The present invention relates to light guides, and to methods for making light guides.
Planar waveguides are cost-effective devices to provide lighting for e.g. liquid crystal displays or key sets. Light initially provided e.g. by an a light emitting diode (LED) may be distributed to a larger area by means of a planar waveguide. The use of thin planar waveguides may facilitate reducing size, weight and manufacturing costs of a portable device.
US patent application US2006/0002675 discloses a light guide plate comprising an upper cladding film, core films formed with V-cut grooves, and a lower cladding film. The V-cut grooves may be formed by means of a hot embossing process. Referring to FIG. 10 of US2006/0002675, light incident on the side surface of the light guide plate propagates in the core films, and is subsequently vertically reflected from the V-cut grooves.
The object of the invention is to provide a light distributing device. A further object of the invention is to provide a method of manufacturing a light distributing device.
According to a first aspect of the invention, there is provided a manufacturing method according to claim 1.
According to a second aspect of the invention, there is provided a method of distributing light according to claim 9.
According to a third aspect of the invention, there is provided a light distributing device according to claim 11.
According to a fourth aspect of the invention, there is provided a device according to claim 14, said device comprising a key set.
According to a fifth aspect of the invention, there is provided a light distributing device according to claim 15.
According to a sixth aspect of the invention, there is provided a means for distributing light according to claim 16.
The light distributing device comprises a substantially planar waveguide having an out-coupling grating and a smoothed or embossed input face, wherein said input face is substantially perpendicular to said out-coupling grating.
Manufacturing of a planar light guide by die-cutting from a plastic sheet or carrier typically results in an optically diffusing side face. A die-cut side face of a light guide is processed using a hot surface processing tool. The surface of the side face may be polished by using a polished surface processing member, or the surface of the side face may be embossed using a member which has a microstructure.
A light beam emitted by a light source is coupled into the light guide through the side face to form a second light beam which is waveguided in the light guide by total internal reflections. The second light beam is subsequently coupled out of the light guide by an out-coupling grating in order to illuminate e.g. a liquid crystal display or a keypad.
According to the invention, topological errors of the input face may be reduced and/or completely eliminated. By removing topological errors, e.g. defects, the efficiency of coupling light of the light source into the light guide may be increased. Adverse stray light may be reduced by eliminating light-scattering defects.
Efficiency of coupling light out of a light guide by binary gratings typically degrades at large angles of incidence. The angle of incidence at the out-coupling grating may be reduced by implementing refractive and/or diffractive structures on the input face. The reduction in the angle of incidence may lead to increased efficiency of coupling light out of the light guide.
The throughput efficiency may be increased by adding diffractive or refractive structures to the input face of the light guide. The input grating or prisms may change the direction of light rays which would otherwise propagate substantially straight through the light guide without impinging on the out-coupling grating. Thus, the diffractive or refractive structures may reduce or completely eliminate the portion of the light which would propagate substantially straight through the light guide without impinging on the out-coupling grating. The throughput efficiency means the ratio of optical output power coupled out by the out-coupling grating to the optical power of a light beam impinging on the input face.
Also the number of interactions between an in-coupled light beam and the out-coupling grating may be increased by diffractive or refractive structures implemented on the input face. The increased number of interactions may also lead to an improved throughput efficiency.
In an embodiment, a substantially collimated output beam may be provided when using a substantially collimated light source.
In an embodiment, a thin illuminated keypad and/or a thin illuminated display may be implemented.
The embodiments of the invention and their benefits will become more apparent to a person skilled in the art through the description and examples given herein below, and also through the appended claims.
