Patent Grant
8191260
The present invention relates to a liquid ejection head for ejecting liquid and a manufacturing method of the liquid ejection head. Specifically, the present invention relates to an ink jet recording head for effecting recording by ejecting ink onto a recording material (medium) and a manufacturing method of the ink jet recording head.
As an example using the liquid ejection head for ejecting liquid, there is an ink jet recording head used in an ink jet recording method.
In an ink jet recording apparatus, image recording is effected by ejecting minute droplet-like ink from a plurality of ink ejection outlets arranged on an ink jet head.
A manufacturing method of the above-described liquid ejection head is disclosed in U.S. Pat. No. 4,657,631. In this manufacturing method, an ink jet head is manufactured through the steps of:
In the manufacturing method disclosed in U.S. Pat. No. 4,657,631, as the photosensitive material, a positive resist is used from the viewpoint of easiness of removal.
In the above-described manufacturing method, the ink flow passage, the ejection outlet, and the like are formed through lithography employed in semiconductor manufacturing, so that it is possible to perform fine processing with high accuracy. In this case, however, a change in shape in the neighborhood of the ink flow passage and the ejection outlet is basically restricted to a two-dimensional direction parallel to an element substrate. That is, the photosensitive material layer cannot be partially formed in a multiple layer because of use of the photosensitive material for the mold for the ink flow passage and the ejection outlet, so that the mold for the ink flow passage or the like cannot be changed in height (i.e., a shape of the mold with respect to a height direction of the element substrate is restricted to a uniform shape). As a result, ink flow passage design necessary to realize high-speed and stable ejection is restricted.
U.S. Patent Application Publication No. US2003/0011655 discloses a method for manufacturing an ink jet head having a three-dimensional liquid flow passage structure. In this manufacturing method, the ink jet head having the three-dimensional liquid flow passage structure is formed through the steps of:
However, in order to suppress variations in an ejection amount, an ejection speed, and the like of small ink liquid droplets during advance of downsizing of a droplet size of ink with recent higher printing image quality, it is necessary to form bubble-generating chambers/ink flow passages with high accuracy. That is, with a smaller ink droplet, an ejection performance of the ink droplet depends on a dimension and a height of the bubble-generating chambers/ink flow passages, so that variations thereof can result in variations in ejection amount, ejection speed, and the like of the ink droplet.
For that reason, a processing method with higher accuracy is required but it has been difficult to achieve an objective bubble-generating chamber formation accuracy only by a conventional ink flow passage forming method.
As one of factors for causing the variation in shape dimension of the bubble-generating chambers, dissolution and deformation of the ink flow passage structure of the positive resist for providing the bubble-generating chambers by a solvent, gas, heat, and the like used in various steps can be considered.
For example, when the second positive resist is applied onto the first positive resist, solvents for these positive resists cause mutual dissolution or the second positive resist pattern causes a decrease in film thickness during development of the first positive resist.
In order to solve these problems, as a method of maintaining the shape dimension, the use of a positive resist having high resistance to the various steps can be considered. However, the positive resist is required to be removed after an ink flow passage wall is formed, so that the use of the positive resist having the high resistance can lead to a lowering in removal performance.
A principal object of the present invention is to provide a constitution of a highly reliable ink ejection outlet protecting film formed on a substrate.
Another object of the present invention is to provide a manufacturing method capable of facilitating provision of such a constitution.
According to an aspect of the present invention, there is provided a manufacturing method of a liquid ejection head including an ejection outlet forming member provided with an ejection outlet for ejecting liquid and including a flow passage communicating with the ejection outlet, the manufacturing method comprising:
preparing a substrate on which a first flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the first flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer;
providing a first layer formed of a negative photosensitive resin material;
exposing to light a portion of the first layer for constituting the ejection outlet forming member;
providing a second layer, on the first layer, formed of a negative photosensitive resin material;
exposing to light a portion of the second layer for constituting a second flow passage wall forming member for forming another part of the wall of the flow passage;
placing the exposed first layer and the exposed second layer on the solid layer and the first flow passage wall forming member so that a non-exposed portion of the second layer contacts the solid layer;
forming a part of the flow passage and the ejection outlet by removing a non-exposed portion of the first layer and the non-exposed portion of the second layer above the substrate; and
forming the flow passage by removing the solid layer.
