LIQUID-CRYSTALLINE MEDIUM

The invention relates to a liquid-crystalline medium which comprises at least one compound of the formula I,

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in which

R¹and R^1*each, independently of one another, denote an alkyl or alkoxy radical having 1 to 15 C atoms, where, in addition, one or more CH₂groups in these radicals may each be replaced, independently of one another, by —C≡C—, —CF₂O—, —OCF₂—, —CH═CH—,

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—O—, —CO—O—, or —O—CO— in such a way that O atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by halogen,

L¹and L²each, independently of one another, denote F, Cl, CF₃or CHF₂.

Media of this type can be used, for example, for electro-optical displays having active-matrix addressing based on the ECB effect and for IPS (in-plane switching) displays or FFS (fringe field switching) displays.

The principle of electrically controlled birefringence, the ECB effect or also DAP (deformation of aligned phases) effect, was described for the first time in 1971 (M. F. Schieckel and K. Fahrenschon, “Deformation of nematic liquid crystals with vertical orientation in electrical fields”, Appl. Phys. Lett. 19 (1971), 3912). This was followed by papers by J. F. Kahn (Appl. Phys. Lett. 20 (1972), 1193) and G. Labrunie and J. Robert (J. Appl. Phys. 44 (1973), 4869).

The papers by J. Robert and F. Clerc (SID 80 Digest Techn. Papers (1980), 30), J. Duchene (Displays 7 (1986), 3) and H. Schad (SID 82 Digest Techn. Papers (1982), 244) showed that liquid-crystalline phases must have high values for the ratio of the elastic constants K₃/K₁, high values for the optical anisotropy Δn and values for the dielectric anisotropy of Δ∈≦−0.5 in order to be suitable for use in high-information display elements based on the ECB effect. Electro-optical display elements based on the ECB effect have a homeotropic edge alignment (VA technology=vertically aligned). Dielectrically negative liquid-crystal media can also be used in displays which use the so-called IPS or FFS effect.

Displays which use the ECB effect, as so-called VAN (vertically aligned nematic) displays, for example in the MVA (multi-domain vertical alignment, for example: Yoshide, H. et al., paper 3.1: “MVA LCD for Notebook or Mobile PCs . . . ”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book I, pp. 6 to 9, and Liu, C. T. et al., paper 15.1: “A 46-inch TFT-LCD HDTV Technology . . . ”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 750 to 753), PVA (patterned vertical alignment, for example: Kim, Sang Soo, paper 15.4: “Super PVA Sets New State-of-the-Art for LCD-TV”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 760 to 763), ASV (advanced super view, for example: Shigeta, Mitzuhiro and Fukuoka, Hirofumi, paper 15.2: “Development of High Quality LCDTV”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 754 to 757) modes, have established themselves as one of the three more recent types of liquid-crystal display that are currently the most important, in particular for television applications, besides IPS (in-plane switching) displays (for example: Yeo, S. D., paper 15.3: “An LC Display for the TV Application”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 758 & 759) and the long-known TN (twisted nematic) displays. The technologies are compared in general form, for example, in Souk, Jun, SID Seminar 2004, seminar M-6: “Recent Advances in LCD Technology”, Seminar Lecture Notes, M-6/1 to M-6/26, and Miller, Ian, SID Seminar 2004, seminar M-7: “LCD-Television”, Seminar Lecture Notes, M-7/1 to M-7/32. Although the response times of modern ECB displays have already been significantly improved by addressing methods with overdrive, for example: Kim, Hyeon Kyeong et al., paper 9.1: “A 57-in. Wide UXGA TFT-LCD for HDTV Application”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book I, pp. 106 to 109, the achievement of video-compatible response times, in particular on switching of grey shades, is still a problem which has not yet been satisfactorily solved.

Industrial application of this effect in electro-optical display elements requires LC phases, which have to satisfy a multiplicity of requirements. Particularly important here are chemical resistance to moisture, air and physical influences, such as heat, infrared, visible and ultraviolet radiation and direct and alternating electric fields.

Furthermore, industrially usable LC phases are required to have a liquid-crystalline mesophase in a suitable temperature range and low viscosity.

None of the hitherto-disclosed series of compounds having a liquid-crystalline mesophase includes a single compound which meets all these requirements. Mixtures of two to 25, preferably three to 18, compounds are therefore generally prepared in order to obtain substances which can be used as LC phases. However, it has not been possible to prepare optimum phases easily in this way since no liquid-crystal materials having significantly negative dielectric anisotropy and adequate long-term stability were hitherto available.

Matrix liquid-crystal displays (MLC displays) are known. Non-linear elements which can be used for individual switching of the individual pixels are, for example, active elements (i.e. transistors). The term “active matrix” is then used, where a distinction can be made between two types:

1. MOS (metal oxide semiconductor) transistors on a silicon wafer as substrate

2. thin-film transistors (TFTs) on a glass plate as substrate.

In the case of type 1, the electro-optical effect used is usually dynamic scattering or the guest-host effect. The use of single-crystal silicon as substrate material restricts the display size, since even modular assembly of various part-displays results in problems at the joints.

In the case of the more promising type 2, which is preferred, the electro-optical effect used is usually the TN effect.

A distinction is made between two technologies: TFTs comprising compound semiconductors, such as, for example, CdSe, or TFTs based on polycrystalline or amorphous silicon. The latter technology is being worked on intensively worldwide.

The TFT matrix is applied to the inside of one glass plate of the display, while the other glass plate carries the transparent counterelectrode on its inside. Compared with the size of the pixel electrode, the TFT is very small and has virtually no adverse effect on the image. This technology can also be extended to fully colour-capable displays, in which a mosaic of red, green and blue filters is arranged in such a way that a filter element is opposite each switchable pixel.

The term MLC displays here covers any matrix display with integrated non-linear elements, i.e. besides the active matrix, also displays with passive elements, such as varistors or diodes (MIM=metal-insulator-metal).

MLC displays of this type are particularly suitable for TV applications (for example pocket TVs) or for high-information displays in automobile or air-craft construction. Besides problems regarding the angle dependence of the contrast and the response times, difficulties also arise in MLC displays due to insufficiently high specific resistance of the liquid-crystal mixtures [TOGASHI, S., SEKIGUCHI, K., TANABE, H., YAMAMOTO, E., SORI-MACHI, K., TAJIMA, E., WATANABE, H., SHIMIZU, H., Proc. Eurodisplay 84, September 1984: A 210-288 Matrix LCD Controlled by Double Stage Diode Rings, pp. 141 ff., Paris; STROMER, M., Proc. Eurodisplay 84, September 1984: Design of Thin Film Transistors for Matrix Addressing of Television Liquid Crystal Displays, pp. 145 ff., Paris]. With decreasing resistance, the contrast of an MLC display deteriorates. Since the specific resistance of the liquid-crystal mixture generally drops over the life of an MLC display owing to interaction with the inside surfaces of the display, a high (initial) resistance is very important for displays that have to have acceptable resistance values over a long operating period.

There is thus still a great demand for MLC displays having very high specific resistance at the same time as a large working-temperature range, short response times and a low threshold voltage, with the aid of which various grey shades can be generated.

The disadvantage of the MLC-TN displays frequently used is due to their comparatively low contrast, the relatively high viewing-angle dependence and the difficulty of generating grey shades in these displays.

VA displays have significantly better viewing-angle dependencies and are therefore principally used for televisions and monitors. However, there continues to be a need to improve the response times here, in particular in view of use for televisions having frame rates (image change frequency/repetition rates) of greater than 60 Hz. However, the properties, such as, for example, the low-temperature stability, must not be impaired at the same time.

An object of the invention is providing liquid-crystal mixtures, in particular for monitor and TV applications, based on the ECB effect or on the IPS or FFS effect, which do not have the disadvantages indicated above, or only do so to a reduced extent. In particular, it should be ensured for monitors and televisions that they also work at extremely high and extremely low temperatures and at the same time have very short response times and at the same time have an improved reliability behaviour, in particular exhibit no or significantly reduced image sticking after long operating times.

Surprisingly, it is possible to improve the rotational viscosity values and thus the response times if polar compounds of the general formula I, see formula defined above, are used in liquid-crystal mixtures, in particular in LC mixtures having negative dielectric anisotropy, preferably for VA and FFS displays.

The invention thus relates to a liquid-crystalline medium which comprises at least one compound of the formula I. The present invention likewise relates to compounds of formula I.

The compounds of the formula I are covered by the generic formula (I) in WO 02/055463 A1.

The mixtures according to the invention preferably exhibit very broad nematic phase ranges with clearing points ≧70° C., preferably ≧75° C., in particular ≧80° C., very favourable values of the capacitive threshold, relatively high values of the holding ratio and at the same time very good low-temperature stabilities at −20° C. and −30° C., as well as very low rotational viscosity values and short response times. The mixtures according to the invention are furthermore distinguished by the fact that, in addition to the improvement in the rotational viscosity γ₁, relatively high values of the elastic constants K₃₃for improving the response times can be observed. The use of the compounds of the formula I in LC mixtures, preferably having negative dielectric anisotropy, the ratio of rotational viscosity γ₁and elastic constants K_iis reduced.

Some preferred embodiments of the mixtures according to the invention are indicated below.

In the compounds of the formula I, R¹and R^1*preferably each, independently of one another, denote straight-chain alkoxy, in particular OCH₃, n-C₂H₅O, n-OC₃H₇, n-OC₄H₉, n-OC₅H₁₁or n-OC₆H₁₃, furthermore alkenyl, in particular CH₂═CH₂, CH₂CH═CH₂, CH₂CH═CHCH₃or CH₂CH═CHC₂H₅, branched alkoxy, in particular OC₃H₆CH(CH₃)₂, and alkenyloxy, in particular OCH═CH₂, OCH₂CH═CH₂, OCH₂CH═CHCH₃or OCH₂CH═CHC₂H₅.

R¹and R^1*particularly preferably each, independently of one another, denote straight-chain alkoxy having 1-6 C atoms, in particular methoxy, ethoxy, propoxy, butoxy, pentoxy or hexoxy.

L¹and L²preferably both denote F.

Preferred compounds of the formula I are the compounds of the formulae I-1 to I-10,

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in which

alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, alkenyl and alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms, alkoxy and alkoxy* each, independently of one another, denote a straight-chain alkoxy radical having 1-6 C atoms, and L¹and L²each, independently of one another, denote F or Cl.

In the compounds of the formulae I-1 to I-10, L¹and L²preferably each, independently of one another, denote F or Cl, in particular L¹=L²=F. Particular preference is given to the compounds of the formulae I-2 and I-6. In the compounds of the formulae I-2 and I-6, preferably L¹=L²=F.

The mixture according to the invention very particularly preferably comprises at least one compound of the formulae I-1A, I-2A, I-4A, I-6A and/or I-6B,

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Very particularly preferred mixtures comprise at least one compound of the formulae I-2.1 to I-2.49 and I-6.1 to I-6.28,

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In the compounds I-2.1 to I-2.49 and I-6.1 to I-6.28, L¹and L²preferably both denote fluorine.

Preference is furthermore given to liquid-crystalline mixtures which comprise at least one compound selected from the group of the compounds of the formulae I-1.1 to I-1.28 and I-6B.1 to I-6B.3:

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in which L¹and L²each, independently of one another, have the meanings given above. In the compounds of the formulae I-1.1 to I-1.28 and I-6B.1 to I-6B.3, preferably L¹=L²=F.

Very particularly preferred mixtures comprise at least one of the compounds mentioned below:

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The compounds of the formula I can be prepared, for example, analogously to the manner as described in US 2005/0258399 or WO 02/055463 A1, which description is incorporated herein by reference.

The compounds of the formula I are preferably prepared as follows:

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Analogous methods can be used to prepare compounds of the formula I wherein R¹and R^1*and L¹and L²have different meanings within formula I.

In one embodiment, the present invention preferably relates to the compounds of the formula I-6B above.

The media according to the invention preferably comprise one, two, three, four or more, preferably one, two or three, compounds of the formula I.

The compounds of the formula I are preferably employed in the liquid-crystalline medium in amounts of 1% by weight, preferably 3% by weight, based on the mixture as a whole. Particular preference is given to liquid-crystalline media which comprise 1-40% by weight, very particularly preferably 2-30% by weight, of one or more compounds of the formula I.

Preferred embodiments of the liquid-crystalline medium according to the invention are indicated below:

a) Liquid-crystalline medium which additionally comprises one or more compounds selected from the group of the compounds of the formulae IIA, IIB and IIC,

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- in which
- R^2A, R^2Band R^2Ceach, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF₃or at least monosubstituted by halogen, where, in addition, one or more CH₂groups in these radicals may be replaced by —O—, —S—,

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- -C≡C—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another,
- L^1-4each, independently of one another, denote F, Cl, CF₃or CHF₂,
- Z²and Z^2′ each, independently of one another, denote a single bond, —CH₂CH₂—, —CH═CH—, —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —COO—, —OCO—, —C₂F₄—, —CF═CF—, or —CH═CHCH₂O—,
- (O) indicates an optionally present —O— group,
- p denotes 0, 1 or 2,
- q denotes 0 or 1, and
- v denotes 1 to 6.
- In the compounds of the formulae IIA and IIB, the Z²groups may have identical or different meanings. In the compounds of the formula IIB, the Z²and Z^2′ groups may have identical or different meanings.
- In the compounds of the formulae IIA, IIB and IIC, R^2A, R^2Band R^2Ceach preferably denote alkyl having 1-6 C atoms, in particular CH₃, C₂H₅, n-C₃H₇, n-C₄H₉or n-C₅H₁₁.
- In the compounds of the formulae IIA and IIB, L¹, L², L³and L⁴preferably denote L¹=L²=F and L³=L⁴=F. In other embodiments L¹=F and L²=Cl, L¹=Cl and L²=F, L³=F and L⁴=Cl, L³=Cl and L⁴=F. Z²and Z^2′ in the formulae IIA and IIB preferably each, independently of one another, denote a single bond, or furthermore a —C₂H₄— bridge.
- If, in the formula IIB, Z²=—C₂H₄— or —CH₂O—, Z^2′ is preferably a single bond or, if Z^2′=—C₂H₄— or —CH₂O—, Z²is preferably a single bond. In the compounds of the formulae IIA and IIB, (O)C_vH_2v+1preferably denotes OC_vH_2v+1, or furthermore C_vH_2v+1. In the compounds of the formula IIC, (O)C_vH_2v+1preferably denotes C_vH_2v+1. In the compounds of the formula IIC, L³and L⁴preferably each denote F.
- Preferred compounds of the formulae IIA, IIB and IIC are indicated below:

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- in which alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms.
- Particularly preferred mixtures according to the invention comprise one or more compounds of the formulae IIA-2, IIA-8, IIA-14, IIA-26, II-28, IIA-33, IIA-39, IIA-45, IIA-46, IIA-47, IIA-50, IIB-2, IIB-11, IIB-16 or IIC-1.
- The proportion of compounds of the formulae IIA and/or IIB in the mixture as a whole is preferably at least 20% by weight.
- Particularly preferred media according to the invention comprise at least one compound of the formula IIC-1,

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- in which alkyl and alkyl* have the meanings indicated above, preferably in amounts of >3% by weight, in particular >5% by weight and particularly preferably 5-25% by weight.

b) Liquid-crystalline medium which additionally comprises one or more compounds of the formula III,

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- in which
- R³¹and R³²each, independently of one another, denote a straight-chain alkyl, alkenyl, alkoxyalkyl or alkoxy radical having 1 to 12 C atoms, and

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- denotes

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- Z³denotes a single bond, —CH₂CH₂—, —CH═CH—, —OCF₂—, —CH₂O—, OCH₂—, —COO—, —C₄H₈— or —CF═CF—.
- Preferred compounds of the formula III are indicated below:

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- in which
- alkyl and
- alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms.
- The medium according to the invention preferably comprises at least one compound of the formula IIIa and/or formula IIIb.
- The proportion of compounds of the formula III in the mixture as a whole is preferably at least 5% by weight

c) Liquid-crystalline medium additionally comprising a compound of the formula

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preferably in total amounts of ≧5% by weight, in particular ≧10% by weight.
- Preference is furthermore given to mixtures according to the invention comprising the compound (acronym: CC-3-V1)

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- preferably in amounts of 2-15% by weight.
- Preferred mixtures comprise 5-60% by weight, preferably 10-55% by weight, in particular 20-50% by weight, of the compound of the formula (acronym: CC-3-V)

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- Preference is furthermore given to mixtures which comprise both a compound of the formula (acronym: CC-3-V)

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- and a compound of the formula (acronym: CC-3-V1)

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- preferably with total amount of both compounds together being 10-60% by weight.

d) Liquid-crystalline medium which additionally comprises one or more tetracyclic compounds of the formulae

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- in which
- R^7-10each, independently of one another, denote H, an alkyl or alkenyl radical having 1 to 15 C atoms which is unsubstituted, monosubstituted by CN or CF₃or at least monosubstituted by halogen, where, in addition, one or more CH₂groups in these radicals may be replaced by —O—, —S—,

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- —C≡C—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another,
- (O) denotes an optionally present —O— group, and
- w and x each, independently of one another, denote 1 to 6.
- Particular preference is given to mixtures comprising at least one compound of the formula V-9.

e) Liquid-crystalline medium which additionally comprises one or more compounds of the formulae Y-1 to Y-6,

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in which R¹⁴-R¹⁹each, independently of one another, denote an alkyl or alkoxy radical having 1-6 C atoms; z and m each, independently of one another, denote 1-6.
- The medium according to the invention particularly preferably comprises one or more compounds of the formulae Y-1 to Y-6, preferably in amounts of ≧5% by weight.

f) Liquid-crystalline medium additionally comprising one or more fluorinated terphenyls of the formulae T-1 to T-21,

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- in which
- R denotes a straight-chain alkyl, alkenyl or alkoxy radical having 1-7 C atoms, m=0, 1, 2, 3, 4, 5 or 6, n denotes 0, 1, 2, 3 or 4, and (O) denotes an optionally present —O— group.
- R preferably denotes methyl, ethyl, propyl, butyl, pentyl, hexyl, methoxy, ethoxy, propoxy, butoxy, pentoxy.
- The medium according to the invention preferably comprises the terphenyls of the formulae T-1 to T-21 in amounts of 2-30% by weight, in particular 5-20% by weight.
- Particular preference is given to compounds of the formulae T-1, T-2, T-4, T-20 and T-21. In these compounds, R preferably denotes alkyl, furthermore alkoxy, each having 1-5 C atoms. In the compounds of the formula T-20, R preferably denotes alkyl or alkenyl, in particular alkyl. In the compound of the formula T-21, R preferably denotes alkyl.
- The terphenyls are preferably employed in the mixtures according to the invention if the Δn value of the mixture is to be ≧0.1. Preferred mixtures comprise 2-20% by weight of one or more terphenyl compounds selected from the group of the compounds T-1 to T-21.

g) Liquid-crystalline medium additionally comprising one or more biphenyls of the formulae B-1 to B-3,

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- in which
- alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, and
- alkenyl and alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms.
- The proportion of the biphenyls of the formulae B-1 to B-3 in the mixture as a whole is preferably at least 3% by weight, in particular ≧5% by weight.
- Of the compounds of the formulae B-1 to B-3, the compounds of the formula B-2 are particularly preferred.
- Particularly preferred biphenyls are

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- in which alkyl* denotes an alkyl radical having 1-6 C atoms. The medium according to the invention particularly preferably comprises one or more compounds of the formulae B-1a and/or B-2c.

h) Liquid-crystalline medium comprising at least one compound of the formulae Z-1 to Z-7,

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in which R denotes a straight-chain alkyl, alkenyl or alkoxy radical having 1-7 C atoms, alkyl denotes an alkyl radical having 1-6 C atoms and (O) denotes an optionally present —O— group.

i) Liquid-crystalline medium additionally comprising at least one compound of the formulae O-1 to O-18,

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- in which R¹and R²have the meanings indicated for R^2Aabove. R¹and R²preferably each, independently of one another, denote straight-chain alkyl or alkenyl, preferably having 1 to 6 carbon atoms.
- Preferred media comprise one or more compounds of the formulae O-1, O-3, O-4, O-6, O-7, O-10, O-11, O-12, O-14, O-15, O-16 and/or O-17.
- Mixtures according to the invention very particularly preferably comprise the compounds of the formula O-10, O-12, O-16 and/or O-17, in particular in amounts of 5-30%.
- Preferred compounds of the formulae O-10 and O-17 are indicated below:

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- The medium according to the invention particularly preferably comprises the tricyclic compounds of the formula O-10a and/or of the formula O-10b in combination with one or more bicyclic compounds of the formulae O-17a to O-17d. The total proportion of the compounds of the formulae O-10a and/or O-10b in combination with one or more compounds selected from the bicyclic compounds of the formulae O-17a to O-17d is 5-40%, very particularly preferably 15-35%.
- Very particularly preferred mixtures comprise compounds O-10a and O-17a:

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- Compounds O-10a and O-17a are preferably present in the mixture in a concentration of 15-35%, particularly preferably 15-25% and especially preferably 18-22%, based on the mixture as a whole.
- Very particularly preferred mixtures comprise the compounds O-10b and O-17a:

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- The compounds O-10b and O-17a are preferably present in the mixture in a concentration of 15-35%, particularly preferably 15-25% and especially preferably 18-22%, based on the mixture as a whole.
- Very particularly preferred mixtures comprise the following three compounds:

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- The compounds O-10a, O-10b and O-17a are preferably present in the mixture in a concentration of 15-35%, particularly preferably 15-25% and especially preferably 18-22%, based on the mixture as a whole.
- Preferred mixtures comprise at least one compound selected from the group of the compounds

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- in which R¹and R²have the meanings indicated above. Preferably in the compounds O-6, O-7 and O-17, R¹denotes alkyl or alkenyl having 1-6 or 2-6 C atoms respectively and R²denotes alkenyl having 2-6 C atoms.
- Preferred mixtures comprise at least one compound of the formulae O-6a, O-6b, O-7a, O-7b, O-17e, O-17f, O-17g and O-17h:

