Patent Application
20130170045
1. Technical Field
The present disclosure relates to optical films, particularly to a light-guiding optical film, a device for manufacturing the optical film, and a method for manufacturing the light-guiding optical film.
2. Description of Related Art
Environmental awareness has greatly improved. People are now more aware of such things as saving energy and reducing carbon emission, and are now effectively utilizing solar energy and decreasing the use of artificial light sources. To maximize the utilization of the solar energy, products for increasing the capability of guiding the sunlight to a room, such as a light-guiding window, a light-reversing guide plate, and a light-guiding glass, for example, are increasingly employed. However, when these products are used, the original windows should be replaced by the light-guiding window, which is inconvenient and time consuming.
Therefore, there is room for improvement in the art.
The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present disclosure. Moreover, in the drawings, like reference numerals designate corresponding parts throughout several views.
The second surface 13 forms a plurality of nanometer sized conical protrusions 131. In one embodiment, the conical protrusions 131 are arranged in a matrix of rows and columns. In one embodiment, the second surface 13 has been modified to form a hydrophobic layer (not shown) having hydrophobic groups by plasma sputtering deposition. A target material of carbon tetrafluoride (CF4) or perfluoromethylcyclohexane (PFMCH), for example, is used in the plasma sputtering deposition for forming the hydrophobic layer. Thus the second surface 13 have hydrophobic characteristics. Because a thickness of the hydrophobic layer is very thin (about thousands angstroms to hundreds angstroms), it does not affect characteristics of the second surface 13. In one embodiment, the optical film 100 is made of polyethylene terephthalate (PET). A target material of carbon tetrafluoride (CF4) is used for plasma sputtering deposition to form the hydrophobic layer. In other embodiments, the optical film 100 can be made of other materials, such as silica gel, polymethyl methacrylate (PMMA), for example, and the target material for sputtering is changed correspondingly.
If the optical film 100 is pasted on a glass window of a room (not shown), the first surface 11 is adjacent to the room. In this embodiment, an intersection plane of the planar surface 115 with the first surface 11 parallel to the horizontal line can achieve light-guiding optimization. If the intersection of the planar surface 115 with the first surface 11 inclines relative to the horizontal, part of the incident light is reflected by the planar surface 115 to outside. The planar surface 115 perpendicular to the first surface 11, enables the planar surface 115 not to reflect incident light. Instead, the arcuate surface 113 reflects all of the incident light to the room. If the planar surface 115 intersects with the first surface 11 at an acute angle, the planar surface 115 will reflect part of the incident light outside, and the arcuate surface 113 will reflect the other part of the incident light to the room. Light-guiding is worse if using the optimization structure having the planar surface 115 perpendicular to the first surface 11. If the planar surface 115 intersects with the first surface 11 at an obtuse angle, the arcuate surface 113 will reflect a part of the incident light to a planar surface 115 of an adjacent bar-type protrusion 111, and the reflected light further reflected by the planar surface 115 outside. The light-guiding is not at maximum efficiency.
The first roll 21 includes a main body 211 and a first resin layer 213 coated on a sidewall of the main body 211. The main body 211 is substantially cylindrical, and is made of metallic materials, such as stainless steel, for example. The first resin layer 213 is made of polymerization resins including fluorine, and defines a plurality of bar-type grooves 215 matching to the shape of the bar-type protrusions 111. Each bar-type groove 215 includes an inner arcuate surface 2151 and an inner planar surface 2153 connected to the inner arcuate surface 2151. The inner arcuate surface 2151 matches the arcuate surface 113. The inner planar surface 2153 matches the planar surface 115. An extension of the inner planar surface 2153 passes through an axis of the main body 211. In one embodiment, the inner arcuate surface 2153 connects with the inner planar surface 2151 of an adjacent bar-type groove 215. The bar-type grooves 215 are cut by a diamond cutter (not shown). The resin layer 213 is made of Teflon.
The second roll 23 includes a base body 231 and a second resin layer 233 coated on a sidewall of the base body 231. The base body 231 is substantially cylindrical, and is made of metallic materials, such as stainless steel, for example. The second resin layer 233 is made of polymerization resins including fluorine, and defines a plurality of nanometer sized conical holes 235 matching the conical protrusions 131. The conical holes 235 are arranged in a matrix of rows and columns. In one embodiment, the resin layer 213 is made of Teflon.
In step 101, a resin is provided and melted. In one embodiment, the resin is Teflon which has bonding resistance and flexibility characteristics.
