Patent Application
20160178162
The present invention relates to a lighting reflector reflecting light emitted from a light source and a production method therefor. The present invention also relates to a lighting device including a light source and a lighting reflector reflecting light emitted from the light source.
Conventional lighting devices are disclosed in Patent Literatures 1 to 3. The lighting devices each include a light source composed of an LED and a lighting reflector (hereinafter referred to as the “reflector”) reflecting light emitted from the light source. The reflector is composed of a rotating body rotating about an axis aligned with the optical axis of the light source and has a light exit aperture open at an end in an axial direction and an opening which is open at another end and which faces the light source. An inner circumferential surface of the reflector expands toward the light exit aperture.
Light radially emitted from the light source reflects on the inner circumferential surface of the reflector and is focused into parallel light or the like, which is emitted from the light exit aperture.
PTL 1: Japanese Unexamined Patent Application Publication No. 2010-140674 (pages 5 to 11, FIG. 1)
PTL 2: Japanese Unexamined Patent Application Publication No. 2005-190859 (pages 4 to 9, FIG. 3)
PTL 3: Japanese Unexamined Patent Application Publication No. 2012-234650 (pages 4 to 13, FIG. 5)
In recent years, LEDs and the like used as light sources have been souped-up and therefore have been capable of being used in lighting devices for spot lighting or the like. In this field, there is a problem in that a ring-shaped region (yellow ring) with a strong yellow component is formed so as to surround an optical axis and is viewed as the color unevenness of illumination light. In particular, when an LED element includes a light source sealed with a sealing resin containing a phosphor, a yellow ring appears significantly.
It is an object of the present invention to provide a lighting reflector capable of reducing color unevenness and a lighting device including the lighting reflector. Furthermore, it is an object of the present invention to provide a production method for a lighting reflector capable of reducing color unevenness.
In order to achieve the above objects, the present invention provides a lighting reflector including a base member, made of metal, having an inner circumferential surface expanding toward a light exit aperture open at an end in an axial direction. A thin-film layer which is formed from a thin film containing ceramic and which scatters light is placed on an end portion of the inner circumferential surface that is on the opposite side to the light exit aperture.
According to the present invention, in the lighting reflector, a non-formation portion of the thin-film layer is placed on an end portion of the inner circumferential surface that is on the light exit aperture side.
According to the present invention, in the lighting reflector, the inner circumferential surface is formed into a paraboloid, the thin-film layer is formed in a ring-shaped region with an angle of 60° to 90° with respect to an axial direction from the focus of the paraboloid toward the light exit aperture, and the non-formation portion of the thin-film layer extends from the ring-shaped region to the light exit aperture.
According to the present invention, in the lighting reflector, the base member is cylinder-shaped and has an opening in an end portion that is on the opposite side to the light exit aperture.
According to the present invention, in the lighting reflector, the base member is cylinder-shaped and has an opening in an end portion that is on the opposite side to the light exit aperture, the thin-film layer is formed in a ring-shaped region with an angle of 60° to 90° with respect to an axial direction from the center of the opening toward the light exit aperture, and the non-formation portion of the thin-film layer extends from the ring-shaped region to the light exit aperture.
According to the present invention, in the lighting reflector, the thin-film layer is placed around the opening.
According to the present invention, in the lighting reflector, the area occupancy of the thin-film layer inside the ring-shaped region is greater than that of the thin-film layer outside the ring-shaped region.
According to the present invention, in the lighting reflector, the thickness of the thin-film layer outside the ring-shaped region is less than that of the thin-film layer inside the ring-shaped region.
According to the present invention, in the lighting reflector, the thin-film layer mainly contains ceramic and glass.
According to the present invention, in the lighting reflector, the base member is made of an aluminium-based material.
According to the present invention, in the lighting reflector, a protective layer made of an insulator for light-transmissive members or high-reflectivity members is placed so as to cover the inner circumferential surface except the thin-film layer.
According to the present invention, in the lighting reflector, a protective layer is placed so as to cover the inner circumferential surface except the thin-film layer, the base member is made of an aluminium-based material, and the protective layer is composed of an anodized film of the base member.
A lighting device according to the present invention includes the lighting reflector configured as described above and a light source placed on an end portion which is on an axis of the lighting reflector and which is on the opposite side to the light exit aperture.
A lighting device according to the present invention includes the lighting reflector configured as described above and a light source placed near the focus.
A lighting device according to the present invention includes the lighting reflector configured as described above and a light source placed near the center of the opening.
According to the present invention, in the lighting device, the light source includes a light-emitting element emitting light with a predetermined wavelength and a phosphor that excites and converts light emitted from the light-emitting elements into light with a wavelength different from the predetermined wavelength.
According to the present invention, in the lighting device, the light source has an input power of more than 10 W.
The present invention provides a production method for a lighting reflector including a base member, made of metal, having an inner circumferential surface expanding toward a light exit aperture open at an end in an axial direction. The method includes a thin-film layer-forming step of forming a thin-film layer which scatters light and which mainly contains glass and ceramic on an end portion of the inner circumferential surface that is on the opposite side to the light exit aperture. In the thin-film layer-forming step, the thin-film layer is formed in such a manner that a paint containing particles of ceramic and glass raw materials is applied to the inner circumferential surface and glass is synthesized from the glass raw materials by a sol-gel method.