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- in which alkyl denotes an alkyl radical having 1-6 C atoms.
- The compounds of the formulae O-6, O-7 and O-17e-h are preferably present in the mixtures according to the invention in amounts of 1-40% by weight, preferably 2-35% by weight and very particularly preferably 2-30% by weight.

j) Preferred liquid-crystalline media according to the invention comprise one or more substances which contain a tetrahydronaphthyl or naphthyl unit, such as, for example, the compounds of the formulae N-1 to N-5,

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in which R^1Nand R^2Neach, independently of one another, have the meanings indicated for R^2Aabove, and preferably denote straight-chain alkyl, straight-chain alkoxy or straight-chain alkenyl, and
- Z¹and Z²each, independently of one another, denote —C₂H₄—, —CH═CH—, —(CH₂)₄—, —(CH₂)₃O—, —O(CH₂)₃—, —CH═CHCH₂CH₂—, —CH₂CH₂CH═CH—, —CH₂O—, —OCH₂—, —COO—, —OCO—, —C₂F₄—, —CF═CF—, —CF═CH—, —CH═CF—, —CF₂O—, —OCF₂—, —CH₂— or a single bond.

k) Preferred mixtures comprise one or more compounds selected from the group of the difluorodibenzochroman compounds of the formula BC, chromans of the formula CR, fluorinated phenanthrenes of the formulae PH-1 and PH-2, and/or fluorinated dibenzofurans of the formula BF-1 and BF-2,

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- in which
- R^B1, R^B2, R^CR1, R^CR2, R¹, R²each, independently of one another, have the meaning of R^2Agiven above. c denotes 1 or 2 and d denotes 1 or 2. R¹and R²preferably, independently of one another, denote alkyl or alkoxy having 1 to 6 C atoms.
- The mixtures according to the invention preferably comprise the compounds of the formulae BC, CR, PH-1, PH-2, BF-1 and/or BF-2 in amounts of 3 to 20% by weight, in particular in amounts of 3 to 15% by weight.
- Particularly preferred compounds of the formulae BC and CR are the compounds BC-1 to BC-7 and CR-1 to CR-5,

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- in which
- alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, and
- alkenyl and
- alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms.
- Very particular preference is given to mixtures comprising one, two or three compounds of the formula BC-2, BF-1 and/or BF-2.

l) Preferred mixtures comprise one or more indane compounds of the formula In,

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- in which
- R¹¹, R¹²,
- R¹³each, independently of one another, denote a straight-chain alkyl, alkoxy, alkoxyalkyl or alkenyl radical having 1-6 C atoms,
- R¹²and R¹³may additionally denote halogen, preferably F,

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- denotes

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- i denotes 0, 1 or 2.
- Preferred compounds of the formula In are the compounds of the formulae In-1 to In-16 indicated below:

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- Particular preference is given to the compounds of the formulae In-1, In-2, In-3 and In-4.
- The compounds of the formula In and the sub-formulae In-1 to In-16 are preferably employed in the mixtures according to the invention in concentrations ≧5% by weight, in particular 5-30% by weight and very particularly preferably 5-25% by weight.

m) Preferred mixtures additionally comprise one or more compounds of the formulae L-1 to L-11,

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- in which
- R, R¹and R²each, independently of one another, have the meanings indicated for R^2Aabove, and alkyl denotes an alkyl radical having 1-6 C atoms. s denotes 1 or 2. (O) denotes an optionally present —O— group.
- Particular preference is given to the compounds of the formulae L-1 and L-4, in particular L-4.
- The compounds of the formulae L-1 to L-11 are preferably employed in concentrations of 5-50% by weight, in particular 5-40% by weight and very particularly preferably 10-40% by weight.

Particularly preferred mixture concepts are indicated below: (the acronyms used are explained in Table A. n and m here each, independently of one another, denote 1-15, preferably 1-6).

The mixtures according to the invention preferably comprise

- one or more compounds of the formula I in which L¹=L²=F and R¹=alkoxy;
- CPY-n-Om, in particular CPY-2-O2, CPY-3-O2 and/or CPY-5-O2, preferably in concentrations >5%, in particular 10-30%, based on the mixture as a whole,

and/or

- CY-n-Om, preferably CY-3-O2, CY-3-O4, CY-5-O2 and/or CY-5-O4, preferably in concentrations >5%, in particular 15-50%, based on the mixture as a whole,

and/or

- CCY-n-Om, preferably CCY-4-O2, CCY-3-O2, CCY-3-O3, CCY-3-O1 and/or CCY-5-O2, preferably in concentrations >5%, in particular 10-30%, based on the mixture as a whole,

and/or

- CLY-n-Om, preferably CLY-2-O4, CLY-3-O2 and/or CLY-3-O3, preferably in concentrations >5%, in particular 10-30%, based on the mixture as a whole,

and/or

- CK-n-F, preferably CK-3-F, CK-4-F and/or CK-5-F, preferably >5%, in particular 5-25%, based on the mixture as a whole.

Preference is furthermore given to mixtures according to the invention which comprise the following mixture concepts:

(n and m each, independently of one another, denote 1-6.)

- CPY-n-Om and CY-n-Om, together preferably in concentrations of 10-80%, based on the mixture as a whole,

and/or

- CPY-n-Om and CK-n-F, together preferably in concentrations of 10-70%, based on the mixture as a whole,

and/or

- CPY-n-Om and PY-n-Om, preferably CPY-2-O2 and/or CPY-3-O2 and PY-3-O2, together preferably in concentrations of 10-45%, based on the mixture as a whole,

and/or

- CPY-n-Om and CLY-n-Om, together preferably in concentrations of 10-80%, based on the mixture as a whole,

and/or

- CCVC-n-V, preferably CCVC-3-V, preferably in concentrations of 2-10%, based on the mixture as a whole,

and/or

- CCC-n-V, preferably CCC-2-V and/or CCC-3-V, preferably in concentrations of 2-10%, based on the mixture as a whole,

and/or

- CC—V-V, preferably in concentrations of 5-50%, based on the mixture as a whole.

The invention furthermore relates to an electro-optical display having active-matrix addressing, particularly based on the ECB, VA, PS-VA, PA-VA, IPS, PS-IPS, FFS or PS-FFS effect, characterised in that it contains, as dielectric, a liquid-crystalline medium as described above according to the invention.

The liquid-crystalline medium according to the invention preferably has a nematic phase from ≦−20° C. to ≧70° C., particularly preferably from ≦−30° C. to ≧80° C., very particularly preferably from ≦−40° C. to ≧90° C.

The expression “have a nematic phase” here means on the one hand that no smectic phase and no crystallisation are observed at low temperatures at the corresponding temperature and on the other hand that clearing still does not occur on heating from the nematic phase. The investigation at low temperatures is carried out in a flow viscometer at the corresponding temperature and checked by storage in test cells having a layer thickness corresponding to the electro-optical use for at least 100 hours. If the storage stability at a temperature of −20° C. in a corresponding test cell is 1000 h or more, the medium is referred to as stable at this temperature. At temperatures of −30° C. and −40° C., the corresponding times are 500 h and 250 h respectively. At high temperatures, the clearing point is measured by conventional methods in capillaries.

The liquid-crystal mixture preferably has a nematic phase range of at least 60 K and a flow viscosity ν₂₀of at most 30 mm²·s⁻¹at 20° C.

The values of the birefringence Δn in the liquid-crystal mixture are preferably between 0.07 and 0.16, more preferably between 0.08 and 0.13.

The liquid-crystal mixture according to the invention preferably has a Δ∈ of −0.5 to −8.0, in particular −2.5 to −6.0, where Δ∈ denotes the dielectric anisotropy. The rotational viscosity γ₁at 20° C. is preferably ≦150 mPa·s, in particular 120 mPa·s.

The liquid-crystal media according to the invention have relatively low values for the threshold voltage (V₀). They are preferably in the range from 1.7 V to 3.0 V, particularly preferably ≦2.5 V and very particularly preferably ≦2.3 V.

For the present invention, the term “threshold voltage” relates to the capacitive threshold (V₀), also known as the Freedericks threshold, unless explicitly indicated otherwise.

In addition, the liquid-crystal media according to the invention have high values for the voltage holding ratio in liquid-crystal cells.

In general, liquid-crystal media having a low addressing voltage or threshold voltage exhibit a lower voltage holding ratio than those having a higher addressing voltage or threshold voltage and vice versa.

For the present invention, the term “dielectrically positive compounds” denotes compounds having a Δ∈>1.5, the term “dielectrically neutral compounds” denotes those having −1.5≦Δ∈≦1.5 and the term “dielectrically negative compounds” denotes those having Δ∈<−1.5. The dielectric anisotropy of the compounds is determined here by dissolving 10% of the compounds in a liquid-crystalline host and determining the capacitance of the resultant mixture in at least one test cell in each case having a layer thickness of 20 μm with homeotropic and with homogeneous surface alignment at 1 kHz. The measurement voltage is typically 0.5 V to 1.0 V, but is always lower than the capacitive threshold of the respective liquid-crystal mixture investigated.

All temperature values indicated for the present invention are in ° C.

The mixtures according to the invention are suitable for all VA-TFT applications, such as, for example, VAN, MVA, (S)-PVA, ASV, PSA (polymer sustained VA) and PS-VA (polymer stabilized VA). They are furthermore suitable for IPS (in-plane switching) and FFS (fringe field switching) applications having negative Δ∈.

The nematic liquid-crystal mixtures in the displays according to the invention may comprise two components A and B, which themselves consist of one or more individual compounds.

Component A has significantly negative dielectric anisotropy and gives the nematic phase a dielectric anisotropy of ≦−0.5. Besides one or more compounds of the formula I, it preferably comprises the compounds of the formulae IIA, IIB and/or IIC, furthermore one or more compounds of the formula O-17.

The proportion of component A is preferably between 45 and 100%, in particular between 60 and 100%.

For component A, one (or more) individual compound(s) which has (have) a value of Δ∈≦−0.8 is (are) preferably selected. This value must be more negative, the smaller the proportion A in the mixture as a whole.

Component B has pronounced nematogeneity and a flow viscosity of not greater than 30 mm²·s⁻¹, preferably not greater than 25 mm²·s⁻¹, at 20° C. A multiplicity of suitable materials are known to the person skilled in the art from the literature. Particular preference is given to compounds of the formula O-17.

Particularly preferred individual compounds in component B are extremely low-viscosity nematic liquid crystals having a flow viscosity of not greater than 18 mm²·s⁻¹, preferably not greater than 12 mm²·s⁻¹, at 20° C.

Component B is monotropically or enantiotropically nematic, has no smectic phases and is able to prevent the occurrence of smectic phases down to very low temperatures in liquid-crystal mixtures. For example, if various materials of high nematogeneity are added to a smectic liquid-crystal mixture, the nematogeneity of these materials can be compared through the degree of suppression of smectic phases that is achieved.

The mixture may optionally also comprise a component C, comprising compounds having a dielectric anisotropy of Δ∈≧1.5. These so-called positive compounds are generally present in a mixture of negative dielectric anisotropy in amounts of ≦20% by weight, based on the mixture as a whole.

If the mixture according to the invention comprises one or more compounds having a dielectric anisotropy of Δ∈≧1.5, these are preferably one or more compounds selected from the group of the compounds of the formulae P-1 to P-4,

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in which

R denotes straight-chain alkyl, alkoxy or alkenyl, each having 1 or 2 to 6 C atoms respectively, and
X denotes F, Cl, CF₃, OCF₃, OCHFCF₃or CCF₂CHFCF₃, preferably F or OCF₃.

The compounds of the formulae P-1 to P-4 are preferably employed in the mixtures according to the invention in concentrations of 2-15%, in particular 2-10%.

Particular preference is given to the compound of the formula

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which is preferably employed in the mixtures according to the invention in amounts of 2-15%.

In addition, these liquid-crystal phases may also comprise more than 18 components, preferably 18 to 25 components.

Besides one or more compounds of the formula I, the phases preferably comprise 4 to 15, in particular 5 to 12, and particularly preferably <10, compounds of the formulae IIA, IIB and/or IIC and optionally one or more compounds of the formula O-17.

Besides compounds of the formula I and the compounds of the formulae IIA, IIB and/or IIC and optionally O-17, other constituents may also be present, for example in an amount of up to 45% of the mixture as a whole, but preferably up to 35%, in particular up to 10%.

The other constituents are preferably selected from nematic or nematogenic substances, in particular known substances, from the classes of the azoxybenzenes, benzylideneanilines, biphenyls, terphenyls, phenyl or cyclohexyl benzoates, phenyl or cyclohexyl cyclohexanecarboxylates, phenyl-cyclohexanes, cyclohexylbiphenyls, cyclohexylcyclohexanes, cyclo-hexylnaphthalenes, 1,4-biscyclohexylbiphenyls or cyclohexylpyrimidines, phenyl- or cyclohexyldioxanes, optionally halogenated stilbenes, benzyl phenyl ethers, tolans and substituted cinnamic acid esters.

The most important compounds which are suitable as such additional constituents of liquid-crystal phases of this type can be characterised by the formula IV

R²⁰-L-G-E-R²¹ IV

in which L and E each denote a carbo- or heterocyclic ring system from the group formed by 1,4-disubstituted benzene and cyclohexane rings, 4,4′-disubstituted biphenyl, phenylcyclohexane and cyclohexylcyclohexane systems, 2,5-disubstituted pyrimidine and 1,3-dioxane rings, 2,6-disubstituted naphthalene, di- and tetrahydronaphthalene, quinazoline and tetra-hydroquinazoline,

G denotes —CH═CH— —N(O)═N—
- —CH═CQ- —CH═N(O)—
- —C≡C— —CH₂—CH₂—
- —CO—O— —CH₂—O—
- —CO—S— —CH₂—S—
- —CH═N— —COO-Phe-COO—
- —CF₂O— —CF═CF—
- —OCF₂— —OCH₂—
- —(CH₂)₄— —(CH₂)₃O—
  
  or a C—C single bond, Q denotes halogen, preferably chlorine, or —CN, and R²⁰and R²¹each denote alkyl, alkenyl, alkoxy, alkoxyalkyl or alkoxycarbonyloxy having 1 to 18, preferably 1 to 8, carbon atoms, or one of these radicals alternatively denotes CN, NC, NO₂, NCS, CF₃, SF₅, OCF₃, F, Cl or Br.

In most of these compounds, R²⁰and R²¹are different from one another, one of these radicals usually being an alkyl or alkoxy group. Other variants of the proposed substituents are also common. Many such substances or also mixtures thereof are commercially available. All these substances can be prepared by methods known from the literature.

It goes without saying for the person skilled in the art that the VA, IPS or FFS mixtures according to the invention may also comprise compounds in which, for example, H, N, O, Cl and F have been replaced by the corresponding isotopes.

Polymerisable compounds, so-called reactive mesogens (RMs), for example as disclosed in U.S. Pat. No. 6,861,107, may furthermore be added to the mixtures according to the invention in concentrations of preferably 0.01-5% by weight, particularly preferably 0.2-2% by weight, based on the mixture. These mixtures may optionally also comprise an initiator, as described, for example, in U.S. Pat. No. 6,781,665. The initiator, for example Irganox-1076 from BASF, is preferably added to the mixture comprising polymerisable compounds in amounts of 0-1%. Mixtures of this type can be used for so-called polymer-stabilised VA modes (PS-VA) or PSA (polymer sustained VA), in which polymerisation of the reactive mesogens is intended to take place in the liquid-crystalline mixture. The prerequisite for this is that the liquid-crystal mixture itself does not comprise any polymerisable components.

In a preferred embodiment of the invention, the polymerisable compounds are selected from the compounds of the formula M

R^Ma-A^M1-(Z^M1-A^M2)_m1-R^Mb M

in which the individual radicals have the following meaning:

R^Maand R^Mbeach, independently of one another, denote P, P-Sp-, H, halogen, SF₅, NO₂, an alkyl, alkenyl or alkynyl group, where at least one of the radicals R^Maand R^Mbpreferably denotes or contains a group P or P-Sp-,
P denotes a polymerisable group,
Sp denotes a spacer group or a single bond,
A^M1and A^M2each, independently of one another, denote an aromatic, heteroaromatic, alicyclic or heterocyclic group, preferably having 4 to 25 ring atoms, preferably C atoms, which also includes or may contain annellated rings, and which may optionally be mono- or polysubstituted by L,
L denotes P, P-Sp-, OH, CH₂OH, F, Cl, Br, I, —CN, —NO₂, —NCO, —NCS, —OCN, —SCN, —C(═O)N(R^x)₂, —C(═O)Y¹, —C(═O)R^x, —N(R^x)₂, optionally substituted silyl, optionally substituted aryl having 6 to 20 C atoms, or straight-chain or branched alkyl, alkoxy, alkylcarbonyl, alkoxycarbonyl, alkylcarbonyloxy or alkoxycarbonyloxy having 1 to 25 C atoms, in which, in addition, one or more H atoms may be replaced by F, Cl, P or P-Sp-, preferably P, P-Sp-, H, OH, CH₂OH, halogen, SF₅, NO₂, an alkyl, alkenyl or alkynyl group,
Y¹denotes halogen,
Z^M1denotes —O—, —S—, —CO—, —CO—O—, —OCO—, —O—CO—O—, —OCH₂—, —CH₂O—, —SCH₂—, —CH₂S—, —CF₂O—, —OCF₂—, —CF₂S—, —SCF₂—, —(CH₂)_n1, —CF₂CH₂—, —CH₂CF₂—, —(CF₂)_n1—, —CH═CH—, —CF═CF—, —C≡C—, —CH═CH—, —COO—, —OCO—CH═CH—, CR⁰R⁰⁰or a single bond,
R⁰and R⁰⁰each, independently of one another, denote H or alkyl having 1 to 12 C atoms,
Rx denotes P, P-Sp-, H, halogen, straight-chain, branched or cyclic alkyl having 1 to 25 C atoms, in which, in addition, one or more non-adjacent CH₂groups may be replaced by —O—, —S—, —CO—, —CO—O—, —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by F, Cl, P or P-Sp-, an optionally substituted aryl or aryloxy group having 6 to 40 C atoms, or an optionally substituted heteroaryl or heteroaryloxy group having 2 to 40 C atoms,
m1 denotes 0, 1, 2, 3 or 4 and
n1 denotes 1, 2, 3 or 4,
- where at least one, preferably one, two or three, particularly preferably one or two, from the group R^Ma, R^Mband the substituents L present denotes a group P or P-Sp- or contains at least one group P or P-Sp-.

Particularly preferred compounds of the formula M are those in which

R^Maand R^Mbeach, independently of one another, denote P, P-Sp-, H, F, Cl, Br, I, —CN, —NO₂, —NCO, —NCS, —OCN, —SCN, SF₅or straight-chain or branched alkyl having 1 to 25 C atoms, in which, in addition, one or more non-adjacent CH₂groups may each be replaced, independently of one another, by —C(R⁰)═C(R⁰⁰)—, —C≡C—, —N(R⁰⁰)—, —O—, —S—, —CO—, —CO—O—, —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by F, Cl, Br, I, CN, P or P-Sp-, where at least one of the radicals R^Maand R^Mbpreferably denotes or contains a group P or P-Sp-,

A^M1and A^M2each, independently of one another, denote 1,4-phenylene, naphthalene-1,4-diyl, naphthalene-2,6-diyl, phenanthrene-2,7-diyl, anthracene-2,7-diyl, fluorene-2,7-diyl, coumarine, flavone, where, in addition, one or more CH groups in these groups may be replaced by N, cyclohexane-1,4-diyl, in which, in addition, one or more non-adjacent CH₂groups may be replaced by O and/or S, 1,4-cyclohexenylene, bicyclo[1.1.1]pentane-1,3-diyl, bicyclo[2.2.2]octane-1,4-diyl, spiro[3.3]heptane-2,6-diyl, piperidine-1,4-diyl, decahydronaphthalene-2,6-diyl, 1,2,3,4-tetrahydronaphthalene-2,6-diyl, indane-2,5-diyl or octahydro-4,7-methanoindane-2,5-diyl, where all these groups may be unsubstituted or mono- or polysubstituted by L,
L denotes P, P-Sp-, OH, CH₂OH, F, Cl, Br, I, —CN, —NO₂, —NCO, —NCS, —OCN, —SCN, —C(═O)N(R^x)₂, —C(═O)Y¹, —C(═O)R^x, —N(R^x)₂, optionally substituted silyl, optionally substituted aryl having 6 to 20 C atoms, or straight-chain or branched alkyl, alkoxy, alkylcarbonyl, alkoxycarbonyl, alkylcarbonyloxy or alkoxycarbonyloxy having 1 to 25 C atoms, in which, in addition, one or more H atoms may be replaced by F, Cl, P or P-Sp-,
P denotes a polymerisable group,
Sp denotes a spacer group or a single bond,
Y¹denotes halogen,
R^xdenotes P, P-Sp-, H, halogen, straight-chain, branched or cyclic alkyl having 1 to 25 C atoms, in which, in addition, one or more non-adjacent CH₂groups may be replaced by —O—, —S—, —CO—, —CO—O—, —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by F, Cl, P or P-Sp-, an optionally substituted aryl or aryloxy group having 6 to 40 C atoms, or an optionally substituted heteroaryl or heteroaryloxy group having 2 to 40 C atoms.

Very particular preference is given to compounds of the formula M in which one of R^Maand R^Mbor both denote P or P-Sp-.

