This patent application is based on and claims priority pursuant to 35 U.S.C. §119(a) to Japanese Patent Application No. 2021-164956, filed on Oct. 6, 2021, in the Japan Patent Office, the entire disclosure of which is hereby incorporated by reference herein.
Embodiments of the present disclosure relate to a liquid discharge head and a liquid discharge apparatus that discharges liquid.
Some liquid discharge heads include a nozzle member that includes a deformable laminar member having an opening that forms a nozzle to discharge liquid and a flexibly deformable piezoelectric element on the deformable laminar member.
As known in the art, when the liquid is discharged, the piezoelectric element is driven to deform a surrounding area of the opening of the laminar member. Specifically, the piezoelectric element is driven to warp the surrounding area in a liquid discharge direction or in a direction opposite to the liquid discharge direction. Thus, the piezoelectric element is driven to control the liquid discharge direction.
According to an embodiment of the present disclosure, a novel liquid discharge head includes a nozzle member. The nozzle member includes a nozzle, a deformable laminar member, and an electromechanical transducer. The nozzle discharges liquid. The deformable laminar member has an opening forming the nozzle. The electromechanical transducer is disposed around the opening. The nozzle member is warped with respect to a discharge-side plane of the nozzle member in a surrounding area of the nozzle when no voltage is applied to the electromechanical transducer.
Also described is a novel a liquid discharge apparatus. According to an embodiment of the present disclosure, the liquid discharge apparatus includes the liquid discharge head, a wiper, and a voltage applier. The wiper wipes a discharge face of the liquid discharge head. The voltage applier applies a voltage to the electromechanical transducer of the liquid discharge head to warp the surrounding area of the nozzle in the liquid discharge direction when the wiper wipes the discharge face.
Also described is a liquid discharge apparatus. According to an embodiment of the present disclosure, the liquid discharge apparatus includes the liquid discharge head, a wiper, and a voltage applier. The wiper wipes a discharge face of the liquid discharge head. The voltage applier applies a voltage to the electromechanical transducer of the liquid discharge head to warp the surrounding area of the nozzle in a direction opposite to the liquid discharge direction when the wiper wipes the discharge face.
A more complete appreciation of embodiments of the present disclosure and many of the attendant advantages and features thereof can be readily obtained and understood from the following detailed description with reference to the accompanying drawings, wherein:
The accompanying drawings are intended to depict embodiments of the present disclosure and should not be interpreted to limit the scope thereof. The accompanying drawings are not to be considered as drawn to scale unless explicitly noted. Also, identical or similar reference numerals designate identical or similar components throughout the several views.
In describing embodiments illustrated in the drawings, specific terminology is employed for the sake of clarity. However, the disclosure of this specification is not intended to be limited to the specific terminology so selected and it is to be understood that each specific element includes all technical equivalents that have a similar function, operate in a similar manner, and achieve a similar result.
Referring now to the drawings, embodiments of the present disclosure are described below. As used herein, the singular forms “a,” “an,” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise.
For the sake of simplicity, like reference numerals are given to identical or corresponding constituent elements such as parts and materials having the same functions, and redundant descriptions thereof are omitted unless otherwise required.
Note that, in the following description, suffixes Y, M, C, and K denote colors of yellow, magenta, cyan, and black, respectively. To simplify the description, these suffixes are omitted unless necessary.
As used herein, the term “connected/coupled” includes both direct connections and connections in which there are one or more intermediate connecting elements.
Initially with reference to
A liquid discharge apparatus 1, as an apparatus that discharges liquid, includes a liquid discharge head 100 according to the present embodiment.
The liquid discharge head 100 includes a nozzle member 101 and a liquid chamber former 102. The nozzle member 101 includes a nozzle 110 that discharges liquid. The liquid chamber former 102 forms a liquid chamber 120 that is communicated with the nozzle 110.