According to the present invention, a first bubble-generating chamber and a flow passage therefor are formed of a negative photosensitive resin material through lithography and a second bubble-generating chamber and a flow passage therefor are formed by transfer of the second bubble-generating chamber and the flow passage therefor onto a first flow passage wall and a soluble resin material layer, so that the resultant bubble-generating chambers and ink flow passages are excellent in shape stability.
These and other objects, features and advantages of the present invention will become more apparent upon a consideration of the following description of the preferred embodiments of the present invention taken in conjunction with the accompanying drawings.
a) to 1(j) are schematic sectional views for illustrating an embodiment of the manufacturing method of a liquid ejection head according to the present invention.
a) to 2(j) are schematic sectional views for illustrating another embodiment of the manufacturing method of a liquid ejection head according to the present invention.
a) to 3(j) are schematic sectional views for illustrating another embodiment of the manufacturing method of a liquid ejection head according to the present invention.
a) to 4(h) are schematic sectional views for illustrating an embodiment of a conventional ink jet head manufacturing method.
Hereinbelow, embodiments of the manufacturing method of a liquid ejection head according to the present invention will be described.
In the following description, with reference to the figures, constituent members having the same function are represented by the same reference numerals or symbols and are omitted from redundant explanation in some cases.
In the following description, an ink jet recording method will be described as an applied embodiment of the present invention. However, the present invention is not limited thereto but may also be applicable to biochip preparation, electronic circuit printing, etc.
The liquid ejection head is mountable to a printer, a copying machine, a facsimile machine including a communication system, a device such as a word processor including a printer portion, and industrial recording devices compositively combined with various processing devices. For example, the liquid ejection head can also be used for biochip preparation, electronic circuit printing, ejection of medication in the form of spray, etc. For example, by using this liquid ejection head for the purpose of recording, it is possible to carry out recording on various recording media (materials) such as paper, thread, fiber, fabric, leather, metal, plastic, glass, wood, and ceramics. Herein, “recording” means not only that a significant image such as a character image or a graphical image is provided to the recording medium but also that an insignificant image such as a pattern image is provided to the recording medium.
The recording head in this embodiment includes a substrate 101 of Si on which energy generating elements 107 for generating energy utilized for ejecting ink as recording liquid are formed and arranged with a predetermined pitch. The substrate 101 is provided with a supply port 108, formed by subjecting Si to anisotropic etching, which is opened between two arrays of the energy generating elements 107. On the substrate 101, ejection outlets 105 provided by a flow passage forming member 102 at positions opposite to the respective energy generating elements 107 and individual flow passages extending from the supply port 108 and communicating with associated ones of the ejection outlets 105. Incidentally, the positions of the ejection outlets 105 are not limited to those opposite to the energy generating elements 107.
In the case where the recording head is used as the ink jet recording head, a surface at which the ejection outlets 105 are formed is disposed so as to face a recording surface of a recording medium. The recording head causes energy generated by the energy generating elements 107 to act on ink filled on the flow passages through the supply port 108, thus ejecting ink droplets from the ejection outlets 105. Recording is effected by depositing these ink droplets on the recording medium. As the energy generating element, an electrothermal transducer or the like for thermal energy (so-called a heater) and a piezoelectric element or the like for mechanical energy may be used but the energy generating element is not limited to these elements.
(First Embodiment)
Hereinbelow, First Embodiment of the manufacturing method of an ink jet head (liquid ejection head) according to the present invention will be described with reference to schematic process sectional views of
First, on a substrate 1 on which a recording element 20 is formed, a negative photosensitive resin material layer 2 is formed (
As the negative photosensitive resin material used, it is possible to use those utilizing cationic polymerization, radical polymerization, and the like but the negative photosensitive resin material is not limited to these resin materials. When the negative photosensitive resin material utilizing a cationic polymerization reaction is taken as an example, cations generated from a photo-cation polymerization initiator contained in the negative photosensitive resin material promote polymerization or crosslinking between molecules of cationically polymerizable monomers or polymer to cure the negative photosensitive resin material.
