The present technology relates to a light-receiving device. For example, the present technology relates to a light-receiving device that is suitably applicable to a device for detecting radiation such as an α ray, a β ray, a γ ray, or an X ray.
Various kinds of imaging devices have been proposed as imaging devices including photoelectric conversion elements in respective pixels (image capturing pixels). For example, Patent Literature 1 describes a back-illuminated imaging apparatus as an example of such imaging devices including the photoelectric conversion elements.
In addition, Patent Literature 2 proposes a radiation imaging device as an example of the imaging device including the photoelectric conversion elements. To reduce radiation exposure, an active light-receiving device is necessary. The active light-receiving device includes amplifier circuits in pixels. The pixels including amplifiers enables reduction in noise.
In addition, sensitivity is also an important factor. Improvement in sensitivity and reduction in noise result in reduction in radiation exposure. It is necessary for a radiation imaging device to have a size corresponding to sizes of respective parts of a body of an imaging target person. For example, a maximum size of 40 cm×30 cm or more is necessary. Therefore, a technology of enlarging the size of a high-performance sensor is also necessary.
Patent Literature 1: JP 2014-192348A
Patent Literature 2: JP 2016-46336A
In general, with regard to pixels disposed in array in a row direction and a column direction, output lines are formed for respective columns, and the pixels are simultaneously read out in a perpendicular direction.
Among the light-receiving devices, it is desired for an (active) low-noise light-receiving device that demands low dose of radiation to narrow a pixel pitch and achieve high resolution. In addition, to achieve the low noise, it is necessary to dispose a circuit near the pixel. Such a light-receiving device has a layout in which a light-receiving area and a circuit area are lined up with respect to a light-receiving surface. Therefore, the fill factor decreases due to the circuit area, and light reception sensitivity may decrease. In other words, there is a tradeoff relation between resolution and light reception sensitivity due to the pixel area and the circuit area.
In addition, although the readout is simple, it is difficult to achieve the global shutter because of dynamic range and linearity.
On the other hand, image sensors in which IC elements are stacked have been proposed. In the image sensors, a plurality of photoelectric conversion elements shares an amplifier or the like. For example, in the case where four pixels share one amplifier or the like, a pixel readout sequence proceeds in a zig-zag manner. Therefore, it is necessary to change the order of read-out numerical values, and the sequence may be complicated.
The present technology has been made in view of the above described situations. According to the present technology, it is possible to prevent a process or the like after readout from being complicated even in the case of a sharing structure in which a plurality of pixels shares an amplifier or the like.
According to an aspect of the present technology, a light-receiving element includes a plurality of unit elements disposed above a substrate, each of the unit elements including a plurality of pixels disposed in m number of rows and n number of columns, and a readout section that sequentially reads out signals from a plurality of pixels disposed in a column direction among the plurality of pixels. The number of readout sections is at least the same as the number of columns.
In the light-receiving element according to the aspect of the present technology, a plurality of unit elements is disposed above a substrate, each of the unit elements including a plurality of pixels disposed in m number of rows and n number of columns, and a readout section configured to sequentially read out signals from a plurality of pixels disposed in a column direction among the plurality of pixels. In addition, the number of readout sections is at least the same as the number of columns.
Note that, the light-receiving device may be an independent device, or may be an internal block included in a device.
According to an aspect of the present technology, a process or the like after readout does not get complicated even in the case of the sharing structure in which a plurality of pixels shares an amplifier or the like.
Note that, the effects described herein are not necessarily limited and may be any of the effects described in the present disclosure.
An embodiment for implementing the present technology (hereinafter, referred to as an embodiment) will be described below.
The present technology is applicable to a device for detecting radiation such as an α ray, a β ray, a γ ray, or an X ray. In addition, the present technology is applicable to such a device that is a light-receiving device for receiving radiation light.
A radiation imaging device 10 in
Specifically, the arm 11 of the radiation imaging device 10 includes a micro processing unit (MPU) and various kinds of processing circuits (not illustrated) therein, and controls the multipoint parallel X-ray source 13. In addition, the arm 11 holds the imaging table 12, the multipoint parallel X-ray source 13, the shield plate 14, and the imaging section 15. The imaging table 12 is a table on which the object O is put.