The present invention provides a production method for a lighting reflector including a base member, made of metal, having an inner circumferential surface expanding toward a light exit aperture open at an end in an axial direction. The method includes a thin-film layer-forming step of forming a thin-film layer consisting of a thin film and scattering light on an end portion of the inner circumferential surface that is on the opposite side to the light exit aperture. In the thin-film layer-forming step, a thermosetting resin containing particles of ceramic is applied to the inner circumferential surface and is then cured.
According to the present invention, the production method for the lighting reflector further includes a protective layer-forming step of forming a protective layer covering a non-formation region of the thin-film layer on the inner circumferential surface. The base member mainly contains aluminium and in the protective layer-forming step, the protective layer is formed by anodizing the base member so as to be composed of an anodized film.
According to the present invention, in the production method for the lighting reflector, the protective layer-forming step is performed after the thin-film layer-forming step.
In accordance with a lighting reflector according to the present invention, a thin-film layer which contains ceramic and which scatters light is placed on an end portion of an inner circumferential surface of a base member made of metal, the end portion being on the opposite side to a light exit aperture. This enables the occurrence of a yellow ring of illumination light emitted from the light exit aperture to be suppressed, thereby enabling the color unevenness of illumination light to be reduced.
In accordance with a production method for a lighting reflector according to the present invention, a thin-film layer is formed in such a manner that a paint containing particles of ceramic and glass raw materials is applied to an inner circumferential surface of a base member and glass is synthesized from the glass raw materials by a sol-gel method. This enables the thin-film layer to be readily formed at low temperature such that the thin-film layer contains ceramic, thereby enabling the accuracy deterioration of the lighting reflector to be prevented.
In accordance with a production method for a lighting reflector according to the present invention, a thin-film layer is formed in such a manner that a thermosetting resin containing particles of ceramic is applied to an inner circumferential surface of a base member and is then cured. This enables the thin-film layer to be readily formed at low temperature such that the thin-film layer contains ceramic, thereby enabling the accuracy deterioration of the lighting reflector to be prevented and enabling costs to be reduced.
Embodiments of the present invention are described below with reference to the drawings.
The reflector 10 includes a base member 11 made of metal such as aluminium. The base member 11 includes an outer frame section 12 attached to the heat sink 2 and a light-reflecting section 13 placed inside the outer frame section 12. The bottom of the outer frame section 12 has an insertion hole 12a where the light source 3 is inserted. The light-reflecting section 13 is cylinder-shaped and has a light exit aperture 14 open at one end in a direction of a symmetry axis (axis C) and an opening 15 at the other end. The light source 3 is placed on the axis C so as to face the opening 15. Light emitted from the light source 3 reflects on the inner surface of the reflector 10 and illumination light is emitted from the light exit aperture 14.
A frame 8 is placed on the substrate 5 so as to surround the light-emitting elements 6. A sealing resin 7 is filled in the frame 8, whereby the light-emitting elements 6 are sealed. The sealing resin 7 contains a phosphor that excites and converts light emitted from the light-emitting elements 6 into light with a different wavelength. This allows the light source 3 to induce surface emission on the surface of the sealing resin 7.
The light source 3 is a high output (an input power of 10 W, 50 W, 100 W or more) depending on the integration of the light-emitting elements and is configured such that high-intensity light is emitted. Therefore, the light source 3 generates a large amount of heat; hence, high heat dissipation properties are ensured by the heat sink 2 (see
Blue LEDs, violet LEDs, ultraviolet LEDs, and/or the like can be used as the light-emitting elements 6. As the phosphor, a blue, green, yellow, orange, or red one or a combination of arbitrary phosphors can be used. This allows the light source 3 to emit light of a desired color. The phosphor may be omitted from the sealing resin 7. Three-color (blue, green, and red) light-emitting elements 6 having different emission wavelengths may be arranged on the substrate 5 without using the phosphor in the sealing resin 7.
The light source 3 is not limited to the above configuration.
Referring back to
A thin-film layer 17 is placed on a predetermined region of the inner circumferential surface 13a as described below in detail. A protective layer 19 made of an insulator is placed on a non-formation portion 18, in which the thin-film layer 17 is not formed, on the inner circumferential surface 13a.
The thin-film layer 17 is formed from a thin film containing ceramic and roughens the inner circumferential surface 13a to scatter light. This enables the color unevenness of illumination light emitted from the light exit aperture 14 to be reduced. Since ceramic has high electrostatic strength, the thin-film layer 17 is preferably formed around the opening 15 (the lower surface of the light-reflecting section 13). This enables shorting between the light source 3, which is close to the opening 15, and the reflector 10 to be prevented.
When the thickness of the thin-film layer 17 is, for example, about 10 μm, the thin-film layer 17 has the effect of reducing color unevenness. In order to enhance the effect of reducing color unevenness and in consideration of the mechanical strength of the thin-film layer 17, the thickness of the thin-film layer 17 is preferably about 50 μm to 500 μm. When the thickness of the thin-film layer 17 is more than 1 mm, the thin-film layer 17 is likely to be cracked. Therefore, the thickness thereof is preferably 1 mm or less.
The thin-film layer 17 is formed in a thin-film layer-forming step. The thin-film layer 17 can be formed in such a manner that, for example, a ceramic raw material is applied to the base member 11 and is then calcined at high temperature. Since the calcination temperature of ceramic is 1,200° C. to 1,400° C. in this operation, the base member 11 needs to be made of a refractory metal.