Suitable and preferred RMs or monomers or comonomers for use in liquid-crystalline media and PS-VA displays or PSA displays according to the invention are selected, for example from the following formulae:

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in which the individual radicals have the following meanings:

P¹, P²and P³each, identically or differently, denote a polymerisable group, preferably having one of the meanings indicated above and below for P, particularly preferably an acrylate, methacrylate, fluoroacrylate, oxetane, vinyloxy or epoxy group,
Sp¹, Sp²and Sp³each, independently of one another, denote a single bond or a spacer group, preferably having one of the meanings indicated above and below for Sp^a, and particularly preferably —(CH₂)_p1—, —(CH₂)_p1—O—, —(CH₂)_p1—CO—O— or —(CH₂)_p1—O—CO—O—, in which p1 is an integer from 1 to 12, and where in the last-mentioned groups the linking to the adjacent ring takes place via the O atom,
- where one or more of the radicals P¹-Sp¹, P²-Sp²and P³—Sp³- may also denote R^aa, with the proviso that at least one of the radicals P¹-Sp¹-, P²-Sp²and P³-Sp³- present does not denote R^aa,
R^aadenotes H, F, Cl, CN or straight-chain or branched alkyl having 1 to 25 C atoms, in which, in addition, one or more non-adjacent CH₂groups may each be replaced, independently of one another, by C(R⁰)═C(R⁰⁰—)-, —C≡C—, —N(R⁰)—, —O—, —S—, —CO—, —CO—O—, —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by F, Cl, CN or P¹-Sp¹-, particularly preferably straight-chain or branched, optionally mono- or polyfluorinated, alkyl, alkoxy, alkenyl, alkynyl, alkylcarbonyl, alkoxycarbonyl or alkylcarbonyloxy having 1 to 12 C atoms (where the alkenyl and alkynyl radicals have at least two and the branched radicals at least three C atoms),
R⁰, R⁰⁰each, independently of one another and on each occurrence identically or differently, denote H or alkyl having 1 to 12 C atoms,
R^yand R^zeach, independently of one another, denote H, F, CH₃or CF₃,
X¹, X²and X³each, independently of one another, denote —CO—O—, O—CO— or a single bond,
Z¹denotes-O—, —CO—, —C(R^yR^z)— or —CF₂CF₂—,
Z²and Z³each, independently of one another, denote —CO—O—, —O—CO—, —CH₂O—, —OCH₂—, —CF₂O—, —OCF₂— or —(CH₂)_n—, where n is 2, 3 or 4,
L on each occurrence, identically or differently, denotes F, Cl, CN, SCN, SF₅or straight-chain or branched, optionally mono- or polyfluorinated, alkyl, alkoxy, alkenyl, alkynyl, alkylcarbonyl, alkoxycarbonyl, alkylcarbonyloxy or al koxycarbonyloxy having 1 to 12 C atoms, preferably F,
L′ and L″ each, independently of one another, denote H, F or Cl,
r denotes 0, 1, 2, 3 or 4,
s denotes 0, 1, 2 or 3,
t denotes 0, 1 or 2,
x denotes 0 or 1.

In the compounds of the formulae M1 to M44,

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preferably denotes

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in which L, identically or differently on each occurrence, has one of the above meanings and preferably denotes F, Cl, CN, NO₂, CH₃, C₂H₅, C(CH₃)₃, CH(CH₃)₂, CH₂CH(CH₃)C₂H₅, OCH₃, OC₂H₅, COCH₃, COC₂H₅, COOCH₃, COOC₂H₅, CF₃, OCF₃, OCHF₂, OC₂F₅or P-Sp-, particularly preferably F, Cl, CN, CH₃, C₂H₅, OCH₃, COCH₃, OCF₃or P-Sp-, very particularly preferably F, Cl, CH₃, OCH₃, COCH₃or OCF₃, in particular F or CH₃. r denotes 1, 2, 3 or 4, preferably 1 or 2.

Suitable polymerisable compounds are listed, for example, in Table D.

The liquid-crystalline media in accordance with the present application preferably comprise in total 0.1 to 10%, preferably 0.2 to 4.0%, particularly preferably 0.2 to 2.0%, of polymerisable compounds.

Particular preference is given to the polymerisable compounds of the formula M and the formulae RM-1 to RM-94 in Table D.

The mixtures according to the invention may furthermore comprise conventional additives, such as, for example, stabilisers, antioxidants, UV absorbers, nanoparticles, microparticles, etc.

The structure of the liquid-crystal displays according to the invention corresponds to the usual geometry, as described, for example, in EP-A 0 240 379, whose description of such geometry is incorporated herein by reference.

The following examples are intended to explain the invention without limiting it. Above and below, percent data denote percent by weight; all temperatures are indicated in degrees Celsius.

Throughout the patent application, 1,4-cyclohexylene rings and 1,4-phenylene rings are depicted as follows:

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The cyclohexylene rings are trans-1,4-cyclohexylene rings.

Throughout the patent application and in the working examples, the struc-tures of the liquid-crystalline compounds are indicated by means of acronyms. Unless indicated otherwise, the transformation into chemical formulae is carried out in accordance with Tables 1-3. All radicals C_nH_2n+1, C_mH_2m+1and C_m′H_2m+1or C_nH_2nand C_mH_2mare straight-chain alkyl radicals or alkylene radicals in each case having n, m, m′ or z C atoms respectively. n, m, m′, z each denote, independently of one another, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11 or 12, preferably 1, 2, 3, 4, 5 or 6. In Table 1 the ring elements of the respective compound are coded, in Table 2 the bridging members are listed and in Table 3 the meanings of the symbols for the left-hand or right-hand side chains of the compounds are indicated.

TABLE 1

Ring elements

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B(S)

Y(F,Cl)

Y(Cl,F)

TABLE 2

Bridging members

E
—CH₂CH₂—

V
—CH═CH—

T
—C≡C—

W
—CF₂CF₂—

Z
—COO—
ZI
—OCO—

O
—CH₂O—
OI
—OCH₂—

Q
—CF₂O—
QI
—OCF₂—

TABLE 3

Side chains

Left-hand side chain
Right-hand side chain

n-
C_nH_2n+1—
-n
—C_nH_2n+1

nO-
C_nH_2n+1—O—
-On
—O—C_nH_2n+1

V-
CH₂═CH—
-V
—CH═CH₂

nV-
C_nH_2n+1—CH═CH—
-nV
—C_nH_2n—CH═CH₂

Vn-
CH₂═CH—C_nH_2n—
-Vn
—CH═CH—C_nH_2n+1

nVm-
C_nH_2n+1—CH═CH—C_mH_2m—
-nVm
—C_nH_2n—CH═CH—C_mH_2m+1

N-
N≡C—
-N
—C≡N

F-
F—
-F
—F

Cl-
Cl—
-Cl
—Cl

M-
CFH₂—
-M
—CFH₂

D-
CF₂H—
-D
—CF₂H

T-
CF₃—
-T
—CF₃

MO-
CFH₂O—
-OM
—OCFH₂

DO-
CF₂HO—
-OD
—OCF₂H

TO-
CF₃O—
-OT
—OCF₃

T-
CF₃—
-T
—CF₃

A-
H—C≡C—
-A
—C≡C—H

Besides the compounds of the formula I, the mixtures according to the invention preferably comprise one or more of the compounds of the compounds mentioned below from Table A indicated below.

TABLE A

The following abbreviations are used:

(n, m, m′, z: each, independently of one another, 1, 2, 3, 4, 5 or 6;

(O)C_mH_2m+1 means OC_mH_2m+1 or C_mH_2m+1)

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AIK-n-F

AIY-n-Om

AY-n-Om

B-nO-Om

B-n-Om

B-nO-O5i

CB-n-m

CB-n-Om

PB-n-m

PB-n-Om

BCH-nm

BCH-nmF

BCN-nm

C-1V-V1

CY-n-Om

CY(F,Cl)n-Om

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CY(Cl,F)-n-Om

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CCY-n-Om

CCY(F,Cl)n-Om

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CCY(Cl,F)-n-Om

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CCY-n-m

CCY-V-m

CCY-Vn-m

CCY-n-OmV

CBC-nmF

CBC-nm

CCP-V-m

CCP-Vn-m

CCP-nV-m

CCP-n-m

CPYP-n-(O)m

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CYYC-n-m

CCYY-n-(O)m

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CCY-n-O2V

CCH-nOm

CCC-n-m

CCC-n-V

CY-n-m

CCH-nm

CC-n-V

CC-n-V1

CC-n-Vm

CC-V-V

CC-V-V1

CC-2V-V2

CVC-n-m

CC-n-mV

CCOC-n-m

CP-nOmFF

CH-nm

CEY-n-Om

CEY-V-n

CVY-V-n

CY-V-On

CY-n-O1V

CY-n-OC(CH₃)═CH₂

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CCN-nm

CY-n-OV

CCPC-nm

CCY-n-zOm

CPY-n-Om

CPY-n-m

CPY-V-Om

CQY-n-(O)m

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CQIY-n-(O)m

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CCQY-n-(O)m

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CCQIY-n-(O)m

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CPQY-n-(O)m

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CPQIY-n-(O)m

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CPYG-n-(O)m

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CCY-V-Om

CCY-V2-(O)m

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CCY-1V2-(O)m

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CCY-3V-(O)m

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CCVC-n-V

CCVC-V-V

CPYG-n-(O)m

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CPGP-n-m

CY-nV-(O)m

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CENaph-n-Om

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COChrom-n-Om

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COChrom-n-m

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CCOChrom-n-Om

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CCOChrom-n-m

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CONaph-n-Om

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CCONaph-n-Om

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CCNaph-n-Om

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CNaph-n-Om

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CETNaph-n-Om

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CTNaph-n-Om

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CK-n-F

CLY-n-Om

CLY-n-m

LYLI-n-m

CYLI-n-m

LY-n-(O)m

COYOICC-n-m

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COYOIC-n-V

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CCOY-V-O2V

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CCOY-V-O3V

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COY-n-Om

CCOY-n-Om

D-nOmFF

PCH-nm

PCH-nOm

PGIGI-n-F

PGP-n-m

PP-n-m

PP-n-2V1

PYP-n-mV

PYP-n-m

PGIY-n-Om

PYP-n-Om

PPYY-n-m

YPY-n-m

YPY-n-mV

PY-n-Om

PY-n-m

PY-V2-Om

DFDBC-n(O)-(O)m

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Y-nO-Om

Y-nO-OmV

Y-nO-OmVm′

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YG-n-Om

YG-nO-Om

YGI-n-Om

YGI-nO-Om

YY-n-Om

YY-nO-Om

The liquid-crystal mixtures which can be used in accordance with the invention are prepared in a manner which is conventional per se. In general, the desired amount of the components used in lesser amount is dissolved in the components making up the principal constituent, advantageously at elevated temperature. It is also possible to mix solutions of the components in an organic solvent, for example in acetone, chloroform or methanol, and to remove the solvent again, for example by distillation, after thorough mixing.

By means of suitable additives, the liquid-crystal phases according to the invention can be modified in such a way that they can be employed in any type of, for example, ECB, VAN, IPS, GH or ASM-VA LCD display that has been disclosed to date.

The dielectrics may also comprise further additives known to the person skilled in the art and described in the literature, such as, for example, UV absorbers, antioxidants, nanoparticles and free-radical scavengers. For example, 0-15% of pleochroic dyes, stabilisers or chiral dopants may be added. Suitable stabilisers for the mixtures according to the invention are, in particular, those listed in Table B.

For example, 0-15% of pleochroic dyes may be added, furthermore con-ductive salts, preferably ethyldimethyldodecylammonium 4-hexoxybenzoate, tetrabutylammonium tetraphenylboranate or complex salts of crown ethers (cf., for example, Haller et al., Mol. Cryst. Liq. Cryst., Volume 24, pages 249-258 (1973)), may be added in order to improve the conductivity or substances may be added in order to modify the dielectric anisotropy, the viscosity and/or the alignment of the nematic phases. Substances of this type are described, for example, in DE-A 22 09 127, 22 40 864, 23 21 632, 23 38 281, 24 50 088, 26 37 430 and 28 53 728.

Table B shows possible dopants which can be added to the mixtures according to the invention. If the mixtures comprise a dopant, it is employed in amounts of 0.01-4% by weight, preferably 0.1-1.0% by weight.

TABLE B

Table B indicates possible dopants which are generally added to the mix-

tures according to the invention. The mixture preferably comprises 0-10% by

weight, in particular 0.01-5% by weight and particularly preferably 0.01-3%

by weight, of dopants.

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C 15

CB 15

CM 21

R/S-811

CM 44

CM 45

CM 47

R/S-2011

R/S-3011

R/S-4011

R/S-5011

R/S-1011

TABLE C

Stabilisers which can be added, for example, to the mixtures according to the invention in

amounts of 0-10% by weight are shown below.

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TABLE D

Table D shows example compounds which can preferably be used as

reactive mesogenic compounds in the LC media in accordance with the

present invention. If the mixtures according to the invention comprise one or

more reactive compounds, they are preferably employed in amounts of 0.01-

5% by weight. It may also be necessary to add an initiator or a mixture of two

or more initiators for the polymerisation. The initiator or initiator mixture is

preferably added in amounts of 0.001-2% by weight, based on the mixture. A

suitable initiator is, for example, Irgacure (BASF) or Irganox (BASF).

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RM-1

RM-2

RM-3

RM-4

RM-5

RM-6

RM-7

RM-8

RM-9

RM-10

RM-11

RM-12

RM-13

RM-14

RM-15

RM-16

RM-17

RM-18

RM-19

RM-20

RM-21

RM-22

RM-23

RM-24

RM-25

RM-26

RM-27

RM-28

RM-29

RM-30

RM-31

RM-32

RM-33

RM-34

RM-35

RM-36

RM-37

RM-38

RM-39

RM-40

RM-41

RM-42

RM-43

RM-44

RM-45

RM-46

RM-47

RM-48

RM-49

RM-50

RM-51

RM-52

RM-53

RM-54

RM-55

RM-56

RM-57

RM-58

RM-59

RM-60

RM-61

RM-62

RM-63

RM-64

RM-65

RM-66

RM-67

RM-68

RM-69

RM-70

RM-71

RM-72

RM-73

RM-74

RM-75

RM-76

RM-77

RM-78

RM-79

RM-80

RM-81

RM-82

RM-83

RM-84

RM-85

RM-86

RM-87

RM-88

RM-89

RM-90

RM-91

RM-92

RM-93

RM-94

In a preferred embodiment, the mixtures according to the invention comprise one or more polymerisable compounds, preferably selected from the polymerisable compounds of the formulae RM-1 to RM-94. Media of this type are suitable, in particular, for PS-FFS and PS-IPS applications. Of the reactive mesogens shown in Table D, compounds RM-1, RM-2, RM-3, RM-4, RM-5, RM-11, RM-17, RM-35, RM-41, RM-44, RM-62 and RM-81 are particularly preferred.

WORKING EXAMPLES

The following examples are intended to explain the invention without limiting it. In the examples, m.p. denotes the melting point and C denotes the clearing point of a liquid-crystalline substance in degrees Celsius; boiling temperatures are denoted by m.p. Furthermore: C denotes crystalline solid state, S denotes smectic phase (the index denotes the phase type), N denotes nematic state, Ch denotes cholesteric phase, I denotes isotropic phase, T_gdenotes glass-transition temperature. The number between two symbols indicates the conversion temperature in degrees Celsius an.

The host mixture used for determination of the optical anisotropy Δn of the compounds of the formula I is the commercial mixture ZLI-4792 (Merck KGaA). The dielectric anisotropy Δ∈ is determined using commercial mixture ZLI-2857. The physical data of the compound to be investigated are obtained from the change in the dielectric constants of the host mixture after addition of the compound to be investigated and extrapolation to 100% of the compound employed. In general, 10% of the compound to be investigated are dissolved in the host mixture, depending on the solubility.

Unless indicated otherwise, parts or percent data denote parts by weight or percent by weight.

Above and below:

V_odenotes threshold voltage, capacitive [V] at 20° C.,
n_edenotes extraordinary refractive index at 20° C. and 589 nm,
n_odenotes ordinary refractive index at 20° C. and 589 nm,
Δn denotes optical anisotropy at 20° C. and 589 nm,
∈_⊥ denotes dielectric permittivity perpendicular to the director at 20° C. and 1 kHz,
∈_∥ denotes dielectric permittivity parallel to the director at 20° C. and 1 kHz,
Δ∈ denotes dielectric anisotropy at 20° C. and 1 kHz,
cl.p., T(N,I) denotes clearing point [° C.],
γ₁denotes rotational viscosity measured at 20° C. [mPa·s], determined by the rotation method in a magnetic field,
K₁denotes elastic constant, “splay” deformation at 20° C. [pN],
K₂denotes elastic constant, “twist” deformation at 20° C. [pN],
K₃denotes elastic constant, “bend” deformation at 20° C. [pN],
LTS denotes low-temperature stability (nematic phase), determined in test cells.

Unless explicitly noted otherwise, all values indicated in the present application for temperatures, such as, for example, the melting point T(C,N), the transition from the smectic (S) to the nematic (N) phase T(S,N) and the clearing point T(N,I), are indicated in degrees Celsius (° C.). M.p. denotes melting point, cl.p.=clearing point. Furthermore, Tg=glass state, C=crystalline state, N=nematic phase, S=smectic phase and I=isotropic phase. The numbers between these symbols represent the transition temperatures.

All physical properties are and have been determined in accordance with “Merck Liquid Crystals, Physical Properties of Liquid Crystals”, Status Nov. 1997, Merck KGaA, Germany, and apply for a temperature of 20° C., and Δn is determined at 589 nm and Δ∈ at 1 kHz, unless explicitly indicated otherwise in each case.

The term “threshold voltage” for the present invention relates to the capacitive threshold (V₀), also called the Freedericksz threshold, unless explicitly indicated otherwise. In the examples, as is generally usual, the optical threshold can also be indicated for 10% relative contrast (V₁₀).

The display used for measurement of the capacitive threshold voltage consists of two plane-parallel glass outer plates at a separation of 20 μm, which each have on the insides an electrode layer and an unrubbed polyimide alignment layer on top, which cause a homeotropic edge alignment of the liquid-crystal molecules.

The display or test cell used for measurement of the tilt angle consists of two plane-parallel glass outer plates at a separation of 4 μm, which each have on the insides an electrode layer and a polyimide alignment layer on top, where the two polyimide layers are rubbed antiparallel to one another and cause a homeotropic edge alignment of the liquid-crystal molecules.

The polymerisable compounds are polymerised in the display or test cell by irradiation with UVA light (usually 365 nm) of a defined intensity for a pre-specified time, with a voltage simultaneously being applied to the display (usually 10 V to 30 V alternating current, 1 kHz). In the examples, unless indicated otherwise, a 50 mW/cm²mercury vapour lamp is used, and the intensity is measured using a standard UV meter (make Ushio UNI meter) fitted with a 365 nm band-pass filter.

The tilt angle is determined by a rotational crystal experiment (Autronic-Melchers TBA-105). A low value (i.e. a large deviation from the 90° angle) corresponds to a large tilt here.

The VHR value is measured as follows: 0.3% of a polymerisable monomeric compound are added to the LC host mixture, and the resultant mixture is introduced into TN-VHR test cells (rubbed at 90°, alignment layer TN polyimide, layer thickness d≈6 μm). The HR value is determined after 5 min at 100° C. before and after UV exposure for 2 h (sun test) at 1 V, 60 Hz, 64 μs pulse (measuring instrument: Autronic-Melchers VHRM-105).

In order to investigate the low-temperature stability, also known as “LTS”, i.e. the stability of the LC mixture to spontaneous crystallisation-out of individual components at low temperatures, bottles containing 1 g of LC/RM mixture are stored at −10° C., and it is regularly checked whether the mixtures have crystallised out.

The so-called “HTP” denotes the helical twisting power of an optically active or chiral substance in an LC medium (in μm). Unless indicated otherwise, the HTP is measured in the commercially available nematic LC host mixture MLD-6260 (Merck KGaA) at a temperature of 20° C.

Unless explicitly noted otherwise, all concentrations in the present application are indicated in percent by weight and relate to the corresponding mixture as a whole, comprising all solid or liquid-crystalline components, without solvents. All physical properties are determined in accordance with “Merck Liquid Crystals, Physical Properties of Liquid Crystals”, Status November 1997, Merck KGaA, Germany, and apply for a temperature of 20° C., unless explicitly indicated otherwise.