As the photo-cation polymerization initiator, it is possible to use aromatic iodonium salts, aromatic sulfonium salts, and the like. Specifically, e.g., photo-cation polymerization initiators (“ADEKA OPTOMER SP-170”, “ADEKA OPTOMER SP-150” (trade name)) are commercially available from ADEKA CORPORATION.
Such a negative photosensitive resin material is formed on the substrate 1 in the negative photosensitive resin material layer by a method such as a spin coating method, a direct coating method, or a lamination transfer method.
Next, the thus formed first negative photosensitive resin layer 2 is subjected to light exposure and development in a predetermined area to form a first flow passage wall 2-1 for forming a first bubble-generating chamber/flow passage (
Incidentally, in this embodiment and also in the following Embodiments, in the case of the negative photosensitive resin material, the negative photosensitive resin material in the light-irradiation area is cured to form a cured resin material film (layer).
Next, on the above-formed first flow passage wall 2-1, a soluble resin material layer 3 is formed (
Next, by abrading the formed soluble resin material layer 3, a flattened surface is formed so that the soluble resin material layer 3 is flattened in an area surrounded by the ink flow passage wall 2-1 (
As an abrading method, it is possible to use a CMP (chemical mechanical polish) technique, which is a chemical mechanical polishing method, by using slurry. In this case, the first flow passage wall 2-1 formed of the negative photosensitive resin material is sufficiently cross-linked by light exposure, thus providing a difference in hardness from the coated soluble resin material layer to sufficiently function as a polishing (abrasion) stop layer. As a result, it is possible to stably remove the soluble resin material layer by the abrasion until an upper pattern of the negative photosensitive resin material layer is exposed, so that the surface of the first flow passage wall 2-1 and the surface of the first positive photosensitive resin material layer 3 coincide with each other. Thus, the first flow passage wall 2-1 and the soluble resin material layer 3 have the substantially same height from the substrate 1.
As another method of flattening the soluble resin material layer 3 and the first flow passage wall 2-1, it is possible to use dry etching. Further, as particles for the abrasion, it is possible to use those of alumina, silica, and the like.
Separately, on a supporting substrate 6, a negative photosensitive resin material layer 4 as a layer formed of a curable resin material is formed and thereafter against the negative photosensitive resin material layer 4, a mold for transferring a flow passage wall 4 and an ejection outlet pattern 5 for providing a second bubble-generating chamber and a flow passage therefor is pressed (
As the supporting substrate 6, it is possible to use quartz glass, single crystal silicon substrate, and the like.
Next, the substrate 1 and the supporting substrate 6 are disposed so that the negative photosensitive resin material layer 4 and the soluble resin material layer 3 are located opposite to each other (
In this case, a condition including a transfer temperature, a transfer pressure, and a transfer time can be selected relatively freely since the lower layer is flattened but it is necessary to consider that both of the upper and lower layers caused no mutual dissolution and that the second flow passage wall 4 has sufficient adhesiveness to the previously formed first flow passage wall 2 of the negative photosensitive resin material. As a method of improving the adhesiveness, an adhesive layer of an adhesive may be formed between the upper and the lower layers or the ink flow passage wall 4 may be irradiated with light after the transfer.
Then, the supporting substrate 6 is separated (
Then, the ink supply port (not shown) which penetrates through the substrate 1 is formed (not shown). As a method of forming the ink supply port, anisotropic etching or dry etching is generally used but the method is not limited to these etching methods. As an example thereof, an anisotropic etching method using a silicon substrate having a particular crystal orientation will be described. First, at a back surface of the silicon (Si) substrate 1, an etching mask is formed in an entire area while leaving only a slit portion having a size of the ink supply port. Then, the substrate 1 is dipped into an alkaline etching liquid consisting of an aqueous solution of potassium hydroxide, sodium hydroxide, tetramethylammonium hydroxide, or the like while being warmed. As a result, only a portion exposed at the slit portion of the substrate 1 can be dissolved with anisotropy, so that the ink supply port can be formed. Next, the etching mask is removed as desired. Incidentally, in this case, for the purpose of protecting the negative photosensitive resin layer and the ink-repellent layer at the surface of the substrate from the etching liquid, a layer of resin material or the like having resistance to the etching liquid may be formed on the surface of the substrate as a protection layer.