Therefore, in the thin-film layer-forming step, the thin-film layer 17 may be formed in such a manner that a ceramic paint containing particles of ceramic calcined at high temperature and a binder made of glass is applied to the base member 11 and is then calcined. This allows the calcination temperature of glass to be about 900° C.; hence, the base member 11, which has a low melting point, can be used. Since a glass component, as well as ceramic, has high electrostatic strength, the thin-film layer 17 can be formed without reducing insulating properties.
The binder made of glass is one obtained by combining particles of low-melting point glass with an organic binder. When the low-melting point glass is re-melted, the organic binder is evaporated due to high temperature and only a glassy layer containing ceramic particles remains. The low-melting point glass particles, which have a low melting point, need to be heated to a calcination temperature of 800° C. to 900° C. in order to re-melt the low-melting point glass particles. This calcination temperature exceeds 660° C., which is the melting point of aluminium. Therefore, the base member 11 may be made of an aluminium alloy material, prepared by adding an appropriate impurity to aluminium, having an increased melting point.
In the thin-film layer-forming step, the binder made of glass is preferably prepared by a sol-gel method. That is, the thin-film layer 17 is formed in such a manner that after a ceramic paint containing the ceramic particles calcined at high temperature and glass raw materials is applied to the base member 11, glass is synthesized from the glass raw materials by the sol-gel method.
This enables the binder made of glass to be prepared at 200° C. to 500° C. and therefore the base member 11, which has a low melting point, can be used. Thus, material options for the base member 11 can be expanded and the damage (for example, accuracy deterioration, oxidation, or the like) of the base member 11 due to heat can be reduced.
Since the melting point of aluminium is about 660° C., the thin-film layer 17 can be formed on the base member 11, which is made of an aluminium-based material mainly containing aluminium, by the sol-gel method in the above step. The aluminium-based material is inexpensive, is easy to process, is lightweight, and can be used to obtain high reflectivity and high heat dissipation. Thus, it is preferred that the aluminium-based material is used as the base member 11 and the thin-film layer 17 is formed by the sol-gel method in the above step.
The thickness of the thin-film layer 17, which contains the binder made of glass and ceramic, can be reduced to the diameter of particles of ceramic. If the size of the ceramic particles is adjusted to, for example, 10 μm or less, the thin-film layer 17 can be thinned to 10 μm. When the thin-film layer 17 contains a sufficient amount of the ceramic particles, light can be scattered on the thin-film layer 17 even if the thin-film layer 17 is thin.
The glass component, which is used as a binder, has heat resistance, light resistance, and electrostatic strength as is the case with ceramic and therefore is preferred as a reflective material for lighting devices. In particular, when the light source 3 has an input power of 10 W to 100 W or an input power of more than 100 W, the heat generation and light emission of the light source 3 cause severe conditions. Therefore, a stable material like glass is preferred.
For example, zirconia or the like with high light reflectivity is used as ceramic particles contained in the ceramic paint. Furthermore, silica may be mixed with some of the ceramic particles so as to act as a reinforcing agent for the thin-film layer 17, which is formed by calcining the ceramic paint.
The following materials can be used as ceramic particles with high light reflectivity: typical white inorganic materials, such as titanium oxide, alumina, magnesium oxide, zinc oxide, barium sulfate, zinc sulfate, magnesium carbonate, calcium carbonate, and wollastonite, other than zirconia. Aluminium nitride particles and the like may be used as ceramic materials with high thermal conductivity. Other ceramic materials with high reflectivity or thermal conductivity may be used. Particles of these ceramic materials may be appropriately selected and may be used in combination.
These ceramic materials are not limited to metal oxides and may be insulating materials reflecting light emitted from a light-emitting element. These ceramic materials include, for example, ceramics in a broad sense including aluminium nitride or the like, that is, general solid inorganic materials. Among these solid inorganic materials, an arbitrary material which is excellent in heat resistance, light resistance, light reflectivity, and light scattering can be used.
However, it is not appropriate to use a ceramic material absorbing light. For example, silicon nitride, silicon carbide, and the like are generally black and are inadequate as a material for the thin-film layer 17, which reflects light.
The thin-film layer-forming step, in which the sol-gel method is used, is further described in detail. In the thin-film layer-forming step, first, the ceramic paint containing the ceramic particles is applied to a predetermined portion of the inner circumferential surface 13a of the light-reflecting section 13, which is formed of the base member 11 made of metal, by spray painting or the like. Next, the thin-film layer 17 is formed by synthesizing glass by the sol-gel method.
The calcination temperature of the binder made of glass used in the sol-gel method is usually 200° C. to 500° C. It is effective that the calcination temperature thereof is 400° C. to 500° C. This enables the number of pores in a porous film produced in the form of glassy gel to be reduced, thereby enhancing insulating properties of the thin-film layer 17.
Therefore, it is preferred that the ceramic paint is applied to the inner circumferential surface 13a by spray painting using sol for synthesizing glass by the sol-gel method as a binder for zirconium particles and the binder is dried at 200° C. to 300° C. and is then calcined at 400° C. to 500° C. This enables the thin-film layer 17, which has high insulating properties, to be readily formed.
In the thin-film layer-forming step, the thin-film layer 17 may be formed in such a manner that a thermosetting resin containing the ceramic particles is applied to the base member 11, is dried, and is then cured. In order to prevent the thermosetting resin from being deteriorated with time or discolored due to the heat generated from the light source 3 or the irradiation of intense light such as blue light, the thermosetting resin used is one that has high heat resistance and high light resistance. An epoxy resin, a silicone resin, a polyimide resin, a fluorinated resin, or the like can be used as a thermosetting resin which is excellent in heat resistance and light resistance and which is highly transparent.