MIXTURE EXAMPLES
Example M1

CC-3-V
41.00%
Clearing point [° C.]:
74.0

CCY-3-O2
11.00%
Δn [589 nm, 20° C.]:
0.1005

CCY-3-O1
2.50%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O2
4.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CLY-3-O3
4.00%
K₁[pN, 20° C.]:
13.3

CPY-2-O2
4.00%
K₃[pN, 20° C.]:
15.0

CPY-3-O2
11.00%
γ₁[mPa · s, 20° C.]:
87

CY-3-O2
7.50%
V₀[20° C., V]:
2.14

PY-3-O2
12.00%

B-3O-O5
3.00%

Example M2

CC-3-V
42.00%
Clearing point [° C.]:
73.5

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1009

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.5

CCY-4-O2
2.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.5

CY-3-O2
6.50%
γ₁[mPa · s, 20° C.]:
88

PY-3-O2
11.00%
V₀[20° C., V]:
2.14

B-3O-O5
3.00%

Example M3

CC-3-V
43.00%
Clearing point [° C.]:
73.5

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1011

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.6

CCY-4-O2
2.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
13.3

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.7

CY-3-O2
5.00%
γ₁[mPa · s, 20° C.]:
83

PY-3-O2
11.00%
V₀[20° C., V]:
2.14

B-3O-O5
4.00%

Example M4

CC-3-V
40.50%
Clearing point [° C.]:
74.0

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1005

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.6

CCY-4-O2
3.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.6

CY-3-O2
8.00%
γ₁[mPa · s, 20° C.]:
88

PY-3-O2
11.00%
V₀[20° C., V]:
2.14

B-3O-O4
2.00%

Example M5

CC-3-V
42.00%
Clearing point [° C.]:
73.5

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1011

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.6

CCY-4-O2
2.50%
ε_∥ [1 kHz, 20° C.]:
3.7

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.6

CY-3-O2
6.50%
γ₁[mPa · s, 20° C.]:
85

PY-3-O2
11.00%
V₀[20° C., V]:
2.14

B-2O-O4
3.00%

Example M6

CC-3-V
42.00%
Clearing point [° C.]:
73.5

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1001

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.5

CCY-4-O2
2.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
13.0

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.5

CY-3-O2
6.50%
γ₁[mPa · s, 20° C.]:
84

PY-3-O2
11.00%
V₀[20° C., V]:
2.15

B-3O-O6
3.00%

Example M7

CC-3-V
42.00%
Clearing point [° C.]:
73.5

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1007

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.5

CCY-4-O2
2.50%
ε_∥ [1 kHz, 20° C.]:
3.7

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.6

CY-3-O2
6.50%
γ₁[mPa · s, 20° C.]:
84

PY-3-O2
11.00%
V₀[20° C., V]:
2.15

B-2O-O5
3.00%

Example M8

CC-3-V
45.50%
Clearing point [° C.]:
73.0

CCY-3-O1
3.00%
Δn [589 nm, 20° C.]:
0.1011

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.5

CCY-4-O2
3.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
7.50%
K₁[pN, 20° C.]:
13.1

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.3

CY-3-O2
2.00%
γ₁[mPa · s, 20° C.]:
79

PY-3-O2
11.50%
V₀[20° C., V]:
2.15

B-2O-O5
6.00%

Example M9

CC-3-V
42.00%
Clearing point [° C.]:
73.5

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.0993

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.5

CCY-4-O2
2.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.5

CY-3-O2
6.50%
γ₁[mPa · s, 20° C.]:
84

PY-3-O2
11.00%
V₀[20° C., V]:
2.14

B-3O-O3
3.00%

Example M10

CC-3-V
45.50%
Clearing point [° C.]:
73.5

CCY-3-O1
3.00%
Δn [589 nm, 20° C.]:
0.1009

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.5

CCY-4-O2
3.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
8.50%
K₁[pN, 20° C.]:
13.2

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.3

CY-3-O2
2.00%
γ₁[mPa · s, 20° C.]:
80

PY-3-O2
11.00%
V₀[20° C., V]:
2.15

B-2O-O5
3.00%

B-3O-O5
3.00%

Example M11

CC-3-V
35.50%
Clearing point [° C.]:
73.0

CCY-3-O1
6.00%
Δn [589 nm, 20° C.]:
0.1006

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−4.4

CCY-4-O2
6.50%
ε_∥ [1 kHz, 20° C.]:
3.9

CPY-2-O2
4.00%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.6

CY-3-O2
12.00%
γ₁[mPa · s, 20° C.]:
99

PY-3-O2
10.00%
V₀[20° C., V]:
1.93

B-3O-O5
2.50%

B-3O-O4
2.50%

Example M12

CC-3-V
34.50%
Clearing point [° C.]:
75.0

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1084

CCY-3-O1
6.00%
Δε [1 kHz, 20° C.]:
−3.1

CCY-3-O2
11.50%
ε_∥ [1 kHz, 20° C.]:
3.5

CCY-4-O2
3.50%
K₁[pN, 20° C.]:
14.3

CPY-3-O2
11.50%
K₃[pN, 20° C.]:
15.9

PY-3-O2
16.00%
γ₁[mPa · s, 20° C.]:
87

PYP-2-3
3.00%
V₀[20° C., V]:
2.40

PP-1-2V1
3.00%

B-3O-O5
3.00%

Example M13

CC-3-V
34.50%
Clearing point [° C.]:
75.0

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1075

CCY-3-O1
7.00%
Δε [1 kHz, 20° C.]:
−3.1

CCY-3-O2
11.50%
ε_∥ [1 kHz, 20° C.]:
3.5

CCY-4-O2
3.50%
K₁[pN, 20° C.]:
14.7

CPY-3-O2
11.50%
K₃[pN, 20° C.]:
16.4

PY-3-O2
13.00%
γ₁[mPa · s, 20° C.]:
84

PP-1-2V1
6.00%
V₀[20° C., V]:
2.41

B-2O-O5
5.00%

Example M14

CC-V-V
37.00%
Clearing point [° C.]:
73.5

CC-V-V1
10.00%
Δn [589 nm, 20° C.]:
0.1026

CCVC-V-V
7.00%
Δε [1 kHz, 20° C.]:
−3.0

CCVC-3-V
7.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CCC-2-V
3.00%
K₁[pN, 20° C.]:
11.8

CCC-3-V
4.00%
K₃[pN, 20° C.]:
11.9

B-4O-O4
3.00%
γ₁[mPa · s, 20° C.]:
57

B-3O-O4
8.50%
V₀[20° C., V]:
2.10

B-3O-O5
8.50%

PB-3-O4
7.00%

CB-3-O4
5.00%

Example M15

CC-V-V
18.00%
Clearing point [° C.]:
77.8

CC-3-V
21.00%
Δn [589 nm, 20° C.]:
0.1040

CC-V-V1
10.00%
Δε [1 kHz, 20° C.]:
−3.2

CCVC-V-V
7.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CCVC-3-V
7.00%
K₁[pN, 20° C.]:
13.3

CCC-2-V
2.00%
K₃[pN, 20° C.]:
12.2

CCC-3-V
3.00%
γ₁[mPa · s, 20° C.]:
64

B-4O-O4
3.00%
V₀[20° C., V]:
2.07

B-3O-O4
8.50%

B-3O-O5
8.50%

PB-3-O4
7.00%

CB-3-O4
5.00%

Example M16

CC-V-V
38.00%
Clearing point [° C.]:
74.0

CCVC-V-V
5.00%
Δn [589 nm, 20° C.]:
0.1119

CCVC-3-V
10.00%
Δε [1 kHz, 20° C.]:
−4.8

CCC-2-V
3.00%
ε_|| [1 kHz, 20° C.]:
4.3

CCC-3-V
4.00%
K₁[pN, 20° C.]:
12.3

B-4O-O4
2.00%
K₃[pN, 20° C.]:
11.0

B-3O-O4
5.00%
γ₁[mPa · s, 20° C.]:
76

B-3O-O5
7.00%
V₀[20° C., V]:
1.60

PB-3-O4
6.00%

CB-3-O4
7.00%

B-2O-O5
8.00%

B-2O-O6
5.00%

Example M17

CC-V-V
25.00%
Clearing point [° C.]:
81.0

CCVC-V-V
4.00%
Δn [589 nm, 20° C.]:
0.1068

CCVC-3-V
9.00%
Δε [1 kHz, 20° C.]:
−4.2

CCC-2-V
3.00%
ε_|| [1 kHz, 20° C.]:
4.1

CCC-3-V
3.00%
K₁[pN, 20° C.]:
14.6

B-3O-O4
4.00%
K₃[pN, 20° C.]:
11.8

B-3O-O5
5.00%
γ₁[mPa · s, 20° C.]:
90

PB-3-O4
4.00%
V₀[20° C., V]:
1.70

CB-3-O4
7.00%

B-2O-O5
6.00%

B-2O-O6
5.00%

B-2O-O4
3.00%

B-1O-O4
3.00%

CCOC-3-3
3.00%

CCH-23
3.00%

CCH-34
10.00%

CCOC-4-3
3.00%

Example M18

CC-V-V
28.00%
Clearing point [° C.]:
55.5

CCVC-V-V
5.00%
Δε [1 kHz, 20° C.]:
−7.6

CCVC-3-V
10.00%
ε_|| [1 kHz, 20° C.]:
5.8

CCC-2-V
3.00%
K₁[pN, 20° C.]:
11.1

CCC-3-V
3.00%
K₃[pN, 20° C.]:
8.6

B-4O-O4
3.00%
γ₁[mPa · s, 20° C.]:
90

B-3O-O4
4.00%
V₀[20° C., V]:
1.12

B-3O-O5
3.00%

B-4O-O5
3.00%

B-2O-O4
3.00%

B-2O-O5
5.00%

B-2O-O6
3.00%

B-1O-O5
3.00%

B-3O-O3
4.00%

B-3O-O6
3.00%

B-1O-O4
5.00%

B-2O-O5i
5.00%

CCP-V-1
7.00%

Example M19

CC-V-V
35.00%
Clearing point [° C.]:
67.5

CCVC-V-V
5.00%
Δε [1 kHz, 20° C.]:
−6.2

CCVC-3-V
8.00%
ε_|| [1 kHz, 20° C.]:
4.8

CCC-2-V
3.00%
K₁[pN, 20° C.]:
11.9

CCC-3-V
4.00%
K₃[pN, 20° C.]:
9.6

B-4O-O4
2.00%
γ₁[mPa · s, 20° C.]:
86

B-3O-O4
5.00%
V₀[20° C., V]:
1.32

B-3O-O5
7.00%

PB-3-O4
6.00%

CB-3-O4
7.00%

B-2O-O5
8.00%

B-2O-O6
5.00%

B-3O-O3
5.00%

Example M20

CC-3-V
10.00%
Clearing point [° C.]:
74.5

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1078

CCH-23
10.00%
Δε [1 kHz, 20° C.]:
−3.3

CCH-34
5.00%
ε_|| [1 kHz, 20° C.]:
3.5

CCP-3-1
7.00%
K₁[pN, 20° C.]:
14.6

CCY-3-O1
5.00%
K₃[pN, 20° C.]:
15.7

CCY-3-O2
11.00%
γ₁[mPa · s, 20° C.]:
101

CCY-4-O2
4.50%
V₀[20° C., V]:
2.32

CPY-3-O2
3.00%

CY-3-O2
12.00%

PY-3-O2
8.50%

PYP-2-3
8.00%

B-2O-O5
4.00%

PP-1-2V1
4.00%

Example M21

CC-3-V
15.00%
Clearing point [° C.]:
74.0

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1078

CCH-23
10.00%
Δε [1 kHz, 20° C.]:
−3.1

CCH-34
7.00%
ε_|| [1 kHz, 20° C.]:
3.5

CCY-3-O1
8.00%
K₁[pN, 20° C.]:
14.6

CCY-3-O2
11.00%
K₃[pN, 20° C.]:
15.1

CCY-4-O2
3.50%
γ₁[mPa · s, 20° C.]:
94

CPY-3-O2
6.00%
V₀[20° C., V]:
2.32

CY-3-O2
5.50%

PY-3-O2
10.00%

PYP-2-3
8.00%

B-2O-O5
4.00%

PP-1-2V1
4.00%

Example M22

CC-3-V
42.50%
Clearing point [° C.]:
75.0

CCP-3-1
4.50%
Δn [589 nm, 20° C.]:
0.0984

CCY-3-O1
9.00%
Δε [1 kHz, 20° C.]:
−3.2

CCY-3-O2
11.00%
ε_|| [1 kHz, 20° C.]:
3.6

CPY-3-O2
8.00%
K₁[pN, 20° C.]:
13.5

CPY-2-O2
4.50%
K₃[pN, 20° C.]:
15.1

CY-3-O2
3.00%
γ₁[mPa · s, 20° C.]:
81

PY-3-O2
13.50%
V₀[20° C., V]:
2.29

B-2O-O5
4.00%

Example M23

CC-3-V
45.00%
Clearing point [° C.]:
75.0

CCP-3-1
3.00%
Δn [589 nm, 20° C.]:
0.0991

CCY-3-O1
8.50%
Δε [1 kHz, 20° C.]:
−3.3

CCY-3-O2
11.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCY-4-O2
1.50%
K₁[pN, 20° C.]:
13.8

CPY-3-O2
11.50%
K₃[pN, 20° C.]:
15.3

PY-3-O2
12.50%
γ₁[mPa · s, 20° C.]:
80

B-2O-O5
4.00%
V₀[20° C., V]:
2.28

B-3-O2
3.00%

Example M24

CC-3-V1
8.00%
Clearing point [° C.]:
74.0

CCH-23
18.00%
Δn [589 nm, 20° C.]:
0.0978

CCH-34
3.00%
Δε [1 kHz, 20° C.]:
−3.4

CCH-35
4.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCP-3-1
14.00%
K₁[pN, 20° C.]:
14.9

CCY-3-O2
11.00%
K₃[pN, 20° C.]:
16.1

CCY-3-O1
2.00%
γ₁[mPa · s, 20° C.]:
102

CPY-3-O2
11.00%
V₀[20° C., V]:
2.28

CY-3-O2
10.50%

PY-3-O2
12.50%

B-2O-O5
3.00%

Y-4O-O4
3.00%

Example M25

CC-3-V1
7.00%
Clearing point [° C.]:
73.0

CCH-23
18.00%
Δn [589 nm, 20° C.]:
0.0969

CCH-34
3.00%
Δε [1 kHz, 20° C.]:
−3.4

CCH-35
4.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCP-3-1
14.00%
K₁[pN, 20° C.]:
14.6

CCY-3-O2
11.00%
K₃[pN, 20° C.]:
15.8

CCY-3-O1
3.00%
γ₁[mPa · s, 20° C.]:
102

CPY-3-O2
11.00%
V₀[20° C., V]:
2.29

CY-3-O2
12.00%

PY-3-O2
11.00%

Y-4O-O4
3.00%

B-2-O2
3.00%

Example M26

CC-V-V
31.50%
Clearing point [° C.]:
75.0

CCP-3-1
5.00%
Δn [589 nm, 20° C.]:
0.0949

CCY-2-1
12.00%
Δε [1 kHz, 20° C.]:
−3.8

CCY-3-O1
7.50%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
8.00%
K₁[pN, 20° C.]:
11.4

CLY-3-O2
5.50%
K₃[pN, 20° C.]:
14.2

CLY-3-O3
4.00%
γ₁[mPa · s, 20° C.]:
88

CPY-2-O2
4.50%
V₀[20° C., V]:
2.04

CPY-3-O2
3.00%

CY-3-O2
11.00%

PY-1-O4
4.00%

B-2O-O5
4.00%

Example M27

CC-3-V
36.50%
Clearing point [° C.]:
80.0

CCY-3-O1
6.00%
Δn [589 nm, 20° C.]:
0.1028

CCY-3-O2
6.00%
Δε [1 kHz, 20° C.]:
−4.4

CCY-4-O2
2.50%
ε_|| [1 kHz, 20° C.]:
3.8

CLY-3-O2
7.00%
K₁[pN, 20° C.]:
14.2

CLY-3-O3
3.00%
K₃[pN, 20° C.]:
15.9

CPY-2-O2
7.00%
γ₁[mPa · s, 20° C.]:
108

CPY-3-O2
10.00%
V₀[20° C., V]:
2.01

CY-3-O2
11.50%

PY-3-O2
5.50%

B-2O-O5
5.00%

Example M28

CY-3-O2
9.00%
Clearing point [° C.]:
87.0

CY-3-O4
7.00%
Δn [589 nm, 20° C.]:
0.1026

PY-3-O2
3.00%
Δε [1 kHz, 20° C.]:
−4.9

CCY-3-O1
8.00%
ε_|| [1 kHz, 20° C.]:
3.9

CCY-3-O2
11.00%
K₁[pN, 20° C.]:
14.5

CCY-4-O2
10.00%
K₃[pN, 20° C.]:
16.7

CPY-2-O2
6.50%
γ₁[mPa · s, 20° C.]:
142

CPY-3-O2
12.00%
V₀[20° C., V]:
1.95

CC-3-V
29.50%

B-2O-O5
4.00%

Example M29

CY-3-O2
12.50%
Clearing point [° C.]:
87.0

CCY-3-O1
9.00%
Δn [589 nm, 20° C.]:
0.1025

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−4.8

CCY-4-O2
7.00%
ε_|| [1 kHz, 20° C.]:
3.8

CPY-3-O2
3.00%
K₁[pN, 20° C.]:
14.1

CC-3-V
31.00%
K₃[pN, 20° C.]:
16.8

B-2O-O5
4.00%
γ₁[mPa · s, 20° C.]:
127

PY-V2-O2
5.50%
V₀[20° C., V]:
1.97

CPY-V-O2
6.00%

CPY-V-O4
5.00%

CCY-V-O2
6.00%

Example M30

CC-3-V
34.50%
Clearing point [° C.]:
74.0

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1072

CCY-3-O1
5.50%
Δε [1 kHz, 20° C.]:
−3.0

CCY-3-O2
11.50%
ε_|| [1 kHz, 20° C.]:
3.5

PY-3-O2
7.50%
K₁[pN, 20° C.]:
14.0

PP-1-2V1
7.00%
K₃[pN, 20° C.]:
15.8

B-2O-O5
4.00%
γ₁[mPa · s, 20° C.]:
78

PY-V2-O2
5.00%
V₀[20° C., V]:
2.43

CPY-V-O2
6.00%

CPY-V-O4
5.00%

CCY-V-O2
6.00%

Example M31

CC-3-V
42.00%
Clearing point [° C.]:
74.5

CCP-3-1
5.00%
Δn [589 nm, 20° C.]:
0.0997

CCY-3-O1
3.00%
Δε [1 kHz, 20° C.]:
−3.3

CCY-3-O2
11.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCY-V-O2
6.00%
K₁[pN, 20° C.]:
13.0

CPY-V-O2
6.50%
K₃[pN, 20° C.]:
14.9

CPY-V-O4
5.00%
γ₁[mPa · s, 20° C.]:
75

CY-3-O2
3.50%
V₀[20° C., V]:
2.26

PY-3-O2
5.00%

B-2O-O5
4.00%

PY-V2-O2
9.00%

Example M32

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M1 are mixed with 0.3% of the polymerisable compound of the formula

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Example M33

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M1 are mixed with 0.25% of the polymerisable compound of the

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Example M34

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M1 are mixed with 0.2% of the polymerisable compound of the formula

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Example M35

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M1 are mixed with 0.25% of the polymerisable compound of the formula

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Example M36

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M1 are mixed with 0.25% of the polymerisable compound of the formula

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Example M37

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M1 are mixed with 0.3% of the polymerisable compound of the formula

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Example M38

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M1 are mixed with 0.2% of the polymerisable compound of the formula

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Example M39

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M1 are mixed with 0.2% of the polymerisable compound of the formula

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Example M40

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M2 are mixed with 0.25% of the polymerisable compound of the formula

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Example M41

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M2 are mixed with 0.3% of the polymerisable compound of the formula

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Example M42

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M2 are mixed with 0.3% of the polymerisable compound of the formula

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Example M43

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M2 are mixed with 0.25% of the polymerisable compound of the formula

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Example M44

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M2 are mixed with 0.3% of the polymerisable compound of the formula

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Example M45

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M2 are mixed with 0.25% of the polymerisable compound of the formula

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Example M46

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M2 are mixed with 0.25% of the polymerisable compound of the formula

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Example M47

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M2 are mixed with 0.25% of the polymerisable compound of the formula

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Example M48

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M3 are mixed with 0.25% of the polymerisable compound of the formula

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Example M49

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M3 are mixed with 0.3% of the polymerisable compound of the formula

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Example M50

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M3 are mixed with 0.3% of the polymerisable compound of the

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Example M51

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M3 are mixed with 0.3% of the polymerisable compound of the formula

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Example M52

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M3 are mixed with 0.3% of the polymerisable compound of the formula

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Example M53

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M3 are mixed with 0.3% of the polymerisable compound of the

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Example M54

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M4 are mixed with 0.3% of the polymerisable compound of the formula

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Example M55

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M4 are mixed with 0.25% of the polymerisable compound of the formula

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Example M56

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M17 are mixed with 0.25% of the polymerisable compound of the

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Example M57

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M21 are mixed with 0.3% of the polymerisable compound of the formula

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Example M58

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M25 are mixed with 0.25% of the polymerisable compound of the formula

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Example M59

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M28 are mixed with 0.25% of the polymerisable compound of the

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Example M60

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M29 are mixed with 0.3% of the polymerisable compound of the formula

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Example M61

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M30 are mixed with 0.25% of the polymerisable compound of the formula

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Example M62

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M31 are mixed with 0.2% of the polymerisable compound of the formula

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Example M63

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M19 are mixed with 0.25% of the polymerisable compound of the formula

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Example M64

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M20 are mixed with 0.25% of the polymerisable compound of the formula

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Example M65

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M27 are mixed with 0.25% of the polymerisable compound of the formula

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Example M66

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M27 are mixed with 0.25% of the polymerisable compound of the formula

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Example M67

CC-3-V
17.00%
Clearing point [° C.]:
75.5

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.1079

CC-3-V1
8.00%
ε_|| [1 kHz, 20° C.]:
3.4

CCY-3-O1
6.00%
ε_⊥ [1 kHz, 20° C.]:
6.1

CCY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−2.7

CCY-4-O2
2.50%
K₁[pN, 20° C.]:
12.5

CPY-2-O2
5.50%
K₃[pN, 20° C.]:
14.8

CPY-3-O2
11.50%
V₀[pN, 20° C.]:
2.45

PY-3-O2
8.50%
γ₁[mPa · s, 20° C.]:
75

PYP-2-3
5.00%

PP-1-2V1
3.00%

B-3O-O5
3.00%

Example M68

CC-3-V
20.50%
Clearing point [° C.]:
74.5

CC-V-V
15.00%
Δn [589 nm, 20° C.]:
0.1095

CC-3-V1
8.00%
ε_|| [1 kHz, 20° C.]:
3.5

CLY-3-O2
6.00%
ε_⊥ [1 kHz, 20° C.]:
6.3

CCY-3-O2
11.50%
Δε [1 kHz, 20° C.]:
−2.9

CCY-4-O2
4.00%
K₁[pN, 20° C.]:
13.5

CPY-3-O2
7.50%
K₃[pN, 20° C.]:
15.2

BCH-32
3.50%
V₀[pN, 20° C.]:
2.43

PY-3-O2
11.50%
γ₁[mPa · s, 20° C.]:
77

PGIY-2-O4
4.50%

PP-1-2V1
4.00%

B-2O-O5
4.00%

Example M69

CC-V-V
36.00%
Clearing point [° C.]:
75

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1076

CLY-3-O2
6.00%
ε_|| [1 kHz, 20° C.]:
3.4

CCY-3-O2
11.50%
ε_⊥ [1 kHz, 20° C.]:
6.0

CCY-4-O2
5.00%
Δε [1 kHz, 20° C.]:
−2.7

CPY-3-O2
7.50%
K₁[pN, 20° C.]:
12.0

BCH-32
7.00%
K₃[pN, 20° C.]:
14.3

PY-3-O2
8.00%
V₀[pN, 20° C.]:
2.46

PGIY-2-O4
4.50%
γ₁[mPa · s, 20° C.]:
70

PP-1-2V1
2.50%

B-2O-O5
4.00%

Example M70

CC-V-V
34.00%
Clearing point [° C.]:
75.5

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1085

CCY-3-O1
7.00%
ε_|| [1 kHz, 20° C.]:
3.4

CCY-3-O2
11.50%
ε_⊥ [1 kHz, 20° C.]:
6.1

CCY-4-O2
5.00%
Δε [1 kHz, 20° C.]:
−2.7

CPY-3-O2
7.50%
K₁[pN, 20° C.]:
12.0

BCH-32
7.00%
K₃[pN, 20° C.]:
14.4

PY-3-O2
8.00%
V₀[pN, 20° C.]:
2.44

PGIY-2-O4
4.50%
γ₁[mPa · s, 20° C.]:
74

PP-1-2V1
3.50%

B-2O-O5
4.00%

Example M71

CC-3-V
9.50%
Clearing point [° C.]:
74.0

CC-V-V
29.00%
Δn [589 nm, 20° C.]:
0.0989

CCP-3-1
10.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCY-3-O1
8.50%
ε_⊥ [1 kHz, 20° C.]:
6.7