Therefore, the soluble resin material layer 3 for forming a first ink flow passage pattern is dissolved and removed by using a removing liquid to form a first flow passage 3′ communicating with the ink ejection outlet (
As the removing liquid, methyl isobutyl ketone (MIBK) or the like can be used.
In the case of using the positive photosensitive resin material for the soluble resin material layer, dissolubility of the resin material in the removing liquid is improved by irradiating the soluble resin material layer 3 for forming the flow passage pattern with ionizing radiation (light exposure) to cause decomposition reaction of the positive photosensitive resin material. In order to further improve the dissolubility, application of ultrasonic wave or temperature rise of the removing liquid is also effective. In this case, as the removing liquid, it is also possible to use MIBK.
(Second Embodiment)
Second Embodiment of the manufacturing method of an ink jet head according to the present invention will be described with reference to schematic process sectional views of
In the manufacturing method of the ink jet head in this embodiment, a photosensitive resin material layer, on which a latent image for a second flow passage wall and an ejection outlet pattern is formed, formed on a supporting substrate is transferred.
Manufacturing steps, shown in
On a supporting substrate 6, a first negative photosensitive resin material layer 4-1 is formed and is subjected to light exposure through a mask having an ejection outlet pattern shape to form a latent image 5′ for an ejection outlet (
In this embodiment, a step of separately applying the first negative photosensitive resin material layer 4-1 for forming an orifice plate having the ejection outlet and the second negative photosensitive resin material layer 4-2 for forming a second flow passage 4′ is described but it is also possible to employ such a method that these layers are simultaneously formed in a thickness corresponding to the total thickness of the above layers 4-1 and 4-2 and then are subjected to light exposure through photomasks having different absorbances.
Next, the first and second negative photosensitive resin material layers 4-1 and 4-2 on which the latent images are formed, and the flattened first bubble-generating chamber and soluble resin material layer are disposed opposite to each other (
Thereafter, the latent images which are non-exposed patterns are removed (
In this case, it is also possible to select a developing liquid capable of removing the latent image patterns and the soluble resin material layer 3 at the same time. As the developing liquid, an organic developing liquid, e.g., MIBK or the like, can be used.
(Third Embodiment)
Third Embodiment of the manufacturing method of the ink jet head according to the present invention will be described with reference to schematic process sectional views of
Manufacturing steps, shown in
A dry film resist including a base film 7 and a first negative photosensitive resin material layer 4-1 formed on the base film 7 in a predetermined thickness is disposed so as to oppose a first flow passage wall 2-1 and a soluble resin material layer 3 (
A condition including a transfer temperature, a transfer pressure, and a transfer time can be selected relatively freely since the lower layer is flattened but it is necessary to consider that no mutual dissolution with the sacrifice layer occurs and that the second flow passage wall 4 has sufficient adhesiveness to the previously formed first flow passage wall 2 of the negative photosensitive resin material. Further, in order to facilitate the transfer of the first negative photosensitive resin material layer 4-1 from the base film, fluorine-imparting treatment for the base film is also effective.
Then, the first negative photosensitive resin material layer 4-1 is subjected to light exposure through lithography (
When the negative photosensitive resin material is selected, by using the negative photosensitive resin material having a sensitivity wavelength different from that of the soluble resin material layer 3, it is possible to effect patterning without causing decomposition reaction of the soluble resin material layer 3 even when the soluble resin material layer 3 is exposed to light. Further, the developing liquid is required to be selected so as not to adversely affect the lower light. For this purpose, it is possible to use a mixture liquid such as a mixture of MIBK, xylene and isopropyl alcohol (IPA) or the like.
