Liquid injection of VCL4 into superheated TiCL4 for the production of Ti-V alloy powder

Information

  • Patent Grant
  • 9127333
  • Patent Number
    9,127,333
  • Date Filed
    Wednesday, April 25, 2007
    17 years ago
  • Date Issued
    Tuesday, September 8, 2015
    8 years ago
Abstract
A method and system for producing an alloy using a flowing stream of superheated halide vapor to flash vaporize liquid halides forming a mixture of gases in predetermined and controllable ratios. The mixture of gases are introduced into a flowing stream of liquid alkali or alkaline earth metal or mixtures to establish a reaction zone where the mixture of gases is reduced to an alloy and a salt. The liquid metal is in a sufficient amount in excess of stoichiometric to maintain substantially all the alloy and salt below the sintering temperatures thereof away from the reaction zone. Equipment for practicing the method is also disclosed. The system relates to alloys of B, Be, Bi, C, Fe, Ga, Ge, Hf, In, Mo, Nb, P, Pb, Re, S, Sb, Si, Sn, Ta, Ti, V, W and Zr.
Description
FIELD OF THE INVENTION

This invention relates to the production of alloys.


BACKGROUND OF THE INVENTION

The present invention relates to the production of metals and alloys using the general method disclosed in U.S. Pat. Nos. 6,409,797; 5,958,106; and 5,779,761, all of which are incorporated herein, and preferably a method wherein titanium or an alloy thereof is made by the reduction of halides in a flowing liquid stream of reducing metal.


Although the process and system hereinafter described pertains to titanium base alloys, it is applicable to a wide variety of alloys, wherein a superheated halide is used to vaporize a liquid halide to form an alloy in which the constituents include the superheated halide and in the liquid halide.


The Armstrong Process is defined in the patents cited above and uses a flowing liquid metal stream into which is introduced a halide vapor. The liquid metal stream may be any one or more of the alkali metals or alkaline earth metals or mixtures thereof, however, the preferred metal is sodium because of its availability, low cost and melting point, permitting steady state operations of the process to be less than 600° C. and approaching or below 400° C. Preferred alternates are potassium or NaK while Mg and Ca are preferred alkaline earth metals. One very important commercial aspect of the Armstrong Process as disclosed in the above-referenced and incorporated patents is the ability to make almost any alloy wherein the constituents can be introduced as vapor into the flowing liquid metal. For titanium and its alloys, the most common commercial alloy is what is known as 6-4 alloy, that is 6% percent by weight aluminum, 4% by weight vanadium with the balance titanium, the ASTM B265 classifications for Ti are set forth in Table 1 hereafter (Class 5 is alloy 6-4). The ASTM 265 classification for commercially pure (CP) titanium is Class 2.









TABLE 1







Chemical Requirements









Composition %



Grade

















Element
1
2
3
4
5
6
7
8
9
10




















Nitrogen max
0.03
0.03
0.05
0.05
0.05
0.05
0.03
0.02
0.03
0.03


Carbon max
0.10
0.10
0.10
0.10
0.10
0.10
0.10
0.10
0.10
0.08


HydrogenB max
0.015
0.015
0.015
0.015
0.015
0.020
0.015
0.015
0.015
0.015


Iron Max
0.20
0.30
0.30
0.50
0.40
0.50
0.30
0.25
0.20
0.30


Oxygen max
0.18
0.25
0.35
0.40
0.20
0.20
0.25
0.15
0.18
0.25


Aluminum
. . .
. . .
. . .
. . .
5.5 to
4.0 to
. . .
2.5 to
. . .
. . .







6.75
6.0

3.5


Vanadium
. . .
. . .
. . .
. . .
3.5 to
. . .
. . .

2.0 to







4.5



3.0


Tin
. . .
. . .
. . .
. . .
. . .
2.0 to
. . .
. . .
. . .
. . .








3.0


Palladium
. . .
. . .
. . .
. . .
. . .
. . .
0.12 to
. . .
0.12 to
. . .









0.25

0.25


Molybdenum
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .
0.2 to 0.4


Zirconium
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .


Nickel
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .
. . .
0.6 to 0.9


ResidualsC.D.E.
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.1
0.1


(each), max


ResidualsC.D.E
0.4
0.4
0.4
0.4
0.4
0.4
0.4
0.4
0.4
0.4


(total) max


TitaniumF
remainder
remainder
remainder
remainder
remainder
remainder
remainder
remainder
remainder
remainder






AAnalysis shall be completed for all elements listed in this Table for each grade. The analysis results for the elements not quantified in the Table need not be reported unless the concentration level is greater than 0.1% each or 0.4% total.




BLower hydrogen may be obtained by negotiation with the manufacturer.




CNeed not be reported.




DA residual is an element present in a metal or an alloy in small quantities inherent to the manufacturing process but not added intentionally.




EThe purchaser may, in his written purchase order, request analysis for specific residual elements not listed in this specification. The maximum allowable concentration for residual elements shall be 0.1% each and 0.4% maximum total.




FThe percentage of titanium is determined by difference.







In making 6-4 alloy, one of the problems is the instability of VCl4. VCl4 is commonly transported as liquid vanadium tetrachloride, but liquid vanadium tetrachloride is unstable and decomposes to vanadium trichloride, the rate of decomposition being temperature dependent. Vanadium trichloride is less desirable as a feedstock for the Armstrong Process because it has a much higher melting and boiling point than vanadium tetrachloride. Moreover, decomposition of liquid tetrachloride to solid trichloride in a vanadium tetrachloride boiler adversely affects boiler performance due to the solids build up resulting in poor boiler pressure control, premature failure of boiler heaters, line plugging, loss of usable feedstock and excessive maintenance.


