This application is a Section 371 National Stage Application of International Application No. PCT/GB2016/051761, filed Jun. 15, 2016, which is incorporated by reference in its entirety and published as WO 2017/013380 A1 on Jan. 26, 2017 and which claims priority of British Application No. 1512897.8, filed Jul. 22, 2015.
Embodiments relate to a liquid ring pump and a method of operating said liquid ring pump. In particular, the embodiments relate to a liquid ring pump for pumping and treating a corrosive effluent gas stream from a processing chamber at least one constituent of which is reactive with or soluble in a service liquid of the pump.
Liquid ring pumps are used to pump a variety of gases, however their typical materials of construction (e.g. stainless steel, cast iron, brass, etc.) precludes their long term use with strongly corrosive or reactive gases (i.e. acidic, basic, oxidising or reducing gases). Known liquid ring pumps have been made from exotic materials such titanium, ceramics and polymers, however, not only can these materials be costly but it is difficult to manufacture pumps in these materials with the required close dimensional tolerances between certain components, for example the rotor and the stator.
During the evacuation of some semiconductor manufacturing processes, for example plasma etch, the effluent gas stream produced is chemically reactive with, or soluble in, the service liquid (typically water) in the liquid ring pump. This generates a corrosive service liquid and thus corrosion products from the reaction of said corrosive service liquid with the internal workings of the pump. Such corrosion products can cause additional corrosion and abrasion within the pumping arrangement.
The discussion above is merely provided for general background information and is not intended to be used as an aid in determining the scope of the claimed subject matter. The claimed subject matter is not limited to implementations that solve any or all disadvantages noted in the background.
Embodiments seek at least to mitigate one or more of the problems associated with the prior liquid ring pumps.
A liquid ring pump for treating a corrosive effluent gas stream from a processing chamber which is reactive with, or soluble in, a service liquid of the pump to form corrosion products, the pump comprising: an annular pumping chamber which is generally cylindrical around a central pumping chamber axis for receiving the gas stream and a service liquid; a rotor having a rotor axis which is offset from the central pumping chamber axis, the rotor having a plurality of rotor blades which, on rotation of the rotor, cause liquid in the pumping chamber to form a ring having a centre coincident with the central axis of the pumping chamber and compression of effluent gas conveyed from an inlet to an outlet of the pumping chamber; a magnetic drive assembly for driving the rotor, the magnetic drive assembly comprising a magnetic follower received in a drive chamber that can be magnetically coupled with a magnetic drive outside the drive chamber such that when the magnetic drive is driven by a motor the magnetic follower imparts rotation to the rotor; wherein the drive chamber is in fluid communication with the pumping chamber allowing circulation of the service liquid in the drive chamber and the pumping chamber, and wherein the pumping chamber, drive chamber, magnetic follower and rotor comprise one or more materials which are resistant to the effluent gas stream and the corrosion products generated when the gas stream is treated by the service liquid.
Other preferred and/or optional aspects of the invention are defined in the accompanying claims.
The Summary is provided to introduce a selection of concepts in a simplified form that are further described in the Detail Description. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
In order that the embodiments may be well understood, an embodiment thereof, which is given by way of example only, will now be described with reference to the accompanying drawings, in which:
With reference first to
A waste gas stream is drawn from the outlet 18 of the process chamber 10 by a pumping system indicated at 20 in
The pumping system 20 comprises a first pumping arrangement 22. The first pumping arrangement 22 comprises a multi-stage dry pump, wherein each pumping stage of said pump may be provided by a Roots-type or Northey-type pumping mechanism. The first pumping arrangement may also comprise a turbomolecular pump, and/or a molecular drag mechanism, and/or a mechanical booster pump, such as a roots blower, depending on the pumping requirements of the process chamber 10. One pump is shown in the first pumping arrangement 22 of
The first pumping arrangement 22 draws the waste gas stream from the outlet 18 of the process chamber 10 and exhausts the gas stream at a pressure, typically in the range from 50 to 1000 mbar, from an exhaust 30 thereof. It has been found advantageous for the pumping system 20 to also include a liquid ring pump (LRP) backing pump 32 having a first inlet 34 connected to the exhaust 30 of the first pumping arrangement 22 via a conduit system 36.