In step 102, a main body 211 is provided. The melted resin is coated on a sidewall of the main body 211 to form the first resin layer 213 on the main body 211. In one embodiment, the main body 211 is substantially cylindrical and made of stainless steel.
In step 103, the first resin layer 213 is machined to define a plurality of bar-type grooves 215 parallel to each other. In one embodiment, the bar-type grooves 215 are cut by a diamond cutter (not shown).
In step 201, a base plate is provided. The base plate can be a metallic plate or a single crystal silicon plate. In one embodiment, the base plate is a single-crystal silicon plate.
In step 202, an aluminum target material is provided, and an aluminum layer is formed on the base plate by plasma sputtering deposition. In one embodiment, argon gas may be used as a working gas and fed into a chamber evacuated to about 1.3×10-3 Pa. A high voltage direct current is then applied to the base plate and the aluminum target material, to active the argon gas to form plasma which strikes against the surface of the aluminum target material to separate aluminum atoms. Therefore, the aluminum atoms are deposited on the base plate to form the aluminum layer.
In step 203, the aluminum layer is anodized to form a pore layer having a plurality of nanometer sized pores. The anodizing process is processed in an oxalic acid solution. The oxalic acid solution has a mass concentration of about 0.3 mol/L, and is maintained at a temperature of about 17° C. A voltage of about 40V is applied to the oxalic acid solution for forming the plurality of pores on the aluminum layer. Thus the aluminum layer is processed to the pore layer.
In step 204, the aluminum layer is further anodized for pore-enlargement, such that a shape of the nanometer sized conical pores on the aluminum layer is formed. In one embodiment, the aluminum layer with pores is immersed in a phosphorous acid solution for pore-enlargement by anodizing, and the phosphorous acid solution has a mass concentration of about 5% and is maintained at a temperature of about 30° C. The pores are enlarged to nanometer sized conical pores during the anodizing. In one embodiment, the pores are enlarged several times by anodizing in the phosphorous acid solution.
In step 205, an electroform base material is provided. The aluminum layer on the base plate is transferred to the electroform base material by electroforming. In one embodiment, the electroforming base material is nickel. The base plate and the nickel are immersed in a nickel saline solution applied a current density. The base plate has a plurality of conical pores as a cathode, and the nickel material as an anticathode. The nickel material forms an electroform layer having a plurality of nanometer sized conical protrusions corresponding to the conical pores by electroforming. The nickel material with the electroform layer is taken out from the nickel saline solution, and the electroform layer is separated from the nickel material.
In step 206, a resin is provided, and is heated to a melted state. In one embodiment, the resin is Teflon which has bonding resistance and flexibility characteristics.
In step 207, a base body 231 is provided. The melted resin is coated on a sidewall of the base body 231 to form the second resin layer 233. In one embodiment, the main body 231 is substantially cylindrical, and is made of stainless steel.
In step 208, the conical protrusions on the electroform layer are transferred to the second resin layer 233 by thermal transfer printing. The second resin layer 233 forms a plurality of conical holes 235 corresponding to the conical protrusions on the electroform layer.
In step 301, a high polymer material film is provided. In one embodiment, the high polymer material film is a polyethylene terephthalate film.
In step 302, the first roll 21 rolls on the first surface 11, to enable the first surface 11 to form a plurality of bar-type protrusions 111 corresponding to the bar-type grooves 215. Because the plurality of bar-type grooves 215 are defined on the first roll 21, thus the bar-type protrusions 111 may be formed on the first surface 11 corresponding to the bar-type grooves 215 by rolling the first roll 21 on the first surface 11
In step 303, the second roll 23 rolls on the second surface 13, to enable to the second surface 13 to form a plurality of conical protrusions 131 corresponding to the conical holes 235. Because the plurality of nanometer sized conical holes 235 are defined on the second roll 23, thus the nanometer sized conical protrusions 131 may be formed on the second surface 13 corresponding to the nanometer sized conical holes 235 by rolling the second roll 23 on the second surface 13.
In step 304, the second surface 13 is modified to form a hydrophobic layer having hydrophobic groups. In one embodiment, the second surface has hydrophobic characteristics because the second surface is modified by plasma sputtering deposition using a target material of CF4.
In other embodiments, the second surface 13 of the optical film 100 can be omitted, and the optical film 100 having the first surface 11 can guide the light well to the room when in use.
It is believed that the present embodiments and their advantages will be understood from the foregoing description, and it will be apparent that various changes may be made thereto without departing from the spirit and scope of the embodiments or sacrificing all of its material advantages.
| Number | Date | Country | Kind |
|---|---|---|---|
| 100149525 | Dec 2011 | TW | national |