For example, the multipoint parallel X-ray source 13 includes a plurality of X-ray tubes and a plurality of collimators. The multipoint parallel X-ray source 13 emits parallel X-ray beams to the imaging table 12 under the control of the arm 11. For example, the shield plate 14 contains metal capable of blocking the X-rays such as lead or iron, and the shield plate 14 is provided between the multipoint parallel X-ray source 13 and the imaging table 12. The object O is sandwiched between the imaging table 12 and the shield plate 14.
The shield plate 14 has an opening 14A. Via the opening 14A, the object O is irradiated with X-rays emitted by the multipoint parallel X-ray source 13. Therefore, the object O is placed on the imaging table 12 in a manner that the position of the opening 14A corresponds to the position of the imaging target.
The imaging section 15 includes an X-ray CMOS image sensor. The imaging section 15 converts the x-rays radiated from the multipoint parallel X-ray source 13 via the opening 14A into visible light, and captures an image. The imaging section 15 holds the image obtained as a result of the image capturing, or transmits the image to another device through a network (not illustrated).
The light-receiving device 30 has a configuration in which a substrate 31, an insulating film 32, an insulating film 33, a wiring layer 34, under-barrier metal (UBM) 35, a solder layer 36, and a unit element 37 are stacked, and the insulating film 32 to the solder layer 36 serve as a wiring substrate 38.
For example, the substrate 31 contains glass, quartz, an organic substrate, or the like. Above the substrate 31, a plurality of the unit elements 37 is formed and connected. For example, the substrate 31 is connected to a power source, ground, and a terminal of a reference power source that are lined up in a vertical direction. In addition, the substrate 31 includes wiring for extracting a signal to an outside. Wiring lines that are lined up in a lateral direction are wiring lines for supplying various kinds of control signals.
In the light-receiving device 30, the plurality of unit elements 37 is mounted above the wiring substrate 38 via the UBM 35 and the solder layer 36. The unit element 37 can contain silicon.
When viewed from the light-receiving side (the unit element 37 side), the light-receiving device 30 includes the plurality of unit elements 37 above the substrate 31 above the substrate 31 as illustrated in
The imaging section 15 of the radiation imaging device 10 illustrated in
The unit element 37 may have the size of approximately 40 cm×30 cm. However, it is difficult to manufacture the unit element 37 with the size of approximately 40 cm×30 cm because the unit element 37 with the size of approximately 40 cm×30 cm does not have enough strength. Therefore, for example, the following description will be given with reference to a case where the imaging section 15 with the size of approximately 40 cm×30 cm is obtained by forming the unit elements 37 with sizes enough to have sufficient strength and disposing the plurality of unit elements 37 above the substrate 31.
The unit element 37 is configured as illustrated in
The single unit element 37 includes the plurality of pixels 51. The number of pixels 51 included in the single unit element 37 is not limited to nine. Here, the description will be given with reference to an example in which the single unit element 37 includes the nine pixels 51. However, the number of pixels 51 is not limited to nine. The present technology is applicable to a unit element 37 including a plurality of the pixels 51.
In addition, the description will be given on the assumption that the nine pixels are disposed in array of 3 rows×3 columns. Alternatively, the present technology is also applicable to a unit element 37 in which pixels are disposed in m number of rows and n number of columns. In addition, m is three or more, and n is two or more. In other words, the present technology is applied to a case where three or more pixels are disposed in a vertical direction (perpendicular direction), and two or more pixels are disposed in a lateral direction (horizontal direction).
The unit element 37 illustrated in
The pixel 51 includes a photodiode, and receives incident light. The buffer 52 temporarily holds a signal representing an amount of electric charge accumulated in the pixel 51 read out via the QV amplifier 55, and outputs the signal to a processor (not illustrated) in a later stage. The QV amplifier 55 is a charge/voltage conversion amplifier, and includes a conversion circuit that converts photocurrent of the pixel 51 into a voltage signal. The QV amplifier 55 performs processes such as a process of selecting a pixel 51, from which the photocurrent is to be read out, and a process of resetting the pixel 51.