Depending on the process conducted within the process chamber 10, the waste stream entering the liquid ring pump 32 may contain one or more halogen-containing and/or silicon-containing gases used as a precursor in the manufacture of a semiconductor device. Examples of such gases and their process by-products include tetrafluoromethane; fluorine; hydrogen fluoride; silane; disilane; dichlorosilane; trichlorosilane; tetraethylorthosilicate (TEOS); a siloxane, such as octamethylcyclotetrasiloxane (OMCTS); and an organosilane.
In view of these types of gases, the liquid ring pump 32 is able to perform as both a wet scrubber for the waste gas stream whilst also compressing the gas stream for exhausting to atmosphere (and thus reducing the exhaust pressure of the first pumping arrangement 22 such that its overall power usage is reduced). The liquid ring pump 32 may also act as a backing pump if the first pumping arrangement only comprises a turbomolecular pump, and/or a molecular drag mechanism, and/or a mechanical booster pump.
Referring to
As illustrated in
This means that on an inlet side of the pump 32 the gas present in the compression regions located between adjacent rotor blades 62 is moving radially outward, away from the rotor hub, while on the outlet side of the pump the gas is moving radially inward toward the rotor hub. This results in a piston-type pumping action on the gas passing through the pump 32.
The waste stream entering the liquid ring pump 32 through the first inlet 34 is pulled into the spaces 63 between adjacent blades 62. The gas stream is compressed by the piston-type pumping action and exhausted through an exhaust 64 on the outlet side thereof for exhausting from the pump 32 a treated gas stream predominantly containing treated gas but also some liquid from the liquid ring 48. The service liquid becomes contaminated with corrosion products, or particulates produced by treatment of the gas stream and over time the liquid may become less effective at treating the gas or may become too corrosive or abrasive. It is necessary therefore to remove liquid from the pump and replenish the pump with fresh service liquid. The rate at which liquid is replenished is dependent on a number of factors, for example, the reactivity or solubility rate of the particular component of the effluent gas stream with the service liquid. Liquid drained from the pump may subsequently be treated to remove corrosion products and/or particulates and re-used or simply disposed of. Liquid is drained from the pump through drain port 96, described in more detail below, and fresh liquid enters the pump through inlet 44.
A cross-section through a liquid ring pump 32 is shown in
The magnetic follower 74 is fixed to a first bearing 76 which is supported for rotation by a stationary cantilevered shaft 78 fixed to a magnetic drive housing 80. An opposing end of the shaft 78 extends through a port plate 82 and is therefore retained with a central shaft axis along the eccentric axis 58 of the pump. The rotor 54 is fixed to a second bearing 84 which is supported for rotation by shaft 78. A drive piece 94 connects the magnetic follower 74 to the rotor so that rotation of the motor is transmitted to the rotor. The rotor blades 62 extend outwardly from the rotor hub and are supported at one end by a circumferential portion 86. The shaft 78 extends through an adapter plate 88 between the rotor and the follower magnet. A stator 56, which in this example is part of the pump housing, forms the pumping chamber 90 with the adapter plate 88 and the drive piece 94. The magnetic drive housing 80 together with the adapter plate 88 and the drive piece 94 forms a drive chamber 92. The adapter plate therefore generally separates the pumping chamber 90 from the drive chamber 92.
A head plate 98 comprises waste stream gas inlet 34 and outlet 66 together with liquid inlet 44. A liquid outlet 96 from the pump extends from the drive chamber 92 through the drive housing 80. The head plate 98 co-operates with the port plate 82 which conveys gas into and out of the pumping chamber and service liquid into drive and pumping chambers. The inlet 34 conveys gas along a conduit 126 formed through the head plate. The head plate further comprises an internal chamber 128 which communicates with the outlet 66.