SUMMARY OF THE INVENTION

Accordingly, it is a principal object of the present invention to provide a method of and system for producing alloys using the Armstrong Process in which halides which are unstable can be injected as liquids into superheated vapor to form a mixture of gases for alloy production.


Another object of the invention is to provide a method of producing an alloy, comprising providing a flowing stream of superheated halide vapor, introducing one or more liquid halides into the flowing superheated halide vapor to vaporize the liquid halides forming a mixture of gases in predetermined and controllable ratios, introducing the mixture of gases into a flowing stream of liquid alkali or alkaline earth metal or mixtures thereof establishing a reaction zone wherein the mixture of gases is reduced to an alloy and a salt, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain substantially all the alloy and salt below the sintering temperatures thereof away from the reaction zone.


Another object of the present invention is to provide a method of producing a Ti base alloy, comprising providing a flowing stream of superheated titanium tetrahalide vapor, introducing one or more liquid halides into the flowing superheated titanium tetrahalide vapor to vaporize the liquid halides forming a mixture of gases in predetermined and controllable ratios,


introducing the mixture of gases into a flowing stream of liquid alkali or alkaline earth metal or mixtures thereof establishing a reaction zone wherein the mixture of gases is reduced to a titanium base alloy and a salt, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain substantially all the titanium base alloy and salt below the sintering temperatures thereof away from the reaction zone.


A further object of the present invention is to provide a method of producing a Ti base alloy, comprising providing a flowing stream of superheated titanium tetrachloride vapor, introducing one or more liquid chlorides into the flowing superheated titanium tetrachloride vapor to vaporize the liquid chlorides forming a mixture of gases in predetermined and controllable ratios, introducing the mixture of gases into a flowing stream of liquid sodium or alkaline earth metal or mixtures thereof establishing a reaction zone wherein the mixture of gases is reduced to a titanium base alloy and salt, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain substantially all the titanium base alloy and salt below the sintering temperatures thereof away from the reaction zone.


A still further object of the present invention is to provide a system for producing an alloy, comprising a storage container for a first liquid halide and heating mechanism in communication therewith for providing a flowing stream of superheated halide vapor, a first detection and/or control device in communication with the flowing stream of superheated halide for detecting and/or controlling the mass flow rate thereof, a second storage container for a second liquid halide and mechanism in communication therewith for introducing the second liquid halide into the flowing stream of superheated halide vapor to vaporize the second liquid halide forming a mixture of gases in predetermined and controllable ratios, a second detection and/or control device in communication with the second storage container for the second liquid halide to measure and/or control the amount of second liquid halide introduced into the flowing superheated stream of halide, a storage container for a liquid alkali or alkaline earth metal and mechanism for providing a flowing stream of liquid alkali or alkaline earth metal or mixtures thereof and mechanism for introducing the mixture of gases into the flowing stream of liquid alkali or alkaline earth metal or mixtures thereof establishing a reaction zone wherein the mixture of gases is reduced to an alloy and salts, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain substantially all the alloy and salts below the sintering temperatures thereof away from the reaction zone, and control mechanism in communication with the first and second detection and/or control devices to control the amount of second liquid halide introduced into the flowing superheated stream of halide as a function of the mass flow rate of the superheated halide vapor to produce an alloy with predetermined constituent concentrations.


A final object of the invention is to provide a system for producing a Ti base alloy, comprising a storage container for liquid titanium tetrahalide and heating mechanism in communication therewith for providing a flowing stream of superheated titanium tetrahalide vapor, a first flow meter in communication with the flowing stream of superheated titanium tetrahalide for measuring the flow rate thereof, a second storage container for a second liquid halide and mechanism in communication therewith for introducing the second liquid halide into the flowing stream of superheated titanium tetrahalide vapor to vaporize the second liquid halide forming a mixture of gases in predetermined and controllable ratios, a second flow meter and/or a scale in communication with the second storage container for the second liquid halide to measure the amount of second liquid halide introduced into the flowing superheated stream of titanium tetrahalide, a storage container for a liquid alkali or alkaline earth metal and mechanism for providing a flowing stream of liquid alkali or alkaline earth metal or mixtures thereof and mechanism for introducing the mixture of gases into the flowing stream of liquid alkali or alkaline earth metal or mixtures thereof establishing a reaction zone wherein the mixture of gases is reduced to a titanium base alloy and salts, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain substantially all the titanium base alloy and salts below the sintering temperatures thereof away from the reaction zone, and control mechanism in communication with flow meters and/or the scale to control the amount of second liquid halide introduced into the flowing superheated stream of titanium tetrahalide to produce a titanium base alloy with predetermined constituent concentrations.


The invention consists of certain novel features and a combination of parts hereinafter fully described, illustrated in the accompanying drawings, and particularly pointed out in the appended claims, it being understood that various changes in the details may be made without departing from the spirit, or sacrificing any of the advantages of the present invention.





BRIEF DESCRIPTION OF THE DRAWINGS

For the purpose of facilitating an understanding of the invention, there is illustrated in the accompanying drawings a preferred embodiment thereof, from an inspection of which, when considered in connection with the following description, the invention, its construction and operation, and many of its advantages should be readily understood and appreciated.



FIG. 1 is a schematic representation of a system for producing alloys according to the Armstrong Process incorporating the subject invention;



FIG. 1A is a schematic representation of a reactor useful in the practice of the invention;



FIGS. 2-4 are SEMs of alloys made in accordance with the present invention; and



FIG. 5 is a plot of intensity versus energy level, in keV, for one spot of the alloy illustrated in the SEMs showing a small peak of about 5.3 keV is the Kβ emission for V.