The nozzle member 101 includes a laminar member (or nozzle base) 111 and a piezoelectric element 112. The laminar member 111 serves as a deformable nozzle plate or diaphragm having an opening 111a forming the nozzle 110 that discharges the liquid. The piezoelectric element 112 serves as an electromechanical transducer disposed around the opening 111a of the laminar member 111.
The laminar member 111 has a layer structure including a vibration layer 504 and an insulation layer 503 having a stress adjusting function.
The piezoelectric element 112 includes a lower electrode 113 on a surface of the vibration layer 504 of the laminar member 111, a piezoelectric film 114 as an electromechanical conversion film on the lower electrode 113, and an upper electrode 115 on the piezoelectric film 114.
A protective film 116 covers the piezoelectric element 112.
A liquid repellent film 117 having liquid repellency is formed on the surface of the protective film 116. A surface of the liquid repellent film 117 serves as a discharge face 118.
The liquid chamber former 102 forms the liquid chamber 120 that is communicated with the nozzle 110, in other words, the opening 111a of the laminar member 111, of the nozzle member 101.
In the present embodiment, when no voltage is applied to the piezoelectric element 112 in the liquid discharge head 100, the nozzle member 101 is warped with respect to a discharge-side plane of the nozzle member 101 in a surrounding area 130 of the nozzle 110. In other words, the surrounding area 130 of the nozzle 110 is warped with respect to the main plane of the nozzle member 101 having a larger area than other faces of the nozzle member 101.
In the present embodiment, the surrounding area 130 of the nozzle 110 is an area of a part around the nozzle 110 of a portion of the nozzle member 101 facing the liquid chamber 120. The surrounding area 130 of the nozzle 110 is warped in a direction opposite to a liquid discharge direction. In other words, the surrounding area 130 of the nozzle 110 is warped toward the liquid chamber 120. The warp of the surrounding area 130 of the nozzle 110 in the present embodiment is adjusted with the insulation layer 503 of the laminar member 111 having a stress adjusting function.
The liquid discharge apparatus 1 further includes a maintenance assembly 200 that includes a wiper 201 to wipe the discharge face 118 of the liquid discharge head 100. The wiper 201 is moved by a wiping assembly driving controller 202 relative to the liquid discharge head 100 to wipe and clean the discharge face 118.
The liquid discharge apparatus 1 further includes a voltage applier 300 that applies a voltage to the piezoelectric element 112 of the liquid discharge head 100. The voltage applier 300 applies a given voltage, as a first voltage, to drive the piezoelectric element 112 so as to warp the surrounding area 130 of the nozzle 110 of the nozzle member 101 in the liquid discharge direction.
In the present embodiment, when the wiper 201 performs a wiping operation of wiping the discharge face 118, the voltage applier 300 applies the first voltage to the piezoelectric element 112 corresponding to the nozzle 110 in the surrounding area 130 in which a residual liquid adheres to the discharge face 118.
Referring now to
The liquid discharge apparatus 1 performs an operation of maintaining and recovering the state of the liquid discharge head 100 with the maintenance assembly 200 at a given point in time. At this time, the wiping assembly driving controller 202 of the maintenance assembly 200 moves the wiper 201 relative to the discharge face 118 of the liquid discharge head 100 to wipe and clean the discharge face 118 of the liquid discharge head 100.
In the present embodiment, the voltage applier 300 applies the first voltage to the piezoelectric element 112 corresponding to the nozzle 110 adjacent to the discharge face 118 to which a residual liquid 400 adheres. As a result, as illustrated in
Accordingly, as illustrated in
On the other hand, the voltage applier 300 does not apply the first voltage to the piezoelectric element 112 corresponding to the nozzle 110 adjacent to the discharge face 118 to which the residual liquid 400 does not adhere. In other words, as illustrated in
Accordingly, as illustrated in
Referring now to
A liquid discharge apparatus 1A, as an apparatus that discharges liquid, includes a liquid discharge head 100A according to the present embodiment.
