The present application claims priority from Japanese Patent Application No. 2021-076286, filed on Apr. 28, 2021, the disclosure of which is incorporated herein by reference in its entirety.
The present invention relates to a liquid discharge head in which a protective substrate has wall portions for defining a plurality of actuator accommodating chambers, and a method for manufacturing the same.
Conventionally, a liquid jetting head, which is provided with a protective substrate, is known. In such a liquid jetting head, the protective substrate has support portions (wall portions) each of which is provided for defining an actuator accommodating chamber for each of piezoelectric elements (actuators). The support portion is overlapped in the Z direction (orthogonal direction) with a partition wall which partitions two pressure chambers in a pressure chamber substrate. Further, the support portion is adhered to the pressure chamber substrate by means of an adhesive intervening therebetween.
In the case of the liquid jetting head as described above, the support portion (wall portion) of the protective substrate is overlapped in the Z direction (orthogonal direction) with the partition wall of the pressure chamber substrate, and thus it is possible to suppress the structural crosstalk (phenomenon in which the vibration caused by the deformation of a certain actuator is transmitted to another actuator adjacent to the concerning actuator). However, any moisture (water content) may enter the interior of the actuator accommodating chamber from the outside of the protective substrate via the adhesive disposed between the wall portion of the protective substrate and the flow passage substrate, and the actuator may be destroyed by the moisture.
An object of the present teaching is to provide a liquid discharge head which makes it possible to realize both of the suppression of the structural crosstalk and the suppression of the invasion of moisture into the actuator accommodating chamber, and a method for manufacturing the same.
According to a first aspect of the present teaching, there is provided a liquid discharge head including:
According to a second aspect of the present teaching, there is provided a method for manufacturing a liquid discharge head, the method including:
As depicted in
The head unit 1x is lengthy in the paper width direction (direction orthogonal to the vertical direction). The head unit 1x is based on the line type in which the ink is discharged from nozzles 22 (see
The platen 3 is a flat plate member which is arranged under or below the head unit 1x. The recording paper 9 is placed on the upper surface of the platen 3.
The conveying mechanism 4 has two roller pairs 4a, 4b which are arranged while interposing the platen 3 in the conveying direction (direction orthogonal to the vertical direction and the paper width direction). When a conveyance motor (not depicted) is driven in accordance with the control of the controller 5, then the roller pairs 4a, 4b are rotated in a state in which the roller pairs 4a, 4b interpose the recording paper 9, and the recording paper 9 is conveyed in the conveying direction.
The controller 5 has ROM (Read Only Memory), RAM (Random Access Memory), and ASIC (Application Specific Integrated Circuit). ASIC executes, for example, the recording process in accordance with a program stored in ROM. In the recording process, the controller 5 controls the conveyance motor (not depicted) and driver ICs 19 of the respective heads 1 (see
Next, an explanation will be made about the configuration of the head 1.
As depicted in
The flow passage substrate 11 is composed of four plates 11a to 11d which are stacked in the vertical direction (orthogonal direction) and which are adhered to one another. The plate 11a disposed at the uppermost layer, which is included in the four plates 11a to 11d, is formed, for example, by the injection molding with resin, and the plate 11a is formed with two common flow passages 31. The plates 11b to 11d are composed of, for example, resin (for example, LCP: liquid crystal polymer) or metal (for example, SUS: stainless steel). The plates 11b to 11d are formed with a plurality of individual flow passages 20.
The plurality of individual flow passages 20 are arranged in the paper width direction (array direction) to constitute two individual flow passage arrays 20R. Each of the individual flow passage arrays 20R is composed of the plurality of individual flow passages 20 arranged in the paper width direction. The two individual flow passage arrays 20R are aligned in the conveying direction. The plurality of individual flow passages 20 are arranged in a zigzag form in the paper width direction as a whole.
As depicted in
The common flow passage 31 disposed on the left side as viewed in
As depicted in
The pressure chamber 21 has a substantially rectangular shape which is lengthy in the conveying direction on the plane orthogonal to the vertical direction. The connecting flow passage 23 is connected to one end in the conveying direction of the pressure chamber 21, and the narrow width flow passage 24 is connected to the other end in the conveying direction of the pressure chamber 21.
The narrow width flow passage 24 has a width which is smaller than the width (length in the paper width direction) of the pressure chamber 21, and the narrow width flow passage 24 functions as a throttle. The wide width flow passage 25 has a width which is approximately the same as the width (length in the paper width direction) of the pressure chamber 21.
