The present application claims priority from Japanese application serial No. 2008-215463, filed on Aug. 28, 2008, the content of which is hereby incorporated by reference into this application.
1. Field of the Invention
The present invention relates to a display device, and more particularly to a liquid crystal display device which suppresses the generation of irregularities in a display region when a sealing material is formed by printing.
2. Description of Related Art
In a liquid crystal display device, a TFT substrate which mounts pixel electrodes, thin film transistors (TFT) and the like thereon in a matrix array and a counter substrate which mounts color filters and the like at positions thereof corresponding to the pixel electrodes on the TFT substrate are arranged to face each other, and liquid crystal is sandwiched between the TFT substrate and the counter substrate. An image is formed by controlling optical transmissivity of liquid crystal molecules for every pixel.
The TFT substrate and the counter substrate are adhered to each other by way of a sealing material which is formed on a periphery of the counter substrate. As a method for forming the sealing material on the counter substrate, there has been known a method which uses a dispenser. If the sealing material can be formed by screen printing in place of the dispenser, the productivity of the liquid crystal display device can be enhanced.
However, in forming the sealing material by screen printing, it is necessary to bring a printing mask into contact with the counter substrate. Then, a paste which constitutes the sealing material is applied to the counter substrate from above the printing mask using a squeeze. The printing mask is formed of meshes, and the meshes have the uneven surface. On the other hand, color filters and the like are formed on the counter substrate, an alignment film for aligning liquid crystal is formed on the color filters and the like, and the alignment of liquid crystal is determined by rubbing the alignment film in the particular direction.
In JP-A-5-100233 (patent document 1), there is the description that in forming a sealing material by printing, the degree of occurrence of contrast irregularities differs depending on the operational direction of a squeeze and the direction of rubbing.
In forming the sealing material by screen printing, to reduce the influence of meshes of the printing mask, there has been proposed a means which increases the number of meshes and decreases a diameter of each line. However, such a means cannot sufficiently reduce the influence of meshes of the printing mask. Further, there has been also proposed a means which applies a so-called calendar treatment for leveling a surface of meshes by applying pressure to the surface of the meshes. However, this means also cannot sufficiently reduce the influence of meshes of the printing mask. When a suspended metal is used for forming a printing mask in place of printing meshes, surface irregularities are eliminated from the printing mask and hence, the generation of mesh irregularities is also eliminated. However, the application of the suspend metal to a large-sized substrate is difficult.
With respect to the technique described in patent document 1, there is the description that contrast irregularities can be eliminated by setting the alignment direction of the counter substrate and the operational direction of a squeeze in screen printing within a particular range. Patent document 1 describes that contrast irregularities can be eliminated by setting an angle made by the rubbing direction and the operational direction of the squeeze (the direction of squeezing) to 60 degrees or more.
However, the technique described in patent document 1 cannot acquire a sufficient mesh influence reducing effect particularly when the liquid crystal display device is an IPS (In Plane Switching) type liquid crystal display device. In the IPS-type liquid crystal display device, a pretilt angle of liquid crystal is set to 2.5 degrees or less. In this manner, the IPS-type liquid crystal display device has the different constitution compared to a conventional TN (Twisted Nematic) type liquid crystal display device or the like and hence, it is considered that a phenomenon which differs from a phenomenon which occurs when a printing step is applied to the conventional liquid crystal display device arises.
It is an object of the present invention to eliminate mesh irregularities when a sealing material is formed by screen printing which uses a printing mask formed of meshes in case of the IPS-type liquid crystal display device.
To overcome the above-mentioned drawbacks, the present invention adopts the following specific means.
(1) According to one aspect of the present invention, there is provided a liquid crystal display device which includes: a TFT substrate on which pixels each of which includes a pixel electrode and a TFT are formed in a matrix array, the pixels being covered with a TFT-substrate-side alignment film; a counter substrate on which the color filters are formed, the color filters being covered with a counter-substrate-side alignment film; liquid crystal which is sandwiched between the TFT-substrate-side substrate alignment film and the counter-substrate-side alignment film; and a sealing material which is formed on a periphery of the counter substrate for adhering the TFT substrate and the counter substrate to each other, wherein rubbing treatment having the rubbing direction is applied to the counter-substrate-side alignment film formed on the counter substrate, and a pretilt angle imparted to liquid crystal molecules by the rubbing treatment is set to 2.5 degrees or less, and
the sealing material is formed by screen printing, and an angle made by the squeezing direction in the screen printing and the rubbing direction falls within a range from 165 degrees to 195 degrees.
(2) In the liquid crystal display device having the constitution (1), an angle made by the rubbing direction and the squeezing direction is set to a value which falls within a range from 170 degrees to 190 degrees.
(3) In the liquid crystal display device having the constitution (1), the pretilt angle imparted to the liquid crystal molecules by rubbing is 2.0 degrees or less.