The liquid discharge head 100A includes the nozzle member 101 and the liquid chamber former 102. The nozzle member 101 includes the nozzle 110 that discharges liquid. The liquid chamber former 102 forms the liquid chamber 120 that is communicated with the nozzle 110.
The nozzle member 101 includes the laminar member (or nozzle base) 111 and the piezoelectric element 112. The laminar member 111 serves as a deformable nozzle plate or diaphragm having the opening 111a forming the nozzle 110 that discharges the liquid. The piezoelectric element 112 serves as an electromechanical transducer disposed around the opening 111a of the laminar member 111.
The piezoelectric element 112 includes the lower electrode 113 on the surface of the vibration layer 504 of the laminar member 111, the piezoelectric film 114 as an electromechanical conversion film on the lower electrode 113, and the upper electrode 115 on the piezoelectric film 114. The protective film 116 covers the piezoelectric element 112.
The liquid repellent film 117 having liquid repellency is formed on the surface of the protective film 116. The surface of the liquid repellent film 117 serves as the discharge face 118.
The liquid chamber former 102 forms the liquid chamber 120 that is communicated with the nozzle 110, in other words, the opening 111a of the laminar member 111, of the nozzle member 101.
In the present embodiment, when no voltage is applied to the piezoelectric element 112 in the liquid discharge head 100A, the nozzle member 101 is warped with respect to the discharge-side plane of the nozzle member 101 in the surrounding area 130 of the nozzle 110. In other words, the surrounding area 130 of the nozzle 110 is warped with respect to the main plane of the nozzle member 101 having a larger area than other faces of the nozzle member 101.
In the present embodiment, the surrounding area 130 of the nozzle 110 is an area of a part around the nozzle 110 of the portion of the nozzle member 101 facing the liquid chamber 120. The surrounding area 130 of the nozzle 110 is warped in the liquid discharge direction. In other words, the surrounding area 130 of the nozzle 110 is warped away from the liquid chamber 120. Like the first embodiment, the warp of the surrounding area 130 of the nozzle 110 in the present embodiment is adjusted with the insulation layer 503 of the laminar member 111 having a stress adjusting function.
The liquid discharge apparatus 1A further includes the maintenance assembly 200 that includes the wiper 201 to wipe the discharge face 118 of the liquid discharge head 100A. The wiper 201 is moved by the wiping assembly driving controller 202 relative to the liquid discharge head 100A to wipe and clean the discharge face 118.
The liquid discharge apparatus 1A further includes the voltage applier 300 that applies a voltage to the piezoelectric element 112 of the liquid discharge head 100A. The voltage applier 300 applies a given voltage, as a second voltage, to drive the piezoelectric element 112 so as to warp the surrounding area 130 of the nozzle 110 of the nozzle member 101 in the direction opposite to the liquid discharge direction, in other words, toward the liquid chamber 120.
In the present embodiment, when the wiper 201 performs the wiping operation, the voltage applier 300 applies the second voltage to the piezoelectric element 112 corresponding to the nozzle 110 in the surrounding area 130 in which no residual liquid adheres to the discharge face 118.
Referring now to
The liquid discharge apparatus 1A performs the operation of maintaining and recovering the state of the liquid discharge head 100A with the maintenance assembly 200 at a given point in time. At this time, the wiping assembly driving controller 202 of the maintenance assembly 200 moves the wiper 201 relative to the discharge face 118 of the liquid discharge head 100A to wipe and clean the discharge face 118 of the liquid discharge head 100A.
In the present embodiment, the voltage applier 300 does not apply the second voltage to the piezoelectric element 112 corresponding to the nozzle 110 adjacent to the discharge face 118 to which the residual liquid 400 adheres. In other words, as illustrated in
Accordingly, as illustrated in
On the other hand, the voltage applier 300 applies the second voltage to the piezoelectric element 112 corresponding to the nozzle 110 adjacent to the discharge face 118 to which the residual liquid 400 does not adhere. As a result, as illustrated in
Accordingly, as illustrated in
Referring now to
Like the first embodiment described above, when no voltage is applied to the piezoelectric element 112 in a liquid discharge head 100B of a liquid discharge apparatus 1B as an apparatus that discharges liquid according to the present embodiment, the nozzle member 101 is warped with respect to the discharge-side plane of the nozzle member 101 in a surrounding area 130B of the nozzle 110 in the direction opposite to the liquid discharge direction.