DETAILED DESCRIPTION OF THE INVENTION

Because VCl4 is a stable compound in the vapor form but decomposes when present as a liquid, the decomposition rate being both temperature and time dependent, the subject invention solves a difficult problem in making the most commercially useful titanium alloy. By introducing VCl4 as a liquid, stored at a relatively low ambient temperature, directly into a super heated vapor without having to raise the temperature of the liquid over a longer period of time, significant losses of the VCl4 feedstock are prevented. Moreover, as previously indicated, a host of other problems are also solved by the subject invention including equipment failure, poor control of the amount of vanadium introduced due to build up of solids in the vanadium boiler, increased maintenance and boiler failure.


All of the figures included in this application are non-limiting specific examples of the invention. Although the superheated vapor used in the specific example herein is TiCl4 with optional aluminum trichloride intermixed therewith, the superheated vapor may be any halide or mixtures thereof that is suitable for the Armstrong process. Fluorides and borides are commercially available and for some alloy constituents may be required. The preferred halide is a chloride due to cost and availability. In general, the super heated halide may be one or more of titanium, vanadium, boron, antimony, beryllium, gallium, uranium, silicon and rhenium. In addition, one or more liquid halides of the following elements may be used as alloy constituents: Al, B, Be, Bi, C, Fe, Ga, Ge, In, Mo, Nb, P, Pb, Re, Sb, Si, Sn, Ta, Ti, V, and W. Certain halides sublimate rather than boil, so these, such as AlCl3, PtF6 and ZrCl4, are introduced as vapor. The resulting alloy produced by this method and the system designed to provide same will include one or more of the following: Al, B, Be, Bi, C, Fe, Ga, Ge, Hf, In, Mo, Nb, P, Pb, Re, S, Sb, Si, Sn, Ta, Ti, U, V, W, and Zr. It should be noted that the alloy may contain non-metals such as carbon or boron or sulfur and in various amounts. The examples hereinafter set forth relate to titanium base alloys and particularly to titanium base alloys containing one or more of vanadium and aluminum but other alloys have been and are able to be made with the Armstrong Process. The introduction of some alloy constituents directly from the liquid has an additional advantage of facilitating the control of constituent concentrations.


Referring now to a non-limiting specific example, VCl4 is a stable compound in vapor form but the decomposition of liquid VCl4 is a problem when the liquid is heated beyond ambient temperatures in order to vaporize the same. The invention involves introducing a liquid halide into a super heated vapor stream of halides in order to flash the liquid VCl4 to the vapor phase from ambient temperatures directly without heating the liquid to its boiling point over a long period of time resulting in the aforesaid decomposition.


With respect to titanium base alloys, a superheated stream of TiCl4 can be used to flash vaporize liquids of vanadium chlorides and other halides facilitating improved control and reducing equipment problems in a vanadium tetrachloride boiler, as previously discussed. The amount of superheat needed is dependent among other things on the respective amount of superheated vapor and liquid halide being injected and can be determined by a person within the ordinary skill in the art when the constituents are known, based on the specific heat of the superheated vapor and the specific heat and heat of vaporization of the liquid. An example calculation specific to flash vaporizing VCl4 with a superheated stream of TiCl4 is set forth below.


Properties and Assumptions






    • TiCl4 Mass Flow Rate=2.5 Kg/min

    • VCl4 Mass Flow Rate=0.091 kg/min

    • Cp TiCl4gas=94.9 Joule/Mol-K @ 533K

    • Cp VCl4Eq=138.63 Joule/Mol-K @ 403K

    • Hvap VCl4=33 kJoules/Mol-K @ 503K

    • VCl4 Mol Wt.=192.9 g

    • TiCl4 Mol Wt.=189.9 g

    • Mol Wt V=50.9 g

    • Mol Wt Ti=47.9 g





Assume thermodynamic property variations are negligible over the temperature range considered (Ref. Chemical Properties Handbook, Carl L. Yaws, McGraw-Hill Handbooks).


To calculate the energy needed to vaporize the liquid VCl4 @ 500 Kpa and 230° C. using the properties and assumption above, the following calculations are made: (This is the energy to heat the VCl4 from 30° C. to 230° C. and the energy to vaporize the VCl4) (mol VCl4/0.1929 Kg)[(0.091 kg/60 sec)(138.6 J/mol-k)(230−30)+(0.091 kg/60 sec)(33 kj/mol)]=477j/sec needed to heat and vaporize the VCl4 at 500 kPa and at the stated flow rate.


Calculate the necessary superheat on the TiCl4 to provide the energy necessary to vaporize the VCl4 at 500 Kpa:

(Mass FlowTiCl4 Vap)(CpTiCl4 Vap)(TTiCl4 Superheated−503 k)=477j/Sec
(2.500 kg/60 sec)(mol TiCl4/0.1899 kg)(94.9 J/mol-K)(TTiCl4 Superheated−503 k)=477 j/sec TTiCl4 Superheated=525.8K=252.8° C.


Thus, the superheat temperature above saturation required to provide the necessary energy to heat and vaporize the VCl4liq in this example is (252.8° C.−230° C.):=22.8° C. of superheat.


EXAMPLE 1


FIG. 1 is a schematic representation of the equipment used in the following example.


Referring now to FIG. 1, there is VCl4 reservoir 9 connected by a valve 1 to a source of argon, the reservoir 9 being supported on a weigh scale 10. A conduit is below the liquid level of the VCl4 in the reservoir 9 and extends through a series of valves 2 and 3 through a filter 6 into a gas manifold line 7. A separate argon purge is connected to the conduit leaving the VCl4 reservoir by means of a valve 11 and a flow meter 8 to control the flow rate of argon purge gas after a run has been completed.