As depicted in
The connecting flow passage 23 is composed of a through-hole formed through the plate 11c, and the connecting flow passage 23 makes mutual communication between the pressure chamber 21 and the nozzle 22.
The nozzle 22 is composed of a through-hole formed through the plate 11d, and the nozzle 22 is open on the lower surface of the flow passage substrate 11.
As depicted in
As depicted in
The vibration plate 12a and the common electrode 12b are arranged over the entire region of the upper surface of the plate 11b, and the vibration plate 12a and the common electrode 12b cover all of the pressure chambers 21 formed in the plate 11b. On the other hand, the piezoelectric member 12c and the individual electrode 12d are provided for each of the pressure chambers 21, and the piezoelectric member 12c and the individual electrode 12d are overlapped in the vertical direction with the pressure chamber 21.
The actuator substrate 12 further includes an insulating film 12i and a plurality of wirings 12e.
The insulating film 12i is composed of, for example, silicon dioxide (SiO2), and the insulating film 12i covers the portion of the upper surface of the common electrode 12b on which the piezoelectric member 12c is not provided, the side surface of the piezoelectric member 12c, and the upper surface of the individual electrode 12d. A through-hole is provided at a portion of the insulating film 12i overlapped in the vertical direction with the individual electrode 12d.
The wiring 12e is provided for each of the individual electrodes 12d. The forward end of the wiring 12e enters the foregoing through-hole of the insulating film 12i, and thus the wiring 12e is electrically connected to the individual electrode 12d.
The wiring substrate 18 is composed of, for example, COF (Chip On Film), and one end of the wiring substrate 18 is fixed to the center in the conveying direction of the upper surface of the actuator substrate 12. The wiring substrate 18 has a plurality of individual wirings 18e which are electrically connected to the plurality of wirings 12e respectively and a common wiring (not depicted) which is electrically connected to the common electrode 12b.
The other end of the wiring substrate 18 is connected to the controller 5 (see
The driver IC 19 is electrically connected to the individual electrode 12d via the individual wiring 18e, and the driver IC 19 is electrically connected to the common electrode 12b via the common wiring. The driver IC 19 maintains the electric potential of the common electrode 12b at the ground electric potential. On the other hand, the driver IC 19 generates the driving signal on the basis of the control signal fed from the controller 5, and the driving signal is applied to the individual electrode 12d. Accordingly, the electric potential of the individual electrode 12d is changed between the predetermined driving electric potential and the ground electric potential. In this situation, the portion (actuator 12x) of the piezoelectric member 12c, which is interposed by the individual electrode 12d and the common electrode 12b, is shrunk in the in-plane direction in accordance with the piezoelectric transverse effect. In accordance therewith, the portion of the actuator substrate 12, which is overlapped in the vertical direction with the pressure chamber 21, is deformed so that the portion protrudes toward the pressure chamber 21. Accordingly, the volume of the pressure chamber 21 is decreased, and the pressure is applied to the ink contained in the pressure chamber 21.
As depicted in
Each of the protective substrates 13 has a wall portion 13w and a plate portion 13p.
The wall portion 13w corresponds to the side wall of the protective substrate 13. The lower end of the wall portion 13w is adhered to the upper surface of the actuator substrate 12 via an adhesive portion A composed of an adhesive (for example, adhesive based on epoxy or based on silicone).
The plate portion 13p corresponds to the upper wall of the protective substrate 13, and the plate portion 13p is connected to the upper end of the wall portion 13w. The plate portion 13p defines the outer shape of the protective substrate 13 depicted in
As depicted in
Owing to the configuration of the wall portion 13w as described above, a plurality of actuator accommodating chambers 13c are defined. Each of the actuator accommodating chambers 13c accommodates one actuator 12x. As depicted in
As depicted in
Each of the second wall portions 13w2 extends in the conveying direction from one of the pair of first wall portions 13w1 (first wall portion 13w1 overlapped in the vertical direction with the wide width flow passage 25 as depicted in
In relation to the protective substrate 13 configured as described above, a protective film (protective coating) C is formed on the entire inner wall surface of the protective substrate 13 (see
Next, an explanation will be made about a method for manufacturing the head 1 with reference to
At first, the actuators 12x are formed on the surface of a silicon single crystal substrate which serves as the plate 11b (S1: actuator forming step). Specifically, the vibration plate 12a, which is composed of a film of silicon dioxide, is formed, for example, by the thermal oxidation on the surface of the silicon single crystal substrate which serves as the plate 11b. After that, the common electrode 12b is formed on the surface of the vibration plate 12a, the plurality of piezoelectric members 12c are formed on the surface of the common electrode 12b, and the individual electrodes 12d are formed on the surfaces of the respective piezoelectric members 12c. Further, the insulating film 12i and the plurality of wirings 12e are thereafter formed, for example, by means of the sputtering and the etching.