The port plate 82 can be seen in more detail in
The thrust surface of the bearing 108 has three engraved blind-ending radial liquid distribution channels 110, that are located flush to the bearing surface. By suitable axial alignment of the magnetic drive coupling 72, 74, a forward, axial, thrust (to the right in
A rear thrust plate 114 may mounted in a circular recess of the drive housing 80 and adapted to extend axially and sit proud of the internal surface of drive housing 80 to protect the magnetic drive should an axial force move the follower magnet to the left as shown in
Liquid entering the pump is directed along inlet 44 to a central chamber 116 in the port plate which surrounds an axial end of the shaft 78. The central chamber 116 fluidly communicates with the channels 106 in the port plate 82 and thrust plate 104 so that liquid entering the pump is directed along the shaft 78 for lubrication and flushing the interface between the shaft 78 and the rotating components 76, 94, 84 of the pump. The rotating components are shaped along the interface with the shaft 78 to extend the channels 106 along the shaft to the drive chamber 92 to ensure that the full axial and circumferential extent of the shaft is lubricated. The channels 106 convey water along the shaft and by rotation of bearings 84, 76 and the drive piece 94 cause the service liquid (for example water) to flush the circumferential surface of the shaft with clean water thereby removing any particulates along the shaft downstream. The service liquid, having completed its lubrication duty, exits the rear of the first bearing 76 and passes into the pumping chamber 90 through a conduit defined by the gap between the adaptor plate 88 and the drive piece 94. Additional service liquid (possibly recirculated service liquid) can be supplied by other suitably located ports.
An additional suitably sized port 117 extends through the adaptor plate 88 and allows liquid to pass between the drive chamber 92 and pumping chamber 90 thereby acting as a pressure relief for the service liquid between the magnetic drive housing and the pump chamber. The location and size of this port is selected to optimise flow of service liquid in the pumping chamber to improve pumping performance.
The pump comprises a plurality of discrete components which are assembled and held together using external steel support rings 118 which spread the compression and are fixed by a plurality of tie bars 120. This arrangement provides mechanical stiffness and facilitates both axial and radial location and orientation. Sealing of the components is achieved using O-rings 122 set into channels 124 formed in the faces of each component. Moreover, the components of the pump can readily be changed to allow performance modification for different pumping and abatement requirements. For example, the stator 56 defining the pumping chamber is a discrete component which allows different radial profiles and sizes to be used so as to optimise pump performance by controlling the radial clearances between the impeller 54 and the stator 56. The pumping capacity of the liquid ring pump may also be adjusted by changing the axial length of the stator 56, impeller 54 and shaft 78 without having to redesign any other components of the pump.
The materials from which the components of the pump are made are selected to be corrosion resistant to afford good corrosion resistance to a wide range of aggressive substances which may be encountered in the effluent gas stream exhausted from the processing chamber. The drive shaft 78 and thrust washers 104, 114 may be made from high purity alumina, sintered silicon carbide or other similar materials. The first bearing 76 for the magnetic drive 74 and the second bearing 84 for the impeller 54 are selected from a range of self-lubricating materials such as (but not limited to), graphite and graphite/PTFE composites. The mag-drive housing 80, adaptor plate 88, pumping chamber stator 56, port plate 82, head plate 98 and impeller 54 may be manufactured from a range of polymers such as (but not limited to) poly(vinyl chloride), filled polypropylene, poly(phenylene sulphide), poly(vinylidene fluoride); these may also comprise PTFE.
