensor wiring is electrically connected to the reference power line GNDA and to the temperature sensor pad group, for loading the reference power supply voltage GND to the temperature sensor. The third capacitor pad group includes a first pad for the third capacitor and a second pad for the third capacitor. The first pad for the third capacitor is arranged on the first temperature sensor wiring, and the second pad for the third capacitor is arranged on the second temperature sensor wiring. The two pins of the third capacitor are electrically connected to the first pad of the third capacitor and the second pad of the third capacitor respectively.
For example, in an embodiment of the present disclosure, on the light-emitting substrate, the number of columns of light areas AA is 80 columns, and the number of rows of light areas AA is 45 rows (one end away from the bonding pad, one chip IC can drive two light areas AA). The light-emitting substrate is provided with at least 5 columns of temperature sensor power lines, and the 5 columns of temperature sensor power lines are adjacent to the 8th, 24th, 40th, 56th, and 72nd column of light areas respectively. Each column of temperature sensor power lines includes three temperature sensor power lines, and each temperature sensor power line is connected to a third capacitor. The third capacitors are arranged in three rows and five columns. Along the column direction H2, the row of third capacitors is adjacent to the 6th row (starting from the end close to the bonding pad), the 22nd row, and the 38th row of light areas AA. Along the row direction H1, the third capacitors are adjacent to the 8th, 24th, 40th, 56th, and 72nd columns of light areas.
In some embodiments of the present disclosure, referring to
In one example, referring to
In an example, see
In one example, the wiring metal layer Cu2 is provided with a light area power resistance-reducing structure VLEDB that overlaps with the light area power line VLEDA. The light area power resistance-reducing structure VLEDB and the light area power line VLEDA are connected through multiple via holes. The via holes are arranged at least partially around the edge of the light area power resistance-reducing structure VLEDB.
In one example, the wiring metal layer Cu2 is provided with a reference power resistance-reducing structure GNDB that partially overlaps the main reference power line GNDA, and the light area connection line LEDL for the light area power supply voltage V and the light-emitting element pad group LEDPAD, etc. are arranged between the reference power resistance-reducing structures GNDB. The reference power resistance-reducing structure GNDB and the reference power line GNDA are connected through a plurality of via holes. The plurality of via holes is at least partially arranged around the edge of the reference power resistance-reducing structure GNDB.
In one example, the chip pad group ICPAD is disposed between the chip power line VCCA and the main reference power line GNDA. The driving metal layer Cu1 is provided with an output transfer line OUTC between the main reference power line GNDA and the chip pad group ICPAD. The light area connection lines LEDL for the light area power supply voltage V connected to the third output pad OUT3P bridged through the output transfer line OUTC.
In one example, referring to
The driving data connection line DataL overlaps with the chip power line VCCA, the address configuration line DSA, the clock signal line CLKA, the auxiliary reference power line GNDA, and the driving data line DataA, and is connected to the driving data pad DataP and the driving data line DataA.
The address configuration connection line DISL overlaps the output transfer line OUTC, the main reference power line GNDA, the chip power line VCCA, and the front address configuration line DSA, and is connected to the address configuration pad DISP and the front address configuration line DSA.
The address relay connection line DOSL overlaps the chip power line VCCA and the rear address configuration line DSA, and is connected to the chip power pad VCCP and the rear address configuration line DSA.
The reference power connection line GNDL includes a first reference power connection line GNDL1 and a second reference power connection line GNDL2. The main reference power supply voltage GND has a reference power line extension GNDE extending to the side close to the reference power pad GNDP. The first reference power connection line GNDL1 is connected to the reference power line extension GNDE, the reference power pad GNDP and the auxiliary reference power line GNDA of the chip power line VCCA. The second reference power connection line GNDL2 is connected to two auxiliary reference power lines GNDA.
In one example, the chip power line VCCA is provided with a chip power line avoidance gap VCCAG to avoid the chip pad group ICPAD on a side close to the main reference power line GNDA. The chip pad group ICPAD is arranged in the chip power line avoidance gap VCCAG. The chip power line VCCA has an avoidance section with a chip power line avoidance gap VCCAG and a non-avoidance section without a chip power line avoidance gap VCCAG. The width of the avoidance section of the chip power line VCCA is smaller than the width of the non-avoidance section of the chip power line VCCA.
In one example, the wiring metal layer Cu2 is also provided with a chip power resistance-reducing structure VCCB, and the chip power resistance-reducing structure VCCB is connected to the non-avoidance section of the chip power line VCCA through a via hole.
In the light-emitting substrate of the present disclosure, the wiring arrangement in local areas can be fine-tuned according to actual wiring requirements. For example, when a line located on the driving metal layer Cu1 is blocked by other lines on the driving metal layer Cu1, the line may be bridged through the wiring metal layer Cu2. Accordingly, when a line located on the wiring metal layer Cu2 is blocked by other lines on the wiring metal layer Cu2, the line may be bridged through the driving metal layer Cu1. In some embodiments, in the fan-out area of the PNL, the fan-out lines are provided on the driving metal layer Cu1. When the fan-out lines are blocked by other driving lines, the fan-out lines may be partially bridged through the wiring metal layer Cu2. In other embodiments, in the fan-out area, some chip ICs need to be connected to the driving lines and the light areas through long connection lines. These connection lines may need to be bent to avoid other connection lines. Also, the bridge connection may be made through the driving metal layer Cu1 to avoid other lines.
In the display device provided by the present disclosure, the light-emitting substrate may directly display a picture as a display panel, or may be used as a backlight source of a transmissive liquid crystal display device or as a frontlight source of a reflective liquid crystal display device. The display device may be a mobile phone screen, a computer monitor, a television, an electronic billboard, or other display devices, which are not specifically limited in the present disclosure.
Other embodiments of the present disclosure will be readily apparent to those skilled in the art from consideration of the specification and practice of the contents disclosed herein. This application is intended to cover any variations, uses, or adaptations of the present disclosure that follow the general principle of the present disclosure and include common knowledge or customary technical means in the technical field that are not disclosed in the present disclosure. It is intended that the specification and examples be considered as exemplary only, with the true scope and spirit of the present disclosure being indicated by the following claims.
Filing Document | Filing Date | Country | Kind |
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PCT/CN2021/128266 | 11/2/2021 | WO |