In the following examples, the embodiments of the invention will be described in more detail with reference to the appended drawings in which
a shows, in a three dimensional view, a substrate sheet comprising a plurality of out-coupling gratings,
b shows, in a side view, cutting of the input face of a light guide,
c shows, in a three dimensional view, a rough surface of the die-cut side face,
a shows, in a three dimensional view, surface processing of the cut side face,
b shows, in a side view, surface processing of the cut side face,
c shows, in a side view, a light guide having a diffractive grating on its input face, and a corresponding embossing surface processing member,
d shows a light guide having refractive prisms on its input face, and a corresponding embossing surface processing member,
a shows, in a side view, propagation of light in the light guide when the input face has an in-coupling grating,
b shows propagation of light in the light guide when the input face has an in-coupling grating to diffract light into two different directions.
c shows, in a side view, propagation of light in the light guide when the input face comprises prisms,
a shows angular distribution of the intensity of light emitted by a substantially collimated light source,
b shows angular distribution of the intensity of light impinging on the out-coupling grating when light is provided by the light source of
c shows angular distribution of the intensity of light impinging on the out-coupling grating when light is provided by the light source of
a shows angular distribution of the intensity of light emitted by a slightly collimated light source,
b shows angular distribution of the intensity of light impinging on the out-coupling grating when light is provided by the light source of
c shows angular distribution of the intensity of light impinging on the out-coupling grating when light is provided by the light source of
a shows, in an end view, an input grating 12 which comprises vertical diffractive ridges to collimate light of the in-coupled beam in the horizontal direction,
b shows, in an end view, a crossed grating adapted to collimate light of the in-coupled beam in the horizontal direction and adapted to change the direction of the in-coupled beam in the vertical direction,
c shows, in a three dimensional view, a portion of the surface of a crossed grating,
Referring to
An input beam B0 provided by a light source 50 may be coupled into the substrate 10 through the input face 11 to form an in-coupled light beam B1 propagating in said substrate 10. The light of said in-coupled beam B1 may be coupled out of the substrate 10 by the diffractive out-coupling grating 30 to form an output beam B2. The output beam B2 may be used e.g. to light a display 220. The output beam B2 may be viewed e.g. by a human viewer (not shown).
The input beam B0 may be provided by a light source 50 which may be e.g. a light emitting diode (LED), a resonant cavity LED, or a laser. The light source 50 may be in contact with the input face 11 or at some distance from it.
The direction SX refers to the initial average direction of the input beam B0. If the beam B0 is symmetric, the direction SX is parallel to the centerline of the beam B0. The out-coupling grating 30 is in a horizontal plane defined by the directions SX and SY. The horizontal direction SY is perpendicular to the direction SX. The vertical direction SZ is perpendicular to the directions SX and SY.
The input face 11 may be substantially perpendicular to said out-coupling grating 30.
The ratio of the length L1 of the light guide 100 to the thickness t1 of the light guide 100 may be greater than 10. The ratio of the width W1 of the light guide 100 to the thickness t1 of the light guide 100 may be greater than 10. The thickness t1 of the planar waveguide may be e.g. in the range of 0.2 to 1 mm. In order to implement light and/or flexible structures, the thickness t1 may be in the range of 0.1 to 0.2 mm. In order to implement very light and/or flexible structures, the thickness t1 may be in the range of 0.05 to 0.1 mm.
In order to implement e.g. light distributing device 100 to illuminate a key set and/or display (
A waveguiding core of the light guide 100, and in particular one or more of its planar surfaces may be covered by a cladding layer which has lower refractive index than said core. The cladding may comprise e.g. fluoropolymer, in particular polytetrafluoroethylene.
The dimensions t1, W1, and L1 refer to the dimensions of the waveguiding core of the planar waveguide 100, i.e. a possible cladding layer is not taken into consideration.
Referring to
The out-coupling gratings 30 may be implemented before said cutting, substantially simultaneously with said cutting, or after said cutting. The out-coupling gratings 30 may be implemented e.g. by embossing.
The material of the sheet 900 may be substantially transparent thermoplastic polymer, e.g. polycarbonate, polymethylmetacrylate (PMMA) or polyvinyl chloride.
Referring to
Referring to
The rough surfaces cause scattering of light into unwanted directions, i.e. stray light. The input face 11 may comprise defects, i.e. light-scattering protrusions and/or recesses. The criterion for a defect may be e.g. that a defect causes greater than λ/4 distortion in a planar wavefront of light transmitted through the input face 11. The wavelength λ may be e.g. 550 nm, which corresponds to the green color.