Titanium tetrachloride from a boiler (not shown) flows into a superheater 5 through a conduit past valves 4 into a manifold receiving liquid VCl4 from the reservoir 9.


Other chlorides for alloy constituents can be introduced into the manifold containing the gas as illustrated in FIG. 1 or at any point before the introduction of the liquid VCl4. After the liquid VCl4 is flashed to a vapor, the mixture of gases is then fed to the Armstrong reactor as illustrated in FIG. 1. FIG. 1A is a replication of the reactor as illustrated in FIG. 2 of U.S. Pat. No. 5,958,106, issued to Armstrong et al. Sep. 28, 1999, the entire disclosure of which was incorporated herein by reference. A reactor 20 has a liquid metal inlet 13 and a pipe 21 having an outlet or nozzle 23 connected to a source halide gas 22 (TiCl4 Boiler) and source of halide liquid 24 (Liquid Halide).


For instance in FIG. 1A, the sodium entering the reaction chamber is at 200° C. having a flow rate of 38.4 kilograms per minute. The titanium tetrachloride from the boiler is at 2 atmospheres and at a temperature of 164° C., the flow rate through the line was 1.1 kg/min. Higher pressures may be used, but it is important that back flow be prevented, so the minimum pressure should be equal to or above that determined by the critical pressure ratio for sonic conditions, or about two times the absolute pressure of the sodium stream (two atmospheres if the sodium is at atmospheric pressure) is preferred to ensure that flow through the reaction chamber nozzle is critical or choked.


The description of the reactor in FIG. 1A is found in the previously incorporated Armstrong et al. patents. The difference between the reactor illustrated in FIG. 1A herein and that as described in the '106 and other patents incorporated herein is that the halide liquid that is flashed in this present invention is injected from the source (24) as a liquid into the titanium tetrachloride after it leaves the boiler 22 and superheater (5) under superheat conditions calculated in the manner hereinbefore described.


Referring to FIG. 1, a liquid reservoir of VCl4 (9) is pressurized with Argon (1) to above the TiCl4 vapor pressure so that liquid VCl4 is capable of flowing into a pressurized TiCl4 vapor stream at a constant rate. The rate can be varied by adjusting the reservoir pressure or the spray orifice diameter. When the reaction process is started, the TiCl4 valves (4) open allowing superheated TiCl vapor to flow towards the reactor. Simultaneously, valve (3) opens allowing room temperature liquid VCl4 to flow through filter (6) and spray nozzle (7) into the superheated TiCl4 stream. The weigh scale 10 monitors VCl4 mass flow rate into the process. The superheated TiCl4 mixes with the liquid VCl4, rapidly vaporizes it, and carries it to the Armstrong Reactor 20 (FIG. 1A) along with other metal chlorides from additional alloy boilers (not shown) to produce the desired powder. At the end of the run, the argon purge through flow meter (8) is used to drive out residual VCl4 from the injection nozzle and tubing to prevent decomposition of residual VCl4 plugging the delivery system.


In this example, TiCl4 pressure was 500 Kpa and VCl4 reservoir pressure was 2400 Kpa. During the course of the reaction, 232 g of liquid VCl4 and 10,800 g of TiCl4 with 80 to 100° C. superheat were injected. This corresponded to 61.3 g V and 2,728 g of Ti or 0.22 wt % V. The average chemical analysis showed a 0.23 wt % V in the powder demonstrating that the VCl4 injected into the TiCl4 stream made it into the reacted product. Further, X-ray mapping showed typical uniform distribution of the vanadium within the powder particles as shown in FIG. 5.


Using the equipment as shown in FIG. 1 with the addition of liquid VCl4 flow control (PID) capability and the elimination of the spray nozzle (7) into the TICl4 tube replaced by a ¼″ tube leading directly into the superheated TiCl4 vapor, a TiV alloy was produced. Based on actual TiCl4 and VCl4 weights reacted during a run, a 5.1 wt % vanadium content was expected in the titanium powder that was produced. The actual measured vanadium content produced during the test as measured by direct current plasma emission spectroscopy per ASTM E1097-03 varied from 4.95% to 5.27% over six different samples.


In this example, the control system was programmed to produce a Ti-4% V alloy as a function of actual TiCl4 flow. The TiCl4 pressure was approximately 500 kPa, the VCl4 reservoir pressure was approximately 800 kPa, the TiCl4 was superheated to greater than 285° C., the TiCl4 flow indicated approximately 2200 g/min and the VCl flow indicated approximately 90 g/min. Based on actual weights of metal chloride reactants used during this run, the metal powder chemistry was expected to be between 4.1% and 4.2% vanadium. The vanadium concentrations are shown in Table 2.












TABLE 2







Sample Identification
Vanadium %









B.01
4.30



B.06
4.10



B.03
4.10



B.04
4.14



B.05
4.11



B.06
4.30











Method: Direct current plasma emission spectroscope—ASTM E 1097 03.


The Titanium (Ti)-Vanadium (V) alloy sample (©) was analyzed on a Zeiss Supra40VP Scanning Electron Microscope (SEM), a variable-pressure system with a PGT energy-dispersive X-ray detector. The secondary electron detector operating at 20 kV was used for the SEM micrographs shown in FIG. 2. This micrograph reveals typical Armstrong powder morphology with feature size similar to commercially pure (CP) Ti. Eleven spots were selected from an image similar to FIG. 2 for quantitative elemental analysis (spotlight). The individual results from this spotlight analysis are given in Table 3. The x-ray information showed a fairly uniform distribution of vanadium in titanium with an average value for V of 4.38%, see Table 3.









