The present invention relates to an optically transparent conductive material for touchscreens, organic EL materials, solar cells, and the like. More specifically, the present invention relates to an optically transparent conductive material suitable for projected capacitive touchscreens.
Touchscreens are widely used as input means on displays of smart devices such as personal digital assistants (PDAs), laptop computers, smartphones, and tablet computers, as well as other electronic devices such as office automation equipment, medical equipment, and car navigation systems.
There are various touchscreens that utilize different position detection methods, such as optical, ultrasonic, surface capacitive, projected capacitive, and resistive, touchscreens. Resistive touchscreens include an optically transparent conductive material and a glass plate with an optically transparent conductive layer, which face each other with a spacer therebetween. An electrical current is applied to the optically transparent conductive material, and the voltage of the glass plate with an optically transparent conductive layer is measured. In contrast, capacitive touchscreens basically include an optically transparent support and an optically transparent conductive layer thereon and do not include movable parts. The capacitive touchscreens have high durability and high optical transmittance, and are thus used in various applications. Projected capacitive touchscreens are also capable of simultaneous multipoint detection, and are thus widely used in devices such as smartphones and tablet PCs.
Conventional transparent electrodes (optically transparent conductive materials) for touchscreens usually include an ITO (indium-tin oxide) conductive film as an optically transparent conductive layer formed on an optically transparent support. Yet, ITO conductive films have a high refractive index and high surface reflectivity, so that optically transparent conductive materials including an ITO conductive film unfortunately have a reduced total light transmittance. In addition, due to low flexibility, such ITO conductive films are prone to crack when bent, resulting in an increased electrical resistance.
As an alternative optically transparent conductive material including an optically transparent conductive layer different from an ITO conductive film, Patent Literature 1 and Patent Literature 2, for example, each disclose an optically transparent conductive material having a metal thin wire net-like pattern on an optically transparent support, which can be obtained by a method (semi-additive method) in which a thin catalytic layer is formed on a optically transparent support, a pattern is formed thereon using a resist, a metal layer is stacked on resist opening portions by plating, and lastly, the resist layer and a underlayer metal protected by the resist layer are removed.
Recent proposals also include a method that uses a silver halide photosensitive material produced by a silver salt diffusion transfer process as a conductive-material precursor to produce a metal thin wire net-like pattern. For example, Patent Literature 3, Patent Literature 4, and Patent Literature 5 each disclose a technique for forming a metal (silver) thin wire pattern by reacting a conductive-material precursor with a soluble silver halide forming agent and a reducing agent in an alkaline fluid, wherein the conductive-material precursor includes at least a physical development nucleus layer and a silver halide emulsion layer formed in this order on an optically transparent support. A metal thin wire pattern produced by this method can reproduce uniform wire width, and can also provide high conductivity with a narrower wire width compared to patterns produced by other methods because silver has the highest conductivity of all metals. The optically transparent conductive layer obtained by this method is also advantageous in that it has higher flexibility and higher bending resistance than ITO conductive films.
Projected capacitive touchscreens include a touch sensor formed of an optically transparent conductive material on which multiple sensor parts are patterned on the same plane. If such a touch sensor is formed of an optically transparent conductive material only having multiple sensor parts, the sensor parts will be noticeable. Thus, usually, dummy parts that are non-conductive with the sensor parts are arranged at portions where the sensor parts are not patterned on the optically transparent conductive material. For example, Patent Literature 6 suggests a method for disposing sensor parts and dummy parts by dividing a metal thin wire pattern by slits. Patent Literature 7 discloses an optically transparent conductive material in which disconnection parts are provided within a metal thin wire pattern to cut off conduction from sensor parts so as to form dummy parts and in which the difference in aperture ratio between the sensor parts and the dummy parts is specified. Patent Literature 8 suggests a method in which a metal thin wire net-like pattern of sensor parts and a metal thin wire net-like pattern of dummy parts are shifted along the boundary between each sensor part and each dummy part so as to cut off conduction of the dummy parts from the sensor parts. Patent Literature 9 discloses dummy parts formed in a metal thin wire net-like pattern formed by an assembly of multiple polygons each including a disconnection part. Patent Literature 10 suggests a method for providing floating electrodes (dummy parts) separated from sensor parts via disconnection parts.