The wavefront distortion depends on the height of a defect and the refractive index difference over the input face 11. The refractive index of polycarbonate is approximately 1.6, and the refractive index of polymethylmetacrylate is approximately 1.5. The respective refractive index difference for an air-substrate interface may be e.g. 0.5 to 0.6. Thus, a protrusion of 0.25 μm may cause a 125 to 150 nm retardation in a wavefront transmitted through the input face 11. The retardation of 125 nm corresponds approximately to λ/4 for the wavelength 550 nm.
For demanding applications, the criterion for a defect may also be defined such that it causes less than λ/10 distortion in the wavefront, and/or that the defect protrudes more than λ/10 μm from the average level of the input face 11, wherein the wavelength λ may be e.g. 550 nm.
Referring to
The member 701 may have e.g. a substantially flat polished surface 703 to smooth the surface of the input face 11.
The smoothed input face 11 may polished, i.e. it may be substantially non-diffusing. The smoothing may reduce the number and the size of light scattering defects such that they cover less than 5%, or even less than 1% of the area of the input face 11.
Referring to
The surface of the input face 11 may be softened by heating in order to facilitate smoothing and/or embossing. The surface layer of the input face 11 may be kept at an elevated temperature, e.g. at a temperature greater than 150° C. during the processing in order to facilitate the processing. The material of the substrate 10 may have a softening temperature, which is also known as the glass transition temperature TG. For example, the glass transition temperature of polycarbonate is typically in the range of 145 to 150° C., and the glass transition temperature of polymethylmetacrylate is approximately 105° C. During the embossing or smoothing process, the temperature Ts of the surface of the input face 11 should reach at least temporarily a maximum temperature which is greater than TG.
A first heater 730 may be adapted to heat the surface processing member 701. The heater 730 may be e.g. an electrical heating element or a heat exchanger for transferring heat from hot fluid to the member 701. A second heater 740 may be adapted to heat the input face 11 prior to the processing and/or during the processing. The heater 740 may be based e.g. on infrared radiation or hot gas flow.
The surface processing member 701 may exert an embossing pressure on the input face 11. The embossing pressure may be substantially equal to a predetermined value.
The maximum temperature Ts of the input face 11 may be kept lower than a predetermined upper limit in order to avoid boiling of the substrate material, in order to avoid irreversible chemical damage of the substrate material, in order to minimize sticking of the substrate material to the surface processing member 701, and/or in order to avoid excessive deformation of the input face 11 due to pressure caused by the surface processing member 701 or deformation due to gravity. An excessive deformation may lead e.g. to a local increase in the thickness t1 and width W1 near the input face 11 during the pressing.
During the embossing or smoothing process, the temperature Ts of the surface of the input face 11 may reach at least temporarily a maximum temperature, which is e.g. in the range of TG to TG+30° C., in the range of TG+30° C. to TG+70° C., in the range of TG+70° C. to TG+100° C., or even in the range of TG+100° C. to TG+170° C. The use of high temperatures may facilitate implementing of fine microstructures, but may also require fast heating and cooling of the input face 11 so that only a thin surface layer is deformed during the processing. The maximum temperature Ts of the input face 11 may be selected to correspond to a predetermined embossing pressure.
The temperature of the surface processing member 701 may be kept below a predetermined temperature in order to minimize sticking of the substrate material to the member 701 and/or in order to minimize deformation of an embossed structure when the member 701 is separated from the input face 11. However, the temperature of the surface processing member 701 should not be so low as to harden the input face 11 before the embossing is completed. During the processing, the temperature of the surface processing member 701 may be lower than the glass transition temperature TG, and/or the temperature of the surface processing member 701 may be e.g. 20° C. to 50° C., 50° C. to 100° C., or even 100° C. to 200° C. lower than the maximum temperature of the input face 11.
In particular, the temperature of the surface processing member 701 may be kept 10 to 30° C. lower than a self-adhesive temperature of the substrate material in order to minimize sticking. The self-adhesive temperature is defined as the minimum temperature at which two layers of said substrate material will mutually adhere when pressed together without using any release agents. The surface processing member 701 may be coated with e.g. fluoropolymer-based release agent before the processing in order to minimize sticking.