(4) According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device which includes: a TFT substrate on which pixels each of which includes a pixel electrode and a TFT are formed in a matrix array, the pixels being covered with a TFT-substrate-side alignment film; a counter substrate on which the color filters are formed, the color filters being covered with a counter-substrate-side alignment film; liquid crystal which is sandwiched between the TFT-substrate-side substrate alignment film and the counter-substrate-side alignment film; and a sealing material which is formed on a periphery of the counter substrate for adhering the TFT substrate and the counter substrate to each other, the method including the steps of: applying rubbing treatment to the counter-substrate-side alignment film formed on the counter substrate such that a pretilt angle imparted to liquid crystal molecules becomes 2.5 degrees or less; and forming the sealing material on the counter substrate by screen printing such that an angle made by the rubbing direction in the rubbing treatment and the squeezing direction in the screen printing falls within a range from 165 degrees to 195 degrees.
(5) In the method of manufacturing a liquid crystal display device having the above-mentioned constitution (4), the sealing material is formed on the counter substrate by screen printing such that an angle made by the rubbing direction and the squeezing direction falls within a range from 170 degrees to 190 degrees.
(6) In the method of manufacturing a liquid crystal display device having the above-mentioned constitution (4), the rubbing treatment is applied such that the pretilt angle becomes 2.0 degrees or less.
According to the present invention, in the IPS-type liquid crystal display device, it is possible to form the sealing material which adheres the TFT substrate and the counter substrate to each other by screen printing and hence, a time for performing a step for forming the sealing material can be largely shortened. Further, according to the present invention, by determining the rubbing direction with respect to the alignment film formed on the counter substrate and the squeezing direction in screen printing for forming the sealing material, it is possible to prevent mesh mark irregularities attributed to printing meshes used in screen printing.
The present invention is explained in detail in conjunction with embodiments hereinafter.
In
In
The liquid crystal display device shown in
In
In
In the liquid crystal display device, to impart initial alignment to liquid crystal, an alignment film is formed on the TFT substrate 100 and the counter substrate 200 and, then, the alignment film is rubbed in the particular direction so as to decide the direction of the initial alignment. Although an angle of liquid crystal molecules on the alignment film, that is, a so-called pretilt angle of the liquid crystal molecules is set at the time of performing a rubbing treatment, when the liquid crystal display device is an IPS-type liquid crystal display device, it is necessary to set the pretilt angle small compared to an ordinary liquid crystal display device. That is, it is necessary to set the pretilt angle to 2.5 degrees or less, for example. When the pretilt angle is small in this manner, the influence attributed to the contacting of a printing mask in screen printing is increased.
A gate insulation film 102 made of SiN is formed on the TFT substrate 100 in a state that the gate insulation film 102 covers the gate electrodes 101. A semiconductor layer 103 made of a-Si is formed on the gate insulation film 102 at a position where the semiconductor layer 103 faces the gate electrode 101 in an opposed manner. The a-Si films are formed by plasma CVD. The a-Si film constitutes a channel portion of the TFT, and a source electrode 104 and a drain electrode 105 are formed on the a-Si film with the channel portion sandwiched therebetween. Here, an n+Si layer not shown in the drawing is formed between the a-Si film and the source electrode 104 or between the a-Si film and the drain electrode 105 for establishing an ohmic contact between the semiconductor layer and the source electrode 104 or the drain electrode 105.
The video signal line also functions as the source electrode 104, and the drain electrode 105 is connected to a pixel electrode 110. Both the source electrodes 104 and the drain electrodes 105 are simultaneously formed on the same layer. In this embodiment, the source electrodes 104 or the drain electrodes 105 are made of a MoCr alloy. When it is necessary to decrease electric resistance of the source electrode 104 or the drain electrode 105, for example, the electrode structure where an AlNd alloy layer is sandwiched between MoCr alloy layers is used.
An inorganic passivation film 106 made of SiN is formed on the TFT substrate 100 in a state that the inorganic passivation film 106 covers the TFTs. The inorganic passivation film 106 is provided for protecting the TFTs, particularly, the channel portions of the TFTs from impurities. An organic passivation film 107 is formed on the inorganic passivation film 106. The organic passivation film 107 plays a role of leveling a surface of the TFT as well as a role of protecting the TFT and hence, the organic passivation film 107 has a large thickness. That is, the thickness of the organic passivation film 107 is set to 1 μm to 4 μm.
The organic passivation film 107 is formed using a photosensitive acrylic resin, a silicon resin, a polyimide resin or the like. It is necessary to form through holes in the organic passivation film 107 at positions where the pixel electrodes 110 and the drain electrodes 105 are connected with each other. Since the organic passivation film 107 is a photosensitive film, the through holes can be formed by exposing and developing the organic passivation film 107 per se without using a photoresist.