The decoder 54 controls operation of the QV amplifier 55. The constant-current supply 53 converts current or voltage to be supplied, into stable current or voltage, and supplies it to respective structural elements of the unit element 37.
The unit element 37 includes the plurality of pixels 51 and a readout section that reads out signals from the pixels 51. The readout section includes the QV amplifier 55 and the buffer 52. The QV amplifier 55 includes a conversion circuit that converts photocurrent of the pixel 51 into a voltage signal, and the buffer 52 is connected to an output side of the conversion circuit. In addition, the unit element 37 includes the decode 54 for controlling the readout section.
In the unit element 37 illustrated in
In the case where the pixels 51 do not share the structural elements, the buffer 52, constant-current supply 53, decoder 54, and QV amplifier 55 are prepared for each pixel 51. Therefore, there is a possibility that a region in which the buffer 52, the constant-current supply 53, the decoder 54, and the QV amplifier 55 are disposed becomes large and a region for the pixel 51 becomes small in the case where the size of the unit element 37 is limited. Accordingly, there is a possibility that sensitivity decreases.
When the unit element 37 is configured as illustrated in
In addition, since the number of buffers 52, constant-current supplies 53, decoders 54, and QV amplifiers 55 that have to be disposed in the unit element 37 is reduced, it is also possible to enlarge regions allocated to the respective structural elements in the unit element 37. In addition, since the buffer 52, the constant-current supply 53, the decoder 54, and the QV amplifier 55 are configured to be shared, it is possible to reduce the number of terminals that have to be provided above the substrate 31. As described later, it is also possible to obtain effects of improving reliability, reducing noise, and the like.
In the unit element 37 illustrated in
In addition, in the unit element 37 illustrated in
In addition, in the unit element 37 illustrated in
As described above, the plurality of pixels 51 disposed in the vertical direction is configured to share the buffer 52, the constant-current supply 53, the decoder 54, and the QV amplifier 55. Therefore, it is possible to sequentially read out signals from the pixels 51 in the vertical direction. Description thereof will be given with reference to
In a similar way, a QV amplifier 55A-2 reads out a signal from the pixel 51A-4, reads out a signal from the pixel 51A-5 disposed below the pixel 51A-4 in the perpendicular direction, and then reads out a signal from the pixel 51A-6 disposed below the pixel 51A-5 in the perpendicular direction.
In addition, in a similar way, a QV amplifier 55A-3 reads out a signal from the pixel 51A-7, reads out a signal from the pixel 51A-8 disposed below the pixel 51A-7 in the perpendicular direction, and then reads out a signal from the pixel 51A-9 disposed below the pixel 51A-8 in the perpendicular direction.
As described above, the signals are sequentially read out from the pixels 51 disposed in the perpendicular direction. Since the signals are read out in order of the pixels 51 arrayed in the perpendicular direction as described above, it is not necessary to perform a process of changing the order of signals (numerical values) or the like as the process in the later stage. This enables the process in the later stage to be simplified.
For example, as a comparative example, it is assumed that the QV amplifier 55A-1 is shared by the pixel 51A-1, the pixel 51A-2, the pixel 51A-4, and the pixel 51A-5. In this case, 2x2 number of pixels 51A share the QV amplifier 55A-1. In such a case, the QV amplifier 55A-1 reads out signals from the pixel 51A-1, the pixel 51A-4, the pixel 51A-2, and the pixel 51A-5 in this order.
When the signals are read out in the above-described order, the pixel readout sequence proceeds in a zig-zag manner. Therefore, it is necessary to change the order of numerical values in a process after the readout, and there is a possibility that the sequence gets complicated. However, according to the present technology, as described above, it is possible to provide a pixel readout sequence capable of reading out signals from pixels only in the perpendicular direction. Therefore, it is not necessary to change the order of numerical values in the process, and it is possible to prevent the readout sequence from getting complicated.