Patent Literature 1: JP-A 2007-287994
Patent Literature 2: JP-A 2007-287953
Patent Literature 3: JP-A 2003-77350
Patent Literature 4: JP-A 2005-250169
Patent Literature 5: JP-A 2007-188655
Patent Literature 6: JP-A 2006-344163
Patent Literature 7: JP-A 2013-30378
Patent Literature 8: JP-A 2014-127115
Patent Literature 9: JP-A 2014-186716
Patent Literature 10: JP-A 2014-109997
Optically transparent conductive materials having a metal thin wire net-like pattern are required to ensure the invisibility of the shapes of the sensor parts and the dummy parts (i.e., the pattern is difficult to see) and also to minimize the occurrence of short circuit during production of the optically transparent conductive materials. It is possible to prevent short circuit by sufficiently increasing the width of each disconnection part (the length of the disconnected portion) provided in the metal thin wire pattern of the dummy parts; however, the disconnection parts having a sufficiently increased width sometimes result in a phenomenon, so-called “visible pattern or pattern visibility”, where the shapes of the sensor parts and the dummy parts patterned on the optically transparent support are recognizable. Since an aim to reduce the occurrence of short circuit during production of the optically transparent conductive materials conflicts with an aim to reduce pattern visibility, it has been very difficult to achieve both aims at the same time.
In a projected capacitive touchscreen, usually, two sheets of an optically transparent conductive material having multiple sensor parts patterned on the same plane are superimposed on each other, and a portion where the upper and lower sensor parts overlap each other serves as a capacitor. Changes in the capacitance of the capacitor upon touch by a user are captured by the sensors which thus operate as touch sensors. A capacitor having a smaller capacitance is preferred for increasing the sensitivity of the sensor.
Generally, the capacitance of the capacitor is known to be proportional to the area of polar plates (the portion where the upper and lower sensor parts overlap each other) and inversely proportional to the distance between the polar plates. Further, when a conductor is located close to the capacitor, the capacitance of the capacitor may change due to the influence of the conductor. Such a change is known as parasitic capacitance.
As disclosed in Patent Literatures 6 to 10, in an optically transparent conductive material having a metal thin wire net-like pattern, a dummy part also has a metal thin wire pattern which is a conductor. In the case of a projected capacitive touchscreen, since a metal thin wire pattern including disconnection parts (i.e., dummy parts) is located close to the portion where upper and lower sensor parts overlap each other, the parasitic capacitance occurs due to the dummy parts, causing a reduction in the sensitivity of the touchscreen.
An object of the present invention is to provide an optically transparent conductive material capable of producing a highly sensitive touchscreen, in which the pattern visibility and the occurrence of short circuit are reduced.
The object of the present invention is achieved by the invention described below.
The present invention provides an optically transparent conductive material including an optically transparent support, sensor parts electrically connected to terminal areas via peripheral wiring parts, and dummy parts not electrically connected to the terminal areas, the sensor parts and the dummy parts being disposed on the optically transparent support, wherein the sensor parts and the dummy parts each have a metal thin wire net-like pattern formed by an assembly of multiple polygons, the metal thin wire pattern of each dummy part includes disconnection parts, and the metal thin wire pattern of each dummy part also includes a region satisfying the following requirement (1) and/or a region satisfying the following requirement (2):
The present invention provides a highly sensitive optically transparent conductive material in which the pattern visibility and the occurrence of short circuit are reduced.
The present invention is described in detail below with reference to the drawings.
The sensor parts 11 and the dummy parts 12 in
In the present invention, the sensor parts 11 and the dummy parts 12 are each formed in a metal thin wire net-like pattern formed by an assembly of multiple polygons. The metal thin wire pattern may be a regular pattern or a random pattern.