Referring to
The grating structure 702 may be implemented e.g. on a nickel shim by optical methods, electrolytic methods and/or electron beam lithography.
Referring to
Referring to
A filling factor f is the ratio of the width w2 of the diffractive features 15 compared to the grating period d1. The filling factor of the gratings 12, may be e.g. in the range of 40% to 60%.
A gap between the light source 50 and the in-coupling grating 12 may be filled with a transparent filler, e.g. adhesive. In that case the grating period d1 and the profile height h1 of the in-coupling grating 12 may be selected to be e.g. substantially equal to 2 μm.
The grating period of the surface processing member 701 is selected to be substantially equal to d1. The height of the embossing microstructure of the member 701 is selected to be equal to or greater than h1.
Referring to
I(θ1)=I0 cosn(θ1) (1)
Where I0 is the intensity in the direction SX, and cosn denotes cosine to the power of n.
The beam B0 provided by the light source 50 may be substantially collimated in the vertical and/or horizontal directions. The vertical divergence and/or the horizontal divergence may be in the range of 0 to 5 degrees, or in the range or 5 to 20 degrees. The beam B0 may be slightly collimated in the vertical and/or horizontal directions, i.e. the vertical divergence and/or the horizontal divergence may be in the range of 20 to 60 degrees. The beam B0 may be highly diverging, and the vertical divergence and/or the horizontal divergence may even be in the range of 60 to 180 degrees.
Referring to
The embodiment of
The angle α between the input face 11 and the out-coupling grating 30 may be in the range of 80 to 100 degrees. In particular, the angle α may be substantially equal to 90 degrees.
Referring to
The efficiency of coupling light out of the substrate 10 may be substantially greater than in case of
The local coupling efficiency at the left side of the out-coupling grating 30, i.e. near the input face 11 may be maximized by minimizing the angle θ2 of the in-coupled beam B1 but keeping the angle θ2 greater than a predetermined limit in order to fulfill the criterion for total internal reflection. The angle θ2 may be selected e.g. such that no more than 5% of optical power is coupled out of the lower planar surface of the light guide 100. The local coupling efficiency is defined to be the ratio of the intensity of the output beam B2 to the intensity of the in-coupled beam B1 at a given point of the out-coupling grating 30.
In order to facilitate coupling of light out of the light guide 100, the angle θ2 for the average direction of the in-coupled beam B1 may be selected to be greater than three times arctan(t1/L1)
The angle θ3 between the average direction of the output beam B2 and the surface normal N2 of the out-coupling grating 30 may be e.g. in the range of 0 to 20 degrees. The output beam B2 may be substantially perpendicular to the out-coupling grating 30. The out-coupling grating 30 may be substantially planar.
The angle α between the input face 11 and the out-coupling grating 30 may be in the range of 80 to 100 degrees. In particular, the angle α may be substantially equal to 90 degrees.
Referring to
Referring to
When the input face 11 comprises macroscopic prisms 8a, 8b, the surface normal N1 refers to the surface normal of a tangential plane TP1 of the input face 11. The angle α between the normal N1 input face 11 and the normal N2 of the out-coupling grating 30 may be in the range of 80 to 100 degrees. In particular, the angle α may be substantially equal to 90 degrees.
The angle α between the input face 11 and the out-coupling grating 30 may be in the range of 80 to 100 degrees. In particular, the angle α may be substantially equal to 90 degrees.
The prisms 8a, 8b are macroscopic refractive triangular features which have at least one face 81a, 81b which is inclined with respect to the tangential plane TP1 of the input face 11 in order to re-direct the in-coupled light beams B1a, B1b. An angle γ between the faces 81a, 81b of the prisms 8a, 8b and the tangential plane TP1 may be e.g. in the range of 10 to 60 degrees.
Referring back to
The input beam B0 emitted from the light source 50 may have a predetermined vertical divergence in the direction SZ. When the light of said beam B0 is coupled out by the out-coupling grating 30, the output beam B2 may have substantially the same divergence in the direction SX. In other words, The output beam B2 may have substantially the same divergence as the input beam B0.