TABLE 3







Spotlight Summary Report Concentrations by Weight %









Tag # C
Ti
V












1
97.83%
2.17%


2
98.18%
1.82%


3
98.15%
1.85%


4
89.73%
10.27%


5
92.09%
7.91%


6
96.52%
3.48%


7
98.47%
1.53%


8
95.89%
4.11%


9
92.56%
7.44%


10
97.68%
2.32%


11
94.90%
5.10%



Average V
4.38%










Summary of the elemental concentrations derived from emission data for 11 random spots from an SEM image similar to FIG. 2.


Composition elemental mapping of the V concentration distribution in the titanium was performed using the K orbital x-ray emission data measure by a detector in the SEM. One issue in analyzing the x-ray emission information for a Ti—V alloy is that the Kα peak of V is near the Ti Kβ peak making it difficult to directly map elemental V based on the V Kα data. In order to get an elemental map of V, without the masking effect of the Ti Kβ peak, its Kβ peak was used. The Kα data for V is much weaker but is not confounded by other possible elements in this range.


In FIG. 3 the secondary electron image is given along with the elemental mapping data for Ti and V based on Kα emission data. With the confounding of the Ti Kβ data at the same energy level as the V Kα the results may not give an accurate map of the V concentrations. The V Kβ peak was used to map the elemental concentration of V, as shown in FIG. 4. Since there are no other peaks masking the V Kβ peak, it is assumed that the V mapping results should be more accurate.


The intensity results of the x-ray energy emission for the Armstrong Ti-4V powder sample is given in FIG. 5. The high intensity peak at 4.51 keV is the Kα peak for Ti while the V Kα peak should appear at 4.95 keV, it is in part hidden by the secondary Ti Kβ peak at about 4.9 keV. The V Kβ peak however can be seen unabated at about 5.3 keV. Sample C (FIGS. 3 and 4) contains Ti—V powder with feature size similar to Armstrong CP Ti powder. X-ray analysis indicates minimal segregation of the V element in the Ti alloy.


Although the specific experiments or examples set forth above relate to titanium and vanadium, and more particularly, to the use of a titanium tetrachloride superheated vapor to flash vaporize ambient liquid vanadium tetrachloride, the invention extends beyond the specific examples and is not to be limited thereby. More specifically, a wide variety of superheated halides including mixtures thereof may be used in the subject invention including titanium, boron, antimony, beryllium gallium, uranium, silicon and rhenium to name a few. The liquid halide may include one or more of boron, beryllium, bismuth, carbon, iron, gallium, germanium, indium, molybdenum, niobium, phosphous lead rhenium, antimony, silicon, tin, tantalum, titanium vanadium and tungsten.


Moreover, more than one liquid halides may be introduced and more than one halide may be used as the superheated halide. In addition, the invention includes serial introduction of liquid halides and serial introduction of halide vapors. For instance, a titanium tetrachloride vapor may be superheated to flash vaporize a liquid such as but not limited to vanadium tetrachloride, and thereafter, additional halides such as those of bismuth, iron or any of the other previously named halides may be added as vapors or as liquids, as necessary.


The calculation for the amount of superheat needed is based on the examples hereinbefore set forth.


In order to make the most commercially useful alloy of titanium which is called 6-4 titanium, that is 6 percent by weight aluminum and 4 percent by weight vanadium with the balance titanium, aluminum trichloride has to be introduced into the titanium tetrachloride either before or after the liquid vanadium tetrachloride is flashed from liquid to vapor. The amounts of alloy constituents can be closely controlled using either the liquid or the vapor form, depending on instrumentation and the like. Other alloys can be made using the present invention including 6-4 titanium with boron additions as well as many other alloys.


While the invention has been particularly shown and described with reference to a preferred embodiment hereof, it will be understood by those skilled in the art that several changes in form and detail may be made without departing from the spirit and scope of the invention.