With reference to
In general, the crossing means roads that intersect with each other in a cross shape. Here, the wording “crossing” means a part (region) where paths intersect with each other on the assumption that a region between two pixels 51 is treated as a path.
In addition, here, the crossing is the region including a center of a region in which the four (=2×2) pixels 51 are disposed, and the crossing is the region other than the pixels 51.
In the unit element 37 illustrated in
As described above, the QV amplifier 55 is disposed at the crossing surrounded by the four (=2×2) pixels 51. The crossing is a wider region than the region (path) between the pixels 51. The QV amplifier 55 is disposed in such a wider region.
The QV amplifier 55 tends to have a large circuit size because the QV amplifier 55 includes a plurality of transistors therein. Therefore, it is possible to effectively dispose the QV amplifiers 55 in the unit element 37 when such QV amplifiers 55 are disposed at the crossing.
In addition, since the QV amplifier 55 is disposed at the crossing, it is possible to dispose circuits other than the QV amplifier 55 such as the buffer 52, the constant-current supply 53, and the decoder 54 in the regions between the pixels (regions serving as the paths). Therefore, it is also possible to enlarge regions allocated to the circuits other than the QV amplifier 55.
A QV amplifier 55B-1 is disposed at a crossing surrounded by four (=2×2) pixels which are a pixel 51B-1, a pixel 51B-2, a pixel 51B-5, and a pixel 51B-6. The QV amplifier 55B-1 is shared by the pixel 51B-1, the pixel 51B-2, a pixel 51B-3, and a pixel 51B-4 disposed in the perpendicular direction.
The QV amplifier 55B-1 reads out signals from the pixel 51B-1, the pixel 51B-2, the pixel 51B-3, and the pixel 51B-4 in this order, the pixels being disposed in the perpendicular direction.
A QV amplifier 55B-2 is disposed at a crossing surrounded by four (=2×2) pixels which are the pixel 51B-2, the pixel 51B-3, the pixel 51B-6, and a pixel 51B-7. The QV amplifier 55B-2 is shared by the pixel 51B-5, the pixel 51B-6, the pixel 51B-7, and a pixel 51B-8 disposed in the perpendicular direction.
The QV amplifier 55B-2 reads out signals from the pixel 51B-5, the pixel 51B-6, the pixel 51B-7, and the pixel 51B-8 in this order, the pixels being disposed in the perpendicular direction.
A QV amplifier 55B-3 is disposed at a crossing surrounded by four (=2×2) pixels which are a pixel 51B-9, a pixel 51B-10, a pixel 51B-13, and a pixel 51B-14. The QV amplifier 55B-3 is shared by the pixel 51B-9, the pixel 51B-10, a pixel 51B-11, and a pixel 51B-12 disposed in the perpendicular direction.
The QV amplifier 55B-3 reads out signals from the pixel 51B-9, the pixel 51B-10, the pixel 51B-11, and the pixel 51B-12 in this order, the pixels being disposed in the perpendicular direction.
A QV amplifier 55B-4 is disposed at a crossing surrounded by four (=2×2) pixels which are the pixel 51B-10, the pixel 51B-11, the pixel 51B-14, and a pixel 51B-15. The QV amplifier 55B-4 is shared by the pixel 51B-13, the pixel 51B-14, the pixel 51B-15, and a pixel 51B-16 disposed in the perpendicular direction.
The QV amplifier 55B-4 reads out signals from the pixel 51B-13, the pixel 51B-14, the pixel 51B-15, and the pixel 51B-16 in this order, the pixels being disposed in the perpendicular direction.
As described above, even in the case of the unit element 37B including the 16 (=4×4) pixels 51B, the QV amplifier 55B is shared in a manner that signals are sequentially read out from the pixels 51B disposed in the perpendicular direction (column direction). This enables a sequence after reading out the signals to be simplified.
Note that, the arrangement positions of the QV amplifiers 55B illustrated in
In addition, for example, it is also possible to dispose the QV amplifier 55B-2 at a crossing (a crossing surrounded by four (=2×2) pixels which are the pixel 51B-3, the pixel 51B-4, the pixel 51B-7, and the pixel 51B-8) that is below the QV amplifier 55B-1 with one crossing interposed therebetween.