In the present embodiment, the surrounding area 130B of the nozzle 110 is the entire area of the portion of the nozzle member 101 facing the liquid chamber 120. As described above, the surrounding area 130B of the nozzle 110 is warped in the direction opposite to the liquid discharge direction. In other words, the surrounding area 130B of the nozzle 110 is warped toward the liquid chamber 120.
Accordingly, a face 101a of the nozzle member 101 facing the liquid chamber 120 and a sidewall face 120a of the liquid chamber 120 form an angle θ less than 90°. In other words, the nozzle member 101 has the face 101a facing the liquid chamber 120, and the face 101a is inclined at the angle θ less than 90° with respect to the sidewall face 120a of the liquid chamber 120.
As in the embodiments described above, for the nozzle 110 in the surrounding area 130B to which a residual liquid adheres, the surrounding area 130B of the nozzle 110 is warped in the liquid discharge direction when the wiper 201 performs the wiping operation.
Referring now to a first comparative example illustrated in
In a liquid discharge head 1100 according to the first comparative example, the face 101a of the nozzle member 101 facing the liquid chamber 120 and the sidewall face 120a of the liquid chamber 120 form an angle θ equal to or greater than 90°.
In a liquid discharge head that includes the piezoelectric element 112 in the surrounding area 130B of the nozzle 110 of the nozzle member 101 to vibrate the nozzle member 101 and perform a liquid discharge operation as in the present embodiment and the first comparative example, the stress is applied to a joint between the nozzle member 101 and the liquid chamber former 102.
In other words, when the liquid discharge head performs the liquid discharge operation, the application of a voltage to the piezoelectric element 112 displaces the surrounding area 130B of the nozzle 110 in a direction in which the angle θ increases at the joint between the face 101a of the nozzle member 101 facing the liquid chamber 120 and the sidewall face 120a of the liquid chamber 120.
As in the first comparative example illustrated in
When the angle θ thus exceeds 90°, tensile stress is applied to the nozzle member 101 at the joint. The tensile stress repeatedly applied in association with the liquid discharge operation may cause cracks in the laminar member 111 of the nozzle member 101 and shorten the lifespan of the liquid discharge head 1100.
To prevent such a situation, according to the present embodiment, the surrounding area 130B of the nozzle 110 is warped such that the angle θ is less than 90° between the face 101a of the nozzle member 101 facing the liquid chamber 120 and the sidewall face 120a of the liquid chamber 120. As a result, a decreased tensile stress is applied when the liquid discharge operation is performed. Accordingly, the lifespan of the liquid discharge head is lengthened.
Referring now to
Subsequently, as illustrated in
Then, as illustrated in
Thereafter, as illustrated in
Then, as illustrated in
Next, as illustrated in
Subsequently, as illustrated in
Next, as illustrated in
Subsequently, as illustrated in
The liquid discharge head illustrated in
Now, a description is given of a specific example of a method for manufacturing the liquid discharge head according to the first embodiment of the present disclosure.
In the manufacturing process described with reference to
Since the two SiO layers have compressive stress with respect to the vibration layer 504 as the Si layer, the surrounding area 130 of the nozzle 110 is warped in the direction opposite to the liquid discharge direction, in other words, toward the liquid chamber 120, after the process is completed.
Accordingly, the wiper 201 is prevented from contacting the nozzle 110 during the wiping operation, or the wiper 201 contacts the nozzle 110 with decreased pressure during the wiping operation. As a result, the repetitive wiping load on the liquid repellent film 117 is reduced, resulting in an extension of the lifespan of the liquid repellent film 117.
