Claims
- 1. A method of fabricating a liquid crystal display device, comprising the steps of:
forming a gate electrode on a transparent substrate; forming a gate insulating film, an active layer and an ohmic contact layer on the transparent substrate to cover the gate electrode; forming a source electrode and a drain electrode on the ohmic contact layer and patterning the drain electrode to form an L-shaped portion and a plurality of protrusions; forming a protective layer on the source and drain electrodes such that side surfaces of the protective layer, the drain electrode, the ohmic contact layer and the active layer are exposed; and forming a pixel electrode on the protective layer to electrically contact the side surface of the drain electrode.
- 2. The method of fabricating a liquid crystal display device according to claim 1, wherein the source electrode is U-shaped.
- 3. The method of fabricating a liquid crystal display device according to claim 1, wherein the source electrode surrounds a portion of the drain electrode at three sides.
- 4. The method of fabricating a liquid crystal display device according to claim 1, wherein the plurality of protrusions overlap the pixel electrode.
- 5. The method of fabricating a liquid crystal display device according to claim 1, wherein the pixel electrode is disposed on the gate insulating film.
- 6. The method of fabricating a liquid crystal display device according to claim 1, wherein the pixel electrode electrically contacts side surfaces of the ohmic contact layer and the active layer.
- 7. The method of fabricating a liquid crystal display device according to claim 6, wherein the electrical contacts of the pixel electrode with the side surfaces of the drain electrode, ohmic contact layer, and active layer are along a plane.
- 8. The method of fabricating a liquid crystal display device according to claim 1, wherein the ohmic contact layer includes one of amorphous silicon and polycrystalline silicon.
- 9. The method of fabricating a liquid crystal display device according to claim 1, wherein the pixel electrode includes one of indium-tin-oxide (ITO), tin-oxide (TO), indium-zinc-oxide (ITO), and indium-tin-zinc-oxide (ITZO).
- 10. The method of fabricating a liquid crystal display device according to claim 1, wherein the protective layer covers side surfaces of the source electrode and the drain electrode.
Priority Claims (1)
Number |
Date |
Country |
Kind |
P2000-45944 |
Aug 2000 |
KR |
|
Parent Case Info
[0001] The present application is a divisional application of U.S. application Ser. No. 09/923,324 filed Aug. 8, 2001, which is hereby incorporated by reference. The present application also claims the benefit of Korean Patent Application No. P2000-45944 filed on Aug. 8, 2000 in Korea, which is hereby incorporated by reference.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09923324 |
Aug 2001 |
US |
Child |
10634863 |
Aug 2003 |
US |