As described above, the QV amplifiers 55B may be disposed at neighboring crossings, or at crossings disposed with one or more crossing interposed therebetween.
In addition, with reference to
A QV amplifier 55C-1 is disposed at a crossing surrounded by four (=2×2) pixels which are a pixel 51C-1, a pixel 51C-2, a pixel 51C-4, and a pixel 51C-5. The QV amplifier 55C-1 is shared by the pixel 51C-1, the pixel 51C-2, and a pixel 51C-3 disposed in the perpendicular direction.
The QV amplifier 55C-1 reads out signals from the pixel 51C-1, the pixel 51C-2, and the pixel 51C-3 in this order, the pixels being disposed in the perpendicular direction.
A QV amplifier 55C-2 is disposed at a crossing surrounded by four (=2×2) pixels which are the pixel 51C-2, the pixel 51C-3, a pixel 51C-5, and a pixel 51C-6. The QV amplifier 55C-2 is shared by the pixel 51C-4, the pixel 51C-5, and the pixel 51 C-6 disposed in the perpendicular direction.
The QV amplifier 55C-2 reads out signals from the pixel 51C-4, the pixel 51C-5, and the pixel 51C-6 in this order, the pixels being disposed in the perpendicular direction.
As described above, even in the case of the unit element 37C including the six (=2×3) pixels 51C, the QV amplifier 55C is shared in a manner that signals are sequentially read out from the pixels 51C disposed in the perpendicular direction (column direction). This makes it possible to simplify a sequence after reading out the signals.
The present technology is applicable to the case where the same number of pixels are disposed in the row direction and the column direction (horizontal direction and perpendicular direction) like the unit element 37A illustrated in
The positions of the QV amplifiers 55A to 55C in the unit elements A to C illustrated in
With regard to the unit elements 37A to 37C illustrated in
In addition, for example, the pixels 51B are disposed in four rows and four columns in the unit element 37B illustrated in
As described above, the number of QV amplifiers 55 disposed at crossings in the unit element 37 is the same as the number of columns of the pixels 51 disposed in the unit element 37. The crossings include no anode or cathode, and the crossings have a large area. Therefore, the crossings are regions with very good design efficiency, and the QV amplifiers 55 are disposed in such regions.
Note that, here, the examples in which the number of QV amplifiers 55 disposed at crossings in the unit element 37 is the same as the number of columns of the pixels 51 disposed in the unit element 37 are continuously described. However, for example, it is also possible to provide a configuration including a larger number of the QV amplifiers 55 than the number of columns of the pixels 51, such as a case where the number of pixels disposed in the row direction is large.
For example, in a unit element 37 in which the pixels 51 are disposed in ten rows and three columns, QV amplifiers 55 for reading out pixels 51 of five rows may be disposed in each column. In other words, the six QV amplifiers 55 may be disposed in the unit element 37.
In other words, the number of QV amplifiers 55 disposed in the single unit element 37 is at least the same as the number of columns of the pixels 51.
In
In addition, a cathode 106 is formed on the side edge of the P+ layer 105. In addition, a separating layer including a P++ layer 107 and a P+ layer 108 is formed between the pixel 51C-2 and the pixel 51C-5 (between the cathodes 106).
As illustrated in
A circuit is configured to be disposed in a gap between such cathodes 106. In the case of the back-illuminated photodiode, a circuit is formed on a front-surface side (electrode side). To separate the photodiode from the circuit in an up-down direction, highly concentrated impurities are diffused in an Epi layer. The crossing at which the QV amplifier 55 is disposed is a widest region of the P+ layer 108. Therefore, very good design efficiency is obtained. In addition, it is possible to design the unit element in a manner that circuits or the like other than the QV amplifiers 55 are provided at the P+ layer 108.
The pixels 51-1 to 51-3 are connected to a negative terminal side of the QV amplifier 55-1 via switches 152-1 to 152-3 for adjusting respective readout timings. A capacitor 151-1 is connected to the pixel 51-1 in parallel. In a similar way, a capacitor 151-2 is connected to the pixel 51-2 in parallel, and a capacitor 151-3 is connected to the pixel 51-3 in parallel.