In the present invention, the term “regular pattern” means that there is regularity in how polygons are assembled. Examples include a pattern in which polygons of the same shape and size are regularly assembled, and a pattern in which polygons of several different shapes and sizes are assembled while regularity is maintained. In contrast, in the present invention, the term “random pattern” refers to a pattern without regularity in the shape of polygons assembled or in the repetition in how the polygons are assembled. It should be noted that the design of the optically transparent conductive material including the sensor parts 11 and the dummy parts 12 will be very complicated if there is no regularity in the shape of polygons assembled or in the repetition in how the polygons are assembled in the entire region of the sensor parts 11 and the dummy parts 12. Thus, if a pattern has no regularity in the shape of polygons or in the repetition in how the polygons are assembled in an at least 10-mm2 region, such a metal thin wire net-like pattern is regarded as a random pattern.
When the sensor parts 11 and the dummy parts 12 are each formed in a regular pattern, the smallest unit of a repeated regular shape is referred to as a “unit figure”. Unit figures of the sensor parts 11 and the dummy parts 12 may have the same shape or different shapes; however, unit figures of the same shape are preferred in terms of reducing “pattern visibility”. Preferably, such unit figures also have the same size. Yet, differences in the presence or absence of a disconnection part, location of the disconnection part, width of the disconnection part, and the like should not be considered in determining whether or not the unit figures have the same shape. In the case of employing the present invention to produce the optically transparent conductive material for a versatile touchscreen capable of preventing moire even when used in different kinds of liquid crystal display (LCD) panels, the sensor parts 11 and the dummy parts 12 each preferably have a net-like shape of a random pattern. In contrast, in the case of producing the optically transparent conductive material for a touchscreen exclusive for a specific LCD or for the purpose of preventing a “grainy appearance” problem peculiar to the use of a random pattern, the sensor parts 11 and the dummy parts 12 each preferably have a net-like shape of a regular pattern.
In the present invention, when the sensor parts 11 and the dummy parts 12 each have a regular net-like pattern, a preferred shape of the unit figure is a square or a rhombus in terms of preventing a moire phenomenon that occurs in relation to a liquid crystal display. A rhombus in which one vertex has an angle of 30 to 80° is more preferred.
There is a case where the sensor parts 11 or the dummy parts 12 are disposed on the optically transparent support 2 and these parts are arranged with a certain period (for example, in
In the present invention, in the case where a net-like shape of a random pattern is employed, the random pattern may be a Voronoi diagram or a Delaunay diagram, or a pattern obtained by expanding or reducing such a random pattern in any direction. Essentially, these random patterns have no periodicity. Yet, in the present invention, as described above, if a pattern does not maintain regularity in an at least 10-mm2 region, such a pattern is regarded as a random pattern. Thus, it is possible to form a random pattern by, for example, defining a 16-mm2 region as a base figure and repeating this base figure. As for the period of the base figure, there is a case where the sensor parts 11 or the dummy part 12 are arranged with a certain period in their alignment direction (for example, in
Further, in the present invention, in the case where a random pattern or a base figure obtained by expanding or reducing a random pattern in any direction is repeated, preferably, the sensor parts 11 and the dummy parts 12 are formed with different base figures. In addition, in this case, it is preferred that the period of the sensor parts 11 in the x-direction or y-direction is shorter than the period of the dummy parts 12 in the x-direction or y-direction, and it is more preferred that the period of the sensor part 11 is shorter than the period of the dummy part 12 in both the x-direction and the y-direction. This arrangement can further reduce the “grainy appearance”.
In the present invention, the metal thin wire pattern of each dummy part 12 includes disconnection parts. Each disconnection part may be provided by making a cut in a part of the metal thin wire pattern. Alternatively, for example, a method disclosed in Patent Literature 8 may be employed in which the net-like shape is shifted in a specific direction along the boundary line. In order to reduce the difference in the aperture ratio (the ratio of the area occupied by portions without metal thin wires to the area occupied by the sensor parts 11 or the dummy parts 12) between the sensor parts 11 and the dummy parts 12 resulting from the presence of the disconnection parts, the metal thin wire pattern of the dummy parts 12 may have a greater wire width than that of the sensor parts 11, or the metal thin wire pattern of the dummy parts 12 may partly have a greater wire width. If the width of each disconnection part is too wide, the aperture ratio difference between the sensor parts 11 and the dummy parts 12 will be large, and the difference between the dummy parts 12 and the sensor parts 11 will be easily visible. In contrast, if the width of each disconnection part is too narrow, a connection may be established at a part that should be a disconnection part (which results in a short circuit) due to production defects. Thus, the width of the disconnection part (length of the disconnection) is preferably 1 to 20 μm, more preferably 2 to 10 μm. The disconnection part may be provided on a side or a vertex of a polygon. Yet, preferably, the disconnection part is provided on a side of a polygon in order to cut off the electrical connection without fail.