Claims
  • 1. A method of producing an alloy, comprising the steps of: introducing a liquid VCl4 at ambient temperature into a flowing superheated halide vapor thereby vaporizing the liquid VCl4 forming a mixture of gases, wherein the liquid VCl4 has not been heated to boiling before being introduced into the flowing stream of superheated halide vapor; andintroducing the mixture of gases into a flowing stream of a liquid metal comprising a liquid alkali metal or an alkaline earth metal or a mixture thereof establishing a reaction zone wherein the mixture of gases is reduced to an alloy and a salt, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain the alloy and salt below the sintering temperatures thereof away from the reaction zone after the mixture of gases is reduced to the alloy and salt.
  • 2. The method of claim 1, wherein the superheated halide vapor comprises one or more of the halides of titanium, boron, antimony, beryllium, gallium, uranium, silicon, and rhenium.
  • 3. The method of claim 1, wherein the superheated halide vapor comprises TiCl4.
  • 4. The method of claim 1, wherein the superheated halide vapor mixture contains a metal halide and a non-metal halide.
  • 5. The method of claim 2, wherein the halides are chlorides.
  • 6. The method of claim 1, wherein the alloy is a base alloy of one or more of titanium, boron, antimony, beryllium, gallium, uranium, silicon, and rhenium.
  • 7. The method of claim 1, wherein the liquid metal is selected from the group consisting of Na, K, Mg, Ca and mixtures thereof.
  • 8. The method of claim 7, wherein the liquid metal is Na.
  • 9. The method of claim 7, wherein the temperature of the liquid metal away from the reaction zone is maintained at less than about 600° C.
  • 10. The method of claim 1, wherein the alloy comprises Al.
  • 11. A method of producing a Ti base alloy, comprising the steps of: introducing a liquid VCl4 at ambient temperature into a flowing superheated titanium tetrahalide vapor thereby vaporizing the liquid VCl4 forming a mixture of gases, wherein the liquid VCl4 has not been heated to boiling before being introduced into the flowing superheated titanium tetrahalide vapor; andintroducing the mixture of gases into a flowing stream of a liquid metal comprising a liquid alkali metal or an alkaline earth metal or a mixture thereof establishing a reaction zone wherein the mixture of gases is reduced to a titanium base alloy and a salt, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain the titanium base alloy and salt below the sintering temperatures thereof away from the reaction zone after the mixture of gases is reduced to the titanium base alloy and salt.
  • 12. The method of claim 11, wherein the flowing superheated titanium tetrahalide vapor comprises titanium tetrachloride.
  • 13. The method of claim 11, wherein the mixture of gases comprises aluminum chloride.
  • 14. The method of claim 13, wherein the titanium base alloy contains about 6% aluminum and about 4% vanadium within ASTM B265, grade 5 specifications for 6-4 Ti.
  • 15. The method of claim 11, wherein at least some of the vanadium tetrachloride is provided as vanadium tetrachloride in a container under an inert gas atmosphere prior to the introduction thereof into the flowing superheated titanium tetrahalide vapor mixture.
  • 16. The method of claim 15, wherein the gas pressure in the container exceeds the vapor pressure of the flowing superheated titanium tetrahalide vapor mixture and is used at least in part to control a flow rate of the vanadium chloride into the flowing superheated titanium tetrahalide vapor mixture.
  • 17. The method of claim 11, wherein the amount of liquid VCl4 introduced into the flowing superheated titanium tetrahalide vapor mixture is controlled at least in part by measuring the flow rate of the flowing superheated titanium tetrahalide vapor mixture.
  • 18. The method of claim 11, wherein the liquid metal is selected from the group consisting of Na, K, Mg, Ca and mixtures thereof.
  • 19. The method of claim 11 wherein the liquid metal is Na.
  • 20. A method of producing a Ti base alloy, comprising the steps of: introducing a liquid VCl4 at ambient temperature into a flowing stream of superheated TiCl4 vapor thereby vaporizing the liquid VCl4 forming a mixture of gases, wherein the liquid VCl4 has not been heated to boiling before being introduced into the flowing stream of superheated TiCl4 vapor; andintroducing the mixture of gases into a flowing stream of a liquid metal comprising a liquid alkali metal or an alkaline earth metal or a mixture thereof establishing a reaction zone wherein the mixture of gases is reduced to a Ti base alloy and salt, the liquid metal being present in a sufficient amount in excess of stoichiometric to maintain the Ti base alloy and salt below the sintering temperatures thereof away from the reaction zone after the mixture of gases is reduced to the Ti base alloy and salt.