The switch 152-1 is a switch for adjusting a timing of transferring a signal from the pixel 51-1 (photodiode) to the QV amplifier 55-1. In a similar way, the switch 152-2 is a switch for adjusting a timing of transferring a signal from the pixel 51-2 (photodiode) to the QV amplifier 55-1, and the switch 152-3 is a switch for adjusting a timing of transferring a signal from the pixel 51-3 (photodiode) to the QV amplifier 55-1.
A reference power source supplies reference voltage Vref to a + terminal side of the QV amplifier 55-1. The − terminal of the QV amplifier 55-1 and an output terminal of the QV amplifier 55-1 are connected via a capacitor 153 that stores photoelectric charge. In addition, a transistor 154 for resetting the capacitor 153 is connected to both ends of the capacitor 153. The QV amplifier 55-1 performs IV conversion (current-voltage conversion).
Output from the QV amplifier 55-1 is supplied to a + terminal of the buffer 52-2. A − terminal of the buffer 52-2 is connected to an output terminal of the buffer 52-2. In addition, the output terminal of the buffer 52-2 is connected to a transistor 155 that adjusts an output timing. The transistor 155 outputs a signal, which has been temporarily held by the buffer 52-2, to a processing section (not illustrated) in a later stage at a predetermined timing. Note that, since the buffer 52-2 has a long wiring length, the buffer 52-2 is provided for low-impedance output.
For example, at a time t1, the switch 152-1 gets closed and a signal is transferred from the pixel 51-1 to the QV amplifier 55-1. After the transfer, the switch 152-1 gets opened.
After the QV amplifier 55-1, the signal from the pixel 51-1 is processed. In addition, at a time t2, the switch 152-2 gets closed and a signal is transferred from the pixel 51-2 to the QV amplifier 55-1. After the transfer, the switch 152-2 gets opened.
In addition, after the QV amplifier 55-1, the signal from the pixel 51-2 is processed. In addition, at a time t3, the switch 152-3 gets closed and a signal is transferred from the pixel 51-3 to the QV amplifier 55-1. After the transfer, the switch 152-3 gets opened.
As described above, the opening-closing timings of the switches 152-1 to 152-3 are adjusted, and signals are sequentially read out from the pixels 51-1 to 51-3. As illustrated in
Next, wiring and terminals formed in the substrate 31 connected to the unit element 37 will be described.
In the substrate 31, various kinds of power sources and output lines are formed in a vertical direction (perpendicular direction) of the drawing, and various kinds of control lines are formed in a lateral direction (horizontal direction) of the drawing. As the various kinds of power sources and output lines, a Vref signal line 201, an OUT1 signal line 202, a Vcc signal line 203, and a Gnd signal line 204 are formed. In addition, as various kinds of control lines, a DO control line 205, a D1 control line 206, a D2 control line 207, a D3 control line 208, a D4 control line 209, a Gain control line 210, and a BIN control line 211 are formed.
As the terminals, a BIN terminal 231, a Vcc terminal 232, a GND terminal 233, a D4 terminal 234, a Gain terminal 235, an NC terminal 236, a D2 terminal 237, a D3 terminal 238, a D0 terminal 239, an OUT1 terminal 240, and a D1 terminal 241 are formed in this order from the lower left side.
Note that, the wiring and terminals described above are mere examples. The present technology is not limited thereto. For example, a case where the positions of the wiring lines are changed and a case where the positions of the terminals are changed are also within the scope of application of the present technology.
If the plurality of pixels 51 is not configured to share the QV amplifier 55 and the like, the BIN terminal 231 to the D1 terminal 241 are prepared for each pixel 51. In the case where the plurality of pixels 51 is configured to share the QV amplifier 55 and the like, the plurality of pixels 51 can also share the terminals. Therefore, it is possible to reduce the number of terminals necessary for the single unit element 37.