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.2

CPY-2-O2
2.00%
K₁[pN, 20° C.]:
11.8

CPY-3-O2
11.00%
K₃[pN, 20° C.]:
14.8

CY-3-O2
5.00%
V₀[pN, 20° C.]:
2.28

PY-3-O2
10.00%
γ₁[mPa · s, 20° C.]:
76

B-2O-O5
4.00%

Example M72

CC-3-V
15.50%
Clearing point [° C.]:
74.5

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.1075

CC-3-V1
8.00%
ε_|| [1 kHz, 20° C.]:
3.5

CCY-3-O1
8.00%
ε_⊥ [1 kHz, 20° C.]:
6.5

CCY-3-O2
11.50%
Δε [1 kHz, 20° C.]:
−3.0

CCY-4-O2
4.50%
K₁[pN, 20° C.]:
12.9

CPY-3-O2
8.50%
K₃[pN, 20° C.]:
15.0

PY-2-O2
6.50%
V₀[pN, 20° C.]:
2.35

PGIY-2-O4
5.00%
γ₁[mPa · s, 20° C.]:
76

PP-1-2V1
6.50%
LTS bulk [−20° C.]:
>1000 h

B(S)-2O-O5
3.00%

B-2O-O5
3.00%

Example M73

CC-3-V
17.50%
Clearing point [° C.]:
74

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.1074

CC-3-V1
8.00%
ε_|| [1 kHz, 20° C.]:
3.5

CCY-3-O1
8.00%
ε_⊥ [1 kHz, 20° C.]:
6.4

CCY-3-O2
12.00%
Δε [1 kHz, 20° C.]:
−2.9

CPY-3-O2
12.00%
K₁[pN, 20° C.]:
12.7

PY-2-O2
6.00%
K₃[pN, 20° C.]:
15.1

PGIY-2-O4
4.50%
V₀[pN, 20° C.]:
2.41

PP-1-2V1
6.00%
γ₁[mPa · s, 20° C.]:
72

B(S)-2O-O5
3.00%

B-2O-O5
3.00%

Example M74

CC-3-V
22.00%
Clearing point [° C.]:
76

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.0946

CCY-3-O1
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
12.00%
ε_⊥ [1 kHz, 20° C.]:
7.5

CCY-4-O2
2.50%
Δε [1 kHz, 20° C.]:
−3.9

CLY-3-O2
6.00%
K₁[pN, 20° C.]:
12.4

CLY-3-O3
9.50%
K₃[pN, 20° C.]:
14.3

CPY-3-O2
1.50%
V₀[pN, 20° C.]:
2.04

CY-3-O2
2.50%
γ₁[mPa · s, 20° C.]:
78

B-2O-O5
3.00%

B(S)-2O-O5
3.00%

PY-2-O2
10.00%

Example M75

CC-3-V
20.50%
Clearing point [° C.]:
76

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.0945

CCY-3-O1
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
11.50%
ε_⊥ [1 kHz, 20° C.]:
7.6

CCY-4-O2
4.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-2-O2
6.00%
K₁[pN, 20° C.]:
11.9

CPY-3-O2
11.00%
K₃[pN, 20° C.]:
14.7

CY-3-O2
13.50%
V₀[pN, 20° C.]:
2.05

B-2O-O5
3.00%
γ₁[mPa · s, 20° C.]:
84

B(S)-2O-O5
2.50%

Example M76

CC-3-V
19.50%
Clearing point [° C.]:
75.5

CC-V-V
23.00%
Δn [589 nm, 20° C.]:
0.0989

CCP-3-1
5.50%
ε_|| [1 kHz, 20° C.]:
3.5

CCY-3-O1
8.00%
ε_⊥ [1 kHz, 20° C.]:
6.6

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.1

CCY-4-O2
4.00%
K₁[pN, 20° C.]:
12.2

CPY-3-O2
12.00%
K₃[pN, 20° C.]:
14.8

PY-3-O2
13.00%
V₀[pN, 20° C.]:
2.30

B-2O-O5
4.00%
γ₁[mPa · s, 20° C.]:
75

Example M77

CC-V-V
15.00%
Clearing point [° C.]:
74.5

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1071

CCH-23
6.50%
ε_|| [1 kHz, 20° C.]:
3.6

CCH-34
4.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CCP-3-1
16.00%
Δε [1 kHz, 20° C.]:
−3.2

CCY-3-O1
4.50%
K₁[pN, 20° C.]:
13.4

CCY-3-O2
12.00%
K₃[pN, 20° C.]:
15.0

CY-3-O2
8.50%
V₀[pN, 20° C.]:
2.29

PY-3-O2
11.50%
γ₁[mPa · s, 20° C.]:
88

PYP-2-3
8.00%

B-2O-O5
4.00%

B(S)-2O-O5
3.00%

Example M78

CC-3-V
23.00%
Clearing point [° C.]:
74.5

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.0974

CCP-3-1
5.00%
ε_|| [1 kHz, 20° C.]:
3.5

CCY-3-O1
7.50%
ε_⊥ [1 kHz, 20° C.]:
6.6

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.1

CCY-4-O2
5.00%
K₁[pN, 20° C.]:
12.3

CPY-3-O2
11.00%
K₃[pN, 20° C.]:
14.7

PY-3-O2
13.50%
V₀[pN, 20° C.]:
2.30

B-2O-O5
4.00%
γ₁[mPa · s, 20° C.]:
74

Example M79

BCH-32
8.50%
Clearing point [° C.]:
73.0

CC-3-V
15.00%
Δn [589 nm, 20° C.]:
0.1052

CC-V-V
14.00%
ε_|| [1 kHz, 20° C.]:
3.4

CCP-3-1
11.00%
ε_⊥ [1 kHz, 20° C.]:
6.0

CCY-3-O1
7.00%
Δε [1 kHz, 20° C.]:
−2.6

CCY-3-O2
8.50%
K₁[pN, 20° C.]:
12.5

CPY-3-O2
7.00%
K₃[pN, 20° C.]:
14.7

CY-3-O2
17.00%
V₀[pN, 20° C.]:
2.53

PP-1-3
7.00%
γ₁[mPa · s, 20° C.]:
79

B-2O-O5
4.00%

PYP-2-3
1.00%

Example M80

CC-V-V
31.50%
Clearing point [° C.]:
75.0

CCP-3-1
5.00%
Δn [589 nm, 20° C.]:
0.0949

CCY-2-1
12.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O1
7.50%
ε_⊥ [1 kHz, 20° C.]:
7.5

CCY-3-O2
8.00%
Δε [1 kHz, 20° C.]:
−3.8

CLY-3-O2
5.50%
K₁[pN, 20° C.]:
11.4

CLY-3-O3
4.00%
K₃[pN, 20° C.]:
14.2

CPY-2-O2
4.50%
V₀[pN, 20° C.]:
2.04

CPY-3-O2
3.00%
γ₁[mPa · s, 20° C.]:
88

CY-3-O2
11.00%

PY-1-O4
4.00%

B-2O-O5
4.00%

Example M81

CC-V-V
31.50%
Clearing point [° C.]:
74.5

CCP-3-1
4.00%
Δn [589 nm, 20° C.]:
0.0945

CCY-2-1
12.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O1
7.50%
ε_⊥ [1 kHz, 20° C.]:
7.6

CCY-3-O2
11.50%
Δε [1 kHz, 20° C.]:
−3.8

CLY-3-O2
5.00%
K₁[pN, 20° C.]:
11.2

CPY-3-O2
4.50%
K₃[pN, 20° C.]:
14.4

CY-3-O2
14.00%
V₀[pN, 20° C.]:
2.05

PY-4-O2
2.00%
γ₁[mPa · s, 20° C.]:
90

PGIY-2-O4
3.00%

B-2O-O5
4.00%

CCPC-33
1.00%

Example M82

CC-3-V
14.50%
Clearing point [° C.]:
74

CC-V-V
20.00%
Δn [589 nm, 20° C.]:
0.1074

CC-3-V1
8.00%
Δε [1 kHz, 20° C.]:
−3.0

CCY-3-O1
5.50%
K₁[pN, 20° C.]:
12.7

CCY-3-O2
11.50%
K₃[pN, 20° C.]:
15.4

CPY-3-O2
4.00%
V₀[pN, 20° C.]:
2.42

PY-3-O2
3.50%
γ₁[mPa · s, 20° C.]:
73

PP-1-2V1
7.00%

B-2O-O5
4.00%

PY-V2-O2
5.00%

CPY-V-O2
6.00%

CPY-V-O4
5.00%

CCY-V-O2
6.00%

Example M83

CCP-V-1
4.00%
Clearing point [° C.]:
92.5

CCY-3-O2
7.50%
Δn [589 nm, 20° C.]:
0.1074

CLY-3-O2
8.00%
Δε [1 kHz, 20° C.]:
−2.5

CLY-3-O3
5.00%
ε_|| [1 kHz, 20° C.]:
3.2

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
5.7

PGIY-2-O4
5.00%
K₁[pN, 20° C.]:
16.4

PYP-2-3
6.00%
K₃[pN, 20° C.]:
18.0

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.82

CC-3-V
41.50%
γ₁[mPa · s, 20° C.]:
96

CC-3-V1
8.00%

Example M84

CLY-3-O2
10.00%
Clearing point [° C.]:
80

CLY-3-O3
1.50%
Δn [589 nm, 20° C.]:
0.1080

CPY-2-O2
4.00%
Δε [1 kHz, 20° C.]:
−2.4

CPY-3-O2
10.00%
ε_|| [1 kHz, 20° C.]:
3.3

PGIY-2-O4
5.00%
ε_⊥ [1 kHz, 20° C.]:
5.7

PYP-2-3
8.00%
K₁[pN, 20° C.]:
14.0

B-2O-O5
4.50%
K₃[pN, 20° C.]:
15.8

CC-3-V
44.50%
V₀[pN, 20° C.]:
2.68

CC-3-V1
8.00%
γ₁[mPa · s, 20° C.]:
80

CY-3-O2
2.50%

CY-5-O2
2.00%

Example M85

CCP-V2-1
5.00%
Clearing point [° C.]:
79.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1079

CPY-3-O2
9.00%
Δε [1 kHz, 20° C.]:
−2.0

PGIY-2-O4
2.50%
ε_|| [1 kHz, 20° C.]:
3.2

PYP-2-3
8.00%
ε_⊥ [1 kHz, 20° C.]:
5.3

PYP-2-4
5.00%
K₁[pN, 20° C.]:
14.4

B-2O-O5
4.00%
K₃[pN, 20° C.]:
15.5

CC-3-V
43.00%
V₀[pN, 20° C.]:
2.92

CC-3-V1
7.50%
γ₁[mPa · s, 20° C.]:
75

CY-3-O2
6.00%

Example M86

CCY-3-O1
4.00%
Clearing point [° C.]:
79.8

CCY-3-O2
8.50%
Δn [589 nm, 20° C.]:
0.1013

CCY-4-O2
5.00%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O2
10.00%
ε_|| [1 kHz, 20° C.]:
3.6

CLY-3-O3
4.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

PGIY-2-O4
5.00%
K₁[pN, 20° C.]:
14.7

PYP-2-3
1.00%
K₃[pN, 20° C.]:
16.3

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.20

CC-3-V
34.50%
γ₁[mPa · s, 20° C.]:
97

CC-3-V1
8.50%

CY-3-O2
5.00%

PY-3-O2
9.50%

Example M87

CCY-3-O2
7.00%
Clearing point [° C.]:
80

CCY-4-O2
2.00%
Δn [589 nm, 20° C.]:
0.1009

CLY-3-O2
8.00%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O3
4.00%
ε_|| [1 kHz, 20° C.]:
3.6

CPY-2-O2
3.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

CPY-3-O2
8.00%
K₁[pN, 20° C.]:
14.4

PGIY-2-O4
5.00%
K₃[pN, 20° C.]:
16.4

PYP-2-3
1.00%
V₀[pN, 20° C.]:
2.21

B-2O-O5
5.00%
γ₁[mPa · s, 20° C.]:
99

CC-3-V
35.00%

CC-3-V1
8.00%

CY-3-O2
12.00%

CY-5-O2
2.00%

Example M88

CY-3-O2
4.00%
Clearing point [° C.]:
100

CY-3-O4
18.00%
Δn [589 nm, 20° C.]:
0.0955

CCY-3-O1
5.00%
Δε [1 kHz, 20° C.]:
−5.0

CCY-3-O2
6.00%
ε_|| [1 kHz, 20° C.]:
3.8

CCY-3-O3
6.00%
ε_⊥ [1 kHz, 20° C.]:
8.8

CCY-4-O2
6.00%
K₁[pN, 20° C.]:
15.2

CLY-3-O2
2.50%
K₃[pN, 20° C.]:
16.0

CPY-2-O2
8.00%
V₀[pN, 20° C.]:
1.90

CC-4-V
18.00%
γ₁[mPa · s, 20° C.]:
226

CC-5-V
4.00%

CH-33
3.00%

CH-35
3.00%

CCPC-33
4.50%

CCPC-34
4.50%

B-2O-O5
7.50%

Example M89

CCY-3-O1
8.00%
Clearing point [° C.]:
81.5

CCY-4-O2
6.00%
Δn [589 nm, 20° C.]:
0.1075

CLY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.1

CPY-3-O2
10.50%
ε_|| [1 kHz, 20° C.]:
3.5

PYP-2-3
9.00%
ε_⊥ [1 kHz, 20° C.]:
6.6

B-2O-O5
5.00%
K₁[pN, 20° C.]:
14.3

CC-3-V
45.00%
K₃[pN, 20° C.]:
15.7

PY-3-O2
5.00%
V₀[pN, 20° C.]:
2.38

Y-4O-O4
1.50%
γ₁[mPa · s, 20° C.]:
90

Example M90

CC-3-V
35.00%
Clearing point [° C.]:
86

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1208

CCY-3-O2
7.50%
Δε [1 kHz, 20° C.]:
−4.2

CLY-3-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.8

CPY-2-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
8.0

CPY-3-O2
10.00%
K₁[pN, 20° C.]:
14.3

PY-3-O2
12.50%
K₃[pN, 20° C.]:
15.6

PGIY-2-O4
8.00%
V₀[pN, 20° C.]:
2.04

B-2O-O5
4.00%
γ₁[mPa · s, 20° C.]:
129

Example M91

CCY-3-O1
7.00%
Clearing point [° C.]:
80

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1141

CPY-2-O2
10.00%
Δε [1 kHz, 20° C.]:
−4.0

CPY-3-O2
10.00%
ε_|| [1 kHz, 20° C.]:
3.7

PYP-2-3
3.00%
ε_⊥ [1 kHz, 20° C.]:
7.7

B-2O-O5
4.00%
K₁[pN, 20° C.]:
14.9

CC-3-V
38.00%
K₃[pN, 20° C.]:
15.6

PY-1-O4
10.00%
V₀[pN, 20° C.]:
2.09

PY-3-O2
4.50%
γ₁[mPa · s, 20° C.]:
108

CCY-3-O2
3.50%

Example M92

CCY-3-O1
7.00%
Clearing point [° C.]:
90

CCY-4-O2
4.00%
Δn [589 nm, 20° C.]:
0.1139

CLY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−4.2

CPY-2-O2
10.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.9

PYP-2-3
2.50%
K₁[pN, 20° C.]:
16.2

B-2O-O5
4.00%
K₃[pN, 20° C.]:
17.0

CC-3-V
35.50%
V₀[pN, 20° C.]:
2.12

PY-1-O4
10.00%
γ₁[mPa · s, 20° C.]:
131

PY-3-O2
1.00%

CCY-3-O2
6.00%

Example M93

B-2O-O5
5.00%
Clearing point [° C.]:
80.1

BCH-32
7.00%
Δn [589 nm, 20° C.]:
0.1121

CC-3-V
34.50%
Δε [1 kHz, 20° C.]:
−3.9

CCP-V-1
2.00%
K₁[pN, 20° C.]:
14.0

CCY-3-O1
5.00%
K₃[pN, 20° C.]:
14.5

CCY-3-O2
4.00%
V₀[pN, 20° C.]:
2.03

CCY-4-O2
2.00%
γ₁[mPa · s, 20° C.]:
104

CLY-3-O2
8.00%

CPY-2-O2
10.00%

CPY-3-O2
7.00%

PGIY-2-O4
6.00%

PY-3-O2
2.00%

Y-4O-O4
7.50%

Example M94

CCY-3-O1
7.00%
Clearing point [° C.]:
80.5

CCY-4-O2
1.50%
Δn [589 nm, 20° C.]:
0.1070

CLY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-2-O2
9.50%
K₁[pN, 20° C.]:
15.0

CPY-3-O2
8.00%
K₃[pN, 20° C.]:
15.7

B-2O-O5
4.00%
V₀[pN, 20° C.]:
2.12

CC-3-V
40.00%
γ₁[mPa · s, 20° C.]:
104

PY-1-O4
9.50%

PY-3-O2
4.50%

CCY-3-O2
6.00%

Example M95

CCY-3-O1
7.00%
Clearing point [° C.]:
80.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1140

CPY-2-O2
10.00%
Δε [1 kHz, 20° C.]:
−4.0

CPY-3-O2
10.00%
K₁[pN, 20° C.]:
14.8

PYP-2-3
3.00%
K₃[pN, 20° C.]:
15.6

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.09

CC-3-V
38.50%
γ₁[mPa · s, 20° C.]:
107

PY-1-O4
10.00%

PY-3-O2
3.00%

CCY-3-O2
3.50%

Example M96

CCY-3-O1
7.00%
Clearing point [° C.]:
78.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1142

CPY-2-O2
10.00%
Δε [1 kHz, 20° C.]:
−4.0

CPY-3-O2
10.00%
K₁[pN, 20° C.]:
14.3

PGIY-2-O4
5.00%
K₃[pN, 20° C.]:
14.8

PYP-2-3
1.00%
V₀[pN, 20° C.]:
45.66

B-2O-O5
5.00%
γ₁[mPa · s, 20° C.]:
103

CC-3-V
39.50%

PY-1-O4
10.00%

Y-4O-O4
1.50%

CCY-3-O2
1.00%

Example M97

CCY-3-O1
7.00%
Clearing point [° C.]:
74.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1014

CPY-2-O2
10.50%
Δε [1 kHz, 20° C.]:
−3.7

CPY-3-O2
9.50%
γ₁[mPa · s, 20° C.]:
89

B-2O-O5
3.50%

CC-3-V
42.00%

PY-1-O4
10.00%

Y-4O-O4
3.50%

CCY-3-O2
4.00%

Example M98

CCY-3-O1
7.00%
Clearing point [° C.]:
76.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1003

CPY-2-O2
10.50%
Δε [1 kHz, 20° C.]:
−3.7

CPY-3-O2
10.00%
K₁[pN, 20° C.]:
14.0

B-2O-O5
5.00%
K₃[pN, 20° C.]:
14.7

CC-3-V
43.50%
V₀[pN, 20° C.]:
2.09

PY-1-O4
6.00%
γ₁[mPa · s, 20° C.]:
89

Y-4O-O4
4.00%

CCY-3-O2
4.00%

Example M99

B-2O-O5
5.00%
Clearing point [° C.]:
80

CC-3-V
37.00%
Δn [589 nm, 20° C.]:
0.1094

CCP-V-1
4.50%
Δε [1 kHz, 20° C.]:
−3.7

CCY-3-O1
5.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CCY-3-O2
6.00%
ε_⊥ [1 kHz, 20° C.]:
7.4

CCY-4-O2
5.00%
K₁[pN, 20° C.]:
13.9

CLY-3-O2
8.00%
K₃[pN, 20° C.]:
14.4

CPY-2-O2
9.50%
V₀[pN, 20° C.]:
2.09

PGIY-2-O4
6.00%
γ₁[mPa · s, 20° C.]:
106

PY-3-O2
14.00%

Example M100

CCY-3-O1
7.00%
Clearing point [° C.]:
90

CCY-4-O2
4.00%
Δn [589 nm, 20° C.]:
0.1139

CLY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−4.2

CPY-2-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.9

PYP-2-3
2.50%
K₁[pN, 20° C.]:
16.2

B-2O-O5
4.00%
K₃[pN, 20° C.]:
17.0

CC-3-V
35.50%
V₀[pN, 20° C.]:
2.12

PY-1-O4
10.00%
γ₁[mPa · s, 20° C.]:
131

PY-3-O2
1.00%

CCY-3-O2
6.00%

Example M101

CC-3-V
35.50%
Clearing point [° C.]:
75.1

CC-3-V1
10.00%
Δn [589 nm, 20° C.]:
0.1096

CCP-3-1
1.50%
Δε [1 kHz, 20° C.]:
−3.2

CLY-3-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.5

CLY-3-O3
3.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CPY-2-O2
9.00%
K₁[pN, 20° C.]:
14.3