  • 21. The method of claim 20 wherein the mixture of gases comprises AlCl3.
  • 22. The method of claim 20, wherein the Ti base alloy comprises about 6% aluminum and about 4% vanadium within ASTM B265, grade 5 specifications for 6-4 Ti alloy.
US Referenced Citations (166)
Number Name Date Kind
1771928 Jung Jul 1930 A
2205854 Kroll Jun 1940 A
2607675 Gross Aug 1952 A
2647826 Jordan Aug 1953 A
2816828 Benedict et al. Dec 1957 A
2823991 Kamlet Feb 1958 A
2827371 Quin Mar 1958 A
2835567 Willcox May 1958 A
2846303 Keller et al. Aug 1958 A
2846304 Keller et al. Aug 1958 A
2882143 Schmidt Apr 1959 A
2882144 Follows et al. Apr 1959 A
2890112 Winter Jun 1959 A
2895823 Lynskey Jul 1959 A
2915382 Hellier et al. Dec 1959 A
2941867 Maurer Jun 1960 A
2944888 Quin Jul 1960 A
3058820 Whitehurst Oct 1962 A
3067025 Chisholm Dec 1962 A
3085871 Griffiths Apr 1963 A
3085872 Kenneth Apr 1963 A
3113017 Homme Dec 1963 A
3331666 Robinson et al. Jul 1967 A
3519258 Ishizuka Jul 1970 A
3535109 Ingersoll Oct 1970 A
3650681 Sugahara et al. Mar 1972 A
3825415 Johnston et al. Jul 1974 A
3836302 Kaukeinen Sep 1974 A
3847596 Holland et al. Nov 1974 A
3867515 Bohl et al. Feb 1975 A
3919087 Brumagim Nov 1975 A
3927993 Griffin Dec 1975 A
3943751 Akiyama et al. Mar 1976 A
3966460 Spink Jun 1976 A
4007055 Whittingham Feb 1977 A
4009007 Fry Feb 1977 A
4017302 Bates et al. Apr 1977 A
4070252 Bonsack Jan 1978 A
4128421 Marsh et al. Dec 1978 A
4141719 Hakko Feb 1979 A
4149876 Rerat Apr 1979 A
4190442 Patel Feb 1980 A
4331477 Kubo et al. May 1982 A
4379718 Grantham et al. Apr 1983 A
4401467 Jordan Aug 1983 A
4402741 Pollet et al. Sep 1983 A
4414188 Becker Nov 1983 A
4423004 Ross Dec 1983 A
4425217 Beer Jan 1984 A
4432813 Williams Feb 1984 A
4445931 Worthington May 1984 A
4454169 Hinden et al. Jun 1984 A
4518426 Murphy May 1985 A
4519837 Down May 1985 A
4521281 Kadija Jun 1985 A
4555268 Getz Nov 1985 A
4556420 Evans et al. Dec 1985 A
4604368 Reeve Aug 1986 A
4606902 Ritter Aug 1986 A
RE32260 Fry Oct 1986 E
4687632 Hurd Aug 1987 A
4689129 Knudsen Aug 1987 A
4725312 Seon et al. Feb 1988 A
4828008 White et al. May 1989 A
4830665 Winand May 1989 A
4839120 Baba et al. Jun 1989 A
4877445 Okudaira et al. Oct 1989 A
4897116 Scheel Jan 1990 A
4902341 Okudaira et al. Feb 1990 A
4915729 Boswell et al. Apr 1990 A
4923577 McLaughlin et al. May 1990 A
4940490 Fife et al. Jul 1990 A
4941646 Stelts et al. Jul 1990 A
4985069 Traut Jan 1991 A
5028491 Huang et al. Jul 1991 A
5032176 Kametani et al. Jul 1991 A
5055280 Nakatani et al. Oct 1991 A
5064463 Ciomek Nov 1991 A
5082491 Rerat Jan 1992 A
5147451 Leland Sep 1992 A
5149497 McKee et al. Sep 1992 A
5160428 Kuri Nov 1992 A
5164346 Giunchi et al. Nov 1992 A
5167271 Lange et al. Dec 1992 A
5176741 Bartlett et al. Jan 1993 A
5176810 Volotinen et al. Jan 1993 A
5211741 Fife May 1993 A
5259862 White et al. Nov 1993 A
5338379 Kelly Aug 1994 A
5356120 König et al. Oct 1994 A
5427602 DeYoung et al. Jun 1995 A
5437854 Walker et al. Aug 1995 A
5439750 Ravenhall et al. Aug 1995 A
5448447 Chang Sep 1995 A
5460642 Leland Oct 1995 A
5498446 Axelbaum et al. Mar 1996 A
5580516 Kumar Dec 1996 A
H1642 Ogden Apr 1997 H
5637816 Schneibel Jun 1997 A
5779761 Armstrong et al. Jul 1998 A
5897830 Abkowitz et al. Apr 1999 A
5914440 Celik et al. Jun 1999 A
5948495 Stanish et al. Sep 1999 A
5951822 Knapick et al. Sep 1999 A
5954856 Pathare et al. Sep 1999 A
5958106 Armstrong et al. Sep 1999 A
5986877 Pathare et al. Nov 1999 A
5993512 Pargeter et al. Nov 1999 A
6010661 Abe et al. Jan 2000 A
6027585 Patterson et al. Feb 2000 A
6040975 Mimura Mar 2000 A
6099664 Davies Aug 2000 A
6103651 Leitzel Aug 2000 A
6136062 Loffeholz et al. Oct 2000 A
6180258 Klier Jan 2001 B1
6193779 Reichert et al. Feb 2001 B1
6210461 Elliott Apr 2001 B1
6238456 Wolf et al. May 2001 B1
6309570 Fellabaum Oct 2001 B1
6309595 Rosenberg et al. Oct 2001 B1
6409797 Armstrong et al. Jun 2002 B2
6432161 Oda et al. Aug 2002 B1
6488073 Blenkinsop et al. Dec 2002 B1
6502623 Schmitt Jan 2003 B1
6602482 Kohler et al. Aug 2003 B2
6689187 Oda Feb 2004 B2
6727005 Gimondo et al. Apr 2004 B2
6745930 Schmitt Jun 2004 B2
6824585 Joseph et al. Nov 2004 B2
6861038 Armstrong et al. Mar 2005 B2
6884522 Adams et al. Apr 2005 B2
6902601 Nie et al. Jun 2005 B2
6921510 Ott et al. Jul 2005 B2
6955703 Zhou et al. Oct 2005 B2
7041150 Armstrong et al. May 2006 B2
7351272 Armstrong et al. Apr 2008 B2
7410610 Woodfield et al. Aug 2008 B2
7435282 Armstrong et al. Oct 2008 B2
7445658 Armstrong et al. Nov 2008 B2
7501007 Anderson et al. Mar 2009 B2
7501089 Armstrong et al. Mar 2009 B2
20020050185 Oda May 2002 A1
20020152844 Armstrong et al. Oct 2002 A1
20030061907 Armostrong et al. Apr 2003 A1
20030145682 Anderson et al. Aug 2003 A1
20040050208 Nie et al. Mar 2004 A1