Although the thin-film layer 17 fixed on the base member 11 with the thermosetting resin is lower in long-term reliability as compared to the thin-film layer 17 fixed on the base member 11 with the binder made of glass, the thin-film layer 17 can be readily formed at low temperature. For example, the curing temperature of most of silicone resins is low, about 200° C. This enables the base member 11 to be prevented from being damaged by heat in manufacturing steps and also enables the cost of the reflector 10 to be reduced. Therefore, the reflector 10, which includes the thin-film layer 17 fixed with the thermosetting resin, can be used depending on purposes or applications.
In the thin-film layer-forming step, the thin-film layer 17 may be formed by another method. The thin-film layer 17 can be formed by, for example, thermal spraying, an AD method (aerosol deposition method), or the like. Thermal spraying and the AD method are used to form the thin-film layer 17 by ejecting the ceramic particles toward the base member 11 at high speed. Though there are a method for accelerating particles and various derived methods distinguished depending on the difference in size or temperature of particles used in addition to thermal spraying and the AD method, these methods are common in that the thin-film layer 17 is formed by ejecting the ceramic particles at high speed.
In order to increase the adhesion between the base member 11 and the thin-film layer 17, after a surface of the base member 11 is roughened by sandblasting as pretreatment, the ceramic particles may be ejected.
Furthermore, a buffer layer may be placed between the base member 11 and the thin-film layer 17 such that the delamination of the thin-film layer 17 due to thermal expansion or thermal contraction is prevented. A material with a linear expansion coefficient less than that of the base member 11 may be used as the buffer layer. More preferably, a material that is less in linear expansion coefficient than the base member 11 and that is greater in linear expansion coefficient than the thin-film layer 17 may be used as the buffer layer.
In particular, in the case where aluminium is used for the base member 11 and alumina is used for the thin-film layer 17, a NiAl alloy is preferably used as the buffer layer. When the weight percentage of Ni in the NiAl alloy is 90% or more, the buffer layer can be formed so as to have a linear expansion coefficient between that of aluminium and that of alumina. This enables the delamination of the thin-film layer 17 made of alumina to be prevented even if the base member 11 made of aluminium is expanded and contracted due to thermal history, because this influence is reduced by the buffer layer.
The buffer layer is not limited to metal materials including alloys and may be made of another material (for example, resin). That is, in consideration of the linear expansion coefficient of materials actually used for the base member 11 and the thin-film layer 17, a material with an appropriate linear expansion coefficient may be selected for the buffer layer as described above. The buffer layer is more preferably made of a material excellent in heat resistance and heat dissipation.
The protective layer 19 is placed in order to prevent a reduction in reflectivity or light-collecting performance due to the oxidation of the inner circumferential surface 13a of the base member 11 and in order to ensure electrostatic strength. Therefore, the protective layer 19 is formed using an insulator, having low gas permeability, for light-transmissive members or high-reflectivity members.
The protective layer 19 is formed in a protective layer-forming step. The protective layer 19 can be formed in such a manner that, for example, a paint containing a glass component is applied to the base member 11 and is then calcined such that the protective layer 19 is made of glass. Alternatively, in the protective layer-forming step, the protective layer 19 may be formed in such a manner that a transparent resin having low gas permeability, high light resistance and high heat resistance is applied thereto and is then cured.
When the base member 11 is made of the aluminium-based material, the protective layer 19 may be formed by anodizing the base member 11 in the protective layer-forming step so as to be composed of an anodized film. This enables the protective layer 19 to be formed such that the protective layer 19 is composed of the anodized film of aluminium, which is very hard, is excellent in durability.
Herein, the protective layer-forming step is preferably performed after the thin-film layer-forming step. In this manner, the thin-film layer 17 serves as a protective film during anodizing in the protective layer-forming step. This allows only the non-formation portion 18, which excludes the thin-film layer 17 on the inner circumferential surface 13a and where the aluminium-based material is exposed, to be covered with the protective layer 19, which is composed of the anodized film.
In the case where the thin-film layer-forming step is performed after the protective layer-forming step, the base member 11 needs to be partly anodized in the protective layer-forming step. Alternatively, after the whole of the base member 11 is anodized in the protective layer-forming step, the anodized film needs to be removed from a region for forming the thin-film layer 17. This increases man-hours needed for the protective layer-forming step. Therefore, the protective layer-forming step is performed after the thin-film layer-forming step, thereby enabling man-hours needed to manufacture the reflector 10 to be reduced.
The region for forming the thin-film layer 17 is described below.
4δz′=ρ′2 (1)
4z=ρ2 (2)
The thin-film layer 17 is formed on an end portion on the opposite side (opening 15 side) to the light exit aperture 14. In particular, the thin-film layer 17 is formed over the inside of a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the focus F of the paraboloid toward the light exit aperture 14. The axial length of the thin-film layer 17 is 2δ.
The whole of the inner circumferential surface 13a on the light exit aperture 14 side with respect to the thin-film layer 17 is the non-formation portion 18 in which the thin-film layer 17 is not formed. This allows the non-formation portion 18 to be placed on an end portion of the inner circumferential surface 13a that is on the light exit aperture 14 side. Herein, the area occupancy of the thin-film layer 17 outside the ring-shaped region D is 0% and the area occupancy of the thin-film layer 17 inside the ring-shaped region D is 100%.