Embossing of the in-coupling grating 12 may require smaller deformation of the input face 11 than embossing of the prisms 8.
a shows the angular distribution of intensity I(θ1) of a substantially collimated input beam B0 emitted by a light source 50.
Referring to
Referring to
The diffraction efficiency of a typical binary grating is rather low at large angles of incidence. Thus, light may be coupled out of the substrate 10 substantially more effectively in case of
a shows the intensity distribution of a slightly collimated input beam B0 emitted by a light source 50.
Referring to
Referring to
The input grating 12 or the prisms 8a, 8b may be adapted to direct the light of the in-coupled beam B1, B1a, B1b such that an angle between the average direction of light impinging on the out-coupling grating 30 and the normal N2 is smaller than 70 degrees, in particular smaller than 60 degrees.
Referring to
Referring to
Alternatively, the input grating 12 may comprise a plurality of substantially linear diffractive ridges 15 (
b shows a crossed grating. The input grating 12 may comprise a plurality of diffractive features 17, which are adapted to diffract light simultaneously in the vertical direction SZ and the horizontal direction SY. The diffractive features may be e.g. rectangular or oval microscopic studs (
The position of the vertical lines VL may correspond to a position-dependent grating period d2, i.e. a variable line density as a function of the horizontal distance y from the light source 50. The diffractive features 17 may be adapted to collimate the in-coupled beam B1 in the horizontal direction. In other words, the features 17 may act as a diffractive collimator. The collimation may require a relatively high accuracy for positioning the light source 50 with respect to the input face 11.
c shows a portion of a surface relief grating 12 according to
The input grating 12 may be e.g. a slanted grating to diffract a majority of optical power substantially into one direction and diffraction order, e.g. into the diffraction order one.
The cutting and surface processing operations may be performed as a roll-to-roll process.
Referring to
The roll 701 may be pressed against the input face 11, and the input face 11 may be moved in the direction SY with respect to the roll 701 in order to emboss a grating pattern to said input face 11.
In an embodiment, the heated cutting member 901 also acts as the surface processing member 701.
The light guide 100 may be optimized to operate at a predetermined wavelength λ selected from the range of visible wavelengths 400-760 nm. The light guide 100 may be optimized to operate at the green wavelength 550 nm or at the whole range of visible wavelengths 400-760 nm.
The substantially planar surface 18 of the light guide 100 may have one or more out-coupling gratings 30.
Referring to
Illuminating of the key set 230 comprises illuminating of a pattern 236 associated with a function of said key-set 230. An out-coupling grating 30 may be adapted to illuminate a pattern 236, which is associated with a function of a switch 234. The key set 230 may comprise a plurality of illuminated patterns 236 and switches 234, wherein each pattern may be associated with a function of a switch 234. Thus, it is not necessary to illuminate the switches 234 itself, and the switches 234 may be opaque. The pattern 230 may be e.g. a star pattern, a letter “Q”, “W”, “E”, “R”, a number, or another character. The patterns 236 may be implemented e.g. by printing ink on the out-coupling gratings 30, or by superposing a patterned mask on the out-coupling gratings 30. Also the perimeter, i.e. the shape of the out-coupling gratings 30 may correspond to a pattern 236.
The device 200 may further comprise a battery, data processing and/or telecommunications module. The device 200 may be portable. The device 200 may comprise telecommunications capabilities. The device 200 may be e.g. a mobile phone, and/or a computer. Yet, the device 200 may be a personal digital assistant (PDA), a communicator, a navigation instrument, a digital camera, a video recording/playback device, an electronic wallet, an electronic ticket, an audio recording/playback device, a game device, a measuring instrument, and/or a controller for a machine.
For the person skilled in the art, it will be clear that modifications and variations of the devices and method according to the present invention are perceivable. All drawings are schematic. The particular embodiments described above with reference to the accompanying drawings are illustrative only and not meant to limit the scope of the invention, which is defined by the appended claims.
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/FI2006/050591 | 12/28/2006 | WO | 00 | 8/26/2010 |