In the present invention, the metal thin wire pattern of each dummy part includes a region satisfying the following requirement (1) and/or a region satisfying the following requirement (2):
The requirement (1) is described with reference to
As shown in
Next, the requirement (2) is described with reference to
As shown in the region 34 shaded with “+” in
Further, the requirement (2) is described with reference to
As shown in the region 54 shaded with “+” in
The dummy part of the optically transparent conductive material of the present invention may include both the region satisfying the requirement (1) and the region satisfying the requirement (2). The percentage of the total area of the region satisfying the requirement (1) and the region satisfying the requirement (2) (hereinafter also referred to as the percentage of the region(s) satisfying the requirement (1) and/or the requirement (2)) in the area of the dummy part is preferably 50% or higher. In the calculation of the total area, in the case where the region satisfying the requirement (1) and the region satisfying the requirement (2) overlap each other, the overlapped region is assumed to be either one of the region satisfying the requirement (1) or the region satisfying the requirement (2) for calculation. The area of the overlapped region should not be duplicated in the calculation.
In the present invention, the sensor parts 11, the dummy parts 12, the peripheral wiring parts 14, and the terminal areas 15 are preferably made of metal, particularly preferably gold, silver, copper, nickel, aluminium, or composite materials thereof. Examples of the method for forming the sensor parts 11, the dummy parts 12, the peripheral wiring parts 14, and the terminal areas 15 include known methods such as a method in which a silver halide photosensitive material is used; a method in which a silver halide photosensitive material is used and an obtained silver image is electroless plated or electroplated; a method in which conductive ink such as silver paste or copper paste is printed by a screen printing method; a method in which conductive ink such as silver ink or copper ink is printed by an ink-jet method; a method in which a conductive layer is formed by vapor deposition or sputtering, and a resistance film is formed thereon, followed by exposure, development, etching, and resist layer removal; and a method in which metal foil such as copper foil is attached, and a resistance film is formed thereon, followed by exposure, development, etching, and resist layer removal. Particularly preferred is the silver salt diffusion transfer process capable of making a thin pattern made of metal and also capable of easily forming a very fine pattern. A pattern that is too thick may be difficult to be post-processed. A pattern that is too thin may not be able to provide necessary conductivity as a touchscreen. Thus, the thickness of a pattern made of metal is preferably 0.01 to 5 μm, more preferably 0.05 to 1 μm. In the optically transparent conductive material of the present invention, the sensor parts 11, the dummy parts 12, the peripheral wiring parts 14, and the terminal areas 15 may be provided either one side or both sides of the optically transparent support. The silver salt diffusion transfer process is described in detail in documents such as Patent Literature 3, Patent Literature 4, and Patent Literature 5.
The optically transparent support of the optically transparent conductive material of the present invention is preferably a plastic, glass, rubber, or ceramic support, for example. Such an optically transparent support preferably has a total light transmittance of 60% or higher. The plastic support is particularly preferably a flexible resin film because of its excellent handling properties. Specific examples of the resin film used as the optically transparent support include resin films made of polyester resin such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), acrylic resin, epoxy resin, fluororesin, silicone resin, polycarbonate resin, diacetate resin, triacetate resin, polyarylate resin, polyvinyl chloride, polysulfone resin, polyether sulfone resin, polyimide resin, polyamide resin, polyolefin resin, and cyclic polyolefin resin, having a thickness of 50 to 300 μm. The optically transparent support may be provided with a known layer such as an easy-adhesion layer.
The optically transparent conductive material of the present invention may include, in addition to the optically transparent support, easy-adhesion layer, and optically transparent conductive layer including the sensor parts and the dummy parts each formed in a metal thin wire pattern described above, a known layer such as a hard coat layer, an antireflection layer, an adhesive layer, or an antiglare layer between the optically transparent support and the optically transparent conductive layer, on the side of the optically transparent support on which the optically transparent conductive layer is not present, or on the optically transparent conductive layer. A physical development nuclei layer or the like may also be provided between the optically transparent support and the optically transparent conductive layer.