Light-collecting performance can be enhanced in such a manner that the axial length of the light-reflecting section 13 is made sufficiently large with respect to the thin-film layer 17. Therefore, the axial length of the light-reflecting section 13 is preferably 4δ or more and more preferably 8δ or more. In this embodiment, the axial length of the light-reflecting section 13 is 15δ and the diameter of the light exit aperture 14 is 16δ.
The cause of the color unevenness of illumination light emitted from the reflector 10 is described below.
In
Referring to
This is because the influence that light emitted from the phosphor is not directional, whereas light emitted from an LED element is directional with respect to an optical axis, remains when light emerges from the sealing resin 7. Therefore, the directionality of light with a wavelength of 450 nm is slightly narrow, the directionality of light with a wavelength of 560 nm is slightly broad, and the difference therebetween is slight as shown in
The increase of the intensity ratio ly(θ)/lb(θ) corresponds to the fact that the proportion of a yellow light component increases at a high angle. That is, the color of light emitted from the light source 3 shifts to yellow at a high angle. This is the cause of color unevenness due to the light source 3.
As shown in
Light emitted from the point light source on the focus F is reflected by the inner circumferential surface 13a of the reflector 10 and is thereby converted into parallel rays. In the case where this light is projected on a plane perpendicular to a z-axis, formula (3) is derived, where the luminous intensity per unit area on the radius ρ is Iring(ρ). Formula (4) holds between the radius ρ and the angle θ.
Iring(ρ)·2πρdρ=−I(θ)·2π sin θdθ (3)
ρ/2=cot(θ/2) (4)
From formulas (3) and (4), Iring(ρ) and I(θ) have a relationship given by formula (5).
The luminous intensity Iring-b(ρ) of light with a wavelength of 450 nm and the luminous intensity Iring-y(ρ) of light with a wavelength of 560 nm on a plane perpendicular to the z-axis are derived in such a manner that each of the emission intensities lb(θ) and ly(θ) shown in
The color shift is described below in detail. The half width at half maximum (HWHM) of a light source which has such ideal Lambertian light distribution characteristics that the emission intensity corresponding to
That is, light emitted from the light source at an angle θ of about 70.5° reflects on the inner circumferential surface 13a given by formula (2) to forms an ring-shaped region with the highest luminous intensity at a position given by ρ=2√2.
The luminous intensity per unit solid angle of the light source having the ideal Lambertian light distribution characteristics (light distribution: cos θ) is ⅓ at θ≈70.5° with respect to an axial direction (θ=0°). However, as light is emitted to a region where the angle θ is larger, closer to 90° (a direction perpendicular to the z-axis), light is collected at a position closer to a center in a radial direction after being reflected by the inner circumferential surface 13a. Therefore, in the luminous intensity per unit area on a plane perpendicular to the z-axis, the line profile of the luminous intensity takes an extremum (herein, a maximum) at θ≈70.5° (ρ=2√2≈2.8), which is not close to θ=0° (ρ=∞) but is close to θ=90° (ρ=2).
Likewise, the line profile of each of the luminous intensities Iring-b(ρ) and Iring-y(ρ) with respect to the light source with the emission intensities lb(θ) and ly(θ) takes a maximum near ρ=2√2≈2.8 (θ≈70.5°).
The half width at half maximum of the emission intensity lb(θ) and that of the emission intensity ly(θ) are slightly wider as compared to the case of Lambertian and are about 62° and about 64°, respectively. Therefore, the radius ρ at which the luminous intensities Iring-b(ρ) and Iring-y(ρ) take a maximum approaches the z-axis, resulting in that ρ≈2.7 (θ≈73°) and ρ≈2.6 (θ≈76°).
The emission intensities lb(θ) and ly(θ) of the light distribution characteristics shown in the orthogonal coordinates in
Herein, the intensity ratio Iring-y(ρ)/Iring-b(ρ) is 1 when ρ=2√3 (θ=60°). In the range where ρ is 2√3 to 2 (θ is 60° to 90°), the intensity ratio Iring-y(ρ)/Iring-b(ρ) sharply increases from 1 to 2 and significantly shifts to a yellow side.
The line profile of each of the luminous intensities Iring-b(ρ) and Iring-y(ρ) peaks near substantially an intermediate (ρ=2.6, θ=75°) of a region shifted from the reference value to a yellow side. Therefore, a yellow region represented by the intensity ratio Iring-y(ρ)/Iring-b(ρ) overlaps a light region. As a result, the following ring is viewed: a yellow ring in which light with a strong yellow component is collected in a region where ρ is 2√3 to 2 (θ is 60° to 90°, z is 3 to 1) around an optical axis.
On the other hand, in a region which is located outside the yellow ring and in which ρ is 2√3 to ∞ (θ is 60° to 0°), the intensity ratio Iring-y(ρ)/Iring-b(ρ) is less than 1 and slightly shifts to a blue side. The line profiles of the luminous intensities Iring-b(ρ) and Iring-y(ρ) monotonically decrease.
The above shows an ideal case where the point light source is placed on the focus F of the inner circumferential surface 13a, which is parabolic, for clear understanding. In practice, the light source 3 has a limited spread and there are the case where the light source 3 is misaligned with the focus F and the case where the shape of the inner circumferential surface 13a deviates from a parabola depending on the processing accuracy of the reflector 10. However, these cases are approximated to an ideal state and a yellow ring is caused by a similar factor.