In a way similar to the substrate 31 illustrated in
Even when the number of pixels 51 that share the QV amplifier 55 and the like increases, the number of terminals increases just slightly. Details thereof will be described here. As illustrated in a left side of
Note that, the case where the four (=2×2) pixels share the single QV amplifier 55 will be described for an illustrative purpose. However, in the case where the present technology is applied as described above, the number of provided QV amplifiers 55 are the same as the number of columns of the pixels 51. Therefore, two QV amplifiers 55 are provided in the case where the single unit element 37 includes the four (=2×2) pixels.
In the case where the four pixels share the QV amplifier 55, 10 terminals are formed in the substrate 31 (not illustrated) as illustrated in a right side of
In addition, the added terminal is the D4 terminal 234. The terminals such as D0 to D4 terminals are connected to the signal lines that transfer signals of 0 or 1. As illustrated in
As described above, even when the number of share pixels increases, the number of added terminals is less than the number of added pixels. Therefore, even in the case where the number of share pixels increases, the number of terminals does not need to be increased as much. Accordingly, in this respect, it is also possible to reduce the number of terminals because the pixels share structural elements.
When the number of terminals is reduced, it is possible to dispose the terminals while keeping distances from each other. The terminals are connected to bumps (the solder layer 36,
When the distance between the bumps is short, there is a high possibility that the bumps come into contact with each other. When the distance between the terminals is long, it is possible to reduce the possibility that the bumps come into contact with each other.
In addition, in the case where the distance between the bumps is long, it is possible to reduce a possibility that a bump comes into contact with another bump even when the sizes of the bumps are large. When the sizes of the bumps are large, it is possible to make stronger connections between the terminals and the bumps.
Therefore, it is possible to increase reliability of the light-receiving device 30 when the number of terminal is reduced and enough distances between the terminals are kept.
According to the present technology, it is possible to further increase reliability of the light-receiving device 30 because of the following reason.
In the case where the light-receiving device 30 is applied to a device for detecting radiation such as an α ray, a β ray, a γ ray, or an X ray, it is necessary to take into consideration effects of the radiation. When a large amount of radiation enters, electric charge caused and generated by ionization effect of the radiation forms fixed charge and an interface state, and deteriorates characteristics of elements. For example, this causes leakage among the transistors. Since the QV amplifier 55 and the like include a plurality of transistors, the cause of leakage among the transistors is preferably removed.
As a countermeasure against the above-described matter, it is conceived that an offset region is prepared in a transistor 311 as illustrated in
In addition, an offset 324 is formed between the source 322 (drain 323) and the LOCOS 325. Since such an offset 324 is provided, it is possible to prevent leakage from the LOCOS 325.
In addition, although not illustrated, concentration of the offset 324 may be increased by performing ion implantation of boron (B), and a separation characteristic between the transistors may be improved.
In addition, although not illustrated, the transistor may be configured in a manner that the transistor has a ring-like shape, a distance between the source 322 and the drain 323 increases, and the leakage is prevented.
Since the transistor 311 is configured in a manner that the leakage is prevented as described above, it is possible to reduce effects of the leakage. However, for example, the size of the transistor 311 itself increases in the case where the offset 324 is provided in the transistor 311 as illustrated in
For example, in the case of another configuration, that is, in the case where the transistor has a ring-like shape, the size of the transistor 311 itself increases. In other words, when the transistor 311 has a large size, it is possible to reduce leakage.
Since the QV amplifier 55 includes the plurality of transistors 311, the size of the QV amplifier 55 gets larger when the size of the transistor 311 gets larger. In other words, if a region allocated to the QV amplifier 55 in the unit element 37 is large, it is possible to increase the sizes of the transistors 311 included in the QV amplifier 55. Therefore, it is possible to improve radiation resistance.
As described above, according to the present technology, it is possible to dispose the QV amplifier 55 in the region of the crossing formed by disposing the pixels 51. In addition, since the region of the crossing is a relatively large region, it is possible to dispose the QV amplifier 55 with a sufficient size as a result. This enables improvement in radiation resistance of the QV amplifier 55.