The present invention is described in detail below with reference to examples, but the present invention is not limited to the following embodiments within the scope of the invention.
<Production of Optically Transparent Conductive Material 1>
A 100-μm thick polyethylene terephthalate film was used as an optically transparent support. The total light transmittance of the optically transparent support was 91%.
Next, in accordance with the following formulation, the following physical development nuclei coating liquid was prepared, applied to the optically transparent support, and dried to form a physical development nuclei layer.
<Preparation of Palladium Sulfide Sol>
Liquid A and Liquid B were mixed with stirring for 30 minutes, and then passed through a column filled with an ion exchange resin to give a palladium sulfide sol.
<Preparation of Physical Development Nuclei Layer Coating Liquid> for Each 1 m2
Subsequently, an intermediate layer, a silver halide emulsion layer, and a protective layer (their compositions are shown below) were applied, in the order from closest to the optically transparent support, to the physical development nuclei layer, and dried to give a silver halide photosensitive material. The silver halide emulsion was produced by a double jet mixing method commonly used for photographic silver halide emulsions. The silver halide emulsion was prepared using 95 mol % of silver chloride and 5 mol % of silver bromide to have an average particle diameter of 0.15 μm. The thus-obtained silver halide emulsion was subjected to gold-sulfur sensitization using sodium thiosulfate and chloroauric acid according to the usual method. The thus-obtained silver halide emulsion contains 0.5 g of gelatin per gram of silver.
<Composition of Intermediate Layer (per m2)>
<Composition of Silver Halide Emulsion Layer (per m2)>
<Composition of Protective Layer (per m2)>
The thus-obtained silver halide photosensitive material was brought into close contact with a transparent manuscript having a pattern shown in
Subsequently, after immersion in a diffusion transfer developer (described below) at 20° C. for 60 seconds, the silver halide emulsion layer, the intermediate layer, and the protective layer were washed off with warm water at 40° C., followed by drying. Thus, an optically transparent conductive material 1 having a pattern that is a mirror image to the pattern of the transparent manuscript in
<Composition of Diffusion Transfer Developer>
The total volume was made up to 1000 ml with water.
The pH was adjusted to 12.2.
<Production of Optically Transparent Conductive Material 2>
An optically transparent conductive material 2 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 3>
An optically transparent conductive material 3 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 4>
An optically transparent conductive material 4 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 5>
An optically transparent conductive material 5 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 6>
An optically transparent conductive material 6 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 7>
An optically transparent conductive material 7 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 8>
An optically transparent conductive material 8 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 9>
An optically transparent conductive material 9 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 10>
An optically transparent conductive material 10 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
<Production of Optically Transparent Conductive Material 11>
A transparent manuscript having the pattern shown in
<Production Method of Thin Wire Pattern of a Voronoi Diagram>
A plane is covered with the rhombuses shown in
<Disconnection Part Production Method>
A plane is covered with the rhombuses shown in
<Production of Optically Transparent Conductive Material 12>
An optically transparent conductive material 12 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
The dummy part 12 shown in
<Production of Optically Transparent Conductive Material 13>
An optically transparent conductive material 13 was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having the pattern shown in
The obtained optically transparent conductive materials 1 to 13 were tested as described below to evaluate the pattern visibility, short circuit, and capacitance. Table 1 shows the results.
<Evaluation of Pattern Visibility>
In a room protected from external light, each obtained optically transparent conductive material was placed with its side having a metal thin wire pattern facing up, and irradiated from above with a three-wavelength fluorescent lamp located 30 cm away from the table. The optically transparent conductive material was observed from an angle of 30° relative to the table surface to determine whether or not the shapes of the sensor parts and the dummy parts are visible. The evaluation was made based on the following criteria: “1” for a level at which the sensor parts and the dummy parts are visible when observed from a position 100 cm away from the side of the optically transparent conductive material (poor: the pattern is visible from afar); “2” for a level at which the sensor parts and the dummy parts are visible when observed from a position 50 cm away from the side of the optically transparent conductive material (inadequate: the pattern is visible); “3” for a level at which the sensor parts and the dummy parts are visible when observed from a position 20 cm away from the side of the optically transparent conductive material (good: the pattern is only slightly visible at a close range); and “4” for a level at which the sensor parts and the dummy parts are not visible when observed from a position 20 cm away from the side of the optically transparent conductive material (excellent: the pattern is not visible even at a close range).