CPY-3-O2
10.50%
K₃[pN, 20° C.]:
15.9

PY-3-O2
16.50%
V₀[pN, 20° C.]:
2.37

PYP-2-3
1.00%
γ₁[mPa · s, 20° C.]:
84

B-2O-O5
3.00%

Example M102

For the preparation of a PS-VA mixture, 99.9% of the mixture according to Example M101 are mixed with 0.1% of the polymerisable compound of the formula

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Example M103

For the preparation of a PS-VA mixture, 99.6% of the mixture according to Example M101 are mixed with 0.4% of the polymerisable compound of the formula

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Example M104

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M101 are mixed with 0.3% of the polymerisable compound of the formula

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Example M105

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M101 are mixed with 0.2% of the polymerisable compound of the formula

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Example M106

CC-3-V
36.50%
Clearing point [° C.]:
74.1

CC-3-V1
6.00%
Δn [589 nm, 20° C.]:
0.1087

CCY-3-O1
7.00%
Δε [1 kHz, 20° C.]:
−3.2

CCY-3-O2
9.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CCY-5-O2
2.00%
ε_⊥ [1 kHz, 20° C.]:
6.8

CLY-3-O2
10.00%
K₁[pN, 20° C.]:
14.1

PY-1-O4
3.00%
K₃[pN, 20° C.]:
15.7

PY-3-O2
14.00%
V₀[pN, 20° C.]:
2.33

PYP-2-3
9.50%
γ₁[mPa · s, 20° C.]:
87

B-2O-O5
3.00%

Example M107

For the preparation of a PS-VA mixture, 99.6% of the mixture according to Example M106 are mixed with 0.4% of the polymerisable compound of the formula

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Example M108

CY-3-O2
3.50%
Clearing point [° C.]:
74.3

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1096

CCY-3-O2
2.50%
Δε [1 kHz, 20° C.]:
−4.0

CPY-2-O2
8.00%
ε_∥ [1 kHz, 20° C.]:
4.0

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
8.0

PYP-2-3
4.00%
K₁[pN, 20° C.]:
13.0

CLY-3-O2
7.00%
K₃[pN, 20° C.]:
13.7

CLY-3-O3
4.00%
V₀[pN, 20° C.]:
1.94

Y-4O-O4
7.00%
γ₁[mPa · s, 20° C.]:
96

PGIY-2-O4
7.00%

B-2O-O5
4.00%

CC-3-V
38.00%

Example M109

CCY-3-O1
6.00%
Clearing point [° C.]:
80

CCY-3-O2
8.00%
Δn [589 nm, 20° C.]:
0.1010

CCY-4-O2
4.00%
Δε [1 kHz, 20° C.]:
−3.7

CCY-5-O2
2.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CLY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

CLY-3-O3
4.00%
K₁[pN, 20° C.]:
15.0

PGIY-2-O4
5.00%
K₃[pN, 20° C.]:
16.3

B-2O-O5
4.00%
V₀[pN, 20° C.]:
2.20

CC-3-V
36.00%
γ₁[mPa · s, 20° C.]:
98

CC-3-V1
7.50%

CY-3-O2
2.00%

PY-3-O2
12.00%

Example M110

CCY-3-O2
6.00%
Clearing point [° C.]:
80.4

CCY-4-O2
3.00%
Δn [589 nm, 20° C.]:
0.1014

CLY-3-O2
8.00%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O3
2.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
6.50%
ε_⊥ [1 kHz, 20° C.]:
7.3

CPY-3-O2
8.00%
K₁[pN, 20° C.]:
13.9

PGIY-2-O4
5.00%
K₃[pN, 20° C.]:
15.8

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.20

CC-3-V
36.00%
γ₁[mPa · s, 20° C.]:
99

CC-3-V1
7.50%

CY-3-O2
11.00%

CY-5-O2
2.00%

Example M111

BCH-32
3.00%
Clearing point [° C.]:
74.7

CC-3-V
15.00%
Δn [589 nm, 20° C.]:
0.1086

CC-3-V1
9.00%
Δε [1 kHz, 20° C.]:
−3.2

CCH-34
4.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CCH-35
5.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CCP-3-1
8.00%
K₁[pN, 20° C.]:
13.4

CCP-3-3
5.00%
K₃[pN, 20° C.]:
15.6

CPY-2-O2
10.50%
V₀[pN, 20° C.]:
2.31

CPY-3-O2
10.50%
γ₁[mPa · s, 20° C.]:
109

CY-3-O2
15.00%

PY-3-O2
12.00%

B-2O-O5
3.00%

Example M112

BCH-32
2.50%
Clearing point [° C.]:
74.4

CCP-3-1
8.00%
Δn [589 nm, 20° C.]:
0.1093

CCY-3-O1
8.00%
Δε [1 kHz, 20° C.]:
−3.1

CCY-3-O2
11.00%
ε_∥ [1 kHz, 20° C.]:
3.5

CCY-5-O2
1.50%
ε_⊥ [1 kHz, 20° C.]:
6.6

PGIY-2-O4
5.00%
K₁[pN, 20° C.]:
15.3

B-2O-O5
4.00%
K₃[pN, 20° C.]:
15.8

CC-3-V
5.00%
V₀[pN, 20° C.]:
2.37

CC-3-V1
7.00%
γ₁[mPa · s, 20° C.]:
105

CCH-23
11.00%

CCH-34
9.00%

CCH-35
2.00%

CY-3-O2
2.50%

PCH-301
1.00%

PP-1-2V1
4.50%

PY-3-O2
18.00%

Example M113

BCH-32
6.50%
Clearing point [° C.]:
74.2

CCP-3-1
8.00%
Δn [589 nm, 20° C.]:
0.1086

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.2

CCY-5-O2
7.50%
ε_∥ [1 kHz, 20° C.]:
3.6

PGIY-2-O4
5.00%
ε_⊥ [1 kHz, 20° C.]:
6.8

B-2O-O5
3.00%
K₁[pN, 20° C.]:
14.2

CC-3-V
10.00%
K₃[pN, 20° C.]:
15.9

CC-3-V1
8.00%
V₀[pN, 20° C.]:
2.35

CCH-23
10.00%
γ₁[mPa · s, 20° C.]:
105

CCH-34
3.00%

CY-3-O2
9.00%

PCH-301
1.50%

PP-1-2V1
1.50%

PY-3-O2
16.00%

Example M114

B-2O-O5
3.00%
Clearing point [° C.]:
74.5

CC-3-V
15.00%
Δn [589 nm, 20° C.]:
0.1092

CC-3-V1
10.00%
Δε [1 kHz, 20° C.]:
−3.3

CCH-34
9.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CCP-3-1
8.00%
ε_⊥ [1 kHz, 20° C.]:
6.9

CCP-3-3
6.00%
K₁[pN, 20° C.]:
14.0

CPY-2-O2
8.50%
K₃[pN, 20° C.]:
15.7

CPY-3-O2
11.00%
V₀[pN, 20° C.]:
2.31

CY-3-O2
15.00%
γ₁[mPa · s, 20° C.]:
102

PGIY-2-O4
4.00%

PY-3-O2
10.50%

Example M115

B-2O-O5
3.00%
Clearing point [° C.]:
74.5

BCH-32
2.00%
Δn [589 nm, 20° C.]:
0.1090

CC-3-V
37.00%
Δε [1 kHz, 20° C.]:
−3.2

CC-3-V1
6.50%
ε_∥ [1 kHz, 20° C.]:
3.6

CCY-3-O1
6.50%
ε_⊥ [1 kHz, 20° C.]:
6.8

CCY-3-O2
3.50%
K₁[pN, 20° C.]:
14.1

CLY-3-O2
10.00%
K₃[pN, 20° C.]:
15.9

CPY-3-O2
10.50%
V₀[pN, 20° C.]:
2.35

PY-3-O2
18.00%
γ₁[mPa · s, 20° C.]:
86

PYP-2-3
3.00%

Example M116

B-2O-O5
3.00%
Clearing point [° C.]:
74.6

CC-3-V
36.50%
Δn [589 nm, 20° C.]:
0.1092

CC-3-V1
9.00%
Δε [1 kHz, 20° C.]:
−3.2

CCY-3-O1
5.50%
ε_∥ [1 kHz, 20° C.]:
3.5

CLY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CPY-2-O2
6.50%
K₁[pN, 20° C.]:
14.2

CPY-3-O2
10.50%
K₃[pN, 20° C.]:
15.7

PY-3-O2
16.00%
V₀[pN, 20° C.]:
2.34

PYP-2-3
3.00%
γ₁[mPa · s, 20° C.]:
86

Example M117

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M111 are mixed with 0.3% of the polymerisable compound of the formula

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Example M118

B-2O-O5
4.00%
Clearing point [° C.]:
74.6

BCH-32
0.50%
Δn [589 nm, 20° C.]:
0.1036

CC-3-V
33.00%
Δε [1 kHz, 20° C.]:
−3.4

CC-3-V1
8.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CCH-301
1.00%
ε_⊥ [1 kHz, 20° C.]:
7.0

CCY-3-1
2.50%
K₁[pN, 20° C.]:
13.4

CCY-3-O1
9.00%
K₃[pN, 20° C.]:
14.9

CCY-4-O2
5.00%
V₀[pN, 20° C.]:
2.21

CPY-2-O2
5.50%
γ₁[mPa · s, 20° C.]:
92

CPY-3-O2
12.50%

CY-3-O2
7.00%

PY-1-O4
1.50%

PY-3-O2
8.00%

PYP-2-3
2.50%

Example M119

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M118 are mixed with 0.001% of Irganox 1076 and 0.3% of the polymerisable compound of the formula

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Example M120

CC-3-V
34.50%
Clearing point [° C.]:
74.7

CC-3-V1
10.00%
Δn [589 nm, 20° C.]:
0.1094

CCP-3-1
1.00%
Δε [1 kHz, 20° C.]:
−3.2

CLY-3-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.5

CLY-3-O3
3.00%
ε_⊥ [1 kHz, 20° C.]:
6.8

CPY-2-O2
8.00%
K₁[pN, 20° C.]:
13.9

CPY-3-O2
10.50%
K₃[pN, 20° C.]:
15.8

CY-3-O2
4.50%
V₀[pN, 20° C.]:
2.34

PY-3-O2
12.50%
γ₁[mPa · s, 20° C.]:
87

PYP-2-3
3.00%

B-2O-O5
3.00%

Example M121

For the preparation of a PS-VA mixture, 99.6% of the mixture according to Example M120 are mixed with 0.4% of the polymerisable compound of the

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Example M122

B-2O-O5
3.00%
Clearing point [° C.]:
74.8

BCH-32
2.50%
Δn [589 nm, 20° C.]:
0.1096

CC-3-V
42.00%
Δε [1 kHz, 20° C.]:
−3.2

CC-3-V1
1.00%
ε_∥ [1 kHz, 20° C.]:
3.5

CCY-3-O2
9.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CLY-3-O2
10.00%
K₁[pN, 20° C.]:
14.1

CPY-2-O2
2.00%
K₃[pN, 20° C.]:
15.7

CPY-3-O2
10.50%
V₀[pN, 20° C.]:
2.34

PY-3-O2
17.00%
γ₁[mPa · s, 20° C.]:
85

PYP-2-3
3.00%

Example M123

CY-3-O2
3.00%
Clearing point [° C.]:
74.9

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1032

CCY-3-O2
4.50%
Δε [1 kHz, 20° C.]:
−4.0

CPY-2-O2
8.00%
ε_∥ [1 kHz, 20° C.]:
3.9

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.9

CLY-3-O2
7.00%
K₁[pN, 20° C.]:
13.2

CLY-3-O3
4.00%
K₃[pN, 20° C.]:
13.9

Y-4O-O4
7.00%
V₀[pN, 20° C.]:
1.96

PGIY-2-O4
7.00%
γ₁[mPa · s, 20° C.]:
92

B-2O-O5
4.00%

CC-3-V
40.50%

Example M124

CC-3-V
37.50%
Clearing point [° C.]:
75

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1033

CCY-3-O2
13.75%
Δε [1 kHz, 20° C.]:
−3.6

CCY-4-O2
4.25%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-3-O2
13.50%
ε_⊥ [1 kHz, 20° C.]:
7.2

CY-3-O2
7.50%
K₁[pN, 20° C.]:
13.5

PY-3-O2
15.50%
K₃[pN, 20° C.]:
15.8

PYP-2-3
3.00%
V₀[pN, 20° C.]:
1.17

γ₁[mPa · s, 20° C.]:
98

Example M125

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M124 are mixed with 0.3% of the polymerisable compound of the formula

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Example M126

CCP-V-1
2.00%
Clearing point [° C.]:
75

CCY-3-O1
7.00%
Δn [589 nm, 20° C.]:
0.1050

CCY-3-O2
7.00%
Δε [1 kHz, 20° C.]:
−3.7

CCY-4-O2
3.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CCY-5-O2
1.50%
ε_⊥ [1 kHz,20° C.]:
7.4

CLY-3-O2
8.00%
K₁[pN, 20° C.]:
14.8

CLY-3-O3
2.00%
K₃[pN, 20° C.]:
15.4

PGIY-2-O4
5.00%
V₀[pN, 20° C.]:
2.15

B-2O-O5
5.00%
γ₁[mPa · s, 20° C.]:
93

CC-3-V
34.00%

CC-3-V1
8.00%

PY-1-O4
3.50%

PY-3-O2
14.00%

Example M127

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M126 are mixed with 0.001% of Irganox 1076 and 0.3% of the polymerisable compound of the formula

embedded image

Example M128

CCP-V-1
2.00%
Clearing point [° C.]:
75

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1013

CCY-3-O2
7.50%
Δε [1 kHz, 20° C.]:
−3.7

CCY-4-O2
3.50%
ε_∥ [1 kHz, 20° C.]:
3.7

CLY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.4

CLY-3-O3
2.00%
K₁[pN, 20° C.]:
14.4

PGIY-2-O4
5.00%
K₃[pN, 20° C.]:
15.5

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.15

CC-3-V
34.00%
γ₁[mPa · s, 20° C.]:
91

CC-3-V1
8.00%

CY-3-O2
6.00%

PY-3-O2
12.00%

Example M129

CCP-V-1
1.00%
Clearing point [° C.]:
75

CCY-3-O1
7.00%
Δn [589 nm, 20° C.]:
0.1081

CCY-3-O2
7.00%
Δε [1 kHz, 20° C.]:
−3.7

CCY-4-O2
3.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CCY-5-O2
1.00%
ε_⊥ [1 kHz, 20° C.]:
7.4

CLY-3-O2
8.00%
K₁[pN, 20° C.]:
14.5

CLY-3-O3
2.00%
K₃[pN, 20° C.]:
15.2

PGIY-2-O4
5.00%
V₀[pN, 20° C.]:
2.14

PYP-2-3
2.50%
γ₁[mPa · s, 20° C.]:
93

B-2O-O5
5.00%

CC-3-V
34.00%

CC-3-V1
7.50%

PY-1-O4
2.00%

PY-3-O2
15.00%

Example M130

CY-3-O2
3.00%
Clearing point [° C.]:
75.1

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1021

CCY-3-O2
3.00%
Δε [1 kHz, 20° C.]:
−3.7

CPY-2-O2
8.00%
ε_∥ [1 kHz, 20° C.]:
3.8

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.5

CLY-3-O2
7.00%
K₁[pN, 20° C.]:
13.3

CLY-3-O3
4.00%
K₃[pN, 20° C.]:
14.0

Y-4O-O4
6.00%
V₀[pN, 20° C.]:
2.04

PGIY-2-O4
7.00%
γ₁[mPa · s, 20° C.]:
87

B-2O-O5
4.00%

CC-3-V
43.00%

Example M131

CCY-3-O1
8.00%
Clearing point [° C.]:
75.5

CCY-4-O2
3.00%
Δn [589 nm, 20° C.]:
0.1024

CLY-3-O2
8.00%
Δε [1 kHz, 20° C.]:
−3.8

CLY-3-O3
4.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CPY-2-O2
7.50%
ε_⊥ [1 kHz,20° C.]:
7.5

CPY-3-O2
3.00%

B-2O-O5
4.00%

CC-3-V
41.50%

PY-1-O4
5.00%

PY-3-O2
11.50%

CCY-3-O2
4.50%

Example M132

CCY-3-O1
6.50%
Clearing point [° C.]:
79.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1070

CPY-2-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-3-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.7

PYP-2-3
5.50%
ε_⊥ [1 kHz, 20° C.]:
7.6

B-2O-O5
4.00%
K₁[pN, 20° C.]:
13.9

CC-3-V
37.00%
K₃[pN, 20° C.]:
15.5

CY-3-O2
14.00%
V₀[pN, 20° C.]:
2.09

CCY-3-O2
1.50%
γ₁[mPa · s, 20° C.]:
104

CY-5-O2
1.50%

Example M133

CCP-V2-1
5.00%
Clearing point [° C.]:
79.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1079

CPY-3-O2
9.00%
Δε [1 kHz, 20° C.]:
−2.0

PGIY-2-O4
2.50%
ε_∥ [1 kHz, 20° C.]:
3.2

PYP-2-3
8.00%
ε_⊥ [1 kHz, 20° C.]:
5.3

PYP-2-4
5.00%
K₁[pN, 20° C.]:
14.4

B-2O-O5
4.00%
K₃[pN, 20° C.]:
15.5

CC-3-V
43.00%
V₀[pN, 20° C.]:
2.92

CC-3-V1
7.50%
γ₁[mPa · s, 20° C.]:
75

CY-3-O2
6.00%

Example M134

CCY-3-O1
1.00%
Clearing point [° C.]:
79.5

CLY-3-O2
10.00%
Δn [589 nm, 20° C.]:
0.1151

CLY-3-O3
1.50%
Δε [1 kHz, 20° C.]:
−4.0

CPY-2-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.7

PGIY-2-O4
5.00%
K₁[pN, 20° C.]:
14.4

PYP-2-3
6.00%
K₃[pN, 20° C.]:
15.7

B-2O-O5
2.50%
V₀[pN, 20° C.]:
2.09

CC-3-V
27.00%
γ₁[mPa · s, 20° C.]:
115

CC-3-V1
8.00%

CY-3-O2
11.00%

CY-5-O2
6.50%

CY-3-O4
1.50%

Example M135

CLY-3-O2
10.00%
Clearing point [° C.]:
79.5

CLY-3-O3
2.00%
Δn [589 nm, 20° C.]:
0.1157

CPY-2-O2
10.50%
Δε [1 kHz, 20° C.]:
−4.0

CPY-3-O2
9.50%
ε_∥ [1 kHz, 20° C.]:
3.7

PGIY-2-O4
5.00%
ε_⊥ [1 kHz, 20° C.]:
7.7

PYP-2-3
5.50%
K₁[pN, 20° C.]:
14.6

B-2O-O5
5.00%
K₃[pN, 20° C.]:
15.5

CC-3-V
30.00%
V₀[pN, 20° C.]:
2.07

CC-3-V1
7.50%
γ₁[mPa · s, 20° C.]:
111

CY-3-O2
11.00%

CY-5-O2
4.00%

Example M136

CCY-3-O1
4.00%
Clearing point [° C.]:
79.8

CCY-3-O2
8.50%
Δn [589 nm, 20° C.]:
0.1013

CCY-4-O2
5.00%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CLY-3-O3
4.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

PGIY-2-O4
5.00%
K₁[pN, 20° C.]:
14.7

PYP-2-3
1.00%
K₃[pN, 20° C.]:
16.3

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.20

CC-3-V
34.50%
γ₁[mPa · s, 20° C.]:
97

CC-3-V1
8.50%

CY-3-O2
5.00%

PY-3-O2
9.50%

Example M137

B-2O-O5
4.00%
Clearing point [° C.]:
79.9

CC-3-V
32.00%
Δn [589 nm, 20° C.]:
0.1036

CCP-3-1
2.00%
Δε [1 kHz, 20° C.]:
−4.4

CCY-3-O2
8.00%
ε_∥ [1 kHz, 20° C.]:
4.0

CCY-4-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
8.3

CLY-3-O2
6.50%
K₁[pN, 20° C.]:
13.4

CLY-3-O3
6.50%
K₃[pN, 20° C.]:
14.4

CPY-2-O2
8.00%
V₀[pN, 20° C.]:
1.92

CPY-3-O2
8.00%
γ₁[mPa · s, 20° C.]:
89

CY-3-O2
2.00%

PY-3-O2
10.00%

Y-4O-O4
5.00%

Example M138

B-2O-O5
4.00%
Clearing point [° C.]:
79.9

CC-3-V
32.00%
Δn [589 nm, 20° C.]:
0.1058

CCP-3-1
2.00%
Δε [1 kHz, 20° C.]:
−4.6

CCY-3-O2
8.00%
K₁[pN, 20° C.]:
14.3

CCY-4-O2
8.00%
K₃[pN, 20° C.]:
15.1

CLY-3-O2
6.50%
V₀[pN, 20° C.]:
1.91

CLY-3-O3
6.50%
γ₁[mPa · s, 20° C.]:
113

CPY-2-O2
8.00%

CPY-3-O2
8.00%

CY-3-O2
2.00%

PY-3-O2
10.00%

Y-4O-O4
5.00%

Example M139

BCH-32
5.00%
Clearing point [° C.]:
80.4

CC-3-V
32.50%
Δn [589 nm, 20° C.]:
0.1099

CCY-3-O1
5.00%
Δε [1 kHz, 20° C.]:
−3.7

CCY-3-O2
8.00%
ε_∥ [1 kHz, 20° C.]:
3.9

CCY-4-O2
2.50%
ε_⊥ [1 kHz, 20° C.]:
7.6

CLY-3-O2
8.00%
K₁[pN, 20° C.]:
13.3

CPY-2-O2
7.00%
K₃[pN, 20° C.]:
14.3

CPY-3-O2
10.00%
V₀[pN, 20° C.]:
2.05

PGIY-2-O4
7.00%
γ₁[mPa · s, 20° C.]:
108

PY-3-O2
7.00%

Y-4O-O4
8.00%

Example M140

Example M141

B-2O-O5
5.00%
Clearing point [° C.]:
80.1

BCH-32
7.00%
Δn [589 nm, 20° C.]:
0.1096

CC-3-V
34.50%
Δε [1 kHz, 20° C.]:
−3.7

CCP-V-1
2.00%
ε_∥ [1 kHz, 20° C.]:
3.9

CCY-3-O1
5.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

CCY-3-O2
4.00%
K₁[pN, 20° C.]:
13.3

CCY-4-O2
2.00%
K₃[pN, 20° C.]:
13.7

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
2.04

CPY-2-O2
10.00%
γ₁[mPa · s, 20° C.]:
104

CPY-3-O2
7.00%

PGIY-2-O4
6.00%

PY-3-O2
2.00%

Y-4O-O4
7.50%

Example M142

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M140 are mixed with 0.3% of the polymerisable compound of the formula