The yellow ring with respect to the light source including the blue LEDS and the yellow phosphor has been described. In another light source, a yellow ring is similarly caused when light distribution characteristics of yellow light have a spread with respect to light distribution characteristics of blue light as shown in
In another light source, there is the case where light distribution characteristics of blue light have a spread with respect to light distribution characteristics of yellow light. In this case, a blue ring in which blue light is conspicuous is caused by a similar factor and therefore the color unevenness of illumination light is caused.
In this embodiment, the thin-film layer 17 is placed on the inner circumferential surface 13a of the light-reflecting section 13 of the reflector 10 as shown in
Therefore, reflected light which is the cause of a yellow ring and in which the angle θ is within the range of 60° to 90° is scattered by the thin-film layer 17. This allows light distribution characteristics of light with different wavelengths to be close to each other suppress the color shift of illumination light to a yellow side and enables the peak of the luminous intensity in this range to be reduced. Thus, the occurrence of the yellow ring can be suppressed.
According to this embodiment, the inner circumferential surface 13a of the light-reflecting section 13 made of metal is formed of the paraboloid and the thin-film layer 17, which scatters light, is placed on the inner circumferential surface 13a. The thin-film layer 17 is formed over the ring-shaped region D, which has an angle θ of 60° to 90° with respect to a symmetry axis (z-axis) in a direction from the focus F of the paraboloid toward the light exit aperture 14. Herein, the axial length of the ring-shaped region D is 2δ, where δ is the distance from the focus F to the vertex of the paraboloid, which forms the inner circumferential surface 13a.
This enables the occurrence of a yellow ring of illumination light emitted from the light exit aperture 14 to be suppressed when the light source 3 is placed near the focus F, thereby enabling the color unevenness of illumination light to be reduced.
The thin-film layer 17 contains ceramic and therefore can be increased in reflectivity, thereby enabling light absorption loss due to the thin-film layer 17 to be suppressed. In addition, since ceramic is excellent in heat resistance and light resistance, the reflector 10, which includes the thin-film layer 17, can be used under severe conditions due to heat and light generated from the light source 3, which has high power.
The non-formation portion 18, in which the thin-film layer 17 is not formed, is placed on the inner circumferential surface 13a of the light-reflecting section 13 so as to extend entirely from the ring-shaped region D, in which the thin-film layer 17 is placed, to the light exit aperture 14. This allows the absorption loss of light reflected on the non-formation portion 18 to be reduced, thereby enabling the light-collecting performance of the reflector 10 to be enhanced.
Since ceramic has high electrostatic strength, forming the thin-film layer 17 around the opening 15 enables shorting between the light source 3, which is close to the opening 15, and the reflector 10 to be prevented.
When the thickness of the thin-film layer 17 is 10 μm or more, the color unevenness of illumination light can be reliably reduced.
When the thin-film layer 17 contains a glass binder and ceramic and glass are main components of the thin-film layer 17, the thin-film layer 17 can be formed at low temperature and the base member 11, which has a low melting point, can be used.
Applying the ceramic paint containing the ceramic particles and the glass raw materials to the base member 11 and synthesizing glass by the sol-gel method enable the thin-film layer 17 to be formed at lower temperature. Thus, the damage, such as accuracy deterioration, oxidation, or the like, of the reflector 10 due to heat can be reduced. The base member 11 of the reflector 10 can be formed using the aluminium-based material, which is inexpensive and is easy to process. Thus, costs for the reflector 10 and the lighting device 1 can be reduced.
In the case where the thin-film layer 17 is formed in such a manner that the thermosetting resin containing the ceramic particles is applied to the base member 11, is dried, and is then cured, the damage of the reflector 10 due to heat can be reduced and costs for the reflector 10 and the lighting device 1 can be further reduced.
The protective layer 19, which is made of the insulator for light-transmissive members or high-reflectivity members, is placed so as to cover the inner circumferential surface 13a except the thin-film layer 17. Therefore, the reduction in reflectivity or light-collecting performance of the inner circumferential surface 13a due to oxidation can be prevented and the electrostatic strength of the reflector 10 can be ensured.
In the case where the anodized film, which is obtained by anodizing the base member 11 made of the aluminium-based material, is used to form the protective layer 19, the protective layer 19 can be formed so as to be hard and excellent in durability. In this case, forming the protective layer 19 after the formation of the thin-film layer 17 enables man-hours needed to manufacture the reflector 10 to be reduced.
The thin-film layer 17 is formed over the whole part of the inside of a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the focus F of the paraboloid, which forms the inner circumferential surface 13a, toward a light exit aperture 14. The thin-film layer 17 extends from the ring-shaped region D toward the light exit aperture 14 by the distance E.
The whole of the inner circumferential surface 13a on the light exit aperture 14 side with respect to the thin-film layer 17 is a non-formation portion 18 in which the thin-film layer 17 is not formed. This allows the non-formation portion 18 to be placed on an end portion of the inner circumferential surface 13a that is on the light exit aperture 14 side. A protective layer 19 (see
This enables the color unevenness of illumination light emitted from the light exit aperture 14 to be reduced, as is the case with in the first embodiment. Since the thin-film layer 17 extends outside the ring-shaped region D, the diameter of a spot of illumination light emitted from the light exit aperture 14 can be made large, although the light-collecting performance of a reflector 10 is lower than that described in the first embodiment.