After S1, the two protective substrates 13 are fixed to the surface of the silicon single crystal substrate which serves as the plate 11b so that the plurality of actuators 12x corresponding to the individual flow passage arrays 20R respectively are covered therewith (S2: protective substrate fixing step). Specifically, the lower end of the wall portion 13w is adhered to the surface of the silicon single crystal substrate which serves as the plate 11b via the adhesive portion A composed of the adhesive. The plate portion 13p is arranged so that the plurality of actuators 12x are covered therewith.
After S2, the flow passages (common flow passage 31 and individual flow passages 20) are formed on the flow passage substrate 11 (S3). Specifically, the silicon single crystal substrate, which serves as the plate 11b, is polished until a predetermined thickness is obtained. After that, the etching is applied to the lower surface of the silicon single crystal substrate to form the pressure chamber 21, the narrow width flow passage 24, and the wide width flow passage 25 of each of the individual flow passages 20. At this stage, the silicon single crystal substrate is designated as the plate 11b. After that, the plate 11c is adhered to the lower surface of the plate 11b, the plate 11d is adhered to the lower surface of the plate 11c, and the plate 11a is adhered to the upper surface of the plate 11c. Thus, the flow passage substrate 11, on which the common flow passage 31 and the individual flow passages 20 are formed, is completed. In this procedure, the wall portion 13w is arranged so that the wall portion 13w is overlapped with the partition wall 11b1 in the direction orthogonal to the surface of the flow passage substrate 11 (see
After S3, the nozzles 22, which are formed on the lower surface of the flow passage substrate 11, are sealed with a sealing member (another member distinct from the sealing member 14) (S4).
After S4, the protective film C is formed on the entire inner wall surface of the protective substrate 13 (S5: protective film forming step). Specifically, the member, which includes the flow passage substrate 11, the actuator substrate 12, and the protective substrate 13 formed in S1 to S4, is arranged in a gas chamber, and the gas is injected into the gas chamber by using the atomic layer stacking method. Accordingly, the gas is injected into the interior from the outside of the protective substrate 13 via the first communication hole 13x. Then, the gas spreads throughout the plurality of actuator accommodating chambers 13c via the second communication holes 13y. Thus, the protective film C is formed at the portions of the protective substrate 13 and the adhesive portion A which define the respective actuator accommodating chambers 13c, as well as the upper surfaces of the individual electrodes 12d and the side surfaces of the piezoelectric members 12c which constitute the respective actuators 12x. In this procedure, the nozzles 22 are sealed with the sealing member, and hence the protective film C is not formed on the nozzles 22.
After S5, the first communication hole 13x is sealed with the sealing member 14 (S6: sealing step). Accordingly, the communication is blocked between the actuator accommodating chamber 13c and the outside.
After S6, one end of the wiring substrate 18 is fixed to the surface of the flow passage substrate 11 (S7). Specifically, one end of the wiring substrate 18 is arranged on the surface of the flow passage substrate 11 with a thermosetting adhesive intervening therebetween, and the adhesive is cured by being heated and pressurized. Accordingly, the individual wiring 18e and the wiring 12e are electrically connected to one another, and the common wiring (not depicted) and the common electrode 12b are electrically connected to one another. Thus, the head 1 is completed.
As described above, according to this embodiment, as depicted in
As depicted in
The second communication hole 13y is formed over the entire length in the vertical direction of the actuator accommodating chamber 13c as depicted in
The atomic layer stacking method is used in S5 (protective film forming step). In this procedure, it is possible to easily form the protective film C.
The protective film C is composed of at least any one of tantalum oxide, hafnium oxide, and aluminum oxide. In this case, it is possible to effectively realize the atomic layer stacking method by using the material suitable for the atomic layer stacking method (consequently, it is possible to easily form the protective film C).