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Example M143

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M140 are mixed with 0.25% of the polymerisable compound of the formula

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Example M144

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M140 are mixed with 0.2% of the polymerisable compound of the

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Example M145

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M141 are mixed with 0.3% of the polymerisable compound of the formula

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Example M146

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M141 are mixed with 0.25% of the polymerisable compound of the formula

embedded image

Example M147

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M141 are mixed with 0.3% of the polymerisable compound of the

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Example M148

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M141 are mixed with 0.2% of the polymerisable compound of the formula

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Example M149

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M141 are mixed with 0.3% of the polymerisable compound of the formula

embedded image

Example M150

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M141 are mixed with 0.25% of the polymerisable compound of the formula

embedded image

Example M151

CCY-3-O1
7.00%
Clearing point [° C.]:
80

CCY-3-O2
6.00%
Δn [589 nm, 20° C.]:
0.1073

CCY-4-O2
6.50%
Δε [1 kHz, 20° C.]:
−3.9

CCY-5-O2
3.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CLY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

PGIY-2-O4
5.00%
γ₁[mPa · s, 20° C.]:
90

PYP-2-3
2.00%

B-2O-O5
5.00%

CC-3-V
33.50%

CC-3-V1
7.00%

PY-1-O4
5.00%

PY-3-O2
10.00%

Example M152

CLY-3-O2
10.00%
Clearing point [° C.]:
80

CLY-3-O3
1.50%
Δn [589 nm, 20° C.]:
0.1080

CPY-2-O2
4.00%
Δε [1 kHz, 20° C.]:
−2.4

CPY-3-O2
10.00%
ε_∥ [1 kHz, 20° C.]:
3.3

PGIY-2-O4
5.00%
ε_⊥ [1 kHz, 20° C.]:
5.7

PYP-2-3
8.00%
K₁[pN, 20° C.]:
14.0

B-2O-O5
4.50%
K₃[pN, 20° C.]:
15.8

CC-3-V
44.50%
V₀[pN, 20° C.]:
2.68

CC-3-V1
8.00%
γ₁[mPa · s, 20° C.]:
80

CY-3-O2
2.50%

CY-5-O2
2.00%

Example M153

CCY-3-O2
7.00%
Clearing point [° C.]:
80

CCY-4-O2
2.00%
Δn [589 nm, 20° C.]:
0.1009

CLY-3-O2
8.00%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O3
4.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CPY-2-O2
3.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

CPY-3-O2
8.00%
K₁[pN, 20° C.]:
14.4

PGIY-2-O4
5.00%
K₃[pN, 20° C.]:
16.4

PYP-2-3
1.00%
V₀[pN, 20° C.]:
2.21

B-2O-O5
5.00%
γ₁[mPa · s, 20° C.]:
99

CC-3-V
35.00%

CC-3-V1
8.00%

CY-3-O2
12.00%

CY-5-O2
2.00%

Example M154

CC-3-V
37.50%
Clearing point [° C.]:
80.2

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1097

CCY-3-O2
3.00%
Δε [1 kHz, 20° C.]:
−3.9

CCY-4-O2
7.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CLY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
13.5

CPY-3-O2
8.00%
K₃[pN, 20° C.]:
14.5

PY-1-O4
3.50%
V₀[pN, 20° C.]:
1.08

PY-3-O2
12.00%
γ₁[mPa · s, 20° C.]:
110

PGIY-2-O4
2.00%

B-2O-O5
4.00%

Example M155

B-2O-O5
4.00%
Clearing point [° C.]:
80.4

CC-3-V
24.50%
Δn [589 nm, 20° C.]:
0.1030

CC-3-V1
5.00%
Δε [1 kHz, 20° C.]:
−4.4

CCP-3-1
3.00%
ε_∥ [1 kHz, 20° C.]:
4.0

CCY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
8.4

CCY-4-O2
8.00%
K₁[pN, 20° C.]:
13.3

CLY-3-O2
6.00%
K₃[pN, 20° C.]:
14.3

CLY-3-O3
6.00%
V₀[pN, 20° C.]:
1.91

CPY-2-O2
6.50%
γ₁[mPa · s, 20° C.]:
96

CPY-3-O2
8.00%

CY-3-O2
8.00%

PYP-2-3
5.00%

Y-4O-O4
8.00%

Example M156

BCH-32
0.50%
Clearing point [° C.]:
80.4

CC-3-V
37.00%
Δn [589 nm, 20° C.]:
0.1195

CCY-3-O1
5.00%
Δε [1 kHz, 20° C.]:
−3.9

CCY-3-O2
3.50%
ε_∥ [1 kHz, 20° C.]:
3.8

CLY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.7

CPY-2-O2
10.00%
K₁[pN, 20° C.]:
13.5

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
14.5

PY-3-O2
14.00%
V₀[pN, 20° C.]:
2.04

PGIY-2-O4
8.00%
γ₁[mPa · s, 20° C.]:
114

B-2O-O5
4.00%

Example M157

Example M158

CC-3-V
25.00%
Clearing point [° C.]:
80.5

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.0995

CCP-3-1
7.00%
Δε [1 kHz, 20° C.]:
−3.8

CCY-3-O1
4.50%
ε_∥ [1 kHz, 20° C.]:
3.7

CCY-3-O2
6.50%
ε_⊥ [1 kHz, 20° C.]:
7.5

CCY-4-O2
5.00%
K₁[pN, 20° C.]:
13.7

CCY-5-O2
4.00%
K₃[pN, 20° C.]:
15.8

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
2.12

CY-3-O2
12.00%
γ₁[mPa · s, 20° C.]:
111

CY-3-O4
4.00%

PY-3-O2
7.00%

PGIY-2-O4
6.00%

B-2O-O5
4.00%

Example M159

CC-3-V
26.00%
Clearing point [° C.]:
80.8

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1099

CCP-3-1
6.00%
Δε [1 kHz, 20° C.]:
−3.9

CCY-3-O1
2.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CCY-3-O2
7.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

CCY-4-O2
7.00%
K₁[pN, 20° C.]:
14.2

CCY-5-O2
4.00%
K₃[pN, 20° C.]:
15.6

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
2.12

CY-3-O2
4.00%
γ₁[mPa · s, 20° C.]:
121

PY-1-O4
5.00%

PY-3-O2
12.00%

PGIY-2-O4
8.00%

B-2O-O5
4.00%

Example M160

CCY-3-O1
8.00%
Clearing point [° C.]:
82

CCY-3-O2
1.00%
Δn [589 nm, 20° C.]:
0.1081

CLY-3-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.5

CPY-2-O2
9.50%
ε_|| [1 kHz, 20° C.]:
3.6

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.2

PGIY-2-O4
5.00%
K₁[pN, 20° C.]:
14.4

PYP-2-3
1.00%
K₃[pN, 20° C.]:
15.3

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.20

CC-3-V
44.50%
γ₁[mPa · s, 20° C.]:
95

PY-1-O4
4.00%

Y-4O-O4
2.00%

Example M161

B-2O-O5
4.00%
Clearing point [° C.]:
84.6

CC-3-V
31.00%
Δn [589 nm, 20° C.]:
0.1069

CC-3-V1
4.00%
Δε [1 kHz, 20° C.]:
−3.8

CCP-3-1
3.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
8.50%
ε_⊥ [1 kHz, 20° C.]:
7.5

CCY-4-O2
6.00%
K₁[pN, 20° C.]:
14.1

CLY-3-O2
6.00%
K₃[pN, 20° C.]:
15.0

CLY-3-O3
6.00%
V₀[pN, 20° C.]:
2.09

CPY-2-O2
8.00%
γ₁[mPa · s, 20° C.]:
88

CPY-3-O2
8.00%

PY-3-O2
8.00%

PY-4-O2
3.00%

PYP-2-4
1.50%

Y-4O-O4
3.00%

Example M162

CCY-3-O2
10.00%
Clearing point [° C.]:
85

CCY-5-O2
7.00%
Δn [589 nm, 20° C.]:
0.1047

CPY-2-O2
10.00%
Δε [1 kHz, 20° C.]:
−3.4

CPY-3-O2
10.00%
ε_|| [1 kHz, 20° C.]:
3.5

PYP-2-3
5.50%
ε_⊥ [1 kHz, 20° C.]:
6.9

B-2O-O5
4.00%
K₁[pN, 20° C.]:
14.6

CC-3-V
32.00%
K₃[pN, 20° C.]:
17.4

CC-3-V1
10.00%
V₀[pN, 20° C.]:
2.37

CY-3-O2
10.00%
γ₁[mPa · s, 20° C.]:
108

CY-5-O2
1.50%

Example M163

Example M164

CC-3-V
35.00%
Clearing point [° C.]:
86.1

CCY-3-O1
5.00%
Δn [589 nm, 20° C.]:
0.1103

CCY-3-O2
6.00%
Δε [1 kHz, 20° C.]:
−4.1

CCY-3-O3
2.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-4-O2
6.00%
ε_⊥ [1 kHz, 20° C.]:
7.8

CLY-3-O2
8.00%
K₁[pN, 20° C.]:
14.2

CPY-2-O2
10.00%
K₃[pN, 20° C.]:
15.7

CPY-3-O2
9.50%
V₀[pN, 20° C.]:
2.06

PY-1-O4
3.50%
γ₁[mPa · s, 20° C.]:
125

PY-3-O2
11.00%

B-2O-O5
4.00%

Example M165

CCY-3-O1
3.50%
Clearing point [° C.]:
86.5

CCY-3-O2
4.50%
Δn [589 nm, 20° C.]:
0.1053

CLY-3-O2
9.00%
Δε [1 kHz, 20° C.]:
−3.4

CPY-2-O2
10.50%
ε_|| [1 kHz, 20° C.]:
3.5

CPY-3-O2
11.00%
ε_⊥ [1 kHz, 20° C.]:
6.9

PYP-2-3
3.50%
K₁[pN, 20° C.]:
14.8

CC-3-V
32.00%
K₃[pN, 20° C.]:
17.8

CC-3-V1
12.00%
V₀[pN, 20° C.]:
2.41

CY-3-O2
10.00%
γ₁[mPa · s, 20° C.]:
105

B-2O-O5
4.00%

Example M166

CC-3-V
22.50%
Clearing point [° C.]:
97.2

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1005

CCP-3-1
2.00%
Δε [1 kHz, 20° C.]:
−4.6

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCY-3-O2
7.00%
ε_⊥ [1 kHz, 20° C.]:
8.2

CCY-3-O3
5.00%
K₁[pN, 20° C.]:
15.8

CCY-4-O2
7.00%
K₃[pN, 20° C.]:
18.6

CCY-5-O2
5.00%
V₀[pN, 20° C.]:
2.13

CLY-3-O2
8.00%
γ₁[mPa · s, 20° C.]:
172

CPY-3-O2
8.00%

CY-3-O2
12.00%

CY-5-O2
4.50%

PGIY-2-O4
3.00%

B-2O-O5
4.00%

Example M167

CC-3-V
21.50%
Clearing point [° C.]:
98.6

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1103

CCP-3-1
3.00%
Δε [1 kHz, 20° C.]:
−4.6

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
7.00%
ε_⊥ [1 kHz, 20° C.]:
8.3

CCY-4-O2
7.00%
K₁[pN, 20° C.]:
16.3

CCY-5-O2
4.00%
K₃[pN, 20° C.]:
18.7

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
2.12

CPY-3-O2
10.50%
γ₁[mP · s, 20° C.]:
175

CY-3-O2
12.00%

CY-5-O2
3.00%

PGIY-2-O4
8.00%

B-2O-O5
4.00%

Example M168

CC-3-V1
7.00%
Clearing point [° C.]:
109

CCP-3-1
10.00%
Δn [589 nm, 20° C.]:
0.1012

CCP-3-3
6.50%
Δε [1 kHz, 20° C.]:
−5.2

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
6.00%
ε_⊥ [1 kHz, 20° C.]:
8.9

CCY-3-O3
7.50%
K₁[pN, 20° C.]:
18.2

CCY-4-O2
8.00%
K₃[pN, 20° C.]:
21.4

CCY-5-O2
4.00%
V₀[pN, 20° C.]:
2.13

CCY-3-1
8.00%
γ₁[mPa · s, 20° C.]:
287

CLY-3-O2
8.00%

CY-3-O2
12.00%

CY-3-O4
14.00%

B-2O-O5
4.00%

Example M169

CC-3-V
10.75%
Clearing point [° C.]:
111.8

CC-3-V1
3.50%
Δn [589 nm, 20° C.]:
0.1104

CCP-3-1
7.50%
Δε [1 kHz, 20° C.]:
−5.2

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
7.50%
ε_⊥ [1 kHz, 20° C.]:
8.9

CCY-4-O2
7.50%
K₁[pN, 20° C.]:
17.9

CCY-5-O2
4.50%
K₃[pN, 20° C.]:
21.0

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
2.13

CPY-3-O2
8.00%
γ₁[mP · s, 20° C.]:
267

CY-3-O2
12.00%

CY-5-O2
5.00%

PGIY-2-O4
4.00%

B-2O-O5
4.00%

CCP-3-3
1.75%

CCY-3-O3
3.00%

CCY-2-1
4.00%

CCY-3-1
4.00%

Example M170

CCP-3-1
12.00%
Clearing point [° C.]:
126

CCP-3-3
3.50%
Δn [589 nm, 20° C.]:
0.1103

CCY-3-O1
5.00%
Δε [1 kHz, 20° C.]:
−5.8

CCY-3-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O3
6.00%
ε_⊥ [1 kHz, 20° C.]:
9.5

CCY-4-O2
8.00%
K₁[pN, 20° C.]:
20.3

CCY-5-O2
5.00%
K₃[pN, 20° C.]:
23.8

CCY-2-1
8.00%
V₀[pN, 20° C.]:
2.14

CCY-3-1
8.00%
γ₁[mPa · s, 20° C.]:
422

CLY-3-O2
8.00%

CPY-3-O2
5.50%

CY-3-O2
12.00%

CY-5-O2
7.00%

B-2O-O5
4.00%

Example M171

CC-3-V
12.50%
Clearing point [° C.]:
110.3

CC-3-V1
6.50%
Δn [589 nm, 20° C.]:
0.1100

CCP-3-1
12.50%
Δε [1 kHz, 20° C.]:
−4.8

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCY-3-O2
7.50%
ε_⊥ [1 kHz, 20° C.]:
8.4

CCY-4-O2
3.00%
K₁[pN, 20° C.]:
17.9

CCY-5-O2
3.50%
K₃[pN, 20° C.]:
20.8

CLY-2-O4
5.00%
V₀[pN, 20° C.]:
2.22

CLY-3-O2
7.00%
γ₁[mP · s, 20° C.]:
233

CLY-3-O3
6.00%

CPY-3-O2
8.00%

CY-3-O2
12.00%

CY-5-O2
4.00%

PGIY-2-O4
3.50%

B-2O-O5
4.00%

Example M172

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M171 are mixed with 0.3% of the polymerisable compound of the formula

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Example M173

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M171 are mixed with 0.25% of the polymerisable compound of the formula

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Example M174

CC-3-V
14.00%
Clearing point [° C.]:
111

CC-3-V1
6.00%
Δn [589 nm, 20° C.]:
0.1102

CCP-3-1
7.00%
Δε [1 kHz, 20° C.]:
−5.2

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
8.9

CCY-4-O2
5.50%
K₁[pN, 20° C.]:
18.5

CCY-5-O2
2.00%
K₃[pN, 20° C.]:
20.5

CLY-2-O4
7.00%
V₀[pN, 20° C.]:
2.10

CLY-3-O2
8.00%
γ₁[mP · s, 20° C.]:
241

CLY-3-O3
7.00%

CPY-3-O2
10.00%

CY-3-O2
12.00%

CY-5-O2
2.50%

PGIY-2-O4
2.00%

B-2O-O5
4.00%

Example M175

CC-3-V
12.25%
Clearing point [° C.]:
110.9

CC-3-V1
6.00%
Δn [589 nm, 20° C.]:
0.1101

CCP-3-1
11.00%
Δε [1 kHz, 20° C.]:
−5.0

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCY-3-O2
7.75%
ε_⊥ [1 kHz, 20° C.]:
8.6

CCY-4-O2
5.00%
K₁[pN, 20° C.]:
18.5

CCY-5-O2
3.50%
K₃[pN, 20° C.]:
20.8

CLY-2-O4
5.00%
V₀[pN, 20° C.]:
2.16

CLY-3-O2
7.00%
γ₁[mPa · s, 20° C.]:
240

CLY-3-O3
6.00%

CPY-3-O2
8.00%

CY-3-O2
12.00%

CY-5-O2
4.25%

PGIY-2-O4
3.25%

B-2O-O5
4.00%

Example M176

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M174 are mixed with 0.2% of the polymerisable compound of the formula

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Example M177

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M174 are mixed with 0.25% of the polymerisable compound of the formula

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Example M178

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M174 are mixed with 0.3% of the polymerisable compound of the formula

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Example M179

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M174 are mixed with 0.3% of the polymerisable compound of the

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Example M180

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M174 are mixed with 0.25% of the polymerisable compound of the formula

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Example M181

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M174 are mixed with 0.3% of the polymerisable compound of the formula

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Example M182

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M175 are mixed with 0.25% of the polymerisable compound of the formula

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Example M183

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M175 are mixed with 0.25% of the polymerisable compound of the formula

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Example M184

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M175 are mixed with 0.25% of the polymerisable compound of the formula

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Example M185

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M175 are mixed with 0.25% of the polymerisable compound of the formula

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Example M186

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M175 are mixed with 0.3% of the polymerisable compound of the formula

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Example M187

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M166 are mixed with 0.3% of the polymerisable compound of the formula

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Example M188

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M167 are mixed with 0.3% of the polymerisable compound of the formula

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Example M189

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M167 are mixed with 0.3% of the polymerisable compound of the formula

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Example M190

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M167 are mixed with 0.3% of the polymerisable compound of the formula

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Example M191

CC-3-V
12.00%
Clearing point [° C.]:
111.6

CC-3-V1
5.50%
Δn [589 nm, 20° C.]:
0.1101

CCP-3-1
9.50%
Δε [1 kHz, 20° C.]:
−5.2

CCY-3-O1
5.00%
ε_|| [1 kHz, 20° C.]:
3.7

CCY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
8.9

CCY-4-O2
7.00%
K₁[pN, 20° C.]:
18.6

CCY-5-O2
3.50%
K₃[pN, 20° C.]:
20.6

CLY-2-O4
5.00%
V₀[pN, 20° C.]:
2.11

CLY-3-O2
7.00%
γ₁[mPa · s, 20° C.]:
252

CLY-3-O3
6.00%

CPY-3-O2
8.00%

CY-3-O2
12.00%

CY-5-O2
4.50%

PGIY-2-O4
3.00%

B-2O-O5
4.00%

Example M192

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M191 are mixed with 0.3% of the polymerisable compound of the formula

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Example M193

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M191 are mixed with 0.25% of the polymerisable compound of the

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Example M194

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M191 are mixed with 0.25% of the polymerisable compound of the formula

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Example M195

CC-3-V
45.50%
Clearing point [° C.]:
73.5

CCY-3-O1
5.50%
Δn [589 nm, 20° C.]:
0.1013

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.4

CPY-2-O2
9.00%
K₁[pN, 20° C.]:
13.1

CPY-3-O2
10.50%
K₃[pN, 20° C.]:
14.4

CY-3-O2
3.00%
γ₁[mPa · s, 20° C.]:
80

PY-3-O2
11.00%

B-3O-O5
2.50%

B-3O-O4
2.50%

Example M196

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M195 are mixed with 0.25% of the polymerisable compound of the

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Example M197

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M195 are mixed with 0.3% of the polymerisable compound of the formula

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Example M198

CC-3-V
41.00%
Clearing point [° C.]:
73.9

CCY-3-O1
6.00%
Δn [589 nm, 20° C.]:
0.1011

CCY-3-O2
11.00%
Δε [1 kHz, 20° C.]:
−3.6

CCY-4-O2
6.00%
K₁[pN, 20° C.]:
13.2

CPY-3-O2
4.00%
K₃[pN, 20° C.]:
14.6

CPY-3-O2
11.00%
γ₁[mPa · s, 20° C.]:
90

CY-3-O2
3.00%

PY-3-O2
12.00%

B-3-O3
6.00%

Example M199

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M198 are mixed with 0.25% of the polymerisable compound of the formula

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Example M200

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M198 are mixed with 0.25% of the polymerisable compound of the formula