Since the area occupancy of the thin-film layer 17 inside the ring-shaped region D is greater than that of the thin-film layer 17 outside the ring-shaped region D, the reduction of light-collecting performance is reduced and the color unevenness of illumination light can be reduced.
The thickness of the thin-film layer 17 outside the ring-shaped region D may be less than that of the thin-film layer 17 inside the ring-shaped region D. This enables light absorption loss due to the thin-film layer 17 outside the ring-shaped region D to be suppressed, thereby enabling the reduction in light-collecting performance of the reflector 10 to be suppressed.
The thin-film layer 17 is formed in a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the focus F of the paraboloid, which forms the inner circumferential surface 13a, toward a light exit aperture 14. The thin-film layer 17 extends from the ring-shaped region D toward the light exit aperture 14 by the distance E. Furthermore, a plurality of thin-film layers 17 are formed in the form of strips arranged in an axial direction.
The whole of the inner circumferential surface 13a on the light exit aperture 14 side with respect to the thin-film layers 17 and portions between the thin-film layers 17 are non-formation portions 18 in which the thin-film layer 17 is not formed. A protective layer 19 (see
This enables the color unevenness of illumination light to be reduced, as is the case with in the first embodiment. Since the thin-film layer 17 extends outside the ring-shaped region D, the diameter of a spot of illumination light emitted from the light exit aperture 14 can be made large.
Since the area occupancy of the thin-film layers 17 inside the ring-shaped region D is greater than that of the thin-film layers 17 outside the ring-shaped region D, the reduction of light-collecting performance is reduced and the color unevenness of illumination light can be reduced.
The thin-film layers 17 may be formed only inside the ring-shaped region D so as to have a strip shape. The area occupancy of the thin-film layers 17 outside the ring-shaped region D may be 0%. The thickness of the thin-film layers 17 outside the ring-shaped region D may be less than that of the thin-film layers 17 inside the ring-shaped region D.
The thin-film layer 17 is formed in a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the focus F of the paraboloid, which forms the inner circumferential surface 13a, toward a light exit aperture 14. The thin-film layer 17 extends from the ring-shaped region D toward the light exit aperture 14 by the distance ε. Furthermore, a plurality of thin-film layers 17 are formed in the form of strips arranged in a circumferential direction.
The whole of the inner circumferential surface 13a on the light exit aperture 14 side with respect to the thin-film layers 17 and portions between the thin-film layers 17 are non-formation portions 18 in which the thin-film layer 17 is not formed. This allows the non-formation portions 18 to be placed on an end portion of the inner circumferential surface 13a that is on the light exit aperture 14 side. A protective layer 19 (see
This enables the color unevenness of illumination light to be reduced, as is the case with in the first embodiment. Since the thin-film layer 17 extends outside the ring-shaped region D, the diameter of a spot of illumination light emitted from the light exit aperture 14 can be made large.
Since the area occupancy of the thin-film layers 17 inside the ring-shaped region D is greater than that of the thin-film layers 17 outside the ring-shaped region D, the reduction of light-collecting performance is reduced and the color unevenness of illumination light can be reduced.
The thin-film layers 17 may be formed only inside the ring-shaped region D so as to have a strip shape. The area occupancy of the thin-film layers 17 outside the ring-shaped region D may be 0%. The thickness of the thin-film layers 17 outside the ring-shaped region D may be less than that of the thin-film layers 17 inside the ring-shaped region D.
The thin-film layer 17 is formed in a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the focus F of the paraboloid, which forms the inner circumferential surface 13a, toward a light exit aperture 14. The thin-film layer 17 extends from the ring-shaped region D toward the light exit aperture 14 by the distance ε. Furthermore, a plurality of thin-film layers 17 are formed in the form of dots.
The whole of the inner circumferential surface 13a on the light exit aperture 14 side with respect to the thin-film layers 17 and portions between the thin-film layers 17 are non-formation portions 18 in which the thin-film layer 17 is not formed. This allows the non-formation portions 18 to be placed on an end portion of the inner circumferential surface 13a that is on the light exit aperture 14 side. A protective layer 19 (see
This enables the color unevenness of illumination light to be reduced, as is the case with in the first embodiment. Since the thin-film layer 17 extends outside the ring-shaped region D, the diameter of a spot of illumination light emitted from the light exit aperture 14 can be made large.
Since the area occupancy of the thin-film layers 17 inside the ring-shaped region D is greater than that of the thin-film layers 17 outside the ring-shaped region D, the reduction of light-collecting performance is reduced and the color unevenness of illumination light can be reduced.
The thin-film layers 17 may be formed only inside the ring-shaped region D so as to have a dot shape. The area occupancy of the thin-film layers 17 outside the ring-shaped region D may be 0%. The thickness of the thin-film layers 17 outside the ring-shaped region D may be less than that of the thin-film layers 17 inside the ring-shaped region D.
The thin-film layer 17 is formed over the inner circumferential surface 13a including a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the focus F of the paraboloid, which forms the inner circumferential surface 13a, toward a light exit aperture 14. Herein, the area occupancy of the thin-film layer 17 outside the ring-shaped region D is 100% and the area occupancy of the thin-film layer 17 inside the ring-shaped region D is 100%.
This enables the color unevenness of illumination light to be reduced, as is the case with in the first embodiment. The thin-film layer 17 extends outside the ring-shaped region D and therefore the diameter of a spot of illumination light emitted from the light exit aperture 14 can be made large. The thickness of the thin-film layer 17 outside the ring-shaped region D may be less than that of the thin-film layer 17 inside the ring-shaped region D.