On the other hand, for the nozzle 110 in which a normal meniscus is not formed, the first voltage is applied in a direction in which the piezoelectric element 112 contracts so that the wiper 201 wipes the discharge face 118 adjacent to the nozzle 110 to reliably remove a contaminant from the discharge face 118. As a result, as described above, the surrounding area 130 of the nozzle 110 is warped in the liquid discharge direction, allowing the wiper 201 to reliably contact the surrounding area 130 and remove the contaminant from the surrounding area 130 at the time of wiping. Thus, the normal meniscus is formed with a small number of times of wiping.
In the first embodiment, a layer structure is employed in which the surrounding area 130 of the nozzle 110 is warped in the direction opposite to the liquid discharge direction when no voltage is applied to the piezoelectric element 112. On the other hand, such a layer structure may be employed in which, by controlling the film thickness and residual stress of the layer structure at the portion of the nozzle 110 of the nozzle member 101, the surrounding area 130 of the nozzle 110 is warped in the direction opposite to the liquid discharge direction when no voltage is applied to the piezoelectric element 112, as in the second embodiment.
Referring now to
A liquid discharge head 1100M according to the present modification includes silicon-on-insulator (SOI) substrates. Specifically, in the manufacturing process of the liquid discharge head described with reference to
Using the SOI substrates as the substrates that form the liquid chamber 120 together with the drive circuit 501 reduces the stray capacitance and the leakage current generated in the drive circuit 501 and attains high-speed printing processing with the liquid discharge head 100 and power saving while enhancing the pressure resistance and reliability of the drive circuit 501.
With continued reference to
As described above, when the discharge operation is repeatedly performed, stresses are repeatedly applied to the joint between the sidewall face 120a of the liquid chamber 120 and the laminar member 111. When a voltage is applied to the piezoelectric element 112, the surrounding area 130 of the nozzle 110 is displaced in a direction in which the angle θ increases at the joint.
When the angle θ exceeds 90°, the tensile stress is applied to the laminar member 111 at the joint. Repeated application of the tensile stress may cause cracks in the laminar member 111 and shorten the lifespan of the laminar member 111.
The liquid discharge head 1100 of the first comparative example as illustrated in
When a rectangular wave of ±150 V was applied to the liquid discharge head 1100 of the first comparative example, the liquid discharge head 1100 malfunctioned due to cracks in the laminar member 111 after the input of a 1E9 pulse.
According to a first example of the third embodiment, the protective film 116 is a BCB layer having a thickness of 0.5 μm. The piezoelectric element 112 is made of AlN and has a thickness of 2 μm. The laminar member 111 is made of Si and has a thickness of 2 μm. Two SiO layers having a thickness of 1 μm are interposed between the laminar member 111 and the lower electrode 113.
As a result, as described in the third embodiment, the angle θ is less than 90° between the sidewall face 120a of the liquid chamber 120 and the face 101a of the nozzle member 101 facing the liquid chamber 120.
When a rectangular wave of ±150V was applied to the liquid discharge head 100B of the first example, the liquid discharge head 100B malfunctioned due to cracks in the laminar member 111 after the input of a 3E10 pulse. The comparison of the first example and the first comparative example clarifies that the lifespan of the liquid discharge head 100B of the first example is longer than the lifespan of the liquid discharge head 1100 of the first comparative example.
Referring now to
The liquid discharge apparatus 1, as an apparatus that discharges liquid, is a serial-type apparatus that includes a main-scanning moving assembly 493 to reciprocally move a carriage 403 in a main scanning direction. The main-scanning moving assembly 493 includes, e.g., a guide 401, a main-scanning motor 405, and a timing belt 408. The guide 401 is bridged between a left side plate 491A and a right side plate 491B to hold the carriage 403 such that the carriage 403 can move. The main-scanning motor 405 reciprocally moves the carriage 403 in the main scanning direction via the timing belt 408 bridged between a driving pulley 406 and a driven pulley 407.