In addition, it is possible to dispose the buffer 52, the constant-current supply 53, and the decoder 54 in a region other than the crossing. In addition, they are shared by the plurality of pixels 51. Therefore, it is possible to reduce the number of structural elements to be disposed and it is possible to enlarge the region in which they are disposed. Accordingly, it is also possible to improve radiation resistance of the buffer 52, the constant-current supply 53, the decoder 54, and the like.
In addition, it is not necessary to reduce the sizes of the pixels 51 even when the sizes of the buffer 52, the constant-current supply 53, the decoder 54, and the QV amplifier 55 are large. Therefore, it is also possible to prevent reduction in sensitivity.
In addition, according to the present technology, it is also possible to reduce noise. With reference to
To reduce the noise, the capacitor is often mounted as typified by metal insulator metal (MIM). Parasitic capacitance reduces as a pitch gets narrowed. Therefore, it is expected to improve the noise reduction effect. For example,
With reference to
As described above, according to the present technology, it is possible to sequentially read out the pixels 51 disposed in the unit element 37 in the column direction. As described above with reference to
For example, in the case where the unit elements 37-1 to 37-9 are disposed above the substrate 31 as illustrated in
As described above, the unit elements 37 each have the unified readout direction. Accordingly, even in the case where the unit elements 37 include a unit element 37 having the different number of pixels from the other unit elements 37, they have the same readout direction. Therefore, it is possible to prevent processes from getting complicated.
In addition, for example, in the case where the size of the substrate 31 is limited, it is also possible to combine and dispose unit elements 37 with different sizes in a manner that the unit elements 37 fit the limited size of the substrate 31.
In addition, for example, the unit element 37 is manufactured by singulating a circular wafer. Note that, it is also possible to obtain a relatively large unit element 37 from a center of the circular wafer, and obtain relatively small unit elements 37 from the circumference. Accordingly, it is possible to effectively manufacture the unit elements 37 by using a wafer.
According to the present technology, it is possible to read out respective pixels in the perpendicular vertical direction (without changing the order of numerical values). In addition, it is possible to form the unit elements without deteriorating light receiving sensitivity and characteristics in resolution.
In addition, it is possible to obtain X-ray resistance and reduce noise (increase capacitance), and it is possible to widen bump pitches with regard to the number of pixels/the number of terminals. This improves reliability.
Note that, the above-described embodiment has described that signals are sequentially read out from the pixels disposed in the vertical direction (perpendicular direction, column direction). However, the present technology is also applicable to a case where signals are sequentially read out from pixels disposed in a lateral direction (horizontal direction, row direction), for example. In other words, according to the present technology, signals can be configured to be sequentially read out from pixel disposed in a same direction.
In the present specification, a system represents the entire device including a plurality of devices.
Note that, the effects described in the present specification are merely illustrative, and the present technology is not limited thereto. There may be other effects.
Note that, the embodiment of the present technology is not limited to the above-described embodiment, and various modifications are possible without departing from the gist of the present technology.
Note that, the present technology can employ the following configurations.
A light-receiving device including
a plurality of unit elements disposed above a substrate, each of the unit elements including
in which the number of readout sections is at least the same as the number of columns.
The light-receiving device according to (1),
in which the readout section includes a QV amplifier.
The light-receiving device according to (2),
in which the QV amplifier is disposed at a crossing surrounded by four pixels in two rows and two columns among the plurality of pixels.
The light-receiving device according to (2),
in which the QV amplifier is disposed at a center of a region in which four pixels are disposed in two rows and two columns among the plurality of pixels.
The light-receiving device according to any of (2) to (4), in which
the read out section further includes a buffer, and
the buffer is disposed in a region between the pixels.
The light-receiving device according to any of (1) to (5),
in which the m is three or more, and the n is two or more.
The light-receiving device according to any of (1) to (6),
in which the unit element includes silicon.
The light-receiving device according to any of (1) to (7),
in which the light-receiving device detects radiation.
Number | Date | Country | Kind |
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2017-030742 | Feb 2017 | JP | national |
Filing Document | Filing Date | Country | Kind |
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PCT/JP2018/004288 | 2/8/2018 | WO | 00 |