20040079197 Armstrong et al. Apr 2004 A1
20040123700 Zhou et al. Jul 2004 A1
20050081682 Armstrong et al. Apr 2005 A1
20050150576 Venigalla Jul 2005 A1
20050225014 Armstrong et al. Oct 2005 A1
20050284824 Anderson et al. Dec 2005 A1
20060086435 Anderson et al. Apr 2006 A1
20060102255 Woodfield et al. May 2006 A1
20060107790 Anderson et al. May 2006 A1
20060123950 Anderson et al. Jun 2006 A1
20060150769 Armstrong et al. Jul 2006 A1
20060230878 Anderson et al. Oct 2006 A1
20070017319 Jacobsen et al. Jan 2007 A1
20070079908 Jacobsen et al. Apr 2007 A1
20070180951 Armstrong et al. Aug 2007 A1
20070180952 Lanin et al. Aug 2007 A1
20080031766 Kogut et al. Feb 2008 A1
20080152533 Ernst et al. Jun 2008 A1
20080187455 Armstrong et al. Aug 2008 A1
20080199348 Armstrong et al. Aug 2008 A1
Foreign Referenced Citations (45)
Number Date Country
587782 Nov 1985 AU
2003263081 Jun 2004 AU
2196534 Feb 1996 CA
006615 Feb 2006 EA
007634 Dec 2006 EA
0298698 Jan 1989 EP
0299791 Jan 1989 EP
1441039 Jul 2004 EP
1657317 May 2006 EP
722184 Jan 1955 GB
778021 Jul 1957 GB
31007808 Sep 1956 JP
49042518 Apr 1974 JP
51010803 Apr 1976 JP
60255300 Dec 1985 JP
6112837 Jan 1986 JP
62065921 Mar 1987 JP
64047823 Feb 1989 JP
4116161 Apr 1992 JP
05078762 Mar 1993 JP
10502418 Mar 1998 JP
11090692 Apr 1999 JP
2001279345 Oct 2001 JP
90840 Jan 1958 NO
411962 Jan 1974 RU
WO9604407 Feb 1996 WO
WO9824575 Jun 1998 WO
WO2004022269 Mar 2004 WO
WO2004022797 Mar 2004 WO
WO2004022798 Mar 2004 WO
WO2004022799 Mar 2004 WO
WO2004022800 Mar 2004 WO
WO2004026511 Apr 2004 WO
WO2004028655 Apr 2004 WO
WO2004033736 Apr 2004 WO
WO2004033737 Apr 2004 WO
WO2004048622 Oct 2004 WO
WO2005019485 Mar 2005 WO
WO2005021807 Mar 2005 WO
WO2005023725 Mar 2005 WO
WO2005042792 May 2005 WO
WO2007044635 Apr 2007 WO
WO2007089400 Aug 2007 WO
WO2008013518 Jan 2008 WO
WO2008079115 Jul 2008 WO
Non-Patent Literature Citations (21)
Entry
Stratcor MSDS sheet (http://www.stratcor.com/chemicals/VCL4-MSDS-English-7-1-07c.pdf).
Crowley, How to Extract Low-Cost Titanium, Adv. Mat'l. & Processes (Nov. 2003).
Kelto et al. “Titanium Powder Metallurgy—A Perspective”; Conference: Powder Metallurgy of Titanium Alloys, Las Vegas, Nevada, Feb. 1980, pp. 1-19.
Mahajan et al. “Microstructure Property Correlation in Cold Pressed and Sintered Elemental Ti-6A1-4V Powder Compacts”; Conference: Powder Metallurgy of Titanium Alloys, Las Vegas, Nevada, Feb. 1980, pp. 189-202.
DeKock et al. “Attempted Preparation of Ti-6-4 Alloy Powders from TiCl4, Al, VCI4, and Na”; Metallurgical Transactions B, vol. 18B, No. 1, Process Metallurgy, Sep. 1987, pp. 511-517.
Upadhyaya “Metal Powder Compaction”, Powder Metallurgy Technology, Published by Cambridge International Science Publishing, 1997; pp. 42-67.
Moxson et al. “Production and Applications of Low Cost Titanium Powder Products”; The international Journal of Powder Metallurgy, vol. 34, No. 5, 1998, pp. 45-47.
ALT “Solid-Liquid Separation, Introduction”; Ulmann's Encyclopedia of Industrial Chemistry, © 2002 by Wiley-VCH Verlag GmbH & Co., Online Posting Date: Jun. 15, 2000, pp. 1-7.
Gerdemann et al. “Characterization of a Titanium Powder Produced Through a Novel Continuous Process”; Published by Metal Powder Industries Federation, 2000, pp. 12.41-12.52.
Moxson et al. “Innovations in Titanium Powder Processing”; Titanium Overview, JOM, May 2000, p. 24.
Gerdemann “Titanium Process Technologies”; Advanced Materials & Processes, Jul. 2001, pp. 41-43.
Lü et al. “Laser-Induced Materials and Processes for Rapid Prototyping” Published by Springer, 2001, pp. 153-154.
Lee et al. “Synthesis of Nano-Structured Titanium Carbide by Mg-Thermal Reduction”; Scripta Materialia, 2003, pp. 1513-1518.
Chandran et al. “TiBw-Reinforced Ti Composites: Processing, Properties, Application Prospects, and Research Needs”; Ti—B Alloys and Composites Overview, JOM, May 2004, pp. 42-48.
Chandran et al. “Titanium-Boron Alloys and Composites: Processing, Properties, and Applications”; Ti—B Alloys and Composites Commentary, JOM, May 2004 pp. 32 and 41.
Hanusiak et al. “The Prospects for Hybrid Fiber-Reinforced Ti—TiB-Matrix Composites”; Ti—B Alloys and Composites Overview, JOM, May 2004, pp. 49-50.
Kumari et al. “High-Temperature Deformation Behavior of Ti—TiBw In-Situ Metal-Matrix Composites”; Ti—B Alloys and Composites Research Summary, JOM, May 2004, pp. 51-55.
Saito “The Automotive Application of Discontinuously Reinforced TiB—Ti Composites”; Ti—B Alloys and Composites Overview, JOM, May 2004, pp. 33-36.
Yolton “The Pre-Alloyed Powder Metallurgy of Titanium with Boron and Carbon Additions”; Ti—B Alloys and Composites Research Summary, JOM, May 2004, pp. 56-59.
Research Report; P/M Technology News, Crucible Research, Aug. 2005, vol. 1, Issue 2, 2 pages.
International Search Report (8 pages).
Related Publications (1)
Number Date Country
20080264208 A1 Oct 2008 US