The liquid ring pump has been optimised with treatment of effluent gas streams in mind. In this regard, the liquid ring pump is adapted to be installed in a vertical orientation with the shaft extending generally vertically. It is noted that conventional liquid ring pumps have traditionally been horizontally mounted. Vertically mounting the pump allows the pump inlet 34 to be both parallel to the axis and vertical. Thus particle laden gas streams from a process chamber have an uninterrupted path into the pumping chamber 90, minimising the chances of blockage (for example in conduit 36). Further opportunity for blockage is reduced by use of a specifically designed inlet system fed with service liquid ported directly, under pressure, from the liquid ring to flush the inlet path.
Vertical mounting of the liquid ring pump also significantly reduces its footprint. The use of an exhaust port 66 perpendicular to the shaft axis (horizontal to the ground) allows very close coupling of a gas/liquid separator tank further improving the pumping packaging and reducing the footprint.
Use of the liquid ring pump will now be described in further detail.
The motor of the pump (not shown) is activated causing the magnetic driver 70 and thus the drive magnets 72 to rotate around an eccentric axis 58 of the pump. Through magnetic coupling the magnetic follower 74 is caused to rotate which transmits torque through the drive piece 94 to the impeller/rotor 54. Service liquid, such as water, is introduced from the control 50 through liquid inlet 44 of the liquid ring pump and passes along the shaft 78 providing lubrication and into the drive chamber 92. From the drive chamber, liquid passes into the pumping chamber 90 through the gap or conduit formed between the drive piece 94 and the adaptor plate 88. Rotation of the rotor 54 causes the liquid to form a ring in pumping chamber 90 having an axial length of approximately the length of the stator 56.
When scrubbing certain corrosive gases it is desirable to control the amount of service liquid which enters the pump in order to control the temperature of the service liquid. That is, the pump 32 generates heat during operation which is exchanged with the service liquid. If the amount (total volume or replenishment flow rate) of service liquid present in the pump is reduced the service liquid rises to a higher temperature. Conversely, if more liquid is present (total volume or replenishment flow rate) the temperature of the service liquid is reduced. Accordingly, control 50 controls the amount of liquid in the pump dependent on the constituents of the effluent gas so that the liquid temperature is suited to scrubbing those constituents.
For example, if the effluent gas stream contains fluorine, scrubbing should take place at above room temperature, for example at least 30° C., because oxygen diflouride may be generated at temperatures around room temperature and below. Oxygen diflouride is far more toxic than fluorine. Accordingly, the control 50 restricts the amount of liquid entering the pump so that the liquid temperature is maintained at a predetermined temperature, preferably from 35° C. to 80° C., for example 60° C., so that hydrogen fluoride is preferentially produced over oxygen diflouride. This is preferential because hydrogen fluoride is less toxic than fluorine and oxygen difluoride and can readily be disposed of. Restriction of the amount of liquid in/delivered to the pump has the further advantage that there is less service liquid that requires abatement.
A modification of the liquid ring pump (LRP) 32 will now be described with reference to
A previously proposed solution to overcome the problem of over-compression was by adoption of a non-cylindrical pumping chamber. This served to constrain the liquid ring close to the rotor between inlet and outlet ports where no pumping is occurring, yet expand the ring away from the inlet and exhaust ports during that part of the cycle where expansion and compression takes place. However, such a complex stator design is not trivial to manufacture.
The modification according to the embodiment is shown in
An alternative arrangement to that shown in
In
Although elements have been shown or described as separate embodiments above, portions of each embodiment may be combined with all or part of other embodiments described above.
Although the subject matter has been described in language specific to structural features and/or methodological acts, it is to be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or acts described above. Rather, the specific features and acts described above are described as example forms of implementing the claims.
Number | Date | Country | Kind |
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1512897.8 | Jul 2015 | GB | national |
Filing Document | Filing Date | Country | Kind |
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PCT/GB2016/051761 | 6/15/2016 | WO | 00 |
Publishing Document | Publishing Date | Country | Kind |
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WO2017/013380 | 1/26/2017 | WO | A |
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Number | Date | Country | |
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20180209420 A1 | Jul 2018 | US |