<Evaluation of Short Circuit>
In the production of the optically transparent conductive materials 1 to 13, 100 sheets of each optically transparent conductive material were produced. The evaluation was made based on the percentage of sheets in which a circuit between the right and left terminal areas 15 was shorted to its adjacent circuit, which are electrically connected in the pattern shown in
<Measurement of Capacitance>
An optically transparent conductive material including sensor parts extending in a y-direction was obtained in the same manner as in the production of the optically transparent conductive material 1, except for using a transparent manuscript having a pattern shown in
Ten sets of the conductive material laminates were produced for each of the optically transparent conductive materials 1 to 13.
For pasting, the optically transparent conductive material including the sensor parts extending in the y-direction and the optically transparent conductive materials 1 to 13 were partially cut before pasting so as to expose the terminal areas 15 of these optically transparent conductive materials. For each of the obtained laminates, the capacitance between all the terminal areas 15 of the optically transparent conductive material including the sensor parts extending in the y-direction and all the terminal areas 15 of each of the optically transparent conductive materials 1 to 13 was measured using an L/C meter (U1731C available from Agilent), and an average value was determined. A lower average value indicates a higher sensitive touchscreen.
Table 1 confirms that the pattern is hardly visible in the optically transparent conductive materials 1 to 8 and 11 to 13 including the regions satisfying the requirement (1) and/or the regions satisfying the requirement (2) of the present invention. The results clearly show the effects of the present invention.
Number | Date | Country | Kind |
---|---|---|---|
2015-129859 | Jun 2015 | JP | national |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/JP2016/067701 | 6/14/2016 | WO | 00 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2017/002609 | 1/5/2017 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
20110102370 | Kono et al. | May 2011 | A1 |
20140144679 | Hwang | May 2014 | A1 |
20140299357 | Nakamura | Oct 2014 | A1 |
20140299361 | Nakamura et al. | Oct 2014 | A1 |
20150193035 | Ullmann | Jul 2015 | A1 |
20150286323 | Iwami et al. | Oct 2015 | A1 |
20150309617 | Yoshiki | Oct 2015 | A1 |
20160209967 | Ku | Jul 2016 | A1 |
20170102804 | Kikukawa | Apr 2017 | A1 |
Number | Date | Country |
---|---|---|
104011635 | Aug 2014 | CN |
203882639 | Oct 2014 | CN |
2003-077350 | Mar 2003 | JP |
2005-250169 | Sep 2005 | JP |
2006-344163 | Dec 2006 | JP |
2007-188655 | Jul 2007 | JP |
2007-287953 | Nov 2007 | JP |
2007-287994 | Nov 2007 | JP |
2010-262529 | Nov 2010 | JP |
2012-146277 | Aug 2012 | JP |
2013-030378 | Feb 2013 | JP |
2013-143045 | Jul 2013 | JP |
2014-109997 | Jun 2014 | JP |
2014-127115 | Jul 2014 | JP |
2014-186716 | Oct 2014 | JP |
201013488 | Apr 2010 | TW |
201327317 | Jul 2013 | TW |
201432540 | Aug 2014 | TW |
201435923 | Sep 2014 | TW |
Entry |
---|
International Search Report and Written Opinion dated Aug. 9, 2016, by the Japan Patent Office in corresponding International Patent Application No. PCT/JP2016/067701, with English translation (12 pages). |
International Preliminary Report on Patentability dated Jan. 2, 2018, by the International Bureau of WIPO in corresponding International Patent Application No. PCT/JP2016/067701, with English translation (9 pages). |
Office Action issued in Japanese Application No. 2016-122591, dated Apr. 2, 2019 (6 pages). |
Number | Date | Country | |
---|---|---|---|
20180196546 A1 | Jul 2018 | US |