The height (length in the vertical direction) H of the actuator accommodating chamber 13c is not less than 100 μm (see
The protective film C is also formed on the surface of the actuator 12x (on the upper surface of the individual electrode 12d and the side surface of the piezoelectric member 12c) (see
In S5 (protective film forming step), the nozzle 22 is sealed with the sealing member (member distinct from the sealing member 14) upon the injection of the gas (see S4). If the protective film C is formed on the nozzle 22, any malfunction may occur in the discharging action of the ink. In the configuration of the present teaching, the nozzle 22 is sealed upon the injection of the gas. Thus, it is possible to suppress the formation of the protective film C on the nozzle 22 (consequently, it is possible to suppress the occurrence of the malfunction in the discharging action of the ink).
Next, a second embodiment of the present teaching will be explained with reference to
In the first embodiment (
According to this embodiment, it is possible to allow the gas to sufficiently spread throughout the actuator accommodating chamber 13c arranged at the end portion in the paper width direction in S5 (protective film forming step) as well (consequently, it is possible to reliably form the protective film C on all of the actuator accommodating chambers 13c).
Next, a third embodiment of the present teaching will be explained with reference to
In the first embodiment (
When the two second communication holes 13y, which are adjacent to one another in the paper width direction, are overlapped with each other in the paper width direction (see
Further, according to this embodiment, the second communication holes 13y are arranged in the zigzag form in the paper width direction, and thus the decrease in the strength of the protective substrate 313 is more suppressed. The protective substrate 313 is more hardly damaged or fractured in S2 (protective substrate fixing step).
Next, a fourth embodiment of the present teaching will be explained with reference to
In the first embodiment, as depicted in
On the contrary, in the fourth embodiment, as depicted in
When the second communication hole 13y is formed at the portion including the lower end of the wall portion 13w, then the binding force, which is exerted on the partition wall 11b1 (see
Next, a fifth embodiment of the present teaching will be explained with reference to
In the first embodiment (
In this embodiment, the wall portion 13w is composed of a photosensitive adhesive for constructing the adhesive portion A. The plate portion 13p is composed of a plate-shaped member which is distinct from the wall portion 13w. The plate portion 13p is connected to the upper ends of the wall portions 13w, and the plate portion 13p is overlapped in the vertical direction (orthogonal direction) with the plurality of actuators 12x.
Further, in this embodiment, in S2 (protective substrate fixing step), the wall portions 13w, which are composed of the photosensitive adhesive, are firstly formed on the surface of a silicon single crystal substrate which serves as the plate 11b by using a photomask. After that, the plate portion 13p is arranged so that the plurality of actuators 12x are covered therewith, and the plate portion 13p is fixed to the upper ends of the wall portions 13w.
According to this embodiment, the wall portion 13w is composed of the photosensitive adhesive, and thus it is possible to perform the patterning having the satisfactory position accuracy based on the use of the photomask upon the formation of the wall portion 13w.
Further, the wall portion 13w can be formed at the satisfactory position accuracy, and hence any high position accuracy is not required for the plate portion 13p. Therefore, it is possible to form the protective substrate 513 including the wall portions 13w and the plate portion 13p easily and highly accurately.
The embodiments of the present teaching have been explained above. However, the present teaching is not limited to the embodiments described above, for which it is possible to make various design changes within a scope as defined in claims.
In the fourth embodiment (
Further, when the second communication hole 13y is formed at the portion except for the lower end of the second wall portion 13w2 as in the fourth embodiment (
In the embodiments described above (
In the embodiment described above (
The liquid discharge head is not limited to the head based on the line type. The liquid discharge head may be any head based on the serial type (type or system in which the liquid is discharged to the discharge object from the nozzles while being moved in the scanning direction parallel to the paper width direction).
The discharge object is not limited to the recording paper, which may be, for example, cloth, substrates and the like.
The liquid discharged from the nozzles is not limited to the ink, which may be any arbitrary liquid (for example, any processing liquid or the like for coagulating or depositing any component contained in an ink).
The present teaching is not limited to the printer, which is also applicable, for example, to facsimiles, copying machines, and multifunction machines. Further, the present teaching is also applicable to any liquid discharging apparatus which is used for any way of use other than the image recording (for example, a liquid discharging apparatus for forming a conductive pattern by discharging a conductive liquid to a substrate).
Number | Date | Country | Kind |
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2021-076286 | Apr 2021 | JP | national |
Number | Name | Date | Kind |
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20190291437 | Kakiuchi | Sep 2019 | A1 |
20200061991 | Fukuda | Feb 2020 | A1 |
Number | Date | Country |
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2020-32713 | Mar 2020 | JP |
Number | Date | Country | |
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20220348015 A1 | Nov 2022 | US |