The counter electrode 108 is formed on the organic passivation film 107. The counter electrode 108 is formed by sputtering ITO (Indium Tin Oxide) for forming a transparent conductive film on the whole display region. That is, the counter electrode 108 is formed into a planar shape. After forming the counter electrode 108 on the whole surface of the display region by sputtering, only through hole portions by which the pixel electrodes 110 and the drain electrodes 105 are made conductive with each other are formed by removing by etching the counter electrode 108.
An upper insulation film 109 made of SiN is formed on the TFT substrate 100 in a state that the upper insulation film covers the counter electrode 108. After the upper insulation film 109 is formed, through holes are formed in the upper insulation film 109 by etching. Through holes 111 are formed by etching the inorganic passivation film 106 using the upper insulation film 109 as a resist. Thereafter, an ITO film which is provided for forming the pixel electrodes 110 is formed on the TFT substrate 100 by sputtering in a state that the ITO film covers the upper insulation film 109 and the through holes 111. The pixel electrodes 110 are formed by patterning the ITO film formed by sputtering. The ITO film which is provided for forming the pixel electrodes 110 is also coated on the through holes 111. The drain electrode 105 which extends from the TFT and the pixel electrode 110 become conductive with each other via the through hole 111 so that a video signal is supplied to the pixel electrode 110.
The pixel electrode 110 is formed of comb-teeth-shaped electrodes with both ends thereof closed. A slit 112 is formed between the comb-teeth-shaped electrode and the comb-teeth-shaped electrode. A fixed voltage is applied to the counter electrode 108, and a voltage corresponding to the video signal is applied to the pixel electrode 110. When a voltage is applied to the pixel electrode 110, as shown in
In an example shown in
In
An overcoat film 203 is formed in a state that the overcoat film 203 covers the color filters 201 and the light blocking films 202. The overcoat film 203 has two functions, that is, a function of preventing color filter materials from contaminating the liquid crystal layer and a function of alleviating excessive surface irregularities of the color filter surfaces. An alignment film 113 which determines the initial alignment of liquid crystal is formed on the overcoat film 203. There may a case that the overcoat film 203 is not used.
As shown in
The sealing material 20 which adheres the counter substrate 200 and the TFT substrate 100 to each other is generally formed on the counter substrate 200. Further, at a point of time that the sealing material 20 is formed, as shown in
A printing paste 500 which becomes the sealing material 20 is placed on the printing mask 410. The printing paste 500 which becomes the sealing material 20 is made of a thermosetting epoxy resin. When a squeezee 430 is moved in a state where pressure is applied to the printing mask 410 by the squeezee from above, the printing paste 500 is extruded. Due to the extrusion of the printing paste 500, the sealing material 20 is printed on the mother substrate in accordance with a pattern of the printing mask 410. Hereinafter, this operation is referred to as squeezing. Further, the moving direction of the squeezee 430 is referred to as the squeezing direction or the printing direction.
The printing mask 410 is formed of meshes 420 shown in
As shown in
The mesh mark irregularities do not always occur in the same manner, and are largely influenced by the relationship between the rubbing direction of the alignment film 113 and the printing direction.
As shown in
That is, patent document 1 suggests that when the angle made by the rubbing direction and the squeezing direction is within 60 degrees or more, such an angle is within an allowable range with respect to the occurrence rate of meshes flaw irregularities. However, in the IPS method, this range is not allowable at all. This is because that, in the IPS, it is necessary to set a pretilt angle of the alignment film 113 to 2.5 degrees or less, and more preferably to 2.0 degrees or less and hence, an action of the printing meshes 420 exerted on the alignment film 113 may also differ compared to a usual liquid crystal display device.
As can be understood from
On the other hand, to take the setting accuracy of the squeezing direction and the setting accuracy of the rubbing direction into consideration, by setting the rubbing direction and the squeezing direction within a range of ±10 degrees taken from the opposite directions, in other words, by setting the angle made by the rubbing direction and the squeezing direction within 170 degrees to 190 degrees, it is possible to surely prevent the meshes flaw irregularities while ensuring tolerance in a printing step also with respect to the IPS method.
In this manner, by accurately managing the angle θ made by the rubbing direction RB and the printing direction SQ, it is possible to suppress the occurrence of meshes flaw irregularities. It is possible to suppress the rubbing direction RB within a range of 0.2 degrees or less. According to the present invention, the screen printing is performed by setting the angle θ made by the rubbing direction RB and the squeezing direction SQ within a range of ±15 degrees, and more preferably, within a range of ±10 degrees taken from the opposite directions in addition to the above-mentioned conditions.
In
As has been explained heretofore, according to the present invention, it is possible to form the sealing material 20 by screen printing while suppressing the occurrence of meshes flaw irregularities. Accordingly, a turnaround time for forming the sealing material 20 can be largely shortened.
Number | Date | Country | Kind |
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2008-215463 | Aug 2008 | JP | national |