Then, by using a dry film resist including a second negative photosensitive resin material layer 4-2 constituting an orifice plate, the second negative photosensitive resin material layer 4-2 is transferred onto the first negative photosensitive resin material layer 4-1 (
A transfer condition is required to be selected so that collapse does not occur at a hollow portion of the ink flow passage. For example, by suppressing the transfer temperature and the transfer pressure at low levels, it is possible to form a stable shape without adversely affecting the ink flow passage and the shape of the orifice plate.
Then, an ejection outlet 5 is provided to the second negative photosensitive resin material layer 4-2 by light exposure and development (
Then, by employing the same step as that of
In this example, a liquid ejection head was prepared by using the manufacturing method of First Embodiment.
First, a single-crystal silicon substrate 1 on which a recording element, a driver circuit, and a logic circuit were formed was prepared. On the substrate 1, a negative photosensitive resin material layer 2 was formed.
As a negative photosensitive resin material for forming the negative photosensitive resin material layer 2, a photosensitive resin material solution having the following composition (1) was used.
(Composition (1))
Onto the substrate 1, the above-constituted negative photosensitive resin material solution was applied by spin coating and then was pre-baked on a hot plate at 90° C. for 3 minutes, thus forming a 11 μm-thick negative photosensitive resin material layer 2 (
Next, the negative photosensitive resin material layer was subjected to pattern exposure at an exposure amount of 500 mJ/cm2 through a mask provided with a pattern of an ink flow passage wall by using a mask aligner (“MPA 600 Super” (trade name), mfd. by Canon Kabushiki Kaisha). Then, the negative photosensitive resin material layer 2 was subjected to PEB (post etching bake) at 90° C. for 180 sec, development using a mixture solution of methyl isobutyl ketone/xylene =2/3, and rinsing with xylene to form a first ink flow passage wall 2-1 (
Next, this ink flow passage wall was coated with a soluble resin material layer 3 of a photodegradable positive photosensitive resin material.
As the photodegradable positive photosensitive resin material for forming a positive photosensitive resin material layer, polymethyl isopropenyl ketone (“ODUR-1010”, mfd. by TOKYO OHKA KOGYO CO., LTD.) was used. Specifically, the resin material was adjusted to provide a resin material concentration of 20 wt. % and was applied by spin coating. Thereafter, the resin material was subjected to pre-baking on a hot plate at 120° C. for 3 minutes to form a 18 μm-thick soluble resin material layer 3 (
Next, the soluble resin material layer 3 was abraded by using the CMP method until the surface of the negative photosensitive resin material layer 2-1 is exposed (
Separately, on a supporting layer 6, a negative photosensitive resin material layer 4 having the above-described composition (1) was applied in a thickness of 10 μm through a release layer (
Then, the negative photosensitive resin material layer 4 provided with a second flow passage 4′ and an ejection outlet 5 and the first ink flow passage wall 2-1 and the soluble resin material layer 3 which were flattened were disposed opposite to each other (
This positional alignment can be performed by using an alignment pattern formed on the substrate 1 or the negative photosensitive resin material layer 2 formed on the substrate 1 and an alignment pattern formed on the supporting substrate 6 or the negative photosensitive resin material layer 4 in combination.
In this embodiment, the patterns formed on the substrate 1 and the supporting substrate 6 were used to perform the positional alignments.
Thereafter, the negative photosensitive resin material layer 4 which was formed on the supporting substrate 6 and was provided with the second flow passage 4′ and the ejection outlet 5 was transferred onto the first flow passage wall 2-1 and the soluble resin material layer 3 which were flattened (
Then, the supporting substrate 6 was removed (
Next, onto an entire surface at which the ejection outlet 5 was formed, a protecting layer of “OBC” (trade name, mfd. by TOKYO OHKA KOGYO CO., LTD.) was applied. Then, at a back surface of the substrate, a slit-like etching mask was formed of a polyetheramide resin material (“HIMAL” (trade name), mfd. by Hitachi Chemical Co., Ltd.) and the substrate was immersed in a tetramethylammonium hydroxide aqueous solution at 80° C., so that anisotropic etching was performed with respect to the silicon substrate to form the ink ejection outlet at the back surface of the substrate 1 (not shown). The etching mask may also be formed in advance of the preparation of the substrate.