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Example M201

CY-3-O2
17.00%
Clearing point [° C.]:
74.4

CCY-3-O2
6.00%
Δn [589 nm, 20° C.]:
0.1116

CLY-3-O2
7.00%
Δε [1 kHz, 20° C.]:
−3.7

CPY-2-O2
3.00%
K₁[pN, 20° C.]:
13.5

CPY-3-O2
10.00%
K₃[pN, 20° C.]:
15.2

PYP-2-3
6.50%
V₀[pN, 20° C.]:
2.14

PGIY-2-O4
7.00%
γ₁[mPa · s, 20° C.]:
97

B-2O-O5
4.00%
LTS bulk [−20° C.]:
>1000 h

CC-3-V
33.00%

CC-3-V1
6.50%

Example M202

B-2O-O5
2.00%
Clearing point [° C.]:
74.3

BCH-32
8.50%
Δn [589 nm, 20° C.]:
0.1095

CC-3-V1
7.00%
Δε [1 kHz, 20° C.]:
−3.2

CCH-301
3.00%
ε_|| [1 kHz, 20° C.]:
3.6

CCH-34
7.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CCH-35
7.00%
K₁[pN, 20° C.]:
13.8

CCP-3-1
8.00%
K₃[pN, 20° C.]:
16.4

CCY-3-O2
11.00%
V₀[pN, 20° C.]:
2.41

CLY-3-O2
5.00%
γ₁[mPa · s, 20° C.]:
114

CPY-3-O2
2.00%

CY-3-O2
14.00%

PCH-301
8.50%

PY-3-O2
14.00%

PYP-2-3
3.00%

Example M203

For the preparation of a polymer stabilized mixture, 99.65% of the mixture according to Example M202 are mixed with 0.35% of the polymerisable compound of the formula

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Example M204

CLY-2-O4
2.00%
Clearing point [° C.]:
79.5

CLY-3-O2
7.50%
Δn [589 nm, 20° C.]:
0.1151

CLY-3-O3
4.50%
Δε [1 kHz, 20° C.]:
−4.0

CPY-2-O2
10.00%
ε_|| [1 kHz, 20° C.]:
3.8

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.7

PGIY-2-O4
8.00%
K₁[pN, 20° C.]:
14.3

PYP-2-3
3.00%
K₃[pN, 20° C.]:
14.9

B-2O-O5
5.00%
V₀[pN, 20° C.]:
2.02

CC-3-V
38.50%
γ₁[mPa · s, 20° C.]:
107

CY-3-O2
11.50%

Example M205

B-2O-O5
4.00%
Clearing point [° C.]:
75

BCH-32
3.00%
Δn [589 nm, 20° C.]:
0.1096

CC-3-V1
9.00%
Δε [1 kHz, 20° C.]:
−3.1

CCH-301
2.00%
ε_|| [1 kHz, 20° C.]:
3.5

CCH-34
8.00%
ε_⊥ [1 kHz, 20° C.]:
6.6

CCH-35
8.00%
K₁[pN, 20° C.]:
14.6

CCP-V2-1
5.00%
K₃[pN, 20° C.]:
16.3

CCY-3-O2
1.50%
V₀[pN, 20° C.]:
2.39

CLY-3-O2
10.00%
γ₁[mPa · s, 20° C.]:
109

CPY-3-O2
8.00%

CY-3-O2
6.50%

PCH-301
17.50%

CPY-2-O2
8.00%

PY-3-O2
9.50%

Example M206

For the preparation of a polymer stabilized mixture, 99.7% of the mixture according to Example M205 are mixed with 0.3% of the polymerisable compound of the formula

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Example M207

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M205 are mixed with 0.25% of the polymerisable compound of the

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Example M208

CCP-3-1
5.00%
Clearing point [° C.]:
75

CLY-3-O2
8.00%
Δn [589 nm, 20° C.]:
0.1086

CLY-3-O3
4.00%
Δε [1 kHz, 20° C.]:
−3.7

CPY-2-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

PGIY-2-O4
1.00%
K₁[pN, 20° C.]:
14.4

B-2O-O5
5.00%
K₃[pN, 20° C.]:
15.8

CC-3-V
31.00%
V₀[pN, 20° C.]:
2.19

CC-3-V1
8.50%
γ₁[mPa · s, 20° C.]:
94

CY-3-O2
6.00%

CY-5-O2
2.00%

PY-3-O2
11.50%

Example M209

CCY-3-O2
5.50%
Clearing point [° C.]:
75

CLY-3-O2
8.00%
Δn [589 nm, 20° C.]:
0.1047

CLY-3-O3
4.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-2-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

PYP-2-3
5.50%
K₁[pN, 20° C.]:
13.5

B-2O-O5
5.00%
K₃[pN, 20° C.]:
15.0

CC-3-V
36.00%
V₀[pN, 20° C.]:
2.06

CC-3-V1
2.50%
γ₁[mPa · s, 20° C.]:
98

CY-3-O2
15.00%

CY-5-O2
2.00%

Example M210

CCY-3-O2
6.50%
Clearing point [° C.]:
75

CLY-3-O2
8.00%
Δn [589 nm, 20° C.]:
0.1049

CLY-3-O3
4.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-2-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

PYP-2-3
5.00%
K₁[pN, 20° C.]:
13.5

PYP-2-4
1.50%
K₃[pN, 20° C.]:
14.9

B-2O-O5
3.00%
V₀[pN, 20° C.]:
2.06

CC-3-V
36.00%
γ₁[mPa · s, 20° C.]:
102

CY-3-O2
15.00%

CY-5-O2
5.00%

Example M211

CCY-3-O2
6.00%
Clearing point [° C.]:
75.5

CLY-3-O2
8.00%
Δn [589 nm, 20° C.]:
0.1023

CLY-3-O3
4.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-2-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

PYP-2-3
4.00%
K₁[pN, 20° C.]:
13.6

B-2O-O5
5.00%
K₃[pN, 20° C.]:
15.3

CC-3-V
35.50%
V₀[pN, 20° C.]:
2.09

CC-3-V1
4.00%
γ₁[mPa · s, 20° C.]:
97

CY-3-O2
15.00%

CY-5-O2
2.50%

Example M212

CCY-3-O2
7.00%
Clearing point [° C.]:
75.5

CLY-3-O2
8.00%
Δn [589 nm, 20° C.]:
0.1021

CLY-3-O3
4.00%
Δε [1 kHz, 20° C.]:
−3.9

CPY-2-O2
8.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.6

PYP-2-3
5.00%
K₁[pN, 20° C.]:
13.3

B-2O-O5
2.50%
K₃[pN, 20° C.]:
15.2

CC-3-V
35.50%
V₀[pN, 20° C.]:
2.09

CC-3-V1
1.00%
γ₁[mP · s, 20° C.]:
102

CY-3-O2
15.00%

CY-5-O2
6.00%

Example M213

B-2O-O5
4.00%
Clearing point [° C.]:
75

CC-3-V
46.00%
Δn [589 nm, 20° C.]:
0.1069

CC-3-V1
7.00%
Δε [1 kHz, 20° C.]:
−2.1

CCP-V-1
3.00%
K₁[pN, 20° C.]:
13.7

CLY-3-O2
6.50%
K₃[pN, 20° C.]:
14.4

CPY-2-O2
7.00%
V₀[pN, 20° C.]:
2.76

CPY-3-O2
9.00%
γ₁[mPa · s, 20° C.]:
68

PGIY-2-O4
3.00%

PY-3-O2
6.50%

PYP-2-3
8.00%

Example M214

PY-3-O2
16.00%
Clearing point [° C.]:
69.9

PY-4-O2
6.50%
Δn [589 nm, 20° C.]:
0.1092

CCY-3-O1
4.00%
Δε [1 kHz, 20° C.]:
−4.1

CCY-3-O2
6.00%
K₁[pN, 20° C.]:
13.5

CCY-4-O2
6.00%
K₃[pN, 20° C.]:
13.9

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
1.94

CLY-3-O3
4.00%
γ₁[mPa · s, 20° C.]:
96

B-2O-O5
5.00%

PGIY-2-O4
6.00%

CC-3-V
32.00%

CC-3-V1
6.00%

CCVC-3-V
0.50%

Example M215

CC-3-V
24.50%
Clearing point [° C.]:
86

CC-3-V1
6.50%
Δn [589 nm, 20° C.]:
0.1093

BCH-32
7.00%
Δε [1 kHz, 20° C.]:
−4.0

CCY-3-O2
3.00%
ε_|| [1 kHz, 20° C.]:
3.7

CLY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
7.7

CLY-3-O3
7.00%
K₁[pN, 20° C.]:
14.3

CPY-2-O2
10.00%
K₃[pN, 20° C.]:
15.9

CPY-3-O2
10.00%
V₀[pN, 20° C.]:
2.10

CY-3-O2
12.00%
γ₁[mPa · s, 20° C.]:
129

CY-5-O2
7.00%

B-2O-O5
5.00%

Example M216

CY-3-O2
12.00%
Clearing point [° C.]:
76.2

CY-5-O2
9.00%
Δn [589 nm, 20° C.]:
0.1088

CLY-3-O2
6.50%
Δε [1 kHz, 20° C.]:
−3.6

CPY-2-O2
11.00%
ε_|| [1 kHz, 20° C.]:
3.7

CPY-3-O2
12.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

PGIY-2-O4
4.50%
K₁[pN, 20° C.]:
12.6

B-2O-O5
4.00%
K₃[pN, 20° C.]:
14.1

CC-3-V
28.50%
V₀[pN, 20° C.]:
2.10

CC-3-V1
7.00%
γ₁[mPa · s, 20° C.]:
105

BCH-32
5.50%

Example M217

B-2O-O5
5.00%
Clearing point [° C.]:
80.3

CC-3-V
21.50%
Δn [589 nm, 20° C.]:
0.1100

CCY-3-O1
4.00%
Δε [1 kHz, 20° C.]:
−5.9

CCY-3-O2
6.00%
ε_∥ [1 kHz, 20° C.]:
4.4

CCY-4-O2
4.00%
ε_⊥ [1 kHz, 20° C.]:
10.3

CLY-2-O4
6.00%
γ₁[mPa · s, 20° C.]:
160

CLY-3-O2
7.00%

CLY-3-O3
6.00%

CPY-3-O2
12.00%

CY-3-O2
12.00%

CY-5-O2
3.50%

PGIY-2-O4
7.00%

Y-4O-O4
6.00%

Example M218

B-2O-O5
5.00%
Clearing point [° C.]:
80

CC-3-V
30.00%
Δn [589 nm, 20° C.]:
0.1098

CCY-3-O2
7.00%
Δε [1 kHz, 20° C.]:
−4.9

CLY-2-O4
6.00%
ε_∥ [1 kHz, 20° C.]:
4.2

CLY-3-O2
7.00%
ε_⊥ [1 kHz, 20° C.]:
9.1

CLY-3-O3
6.00%
γ₁[mPa · s, 20° C.]:
128

CPY-2-O2
8.00%

CPY-3-O2
10.00%

CY-3-O2
8.00%

PGIY-2-O4
7.00%

Y-4O-O4
6.00%

Example M219

PYP-2-4
2.00%
Clearing point [° C.]:
85.9

B-2O-O2
3.00%
Δn [589 nm, 20° C.]:
0.1098

CC-3-V
24.35%
Δε [1 kHz, 20° C.]:
−5.1

CCY-3-O2
6.00%
ε_∥ [1 kHz, 20° C.]:
3.9

CCY-4-O2
4.60%
ε_⊥ [1 kHz, 20° C.]:
9.0

CLY-2-O4
4.60%
K₁[pN, 20° C.]:
14.3

CLY-3-O2
7.00%
K₃[pN, 20° C.]:
15.0

CLY-3-O3
6.15%
V₀[pN, 20° C.]:
1.83

CPY-3-O2
9.45%
γ₁[mPa · s, 20° C.]:
164

CY-3-O2
12.00%

CY-5-O2
8.85%

PGIY-2-O4
7.35%

CCY-3-O1
1.50%

CCY-3-O3
1.20%

CY-3-O4
1.95%

Example M220

B-2O-O5
5.00%
Clearing point [° C.]:
86.5

CC-3-V
19.00%
Δn [589 nm, 20° C.]:
0.1097

CCY-3-O1
5.00%
Δε [1 kHz, 20° C.]:
−6.3

CCY-3-O2
6.00%
ε_∥ [1 kHz, 20° C.]:
4.4

CCY-3-O3
5.50%
ε_⊥ [1 kHz, 20° C.]:
10.7

CCY-4-O2
6.00%
K₁[pN, 20° C.]:
14.2

CLY-2-O4
6.00%
K₃[pN, 20° C.]:
14.5

CLY-3-O2
7.00%
V₀[pN, 20° C.]:
1.61

CLY-3-O3
6.00%
γ₁[mPa · s, 20° C.]:
186

CPY-3-O2
8.00%

CY-3-O2
12.00%

CY-5-O2
1.50%

PGIY-2-O4
7.00%

Y-4O-O4
6.00%

Example M221

B-2O-O5
3.00%
Clearing point [° C.]:
85.7

CC-3-V
29.00%
Δn [589 nm, 20° C.]:
0.1097

CCY-3-O2
6.00%
Δε [1 kHz, 20° C.]:
−4.6

CCY-4-O2
4.00%
ε_∥ [1 kHz, 20° C.]:
3.8

CLY-2-O4
4.00%
ε_⊥ [1 kHz, 20° C.]:
8.4

CLY-3-O2
7.00%
K₁[pN, 20° C.]:
13.9

CLY-3-O3
6.00%
K₃[pN, 20° C.]:
15.3

CPY-3-O2
12.00%
V₀[pN, 20° C.]:
1.93

CY-3-O2
12.00%
γ₁[mPa · s, 20° C.]:
144

CY-5-O2
7.50%

PGIY-2-O4
7.50%

PYP-2-4
2.00%

Example M222

CC-3-V
33.25%
Clearing point [° C.]:
75.2

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1144

CY-3-O2
5.50%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O2
7.00%
ε_∥ [1 kHz, 20° C.]:
3.8

CLY-3-O3
6.00%
ε_⊥ [1 kHz, 20° C.]:
7.5

CPY-2-O2
5.75%
K₁[pN, 20° C.]:
13.7

CPY-3-O2
11.00%
K₃[pN, 20° C.]:
14.3

PYP-2-3
4.50%
V₀[pN, 20° C.]:
2.07

Y-4O-O4
5.00%
γ₁[mPa · s, 20° C.]:
96

PGIY-2-O4
10.00%

B-2O-O5
4.00%

Example M223

CC-3-V
34.50%
Clearing point [° C.]:
75.8

CC-3-V1
8.00%
Δn [589 nm, 20° C.]:
0.1111

CY-3-O2
5.00%
Δε [1 kHz, 20° C.]:
−3.7

CLY-3-O2
7.00%
ε_∥ [1 kHz, 20° C.]:
3.8

CLY-3-O3
6.00%
ε_⊥ [1 kHz, 20° C.]:
7.5

CPY-2-O2
8.00%
K₁[pN, 20° C.]:
13.9

CPY-3-O2
11.00%
K₃[pN, 20° C.]:
14.3

PYP-2-3
1.50%
V₀[pN, 20° C.]:
2.06

Y-4O-O4
5.00%
γ₁[mPa · s, 20° C.]:
94

PGIY-2-O4
10.00%

B-2O-O5
4.00%

Example M224

CCP-V-1
10.50%
Clearing point [° C.]:
102.3

CCP-V2-1
10.00%
Δn [589 nm, 20° C.]:
0.1092

CCY-3-O2
5.00%
Δε [1 kHz, 20° C.]:
−3.8

CCY-3-O3
4.50%
ε_∥ [1 kHz, 20° C.]:
3.5

CCY-4-O2
5.00%
ε_⊥ [1 kHz, 20° C.]:
7.3

CLY-3-O2
4.00%
K₁[pN, 20° C.]:
17.1

CLY-3-O3
4.00%
K₃[pN, 20° C.]:
18.6

CPY-2-O2
2.00%
V₀[pN, 20° C.]:
2.34

CPY-3-O2
9.00%

PGIY-2-O4
5.00%

B-2O-O5
5.00%

CC-3-V
23.00%

CY-3-O4
13.00%

Example M225

CC-3-V
7.00%
Clearing point [° C.]:
105.1

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1105

CCP-3-1
15.00%
Δε [1 kHz, 20° C.]:
−5.0

CCP-V2-1
9.00%
ε_∥ [1 kHz, 20° C.]:
3.9

CCY-3-O1
5.00%
ε_⊥ [1 kHz, 20° C.]:
8.9

CCY-3-O2
8.00%
K₁[pN, 20° C.]:
18.7

CCY-5-O2
5.00%
K₃[pN, 20° C.]:
20.3

CLY-3-O2
8.00%
V₀[pN, 20° C.]:
2.14

CLY-3-O3
7.00%
γ₁[mPa · s, 20° C.]:
200

CPY-3-O2
5.00%

CY-3-O2
5.00%

PGIY-2-O4
3.00%

B-2O-O5
7.00%

Y-4O-O4
9.00%

Example M226

CC-3-V
17.50%
Clearing point [° C.]:
110

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1103

CCP-3-1
11.00%
Δε [1 kHz, 20° C.]:
−4.5

CCY-3-O1
5.00%
ε_∥ [1 kHz, 20° C.]:
3.5

CCY-3-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
8.0

CCY-4-O2
3.00%
K₁[pN, 20° C.]:
18.8

CLY-2-O4
4.50%
K₃[pN, 20° C.]:
20.9

CLY-3-O2
7.50%
V₀[pN, 20° C.]:
2.28

CLY-3-O3
6.50%
γ₁[mPa · s, 20° C.]:
206

CPY-3-O2
11.00%

CY-3-O2
11.00%

PGIY-2-O4
3.00%

B-2O-O5
5.00%

Example M227

CC-3-V
27.50%
Clearing point [° C.]:
74.8

CY-3-O2
4.00%
Δn [589 nm, 20° C.]:
0.1196

CCY-3-O2
7.00%
Δε [1 kHz, 20° C.]:
−5.1

CCY-4-O2
4.00%
ε_∥ [1 kHz, 20° C.]:
4.3

CPY-2-O2
8.00%
ε_⊥ [1 kHz, 20° C.]:
9.4

CPY-3-O2
10.00%
K₁[pN, 20° C.]:
13.3

PYP-2-3
7.50%
K₃[pN, 20° C.]:
13.8

CLY-3-O2
7.00%
V₀[pN, 20° C.]:
1.73

CLY-3-O3
4.00%
γ₁[mPa · s, 20° C.]:
123

Y-4O-O4
10.00%

PGIY-2-O4
7.00%

B-2O-O5
4.00%

Example M228

CC-3-V
19.00%
Clearing point [° C.]:
104.7

CC-3-V1
7.00%
Δn [589 nm, 20° C.]:
0.1102

CCP-3-1
6.00%
Δε [1 kHz, 20° C.]:
−4.7

CCY-3-O1
5.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CCY-3-O2
6.00%
ε_⊥ [1 kHz, 20° C.]:
8.3

CCY-4-O2
3.50%
K₁[pN, 20° C.]:
17.7

CCY-5-O2
3.00%
K₃[pN, 20° C.]:
19.6

CLY-2-O4
2.50%
V₀[pN, 20° C.]:
2.15

CLY-3-O2
7.50%
γ₁[mPa · s, 20° C.]:
196

CLY-3-O3
7.00%

CPY-3-O2
11.50%

CY-3-O2
10.00%

CY-5-O2
3.00%

PGIY-2-O4
4.00%

B-2O-O5
5.00%

Example M229

CY-3-O2
11.00%
Clearing point [° C.]:
74

CY-3-O4
4.00%
Δn [589 nm, 20° C.]:
0.1084

CCY-3-O2
6.00%
Δε [1 kHz, 20° C.]:
−3.3

CCY-4-O2
6.00%
ε_∥ [1 kHz, 20° C.]:
3.9

CCH-34
10.00%
ε_⊥ [1 kHz, 20° C.]:
7.2

CCH-35
5.00%
K₁[pN, 20° C.]:
14.8

CCP-3-1
16.00%
K₃[pN, 20° C.]:
14.4

CCP-3-3
12.00%
V₀[pN, 20° C.]:
2.20

PYP-2-3
7.00%
γ₁[mPa · s, 20° C.]:
115

PP-1-3
5.00%

PGIY-2-O4
5.00%

Y-4O-O4
9.00%

B-2O-O5
4.00%

Example M230

B-2O-O5
4.00%
Clearing point [° C.]:
74.2

BCH-32
8.00%
Δn [589 nm, 20° C.]:
0.1091

CC-3-V1
9.00%
Δε [1 kHz, 20° C.]:
−3.1

CCH-301
2.00%
ε_∥ [1 kHz, 20° C.]:
3.6

CCH-34
8.00%
ε_⊥ [1 kHz, 20° C.]:
6.7

CCH-35
7.00%
K₁[pN, 20° C.]:
14.5

CCP-3-1
8.00%
K₃[pN, 20° C.]:
16.5

CCP-V2-1
5.00%
V₀[pN, 20° C.]:
2.41

CCY-3-O2
10.50%
γ₁[mPa · s, 20° C.]:
108

CLY-3-O2
1.00%

CPY-3-O2
2.50%

CY-3-O2
11.50%

PCH-301
5.50%

PY-3-O2
18.00%

Example M231

CY-3-O2
12.00%
Clearing point [° C.]:
75

CY-5-O2
5.50%
Δn [589 nm, 20° C.]:
0.1112

CCY-3-O2
4.00%
Δε [1 kHz, 20° C.]:
−3.6

CCY-5-O2
2.00%
ε_∥ [1 kHz, 20° C.]:
3.7

CLY-3-O2
4.50%
ε_⊥ [1 kHz, 20° C.]:
7.3

CLY-3-O3
2.00%
K₁[pN, 20° C.]:
13.6

CPY-2-O2
3.00%
K₃[pN, 20° C.]:
15.0

CPY-3-O2
10.50%
V₀[pN, 20° C.]:
2.13

PYP-2-3
6.50%
γ₁[mPa · s, 20° C.]:
100

PGIY-2-O4
7.00%
LTS bulk [−20° C.]:
>1000 h

B-2O-O5
4.00%

CC-3-V
32.50%

CC-3-V1
6.50%

Example M232

For the preparation of a polymer stabilized mixture, 99.7% of the mixture according to Example M231 are mixed with 0.3% of the polymerisable compound of the formula

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LIQUID-CRYSTALLINE MEDIUM

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Abstract

Description

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Provisional Applications (1)