In the first to sixth embodiments, the focus F of the paraboloid, which forms the inner circumferential surface 13a of the light-reflecting section 13 of the reflector 10, is placed on the opening 15. The focus F of the paraboloid may be placed at a position displaced from the opening 15 in an axial direction. In this case, a similar effect can be obtained in such a manner that the thin-film layer 17 is provided in the ring-shaped region D, which has an angle θ of 60° to 90° with respect to the axial direction from the focus F toward the light exit aperture 14. That is, the color unevenness of illumination light can be reduced in such a manner that the thin-film layer 17 is provided on an end portion on the opposite side (opening 15 side) to the light exit aperture 14.
A non-formation portion 18 of the thin-film layer 17 may be provided in a region opposite to the light exit aperture 14 with respect to the ring-shaped region D. Shorting between the reflector 10 and a light source 3 can be prevented by providing a protective layer 19 around the opening 15.
In the case where heat dissipation of the light source 3 can be ensured, the inner circumferential surface 13a may be formed so as to have a portion which is on the opposite side to the light exit aperture 14 and which has a closed shape and the light source 3 may be provided inside the light-reflecting section 13 so as to be close to the focus F.
The light-reflecting section 13 is cylinder-shaped and has a light exit aperture 14 at one end in a direction of a symmetry axis (axis C) and an opening 15 at the other end. The inner circumferential surface 13a of the light-reflecting section 13 is a conical surface obtained by rotating a straight line around the axis C. A light source 3 (see
A thin-film layer 17 is formed over the inside of a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the center of the opening 15 toward a light exit aperture 14. Herein, the area occupancy of the thin-film layer 17 outside the ring-shaped region D is 0% and the area occupancy of the thin-film layer 17 inside the ring-shaped region D is 100%.
In an end portion of the light-reflecting section 13 that is on the opening 15 side, the shape of the inner circumferential surface 13a can be approximated by a paraboloid (drawn with a broken line in
Therefore, reflected light which is the cause of a yellow ring and in which the angle θ is within the range of 60° to 90° is scattered by the thin-film layer 17, as is the case with the inner circumferential surface 13a, which is parabolic, described in the first embodiment. Thus, the color unevenness of illumination light can be reduced.
In this embodiment, as well as the second to sixth embodiments, the thin-film layer 17 may extend from the ring-shaped region D toward the light exit aperture 14 or non-formation portions 18 may be placed between a plurality of thin-film layers 17.
The light-reflecting section 13 is cylinder-shaped and has a light exit aperture 14 at one end in a direction of a symmetry axis (axis C) and an opening 15 at the other end. The inner circumferential surface 13a of the light-reflecting section 13 is formed so as to have a shape made by connecting a plurality of conical surfaces obtained by rotating straight lines around the axis C. A light source 3 (see
A thin-film layer 17 is formed over the whole part of the inside of a ring-shaped region D with an angle θ of 60° to 90° with respect to an axial direction from the center of the opening 15 toward a light exit aperture 14.
In an end portion of the light-reflecting section 13 that is on the opening 15 side, the shape of the inner circumferential surface 13a can be approximated by a paraboloid (drawn with a broken line in
Since the inner circumferential surface 13a is formed of a plurality of conical surfaces, the shape of the inner circumferential surface 13a can be made closer to a paraboloid than that described in the seventh embodiment and the light-collecting performance thereof can be enhanced.
In this embodiment, as well as the second to sixth embodiments, the thin-film layer 17 may extend from the ring-shaped region D toward the light exit aperture 14 or non-formation portions 18 may be placed between a plurality of thin-film layers 17.
The inner circumferential surface 13a of the light-reflecting section 13 is formed so as to have a shape made by connecting a plurality of prismoids in an axial direction. The inner circumferential surface 13a has a cross-sectional shape which includes a symmetry axis (axis C) and which is identical to that described in the eighth embodiment. This enables an effect similar to that described in the eighth embodiment to be obtained.
Since the inner circumferential surface 13a is formed of a plurality of prismoids, the cross-sectional shape of the inner circumferential surface 13a can be made closer to a paraboloid than that described in the seventh embodiment and the light-collecting performance thereof can be enhanced.
In this embodiment, as well as the second to sixth embodiments, a thin-film layer 17 may extend from a ring-shaped region D toward a light exit aperture 14 or non-formation portions 18 may be placed between a plurality of thin-film layers 17.
In the seventh to ninth embodiments, the origin of the angle θ representing the range of the ring-shaped region D coincides with the center of the opening 15 of the light-reflecting section 13. The origin of the angle θ representing the range of the ring-shaped region D may coincide with a position displaced from the center of the opening 15 toward the light exit aperture 14 in an axial direction. This enables a similar effect to be obtained by placing a light source 3 near the origin thereof. That is, the color unevenness of illumination light can be reduced in such a manner that the thin-film layer 17 is provided on an end portion on the opposite side (opening 15 side) to the light exit aperture 14.
The present invention can be applied to lighting devices such as high-place lighting in buildings (such as factories, sports facilities, halls, and theaters), large-size lighting for event sites or the like, display lighting for shops or the like, night-time streetlights, spot lights for signboards, lighting-up illuminations for structures or buildings, guide lights for airports or the like, flashlights, and handy spot lights.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2013-158136 | Jul 2013 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2014/068252 | 7/9/2014 | WO | 00 |