Next, the material (“OBC”) for the protecting layer was removed by xylene and thereafter the resultant structure was subjected to whole surface exposure at an exposure amount of 7000 mJ/cm2 from the side where the ejection outlet was formed, so that the soluble resin material layer 3 for forming the ink flow passage pattern was solubilized. The structure was immersed in methyl lactate while applying thereto ultrasonic wave, thus removing the ink flow passage pattern to prepare an ink jet head as shown in
In this example, an ink jet head was manufactured by using the manufacturing method of Second Embodiment. Manufacturing steps shown in
In this embodiment, on the supporting substrate 6, the negative photosensitive resin material having the composition (1) described above was applied by spin coating and then subjected to baking at 90° C. for 180 seconds to form a 5 μm-thick negative photosensitive resin material layer 4.
Thereafter, the negative photosensitive resin material layer 4 was exposed to light at an exposure amount of 500 mJ/cm2 through a photo-mask provided with a pattern for the ejection outlet 5 by using the mask aligner (“MPA600 Super”, mfd. by Canon Kabushiki Kaisha) to form a latent image 5″ for the ejection outlet in the negative photosensitive resin material layer 4-1 (
Further, on the negative photosensitive resin material layer 4-1, the negative photosensitive resin material having the above-described composition (1) was formed by spin coating, followed by baking at 90° C. for 180 seconds to form a 5 μm-thick negative photosensitive resin material layer 4-2.
Next, the pattern for the second bubble-generating chamber and the ink flow passage is exposed to light by using the mask aligner (MPA600 Super), followed by PEB at 90° C. for 180 seconds to form a latent image 4″ for forming an ink flow passage wall 4 and an ink flow passage 4′ (
Then, the negative photosensitive resin material provided with the latent image on the supporting substrate was positionally aligned with the first flow passage wall and the soluble resin material layer which are flattened. After both the members were brought into close contact with each other, the resultant structure was subjected to light exposure and then PEB at 90° C. for 180 seconds to transfer the pattern (
The positional alignment was performed by using the alignment patterns similarly as in Embodiment 1.
Further, in the same manner as in Embodiment 1, after the ink ejection outlet was formed on the substrate by wet etching, development of the latent image pattern of the negative photosensitive resin material layer was performed by using a mixture solution of MIBK/xylene (
Finally, by using methyl lactate, the soluble resin material layer 3 was removed to prepare an ink jet head as shown in
In this example, an ink jet head was manufactured by using the manufacturing method of Third Embodiment. Manufacturing steps shown in
Onto the abraded surface of the soluble resin material layer 3, a 6 μm-thick negative photosensitive resin material was transferred from a dry film resist including the negative photosensitive resin material to form a negative photosensitive resin material layer 4-1 (
Then, the negative photosensitive resin material layer 4-1 was subjected to pattern exposure at an exposure amount of 300 mJ/cm2 through a mask provided with a pattern for a bubble-generating chamber and an ink flow passage by using the mask aligner (MPA600 Super) (
Next, onto the ink flow passage wall 4 and the ink flow passage 4′, a 5 μm-thick negative photosensitive resin material having the above-described composition (1) was transferred from a dry film resist including the negative photosensitive resin material to form a negative photosensitive resin material layer 4-2 (
Then, the negative photosensitive resin material layer 4-2 was subjected to pattern exposure at an exposure amount of 300 mJ/cm2 through a mask provided with a pattern for an ejection outlet by using the mask aligner (MPA600 Super). Then, PEB was performed at 90° C. for 180 seconds and development was performed by using a mixture solution of MIBK/xylene (=2/3), followed by rinse treatment to form an ejection outlet (
Next, by using the same manufacturing step as that in Embodiment 1, an ink jet head was prepared (
While the invention has been described with reference to the structures disclosed herein, it is not confined to the details set forth and this application is intended to cover such modifications or changes as may come within the purpose of the improvements or the scope of the following claims.
This application claims priority from Japanese Patent Application No. 064139/2008 filed Mar. 13, 2008, which is hereby incorporated by reference.
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