The carriage 403 carries a liquid discharge device 440 in which a head tank 441 and the liquid discharge head 100 according to the embodiments described above are integrated into a single unit. The liquid discharge head 100 of the liquid discharge device 440 discharges liquid for each color, e.g., yellow (Y), cyan (C), magenta (M), and black (K). The liquid discharge head 100 includes a nozzle array including multiple nozzles in a sub-scanning direction orthogonal to the main scanning direction. The nozzle array is disposed to discharge the liquid downward.
The liquid discharge apparatus 1 further includes a supply assembly 494 to supply liquids stored outside the liquid discharge head 100 to the liquid discharge head 100. The supply assembly 494 supplies the liquids stored in liquid cartridges 450 to the head tank 441.
The supply assembly 494 includes, e.g., a cartridge holder 451, a tube 456, and a liquid feeder 452. The liquid cartridges 450 are attached to the cartridge holder 451 that serves as a filler. The liquid feeder 452 includes a liquid feed pump. Specifically, the liquid cartridges 450 are removably attached to the cartridge holder 451. The liquid feeder 452 feeds the liquids from the liquid cartridges 450 to the head tank 441 via the tube 456.
The liquid discharge apparatus 1 further includes a conveyance assembly 495 to convey a sheet 410. The conveyance assembly 495 includes a conveyance belt 412 that serves as a conveyor and a sub-scanning motor 416 to drive the conveyance belt 412.
The conveyance belt 412 attracts the sheet 410 and conveys the sheet 410 at a position where the conveyance belt 412 faces the liquid discharge head 100. The conveyance belt 412 is an endless belt entrained around a conveyance roller 413 and a tension roller 414. For example, the sheet 410 is attracted to the conveyance belt 412 electrostatically or by air suction.
The conveyance belt 412 rotates in the sub-scanning direction as the conveyance roller 413 is rotated by the sub-scanning motor 416 via a timing belt 417 and a timing pulley 418.
The maintenance assembly 200 is disposed beside the conveyance belt 412 in the main scanning direction in which the carriage 403 moves. The maintenance assembly 200 maintains and recovers the liquid discharge head 100.
The maintenance assembly 200 includes, e.g., a cap 421 and the wiper 201. The cap 421 caps the discharge face (or nozzle face) 118 of the liquid discharge head 100. The wiper 201 wipes the discharge face 118.
The main-scanning moving assembly 493, the supply assembly 494, the maintenance assembly 200, and the conveyance assembly 495 are attached to a housing that includes the left side plate 491A, the right side plate 491B, and a rear plate 491C.
In the liquid discharge apparatus 1 thus configured, the sheet 410 is fed onto the conveyance belt 412 and attracted to the conveyance belt 412. The sheet 410 thus attracted to the conveyance belt 412 is conveyed in the sub-scanning direction as the conveyance belt 412 rotates.
The liquid discharge head 100 is driven in response to image signals while the carriage 403 moves in the main scanning direction, to discharge liquid to the sheet 410 stopped and form an image on the sheet 410.
The wiper 201 of the maintenance assembly 200 wipes and cleans the discharge face 118 of the liquid discharge head 100. At this time, the warp of the surrounding area 130 of the nozzle 110 is controlled as described in the first to third embodiments as necessary.
An apparatus that uses a liquid discharge head performs a wiping operation of wiping a discharge face with a wiper to clean the discharge face. According to one aspect of the present disclosure, the discharge face is wiped with an enhanced cleaning efficiency and the damage to the discharge face is reduced.
The above-described embodiments are illustrative and do not limit the present invention. Thus, numerous additional modifications and variations are possible in light of the above teachings. For example, elements and/or features of different illustrative embodiments may be combined with each other and/or substituted for each other within the scope of the present invention.
Number | Date | Country | Kind |
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2021-164956 | Oct 2021 | JP | national |